JPH11329937A - Lithography system - Google Patents

Abstract

PROBLEM TO BE SOLVED: To decrease the number of times for replacing reticle by increasing the reticle containing capacity of a small sized aligner. SOLUTION: A reticle library 36 is disposed in a library unit 30 and shared between aligners 40, 50. Since a reticle library is not required to be installed in the aligners 40, 50, size thereof can be reduced. Furthermore, total footprint can be reduced because the library unit 30 is shared between aligners 40, 50.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a lithography system for transferring a reticle case containing a reticle from or to an exposure apparatus for exposing a pattern formed on the reticle onto a substrate, and more particularly to a reticle. The present invention relates to a lithography system capable of quickly transporting a case.

[0002]

2. Description of the Related Art When a semiconductor element or a liquid crystal display element is manufactured by a photolithography process, a photosensitive agent is applied through a projection optical system to an image of a pattern formed on a mask or a reticle (hereinafter referred to as a reticle). An exposure apparatus for projecting and transferring an image onto a semiconductor wafer, a glass plate, or the like is used. For example, in manufacturing a semiconductor device, in order to form a large number of circuit patterns on the surface of a wafer, several to ten or more or more or more reticles are used to perform pattern exposure. Each reticle is generally housed and handled in a dedicated reticle case in order to prevent attachment of dust in the atmosphere, contamination due to direct contact with humans, or damage due to contact with surrounding members.

FIG. 6 is a schematic view showing the appearance of a conventional exposure apparatus installed in a clean room. The main body of the exposure apparatus is housed in a chamber 80 equipped with an air conditioner, and the inside of the chamber 80 is air-conditioned so that the environment such as temperature and cleanliness (cleanness) is constant. Chamber 8
A reticle insertion / removal door 81 and a wafer insertion / removal door 82 are provided on one side surface of the reference numeral 0. Inside the reticle insertion / removal door 81, a reticle library 83 for storing a reticle used in the exposure apparatus is arranged. The operator of the exposure apparatus takes out the reticle case containing the desired reticle from the reticle stocker in the clean room, opens the reticle insertion / removal door 81 of the chamber 80 of the exposure apparatus,
The reticle case containing the reticle is stored on the shelf of the reticle library 83. Also, reticle library 8
Take out the unnecessary reticle from 3 together with the case and return it to the reticle stocker.

At the time of exposure, an automatic reticle transport device (reticle loader) of the exposure apparatus main body takes out a required reticle from a reticle case mounted on the reticle library 83 and automatically transports the reticle to a reticle stage positioned above the projection optical system. I do. Similarly, a wafer coated with a photosensitive agent such as a photoresist is inserted into the chamber 80 of the exposure apparatus from the wafer insertion / extraction door 82, and the substrate stage positioned below the projection optical system by the automatic wafer transfer apparatus (wafer loader). Are transported one by one. The image of the pattern formed on the reticle is transferred to the wafer via the projection optical system.

[0005]

SUMMARY OF THE INVENTION For example, application-specific I
When manufacturing C (Application-specific IC: ASIC), it is necessary to switch a plurality of types of reticle patterns to different shot areas on one wafer for exposure. With the miniaturization and high integration of the pattern, the types of reticles required to manufacture one wafer are increasing, and the conventional reticle library cannot accommodate all at once. In addition, if the size of the reticle library is increased in response to the increase in the number of required reticles, the size of the exposure apparatus incorporating the reticle library increases.

SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems of the prior art, and has been made to reduce the size of an exposure apparatus, increase the capacity of accommodating a reticle library as a reticle storage means, and quickly mount a reticle case. It is an object to provide a lithography system that can be transported.

