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JPH10273626A - Circuit connecting material and production of circuit board - Google Patents

Circuit connecting material and production of circuit board

Info

Publication number
JPH10273626A
JPH10273626A JP7942597A JP7942597A JPH10273626A JP H10273626 A JPH10273626 A JP H10273626A JP 7942597 A JP7942597 A JP 7942597A JP 7942597 A JP7942597 A JP 7942597A JP H10273626 A JPH10273626 A JP H10273626A
Authority
JP
Japan
Prior art keywords
circuit
connection terminal
connection
connecting material
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7942597A
Other languages
Japanese (ja)
Inventor
Mitsugi Fujinawa
貢 藤縄
Itsuo Watanabe
伊津夫 渡辺
Masahiro Arifuku
征宏 有福
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP7942597A priority Critical patent/JPH10273626A/en
Publication of JPH10273626A publication Critical patent/JPH10273626A/en
Pending legal-status Critical Current

Links

Landscapes

  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Wire Bonding (AREA)
  • Conductive Materials (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain the subject material excellent in low-temperature curing property, having a pot life, inserted between mutually opposed circuit electrodes, pressurizing mutually opposed circuit electrodes to electrically connect between electrodes in pressurizing direction by including a curing agent, a radically polymerizable substance and electroconductive particles as essential components. SOLUTION: This circuit connecting material consists essentially of (A) a curing agent generating a free radical by heating, (B) a radical polymerizable substance and (C) electroconductive particles whose surface layer is composed of at least one kind of metal selected from gold, silver and a metal of platinum group. Furthermore, a temperature in 10 hr half life of the component A is >=40 deg.C and a temperature in 1 min half life of the component A is <=180 deg.C, and benzoyl peroxide, etc., is used as the component A and methyl acrylate, etc., is used as the component B and thickness of metal of surface layer is preferably 300Å.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は接着剤組成物と導電
性粒子を用いた回路接続材料及び回路板の製造法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a circuit connecting material and a circuit board using an adhesive composition and conductive particles.

【0002】[0002]

【従来の技術】エポキシ樹脂系接着剤は、高い接着強さ
が得られ、耐水性や耐熱性に優れること等から、電気・
電子・建築・自動車・航空機等の各種用途に多用されて
いる。中でも一液型エポキシ樹脂系接着剤は、主剤と硬
化剤との混合が不必要であり使用が簡便なことから、フ
ィルム状・ペースト状・粉体状の形態で使用されてい
る。この場合、エポキシ樹脂と硬化剤及び変性剤との多
様な組み合わせにより、特定の性能を得ることが一般的
である。(例えば、特開昭62−141083号公
報)。
2. Description of the Related Art Epoxy resin adhesives have high adhesive strength and are excellent in water resistance and heat resistance.
It is widely used for various purposes such as electronics, architecture, automobiles, aircraft, etc. Among them, one-pack type epoxy resin adhesives are used in the form of a film, paste, or powder because they do not require mixing of a main agent and a curing agent and are easy to use. In this case, a specific performance is generally obtained by various combinations of the epoxy resin and the curing agent and the modifying agent. (For example, JP-A-62-141083).

【0003】[0003]

【発明が解決しようとする課題】しかしながら、上記特
開昭62−141083号公報に示されるフィルム状接
着剤は、作業性に優れるものの、20秒程度の接続時間
で140〜180℃程度の加熱、10秒では180〜2
10℃程度の加熱が必要であった。この理由は、短時間
硬化性(速硬化性)と貯蔵安定性(保存性)の両立によ
り良好な安定性を得ることを目的として、常温で不活性
な触媒型硬化剤を用いているために、硬化に際して十分
な反応が得られないためである。近年、精密電子機器の
分野では、回路の高密度化が進んでおり、電極幅、電極
間隔が極めて狭くなっている。このため、従来のエポキ
シ樹脂系を用いた回路接続材料の接続条件では、配線の
脱落、剥離や位置ずれが生じるなどの問題があった。ま
た、生産効率向上のために10秒以下への接続時間の短
縮化が求められてきており、低温速硬化性が必要不可欠
となっている。本発明の目的は、従来のエポキシ樹脂系
よりも低温速硬化性に優れかつ可使時間を有する電気・
電子用の回路接続材料を提供することにある。
However, although the film adhesive disclosed in the above-mentioned Japanese Patent Application Laid-Open No. Sho 62-141083 is excellent in workability, it can be heated at about 140 to 180 ° C. with a connection time of about 20 seconds. 180-2 for 10 seconds
Heating of about 10 ° C. was required. The reason for this is that a catalyst-type curing agent that is inactive at room temperature is used for the purpose of obtaining good stability by achieving both short-time curing (rapid curing) and storage stability (preservability). This is because a sufficient reaction cannot be obtained during curing. In recent years, in the field of precision electronic equipment, the density of circuits has been increasing, and the electrode width and electrode interval have become extremely narrow. For this reason, under the conventional connection condition of the circuit connection material using the epoxy resin system, there has been a problem that the wiring is dropped, peeled off or displaced. In addition, it is required to shorten the connection time to 10 seconds or less in order to improve production efficiency, and low-temperature rapid curing is indispensable. An object of the present invention is to provide an electric / electrical device that has excellent low-temperature and quick-curing properties and has a long working life than conventional epoxy resin systems.
An object of the present invention is to provide an electronic circuit connection material.

【0004】[0004]

