JPH11212045A - Manufacture of liquid crystal panel - Google Patents
Manufacture of liquid crystal panelInfo
- Publication number
- JPH11212045A JPH11212045A JP1270398A JP1270398A JPH11212045A JP H11212045 A JPH11212045 A JP H11212045A JP 1270398 A JP1270398 A JP 1270398A JP 1270398 A JP1270398 A JP 1270398A JP H11212045 A JPH11212045 A JP H11212045A
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- glass substrate
- extraction electrode
- substrates
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Liquid Crystal (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、液晶パネルの製造
方法に係り、特に、液晶を挾む二枚のガラス基板の貼り
合わせ方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a liquid crystal panel, and more particularly to a method for bonding two glass substrates sandwiching a liquid crystal.
【0002】[0002]
【従来の技術】従来の技術について図9〜図12を用い
て説明する。液晶パネルの組立方法は大きく分類して2
通りの工法が提案されている。2. Description of the Related Art A conventional technique will be described with reference to FIGS. The method of assembling the liquid crystal panel is roughly classified into 2
The following construction methods have been proposed.
【0003】まず第1の工法は、ガラス基板を貼り合わ
せて図9〜図11に示すような空セルを組み立てた後
に、空セル内を真空引きし、空セル内の真空圧と大気圧
の圧力差を利用して液晶材料を注入する方法である(真
空注入工法)。真空注入工法の場合には、上下2枚のガ
ラス基板1を貼り合わせて、シール樹脂8を十分に硬化
した後、液晶材料を注入する。シール樹脂8の材料とし
て、パネル構成に応じて熱硬化型と紫外線硬化型を任意
に選択することができる。[0003] First, after a glass substrate is bonded and an empty cell as shown in FIGS. 9 to 11 is assembled, the empty cell is evacuated, and the vacuum pressure in the empty cell and the atmospheric pressure are reduced. This is a method of injecting a liquid crystal material using a pressure difference (vacuum injection method). In the case of the vacuum injection method, the upper and lower glass substrates 1 are attached to each other, and after the sealing resin 8 is sufficiently cured, a liquid crystal material is injected. As the material of the sealing resin 8, a thermosetting type and an ultraviolet setting type can be arbitrarily selected according to the panel configuration.
【0004】近年、液晶パネルの省スペース化の要求に
対して、図9,図10に示すような表示領域周辺部の遮
光膜2にシール樹脂8が重なる構成が主流であるが、熱
硬化型のシール樹脂を用いた場合には遮光膜2との位置
関係に関わりなく、シール樹脂8を十分に硬化すること
ができる。現在までに生産された液晶パネルのほとんど
がこの真空注入工法により組み立てられており、最も条
件検討が進んだ工法である。In recent years, in response to a demand for space saving of a liquid crystal panel, a configuration in which a sealing resin 8 overlaps a light shielding film 2 around a display area as shown in FIGS. When the sealing resin is used, the sealing resin 8 can be sufficiently cured regardless of the positional relationship with the light shielding film 2. Most of the liquid crystal panels produced to date have been assembled by this vacuum injection method, and this is the method whose conditions have been studied the most.
【0005】第2の工法は、液晶材料を一方の基板上に
滴下した後、もう一方の基板を貼り合わせる工法(滴下
工法)である。この工法はパネル作成のスループットが
短く、液晶材料の利用効率も高いことから次世代の組立
工法として期待されている。A second method is a method of dropping a liquid crystal material on one substrate and then bonding the other substrate (dropping method). This method is expected to be a next-generation assembly method because the throughput of panel production is short and the use efficiency of liquid crystal materials is high.
【0006】しかし、未硬化のシール樹脂に液晶材料が
直接接触するために液晶配向の乱れが発生しやすく、で
きるだけ液晶配向を安定させるために、迅速に硬化する
ことのできる紫外線硬化型のシール樹脂材料が用いられ
ている。However, since the liquid crystal material is in direct contact with the uncured sealing resin, the alignment of the liquid crystal is likely to be disordered. In order to stabilize the liquid crystal alignment as much as possible, a UV-curable sealing resin which can be rapidly cured. Materials are used.
【0007】[0007]
【発明が解決しようとする課題】滴下工法により液晶パ
ネルを製造する時には、上記のように紫外線硬化型のシ
ール樹脂が用いられているが、この時十分なエネルギー
の紫外線をシール樹脂に照射できるようにパネルの表示
領域周辺部の設計及び紫外線照射方法に制約が必要とな
る。When a liquid crystal panel is manufactured by the dropping method, an ultraviolet-curable sealing resin is used as described above. At this time, it is necessary to irradiate the sealing resin with ultraviolet rays having sufficient energy. In addition, the design around the display area of the panel and the method of irradiating ultraviolet rays need to be restricted.
