JPH1022628A - Method for filling conductor into via hole - Google Patents
Method for filling conductor into via holeInfo
- Publication number
- JPH1022628A JPH1022628A JP8174012A JP17401296A JPH1022628A JP H1022628 A JPH1022628 A JP H1022628A JP 8174012 A JP8174012 A JP 8174012A JP 17401296 A JP17401296 A JP 17401296A JP H1022628 A JPH1022628 A JP H1022628A
- Authority
- JP
- Japan
- Prior art keywords
- laser light
- via hole
- conductor
- paste
- light transmitting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、基板に形成された
ビアホール内に導体を充填する方法に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for filling a via hole formed in a substrate with a conductor.
【0002】[0002]
【従来の技術】基板に貫通形成されたビアホールには、
従来、スクリーン印刷やピン転写等の手法によって導体
ペーストを押し入れて導体の充填が行われている。2. Description of the Related Art Via holes formed through a substrate include:
2. Description of the Related Art Conventionally, conductor filling has been performed by pushing in a conductor paste by a technique such as screen printing or pin transfer.
【0003】[0003]
【発明が解決しようとする課題】近年では高密度配線基
板の作成に対する要望が高く、これに対応するにはビア
ホールの内径を微小にし、しかも形成ピッチも狭小にす
る必要がある。In recent years, there has been a high demand for producing a high-density wiring board, and in order to cope with this, it is necessary to make the inside diameter of the via hole small and also to make the formation pitch narrow.
【0004】しかしながら、上記の従来方法では、微小
内径及び狭小ピッチのビアホール内に導体ペーストを充
分に充填することが極めて困難であり、充填不良の問題
を頻繁に生じる問題点がある。However, in the above-mentioned conventional method, it is extremely difficult to sufficiently fill a conductive paste into a via hole having a small inner diameter and a narrow pitch, and there is a problem that frequent filling problems occur.
【0005】本発明は上記問題点に鑑みてなされたもの
で、その目的とするところは、微小内径及び狭小ピッチ
のビアホール内に導体ペーストを的確に充填できるビア
ホールへの導体充填方法を提供することにある。SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and an object of the present invention is to provide a method of filling a via hole with a conductor paste which can accurately fill a via hole with a small inner diameter and a narrow pitch. It is in.
【0006】[0006]
【課題を解決するための手段】上記目的を達成するた
め、本発明は、ビアホールを有する基板の一の面に隣接
して、ビアホールに対向して導体ペーストを塗布したレ
ーザ光透過板を配置し、該レーザ光透過板のペースト塗
布面とは反対側の面から塗布ペーストに向かってレーザ
光を照射し、照射レーザ光によって導体ペーストを溶
融,蒸発させ、該溶融・蒸発粒子をビアホール内に侵入
し付着させて導体充填を行うようにした、ことをその主
たる特徴としている。According to the present invention, there is provided a laser light transmitting plate having a conductive paste applied thereto, which is disposed adjacent to one surface of a substrate having a via hole and opposed to the via hole. Irradiating a laser beam from the surface of the laser light transmitting plate opposite to the paste application surface toward the application paste, melting and evaporating the conductive paste by the irradiating laser light, and entering the molten / evaporated particles into the via hole. The main feature of the present invention is that the conductor is filled by being attached.
【0007】本発明に係るビアホールへの充填方法によ
れば、レーザ光の照射によって導体ペーストを加熱して
溶融,蒸発させ、該溶融・蒸発粒子をビアホール内に侵
入し付着させて所期の導体充填を行うようにしているの
で、基板に貫通形成されるビアホールの内径が微小化さ
れ、しかも形成ピッチが狭小化されるような場合でもビ
アホール内への導体充填を的確に行える。According to the method of filling a via hole according to the present invention, the conductor paste is heated and melted and evaporated by irradiating a laser beam, and the melted / evaporated particles enter the via hole and adhere to the via hole. Since the filling is performed, the inside of the via hole can be accurately filled even when the inside diameter of the via hole formed through the substrate is reduced and the forming pitch is narrowed.