【課題を解決するための手段】本発明の回路接続材料
は、相対峙する回路電極間に介在され、相対向する回路
電極を加圧し加圧方向の電極間を電気的に接続する接続
材料であって、下記(1)〜(3)の成分を必須とする
ものである。 (1)加熱により遊離ラジカルを発生する硬化剤 (2)ラジカル重合性物質 (3)表面層が金、銀および白金族の金属から選ばれる
少なくとも1種で構成される導電性粒子 加熱により遊離ラジカルを発生する硬化剤の半減期10
時間の温度が40℃以上かつ、半減期1分の温度が18
0℃以下である硬化剤が好ましく、導電性粒子表面層の
金属の厚みが300オングストロ−ム以上あるものが好
ましい。本発明の回路板の製造法は、第一の接続端子を
有する第一の回路部材と、第二の接続端子を有する第二
の回路部材とを、第一の接続端子と第二の接続端子を対
向して配置し、前記対向配置した第一の接続端子と第二
の接続端子の間に本発明の回路接続材料を介在させ、加
熱加圧して前記対向配置した第一の接続端子と第二の接
続端子を電気的に接続させるものである。
The circuit connecting material of the present invention is a connecting material which is interposed between opposing circuit electrodes and presses the opposing circuit electrodes to electrically connect the electrodes in the pressing direction. In addition, the following components (1) to (3) are essential. (1) Curing agent that generates free radicals upon heating (2) Radical polymerizable substance (3) Conductive particles whose surface layer is composed of at least one selected from gold, silver and platinum group metals Heating free radicals Half-life of curing agent that generates
The temperature of the time is 40 ° C or more and the temperature of the half-life of 1 minute is 18
A curing agent having a temperature of 0 ° C. or lower is preferable, and a metal having a thickness of 300 Å or more in the conductive particle surface layer is preferable. The method for manufacturing a circuit board according to the present invention includes a first circuit member having a first connection terminal, a second circuit member having a second connection terminal, and a first connection terminal and a second connection terminal. Are disposed facing each other, the circuit connection material of the present invention is interposed between the first connection terminal and the second connection terminal disposed opposite to each other, and the first connection terminal and the second connection terminal disposed opposite each other by heating and pressing. The two connection terminals are electrically connected.

【0005】[0005]

【発明の実施の形態】本発明に用いる加熱により遊離ラ
ジカルを発生する硬化剤としては、過酸化化合物、アゾ
系化合物などの加熱により分解して遊離ラジカルを発生
するものであり、目的とする接続温度、接続時間、保存
性等により適宜選定されるが、高反応性と保存性の点か
ら、半減期10時間の温度が40℃以上かつ、半減期1
分の温度が180℃以下の有機過酸化物が好ましく、半
減期10時間の温度が60℃以上かつ、半減期1分の温
度が170℃以下の有機過酸化物がより好ましい。この
場合、配合量は0.05〜10重量%程度であり0.1
〜5重量%がより好ましい。具体的には、ジアシルパー
オキサイド、パーオキシジカーボネート、パーオキシエ
ステル、パーオキシケタール、ジアルキルパーオキサイ
ド、ハイドロパーオキサイドなどから選定できる。
BEST MODE FOR CARRYING OUT THE INVENTION The curing agent used in the present invention, which generates free radicals by heating, is one which decomposes upon heating a peroxide compound, an azo compound or the like to generate free radicals. The temperature is appropriately selected depending on the temperature, the connection time, the storage stability and the like. However, from the viewpoint of high reactivity and storage stability, the temperature at a half-life of 10 hours is 40 ° C. or more and the half-life is 1
An organic peroxide having a temperature of 180 ° C. or less for a minute is preferable, and an organic peroxide having a temperature of 60 ° C. or more for a half-life of 10 hours and a temperature of 170 ° C. or less for a half-life of 1 minute is more preferable. In this case, the compounding amount is about 0.05 to 10% by weight and 0.1
-5% by weight is more preferred. Specifically, it can be selected from diacyl peroxide, peroxydicarbonate, peroxyester, peroxyketal, dialkyl peroxide, hydroperoxide and the like.

【0006】ジアシルパーオキサイド類としては、2,
4−ジクロロベンゾイルパーオキサイド、3,5,5,
−トリメチルヘキサノイルパーオキサイド、オクタノイ
ルパーオキサイド、ラウロイルパーオキサイド、ステア
ロイルパーオキサイド、スクシニックパーオキサイド、
ベンゾイルパーオキシトルエン、ベンゾイルパーオキサ
イド等がある。
The diacyl peroxides include 2,2
4-dichlorobenzoyl peroxide, 3,5,5
-Trimethylhexanoyl peroxide, octanoyl peroxide, lauroyl peroxide, stearoyl peroxide, succinic peroxide,
Benzoyl peroxytoluene, benzoyl peroxide and the like.

【0007】パーオキシジカーボネート類としては、ジ
ーnープロピルパーオキシジカーボネート、ジイソプロ
ピルパーオキシジカーボネート、ビス(4−t−ブチル
シクロヘキシル)パーオキシジカーボネト、ジ−2−エ
トキシメトキシパーオキシジカーボネート、ジ(2−エ
チルヘキシルパーオキシ)ジカーボネート、ジメトキシ
ブチルパーオキシジカーボネート、ジ(3−メチル−3
−メトキシブチルパーオキシ)ジカーボネート等があ
る。
The peroxydicarbonates include di-n-propylperoxydicarbonate, diisopropylperoxydicarbonate, bis (4-tert-butylcyclohexyl) peroxydicarbonate, and di-2-ethoxymethoxyperoxydicarbonate. Carbonate, di (2-ethylhexylperoxy) dicarbonate, dimethoxybutylperoxydicarbonate, di (3-methyl-3
-Methoxybutylperoxy) dicarbonate.

【0008】パーオキシエステル類としては、1,1,
3,3,−テトラメチルブチルパーオキシネオデカノエ
ート、1−シクロヘキシル−1−メチルエチルパーオキ
シノエデカノエート、tーヘキシルパーオキシネオデカ
ノエート、t−ブチルパーオキシピバレート、1,1,
3,3,−テトラメチルブチルパーオキシ2ーエチルヘ
キサノネート、2,5,ージメチルー2,5ージ(2ー
エチルヘキサノイルパーオキシ)ヘキサン、1−シクロ
ヘキシル−1−メチルエチルパーオキシ2−エチルヘキ
サノネート、tーヘキシルパーオキシ2ーエチルヘキサ
ノネート、tーブチルパーオキシ2ーエチルヘキサノネ
ート、tーブチルパーオキシイソブチレート、1,1ー
ビス(tーブチルパーオキシ)シクロヘキサン、tーヘ
キシルパーオキシイソプロピルモノカーボネート、tー
ブチルパーオキシー3,5,5ートリメチルヘキサノネ
ート、tーブチルパーオキシラウレート、2,5,ージ
メチルー2,5,ージ(mートルオイルパーオキシ)ヘ
キサン、tーブチルパーオキシイソプロピルモノカーボ
ネート、tーブチルパーオキシ2ーエチルヘキシルモノ
カーボネート、tーヘキシルパーオキシベンゾエート、
tーブチルパーオキシアセテート等がある。
[0008] As peroxyesters, 1,1,
3,3, -tetramethylbutyl peroxy neodecanoate, 1-cyclohexyl-1-methylethyl peroxynodecanoate, t-hexyl peroxy neodecanoate, t-butyl peroxypivalate, 1, 1,
3,3, -tetramethylbutylperoxy 2-ethylhexanonate, 2,5-dimethyl-2,5-di (2-ethylhexanoylperoxy) hexane, 1-cyclohexyl-1-methylethylperoxy 2- Ethyl hexanonate, t-hexyl peroxy 2-ethyl hexanonate, t-butyl peroxy 2-ethyl hexanonate, t-butyl peroxyisobutyrate, 1,1-bis (t-butyl peroxy) cyclohexane , T-hexylperoxyisopropyl monocarbonate, t-butylperoxy-3,5,5-trimethylhexanonate, t-butylperoxylaurate, 2,5-dimethyl-2,5, di (m-toluene oil) Peroxy) hexane, t-butylperoxyisopropyl monocarbonate, t-butyl Peroxy 2-ethylhexyl monocarbonate, t chromatography hexyl peroxybenzoate,
t-butyl peroxyacetate and the like.