【0008】特にTFT液晶パネルや電極による反射を
用いた反射型液晶パネル等の、金属製の引出電極を用い
た液晶パネルでは、パネルの上下いずれから紫外線照射
を行ってもシール樹脂に紫外線を照射することができな
い領域が発生し、この領域近傍ではシール樹脂の硬化が
不十分となり、液晶配向が安定しない。In particular, in a liquid crystal panel using a metal lead-out electrode, such as a TFT liquid crystal panel or a reflection type liquid crystal panel using reflection by an electrode, the sealing resin is irradiated with ultraviolet light regardless of whether ultraviolet irradiation is performed from above or below the panel. An area where the sealing cannot be performed occurs. In the vicinity of this area, the curing of the sealing resin becomes insufficient, and the liquid crystal alignment is not stabilized.
【0009】このため滴下工法を用いて金属により引出
電極が形成された液晶パネルを作成するためには、図1
2に示すように、表示領域周辺部の遮光膜2の更に外側
に紫外線硬化型シール樹脂81を塗布して、遮光膜2の
ある基板側から紫外線遮光マスク91を通して紫外線9
0の照射を行う必要がある。図9,図10に示すような
表示領域周辺部の遮光膜2にシール樹脂を重ねて、周辺
領域を省スペース化する構成の場合には、金属製の引出
電極42又は遮光膜2の陰となるために、シール樹脂8
を十分に硬化することができないという問題があった。Therefore, in order to manufacture a liquid crystal panel in which extraction electrodes are formed of metal by using the dropping method, it is necessary to use FIG.
As shown in FIG. 2, an ultraviolet-curable sealing resin 81 is applied to the outer periphery of the light-shielding film 2 around the display area, and the ultraviolet-ray-shielding mask 91 is applied from the substrate side where the light-shielding film 2 is located.
It is necessary to perform 0 irradiation. In the case of a configuration in which a sealing resin is overlaid on the light shielding film 2 around the display area as shown in FIGS. 9 and 10 to save space in the peripheral area, the metal extraction electrode 42 or the shadow of the light shielding film 2 is not used. To become a seal resin 8
Has not been able to be cured sufficiently.
【0010】[0010]
【課題を解決するための手段】上記課題を解決するため
に、遮光膜の材質毎に引出電極幅と、隣接する電極との
距離(電極の形成されていない領域:電極間幅)に制限
を設けて、引出電極を有する基板側から紫外線を照射す
ることや、貼り合わせた2枚の基板の両側から紫外線を
照射することが効果的である。In order to solve the above problems, the width of the extraction electrode and the distance between adjacent electrodes (region where no electrode is formed: width between electrodes) are limited for each material of the light shielding film. It is effective to irradiate the ultraviolet rays from the side of the substrate having the extraction electrodes, or to irradiate the ultraviolet rays from both sides of the two bonded substrates.
【0011】このように、引出電極幅と引出電極間幅の
設計に制約を設けることによって、電極間からシール樹
脂中に入射した紫外線を、対向基板の遮光膜表面での反
射や遮光膜表面と電極表面による多重反射、更にはシー
ル材料中のフィラー剤による散乱により、電極の陰領域
にも十分に照射することができ、また、シール樹脂中の
光開始剤の連鎖反応もあって、電極の陰領域のシール樹
脂を十分に硬化することができる。As described above, by restricting the design of the width of the extraction electrode and the width of the extraction electrode, the ultraviolet light incident on the sealing resin from between the electrodes can be reflected on the light-shielding film surface of the opposing substrate or can be reflected on the light-shielding film surface. Due to multiple reflection by the electrode surface and furthermore scattering by the filler material in the sealing material, it is possible to sufficiently irradiate the shadow area of the electrode, and there is a chain reaction of the photoinitiator in the sealing resin, and The sealing resin in the shadow region can be sufficiently cured.