【0008】[0008]
【発明の実施の形態】図1乃至図5は本発明の一実施形
態に係る導体充填方法の工程図を示すものであり、図
中、1は基板、2はビアホール、3はレーザ光透過板、
4はマスク、5は壁板、Pは導体ペースト、Lはレーザ
光である。1 to 5 show a process chart of a conductor filling method according to an embodiment of the present invention, wherein 1 is a substrate, 2 is a via hole, and 3 is a laser beam transmitting plate. ,
Reference numeral 4 denotes a mask, 5 denotes a wall plate, P denotes a conductive paste, and L denotes a laser beam.
【0009】基板1は、アルミナ,窒化アルミ等から成
る焼成済みのもので、該基板1にはドリル加工,パンチ
ング加工,レーザ加工等によって所定内径のビアホール
2が所定ピッチで貫通形成されている。The substrate 1 is a fired one made of alumina, aluminum nitride, or the like. Via holes 2 having a predetermined inner diameter are formed in the substrate 1 at a predetermined pitch by drilling, punching, laser processing, or the like.
【0010】レーザ光透過板3は、レーザ光Lに対して
透過性を有する材料、例えばサファイヤ,ジルコニア,
フッ化バリウム,フッ化カルシウム,チッ化アルミ,石
英等のセラミックやガラス、またはポリミド,アクリ
ル,PET,ガラスエポキシ等の樹脂から成り、基板1
の下側に所定間隔をおいて配置されている。The laser light transmitting plate 3 is made of a material having transparency to the laser light L, for example, sapphire, zirconia,
The substrate 1 is made of ceramic or glass such as barium fluoride, calcium fluoride, aluminum nitride, and quartz, or a resin such as polyimide, acrylic, PET, or glass epoxy.
Are arranged at a predetermined interval below.
【0011】マスク4は、レーザ光Lに対して反射性を
有する金属、例えばアルミ,ステンレス等の被膜或いは
薄板から成り、ビアホール2と同一内径の光通過孔4a
が該ビアホール2に対向するようにレーザ光透過板3の
下面に設けられている。The mask 4 is made of a film or a thin plate made of a metal having a reflectivity to the laser beam L, for example, aluminum or stainless steel.
Are provided on the lower surface of the laser light transmitting plate 3 so as to face the via holes 2.
【0012】壁板5は、ビアホール2を通過した導体ペ
ーストPの溶融・蒸発粒子Paを受け止めるためのもの
で、基板1の上側に所定間隔をおいて配置されている。The wall plate 5 is for receiving the melted / evaporated particles Pa of the conductive paste P that has passed through the via hole 2 and is arranged above the substrate 1 at a predetermined interval.
【0013】導体ペーストPは、レーザ光照射による溶
融,蒸発を可能としており、例えばSn−Pb合金やA
l,Ag,Au,Cu,Ni,In,Ga,Bi及びそ
の合金の粉末とバインダーと溶剤を混合して形成されて
いる。この導体ペーストPは、レーザ光透過板3の上面
にビアホール2に対向するように適量塗布される。The conductor paste P is capable of melting and evaporating by laser beam irradiation, for example, Sn-Pb alloy or A-Pb alloy.
It is formed by mixing powders of 1, Ag, Au, Cu, Ni, In, Ga, Bi and their alloys, a binder and a solvent. This conductive paste P is applied on the upper surface of the laser light transmitting plate 3 so as to face the via hole 2 in an appropriate amount.
【0014】レーザ光Lは、YAGレーザ,CO2 レー
ザ等から照射される赤外領域や、エキシマレーザ等から
照射される紫外領域のもので、図示省略の光学系によっ
てレーザ光透過板3の下面側から導体ペーストPに向か
って照射される。The laser light L is in an infrared region irradiated by a YAG laser, a CO 2 laser or the like, or an ultraviolet region irradiated by an excimer laser or the like. The lower surface of the laser light transmitting plate 3 is not shown by an optical system (not shown). Irradiation is performed from the side toward the conductor paste P.