[0007]

Means for Solving the Problems To solve the above problems, the lithography system according to the present invention will be described with reference to FIGS. 2 and 5, each showing an embodiment of the present invention. A plurality of exposure apparatuses (40, 50) for exposing the pattern formed on the substrate (R) to the substrate (W);
A reticle storage means (30) for storing a reticle case (RC) outside of the exposure apparatus (40, 50), in which the reticle (R) is housed; the plurality of exposure apparatuses (40, 50); Transport means (4) for transporting the reticle case (RC) to / from a reticle storage means (30);
3, 53).

Further, in the lithography system according to the present invention, the reticle storage means (30) is disposed between the plurality of exposure apparatuses (40, 50). (40, 50) and the reticle storage means (30) can be arranged close to each other, and the transport path of the reticle case (RC) therebetween can be shortened. Further, in the lithography system according to claim 3, the transporting means (43, 53) is arranged so that the exposing device (4)
0, 50), it can also be used as a transport means for the reticle case (RC) inside the exposure apparatus (40, 50).

In a lithography system according to a fourth aspect of the present invention, the transport means (29) transfers the reticle (R) used in the first exposure apparatus (40a) of the plurality of exposure apparatuses to the first reticle (R). The reticle (R) is exchanged without exchanging the reticle (R) with the reticle storage means (30) because the reticle (R) is transferred to the second exposure apparatus (40b) different from the exposure apparatus of (1). Can increase the throughput.

In a lithography system according to a fifth aspect of the present invention, the transporting means (43) includes the exposure apparatus (40).
Since the reticle (R) to be used next to the reticle (R) used for the above exposure is transported, no reticle storage means is required in the exposure apparatus (40). 7. The lithography system according to claim 6, wherein said reticle storage means (30) temporarily stores reticle which is carried in / out by said transport means (43, 53) among said plurality of reticles. Since (33) is provided, the occurrence of waiting can be reduced even if the reticle storage means (30) is shared by a plurality of exposure apparatuses (40, 50).

[0011]

Embodiments of the present invention will be described below with reference to the drawings. First, an example of a reticle case for storing a reticle will be described with reference to FIG. FIG.
Shows an example of the reticle case RC, and shows a state where the upper lid of the reticle case is opened. This reticle case R
C, a U-shaped side member 2 is mounted on a metal bottom plate 1, and an upper cover 4 is pivotally supported on a back surface of the side member 2 via a hinge 3 so as to be freely opened and closed. The front lid 6 is pivotally supported via 5. The bottom plate 1 and the side member 2 are fixed with a conductive adhesive or a screw.

The side member 2 has a back portion 2c and a pair of reticle support portions 2a and 2 opposing each other so as to sandwich the back portion 2c at its end.
b is formed integrally, and a deep groove 2d is formed inside the reticle support 2a on the left side as viewed in FIG.
A protrusion 2f is formed at the center of the groove 2d, and a shallow step 2h to which the upper lid 4 is in close contact is formed so as to surround the groove 2d. A pair of long pin-shaped stoppers 9A and 12A are integrally implanted on the groove 2d inside the projection 2f, and a pair of short reticles for supporting the reticle inside the stoppers 9A and 12A. The support pins 10A and 11A are integrally implanted.

The right reticle supporting portion 2b also has a deep groove 2e, a convex portion 2g, and a shallow step portion 2i to which the upper cover 4 is in close contact with the left reticle supporting portion 2a, and a groove inside the convex portion 2g. 2e, stoppers 9B and 12
B and reticle support pins 10B and 11B are integrally implanted. However, only the stopper 9B is shown in FIG.

Further, guide portions 7A and 7B are provided integrally on outer surfaces of the reticle support portions 2a and 2b, respectively.
In a state where the upper lid 4 is in close contact with the step portions 2h and 2i of the side member 2, the pressing springs 8A and 8B are attached to the guide portions 7A and 7B.
B is inserted, the upper cover 4 is urged toward the side member 2 by the holding springs 8A and 8B, and the upper cover 4 is fixed to the side member 2.
The guide portions 7A and 7B are provided with a concave portion 24 to which a reticle case fixing pin (described later) for fixing the reticle case in a state where the reticle case is loaded in a reticle library for storing a plurality of reticles together with the case. Have been.

