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JPH0399790A - Laser beam machine - Google Patents

Laser beam machine

Info

Publication number
JPH0399790A
JPH0399790A JP1235526A JP23552689A JPH0399790A JP H0399790 A JPH0399790 A JP H0399790A JP 1235526 A JP1235526 A JP 1235526A JP 23552689 A JP23552689 A JP 23552689A JP H0399790 A JPH0399790 A JP H0399790A
Authority
JP
Japan
Prior art keywords
liquid
laser beam
nozzle
processing
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1235526A
Other languages
Japanese (ja)
Inventor
Naohisa Matsushita
直久 松下
Koji Suzuki
宏治 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1235526A priority Critical patent/JPH0399790A/en
Publication of JPH0399790A publication Critical patent/JPH0399790A/en
Pending legal-status Critical Current

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  • Laser Beam Processing (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To improve air bubble eliminating efficiency and machining efficiency by providing a liquid supply pipe on a part close to a condenser lens of a nozzle. CONSTITUTION:A laser beam 11 is condensed by the condenser lens 10 and a workpiece is irradiated with the laser beam and machined thereby. At this time, a liquid 14 such as an etching liquid is fed into the nozzle 13 from the liquid supply pipe 15 and the liquid 14 is sprayed toward a laser beam irradiation point from an opening of the nozzle tip. By this method, the laser beam 11 performs machining in the liquid and the liquid 14 injected from the nozzle 13 eliminates rapidly air bubbles generated on a machining point and the liquid 14 can be supplied up to the inner part of the machining point and machining efficiency can be improved.

Description

【発明の詳細な説明】 〔概 要〕 レーザ・アシスト・エツチングなどの液体中においてレ
ーザ加工を行うレーザ加工装置に関し、気泡除去効率の
向上と加工効率の向上を目的とし、 液体中に浸漬した被加工物にレーザ光を照射して加工を
行なうレーザ加工装置において、レーザ光照射部は、レ
ーザ光源と、該レーザ光源からの光を集光するレンズと
、該集光レンズにより集光されたビームの外側に沿って
延びる逆円錐状のノズルとを具備し、該ノズルの集光レ
ンズに近い部分に液体供給管を設けるように構成する。
[Detailed Description of the Invention] [Summary] Regarding laser processing equipment that performs laser processing in liquid such as laser assisted etching, the purpose of this is to improve bubble removal efficiency and processing efficiency. In a laser processing device that performs processing by irradiating a workpiece with a laser beam, the laser beam irradiation unit includes a laser light source, a lens that focuses the light from the laser light source, and a beam that is focused by the focusing lens. and an inverted conical nozzle extending along the outside of the nozzle, and a liquid supply pipe is provided in a portion of the nozzle near the condenser lens.

〔産業上の利用分野〕[Industrial application field]

本発明はレーザ・アシスト・エツチングなどの液体中に
おいてレーザ加工を行うレーザ加工装置に関する。
The present invention relates to a laser processing apparatus that performs laser processing in a liquid such as laser assisted etching.

セラミックスなどの高脆材料の利用分野の拡大に伴い、
高精度・高品位の加工が要求されている。
With the expansion of the fields of use of highly brittle materials such as ceramics,
High precision and high quality processing is required.

このため材料をエツチング液中に浸しく例えばSi、N
4の場合にはKDH水溶液)レーザの熱エネルギや光エ
ネルギを利用して選択的にエツチングを行うレーザ・ア
シスト・エツチング加工(1、AE加工)が使用される
ようになって来ている。しかし液体中の加工のためレー
ザ照射部で気泡が発生し、加工がスムーズに行なわれな
いため、この気泡を除去する必要がある。
For this purpose, the material is immersed in an etching solution such as Si, N, etc.
In the case of No. 4, a KDH aqueous solution) laser-assisted etching processing (1, AE processing), which performs selective etching using thermal energy or optical energy of a laser, has come to be used. However, since processing is carried out in a liquid, bubbles are generated at the laser irradiation part and processing cannot be carried out smoothly, so these bubbles must be removed.