【0012】[0012]
【発明の実施の形態】図1〜図6は本発明の実施の形態
におけるTFT液晶パネルの主要部分の断面を示したも
のである。ここで、1はガラス基板、13は金属製の引
出電極基板、14は遮光基板、21は金属製の遮光膜、
22は樹脂製の遮光膜、31,32,33はそれぞれ
赤,緑,青のカラーフィルタ、41は透明電極(IT
O)、42は金属製の引出電極、5はオーバーコート、
6は配向膜、7は液晶材料、71はスペーサー粒子、8
1は紫外線硬化型シール樹脂、90は紫外線、91は紫
外線遮光マスクである。1 to 6 show a cross section of a main part of a TFT liquid crystal panel according to an embodiment of the present invention. Here, 1 is a glass substrate, 13 is an extraction electrode substrate made of metal, 14 is a light shielding substrate, 21 is a metal light shielding film,
22 is a light-shielding film made of resin, 31, 32, and 33 are red, green, and blue color filters, respectively, and 41 is a transparent electrode (IT
O), 42 is a metal extraction electrode, 5 is an overcoat,
6 is an alignment film, 7 is a liquid crystal material, 71 is spacer particles, 8
Reference numeral 1 denotes an ultraviolet-curable seal resin, 90 denotes ultraviolet rays, and 91 denotes an ultraviolet light shielding mask.
【0013】図1〜図3は遮光膜21としてCr等の金
属薄膜を用い、図4〜図6は遮光膜22として黒色顔料
を含んだ樹脂製の遮光膜を用いた場合である。また図1
〜図6は、それぞれの断面図を用いて、紫外線90の照
射を引出電極基板13側から照射した場合と、引出電極
基板13と遮光基板14の両側から照射した場合を示し
ている。FIGS. 1 to 3 show the case where a metal thin film such as Cr is used as the light-shielding film 21 and FIGS. 4 to 6 show the case where a resin light-shielding film containing a black pigment is used as the light-shielding film 22. FIG.
6 to FIG. 6 show a case where irradiation with ultraviolet light 90 is performed from the extraction electrode substrate 13 side and a case where irradiation is performed from both sides of the extraction electrode substrate 13 and the light shielding substrate 14 using the respective cross-sectional views.
【0014】引出電極幅と、電極間幅(隣接する電極間
の、電極が形成されていない領域の幅)には、遮光膜の
材質と紫外線照射の方法(引出電極基板13側からか、
両基板13、14側からか)によって異なり、(表4)
のように制限されている。The width of the extraction electrode and the width between the electrodes (the width of the region where no electrode is formed between the adjacent electrodes) are determined by the material of the light-shielding film and the method of irradiating ultraviolet rays (from the extraction electrode substrate 13 side).
(Table 4)
It is restricted as follows.
【0015】また、紫外線の照射が一定エネルギー以上
であれば、紫外線照射エネルギー量が上記制限に影響を
及ぼすことはほとんど無い。[0015] If the irradiation of the ultraviolet rays is equal to or more than a certain energy, the amount of the ultraviolet irradiation energy hardly affects the above-mentioned limit.
【0016】次に、本発明の具体的実施例について図
7,図8,(表1),(表2−1),(表2−2),
(表3),(表4)を用いて説明する。Next, specific embodiments of the present invention will be described with reference to FIGS. 7, 8, (Table 1), (Table 2-1), (Table 2-2),
This will be described with reference to (Table 3) and (Table 4).
【0017】(実施例1)Cr着膜済みのガラス基板に
フォトレジストを塗布、フォトマスクを介しての紫外線
照射、現像、エッチング、レジスト剥離等の工程を経
て、図7及び(表1)に示すA〜OのCrパターン基板
10を作成した。このCrパターンは金属製の引出電極
を模した構成(模擬引出電極43)となっており、後工
程でシール樹脂硬化を行うための紫外線硬化を行う時
に、引出電極の陰に相当する領域を作り出すために形成
したものである。このA〜Oの模擬電極幅431と、電
極間幅432は(表1)に示す通りである。(Example 1) FIG. 7 and (Table 1) show a process of applying a photoresist to a glass substrate having a Cr film formed thereon, irradiating ultraviolet rays through a photomask, developing, etching, and stripping the resist. The Cr pattern substrates 10 of A to O shown were prepared. This Cr pattern has a configuration imitating a metal extraction electrode (simulated extraction electrode 43), and creates an area corresponding to the shadow of the extraction electrode when performing ultraviolet curing for sealing resin curing in a later step. It is formed for the purpose. The simulated electrode width 431 of A to O and the interelectrode width 432 are as shown in (Table 1).