Bearing portions 13A and 14A are integrally implanted in a central portion on the left side of the bottom surface of the upper lid 4, and the reticle retainer 1 is rotatably provided between the bearing portions 13A and 14A.
5A is attached. The reticle holder 15A is
The long holding portion 15Aa and the small spring engaging portion 15Ab are integrally formed so as to be twisted by 90 °, and the spring engaging portion 17A and the spring engaging portion 15Ab implanted on the back side of the bottom surface of the upper lid 4 are combined. A spring hook 19 integrally connected to the inside of the front lid 6 by being connected by a tension coil spring 16A.
A and the spring engaging portion 15Ab to pull the coil spring 18A
Connect with.

Bearings 13B and 14B are integrally implanted on the right side of the bottom surface of the upper lid 4 symmetrically with the left side, and a reticle retainer 15B is rotatably mounted between the bearings 13A and 14A. ing. And the top lid 4
And a spring engaging portion of the reticle retainer 15B are connected by a tension coil spring 16B, and a spring hook portion 19B inside the front cover 6 and the spring engaging portion are connected by a tension coil spring 18B. I do. In this case, when the front lid 6 rotates in the θ2 direction about the hinge 5 and opens, the reticle retainers 15A and 15B rotate by the action of the tension coil springs 16A, 16B and 18A and 18B, and the retainers 15Aa and 15Ba move. It is almost parallel to the upper lid 4. On the other hand, when the front lid 4 is rotated in the θ2 direction about the hinge 5 and closed, the pressing portions 15 of the reticle presses 15A and 15B are closed.
Aa and 15Ba rotate in a direction perpendicular to the upper lid 4.
Therefore, the internal reticle can be fixed by the holding portions 15Aa and 15B.

FIG. 2 is a schematic explanatory view showing an embodiment of a lithography system according to the present invention. FIG.
FIG. 2 is a schematic top view of the main part. 2 and 3 show:
Only a reticle (reticle case) transfer system and an exposure system which are indispensable for the description of the present embodiment are shown, and a wafer transfer system, an air conditioning system for maintaining a predetermined environment in the chamber, and the like are omitted. In FIGS. 2 and 3, the vertical direction (the optical axis direction of the projection optical system of the exposure system) is defined as the Z direction, and the directions orthogonal to the Z direction are defined as the X direction and the Y direction.

An opening / closing door 32 that can be opened and closed via a hinge is provided on a side surface of the chamber 31 of the library device 30.
Is provided. Inside the opening / closing door 32 (−X direction), a reticle buffer 33 composed of upper and lower four stages for temporarily storing the reticle R while housed in the reticle case RC.
Is provided. The first stage, which is the uppermost stage, is a reticle case automatic transfer robot (hereinafter referred to as AGV = Auto Guide).
This is a buffer for receiving a reticle case RC from a vehicle 29 (shown in FIG. 8), identifying the reticle R received by a reticle case barcode reader (not shown), and passing it to a reticle library 36 described later. The second stage is a buffer for receiving the reticle case RC from the reticle library 36 and passing it to the AGV 29. The third stage is a buffer for transferring the reticle case RC between the reticle library 36 and the exposure apparatus 40. The fourth stage is a buffer for transferring the reticle case RC between the reticle library 36 and the exposure apparatus 50. (See Table 1)

[0019]

[Table 1]

Further inside the reticle buffer 33 (-X direction), an arm 3 for vacuum-sucking the reticle case RC.
5 is provided. Arm 35
Can move in the vertical direction as a whole (Z direction, ignoring the +/- sign in the moving direction below), can rotate in the XY plane and can expand and contract with respect to the rotation axis, The reticle case RC can be transferred to a reticle library 36 described later. Further on the inside of the robot 34 (−X direction), a reticle library 36 for storing a plurality of (for example, 13 or 15) reticles R while storing them in a reticle case RC is arranged on a base 37.