【0009】パーオキシケタール類では、1,1,ービ
ス(tーヘキシルパーオキシ)ー3,3,5ートリメチ
ルシクロヘキサン、1,1ービス(tーヘキシルパーオ
キシ)シクロヘキサン、1,1ービス(tーブチルパー
オキシ)−3,3,5ートリメチルシクロヘキサン、
1、1ー(tーブチルパーオキシ)シクロドデカン、
2,2ービス(tーブチルパーオキシ)デカン等があ
る。
The peroxyketals include 1,1, -bis (t-hexylperoxy) -3,3,5-trimethylcyclohexane, 1,1-bis (t-hexylperoxy) cyclohexane, and 1,1-bis (t -Butylperoxy) -3,3,5-trimethylcyclohexane,
1,1,1- (t-butylperoxy) cyclododecane,
2,2-bis (t-butylperoxy) decane and the like.

【0010】ジアルキルパーオキサイド類では、α,
α’ビス(tーブチルパーオキシ)ジイソプロピルベン
ゼン、ジクミルパーオキサイド、2,5,ージメチルー
2,5,ージ(tーブチルパーオキシ)ヘキサン、tー
ブチルクミルパーオキサイド等がある。
[0010] Among the dialkyl peroxides, α,
α'bis (t-butylperoxy) diisopropylbenzene, dicumyl peroxide, 2,5-dimethyl-2,5, di (t-butylperoxy) hexane, t-butylcumyl peroxide and the like.

【0011】ハイドロパーオキサイド類では、ジイソプ
ロピルベンゼンハイドロパーオキサイド、クメンハイド
ロパーオキサイド等がある。これらの遊離ラジカル発生
剤は単独または混合して使用することができ、分解促進
剤、抑制剤等を混合して用いてもよい。また、これらの
硬化剤をポリウレタン系、ポリエステル系の高分子物質
等で被覆してマイクロカプセル化したものは、可使時間
が延長されるために好ましい。
Hydroperoxides include diisopropylbenzene hydroperoxide, cumene hydroperoxide and the like. These free radical generators can be used alone or as a mixture, and a decomposition accelerator, an inhibitor and the like may be used as a mixture. A microcapsule obtained by coating these curing agents with a polyurethane-based or polyester-based polymer substance or the like is preferable because the pot life is extended.

【0012】本発明で用いるラジカル重合性物質として
は、ラジカルにより重合する官能基を有する物質であ
り、アクリレート、メタクリレート等が挙げられる。ラ
ジカル重合性物質はモノマー、オリゴマーいずれの状態
で用いることが可能であり、モノマーとオリゴマーを併
用することも可能である。アクリレート(メタクリレー
ト)の具体例てしては、メチルアクリレート、エチルア
クリレート、イソプロピルアクリレート、イソブチルア
クリレート、エチレングリコールジアクリレート、ジエ
チレングリコールジアクリレート、トリメチロールプロ
パントリアクリレート、テトラメチロールメタンテトラ
アクリレート、2ーヒドロキシ1。3ジアクリロキシプ
ロパン、2,2ービス〔4ー(アクリロキシメトキシ)
フェニル〕プロパン、2,2ービス〔4ー(アクリロキ
シポリエトキシ)フェニル〕プロパン、ジシクロペンテ
ニルアクリレート、トリシクロデカニルアクリレート、
トリス(アクリロイロキシエチル)イソシアヌレート等
がある。これらは単独または併用してもちいることがで
き、必要によっては、ハイドロキノン、メチルエーテル
ハイドロキノン類などの重合禁止剤を適宜用いてもよ
い。また、ジシクロペンテニル基および/またはトリシ
クロデカニル基および/またはトリアジン環を有する場
合は、耐熱性が向上するので好ましい。
The radically polymerizable substance used in the present invention is a substance having a functional group capable of being polymerized by a radical, such as acrylate and methacrylate. The radical polymerizable substance can be used in any state of a monomer and an oligomer, and the monomer and the oligomer can be used in combination. Specific examples of acrylate (methacrylate) include methyl acrylate, ethyl acrylate, isopropyl acrylate, isobutyl acrylate, ethylene glycol diacrylate, diethylene glycol diacrylate, trimethylolpropane triacrylate, tetramethylol methane tetraacrylate, and 2-hydroxy 1.3. Diacryloxypropane, 2,2-bis [4- (acryloxymethoxy)
Phenyl] propane, 2,2-bis [4- (acryloxypolyethoxy) phenyl] propane, dicyclopentenyl acrylate, tricyclodecanyl acrylate,
Tris (acryloyloxyethyl) isocyanurate and the like. These can be used alone or in combination. If necessary, a polymerization inhibitor such as hydroquinone or methyl ether hydroquinone may be used as appropriate. In addition, it is preferable to have a dicyclopentenyl group and / or a tricyclodecanyl group and / or a triazine ring, since heat resistance is improved.

