JPH11330161A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPH11330161A JPH11330161A JP10135608A JP13560898A JPH11330161A JP H11330161 A JPH11330161 A JP H11330161A JP 10135608 A JP10135608 A JP 10135608A JP 13560898 A JP13560898 A JP 13560898A JP H11330161 A JPH11330161 A JP H11330161A
- Authority
- JP
- Japan
- Prior art keywords
- circuit board
- semiconductor element
- conductive material
- resin sheet
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/831—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector the layer connector being supplied to the parts to be connected in the bonding apparatus
- H01L2224/83101—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector the layer connector being supplied to the parts to be connected in the bonding apparatus as prepeg comprising a layer connector, e.g. provided in an insulating plate member
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83192—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
Landscapes
- Wire Bonding (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、主として半導体ベ
アチップからなる半導体素子を回路基板に実装してなる
半導体装置の製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a semiconductor device in which a semiconductor element mainly composed of a semiconductor bare chip is mounted on a circuit board.
【0002】[0002]
【従来の技術】近年、電子機器においては小型化および
軽量化が求められており、それに伴って、回路基板上に
半導体素子を実装してなる半導体装置では、電子回路の
実装密度を高めることを目的として、ウェハを個片に分
割した半導体ベアチップを裏返して回路基板上に直接実
装する工法が多用されている。特に、サーマルヘッドド
ライバ、液晶ディスプレイドライバおよびゲートアレイ
などの超多ピン素子の組立および実装技術として、半導
体ベアチップの素子電極部上にワイヤボンダによるボー
ルボンディング工法により突起電極を形成し、この突起
電極を回路基板の基板電極部に電気的接続状態に接合す
ることにより、回路基板に半導体ベアチップを実装する
方法が知られている。2. Description of the Related Art In recent years, there has been a demand for a reduction in size and weight of electronic equipment, and accordingly, in a semiconductor device having a semiconductor element mounted on a circuit board, it is necessary to increase the mounting density of electronic circuits. For the purpose, a method of turning a semiconductor bare chip obtained by dividing a wafer into individual pieces upside down and mounting the semiconductor bare chips directly on a circuit board is often used. In particular, as a technology for assembling and mounting ultra-high pin count elements such as thermal head drivers, liquid crystal display drivers, and gate arrays, projecting electrodes are formed on the element electrode portion of a semiconductor bare chip by a ball bonding method using a wire bonder. 2. Description of the Related Art There is known a method of mounting a semiconductor bare chip on a circuit board by bonding to a substrate electrode portion of a substrate in an electrically connected state.
【0003】つぎに、従来の半導体装置の製造方法の一
列として、液晶ディスプレイドライバの製造工程につい
て説明する。先ず、図4(a)に示すように、例えばニ
ッケル金属の微粉などの導電性粒子2を分散して含有さ
せた導電性樹脂シート1を、回路基板3における基板電
極部4の形成面上に貼り付ける。この樹脂シート1は加
圧箇所のみが導電性を有するようになる。続いて、同図
(b)に示すように、ヘッドヒータ11を内蔵した実装
ヘッド10は、ボールボンディング工法により素子電極
部8上に2段形状の突起電極(スタッドバンプ)9を予
め形成した半導体ベアチップからなる半導体素子7を吸
着する。ここで、半導体素子7は,その突起電極9の非
形成面に実装ヘッド10の吸着面を押し付けられるとと
もに、真空ポンプ(図示せず)などの空気吸引力が実装
ヘッド10の空気吸引通路12を介して作用することに
より、実装ヘッド10に吸着される。[0005] Next, as one line of a conventional method of manufacturing a semiconductor device, a manufacturing process of a liquid crystal display driver will be described. First, as shown in FIG. 4A, a conductive resin sheet 1 containing dispersed conductive particles 2 such as nickel metal fine powder is placed on the surface of the circuit board 3 on which the substrate electrode portion 4 is formed. paste. In this resin sheet 1, only the pressurized portions have conductivity. Subsequently, as shown in FIG. 1B, the mounting head 10 having the built-in head heater 11 has a semiconductor in which a two-stage projection electrode (stud bump) 9 is previously formed on the element electrode portion 8 by a ball bonding method. The semiconductor element 7 composed of a bare chip is sucked. Here, the semiconductor element 7 is pressed against the suction surface of the mounting head 10 against the surface on which the protruding electrodes 9 are not formed, and the air suction force of a vacuum pump (not shown) is applied to the air suction passage 12 of the mounting head 10. By acting through the mounting head, it is attracted to the mounting head 10.
【0004】半導体素子7を吸着した実装ヘッド10
は、素子電極部8つまり突起電極9が基板電極部4に対
向するように半導体素子7を回路基板3に対し位置決め
したのちに、同図(c)に示すように、下降して半導体
素子7を樹脂シート1上に載置する。つぎに、実装ヘッ
ド10は半導体素子7を加圧して樹脂シート1に押し付
ける。それにより、同図(c)に示すように、突起電極
9は、樹脂シート1内に埋入していき、導電性粒子2を
介して回路基板3の基板電極部4に電気的接続状態に接
触する。また、実装ヘッド10は、ヘッドヒータ11を
駆動して200℃の加熱温度に昇温させる。樹脂シート
1は、ヘッドヒータ11の発生熱が素子電極部8および
突起電極9を通じて伝熱されることにより溶融硬化す
る。この溶融硬化した樹脂シート1は、突起電極9と基
板電極部4との接合部を強固に保持するとともに、半導
体素子7と回路基板3との間隙を封止する。[0004] A mounting head 10 to which a semiconductor element 7 is sucked.