On both sides of the library device 30, two exposure devices 40 and 50 having a plane-symmetric configuration are arranged adjacent to the library device 30, respectively. Therefore, the exposure apparatus 40 will be described. The portion of the chamber 41 that contacts the library apparatus 30 is also used as the chamber 31 of the library apparatus 30, and the reticle buffer 3
An opening / closing door 42 (see FIG. 3) is provided at a position facing the opening 3. An arm 4 is provided inside the door 42 (Y direction).
4 is provided. Arm 44
Although not shown, has an arm portion 44A for transporting the reticle case RC and an arm portion 44B for transporting the reticle R alone.

The arm 44A carries the reticle case RC between the reticle buffer 33 and the reticle buffer 45. The arm 44B transports the reticle R between the reticle buffer 45 and a CX carrier 46 described later.
Beside the robot 43 (-X direction), the upper and lower sides for temporarily storing the reticle R while keeping the reticle R in the reticle case RC.
A reticle buffer 45 composed of steps is provided. The reticle buffer 45 is a buffer for receiving the reticle case RC transported from the reticle buffer 33.

A CX carrier 46 is provided further on the far side (Y direction) of the robot 43, and a mechanism (not shown) for sandwiching the reticle R from two directions with four sides as a reference is provided. In addition, a vacuum suction hole is provided at a lower portion of the reticle R, and the reticle R is held and released. The CX carrier 46 carries the reticle R between the arm 44 and a load arm 48 and an unload arm 49 described later.

CX carrier 46 and reticle stage RS
The transfer of the reticle R is performed by the load arm 48 and the unload arm 49. The load arm 48 and the unload arm 49 are movable in the Y and Z directions. The load arm 48 and the unload arm 49 are individually movable in the Y direction between the CX carrier 46 and the reticle stage RS, and are integrally moved in the Z direction. The load arm 48 and the unload arm 49 are provided with a vacuum suction hole for holding the reticle R, similarly to the CX carrier 46. The vacuum suction and hold of the reticle R and release of the reticle R by turning on and off the vacuum are provided. Is possible.

In the chamber 41, an exposure system is formed, and a reticle R held on a reticle stage RS is provided.
An illumination optical system (not shown) for illuminating the wafer with exposure light, a substrate stage ST on which the wafer W is mounted and movable in the X and Y directions, and a pattern image of a reticle R held on a reticle stage RS is projected onto the wafer W. An exposure system including a projection optical system PL and the like is provided. Next, the reticle transport operation of the lithography system configured as described above will be described in detail.

The reticle R is a reticle stocker (not shown).
It is stored barely in hundreds of reticle storage shelves. When the empty reticle case is delivered from the AGV 29 to the reticle stocker, the delivered reticle case is set on the reticle storage shelf, and one reticle to be used in the reticle storage shelf is taken out by the automatic transport mechanism in the reticle stocker. Are automatically stored in an empty reticle case and returned to the AGV 29 again.

The AGV 29, which has received the reticle case RC containing the desired reticle R from the reticle stocker, communicates with the host computer by radio or optical communication, and transfers the reticle case RC based on a command from the host computer. The vehicle travels to the front of the library device 30 to be stopped. On the library device 30 side, the opening and closing door 32 of the chamber 31 is controlled by a command from a computer that controls the library device 30 based on a command from the host computer.
Open. The AGV 29 communicates with the control computer of the library device 30 by optical communication or the like, transfers the reticle case RC conveyed from the reticle stocker to the first stage of the reticle buffer 33 while keeping timing with each other, and temporarily stores the reticle case RC. Will be kept in a safe place.
In the first stage of the reticle buffer 33, the reticle case RC is identified by the reticle case barcode reader and pulled out by the arm 35 of the robot 34,
The temperature of the robot 34 is 180 ° C. (hereinafter, rotation is clockwise)
The reticle case RC is rotated and moved in the Z direction, and the reticle case RC is stored in a predetermined stage of the reticle library 36.