【0013】上記ラジカル重合性物質中には、ポリスチ
レン、ポリエチレン、ポリビニルブチラール、ポリビニ
ルホルマール、ポリイミド、ポリアミド、ポリエステ
ル、ポリ塩化ビニル、ポリフェニレンオキサイド、尿素
樹脂、メラミン樹脂、フェノール樹脂、キシレン樹脂、
エポキシ樹脂、ポリイソシアネート樹脂、フェノキシ樹
脂などのポリマー類を含有した場合取扱い性もよく硬化
時の応力緩和に優れるため好ましく、水酸基等の官能基
を有する場合接着性が向上するためより好ましい。各ポ
リマーをラジカル重合性の官能基で変性したものがより
好ましい。これらポリマーの分子量は10000以上が
好ましいが1000000以上になると混合性が悪くな
る。
The above radical polymerizable substances include polystyrene, polyethylene, polyvinyl butyral, polyvinyl formal, polyimide, polyamide, polyester, polyvinyl chloride, polyphenylene oxide, urea resin, melamine resin, phenol resin, xylene resin,
Polymers such as epoxy resins, polyisocyanate resins, and phenoxy resins are preferred because they have good handleability and are excellent in stress relaxation during curing, and those having a functional group such as a hydroxyl group are more preferred because they improve adhesion. It is more preferable that each polymer is modified with a radical polymerizable functional group. The molecular weight of these polymers is preferably 10,000 or more, but when the molecular weight is more than 1,000,000, the mixing property deteriorates.

【0014】さらに、充填材、軟化剤、促進剤、老化防
止剤、着色剤、難燃化剤、チキソトロピック剤、カップ
リング剤及びフェノール樹脂やメラミン樹脂、イソシア
ネート類等を含有することもできる。充填材を含有した
場合、接続信頼性等の向上が得られるので好ましい。充
填材の最大径が導電粒子の粒径未満であれば使用でき、
5〜60体積%の範囲が好ましい。60体積%以上では
信頼性向上の効果が飽和する。カップリング剤として
は、ビニル基、アクリル基、アミノ基、エポキシ基、及
びイソシアネート基含有物が、接着性の向上の点から好
ましい。
Further, it may contain a filler, a softening agent, an accelerator, an antioxidant, a coloring agent, a flame retardant, a thixotropic agent, a coupling agent, a phenol resin, a melamine resin, and an isocyanate. It is preferable to include a filler, because an improvement in connection reliability and the like can be obtained. Can be used if the maximum diameter of the filler is less than the particle diameter of the conductive particles,
A range of 5 to 60% by volume is preferred. At 60% by volume or more, the effect of improving reliability is saturated. As the coupling agent, a vinyl group, an acryl group, an amino group, an epoxy group, and an isocyanate group-containing material are preferable from the viewpoint of improving the adhesiveness.

【0015】本発明で用いられる導電性粒子としては、
Au、Ag、Ni、Cu、はんだ等の金属粒子やカーボ
ン等があり、十分な保存性を得るためには、表層はN
i、Cuなどの遷移金属類ではなくAu、Ag、白金族
の貴金属類が好ましくAuがより好ましい。また、Ni
などの遷移金属類の表面をAu等の貴金属類で被覆した
ものでもよい。また、非導電性のガラス、セラミック、
プラスチック等に前記した導通層を被覆等により形成し
最外層を貴金属類としたものは、加熱加圧により変形性
を有するので接続時に電極との接触面積が増加し信頼性
が向上するので好ましい。貴金族類の被覆層の厚みは良
好な抵抗を得るためには、100オングストロ−ム以上
が好ましい。しかし、Ni等の遷移金属の上に貴金属類
の層を設ける場合では、貴金属類層の欠損や導電粒子の
混合分散時に生じる貴金属類層の欠損等により生じる酸
化還元作用で遊離ラジカルが発生し保存性低下引き起こ
すため、300オングストロ−ム以上が好ましい。導電
性粒子は、接着剤樹脂成分100部(体積)に対して
0.1〜30部(体積)の範囲で用途により使い分け
る。過剰な導電性粒子による隣接回路の短絡等を防止す
るためには0.1〜10部(体積)とするのがより好ま
しい。
The conductive particles used in the present invention include:
There are metal particles such as Au, Ag, Ni, Cu, and solder, carbon, and the like.
Instead of transition metals such as i and Cu, Au, Ag, and platinum group noble metals are preferable, and Au is more preferable. Also, Ni
The surface of a transition metal such as may be coated with a noble metal such as Au. In addition, non-conductive glass, ceramic,
The conductive layer formed of a plastic or the like by coating or the like and the outermost layer made of a noble metal is preferable because it has a deformability due to heating and pressurizing, so that a contact area with an electrode increases at the time of connection and reliability is improved. The thickness of the noble metals coating layer is preferably 100 Å or more in order to obtain good resistance. However, in the case where a layer of a noble metal is provided on a transition metal such as Ni, free radicals are generated due to oxidation-reduction action caused by a defect of the noble metal layer or a defect of the noble metal layer generated when mixing and dispersing the conductive particles. In order to cause deterioration in the properties, the thickness is preferably 300 Å or more. The conductive particles are properly used in a range of 0.1 to 30 parts (volume) with respect to 100 parts (volume) of the adhesive resin component depending on the use. In order to prevent a short circuit or the like in an adjacent circuit due to excessive conductive particles, the content is more preferably 0.1 to 10 parts (volume).

【0016】また、本構成の回路接続材料を2層以上に
分割し、遊離ラジカルを発生する硬化剤を含有する層と
導電粒子を含有する層に分離した場合、従来の高精細化
可能の効果に加えて、保存性の向上が得られる。
Further, when the circuit connecting material of the present configuration is divided into two or more layers and separated into a layer containing a hardener generating free radicals and a layer containing conductive particles, the conventional effect of achieving higher definition can be obtained. In addition, storage stability can be improved.

【0017】本発明の回路用接続材料は、ICチップと
基板との接着や電気回路相互の接着用のフィルム状接着
剤としても有用である。本発明で得た回路接続材料を用
いた電極の接続について説明する。この方法は、回路接
続材料を基板上の相対峙する電極間に形成し、加熱加圧
により両電極の接触と基板間の接着を得る電極の接続方
法である。電極を形成する基板としては、半導体、ガラ
ス、セラミック等の無機質、ポリイミド、ポリカーボネ
ート等の有機物、ガラス/エポキシ等のこれら複合の各
組み合わせが適用できる。
The circuit connecting material of the present invention is also useful as a film adhesive for bonding an IC chip to a substrate and for bonding electric circuits to each other. The connection of the electrodes using the circuit connection material obtained in the present invention will be described. In this method, a circuit connecting material is formed between opposing electrodes on a substrate, and the electrodes are connected by heating and pressing to obtain contact between the electrodes and adhesion between the substrates. As a substrate on which electrodes are formed, inorganic materials such as semiconductors, glass, and ceramics, organic materials such as polyimide and polycarbonate, and combinations of these composite materials such as glass / epoxy can be used.