After the semiconductor element 7 is positioned with respect to the circuit board 3 so that the element electrode portion 8, that is, the protruding electrode 9 faces the substrate electrode portion 4, the semiconductor element 7 descends as shown in FIG. Is placed on the resin sheet 1. Next, the mounting head 10 presses the semiconductor element 7 to press it against the resin sheet 1. Thereby, as shown in FIG. 2C, the protruding electrodes 9 are embedded in the resin sheet 1 and are electrically connected to the substrate electrode portions 4 of the circuit board 3 via the conductive particles 2. Contact. In addition, the mounting head 10 drives the head heater 11 to increase the heating temperature to 200 ° C. The resin sheet 1 is melt-hardened by the heat generated by the head heater 11 being transferred through the element electrode portions 8 and the protruding electrodes 9. The melt-cured resin sheet 1 firmly holds the joint between the protruding electrode 9 and the substrate electrode portion 4 and seals the gap between the semiconductor element 7 and the circuit board 3.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、従来の
半導体装置の製造方法では、導電性粒子2による突起電
極9と基板電極部4との電気的接続と、半導体素子7と
回路基板3の間隙の樹脂による封止とを単一の工程で行
うことを目的として、導電性粒子2を混入した樹脂シー
ト1を用いているため、実装状態時に突起電極9と基板
電極部4との間に介在する導電性粒子2は、少数であっ
て、その数にもばらつきが生じる。それにより、突起電
極9と基板電極部4との接続抵抗値は半導体装置毎に変
動して一定とならず、製造された半導体装置の電気特性
が変化してしまう問題がある。However, in the conventional method of manufacturing a semiconductor device, the electrical connection between the protruding electrode 9 and the substrate electrode portion 4 by the conductive particles 2 and the gap between the semiconductor element 7 and the circuit substrate 3 are not provided. Since the resin sheet 1 mixed with the conductive particles 2 is used for the purpose of performing sealing with a resin in a single step, the resin sheet 1 is interposed between the bump electrode 9 and the substrate electrode portion 4 in a mounted state. The number of the conductive particles 2 is small, and the number varies. As a result, the connection resistance value between the protruding electrode 9 and the substrate electrode portion 4 varies from one semiconductor device to another and is not constant, and there is a problem that the electrical characteristics of the manufactured semiconductor device change.
【0006】さらに、この製造方法では、突起電極9と
基板電極部4との間に介在する導電性粒子2の数を可及
的に一定とするために、回路基板3と半導体素子7とを
正確な平行度で対向させる必要がある。そのため、一つ
の半導体素子7に形成した複数の2段突起電極9は、各
々の先端部をレベルリングステージに押し付けるなどの
手段により平坦面に整形し、且つそれぞれの高さを正確
な一定値に揃える必要があり、さらに、突起電極9を形
成した半導体素子7は、回路基板3に対し正確な平行度
を保って押し付ける必要がある。したがって、従来の製
造方法では、半導体製造装置に対し煩雑で困難な調整を
必要とする。Further, in this manufacturing method, in order to keep the number of conductive particles 2 interposed between the protruding electrode 9 and the substrate electrode portion 4 as constant as possible, the circuit substrate 3 and the semiconductor element 7 are connected to each other. It is necessary to face each other with exact parallelism. Therefore, the plurality of two-step protruding electrodes 9 formed on one semiconductor element 7 are shaped into a flat surface by means such as pressing each tip against a leveling stage, and each height is adjusted to an accurate constant value. The semiconductor elements 7 on which the protruding electrodes 9 are formed need to be pressed against the circuit board 3 while maintaining an accurate parallelism. Therefore, the conventional manufacturing method requires complicated and difficult adjustments to the semiconductor manufacturing apparatus.
【0007】そこで、本発明は、上記従来の問題点に鑑
みなされたもので、半導体素子の突起電極と回路基板の
基板電極部とを常にほぼ一定した接続抵抗値で安定に接
続できるとともに、煩雑な調整を要することなく半導体
素子を回路基板に容易に実装することのできる半導体装
置の製造方法を提供することを目的としている。In view of the above, the present invention has been made in view of the above-mentioned conventional problems, and can stably connect a projecting electrode of a semiconductor element to a substrate electrode portion of a circuit board with a substantially constant connection resistance value at all times. It is an object of the present invention to provide a method of manufacturing a semiconductor device in which a semiconductor element can be easily mounted on a circuit board without requiring any adjustment.
【0008】[0008]
【課題を解決するための手段】上記目的を達成するため
に、第1の発明は、半導体素子の素子電極部に形成した
突起電極を回路基板の基板電極部に電気的接続状態に接
合することにより、前記半導体素子を前記回路基板に実
装してなる半導体装置を製造する方法において、前記回
路基板における前記半導体素子を実装すべき箇所に、前
記回路基板と半導体素子との間隙を封止するための樹脂
シートを貼り付ける工程と、前記樹脂シートにおける前
記突起電極を対向させる位置に導電性材料を付着する工
程と、前記突起電極を前記導電性材料に対向させて前記
半導体素子を前記回路基板に対し位置決めしたのちに、
加熱状態下において前記半導体素子を前記回路基板に近
接する方向に加圧して、前記樹脂シート内に埋入した前
記突起電極を、これにより押圧される前記導電性材料を
介して前記基板電極部に接触させることにより、前記半
導体素子と前記回路基板とを接合、封止する工程とを備
えている。In order to achieve the above object, a first aspect of the present invention is to join a projecting electrode formed on a device electrode portion of a semiconductor device to a substrate electrode portion of a circuit board in an electrically connected state. According to the method for manufacturing a semiconductor device in which the semiconductor element is mounted on the circuit board, a gap between the circuit board and the semiconductor element is sealed at a position on the circuit board where the semiconductor element is to be mounted. Attaching a conductive material to a position of the resin sheet facing the projecting electrode, and placing the semiconductor element on the circuit board with the projecting electrode facing the conductive material. After positioning,
Under the heating state, the semiconductor element is pressurized in a direction approaching the circuit board, and the protruding electrode embedded in the resin sheet is applied to the substrate electrode portion via the conductive material pressed thereby. Contacting and sealing the semiconductor element and the circuit board by bringing them into contact with each other.
【0009】この半導体装置の製造方法では、複数の突
起電極と基板電極部との各間に、樹脂シートとは別個に
設けた導電性材料が確実に一定量ずつ介在するので、突
起電極と基板電極部との接合部は確実に電気的接続され
る上に、その接続抵抗値が常に一定値に安定する。しか
も、樹脂シートとは別個に設けた導電性材料を突起電極
と基板電極部との間に介在させるので、半導体素子を回
路基板に対し正確な平行度に対向するよう調整する必要
がなく、容易に製造することができる。In this method of manufacturing a semiconductor device, a certain amount of a conductive material provided separately from the resin sheet surely intervenes between each of the plurality of protruding electrodes and the substrate electrode portion. The junction with the electrode portion is reliably electrically connected, and the connection resistance value is always stabilized at a constant value. In addition, since a conductive material provided separately from the resin sheet is interposed between the protruding electrode and the substrate electrode portion, there is no need to adjust the semiconductor element so as to face the circuit board with an accurate parallelism. Can be manufactured.