At this time, since there is a reticle buffer 33,
Immediately after the robot 34 has pulled out the reticle case RC from the first stage of the reticle buffer 33, the AGV 29 can insert the next reticle case RC into the first stage of the reticle buffer 33. Thus, the reticle cases RC can be transported to the reticle library 36 one after another.

The reticle case RC stored in the reticle library 36 is pulled out by the arm 35 of the robot 34, and the robot 34 moves in the Z direction and
After rotating by 0 ° C., the reticle case RC is inserted into the third stage of the reticle buffer 33, temporarily stored, and then pulled out by the arm portion 44A of the arm 44, and the robot 44 moves in the Z direction. Rotate 90 ° C,
Reticle case RC is inserted into the first stage of reticle buffer 45. Next, the reticle R stored in the reticle case RC is pulled out by the arm portion 44B of the arm 44, and the robot 43 moves in the Z direction, rotates at 90 ° C., and conveys the reticle R to the CX carrier 46.
Here, the reticle R is pre-aligned. Next, the CX carrier 46 attaches the reticle R to the load arm 48.
Hand over.

When replacing the reticle R on the reticle stage RS, first, the unload arm 49
The reticle R on the reticle stage RS is unloaded, and then the reticle R is loaded on the reticle stage RS by the load arm 48, and the unload arm 4
9 is placed on the CX carrier 46.

The reticle R used on the CX carrier 46 is a reticle case RC inserted into the first stage of the reticle buffer 45 by the arm 44B of the arm 44.
Transported to During this time, the robot 34 inserts the reticle case RC in which the reticle R to be used next is stored into the third stage of the reticle buffer 33, so that the robot 43 inserts the used reticle case RC into the first stage of the reticle buffer 45. Immediately after returning to the step, the reticle case RC to be used next can be pulled out from the third step of the reticle buffer 33. Then, the robot 43 moves in the Z direction and rotates at -90 ° C.
A pulls out a reticle case RC to be used next from the third stage of the reticle buffer 33, and
To the second stage. Next, the robot 43 moves in the Z direction, and the arm portion 44A of the arm 44 moves the used reticle case RC temporarily stored in the first stage of the reticle buffer 45 to the third stage of the reticle buffer 33. Transport, arm 35 of robot 34, reticle case R
C is transported to a predetermined stage of the reticle library 36.

To return the reticle case RC stored in the reticle library 36 to the reticle stocker, the reticle library 3 is moved by the arm 35 of the robot 34.
6, the reticle case RC stored at a predetermined level in the reticle case 6 is pulled out, the robot 34 moves in the Z direction and rotates 180 ° C., and the reticle case RC
And temporarily stored in the second stage of the AGV.
It is pulled out by 29 and returned to the reticle stocker.

Further, a different reticle case RC is used.
May be loaded or unloaded without passing through the reticle library 36. That is, A
The reticle case RC conveyed by the GV 29 is received by the first stage of the reticle buffer 33 and temporarily stored. The reticle case RC is identified by the reticle case barcode reader, pulled out by the arm 44 of the robot 43, and pulled out by the robot 43. Moves in the Z direction and reaches 90 ° C
Rotate the reticle case RC to the reticle buffer 4
5, is temporarily stored, and the rest is the same as when it is transported from the reticle library 36.

The above is the description of the library device 30 and the exposure device 40
This is an explanation of the operation of exchanging the reticle case RC between the exposure apparatus 50 and the exposure apparatus 50. The exposure apparatus 50 has a plane-symmetric configuration with the exposure apparatus 40 and is essentially the same.
The exchange of the reticle case RC between 0 and the exposure apparatus 50 is performed by the same operation.