【0018】また本発明の回路接続材料は、例えばフェ
イスダウン方式により半導体チップを基板と接着フィル
ムで接着固定すると共に両者の電極どうしを電気的に接
続する場合にも使用できる。すなわち、第一の接続端子
を有する第一の回路部材と、第二の接続端子を有する第
二の回路部材とを、第一の接続端子と第二の接続端子を
対向して配置し、前記対向配置した第一の接続端子と第
二の接続端子の間に本発明の接続材料(フィルム状接着
剤)を介在させ、加熱加圧して前記対向配置した第一の
接続端子と第二の接続端子を電気的に接続させ回路板を
製造することができる。
The circuit connecting material of the present invention can also be used, for example, when a semiconductor chip is adhered and fixed to a substrate with an adhesive film by a face-down method and both electrodes are electrically connected. That is, a first circuit member having a first connection terminal, and a second circuit member having a second connection terminal, the first connection terminal and the second connection terminal are arranged facing each other, The connection material (film adhesive) of the present invention is interposed between the first connection terminal and the second connection terminal that are arranged to face each other, and heated and pressurized, and the first connection terminal and the second connection that are arranged to face each other. The circuit board can be manufactured by electrically connecting the terminals.

【0019】このような回路部材としては半導体チッ
プ、抵抗体チップ、コンデンサチップ等のチップ部品、
プリント基板等の基板等が用いられる。これらの回路部
材には接続端子が通常は多数(場合によっては単数でも
良い)設けられており、前記回路部材の少なくとも1組
をそれらの回路部材に設けられた接続端子の少なくとも
一部を対向配置し、対向配置した接続端子間に接着剤を
介在させ、加熱加圧して対向配置した接続端子どうしを
電気的に接続して回路板とする。回路部材の少なくとも
1組を加熱加圧することにより、対向配置した接続端子
どうしは、直接接触により又は異方導電性接着剤の導電
粒子を介して電気的に接続することができる。
Such circuit members include chip parts such as a semiconductor chip, a resistor chip, and a capacitor chip.
A board such as a printed board is used. These circuit members are usually provided with a large number of connection terminals (in some cases, a single connection terminal may be provided), and at least one set of the circuit members is arranged so that at least a part of the connection terminals provided on the circuit members are opposed to each other. Then, an adhesive is interposed between the opposed connection terminals and heated and pressed to electrically connect the opposed connection terminals to form a circuit board. By heating and pressurizing at least one set of circuit members, the connection terminals arranged to face each other can be electrically connected by direct contact or via conductive particles of an anisotropic conductive adhesive.

【0020】[0020]

【作用】本発明においては、従来のエポキシ樹脂系より
も低温速硬化性に優れかつ可使時間を有する電気・電子
用の回路接続材料を提供が可能となる。
According to the present invention, it is possible to provide an electric / electronic circuit connecting material which has excellent low-temperature and quick-curing properties and has a usable life as compared with the conventional epoxy resin system.

【0021】[0021]

【実施例】以下、本発明を実施例に基づいて詳細に説明
する。なお、それぞれの配合比は図1の表にまとめてあ
る。 実施例1 フェノキシ樹脂(ユニオンカーバイド株式会社製、商品
名PKHC、平均分子量45,000)50gを、重量
比でトルエン(沸点110.6℃、SP値8.90)/
酢酸エチル(沸点77.1℃、SP値9.10)=50
/50の混合溶剤に溶解して、固形分40%の溶液とし
た。ラジカル重合性物質としてトリヒドロキシエチルグ
リコールジメタクリレート(共栄社油脂株式会社製、商
品名80MFA)を用いた。遊離ラジカル発生剤として
ベンゾイルパーオキサイドを用いた。ポリスチレンを核
とする粒子の表面に、厚み0.2μmのニッケル層を設
け、このニッケル層の外側に、厚み0.04μmの金層
を設け、平均粒径10μmの導電性粒子を作製した。固
形重量比でフェノキシ樹脂50g、トリヒドロキシエチ
ルグリコールジメタクリレート樹脂50g、ベンゾイル
パーオキサイド5gとなるように配合し、さらに導電性
粒子を3体積%配合分散させ、厚み80μmのフッ素樹
脂フィルムに塗工装置を用いて塗布し、70℃、10分
の熱風乾燥により、接着剤層の厚みが35μmの回路接
続材料を得た。得られたフィルム状接着剤は、室温での
十分な柔軟性を示し、また40℃で10時間放置しても
フィルムの性質にはほとんど変化がなく、良好な保存性
を示した。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail based on embodiments. In addition, each compounding ratio is put together in the table of FIG. Example 1 50 g of a phenoxy resin (manufactured by Union Carbide Co., Ltd., trade name: PKHC, average molecular weight: 45,000) was mixed in a weight ratio of toluene (boiling point: 110.6 ° C, SP value: 8.90) /
Ethyl acetate (boiling point 77.1 ° C., SP value 9.10) = 50
/ 50 to obtain a solution having a solid content of 40%. As a radical polymerizable substance, trihydroxyethyl glycol dimethacrylate (trade name: 80MFA, manufactured by Kyoeisha Yushi Co., Ltd.) was used. Benzoyl peroxide was used as a free radical generator. A nickel layer having a thickness of 0.2 μm was provided on the surface of the particles having polystyrene as a core, and a gold layer having a thickness of 0.04 μm was provided outside the nickel layer to produce conductive particles having an average particle diameter of 10 μm. A phenoxy resin 50 g, trihydroxyethyl glycol dimethacrylate resin 50 g, and benzoyl peroxide 5 g were blended in a solid weight ratio, and 3 vol% of conductive particles were further blended and dispersed therein, and a coating apparatus was applied to a fluororesin film having a thickness of 80 μm. And a hot-air drying at 70 ° C. for 10 minutes to obtain a circuit connection material having an adhesive layer thickness of 35 μm. The obtained film adhesive showed sufficient flexibility at room temperature, and showed almost no change in the properties of the film even after being left at 40 ° C. for 10 hours, showing good storage stability.

【0022】実施例2、3 フェノキシ樹脂/トリヒドロキシエチルグリコールジメ
タクリレートの固形重量比を50g/50gに代えて、
30g/70g(実施例2)、70g/30g(実施例
3)とした他は、実施例1と同様にして回路接続材料を
得た。
Examples 2 and 3 The solid weight ratio of phenoxy resin / trihydroxyethyl glycol dimethacrylate was changed to 50 g / 50 g.
A circuit connecting material was obtained in the same manner as in Example 1 except that the amount was 30 g / 70 g (Example 2) and 70 g / 30 g (Example 3).