【0010】また、第2の発明の半導体装置の製造方法
は、前記基板電極部における前記突起電極を接合すべき
位置に導電性材料を付着する工程と、前記回路基板にお
ける前記導電性材料の付着箇所を含む前記半導体素子を
実装すべき箇所に、前記回路基板と半導体素子との間隙
を封止するための樹脂シートを貼り付ける工程と、前記
突起電極を前記導電性材料に対向させて前記半導体素子
を前記回路基板に対し位置決めしたのちに、加熱状態下
において前記半導体素子を前記回路基板に近接する方向
に加圧して、前記樹脂シート内に埋入した前記突起電極
を前記導電性材料を介して前記基板電極部に接触させる
ことにより、前記回路基板と前記半導体素子とを接合、
封止する工程とを有している。In the method of manufacturing a semiconductor device according to a second aspect of the present invention, a step of attaching a conductive material to a position of the substrate electrode portion where the bump electrode is to be joined, and a step of attaching the conductive material to the circuit board. Attaching a resin sheet for sealing a gap between the circuit board and the semiconductor element to a location where the semiconductor element is to be mounted, including a location, and providing the semiconductor with the bump electrode facing the conductive material. After positioning the element with respect to the circuit board, the semiconductor element is pressed in a direction approaching the circuit board under a heating state, and the protruding electrode embedded in the resin sheet is interposed through the conductive material. The circuit board and the semiconductor element by contacting the substrate electrode portion with the
Sealing step.
【0011】この半導体装置の製造方法では、回路基板
に導電性材料を直接付着することによって、第1発明と
同様の作用効果を得ることができる。In this method of manufacturing a semiconductor device, the same effect as that of the first invention can be obtained by directly attaching the conductive material to the circuit board.
【0012】さらに、第3の発明の半導体装置の製造方
法は、前記回路基板と半導体素子との間隙を封止するた
めの樹脂シートにおける所定位置に導電性材料を付着す
る工程と、前記樹脂シートを、前記導電性材料が前記突
起電極を接合すべき位置に対向するよう前記回路基板に
対し位置決めして、前記回路基板における前記半導体素
子を実装すべき箇所に貼着する工程と、前記突起電極を
前記導電性材料に対向させて前記半導体素子を回路基板
に対し位置決めしたのちに、加熱状態下において前記半
導体素子を前記回路基板に近接する方向に加圧して、前
記樹脂シート内に埋入した前記突起電極を、前記導電性
材料を介して前記基板電極部に接触させることにより、
前記半導体素子と前記回路基板とを接合、封止する工程
とを備えている。Further, in the method of manufacturing a semiconductor device according to a third aspect of the present invention, there is provided a method of adhering a conductive material to a predetermined position in a resin sheet for sealing a gap between the circuit board and the semiconductor element; Positioning the conductive material with respect to the circuit board so as to face a position where the bump electrode is to be joined, and attaching the bump to a location on the circuit board where the semiconductor element is to be mounted; and After positioning the semiconductor element with respect to the circuit board by facing the conductive material, the semiconductor element was pressed in a direction approaching the circuit board under a heating state, and embedded in the resin sheet. By making the protruding electrode contact the substrate electrode portion via the conductive material,
Bonding and sealing the semiconductor element and the circuit board.
【0013】この半導体装置の製造方法においても、樹
脂シートに予め導電性材料を付着することによって、第
1発明と同様の作用効果を得ることができる。Also in this method of manufacturing a semiconductor device, the same effect as that of the first invention can be obtained by attaching a conductive material to the resin sheet in advance.
【0014】各発明において、導電性材料として、はん
だ金属または導電フィラーを含有する接着剤を用いるこ
とにより、前記突起電極と前記基板電極部との接合を強
固なものとすることができる。In each aspect of the invention, by using an adhesive containing a solder metal or a conductive filler as the conductive material, the bonding between the protruding electrode and the substrate electrode portion can be strengthened.
【0015】また、各発明における樹脂シートとして、
半導体素子の熱膨張係数よりも大きく、且つ回路基板の
熱膨張係数よりも小さな熱膨張係数を有するものを用い
ることが好ましい。これにより、半導体素子と回路基板
との熱膨張係数の差による熱ストレスに起因して樹脂シ
ートに加わろうとする熱膨張による応力を緩和すること
ができる。そのため、導電性材料を介在しての半導体素
子の突起電極と基板電極部との接合に高い信頼性を得る
ことができる。Further, as the resin sheet in each invention,
It is preferable to use a semiconductor element having a thermal expansion coefficient larger than that of the semiconductor element and smaller than that of the circuit board. Thereby, the stress due to the thermal expansion that tends to be applied to the resin sheet due to the thermal stress due to the difference in the thermal expansion coefficient between the semiconductor element and the circuit board can be reduced. Therefore, high reliability can be obtained in joining the protruding electrode of the semiconductor element and the substrate electrode portion through the conductive material.
【0016】さらに、各発明の樹脂シートとして、半導
体素子との対面側部位から回路基板との対面側部位に向
けて徐々に大きくなるよう変化する熱膨張係数を有する
ものを用いれば、より好ましい。これにより、半導体素
子と回路基板との熱膨張係数の差による熱ストレスに起
因して導電性材料に加わろうとする熱膨張による応力を
極めて効果的に緩和することができるから、半導体素子
の突起電極と基板電極部との導電性材料を介しての接合
により一層高い信頼性を得ることができる。Further, it is more preferable that the resin sheet of each invention has a coefficient of thermal expansion that gradually increases from a portion facing the semiconductor element to a portion facing the circuit board. This makes it possible to extremely effectively reduce the stress due to thermal expansion that is applied to the conductive material due to the thermal stress caused by the difference in the thermal expansion coefficient between the semiconductor element and the circuit board. A higher reliability can be obtained by bonding between the substrate and the substrate electrode portion via a conductive material.
【0017】[0017]
【発明の実施の形態】以下、本発明の好ましい実施の形
態について図面を参照しながら説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the drawings.