【0018】[0018]
【表1】 [Table 1]
【0019】これらのCrパターン基板10にスピンコ
ーターを用いてエポキシ樹脂からなる熱硬化型樹脂を塗
布、200℃,2時間の熱硬化を施してオーバーコート
5を形成した。次に、スパッタリングによって透明電極
(ITO)41を全面に2000〜2500Åの膜厚と
なるように成膜した後、フォトリソ法にてストライプ状
にパターニングを行い、STN液晶パネル用のセグメン
ト基板11を作成した(図8参照)。A thermosetting resin made of an epoxy resin was applied to these Cr pattern substrates 10 using a spin coater, and was thermoset at 200 ° C. for 2 hours to form an overcoat 5. Next, a transparent electrode (ITO) 41 is formed on the entire surface by sputtering so as to have a thickness of 2000 to 2500 °, and is patterned in a stripe shape by a photolithography method to form a segment substrate 11 for an STN liquid crystal panel. (See FIG. 8).
【0020】これらのセグメント基板11と、予め準備
しておいたITOのコモンパターン付のカラーフィルタ
基板12の表面に、ポリイミド樹脂製の配向膜6を50
0〜1000Åの膜厚となるように形成した後、STN
液晶パネルとして組み立てられるように、所定の方向に
ラビング処理を行った。このカラーフィルタ基板12に
は遮光膜2が形成されており、この遮光膜がCr製のも
のと、黒色顔料を含んだ樹脂製のものと2通り準備し
た。On each of the segment substrate 11 and the color filter substrate 12 having a common pattern of ITO prepared in advance, an alignment film 6 made of polyimide
After forming to a film thickness of 0 to 1000 °, STN
A rubbing process was performed in a predetermined direction so as to be assembled as a liquid crystal panel. A light-shielding film 2 is formed on the color filter substrate 12, and two types of light-shielding films, one made of Cr and one made of a resin containing a black pigment, are prepared.
【0021】次に、これらのセグメント基板11の表示
領域周辺部に、平均粒径7.0μmのガラスファイバー
を1〜2%含んだ紫外線硬化型エポキシアクリレート系
シール樹脂81をスクリーン印刷によって塗布し、更
に、表示領域には所定量の液晶材料7を滴下した。この
時シール樹脂81はCrによって形成した模擬引出電極
43のパターンに重なるように、かつ表示領域を取り囲
むように形成した。Next, an ultraviolet-curable epoxy acrylate seal resin 81 containing 1-2% of glass fiber having an average particle size of 7.0 μm is applied to the periphery of the display area of the segment substrate 11 by screen printing. Further, a predetermined amount of the liquid crystal material 7 was dropped on the display area. At this time, the sealing resin 81 was formed so as to overlap the pattern of the simulated extraction electrode 43 formed of Cr and to surround the display area.
【0022】一方、カラーフィルタ基板12には平均粒
径6.5μmの固着材付樹脂製のスペーサ粒子71を平
方ミリメートル当たり200〜300個散布し、150
度の熱処理を施して基板に固着した。On the other hand, on the color filter substrate 12, 200 to 300 spacer particles 71 made of resin and having an average particle diameter of 6.5 μm and having a fixing material are sprayed per square millimeter.
The substrate was fixed to the substrate by performing various heat treatments.
【0023】次に、真空チャンバー中でこれらのセグメ
ント基板11とカラーフィルタ基板12を、シール樹脂
81がカラーフィルタ基板12の表示領域外周辺遮光膜
2に半分だけ重なるように貼り合わせ、真空チャンバー
から取り出した後にシール樹脂81に紫外線90を照射
して、図8に示すSTN液晶パネルを作成した。この時
紫外線90の照射は25mW/cm2(405nmにて
測定)を5分間行い、セグメント基板11側から照射し
たものとセグメント基板11とカラーフィルタ基板12
の両側から照射したものをそれぞれ作成した。Next, the segment substrate 11 and the color filter substrate 12 are bonded together in a vacuum chamber such that the sealing resin 81 overlaps the light-shielding film 2 outside the display area of the color filter substrate 12 by half. After being taken out, the seal resin 81 was irradiated with ultraviolet light 90 to produce an STN liquid crystal panel shown in FIG. At this time, irradiation with ultraviolet light 90 was performed at 25 mW / cm 2 (measured at 405 nm) for 5 minutes, and irradiation with light from the segment substrate 11 side, the segment substrate 11 and the color filter substrate 12 was performed.
Irradiated from both sides were prepared.
【0024】これらのSTN液晶パネルに130℃の熱
アニールを30時間施した後にパネルに電圧印加して液
晶の配向の安定性を観察した。観察結果を(表2−
1),(表2−2)に示す。After subjecting these STN liquid crystal panels to thermal annealing at 130 ° C. for 30 hours, a voltage was applied to the panels to observe the stability of liquid crystal alignment. Observation results (Table 2-
1) and (Table 2-2).