【0023】実施例4 硬化剤をトリヒドロキシエチルグリコールジメタクリレ
ートに代えて、ベンゾイルパーオキシトルエンの40重
量%トルエン溶液(日本油脂株式会社製、商品名ナイパ
ーBMTーT40)とした他は、実施例1と同様にして
回路接続材料を得た。
Example 4 Example 4 was repeated except that a 40% by weight solution of benzoyl peroxytoluene in toluene (Niper BMT-T40, manufactured by NOF Corporation) was used instead of trihydroxyethyl glycol dimethacrylate as a curing agent. In the same manner as in Example 1, a circuit connecting material was obtained.

【0024】実施例5 ベンゾイルパーオキシトルエンの40重量%トルエン溶
液(日本油脂株式会社製、商品名ナイパーBMTーT4
0)の配合量を2gとした他は、実施例1と同様にして
回路接続材料を得た。
Example 5 Benzoyl peroxytoluene in a 40% by weight toluene solution (Nipper BMT-T4, manufactured by NOF Corporation)
A circuit connecting material was obtained in the same manner as in Example 1 except that the blending amount of 0) was 2 g.

【0025】実施例6 硬化剤をトリヒドロキシエチルグリコールジメタクリレ
ートに代えて、ベンゾイルパーオキシトルエンの40重
量%トルエン溶液(日本油脂株式会社製、商品名ナイパ
ーBMTーT40)とした他は、実施例1と同様にして
回路接続材料を得た。
Example 6 The procedure of Example 6 was repeated, except that a 40% by weight benzoyl peroxytoluene solution (trade name, Niiper BMT-T40, manufactured by NOF Corporation) was used instead of trihydroxyethyl glycol dimethacrylate as the curing agent. In the same manner as in Example 1, a circuit connecting material was obtained.

【0026】実施例7 硬化剤をトリヒドロキシエチルグリコールジメタクリレ
ートに代えて、tーヘキシルパーオキシ2ーエチルヘキ
サノネートの50重量%DOP溶液(日本油脂株式会社
製、商品名パーキュアHO)とした他は、実施例1と同
様にして回路接続材料を得た。
Example 7 A 50% by weight DOP solution of t-hexylperoxy 2-ethylhexanonate (trade name Percure HO, manufactured by NOF Corporation) was used in place of trihydroxyethyl glycol dimethacrylate as a curing agent. Otherwise, a circuit connecting material was obtained in the same manner as in Example 1.

【0027】実施例8 平均分子量45,000のフェノキシ樹脂(PKHC)
100gに末端にアクリル基を持つモノイソシアネート
5gを一般的方法で反応させて、アクリル基で変性した
フェノキシ樹脂を作製した。このフェノキシ樹脂を用い
た他は実施例1と同様にして回路接続材料を得た。
Example 8 Phenoxy resin (PKHC) having an average molecular weight of 45,000
5 g of a monoisocyanate having an acrylic group at the terminal was reacted with 100 g by a general method to prepare a phenoxy resin modified with an acrylic group. A circuit connecting material was obtained in the same manner as in Example 1 except that this phenoxy resin was used.

【0028】実施例9 導電性粒子を平均粒径2μmのNi粒子の表面をAuで
被覆(被覆厚み0.08μm)したものを用いて、0.
5部(体積)とした他は、実施例1と同様にして回路接
続材料を得た。
Example 9 Ni particles having an average particle diameter of 2 μm coated with Au (0.08 μm coating thickness) were used as conductive particles.
A circuit connecting material was obtained in the same manner as in Example 1 except that the amount was 5 parts (volume).

【0029】実施例10 導電性粒子の粒径を5μmとした他は、実施例1と同様
にして回路接続材料を得た。
Example 10 A circuit connecting material was obtained in the same manner as in Example 1, except that the particle size of the conductive particles was changed to 5 μm.

【0030】実施例11 ラジカル重合性物質としてトリヒドロキシエチルグリコ
ールジメタクリレート(共栄社油脂株式会社製、商品名
80MFA)30gとジシクロペンテニルアクリレート
20gを用いた他は、実施例1と同様にして回路接続材
料を得た。
Example 11 Circuit connection was performed in the same manner as in Example 1 except that 30 g of trihydroxyethyl glycol dimethacrylate (trade name: 80MFA, manufactured by Kyoeisha Yushi Co., Ltd.) and 20 g of dicyclopentenyl acrylate were used as radical polymerizable substances. The material was obtained.

【0031】実施例12 ラジカル重合性物質としてトリヒドロキシエチルグリコ
ールジメタクリレート(共栄社油脂株式会社製、商品名
80MFA)30gとトリシクロデカニルアクリレート
20gを用いた他は、実施例1と同様にして回路接続材
料を得た。
Example 12 A circuit was prepared in the same manner as in Example 1 except that 30 g of trihydroxyethyl glycol dimethacrylate (trade name: 80MFA, manufactured by Kyoeisha Yushi Co., Ltd.) and 20 g of tricyclodecanyl acrylate were used as radically polymerizable substances. The connection material was obtained.

【0032】実施例13 ラジカル重合性物質としてトリヒドロキシエチルグリコ
ールジメタクリレート(共栄社油脂株式会社製、商品名
80MFA)40gとトリス(アクリロイロキシエチ
ル)イソシアヌレート10gを用いた他は、実施例1と
同様にして回路接続材料を得た。
Example 13 The procedure of Example 1 was repeated except that 40 g of trihydroxyethyl glycol dimethacrylate (trade name: 80MFA, manufactured by Kyoeisha Yushi Co., Ltd.) and 10 g of tris (acryloyloxyethyl) isocyanurate were used as radical polymerizable substances. Similarly, a circuit connecting material was obtained.

【0033】実施例14 ラジカル重合性物質として2.2−ビス{4−(アクリ
ロキシ・ジエトキシ)フェニル}プロパン(新中村化学
(株)製、商品名 A−BPE−4)を用いた他は、実
施例1と同様にして回路接続材料を得た。
Example 14 Except that 2.2-bis {4- (acryloxydiethoxy) phenyl} propane (trade name: A-BPE-4, manufactured by Shin-Nakamura Chemical Co., Ltd.) was used as the radical polymerizable substance. A circuit connecting material was obtained in the same manner as in Example 1.