【0018】図1は本発明の第1の実施の形態に係る半
導体装置の製造方法を工程順に示した概略縦断面図であ
り、図4と同一若しくは同等のものには同一の符号を付
してその説明を省略する。この実施の形態では、同図
(a)に示すように、導電性粒子を含まない単なる樹脂
シート13を設けて、この樹脂シート13を、2点鎖線
で示すように、回路基板3における半導体素子7を実装
すべき箇所に貼り付ける。この樹脂シート13は、熱硬
化性樹脂、例えばエポキシ系樹脂を用いたものが適して
おり、半導体素子7に設ける2段形状の突起電極9の高
さよりも僅かに大きい厚み、すなわち50〜100μm
の厚みに形成されている。FIG. 1 is a schematic vertical sectional view showing a method of manufacturing a semiconductor device according to a first embodiment of the present invention in the order of steps, and the same or equivalent parts as those in FIG. The description is omitted. In this embodiment, as shown in FIG. 1A, a simple resin sheet 13 containing no conductive particles is provided, and the resin sheet 13 is connected to a semiconductor element on the circuit board 3 as shown by a two-dot chain line. 7 is attached to a place to be mounted. The resin sheet 13 is preferably made of a thermosetting resin, for example, an epoxy resin, and has a thickness slightly larger than the height of the two-step projection electrode 9 provided on the semiconductor element 7, that is, 50 to 100 μm.
The thickness is formed.
【0019】つぎに、同図(b)に示すように、樹脂シ
ート13上における所定の各位置には、導電性材料14
をスクリーン印刷法により同時に、またはディスペンス
法により個々に供給する。ここで、樹脂シート13の所
定の位置は、半導体素子7の各突起電極9を回路基板3
の対応する基板電極部4にそれぞれ接触させるために対
向させる位置である。また、導電性材料14としては、
この実施の形態では金または銀あるいは銀−パラジウム
合金などの導電性金属材料の微粉末を導電フィラーとし
て、この導電フィラーを熱硬化性樹脂、例えばエポキシ
系樹脂と溶剤とを混合してなる導電性接着剤を用いる。
なお、導電性材料14としては錫−鉛系などのはんだ金
属を使用することもでき、はんだ金属の場合にはディス
ペンス法により各所定位置に個々に供給して付着させ
る。Next, as shown in FIG. 1B, a predetermined position on the resin sheet 13 is
Are simultaneously supplied by a screen printing method or individually supplied by a dispensing method. Here, the predetermined position of the resin sheet 13 is such that each protruding electrode 9 of the semiconductor element 7 is
Are positions to be opposed to each other to make contact with the corresponding substrate electrode portions 4. Further, as the conductive material 14,
In this embodiment, fine powder of a conductive metal material such as gold or silver or a silver-palladium alloy is used as a conductive filler, and the conductive filler is formed by mixing a thermosetting resin, for example, an epoxy resin and a solvent. Use an adhesive.
In addition, a solder metal such as tin-lead can be used as the conductive material 14. In the case of a solder metal, it is individually supplied to and adhered to each predetermined position by a dispensing method.
【0020】続いて、同図(c)に示すように、ヘッド
ヒータ11を内蔵した実装ヘッド10は、ボールボンデ
ィング工法またはめっき法などにより素子電極部8上に
2段形状の突起電極9が予め形成された半導体ベアチッ
プからなる半導体素子7を吸着する。ここで、半導体素
子7は,その突起電極9の非形成面に実装ヘッド10の
吸着面が押し付けられるとともに、真空ポンプなどの空
気吸引力が実装ヘッド10の空気吸引通路12を介して
作用することにより、実装ヘッド10に吸着されてい
る。このように半導体素子7を吸着した実装ヘッド10
は、素子電極部8つまり突起電極9が導電性材料14に
正確に対向するように半導体素子7を回路基板3に対し
位置決めしたのちに、加熱状態下においてその位置決め
状態を保持したまま下降して、半導体素子7を回路基板
3に対し加圧する。Subsequently, as shown in FIG. 1C, the mounting head 10 having the built-in head heater 11 has a two-stage projecting electrode 9 previously formed on the element electrode portion 8 by a ball bonding method or a plating method. The semiconductor element 7 composed of the formed semiconductor bare chip is sucked. Here, in the semiconductor element 7, the suction surface of the mounting head 10 is pressed against the surface on which the protruding electrodes 9 are not formed, and the air suction force of a vacuum pump or the like acts via the air suction passage 12 of the mounting head 10. Thus, it is attracted to the mounting head 10. The mounting head 10 having the semiconductor element 7 attracted as described above.
After positioning the semiconductor element 7 with respect to the circuit board 3 so that the element electrode portion 8, that is, the protruding electrode 9 accurately faces the conductive material 14, the semiconductor element 7 is moved down while maintaining the positioning state under the heating state. Then, the semiconductor element 7 is pressed against the circuit board 3.
【0021】それにより、突起電極9は、同図(d)に
示すように、対応する導電性材料14をそれぞれ押し下
げながら樹脂シート13中に埋入していき、この樹脂シ
ート13を突き破るようにして導電性材料14を介し基
板電極部4に電気的接続状態に接触する。なお、実装ヘ
ッド10は、ヘッドヒータ11による加熱温度が200
℃に昇温するよう制御する。それにより、樹脂シート1
3は、ヘッドヒータ11の発生熱を素子電極部8および
突起電極9を通じて伝熱されることにより溶融し、且つ
半導体素子7を介して加圧されることにより、突起電極
9の高さよりも僅かに大きな厚みを有していることから
回路基板3と半導体素子7との間隙を隙間無く埋めつく
すように変形する。また導電性材料14および樹脂シー
ト13は、溶融硬化することによって突起電極9と基板
電極部4との接合状態を強固なものとするとともに、半
導体素子7と回路基板3とを互いに強固に接合する。As a result, the protruding electrodes 9 are buried in the resin sheet 13 while pressing down the corresponding conductive materials 14 as shown in FIG. Then, the substrate electrode portion 4 is electrically connected to the substrate electrode portion 4 via the conductive material 14. The mounting head 10 has a heating temperature of 200 head heaters 11.
