[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

JPS54110988A - Coating vacuum evaporation apparatus - Google Patents

Coating vacuum evaporation apparatus

Info

Publication number
JPS54110988A
JPS54110988A JP16127778A JP16127778A JPS54110988A JP S54110988 A JPS54110988 A JP S54110988A JP 16127778 A JP16127778 A JP 16127778A JP 16127778 A JP16127778 A JP 16127778A JP S54110988 A JPS54110988 A JP S54110988A
Authority
JP
Japan
Prior art keywords
vacuum evaporation
evaporation apparatus
coating vacuum
coating
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16127778A
Other languages
Japanese (ja)
Other versions
JPS5651228B2 (en
Inventor
Ioshifuouitsuchi Arukusandoru
Mihairouitsuchi Dorodo Andorei
Fuyoodorouitsuchi Arekusandoru
Danirouitsuchi Kiseref Mihairu
Arekuseeeuitsuchi Pereka Yurii
Furoi Arekusandoru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NII CHIEFUNOROGII AFUTOMOBIRIN
Original Assignee
NII CHIEFUNOROGII AFUTOMOBIRIN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SU782568105A external-priority patent/SU796248A1/en
Priority claimed from SU782593106A external-priority patent/SU1125291A2/en
Application filed by NII CHIEFUNOROGII AFUTOMOBIRIN filed Critical NII CHIEFUNOROGII AFUTOMOBIRIN
Publication of JPS54110988A publication Critical patent/JPS54110988A/en
Publication of JPS5651228B2 publication Critical patent/JPS5651228B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP16127778A 1978-01-31 1978-12-28 Coating vacuum evaporation apparatus Granted JPS54110988A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SU782568105A SU796248A1 (en) 1978-01-31 1978-01-31 Device for coating
SU782593106A SU1125291A2 (en) 1978-03-30 1978-03-30 Apparatus for application of coatings

Publications (2)

Publication Number Publication Date
JPS54110988A true JPS54110988A (en) 1979-08-30
JPS5651228B2 JPS5651228B2 (en) 1981-12-03

Family

ID=26665654

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16127778A Granted JPS54110988A (en) 1978-01-31 1978-12-28 Coating vacuum evaporation apparatus

Country Status (5)

Country Link
JP (1) JPS54110988A (en)
DE (1) DE2902142C2 (en)
FR (1) FR2416273A1 (en)
IT (1) IT1101076B (en)
SE (1) SE431473B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1040631A1 (en) * 1980-06-25 1983-09-07 Предприятие П/Я В-8851 Vacuum arc apparatus
CH651072A5 (en) * 1981-02-23 1985-08-30 Sablev Leonid P Consumable cathode FOR A METAL ARC EVAPORATOR.
CH657242A5 (en) * 1982-03-22 1986-08-15 Axenov Ivan I ARC PLASMA SOURCE AND ARC SYSTEM WITH SUCH AN ARC PLASMA SOURCE FOR PLASMA TREATMENT OF THE SURFACE OF WORKPIECES.
GB2140040B (en) * 1983-05-09 1986-09-17 Vac Tec Syst Evaporation arc stabilization
DE3331707A1 (en) * 1983-09-02 1985-03-21 Leybold-Heraeus GmbH, 5000 Köln METHOD AND DEVICE FOR REACTIVELY SPRAYING CONNECTIONS FROM METALS AND SEMICONDUCTORS
FR2557822B1 (en) * 1984-01-11 1987-10-16 Instr I CUTTING TOOL AND METHOD FOR MANUFACTURING SAID TOOL
US4724058A (en) * 1984-08-13 1988-02-09 Vac-Tec Systems, Inc. Method and apparatus for arc evaporating large area targets
DE3615361C2 (en) * 1986-05-06 1994-09-01 Santos Pereira Ribeiro Car Dos Device for the surface treatment of workpieces
DE19600993A1 (en) * 1995-01-13 1996-08-08 Technics Plasma Gmbh Appts. for high rate anodic evapn. for substrate coating
DE10044419C1 (en) * 2000-09-08 2002-05-02 Infineon Technologies Ag Shading ring for plasma coating systems and its use

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5481780A (en) * 1977-12-13 1979-06-29 Futaba Denshi Kogyo Kk Ion plating device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3305473A (en) * 1964-08-20 1967-02-21 Cons Vacuum Corp Triode sputtering apparatus for depositing uniform coatings
US3329601A (en) * 1964-09-15 1967-07-04 Donald M Mattox Apparatus for coating a cathodically biased substrate from plasma of ionized coatingmaterial
US3369990A (en) * 1964-12-31 1968-02-20 Ibm Cathodic sputtering apparatus including thermionic means for increasing sputtering efficiency
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US3749662A (en) * 1972-04-17 1973-07-31 Materials Research Corp Heated substrate support station for sputtering systems
US4038171A (en) * 1976-03-31 1977-07-26 Battelle Memorial Institute Supported plasma sputtering apparatus for high deposition rate over large area

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5481780A (en) * 1977-12-13 1979-06-29 Futaba Denshi Kogyo Kk Ion plating device

Also Published As

Publication number Publication date
SE7813467L (en) 1979-08-01
DE2902142C2 (en) 1983-03-17
FR2416273B1 (en) 1981-11-06
DE2902142A1 (en) 1979-08-16
JPS5651228B2 (en) 1981-12-03
IT1101076B (en) 1985-09-28
IT7831436A0 (en) 1978-12-29
FR2416273A1 (en) 1979-08-31
SE431473B (en) 1984-02-06

Similar Documents

Publication Publication Date Title
AU523497B2 (en) Coating apparatus
GB2026162B (en) Target apparatus
ZA795590B (en) Adhesive-repellant coatings
JPS54151173A (en) Spraying apparatus
JPS54138279A (en) Vacuum pickkup device
JPS553699A (en) Vacuum device
GB2034356B (en) Coating apparatus
GB2011797B (en) Vacuum filterbelt apparatus
JPS54110988A (en) Coating vacuum evaporation apparatus
JPS5543392A (en) Target projecting apparatus
GB2015127B (en) Target apparatus
GB2032135B (en) Spraying apparatus
JPS54146008A (en) Sprayer
GB2040317B (en) Apparatus for evaporation coating
GB2035148B (en) Coating tubes
GB2012179B (en) Vacuum filterbelt apparatus
GB2032089B (en) Condenser apparatus
JPS54139942A (en) Can coating material
PH14652A (en) Coating system
DE2965186D1 (en) Coating system
YU214179A (en) Process for obtaining diurethanes
JPS54126681A (en) Vacuum evaporation apparatus
JPS54131641A (en) Coating apparatus
JPS54153841A (en) Coating machine
JPS54122356A (en) Electrostatic deposition apparatus