【0034】実施例15 フェノキシ樹脂をポリビニルブチラール樹脂(電気化学
工業(株)製、商品名PVB3000K)とした他は、
実施例1と同様にして回路接続材料を得た。
Example 15 Except that the phenoxy resin was polyvinyl butyral resin (trade name: PVB3000K, manufactured by Denki Kagaku Kogyo KK)
A circuit connecting material was obtained in the same manner as in Example 1.

【0035】実施例16 導電性粒子を平均粒径2μmのNi粒子の表面をPdで
被覆(被覆厚み0.04μm)したものを用いて、0.
5体積%とした他は、実施例1と同様にして回路接続材
料を得た。
Example 16 Ni particles having an average particle size of 2 μm coated with conductive particles and coated with Pd (coating thickness 0.04 μm) were used.
A circuit connecting material was obtained in the same manner as in Example 1 except that the content was 5% by volume.

【0036】比較例1 硬化剤を、ジーtーブチルパーオキサイドとした他は、
実施例1と同様にして回路接続材料を得た。
Comparative Example 1 Except that di-t-butyl peroxide was used as a curing agent,
A circuit connecting material was obtained in the same manner as in Example 1.

【0037】比較例2 硬化剤を、イソブチルパーオキサイドとした他は、実施
例1と同様にして回路接続材料を得た。
Comparative Example 2 A circuit connecting material was obtained in the same manner as in Example 1, except that isobutyl peroxide was used as the curing agent.

【0038】比較例3 導電性粒子を平均粒径2μmのNi粒子とした他は、実
施例1と同様にして回路接続材料を得た。
Comparative Example 3 A circuit connecting material was obtained in the same manner as in Example 1, except that the conductive particles were Ni particles having an average particle size of 2 μm.

【0039】比較例4 導電性粒子の金めっき層の厚みを0.02μmとしたほ
かは、実施例10と同様にして回路接続材料を得た。
Comparative Example 4 A circuit connecting material was obtained in the same manner as in Example 10, except that the thickness of the gold plating layer of the conductive particles was 0.02 μm.

【0040】回路の接続 上述の回路接続材料を用いて、ライン幅50μm、ピッ
チ100μm、厚み18μmの銅回路を500本有する
フレキシブル回路板(FPC)同士を160℃、3MP
aで10秒間加熱加圧して幅2mmにわたり接続した。
この時、あらかじめ一方のFPC上に、回路接続材料の
接着面を貼り付けた後、70℃、0.5MPaで5秒間
加熱加圧して仮接続し、その後、フッ素樹脂フィルムを
剥離してもう一方のFPCと接続した。
Circuit Connection Using the above-described circuit connection material, a flexible circuit board (FPC) having 500 copper circuits having a line width of 50 μm, a pitch of 100 μm, and a thickness of 18 μm is connected to each other at 160 ° C. and 3MP.
a and heated and pressed for 10 seconds to connect over a width of 2 mm.
At this time, after the adhesive surface of the circuit connecting material is pasted on one of the FPCs in advance, the connection is made temporarily by heating and pressing at 70 ° C. and 0.5 MPa for 5 seconds, and then the fluororesin film is peeled off and the other side is removed. FPC.

【0041】接続抵抗の測定 回路の接続後、上記接続部を含むFPCの隣接回路間の
抵抗値を、初期と、85℃、85%RHの高温高湿槽中
に500時間保持した後にマルチメータで測定した。抵
抗値は隣接回路間の抵抗150点の平均(x+3σ)で
示した。 実施例1で得られた回路接続材料は良好な接
続信頼性を示した。また、初期の接続抵抗も低く、高温
高湿試験後の抵抗の上昇もわずかであり、高い耐久性を
示した。また、実施例2〜16の回路接続材料も同様に
良好な接続信頼性が得ら、いずれの場合も室温で10日
以上の良好な保存性を有した。これらに対して、比較例
1は、用いた硬化剤の反応性が低く、保存性は室温で1
0日以上と長いが、硬化反応が不十分であるため接着状
態が悪く、初期の接続抵抗も高くなった。また、比較例
2では用いた硬化剤の反応性が非常に高く、初期では良
好な接続が得られたが、保存性1日と短かった。さら
に、比較例3ではNi粒子が遷移金属であるために酸化
還元作用により初期では良好な接続が得られたが、保存
性1日と短かった。また、比較例4では金めっき層が薄
いために比較例3と同様に保存性が短くなった。
Measurement of connection resistance After connecting the circuits, the multimeter was used to hold the resistance between the adjacent circuits of the FPC including the above-mentioned connection parts in the initial stage and in a high-temperature and high-humidity bath at 85 ° C. and 85% RH for 500 hours. Was measured. The resistance value was represented by an average (x + 3σ) of 150 points of resistance between adjacent circuits. The circuit connection material obtained in Example 1 showed good connection reliability. In addition, the initial connection resistance was low, and the resistance after the high-temperature and high-humidity test rose slightly, indicating high durability. In addition, the circuit connection materials of Examples 2 to 16 also obtained good connection reliability, and in any case, had good storage stability for 10 days or more at room temperature. On the other hand, in Comparative Example 1, the reactivity of the curing agent used was low, and the storage stability was 1 at room temperature.
Although it was as long as 0 days or more, the adhesion was poor due to insufficient curing reaction, and the initial connection resistance was high. In Comparative Example 2, the reactivity of the curing agent used was very high, and a good connection was obtained in the initial stage, but the storage stability was as short as one day. Furthermore, in Comparative Example 3, since the Ni particles were a transition metal, a good connection was initially obtained due to the oxidation-reduction action, but the storage stability was as short as one day. Further, in Comparative Example 4, the storage stability was shortened similarly to Comparative Example 3 because the gold plating layer was thin.

【0042】接着力の測定 回路の接続後、90度剥離、剥離速度50mm/min
で接着力測定を行った。比較例1〜4では200gf/
cm程度と接着力が低いが、実施例1〜16では100
0gf/cm程度と良好な接着力が得られた。
Measurement of Adhesive Strength After connection of the circuit, 90 ° peeling, peeling speed 50 mm / min
Was used to measure the adhesive strength. In Comparative Examples 1 to 4, 200 gf /
cm, but in Examples 1 to 16, the adhesive strength is low.
Good adhesive strength of about 0 gf / cm was obtained.

【0043】[0043]

【発明の効果】以上詳述したように本発明によれば、従
来のエポキシ樹脂系よりも低温速硬化性に優れかつ可使
時間を有する電気・電子用の回路接続材料を提供が可能
となる。
As described above in detail, according to the present invention, it is possible to provide a circuit connecting material for electric / electronic devices which is excellent in low-temperature and quick-curing properties and has a long working life as compared with the conventional epoxy resin system. .