【0015】以下に、本実施形態における導体充填方法
について説明する。まず、図1に示すように、壁板5を
基板1の上側に、またマスク付きのレーザ光透過板3を
基板1の下側にそれぞれ配置し、レーザ光透過板3の下
面側から導体ペーストPに向かってその光軸がレーザ光
透過板3の下面と直行するようにレーザ光Lを照射す
る。レーザ光透過板3の上面にはビアホール2の位置に
合わせて予め導体ペーストPが点状に塗布されるが、こ
のペースト塗布量は充填対象となるビアホール2の寸法
に応じて調整される。Hereinafter, the conductor filling method according to the present embodiment will be described. First, as shown in FIG. 1, the wall plate 5 is disposed above the substrate 1 and the laser light transmitting plate 3 with the mask is disposed below the substrate 1, respectively. The laser beam L is emitted toward P so that its optical axis is perpendicular to the lower surface of the laser beam transmitting plate 3. The conductive paste P is applied in a dotted pattern on the upper surface of the laser light transmitting plate 3 in advance in accordance with the position of the via hole 2, and the paste application amount is adjusted according to the size of the via hole 2 to be filled.
【0016】レーザ光Lは、図2に示すようにマスク4
による通過制限を受け、光通過孔4aを通過したレーザ
光Lのみがレーザ光透過板3を透過する。レーザ光透過
板3の上面にある導体ペーストPは透過後のレーザ光L
によって加熱されて溶融,蒸発し、該溶融・蒸発粒子P
aは熱気によって上昇してビアホール2内に侵入し、該
ビアホール2の内面と壁板5の下面に徐々に付着する。The laser beam L is applied to the mask 4 as shown in FIG.
And only the laser light L that has passed through the light passage hole 4a is transmitted through the laser light transmitting plate 3. The conductor paste P on the upper surface of the laser beam transmitting plate 3 is the laser beam L after transmission.
Is heated and melted and evaporated.
a rises by hot air and enters the via hole 2, and gradually adheres to the inner surface of the via hole 2 and the lower surface of the wall plate 5.
【0017】先に述べたレーザ光Lの照射は、図3に示
すようにビアホール2内と壁板5との隙間が溶融・蒸発
粒子Paによって一杯になるまで継続され、この後はレ
ーザ光照射を停止して基板1の上下に置かれた壁板5と
マスク付きのレーザ光透過板3を取り除く。The above-described irradiation with the laser beam L is continued until the gap between the inside of the via hole 2 and the wall plate 5 is filled with the melted / evaporated particles Pa as shown in FIG. Is stopped, and the wall plate 5 placed above and below the substrate 1 and the laser light transmitting plate 3 with the mask are removed.
【0018】壁板5とマスク付きのレーザ光透過板3を
取り除いた状態では、図4に示すようにビアホール2内
に充填された導体Pbが該ビアホール2から上下に盛り
上がった形状とあるため、この盛り上がりが支障となる
場合には適宜研磨を実施して上下の盛り上がり部分を除
去し、図5に示すように充填された導体Pb’の上下面
と基板1の上下面との整合性を図る。When the wall plate 5 and the laser light transmitting plate 3 with the mask are removed, the conductor Pb filled in the via hole 2 has a shape which rises up and down from the via hole 2 as shown in FIG. If the bulge does not hinder, the upper and lower bulges are removed by performing appropriate polishing to ensure consistency between the upper and lower surfaces of the filled conductor Pb 'and the upper and lower surfaces of the substrate 1 as shown in FIG. .
【0019】このように、上述の導体充填方法によれ
ば、レーザ光Lの照射によって導体ペーストPを加熱し
て溶融,蒸発させ、該溶融・蒸発粒子Paをビアホール
2内に侵入し付着させて所期の導体充填を行うようにし
ているので、基板1に貫通形成されるビアホール2の内
径が微小化され、しかも形成ピッチが狭小化されるよう
な場合でもビアホール2内への導体充填を的確に行っ
て、高密度配線基板を容易に作成することができる。As described above, according to the above-described conductor filling method, the conductor paste P is heated and melted and evaporated by the irradiation of the laser beam L, and the melted / evaporated particles Pa enter and adhere to the via hole 2. Since the intended conductor filling is performed, the inside diameter of the via hole 2 formed through the substrate 1 is reduced, and the conductor filling into the via hole 2 is accurately performed even when the formation pitch is narrowed. And a high-density wiring board can be easily produced.
