Classifications

• • H01L29/105—
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
  • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
  • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
  • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
  • H01L21/32—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers using masks
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
  • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
  • H01L21/76—Making of isolation regions between components
  • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
  • H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
  • H01L21/76205—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO in a region being recessed from the surface, e.g. in a recess, groove, tub or trench region
• • H01L27/0623—
• • H01L27/0716—
• • H01L27/0927—
• • H01L29/00—

Landscapes

• Engineering & Computer Science (AREA)
• Physics & Mathematics (AREA)
• Condensed Matter Physics & Semiconductors (AREA)
• General Physics & Mathematics (AREA)
• Microelectronics & Electronic Packaging (AREA)
• Power Engineering (AREA)
• Manufacturing & Machinery (AREA)
• Computer Hardware Design (AREA)
• Ceramic Engineering (AREA)
• Element Separation (AREA)
• Bipolar Transistors (AREA)
• Insulated Gate Type Field-Effect Transistor (AREA)
• Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
• Local Oxidation Of Silicon (AREA)
• Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
• Electrodes Of Semiconductors (AREA)

Applications Claiming Priority (1)

Publications (2)

Family

ID=19813322

Family Applications (5)

Family Applications Before (3)

Family Applications After (1)

Country Status (16)

Cited By (1)

Families Citing this family (10)

Family Cites Families (5)

• 1971
  • 1971-06-08 NL NL7107805.A patent/NL160988C/xx not_active IP Right Cessation
• 1972
  • 1972-04-18 ES ES401854A patent/ES401854A1/es not_active Expired
  • 1972-04-18 AT AT338972A patent/AT351597B/de not_active IP Right Cessation
  • 1972-04-18 CH CH570072A patent/CH542519A/de not_active IP Right Cessation
  • 1972-04-18 DE DE2218680A patent/DE2218680C2/de not_active Expired
  • 1972-04-18 JP JP3838872A patent/JPS5416194B1/ja active Pending
  • 1972-04-18 BR BR2321/72A patent/BR7202321D0/pt unknown
  • 1972-04-18 FR FR7213556A patent/FR2140383B1/fr not_active Expired
  • 1972-04-18 CA CA140,068A patent/CA963172A/en not_active Expired
  • 1972-04-18 IT IT68209/72A patent/IT958758B/it active
  • 1972-04-18 NO NO1346/72A patent/NO134676C/no unknown
  • 1972-04-18 DK DK188272AA patent/DK135819B/da not_active IP Right Cessation
  • 1972-04-18 GB GB1786072A patent/GB1389311A/en not_active Expired
  • 1972-04-18 BE BE782285A patent/BE782285A/xx not_active IP Right Cessation
  • 1972-04-18 SE SE7205034A patent/SE371333B/xx unknown
  • 1972-11-15 ES ES408617A patent/ES408617A1/es not_active Expired
• 1973
  • 1973-03-15 IN IN584/CAL/73A patent/IN139051B/en unknown
• 1976
  • 1976-02-04 JP JP1043876A patent/JPS5416397B2/ja not_active Expired
  • 1976-02-04 JP JP51010439A patent/JPS51139276A/ja active Granted
  • 1976-02-04 JP JP51010440A patent/JPS51139277A/ja active Granted
• 1980
  • 1980-06-19 JP JP8223280A patent/JPS568880A/ja active Pending

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