【図面の簡単な説明】[Brief description of the drawings]

【図1】 実施例、比較例の接続部の接着力、接続抵抗
の測定結果を示す表である。
FIG. 1 is a table showing the measurement results of the adhesive strength and the connection resistance of a connection portion in Examples and Comparative Examples.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI C09J 201/00 C09J 201/00 H01B 1/20 H01B 1/20 D H01L 21/60 311 H01L 21/60 311S H05K 3/38 H05K 3/38 E ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 Identification code FI C09J 201/00 C09J 201/00 H01B 1/20 H01B 1/20 D H01L 21/60 311 H01L 21/60 311S H05K 3/38 H05K 3/38 E

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 相対峙する回路電極間に介在され、相対
向する回路電極を加圧し加圧方向の電極間を電気的に接
続する接続材料であって、下記(1)〜(3)の成分を
必須とする回路接続材料。 (1)加熱により遊離ラジカルを発生する硬化剤 (2)ラジカル重合性物質 (3)表面層が金、銀および白金族の金属から選ばれる
少なくとも1種で構成される導電性粒子
1. A connecting material interposed between opposed circuit electrodes and pressurizing the opposed circuit electrodes to electrically connect the electrodes in the pressing direction. Circuit connection material that requires components. (1) Curing agent that generates free radicals upon heating (2) Radical polymerizable substance (3) Conductive particles whose surface layer is composed of at least one selected from gold, silver and platinum group metals
【請求項2】 加熱により遊離ラジカルを発生する硬化
剤の半減期10時間の温度が40℃以上かつ、半減期1
分の温度が180℃以下である請求項1記載の回路接続
材料。
2. The curing agent which generates free radicals by heating has a half-life of 10 hours at a temperature of 40 ° C. or more and a half-life of 1 hour.
The circuit connecting material according to claim 1, wherein the temperature of the minute is 180 ° C or less.
【請求項3】 表面層の金属の厚みが300オングスト
ロ−ム以上ある請求項1〜3各項記載の回路接続材料。
3. The circuit connecting material according to claim 1, wherein the thickness of the metal of the surface layer is 300 Å or more.
【請求項4】 第一の接続端子を有する第一の回路部材
と、第二の接続端子を有する第二の回路部材とを、第一
の接続端子と第二の接続端子を対向して配置し、前記対
向配置した第一の接続端子と第二の接続端子の間に請求
項1〜3各項記載の回路接続材料を介在させ、加熱加圧
して前記対向配置した第一の接続端子と第二の接続端子
を電気的に接続させる回路板の製造法。
4. A first circuit member having a first connection terminal and a second circuit member having a second connection terminal are arranged with the first connection terminal and the second connection terminal facing each other. Then, the circuit connection material according to any one of claims 1 to 3 is interposed between the first connection terminal and the second connection terminal arranged opposite to each other, and the first connection terminal arranged opposite to each other by heating and pressing. A method of manufacturing a circuit board for electrically connecting a second connection terminal.
JP7942597A 1997-03-31 1997-03-31 Circuit connecting material and production of circuit board Pending JPH10273626A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7942597A JPH10273626A (en) 1997-03-31 1997-03-31 Circuit connecting material and production of circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7942597A JPH10273626A (en) 1997-03-31 1997-03-31 Circuit connecting material and production of circuit board

Related Child Applications (3)

Application Number Title Priority Date Filing Date
JP2007325159A Division JP2008169389A (en) 2007-12-17 2007-12-17 Circuit connecting material and method of manufacturing circuit board
JP2007325177A Division JP2008106282A (en) 2007-12-17 2007-12-17 Circuit connection material and method for producing circuit board
JP2007325201A Division JP2008106283A (en) 2007-12-17 2007-12-17 Circuit connection material and method for producing circuit board

Publications (1)

Publication Number Publication Date
JPH10273626A true JPH10273626A (en) 1998-10-13

Family

ID=13689525

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7942597A Pending JPH10273626A (en) 1997-03-31 1997-03-31 Circuit connecting material and production of circuit board

Country Status (1)

Country Link
JP (1) JPH10273626A (en)

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US6777464B1 (en) 1997-03-31 2004-08-17 Hitachi Chemical Company, Ltd. Circuit connecting material, and structure and method of connecting circuit terminal
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US7967943B2 (en) 1997-03-31 2011-06-28 Hitachi Chemical Company, Ltd. Circuit-connecting material and circuit terminal connected structure and connecting method
US7879956B2 (en) 1997-03-31 2011-02-01 Hitachi Chemical Company, Ltd. Circuit-connecting material and circuit terminal connected structure and connecting method
US6777464B1 (en) 1997-03-31 2004-08-17 Hitachi Chemical Company, Ltd. Circuit connecting material, and structure and method of connecting circuit terminal
US7629050B2 (en) 1997-03-31 2009-12-08 Hitachi Chemical Company, Ltd. Circuit-connecting material and circuit terminal connected structure and connecting method
US7604868B2 (en) 1997-03-31 2009-10-20 Hitachi Chemical Company, Ltd. Electronic circuit including circuit-connecting material
US7618713B2 (en) 1997-03-31 2009-11-17 Hitachi Chemical Company, Ltd. Circuit-connecting material and circuit terminal connected structure and connecting method
US7629056B2 (en) 1997-03-31 2009-12-08 Hitachi Chemical Company, Ltd. Circuit-connecting material and circuit terminal connected structure and connecting method
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US8029911B2 (en) 2000-04-25 2011-10-04 Hitachi Chemical Company, Ltd. Adhesive for circuit connection, circuit connection method using the same, and circuit connected structure
JP2007169632A (en) * 2000-04-25 2007-07-05 Hitachi Chem Co Ltd Adhesive for circuit connection, circuit connection method using the same and circuit connection structure
JP2002201437A (en) * 2000-12-28 2002-07-19 Hitachi Chem Co Ltd Adhesive composition, and connection method and connection structure of circuit terminal using the same
US7309917B2 (en) 2002-08-29 2007-12-18 Fujitsu Limited Multilayer board and a semiconductor device
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JP2005347273A (en) * 2005-06-06 2005-12-15 Hitachi Chem Co Ltd Thermally cross-linking type circuit-connecting material and method for producing circuit board by using the same
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