【0020】また、導体充填に熱付加による焼結が不要
であるため、焼結による不具合、例えば導体ペーストの
基板材料への拡散や導体ペーストと基板の収縮ミスマッ
チによるクラック発生等の不具合が無くなり、作業信頼
性を格段向上させることができる。In addition, since sintering by applying heat is not required for filling the conductor, defects due to sintering, such as the diffusion of the conductor paste into the substrate material and the occurrence of cracks due to the mismatch between the conductor paste and the shrinkage of the substrate are eliminated. Work reliability can be significantly improved.
【0021】さらに、レーザ光Lの照射時間や導体ペー
ストPの塗布量によって導体充填量を簡単にコントロー
ルすることができ、高アスペクト比なビアホールへも充
分に対応できる。Further, the amount of the conductor filling can be easily controlled by the irradiation time of the laser beam L and the amount of the conductor paste P applied, and it is possible to sufficiently cope with a via hole having a high aspect ratio.
【0022】さらにまた、ビアホール2と塗布ペースト
P、また塗布ペーストPと照射レーザ光Rに正確な位置
合わせが不要であるので、位置合わせに要する負担を軽
減して充填作業を簡略化することができる。Furthermore, since accurate positioning between the via hole 2 and the coating paste P or between the coating paste P and the irradiation laser beam R is unnecessary, the burden required for positioning can be reduced and the filling operation can be simplified. it can.
【0023】尚、上述の実施形態では、基板としてアル
ミナ,窒化アルミ等から成る焼成済みのものを例示した
が、導体充填に熱付加による焼結が不要であるため、該
基板には樹脂製のものも使用でき、またグリーンシート
のビアホールへの導体充填にも利用できる。In the above-described embodiment, a fired substrate made of alumina, aluminum nitride, or the like is used as the substrate. However, since sintering by applying heat is not required for filling the conductor, the substrate is made of resin. They can also be used, and can be used for filling conductors in via holes of green sheets.
【0024】また、上述の実施形態では、レーザ光透過
板の下面にマスクを設けてレーザ光の通過制限を行うよ
うにしたものを例示したが、図6に示すように光通過孔
14aを有するマスク14をレーザ光透過板13の内部
に設けるようにしたり、或いは図7に示すようにレーザ
光透過板23自体をレーザ光透過領域23aとレーザ光
非透過領域23bとから構成して同様の通過制限を行う
ようにしてもよい。Further, in the above-described embodiment, the laser light transmission plate is provided with a mask on the lower surface to restrict the passage of the laser light. However, as shown in FIG. 6, the laser light transmission hole 14a is provided. The mask 14 is provided inside the laser light transmitting plate 13, or the laser light transmitting plate 23 itself is composed of a laser light transmitting region 23 a and a laser light non-transmitting region 23 b as shown in FIG. Restriction may be performed.
【0025】例えば、後者のものをレーザ光透過性を有
しない結晶化ガラス基板で実現するには、レーザ光を透
過させたい領域のみを加熱,急冷することでガラス化を
進めて光透過性とすることが可能であり、また、レーザ
光透過性を有するガラス/セラミック基板で実現するに
は、レーザ光を透過させたい領域の一面に光反射マスク
を設け、同面全体にレーザ光を照射して加熱しこれを相
分離させることで結晶化もしくは分相生成を進めてマス
ク領域以外を失透させることができる。For example, in order to realize the latter with a crystallized glass substrate having no laser light transmission, only the region where the laser light is to be transmitted is heated and quenched to promote vitrification to improve light transmission. In addition, in order to realize the laser light transmitting glass / ceramic substrate, a light reflecting mask is provided on one surface of a region where the laser light is to be transmitted, and the entire surface is irradiated with the laser light. By heating and phase-separating this, crystallization or phase-separation can be advanced to devitrify other than the mask region.