Control so as to raise the temperature to ° C. Thereby, the resin sheet 1
3 is melted by transferring the heat generated by the head heater 11 through the element electrode portion 8 and the projecting electrode 9, and is slightly pressurized through the semiconductor element 7 to be slightly lower than the height of the projecting electrode 9. Since it has a large thickness, it is deformed so as to completely fill the gap between the circuit board 3 and the semiconductor element 7. The conductive material 14 and the resin sheet 13 are melted and hardened to strengthen the bonding state between the protruding electrodes 9 and the substrate electrode portions 4, and firmly bond the semiconductor element 7 and the circuit board 3 to each other. .
【0022】一方、はんだ金属を導電性材料14として
用いた場合には、この導電性材料14がヘッドヒータ1
1の発生熱で加熱されて溶融硬化することによって突起
電極9と基板電極部4とを電気的かつ機械的に強固に接
続するとともに、導電性材料14が溶融硬化することに
よって突起電極9と基板電極部4とを強固に接合する。On the other hand, when a solder metal is used as the conductive material 14, the conductive material 14
1. The protruding electrode 9 and the substrate electrode portion 4 are electrically and mechanically firmly connected by being heated and melt-hardened by the generated heat, and the protruding electrode 9 and the substrate are hardened by the electro-conductive material 14 being melt-hardened. The electrode part 4 is firmly joined.
【0023】図2は本発明の第2の実施の形態に係る半
導体装置の製造方法を工程順に示した概略縦断面図を示
し、この実施の形態では、第1の実施の形態に対しそれ
らの工程のうちの一部の順次が異なるのみである。すな
わち、同図(a)に示すように、回路基板3の各基板電
極部4における突起電極9を接合すべき箇所に、導電性
材料14をスクリーン印刷法により同時に、またはディ
スペンス法により個々に供給する。つぎに、ヘッドヒー
タ11を内蔵した実装ヘッド10は、素子電極部8上に
突起電極9が予め形成された半導体ベアチップからなる
半導体素子7を吸着して、素子電極部8つまり突起電極
9が導電性材料14に正確に対向するように半導体素子
7を回路基板3に対し位置決めしたのちに、その位置決
め状態を保持したまま下降して、半導体素子7を回路基
板3に対し加圧する。それにより、突起電極9は、同図
(d)に示すように、対応する導電性材料14を押し下
げながら樹脂シート13中に埋入していき、この樹脂シ
ート13を突き破るようにして導電性材料14を介し基
板電極部4に電気的接続状態に接触する。FIG. 2 is a schematic longitudinal sectional view showing a method of manufacturing a semiconductor device according to a second embodiment of the present invention in the order of steps. In this embodiment, the method is different from that of the first embodiment. Only the sequence of some of the steps is different. That is, as shown in FIG. 3A, the conductive material 14 is simultaneously supplied to the portion of each circuit board electrode portion 4 of the circuit board 3 to which the protruding electrode 9 is to be joined by the screen printing method or individually by the dispensing method. I do. Next, the mounting head 10 having the built-in head heater 11 attracts the semiconductor element 7 composed of a semiconductor bare chip having the projection electrode 9 formed on the element electrode section 8 in advance, and the element electrode section 8, that is, the projection electrode 9 becomes conductive. After the semiconductor element 7 is positioned with respect to the circuit board 3 so as to accurately face the conductive material 14, the semiconductor element 7 is lowered while maintaining the positioning state, and the semiconductor element 7 is pressed against the circuit board 3. As a result, the protruding electrodes 9 are embedded in the resin sheet 13 while pushing down the corresponding conductive material 14 as shown in FIG. The substrate 14 is in electrical contact with the substrate electrode portion 4 via the line 14.
【0024】このとき、この実施の形態では、実装ヘッ
ド10がヘッドヒータ11を駆動して200℃の加熱温
度まで昇温させている。そのため、樹脂シート13は、
ヘッドヒータ11の発生熱を素子電極部8および突起電
極9を通じて伝熱されることにより溶融するので、突起
電極9は、溶融した樹脂シート13内にスムーズに埋入
していき、同図(d)に示すように、対応する導電性材
料14を介し基板電極部4に電気的接続状態に接触す
る。At this time, in this embodiment, the mounting head 10 drives the head heater 11 to raise the temperature to a heating temperature of 200 ° C. Therefore, the resin sheet 13
Since the heat generated by the head heater 11 is melted by being transferred through the element electrode portion 8 and the protruding electrode 9, the protruding electrode 9 is smoothly embedded in the melted resin sheet 13. As shown in (1), the substrate electrode portion 4 is electrically connected to the substrate electrode portion 4 via the corresponding conductive material 14.
【0025】なお、樹脂シート13は、第1の実施の形
態と同様に、半導体素子7を介して加圧および加熱され
て、回路基板3と半導体素子7との間隙を隙間無く埋め
つくすように変形したのちに硬化し、突起電極9と基板
電極部4との導電性材料14を介在しての接合部を内部
に封入して、その接合状態を強固に保持するとともに、
半導体素子7と回路基板3とを互いに強固に接合する。As in the first embodiment, the resin sheet 13 is pressed and heated via the semiconductor element 7 so as to fill the gap between the circuit board 3 and the semiconductor element 7 without any gap. After being deformed, it hardens, and the joint between the protruding electrode 9 and the substrate electrode portion 4 with the conductive material 14 interposed therebetween is sealed therein, and the joined state is firmly maintained.
The semiconductor element 7 and the circuit board 3 are firmly joined to each other.
【0026】図3は本発明の第3の実施の形態に係る半
導体装置の製造方法を工程順に示した概略縦断面図を示
し、この実施の形態では、第1の実施の形態に対しその
工程の一部の順序が異なるのみである。すなわち、同図
(a)に示すように、樹脂シート13の一面には、回路
基板3への貼着に先立って、突起電極9と基板電極部4
との接合箇所にそれぞれ対応する部位に導電性材料14
をスクリーン印刷法により同時に、またはディスペンス
法により個々に供給しておく。このように、導電性材料
14を予め付着した樹脂シート13は、同図(b)に示
すように、導電性材料14を上方に位置させた状態で、
その導電性材料14が基板電極部4における突起電極9
の接合箇所に対応するよう位置決めして、回路基板3上
に貼り付ける。そののちは、同図(c)および同図
(d)に示すように、第1の実施の形態と同様の工程を
経て半導体素子7を回路基板3に実装して半導体装置1
7を製造する。すなわち、同図(c),(d)は図1
(c),(d)と同一工程である。FIG. 3 is a schematic vertical sectional view showing a method of manufacturing a semiconductor device according to a third embodiment of the present invention in the order of steps. In this embodiment, the steps are different from those of the first embodiment. Only the order of some of them is different. That is, as shown in FIG. 2A, the protruding electrode 9 and the substrate electrode portion 4 are provided on one surface of the resin sheet 13 before being attached to the circuit board 3.