【0025】次に、これらの作成したA〜Oのパネルを
分解して、シール樹脂81を剥がして、FTIR解析を
行い、シール樹脂の重合度を測定した。測定結果を(表
2−1),(表2−2)に示す。Next, these prepared panels A to O were disassembled, the sealing resin 81 was peeled off, and FTIR analysis was performed to measure the degree of polymerization of the sealing resin. The measurement results are shown in (Table 2-1) and (Table 2-2).
【0026】[0026]
【表2−1】 [Table 2-1]
【0027】[0027]
【表2−2】 [Table 2-2]
【0028】(実施例2)実施例1で作成したCrパタ
ーン基板10のうち、A,M(遮光膜2がCr、樹脂
共)を用いて実施例1と同様に図8のSTN液晶パネル
を作成した。この際、シール樹脂81の硬化時の紫外線
照射時間を1,2,3,5,10分とし、照射はセグメ
ント基板側から行った。これらのパネルに140℃、3
0時間の熱アニールを施して液晶配向の安定性を評価し
た後に、パネルを分解して、それぞれのシール樹脂をF
TIR解析によって重合度を測定した。この結果を(表
3)に示す。(Embodiment 2) The STN liquid crystal panel of FIG. 8 is formed in the same manner as in Embodiment 1 by using A and M (the light shielding film 2 is made of both Cr and resin) among the Cr pattern substrates 10 formed in Embodiment 1. Created. At this time, the ultraviolet irradiation time during curing of the seal resin 81 was 1, 2, 3, 5, 10 minutes, and irradiation was performed from the segment substrate side. 140 ° C, 3
After performing thermal annealing for 0 hour to evaluate the stability of liquid crystal alignment, the panel is disassembled and each seal resin is replaced with F.
The degree of polymerization was measured by TIR analysis. The results are shown in (Table 3).
【0029】[0029]
【表3】 [Table 3]
【0030】(表2−1),(表2−2)から、金属製
模擬引出電極43の電極幅431、電極間幅432によ
って紫外線硬化型シール樹脂81の硬化の度合が異な
り、カラーフィルタ基板12の遮光膜2の材質と紫外線
照射方法(どちらのガラス基板側から照射するか)によ
って異なっていることがわかる。これは、照射した紫外
線は、すべて平行光で基板面に垂直に入射している訳で
はなく、斜め光も多く含まれているために、遮光膜2や
金属製模擬電極43によって反射されて模擬電極43や
遮光膜2の陰となっている領域のシール樹脂81にも照
射されるためであると考えられる。From Tables 2-1 and 2-2, the degree of curing of the ultraviolet curable seal resin 81 differs depending on the electrode width 431 and the electrode width 432 of the simulated extraction electrode 43 made of metal. It can be seen that there is a difference depending on the material of the light-shielding film 2 and the method of irradiating the ultraviolet light (which glass substrate is used for irradiation). This is because all the irradiated ultraviolet rays are not parallel rays and are not perpendicularly incident on the substrate surface, but include a large amount of oblique light, so that the reflected ultraviolet rays are reflected by the light shielding film 2 and the metal simulation electrode 43 and simulated. This is considered to be because irradiation is also performed on the sealing resin 81 in a region shaded by the electrode 43 and the light shielding film 2.
【0031】(表3)は、紫外線小照射エネルギーが一
定値(25mW/cm2,3分)以上の場合には、紫外
線小照射エネルギーは電極幅431、電極間幅432と
シール硬化度にはほとんど影響がないことを示してい
る。Table 3 shows that when the ultraviolet light irradiation energy is a fixed value (25 mW / cm 2 , 3 minutes) or more, the ultraviolet light irradiation energy is lower than the electrode width 431, the electrode width 432, and the seal hardening degree. This indicates that there is almost no effect.
【0032】これらの結果から、金属製の引出電極を用
いた液晶パネルを紫外線照射型シール樹脂を用いて組み
立てる場合の引出電極の設計条件が(表4)のように決
定される。From these results, the design conditions of the extraction electrode when the liquid crystal panel using the metal extraction electrode is assembled using the ultraviolet irradiation type sealing resin are determined as shown in Table 4.
【0033】[0033]
【表4】 [Table 4]
【0034】なお、本実施例では液晶配向の安定性を確
認するために、シール樹脂の硬化が不十分な場合に、そ
の影響で液晶配向が乱れやすいSTN液晶パネルを用い
たが、TNモードその他の液晶パネルであっても、同様
の硬化が得られる。In this embodiment, in order to confirm the stability of the liquid crystal alignment, an STN liquid crystal panel in which the liquid crystal alignment is liable to be disturbed by the influence of the insufficient curing of the sealing resin is used. The same curing can be obtained with the liquid crystal panel of the above.
