JPS5599049A - Defect detector - Google Patents
Defect detectorInfo
- Publication number
- JPS5599049A JPS5599049A JP612079A JP612079A JPS5599049A JP S5599049 A JPS5599049 A JP S5599049A JP 612079 A JP612079 A JP 612079A JP 612079 A JP612079 A JP 612079A JP S5599049 A JPS5599049 A JP S5599049A
- Authority
- JP
- Japan
- Prior art keywords
- test piece
- light
- defects
- cut
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Optical Radar Systems And Details Thereof (AREA)
Abstract
PURPOSE:To permit a quick detection of fine particles, flaws or the like on a plane object by detecting only scattered light due to defects with the normally reflected light with an optical planar scanning on the surface to be checked. CONSTITUTION:Laser beam magnified to a proper size with a collimater 101 is scanned in a planar way with a X-Y scanner 102. The beam is irradiated vertically on the test piece 105 with a lens 103 and a mirror 104 thereby allowing an even and quick scanning at a specified spot diameter. Then, the light 111 normally reflected from the test piece is collected on a space filter 108 with a condenser 107 to cut off. In this case, the scattered light 112 due to defects 110 on the test piece 105 won't be cut off thoroughly by the filter because of larger angle of scattering, and detected with a light detector 109.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP612079A JPS5599049A (en) | 1979-01-24 | 1979-01-24 | Defect detector |
US06/109,217 US4330205A (en) | 1979-01-12 | 1980-01-03 | Optical apparatus for measuring the size and location of optical in an article |
GB8000586A GB2044921B (en) | 1979-01-12 | 1980-01-08 | Optical apparatus for inspecting defects |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP612079A JPS5599049A (en) | 1979-01-24 | 1979-01-24 | Defect detector |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5599049A true JPS5599049A (en) | 1980-07-28 |
Family
ID=11629639
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP612079A Pending JPS5599049A (en) | 1979-01-12 | 1979-01-24 | Defect detector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5599049A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5960344A (en) * | 1982-09-04 | 1984-04-06 | ロ−ベルト・ボツシユ・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | Method and device for automatically inspecting surface by coherent laser luminous flux |
JPS61104244A (en) * | 1984-10-29 | 1986-05-22 | Hitachi Ltd | Apparatus for detecting foreign matter of semiconductive wafer |
JPS61296243A (en) * | 1985-06-24 | 1986-12-27 | Datsuku Eng Kk | Method for inspecting object to be inspected in non-contact state |
JPS6211138A (en) * | 1985-06-28 | 1987-01-20 | Hitachi Electronics Eng Co Ltd | Apparatus for inspecting foreign matter |
JP2009008658A (en) * | 2007-04-12 | 2009-01-15 | Imra America Inc | Beam scanning imaging apparatus |
US7754998B2 (en) * | 2004-05-26 | 2010-07-13 | Yamazaki Mazak Corporation | Focus adjuster for laser beam machine |
-
1979
- 1979-01-24 JP JP612079A patent/JPS5599049A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5960344A (en) * | 1982-09-04 | 1984-04-06 | ロ−ベルト・ボツシユ・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | Method and device for automatically inspecting surface by coherent laser luminous flux |
JPS61104244A (en) * | 1984-10-29 | 1986-05-22 | Hitachi Ltd | Apparatus for detecting foreign matter of semiconductive wafer |
JPS61296243A (en) * | 1985-06-24 | 1986-12-27 | Datsuku Eng Kk | Method for inspecting object to be inspected in non-contact state |
JPS6211138A (en) * | 1985-06-28 | 1987-01-20 | Hitachi Electronics Eng Co Ltd | Apparatus for inspecting foreign matter |
JPH0514857B2 (en) * | 1985-06-28 | 1993-02-26 | Hitachi Electr Eng | |
US7754998B2 (en) * | 2004-05-26 | 2010-07-13 | Yamazaki Mazak Corporation | Focus adjuster for laser beam machine |
JP2009008658A (en) * | 2007-04-12 | 2009-01-15 | Imra America Inc | Beam scanning imaging apparatus |
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