【0026】さらに、上述の実施形態では、マスク等に
よる通過制限後のレーザ光を塗布ペーストに照射するよ
うにしたが、図8に示すように図示省略の光学系によっ
てレーザ光L’を塗布ペーストPに向かって集光させる
ようにすれば、マスク等による通過制限が不要となり、
塗布ペーストPに対して効果的なエネルギー付与が行え
る。Further, in the above-described embodiment, the coating paste is irradiated with the laser beam whose passage has been restricted by a mask or the like. However, as shown in FIG. If the light is condensed toward P, there is no need to restrict passage through a mask or the like.
Effective energy can be applied to the application paste P.
【0027】[0027]
【発明の効果】以上詳述したように、本発明によれば、
レーザ光の照射によって導体ペーストを加熱して溶融,
蒸発させ、該溶融・蒸発粒子をビアホール内に侵入し付
着させて所期の導体充填を行うようにしているので、基
板に貫通形成されるビアホールの内径が微小化され、し
かも形成ピッチが狭小化されるような場合でもビアホー
ル内への導体充填を的確に行って、高密度配線基板を容
易に作成することができる。As described in detail above, according to the present invention,
The conductor paste is heated and melted by laser light irradiation.
Evaporation is performed so that the molten / evaporated particles enter and adhere to the via hole to perform the intended conductor filling, so that the inner diameter of the via hole formed through the substrate is reduced, and the forming pitch is reduced. Even in such a case, the conductor can be accurately filled in the via hole, and a high-density wiring board can be easily produced.
【0028】また、導体充填に熱付加による焼結が不要
であるため、焼結による不具合、例えば導体ペーストの
基板材料への拡散や導体ペーストと基板の収縮ミスマッ
チによるクラック発生等の不具合が無くなり、作業信頼
性を格段向上させることができる。Further, since sintering by applying heat is not required for filling the conductor, defects due to sintering, such as diffusion of the conductor paste into the substrate material and cracks caused by mismatch between the conductor paste and the substrate due to shrinkage, are eliminated. Work reliability can be significantly improved.
【図1】本発明の一実施形態に係る導体充填方法の工程
図FIG. 1 is a process diagram of a conductor filling method according to an embodiment of the present invention.
【図2】本発明の一実施形態に係る導体充填方法の工程
図FIG. 2 is a process chart of a conductor filling method according to an embodiment of the present invention.
【図3】本発明の一実施形態に係る導体充填方法の工程
図FIG. 3 is a process chart of a conductor filling method according to an embodiment of the present invention.
【図4】本発明の一実施形態に係る導体充填方法の工程
図FIG. 4 is a process diagram of a conductor filling method according to an embodiment of the present invention.
【図5】本発明の一実施形態に係る導体充填方法の工程
図FIG. 5 is a process diagram of a conductor filling method according to an embodiment of the present invention.
【図6】レーザ光透過板の他の例を示す断面図FIG. 6 is a sectional view showing another example of the laser beam transmitting plate.
【図7】レーザ光透過板の他の例を示す断面図FIG. 7 is a sectional view showing another example of the laser light transmitting plate.
【図8】レーザ光を集光して照射する様子を示す断面図FIG. 8 is a cross-sectional view showing how laser light is focused and irradiated.
1…基板、2…ビアホール、3…レーザ光透過板、4…
マスク、4a…光通過孔、5…壁板、P…導体ペース
ト、Pa…溶融・蒸発粒子、Pb…充填導体、L…レー
ザ光、13…レーザ光透過板、14…マスク、14a…
光通過孔、23…レーザ光透過板、23a…レーザ光透
過領域、23b…レーザ光非透過領域、L’…レーザ
光。DESCRIPTION OF SYMBOLS 1 ... Substrate, 2 ... Via hole, 3 ... Laser light transmission plate, 4 ...
Mask, 4a: Light passage hole, 5: Wall plate, P: Conductive paste, Pa: Melted / evaporated particles, Pb: Filled conductor, L: Laser light, 13: Laser light transmitting plate, 14: Mask, 14a ...