【0035】これらの結果をもとに、(表4)に示す条
件通りにTFT液晶パネル(図1〜図6)を作成し、液
晶配向の安定した表示の良好なパネルであることを確認
した。なお、これらの図では簡単のためにTFTアレイ
等、本発明には直接関係しない部分の図示は省略した。Based on these results, TFT liquid crystal panels (FIGS. 1 to 6) were prepared under the conditions shown in (Table 4), and it was confirmed that the panels were stable in liquid crystal orientation and good in display. . In these figures, for simplicity, illustration of parts not directly related to the present invention, such as a TFT array, is omitted.
【0036】[0036]
【発明の効果】金属製引出電極の電極幅、電極間幅に制
約を設けることによって、滴下工法を用いても、液晶配
向が安定した表示領域周辺部がコンパクトな液晶パネル
を製造することができる。According to the present invention, by limiting the width of the metal extraction electrode and the width between the electrodes, it is possible to manufacture a liquid crystal panel having a stable liquid crystal orientation and a small display area periphery even when the dropping method is used. .
【図1】本発明の実施の形態における液晶パネルの主要
部分の断面図(遮光膜が金属製遮光膜で、それにシール
樹脂が半分重なり、紫外線は引出電極基板側から照射)FIG. 1 is a cross-sectional view of a main part of a liquid crystal panel according to an embodiment of the present invention (a light-shielding film is a metal light-shielding film, and a sealing resin overlaps half of the light-shielding film, and ultraviolet rays are emitted from the extraction electrode substrate side).
【図2】本発明の実施の形態における液晶パネルの主要
部分の断面図(遮光膜が金属製遮光膜で、それにシール
樹脂が半分重なり、紫外線は引出電極基板及び遮光基板
の両側から照射)FIG. 2 is a cross-sectional view of a main part of a liquid crystal panel according to an embodiment of the present invention (a light-shielding film is a metal light-shielding film, a sealing resin is overlapped with the light-shielding film by half, and ultraviolet rays are irradiated from both sides of the extraction electrode substrate and the light-shielding substrate).
【図3】本発明の実施の形態における液晶パネルの主要
部分の断面図(遮光膜が金属製遮光膜で、それにシール
樹脂が全部重なり、紫外線は引出電極基板側から照射)FIG. 3 is a cross-sectional view of a main part of a liquid crystal panel according to an embodiment of the present invention (a light-shielding film is a metal light-shielding film, a sealing resin is entirely overlapped with the light-shielding film, and ultraviolet rays are irradiated from the extraction electrode substrate side).
【図4】本発明の実施の形態における液晶パネルの主要
部分の断面図(遮光膜が樹脂製遮光膜で、それにシール
樹脂が半分重なり、紫外線は引出電極基板側から照射)FIG. 4 is a cross-sectional view of a main part of a liquid crystal panel according to an embodiment of the present invention (a light-shielding film is a resin-made light-shielding film, and a sealing resin overlaps half of the light-shielding film, and ultraviolet rays are irradiated from the extraction electrode substrate side).
【図5】本発明の実施の形態における液晶パネルの主要
部分の断面図(遮光膜が樹脂製遮光膜で、それにシール
樹脂が半分重なり、紫外線は引出電極基板及び遮光基板
の両側から照射)FIG. 5 is a cross-sectional view of a main part of a liquid crystal panel according to an embodiment of the present invention (a light-shielding film is a resin-made light-shielding film, a sealing resin overlaps with the light-shielding film by half, and ultraviolet rays are emitted from both sides of the extraction electrode substrate and the light-shielding substrate).
【図6】本発明の実施の形態における液晶パネルの主要
部分の断面図(遮光膜が樹脂製遮光膜で、それにシール
樹脂が全部重なり、紫外線は引出電極基板側から照射)FIG. 6 is a cross-sectional view of a main part of a liquid crystal panel according to an embodiment of the present invention (a light-shielding film is a resin-made light-shielding film, a sealing resin is entirely overlapped with the light-shielding film, and ultraviolet rays are irradiated from the extraction electrode substrate side).
【図7】本発明の具体的実施例で用いた模擬電極パター
ンの主要部分の平面図FIG. 7 is a plan view of a main part of a simulated electrode pattern used in a specific example of the present invention.
