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JPS5543121A - Removal of monomer from polystyrene resin - Google Patents

Removal of monomer from polystyrene resin

Info

Publication number
JPS5543121A
JPS5543121A JP11579578A JP11579578A JPS5543121A JP S5543121 A JPS5543121 A JP S5543121A JP 11579578 A JP11579578 A JP 11579578A JP 11579578 A JP11579578 A JP 11579578A JP S5543121 A JPS5543121 A JP S5543121A
Authority
JP
Japan
Prior art keywords
resin
product
monomer
polystyrene resin
removal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11579578A
Other languages
Japanese (ja)
Other versions
JPS618842B2 (en
Inventor
Yukio Inoue
Tomoaki Sumiya
Chikao Oda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11579578A priority Critical patent/JPS5543121A/en
Publication of JPS5543121A publication Critical patent/JPS5543121A/en
Publication of JPS618842B2 publication Critical patent/JPS618842B2/ja
Granted legal-status Critical Current

Links

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE: To obtain a polystyrene resin with a monomer content ≤300ppm continuously and efficiently, by controlling the temperature (T) of a molten polystyrene, introduced into a thin film evaporator, and the product of T and the residence time.
CONSTITUTION: A molten polystyrene resin at a temperature (T) of 220W305°C is introduced into a thin film evaporator with the product of T and the residence time of 3.5W45°Ch. If T is too low, the resin cannot be molten. If T is too high, the resin is decomposed and deteriorated in a short time. If the product is too small, the monomer cannot be removed sufficiently. If the product is too large, the resin is decomposed and deteriorated. T is a factor affecting the fluidity and quality of the resin. The product is a factor affecting the efficieny of monomer removal and quality.
COPYRIGHT: (C)1980,JPO&Japio
JP11579578A 1978-09-22 1978-09-22 Removal of monomer from polystyrene resin Granted JPS5543121A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11579578A JPS5543121A (en) 1978-09-22 1978-09-22 Removal of monomer from polystyrene resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11579578A JPS5543121A (en) 1978-09-22 1978-09-22 Removal of monomer from polystyrene resin

Publications (2)

Publication Number Publication Date
JPS5543121A true JPS5543121A (en) 1980-03-26
JPS618842B2 JPS618842B2 (en) 1986-03-18

Family

ID=14671255

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11579578A Granted JPS5543121A (en) 1978-09-22 1978-09-22 Removal of monomer from polystyrene resin

Country Status (1)

Country Link
JP (1) JPS5543121A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1981000814A1 (en) * 1979-09-21 1981-04-02 Hitachi Ltd Process and device for removing volatile substance from highly viscous material
JPS59126411A (en) * 1983-01-10 1984-07-21 Idemitsu Petrochem Co Ltd After-treatment of styrene polymerization product
JPS59126412A (en) * 1983-01-10 1984-07-21 Idemitsu Petrochem Co Ltd After-treatment of styrene polymerization product and equipment therefor

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1981000814A1 (en) * 1979-09-21 1981-04-02 Hitachi Ltd Process and device for removing volatile substance from highly viscous material
JPS59126411A (en) * 1983-01-10 1984-07-21 Idemitsu Petrochem Co Ltd After-treatment of styrene polymerization product
JPS59126412A (en) * 1983-01-10 1984-07-21 Idemitsu Petrochem Co Ltd After-treatment of styrene polymerization product and equipment therefor
JPH0373570B2 (en) * 1983-01-10 1991-11-22 Idemitsu Petrochemical Co
JPH0525881B2 (en) * 1983-01-10 1993-04-14 Idemitsu Sekyu Kagaku Kk

Also Published As

Publication number Publication date
JPS618842B2 (en) 1986-03-18

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