The conductive material 14
Are simultaneously supplied by a screen printing method or individually supplied by a dispensing method. In this way, the resin sheet 13 to which the conductive material 14 has been previously attached is placed in a state where the conductive material 14 is positioned upward as shown in FIG.
The conductive material 14 serves as the protruding electrode 9 in the substrate electrode portion 4.
And bonded to the circuit board 3. After that, as shown in FIGS. 3C and 3D, the semiconductor device 7 is mounted on the circuit board 3 through the same steps as in the first embodiment, and
7 is manufactured. That is, FIGS. 1C and 1D show FIGS.
This is the same step as (c) and (d).
【0027】したがって、この製造方法により得られた
半導体装置17は第1の実施の形態と全く同じ効果を得
られる。それに加えて、この製造方法では、導電性材料
を予め付着させた樹脂シートを回路基板に貼着するの
で、工程を簡略化できる利点がある。Therefore, the semiconductor device 17 obtained by this manufacturing method can obtain exactly the same effects as in the first embodiment. In addition, this manufacturing method has an advantage that the process can be simplified because the resin sheet to which the conductive material is previously attached is attached to the circuit board.
【0028】一方、図3(a)に示すように導電性材料
14を予め一面に付着した樹脂シート13を、同図
(b)とは逆に導電性材料14が下方に位置する配置と
して、その導電性材料14が基板電極部4における突起
電極9の接合箇所に対応するよう位置決めして、回路基
板3上に貼り付けるようにしてもよい。そののちは、図
2(c),(d)に示すように、第2の実施の形態と同
様の工程を経て半導体素子7を回路基板3に実装して半
導体装置17を製造する。この製造方法により得られた
半導体装置17は第2の実施の形態と全く同様の効果を
得られる。On the other hand, as shown in FIG. 3A, a resin sheet 13 on which a conductive material 14 is previously adhered to one surface is arranged in such a manner that the conductive material 14 is located on the lower side as shown in FIG. 3B. The conductive material 14 may be positioned so as to correspond to the joint portion of the protruding electrode 9 in the substrate electrode portion 4, and may be attached to the circuit board 3. After that, as shown in FIGS. 2C and 2D, the semiconductor device 7 is mounted on the circuit board 3 through the same steps as in the second embodiment to manufacture the semiconductor device 17. The semiconductor device 17 obtained by this manufacturing method can obtain exactly the same effects as in the second embodiment.
【0029】また、上述の第1ないし第3の各実施の形
態において、樹脂シート13の熱膨張係数は、半導体素
子7の熱膨張係数よりも大きく、且つ回路基板3の熱膨
張係数よりも小さく設定されている。具体的には、一般
的な半導体素子7の熱膨張係数が3ppm /K、回路基板
3の熱膨張係数がセラミック基板の場合に6ppm /K
で、樹脂基板の場合に14ppm /Kであるから、樹脂シ
ート13の熱膨張係数は3ppm /K〜6ppm /Kの間の
値、または3ppm /K〜14ppm /Kの間に設定する。In each of the first to third embodiments, the coefficient of thermal expansion of the resin sheet 13 is larger than the coefficient of thermal expansion of the semiconductor element 7 and smaller than the coefficient of thermal expansion of the circuit board 3. Is set. Specifically, when the thermal expansion coefficient of a general semiconductor element 7 is 3 ppm / K, and the thermal expansion coefficient of the circuit board 3 is a ceramic substrate, it is 6 ppm / K.
Since the resin substrate is 14 ppm / K, the coefficient of thermal expansion of the resin sheet 13 is set at a value between 3 ppm / K and 6 ppm / K, or between 3 ppm / K and 14 ppm / K.
【0030】これにより、半導体素子7と回路基板3と
の熱膨張係数の差による熱ストレスに起因して樹脂シー
ト13に加わろうとする熱膨張による応力を緩和するこ
とができる。そのため、導電性材料14を介在しての半
導体素子7の突起電極9と基板電極部4との接合に高い
信頼性を得ることができる。As a result, the stress due to the thermal expansion applied to the resin sheet 13 due to the thermal stress due to the difference in the thermal expansion coefficient between the semiconductor element 7 and the circuit board 3 can be reduced. Therefore, high reliability can be obtained in joining the protruding electrode 9 of the semiconductor element 7 and the substrate electrode portion 4 with the conductive material 14 interposed therebetween.
【0031】一方、上述の第1ないし第3の各実施の形
態において、樹脂シート13の熱膨張係数は、半導体素
子7との対面側から回路基板3との対面側に向けて徐々
に大きくなる状態に変化するよう設定することもでき
る。この場合の樹脂シート13の熱膨張係数の設定に際
しては、特に半導体素子7および回路基板3に各々固有
の熱膨張係数に制約を受けることはないが、好ましく
は、半導体素子7の熱膨張係数の3ppm /Kから回路基
板3の熱膨張係数の6ppm /Kまたは14ppm /Kまで
熱膨張係数が連続的に徐々に変化する樹脂シート13を
用いる。このような樹脂シート13を用いることによ
り、半導体素子7と回路基板3との熱膨張係数の差によ
る熱ストレスに起因して導電性材料14に加わろうとす
る熱膨張による応力を極めて効果的に緩和することがで
きるから、半導体素子7の突起電極9と基板電極部4と
を導電性材料14を介しての接合に一層高い信頼性を得
ることができる。On the other hand, in each of the above-described first to third embodiments, the coefficient of thermal expansion of the resin sheet 13 gradually increases from the side facing the semiconductor element 7 toward the side facing the circuit board 3. It can also be set to change to a state. In setting the coefficient of thermal expansion of the resin sheet 13 in this case, there is no particular restriction on the coefficient of thermal expansion specific to the semiconductor element 7 and the circuit board 3. A resin sheet 13 whose coefficient of thermal expansion gradually changes from 3 ppm / K to 6 ppm / K or 14 ppm / K of the coefficient of thermal expansion of the circuit board 3 is used. By using such a resin sheet 13, stress due to thermal expansion that is applied to the conductive material 14 due to thermal stress due to a difference in thermal expansion coefficient between the semiconductor element 7 and the circuit board 3 is extremely effectively reduced. Therefore, it is possible to obtain higher reliability in joining the protruding electrode 9 of the semiconductor element 7 and the substrate electrode portion 4 via the conductive material 14.