【図8】本発明の具体的実施例で作成したSTN液晶パ
ネルの主要部分の断面図FIG. 8 is a sectional view of a main part of an STN liquid crystal panel prepared in a specific embodiment of the present invention.
【図9】従来技術における真空注入工法により組み立て
た液晶パネルの主要部分の断面図(シール樹脂が遮光膜
に全部重なる)FIG. 9 is a cross-sectional view of a main part of a liquid crystal panel assembled by a vacuum injection method according to a conventional technique (a sealing resin entirely overlaps a light shielding film).
【図10】従来技術における真空注入工法により組み立
てた液晶パネルの主要部分の断面図(シール樹脂が遮光
膜に半分重なる)FIG. 10 is a cross-sectional view of a main part of a liquid crystal panel assembled by a vacuum injection method according to a conventional technique (a sealing resin partially overlaps a light shielding film).
【図11】従来技術における真空注入工法により組み立
てた液晶パネルの主要部分の断面図(シール樹脂が遮光
膜に重ならない)FIG. 11 is a cross-sectional view of a main part of a liquid crystal panel assembled by a vacuum injection method according to a conventional technique (a sealing resin does not overlap a light shielding film).
【図12】従来技術における液晶滴下工法により組み立
てた液晶パネルの主要部分の断面図(シール樹脂が遮光
膜に重ならず、紫外線は遮光基板側から照射)FIG. 12 is a cross-sectional view of a main portion of a liquid crystal panel assembled by a liquid crystal dropping method according to a conventional technique (a sealing resin does not overlap a light shielding film, and ultraviolet light is irradiated from the light shielding substrate side).
1 ガラス基板 2 遮光膜 5 オーバーコート 6 配向膜 7 液晶材料 8 シール樹脂 10 Crパターン基板 11 セグメント基板 12 カラーフィルタ基板 13 引出電極基板 14 遮光基板 21 金属製遮光膜 22 樹脂製遮光膜 31 カラーフィルタ(赤) 32 カラーフィルタ(緑) 33 カラーフィルタ(青) 41 透明電極(ITO) 42 引出電極 43 模擬引出電極 71 スペーサ粒子 81 紫外線硬化型シール樹脂 90 紫外線 91 紫外線遮光マスク 431 電極幅 432 電極間幅 Reference Signs List 1 glass substrate 2 light shielding film 5 overcoat 6 alignment film 7 liquid crystal material 8 seal resin 10 Cr pattern substrate 11 segment substrate 12 color filter substrate 13 lead electrode substrate 14 light shielding substrate 21 metal light shielding film 22 resin light shielding film 31 color filter ( Red) 32 Color filter (Green) 33 Color filter (Blue) 41 Transparent electrode (ITO) 42 Extraction electrode 43 Simulated extraction electrode 71 Spacer particle 81 Ultraviolet curing seal resin 90 Ultraviolet 91 Ultraviolet light shielding mask 431 Electrode width 432 Electrode width
Claims (8)
ガラス基板と、表示領域周辺部に金属薄膜で形成された
遮光膜を有するガラス基板のいずれか一方の基板の表示
領域周辺部に紫外線硬化型シール樹脂を塗布し、更にい
ずれか一方の基板の表示領域に所定量の液晶材料を滴下
した後、2枚の基板を重ね合わせ、金属製引出電極を有
するガラス基板側から紫外線を照射してシール樹脂を硬
化するガラス基板貼り合わせ工程を有することを特徴と
する液晶パネルの製造方法。1. A glass substrate having an extraction electrode formed of a metal thin film, and a glass substrate having a light-shielding film formed of a metal thin film around a display region. After applying a mold sealing resin and further dropping a predetermined amount of liquid crystal material on a display area of one of the substrates, the two substrates are overlapped, and ultraviolet rays are irradiated from a glass substrate side having a metal extraction electrode. A method for manufacturing a liquid crystal panel, comprising a step of bonding a glass substrate to cure a sealing resin.
引出電極の幅が40μm以下であり、更に隣接する引出
電極との距離の2.5倍以下であることを特徴とする請
求項1記載の液晶パネルの製造方法。2. The method according to claim 1, wherein the width of the extraction electrode in a region overlapping with the ultraviolet-curable sealing resin is 40 μm or less, and is 2.5 times or less the distance between adjacent extraction electrodes. Liquid crystal panel manufacturing method.