Accordingly, the reticle case RC stored in the library device 30 can be commonly used by the exposure devices 40 and 50, and there is no need to provide a reticle library in the exposure devices 40 and 50. 40 and 50 can be small. Also, a reticle case R used in both the exposure apparatuses 40 and 50
Since C only needs to be transported to the library device 30 once, the amount of transportation by the AGV 29 can be reduced, the amount of communication can be reduced, and the throughput can be improved. Further, since the library device 30 is shared by the two exposure devices 40 and 50, the footprint (floor area) can be reduced as a whole.

The above is a case where the exposure apparatuses 40 and 50 have a plane-symmetric configuration. FIG. 4 shows a schematic top view of another embodiment of the present invention. An exposure apparatus 50 'having exactly the same configuration may be arranged adjacent to the library apparatus 30'. In this case, the library device 30 ′ is installed inside the opening / closing door 32 ′ as a two-stage reticle buffer 33 ′ of the first stage and the second stage among the four stages of the reticle buffer 33,
The third stage is provided as a one-stage reticle buffer 38 ′ so as to face the opening / closing door 42 between the exposure apparatus 40 and the reticle buffer 38 ′.
The fourth stage is provided as a one-stage reticle buffer 39 ', which is installed opposite to the opening / closing door 52' between the exposure apparatus 50 'and an arm 35 which can protrude from these reticle buffers 33', 38 ', 39'. The robot 34 'having a reticle buffer 33', 38 ', 39' is installed at the center position of these reticle buffers 33 ', 38', 39 ', and a reticle library 36' having the same configuration as the reticle library 36 is installed behind the robot 34 '. Is what you do.

As described in the operation of reticle buffer 33, reticle buffer 33 'is for exchanging reticle case RC between reticle library 36' and AGV 29.
8 ′ is for exchanging a reticle case RC between the reticle library 36 ′ and the exposure apparatus 40, and the reticle buffer 39 ′ is for the reticle library 3
This is for exchanging the reticle case RC between 6 ′ and the exposure apparatus 50 ′. With such a configuration, the same configuration can be adopted as the exposure apparatuses 40 and 50 '.

FIG. 5 is a schematic top view of another embodiment of the present invention. In the present embodiment, C / D (71a-7)
1f) (that is, a coater for applying a photosensitive agent such as a photoresist to the wafer W, and a developer for developing the wafer W exposed by the exposure devices 40a to 40f) and the exposure devices 40a to 40f in racks 70a to 70f. A plurality of these units are installed in a so-called in-line configuration, and a common library device 30 is installed in these units.
The reticle case RC is transported by the GV 29. Also in this case, there is no need to install a reticle library in the exposure apparatuses 40a to 40f, so that the exposure apparatuses 40a to 40f can be downsized.

In the above description, it has been described that the AGV that transports the reticle case containing the reticle between the reticle stocker and the library device in the clean room transfers the reticle case from the front of the library device. However, the transfer of the reticle case between the AGV and the library device is not necessarily performed at the front of the library device, and the transfer of the reticle case may be performed from the side surface or the back surface of the library device.

The AGV of the example described here is of a type that runs on the floor of a clean room. However, the AGV that can be used in the present invention is not limited to the type that travels on the floor. For example, a trajectory may be laid above the reticle stocker and the library device, and a carrier for transporting the reticle case may be transferred along the trajectory by a motor or a linear motor system. In this case, an opening / closing door provided on the reticle stocker or the library device for exchanging the reticle case with the AGV may be provided on the upper surface of the reticle stocker or the library device. Alternatively, a track may be laid under the floor on which the reticle stocker and the library device are installed, and the carrier for transporting the reticle case may be transferred along the track. In this case, an opening / closing door for exchanging the reticle case may be provided on the lower surface of the reticle stocker and the library device.

