JPS56127768A - Surface-treating device - Google Patents
Surface-treating deviceInfo
- Publication number
- JPS56127768A JPS56127768A JP2892980A JP2892980A JPS56127768A JP S56127768 A JPS56127768 A JP S56127768A JP 2892980 A JP2892980 A JP 2892980A JP 2892980 A JP2892980 A JP 2892980A JP S56127768 A JPS56127768 A JP S56127768A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- gas
- take
- plasma
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
PURPOSE:To produce a uniform film of high-melting material or a uniform reaction film containing gaseous elements without using any solvents by a method wherein the surface of a continuous substrate between a supply spool wound with the substrate and a take-up spool is treated by a gas-discharge plasma. CONSTITUTION:A container 5 capable of setting a pressure for maintaining the gas discharge in a gas 4 required for the surface treatment is provided between the supply spool 2 wound with the continuous substrate 1 of a stringlike or sheetlike form and the take-up roll 3 for the substrate, and a means 6 for the electric discharge in the gas 4 is placed in the container 5. While converting the gas 4 into the plasma by the gas discharge and reacting the plasma with the surface of the substrate 1, a motor 7 is driven to take up the substrate 1 onto the spool 3 and simultaneously the substrate 1 is heated by an external heating means 8. The reactive gas 4 consists of at least one selected from the group consisting of single-element gases consisting of H, N, O, F, Cl Br and I, a group of inorganic gaseous compounds consisting of hydrides, nitrides, oxides, fluorides, chlorides, bromides and iodides and a group of organic gaseous compounds.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2892980A JPS56127768A (en) | 1980-03-06 | 1980-03-06 | Surface-treating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2892980A JPS56127768A (en) | 1980-03-06 | 1980-03-06 | Surface-treating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS56127768A true JPS56127768A (en) | 1981-10-06 |
Family
ID=12262083
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2892980A Pending JPS56127768A (en) | 1980-03-06 | 1980-03-06 | Surface-treating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56127768A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000064047A (en) * | 1998-06-26 | 2000-02-29 | James A Mclaughlin | Device and method for coating substrate with diamond- like carbon(dlc) or other vacuum deposition film |
| US11992737B2 (en) | 2015-03-02 | 2024-05-28 | Karsten Manufacturing Corporation | Snap fit golf bag assembly |
-
1980
- 1980-03-06 JP JP2892980A patent/JPS56127768A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000064047A (en) * | 1998-06-26 | 2000-02-29 | James A Mclaughlin | Device and method for coating substrate with diamond- like carbon(dlc) or other vacuum deposition film |
| US11992737B2 (en) | 2015-03-02 | 2024-05-28 | Karsten Manufacturing Corporation | Snap fit golf bag assembly |
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