ガラス基板と、表示領域周辺部に金属薄膜で形成された
遮光膜を有するガラス基板のいずれか一方の基板の表示
領域周辺部に紫外線硬化型シール樹脂を塗布し、更にい
ずれか一方の基板の表示領域に所定量の液晶材料を滴下
した後、2枚の基板を貼り合わせ、2枚の基板の両側か
ら紫外線を照射してシール樹脂を硬化するガラス基板貼
り合わせ工程を有することを特徴とする液晶パネルの製
造方法。3. A glass substrate having an extraction electrode formed of a metal thin film and a glass substrate having a light-shielding film formed of a metal thin film around the display region. A mold sealing resin is applied, and a predetermined amount of a liquid crystal material is further dropped on a display area of one of the substrates. Then, the two substrates are bonded to each other, and the sealing resin is irradiated by irradiating ultraviolet rays from both sides of the two substrates. A method for manufacturing a liquid crystal panel, comprising a step of bonding a glass substrate to be cured.
引出電極の幅が40μm以下であり、更に隣接する引出
電極との距離の3.0倍以下であることを特徴とする請
求項3記載の液晶パネルの製造方法。4. The extraction electrode according to claim 3, wherein the width of the extraction electrode in the region overlapping with the ultraviolet-curable sealing resin is 40 μm or less, and 3.0 times or less the distance between adjacent extraction electrodes. Liquid crystal panel manufacturing method.
ガラス基板と、表示領域周辺部に黒色顔料を含んだ樹脂
製の遮光膜を有するガラス基板のいずれか一方の基板の
表示領域周辺部に紫外線硬化型シール樹脂を塗布し、更
にいずれか一方の基板の表示領域に所定量の液晶材料を
滴下した後、2枚の基板を重ね合わせ、金属製引出電極
を有するガラス基板側から紫外線を照射してシール樹脂
を硬化するガラス基板貼り合わせ工程を有することを特
徴とする液晶パネルの製造方法。5. A glass substrate having an extraction electrode formed of a metal thin film and a glass substrate having a resin light-shielding film containing a black pigment around the display region. A UV-curable seal resin is applied, and a predetermined amount of liquid crystal material is dropped on a display area of one of the substrates. Then, the two substrates are overlapped with each other, and ultraviolet rays are irradiated from a glass substrate having a metal extraction electrode. A method of manufacturing a liquid crystal panel, comprising a step of bonding a glass substrate to cure a sealing resin by performing the step.
引出電極の幅が30μm以下であり、更に隣接する引出
電極との距離の2.0倍以下であることを特徴とする請
求項5記載の液晶パネルの製造方法。6. The extraction electrode according to claim 5, wherein the width of the extraction electrode in a region overlapping with the ultraviolet-curable seal resin is 30 μm or less, and is 2.0 times or less the distance between adjacent extraction electrodes. Liquid crystal panel manufacturing method.
ガラス基板と、表示領域周辺部に黒色顔料を含んだ樹脂
製の遮光膜を有するガラス基板のいずれか一方の基板の
表示領域周辺部に紫外線硬化型シール樹脂を塗布し、更
にいずれか一方の基板の表示領域に所定量の液晶材料を
滴下した後、2枚の基板を貼り合わせ、2枚の基板の両
側から紫外線を照射してシール樹脂を硬化するガラス基
板貼り合わせ工程を有することを特徴とする液晶パネル
の製造方法。7. A glass substrate having an extraction electrode formed of a metal thin film and a glass substrate having a resin light-shielding film containing a black pigment around the display region. A UV-curable sealing resin is applied, and a predetermined amount of liquid crystal material is dropped on a display area of one of the substrates. Then, the two substrates are bonded to each other and irradiated with UV light from both sides of the two substrates to seal. A method for manufacturing a liquid crystal panel, comprising a glass substrate bonding step of curing a resin.
引出電極の幅が30μm以下であり、更に隣接する引出
電極との距離の2.5倍以下であることを特徴とする請
求項7記載の液晶パネルの製造方法。8. The method according to claim 7, wherein the width of the extraction electrode in a region overlapping with the ultraviolet-curable sealing resin is 30 μm or less, and is 2.5 times or less the distance between adjacent extraction electrodes. Liquid crystal panel manufacturing method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1270398A JPH11212045A (en) | 1998-01-26 | 1998-01-26 | Manufacture of liquid crystal panel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1270398A JPH11212045A (en) | 1998-01-26 | 1998-01-26 | Manufacture of liquid crystal panel |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11212045A true JPH11212045A (en) | 1999-08-06 |
Family
ID=11812777
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1270398A Pending JPH11212045A (en) | 1998-01-26 | 1998-01-26 | Manufacture of liquid crystal panel |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH11212045A (en) |
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