The above description has been given of the case where the reticle case RC is automatically transported from the reticle stocker to the library device without any manual operation. However, the operation can be performed manually if necessary. CRT on front of library unit
(Not shown) for monitoring, opening and closing the door, and loading or unloading the reticle case RC by the operator to a predetermined position of the reticle buffer, or a predetermined position of the reticle library from the side or back of the library device. It can also be carried in or out directly to

As the reticle buffer, an example of the reticle buffer 33 having a four-stage configuration, the reticle buffers 45, 55, 33 'having a two-stage configuration, and the reticle buffers 38' and 39 'having a one-stage configuration has been described. The number of each stage can be increased or decreased as needed. If there is enough time, there is no need to provide a reticle buffer. Also, a case has been described where there is one reticle library in the library device, but the number is not limited to one and may be any number such as 2, 3, and 4.

[0043]

According to the present invention, since the reticle storage means is shared by a plurality of exposure apparatuses, there is no need to provide a reticle storage means in the exposure apparatus, and the size of the exposure apparatus can be reduced. Further, since the reticle case used in the plurality of exposure apparatuses only needs to be transported once to the reticle storage means, the amount of transportation by the AGV can be reduced, the amount of communication can be reduced, and the throughput can be improved. Further, since the reticle storage means is shared by a plurality of exposure apparatuses, the footprint (floor area) can be reduced as a whole.

[Brief description of the drawings]

FIG. 1 is a diagram illustrating an example of a reticle case, and is a perspective view illustrating a state where an upper lid of a reticle case is opened.

FIG. 2 is a schematic explanatory view showing one embodiment of the present invention.

FIG. 3 is a schematic top view of a main part of one embodiment of the present invention.

FIG. 4 is a schematic top view of a main part according to another embodiment of the present invention.

FIG. 5 is a schematic top view of a main part of still another embodiment of the present invention.

FIG. 6 is a schematic view showing the appearance of a conventional exposure apparatus installed in a clean room.

[Explanation of symbols]

PL: projection optical system, R: reticle, RC: reticle case, RS: reticle stage, ST: substrate stage, W
... wafer, 2 ... side member, 3 ... hinge, 4 ... top cover, 5 ...
Hinge, 6 Front lid, 7A, 7B Guide part, 8A, 8B
... Retaining springs, 9A, 9B, 12A, 12B ... Stoppers, 10A, 10B, 11A, 11B ... Reticle support pins, 15A, 15B ... Reticle holders, 16A, 16
B, 18A, 18B: tension coil spring, 21: pellicle, 29: reticle case automatic transfer robot (AG
V), 30: Library device, 31, 41, 51: Chamber, 32, 42, 52: Opening / closing door, 37, 47, 57
... Base, 33, 45, 55 ... Reticle buffer, 3
4, 43, 53: robot, 35, 44, 54: arm, 36: reticle library, 40, 50: exposure apparatus, 46, 56: CX carrier, 48, 58: load arm, 49, 59: unload arm

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁶ Identification code FI H01L 21/30 515D

Claims (6)

[Claims] A plurality of exposure devices for exposing a pattern formed on a reticle onto a substrate; a reticle storage means for storing a reticle case in which the reticle is stored outside the exposure device; A lithography system comprising: transport means for transporting the reticle case between an apparatus and the reticle storage means. 2. The lithography system according to claim 1, wherein said reticle storage means is provided between said plurality of exposure apparatuses. 3. The lithography system according to claim 2, wherein said transfer means is provided inside said exposure apparatus. 4. The lithography system according to claim 1, wherein said transport means transfers a reticle used in a first exposure apparatus of said plurality of exposure apparatuses to a second reticle different from said first exposure apparatus. A lithography system for transporting to an exposure apparatus. 5. The lithography system according to claim 1, wherein said transport means transports a reticle to be used next to a reticle used for said exposure of said exposure apparatus. 6. The lithography system according to claim 1, wherein said reticle storage means includes a temporary storage means for temporarily storing a reticle carried in / out by said transport means among said plurality of reticles. And a lithography system.