【0032】[0032]
【発明の効果】以上のように本発明の半導体装置の製造
方法によれば、複数の突起電極と基板電極部との各間
に、樹脂シートとは別個に設けた導電性材料を確実に一
定量ずつ介在させることができるので、突起電極と基板
電極部との接合部を確実に電気的接続できるとともに、
その接続抵抗値を一定値に安定できる。また、樹脂シー
トとは別個に設けた導電性材料を突起電極と基板電極部
4との間に介在させるので、半導体素子を回路基板に対
し正確な平行度に対向するよう調整する必要がなく、容
易に製造することができる。As described above, according to the method of manufacturing a semiconductor device of the present invention, the conductive material provided separately from the resin sheet between each of the plurality of protruding electrodes and the substrate electrode portion can be reliably fixed. Since it can be interposed by the amount, the junction between the protruding electrode and the substrate electrode can be reliably electrically connected,
The connection resistance value can be stabilized at a constant value. Further, since a conductive material provided separately from the resin sheet is interposed between the protruding electrode and the substrate electrode portion 4, there is no need to adjust the semiconductor element so as to face the circuit board with an accurate parallelism. It can be easily manufactured.
【図1】(a)〜(d)は本発明の第1の実施の形態に
係る半導体装置の製造方法の工程を順に示した概略縦断
面図。FIGS. 1A to 1D are schematic longitudinal sectional views sequentially showing steps of a method of manufacturing a semiconductor device according to a first embodiment of the present invention.
【図2】(a)〜(d)は本発明の第2の実施の形態に
係る半導体装置の製造方法の工程を順に示した概略縦断
面図。FIGS. 2A to 2D are schematic longitudinal sectional views sequentially showing steps of a method of manufacturing a semiconductor device according to a second embodiment of the present invention.
【図3】(a)〜(d)は本発明の第3の実施の形態に
係る半導体装置の製造方法の工程を順に示した概略縦断
面図。FIGS. 3A to 3D are schematic longitudinal sectional views sequentially showing steps of a method of manufacturing a semiconductor device according to a third embodiment of the present invention.
【図4】(a)〜(c)は従来の半導体装置の製造方法
の工程を順に示した概略縦断面図。4A to 4C are schematic longitudinal sectional views sequentially showing steps of a conventional method for manufacturing a semiconductor device.
3 回路基板 4 基板電極部 7 半導体素子 8 素子電極部 9 突起電極 13 樹脂シート 14 導電性材料 17 半導体装置 DESCRIPTION OF SYMBOLS 3 Circuit board 4 Substrate electrode part 7 Semiconductor element 8 Element electrode part 9 Protruding electrode 13 Resin sheet 14 Conductive material 17 Semiconductor device
Claims (7)
電極を回路基板の基板電極部に電気的接続状態に接合す
ることにより、前記半導体素子を前記回路基板に実装し
てなる半導体装置を製造する方法において、 前記回路基板における前記半導体素子を実装すべき箇所
に、前記回路基板と半導体素子との間隙を封止するため
の樹脂シートを貼り付ける工程と、 前記樹脂シートにおける前記突起電極を対向させる位置
に導電性材料を付着する工程と、 前記突起電極を前記導電性材料に対向させて前記半導体
素子を前記回路基板に対し位置決めしたのちに、加熱状
態下において前記半導体素子を前記回路基板に近接する
方向に加圧して、前記樹脂シート内に埋入した前記突起
電極を、これにより押圧される前記導電性材料を介して
前記基板電極部に接触させることにより、前記半導体素
子と前記回路基板とを接合封止する工程とを備えている
ことを特徴とする半導体装置の製造方法。1. A semiconductor device having the semiconductor element mounted on the circuit board by bonding a projecting electrode formed on an element electrode section of the semiconductor element to a substrate electrode section of a circuit board in an electrically connected state. In the method, a step of attaching a resin sheet for sealing a gap between the circuit board and the semiconductor element to a portion of the circuit board where the semiconductor element is to be mounted; and opposing the protruding electrodes in the resin sheet. A step of attaching a conductive material to a position to be made, and after positioning the semiconductor element with respect to the circuit board with the protruding electrode facing the conductive material, the semiconductor element is placed on the circuit board under a heated state. The protruding electrode buried in the resin sheet by pressing in a direction to approach the substrate electrode portion via the conductive material pressed thereby. A step of bonding and sealing the semiconductor element and the circuit board by contacting the semiconductor element with the semiconductor device.
電極を回路基板の基板電極部に電気的接続状態に接合す
ることにより、前記半導体素子を前記回路基板に実装し
てなる半導体装置を製造する方法において、 前記基板電極部における前記突起電極を接合すべき位置
に導電性材料を付着する工程と、 前記回路基板における前記導電性材料の付着箇所を含む
前記半導体素子を実装すべき箇所に、前記回路基板と半
導体素子との間隙を封止するための樹脂シートを貼り付
ける工程と、 前記突起電極を前記導電性材料に対向させて前記半導体
素子を前記回路基板に対し位置決めしたのちに、加熱状
態下において前記半導体素子を前記回路基板に近接する
方向に加圧して、前記樹脂シート内に埋入した前記突起
電極を前記導電性材料を介して前記基板電極部に接触さ
せることにより、前記回路基板と前記半導体素子とを接
合、封止する工程とを備えていることを特徴とする半導
体装置の製造方法。2. A semiconductor device having the semiconductor element mounted on the circuit board by bonding the protruding electrode formed on the element electrode section of the semiconductor element to the substrate electrode section of the circuit board in an electrically connected state. In the method, a step of attaching a conductive material to a position of the substrate electrode portion where the protruding electrode is to be joined, and a place where the semiconductor element is to be mounted including a place where the conductive material is attached on the circuit board. Affixing a resin sheet for sealing a gap between the circuit board and the semiconductor element; heating the semiconductor element with respect to the circuit board after positioning the semiconductor element with the protruding electrode facing the conductive material; Under the condition, the semiconductor element is pressed in a direction approaching the circuit board, and the protruding electrodes embedded in the resin sheet are connected to the base via the conductive material. A step of joining and sealing the circuit board and the semiconductor element by bringing the semiconductor element into contact with a plate electrode portion.
