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JPS55151642A - Photomask - Google Patents

Photomask

Info

Publication number
JPS55151642A
JPS55151642A JP5931779A JP5931779A JPS55151642A JP S55151642 A JPS55151642 A JP S55151642A JP 5931779 A JP5931779 A JP 5931779A JP 5931779 A JP5931779 A JP 5931779A JP S55151642 A JPS55151642 A JP S55151642A
Authority
JP
Japan
Prior art keywords
mask
plate
substrate
transfer
portions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5931779A
Other languages
Japanese (ja)
Inventor
Shinya Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5931779A priority Critical patent/JPS55151642A/en
Publication of JPS55151642A publication Critical patent/JPS55151642A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To prevent bubbles from being trapped between mask contact surfaces and easily separate masks after exposure by making the exposure region surface portion of a mask substrate higher than the peripheral portion of the substrate. CONSTITUTION:Central flat mount portion (exposure region forming portion) 12 is formed on glass substrate 11 whose back side 10 is flat, and portion 12 is led to peripheral portion 13 through gently inclined surface 14. Using the resulting mask substrate, master mask 15 is formed. Mask 15 and blank plate 16 having the same structure are arranged so that flat mount portions 12, 12 (pattern surface of mask 15 and resist surface of plate 16) are contacted to each other, and both edge portions are inserted in fixed portions 1,4. By evacuation from exhaust ports 7 mask 15 and plate 16 are closely contacted under external atmospheric pressure 8 (arrows) and exposed to transfer the pattern of mask 15 onto plate 16. After the transfer by feeding the outside air from ports 7 mask 15 and plate 16 can be separated easily.
JP5931779A 1979-05-15 1979-05-15 Photomask Pending JPS55151642A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5931779A JPS55151642A (en) 1979-05-15 1979-05-15 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5931779A JPS55151642A (en) 1979-05-15 1979-05-15 Photomask

Publications (1)

Publication Number Publication Date
JPS55151642A true JPS55151642A (en) 1980-11-26

Family

ID=13109855

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5931779A Pending JPS55151642A (en) 1979-05-15 1979-05-15 Photomask

Country Status (1)

Country Link
JP (1) JPS55151642A (en)

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