JPH10244391A - Marking pattern forming device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To form a marking pattern with large line width on a work in a short time by controlling the diaphragming quantity of an aperture provided on the light path of the laser beam from a laser beam oscillator to a laser beam scanning means according to the line width of the marking pattern. SOLUTION: An aperture (variable diaphragm) 8 is provided on the light path of the laser beam 2 from a laser beam oscillator 1 to a laser beam scanning device 3. The aperture 8 is connected to a controller 10 through a driver 9, and the diaphragming quantity (the diameter of an opening) is varied by the signal to be transmitted from the controller 10. The controller 10 has the function to control the diaphragming quantity of the aperture 8 according to the line width of the marking pattern. More specifically, the output of the laser beam 2 is increased as the diaphragming quantity of the aperture 8 is reduced (the diameter of the opening is increased), and the diaphragming quantity of the aperture 8 is increased when the line width of the making pattern is small, while the diaphragming quantity is reduced when the line width of the making pattern is large.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a marking pattern forming apparatus for forming a marking pattern such as characters and symbols on a workpiece, and more particularly to a marking pattern forming apparatus for forming a marking pattern by a laser beam. is there.

[0002]

2. Description of the Related Art Conventionally, this type of marking pattern forming apparatus has a laser oscillator, which irradiates a laser beam oscillated from the laser oscillator to an object to be processed through an fθ lens and a laser such as a scan mirror. A marking pattern is formed on a workpiece by scanning a laser beam in the X direction and the Y direction by an optical scanning unit. In this case, there are a method of forming a marking pattern by scanning while rotating the laser beam in a spiral shape so as to draw an arc, and a method of painting the contour of the marking pattern.

[0003]

However, in the above-described marking pattern forming apparatus, when the line width of the marking pattern is larger than the beam diameter of the laser light, for example, the laser light is rotated and scanned spirally. Alternatively, since the marking pattern is formed on the workpiece by repeatedly linearly scanning the laser beam in the same direction many times while gradually moving the workpiece, there is a problem that the marking time is long.

The present invention has been made in view of the above problems, and an object thereof is to provide a marking pattern forming apparatus capable of forming a marking pattern having a large line width on a workpiece in a short time. Is what you do.

[0005]

SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention provides a laser beam scanning method for irradiating a workpiece with laser light oscillated from a laser oscillator and scanning the laser light in a two-dimensional direction. A marking pattern forming apparatus provided with a means, wherein an aperture is provided on an optical path of the laser light from the laser oscillator to the laser light scanning means, and an aperture amount of the aperture is controlled according to a line width of the marking pattern. A control means is provided.

According to the above arrangement, the beam diameter of the laser beam changes according to the line width of the marking pattern. This makes it possible to form a marking pattern with a large line width on the workpiece without performing laser light scanning many times,
Processing time can be reduced.

[0007]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to FIGS. In FIG. 1, 1
Is a Q-switched laser oscillator.
The laser beam 2 oscillated by the laser beam is irradiated on the workpiece 5 through the laser beam scanning device 3 and the fθ lens 4.

The laser beam scanning device 3 scans the laser beam 2 in the two-dimensional direction to form a marking pattern on the workpiece 5. The laser beam scanning device 3 scans the laser beam 2 in the X direction in FIG. The direction scanning mirror 6 and the laser beam 2 are
And a Y-direction scanning mirror 7 that scans in the direction.

An aperture (variable stop) 8 is provided on the optical path of the laser beam 2 from the laser oscillator 1 to the laser beam scanning device 3. The aperture 8 is connected to a controller 10 via a driver 9, and the amount of aperture (aperture diameter) can be changed by a signal transmitted from the controller 10.

The controller 10 controls the aperture amount of the aperture 8 according to the line width of the marking pattern. In addition to the function of controlling the aperture amount of the aperture 8, the controller 10 controls the aperture amount of the aperture 8. It has a function of controlling the output of the laser light 2.

More specifically, as shown in FIG. 2, the controller 10 increases the output of the laser beam 2 as the aperture of the aperture 8 decreases (the aperture diameter of the aperture 8 increases).

In the above configuration, the controller 10
As shown in FIG. 3, when the line width of the marking pattern is small, the aperture amount of the aperture 8 is increased, and when the line width of the marking pattern is large, the aperture amount of the aperture 8 is decreased.

As described above, when the aperture of the aperture 8 is controlled by the controller 10 according to the line width of the marking pattern, the beam diameter of the laser beam 2 changes according to the aperture of the aperture 8 as shown in FIG. I do. Accordingly, a marking pattern having a large line width can be formed on the workpiece 5 without performing the scanning with the laser light 2 many times, and the processing time can be reduced.

In the above-described embodiment, the output of the laser beam 2 is controlled in accordance with the amount of aperture of the aperture 8, so that the workpiece 5 can be irradiated with the laser beam 2 having a constant power density. In addition, a marking pattern having a constant density can be formed on the workpiece 5. The aperture 8
As a method of controlling the output of the laser beam 2 according to the aperture amount of the laser beam, for example, a method of controlling the voltage applied to the laser oscillator 1, or a method of controlling the pressure of the gas laser medium when the laser oscillator 1 is a gas laser device When the laser oscillator 1 has a Q switch, a method of controlling high-frequency power to the Q switch can be considered.

[0015]

As described above, according to the present invention, it is possible to provide a marking pattern forming apparatus capable of forming a marking pattern having a large line width on a workpiece in a short time.

[Brief description of the drawings]

FIG. 1 is a diagram showing a schematic configuration of a marking pattern forming apparatus according to an embodiment of the present invention.

FIG. 2 is a diagram showing the relationship between the aperture amount of the aperture and the laser output in the embodiment.

FIG. 3 is a diagram showing a relationship between a line width of a marking pattern and an aperture amount of an aperture in the embodiment.

FIG. 4 is a diagram showing the relationship between the aperture amount of the aperture and the beam diameter in the embodiment.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Laser oscillator 2 ... Laser beam 3 ... Laser beam scanning device 4 ... ftheta lens 5 ... Workpiece 8 ... Aperture 10 ... Controller

Claims (3)

[Claims] 1. A marking pattern forming apparatus comprising: a laser beam oscillating means for irradiating a laser beam oscillated from a laser oscillator onto a workpiece and scanning the laser beam in a two-dimensional direction. A marking pattern forming apparatus, comprising: an aperture provided on an optical path of the laser light reaching an optical scanning means; and a control means for controlling a stop amount of the aperture according to a line width of the marking pattern. 2. The marking pattern forming apparatus according to claim 1, wherein said control means has a function of controlling an output of said laser light in accordance with an aperture amount of said aperture. 3. The marking pattern forming apparatus according to claim 2, wherein the control means increases the output of the laser light as the aperture of the aperture decreases.