Light passing holes, 23: laser light transmitting plate, 23a: laser light transmitting area, 23b: laser light non-transmitting area, L ': laser light.
Claims (6)
して、ビアホールに対向して導体ペーストを塗布したレ
ーザ光透過板を配置し、該レーザ光透過板のペースト塗
布面とは反対側の面から塗布ペーストに向かってレーザ
光を照射し、照射レーザ光によって導体ペーストを溶
融,蒸発させ、該溶融・蒸発粒子をビアホール内に侵入
し付着させて導体充填を行うようにした、 ことを特徴とするビアホールへの導体充填方法。1. A laser light transmitting plate having a conductive paste applied thereto is disposed adjacent to one surface of a substrate having a via hole and opposed to the via hole, and the laser light transmitting plate is provided on a side opposite to the paste application surface of the laser light transmitting plate. Laser light is irradiated from the surface toward the application paste, the conductor paste is melted and evaporated by the irradiated laser light, and the melted / evaporated particles enter and adhere to the via holes to fill the conductor. To fill the via holes with a conductor.
して、ビアホールを通過した溶融・蒸発粒子を受け止め
る壁板を配置した、 ことを特徴とする請求項1記載のビアホールへの導体充
填方法。2. The method according to claim 1, wherein a wall plate is provided adjacent to the other surface of the substrate having the via hole for receiving the molten and evaporated particles passing through the via hole. .
盛り上がり部分を研磨により除去し、充填された導体の
上下面と基板の上下面との整合性を図るようにした、。
ことを特徴とする請求項1または2記載のビアホールへ
の導体充填方法。3. A method according to claim 1, wherein the upper and lower raised portions of the conductor filled in the via hole are removed by polishing so that the upper and lower surfaces of the filled conductor are aligned with the upper and lower surfaces of the substrate.
3. The method according to claim 1, wherein the via hole is filled with a conductor.
板に設け、光通過孔を通過したレーザ光を塗布ペースト
に向かって照射するようにした、 ことを特徴とする請求項1乃至3の何れか1項記載のビ
アホールへの導体充填方法。4. The laser light transmitting plate according to claim 1, wherein a mask having a light passing hole is provided on the laser light transmitting plate, and the laser light passing through the light passing hole is irradiated toward the coating paste. The method for filling a conductor into a via hole according to any one of the preceding claims.
ーザ光非透過領域とから構成し、レーザ光透過領域を透
過したレーザ光を塗布ペーストに向かって照射するよう
にした、 ことを特徴とする請求項1乃至3の何れか1項記載のビ
アホールへの導体充填方法。5. The laser light transmitting plate comprises a laser light transmitting area and a laser light non-transmitting area, and the laser light transmitted through the laser light transmitting area is irradiated toward the coating paste. The method for filling a conductor into a via hole according to claim 1.
させるようにした、 ことを特徴とする請求項1乃至3の何れか1項記載のビ
アホールへの導体充填方法。6. The method for filling a via hole with a conductor according to claim 1, wherein the laser light is focused toward the application paste.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8174012A JPH1022628A (en) | 1996-07-03 | 1996-07-03 | Method for filling conductor into via hole |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8174012A JPH1022628A (en) | 1996-07-03 | 1996-07-03 | Method for filling conductor into via hole |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH1022628A true JPH1022628A (en) | 1998-01-23 |
Family
ID=15971105
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8174012A Withdrawn JPH1022628A (en) | 1996-07-03 | 1996-07-03 | Method for filling conductor into via hole |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH1022628A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1206325A2 (en) * | 1999-08-11 | 2002-05-22 | Tessera, Inc. | Vapor phase connection techniques |
-
1996
- 1996-07-03 JP JP8174012A patent/JPH1022628A/en not_active Withdrawn
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1206325A2 (en) * | 1999-08-11 | 2002-05-22 | Tessera, Inc. | Vapor phase connection techniques |
EP1206325A4 (en) * | 1999-08-11 | 2006-08-02 | Tessera Inc | Vapor phase connection techniques |
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Legal Events
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A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20031007 |