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JPS5612730A - Electron beam exposure - Google Patents

Electron beam exposure

Info

Publication number
JPS5612730A
JPS5612730A JP8766879A JP8766879A JPS5612730A JP S5612730 A JPS5612730 A JP S5612730A JP 8766879 A JP8766879 A JP 8766879A JP 8766879 A JP8766879 A JP 8766879A JP S5612730 A JPS5612730 A JP S5612730A
Authority
JP
Japan
Prior art keywords
alignment
wafer
electron beam
marks
areas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8766879A
Other languages
Japanese (ja)
Other versions
JPS6152973B2 (en
Inventor
Hisayasu Nishino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8766879A priority Critical patent/JPS5612730A/en
Publication of JPS5612730A publication Critical patent/JPS5612730A/en
Publication of JPS6152973B2 publication Critical patent/JPS6152973B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To improve the operational efficiency by exposing four field areas with a plurality of alignment marks formed in one area equal to one field at the center of the four fields. CONSTITUTION:Four fields areas a, b, c and d having square alignment marks 12 formed as illustrated, as basic unit, are arranged in large numbers on the wafer and the wafer is placed on the stage of the electron beam exposure equipment. After the alignment of the wafer by two marks formed at both side ends parallel to the facet of the wafer, the electron beam is positioned on the m area at the center of any zone in the four field areas. The electronic signal reflected from the square marks 12 with electronic beam is detected to find X and Y axes whereby alignment is performed by adjusting the errors. Thus, position detection can be done by one alignment in the four field areas thereby improving the operational efficiency of the exposure equipment.
JP8766879A 1979-07-11 1979-07-11 Electron beam exposure Granted JPS5612730A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8766879A JPS5612730A (en) 1979-07-11 1979-07-11 Electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8766879A JPS5612730A (en) 1979-07-11 1979-07-11 Electron beam exposure

Publications (2)

Publication Number Publication Date
JPS5612730A true JPS5612730A (en) 1981-02-07
JPS6152973B2 JPS6152973B2 (en) 1986-11-15

Family

ID=13921315

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8766879A Granted JPS5612730A (en) 1979-07-11 1979-07-11 Electron beam exposure

Country Status (1)

Country Link
JP (1) JPS5612730A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5940008A (en) * 1982-08-31 1984-03-05 ダイキン工業株式会社 Clamping tool
JPS63148627A (en) * 1986-12-12 1988-06-21 Hitachi Ltd Method of lithographing by electron beam lithography equipment

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0372631U (en) * 1989-11-16 1991-07-23

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5940008A (en) * 1982-08-31 1984-03-05 ダイキン工業株式会社 Clamping tool
JPS63148627A (en) * 1986-12-12 1988-06-21 Hitachi Ltd Method of lithographing by electron beam lithography equipment

Also Published As

Publication number Publication date
JPS6152973B2 (en) 1986-11-15

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