電極を回路基板の基板電極部に電気的接続状態に接合す
ることにより、前記半導体素子を前記回路基板に実装し
てなる半導体装置を製造する方法において、 前記回路基板と半導体素子との間隙を封止するための樹
脂シートにおける所定位置に導電性材料を付着する工程
と、 前記樹脂シートを、前記導電性材料が前記突起電極を接
合すべき位置に対向するよう前記回路基板に対し位置決
めして、前記回路基板における前記半導体素子を実装す
べき箇所に貼着する工程と、 前記突起電極を前記導電性材料に対向させて前記半導体
素子を回路基板に対し位置決めしたのちに、加熱状態下
において前記半導体素子を前記回路基板に近接する方向
に加圧して、前記樹脂シート内に埋入した前記突起電極
を、前記導電性材料を介して前記基板電極部に接触させ
ることにより、前記半導体素子と前記回路基板とを接
合、封止する工程とを備えていることを特徴とする半導
体装置の製造方法。3. A semiconductor device having the semiconductor element mounted on the circuit board by bonding the protruding electrode formed on the element electrode section of the semiconductor element to the substrate electrode section of the circuit board in an electrically connected state. In the method, a step of attaching a conductive material to a predetermined position in a resin sheet for sealing a gap between the circuit board and the semiconductor element; and bonding the resin sheet to the projecting electrode with the conductive material. Positioning the semiconductor element on the circuit board so as to face a position to be mounted, and attaching the semiconductor element on the circuit board at a place where the semiconductor element is to be mounted; and After positioning with respect to the circuit board, the semiconductor element is pressed in a direction approaching the circuit board under a heated state, and the protrusion embedded in the resin sheet is pressed. A method of manufacturing a semiconductor device, comprising: a step of joining and sealing the semiconductor element and the circuit board by bringing an electrode into contact with the substrate electrode portion via the conductive material. .
ないし請求項3の何れかに記載の半導体装置の製造方
法。4. The method according to claim 1, wherein the conductive material is a solder metal.
A method for manufacturing a semiconductor device according to claim 3.
着剤である請求項1ないし請求項3の何れかに記載の半
導体装置の製造方法。5. The method for manufacturing a semiconductor device according to claim 1, wherein the conductive material is an adhesive containing a conductive filler.
係数よりも大きく、且つ回路基板の熱膨張係数よりも小
さな熱膨張係数を有するものを用いた請求項1ないし請
求項5の何れかに記載の半導体装置の製造方法。6. The resin sheet according to claim 1, wherein the resin sheet has a larger coefficient of thermal expansion than a semiconductor element and a smaller coefficient of thermal expansion than a circuit board. Of manufacturing a semiconductor device.
側部位から回路基板との対面側部位に向けて徐々に大き
くなるよう変化する熱膨張係数を有するものを用いた請
求項1ないし請求項5の何れかに記載の半導体装置の製
造方法。7. A resin sheet having a coefficient of thermal expansion that gradually increases from a portion facing the semiconductor element to a portion facing the circuit board is used as the resin sheet. The method for manufacturing a semiconductor device according to any one of the above.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13560898A JP3914332B2 (en) | 1998-05-18 | 1998-05-18 | Manufacturing method of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP13560898A JP3914332B2 (en) | 1998-05-18 | 1998-05-18 | Manufacturing method of semiconductor device |
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Publication Number | Publication Date |
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JPH11330161A true JPH11330161A (en) | 1999-11-30 |
JP3914332B2 JP3914332B2 (en) | 2007-05-16 |
Family
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JP13560898A Expired - Fee Related JP3914332B2 (en) | 1998-05-18 | 1998-05-18 | Manufacturing method of semiconductor device |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006121042A (en) * | 2004-09-21 | 2006-05-11 | Seiko Instruments Inc | Manufacturing method of semiconductor device |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08250549A (en) * | 1995-03-13 | 1996-09-27 | Matsushita Electric Ind Co Ltd | Semiconductor device and manufacture thereof |
JPH0927516A (en) * | 1995-07-12 | 1997-01-28 | Nippondenso Co Ltd | Connection structure of electronic component |
JPH0936177A (en) * | 1995-07-17 | 1997-02-07 | Toshiba Corp | Semiconductor device and its manufacture |
JPH1012673A (en) * | 1996-06-27 | 1998-01-16 | Japan Synthetic Rubber Co Ltd | Sheet for mounting semiconductor element and semiconductor device |
JPH1056260A (en) * | 1996-08-08 | 1998-02-24 | Matsushita Electric Ind Co Ltd | Mounting method of electronic device having bump |
JPH11150150A (en) * | 1997-11-18 | 1999-06-02 | Sumitomo Bakelite Co Ltd | Board for semiconductor mounting and its manufacture and mounting method for semiconductor chip |
-
1998
- 1998-05-18 JP JP13560898A patent/JP3914332B2/en not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08250549A (en) * | 1995-03-13 | 1996-09-27 | Matsushita Electric Ind Co Ltd | Semiconductor device and manufacture thereof |
JPH0927516A (en) * | 1995-07-12 | 1997-01-28 | Nippondenso Co Ltd | Connection structure of electronic component |
JPH0936177A (en) * | 1995-07-17 | 1997-02-07 | Toshiba Corp | Semiconductor device and its manufacture |
JPH1012673A (en) * | 1996-06-27 | 1998-01-16 | Japan Synthetic Rubber Co Ltd | Sheet for mounting semiconductor element and semiconductor device |
JPH1056260A (en) * | 1996-08-08 | 1998-02-24 | Matsushita Electric Ind Co Ltd | Mounting method of electronic device having bump |
JPH11150150A (en) * | 1997-11-18 | 1999-06-02 | Sumitomo Bakelite Co Ltd | Board for semiconductor mounting and its manufacture and mounting method for semiconductor chip |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006121042A (en) * | 2004-09-21 | 2006-05-11 | Seiko Instruments Inc | Manufacturing method of semiconductor device |
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JP3914332B2 (en) | 2007-05-16 |
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