〔従来の技術〕[Conventional technology]

第4図に従来のLAE加工装置を示す。これはガラス窓
1を有する密閉容器2の側面から該容器の中にエツチン
グ液3を流し、その中に置かれた被加工物4に対し、集
光レンズ5で集光されたレーザビーム6をガラス窓1を
通して照射するようになっている。
FIG. 4 shows a conventional LAE processing device. In this method, an etching solution 3 is poured into a closed container 2 having a glass window 1 from the side, and a laser beam 6 focused by a condensing lens 5 is directed onto a workpiece 4 placed inside the container. The light is irradiated through a glass window 1.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記従来のLAE加工装置では、加工時に発生する気泡
はエツチング液3の流れによって効率良く除去されるが
、加工点にエツチング液を供給することができず効率の
良い加工ができないという問題がある。また被加工物4
は密閉容器2の中に収容されているので、その交換に手
間がかかるという問題もある。
In the conventional LAE processing apparatus described above, bubbles generated during processing are efficiently removed by the flow of the etching liquid 3, but there is a problem in that the etching liquid cannot be supplied to the processing point and efficient processing cannot be performed. Also, the workpiece 4
Since it is housed in the airtight container 2, there is also the problem that it takes time and effort to replace it.

本発明は上記従来の問題点に鑑み、気泡除去効率の向上
と加工効率の向上が可能なレーザ加工部(3) 置を提供するものである。
In view of the above-mentioned conventional problems, the present invention provides a laser processing unit (3) that is capable of improving bubble removal efficiency and processing efficiency.

〔課題を解決するための手段〕[Means to solve the problem]

第1図は本発明の原理説明図である。 FIG. 1 is a diagram explaining the principle of the present invention.

図において、10は集光レンズであり、レーザ光11を
被加工物12に集光する。13は集光レンズ10で集光
されるレーザビームの外周を覆うように設けられた逆円
錐状のノズルであり、その先端にはレーザ光及びエツチ
ング液等の液体を通ず開口部を有し、根本部には集光レ
ンズ10が気密に取り付けられている。さらに該ノズル
13の上部のレンズ近傍にはエツチング液等の液体14
を送り込む液体供給管15が設けられている。
In the figure, numeral 10 is a condensing lens, which condenses laser light 11 onto a workpiece 12 . 13 is an inverted conical nozzle provided to cover the outer periphery of the laser beam focused by the condensing lens 10, and has an opening at its tip through which the laser beam and a liquid such as an etching solution pass through. , a condenser lens 10 is airtightly attached to the base. Furthermore, a liquid 14 such as an etching liquid is placed in the upper part of the nozzle 13 near the lens.
A liquid supply pipe 15 is provided for feeding the liquid.

〔作 用〕[For production]

レーザ光11は集光レンズ10により集光され、被加工
物を照射し加工を行なうが、このとき液体供給管15か
らエツチング液等の液体14をノズル13内に送り込む
ことにより、ノズル先端の開口部からレーザ照射点く加
工点)に向って液体を吹き付け(4) る。これによりレーザ光は液体中での加工を行ない、ノ
ズル13から噴出した液体は加工点で生ずる気泡を速や
かに除去し液体を加工点の奥まで供給することができ、
加工効率の向上を可能とする。
The laser beam 11 is focused by a condensing lens 10 and irradiates the workpiece to perform processing. At this time, a liquid 14 such as an etching liquid is sent into the nozzle 13 from the liquid supply pipe 15 to close the opening at the tip of the nozzle. The liquid is sprayed (4) toward the laser irradiation point. As a result, the laser beam performs processing in the liquid, and the liquid ejected from the nozzle 13 can quickly remove air bubbles generated at the processing point and supply the liquid deep into the processing point.
Enables improvement of processing efficiency.

〔実施例〕〔Example〕

第2図は本発明の実施例を示す図である。 FIG. 2 is a diagram showing an embodiment of the present invention.

本実施例はハウジング16に、例えば炭酸ガスレーザ、
YAGレーザ等のレーザ光源17と、反射ミラー18と
、0リング19により気密に取付けられた集光レンズ1
0とが設けられ、該ハウジング16の先端はノズル13
となっている。そしてレーザ光源17から出射されたレ
ーザ光11を反射ミラー18を経て集光レンズ10で被
加工物12の加工点に集光するようになっている。また
ノズル13は集光レンズ10で集光されるレーザ光の外
周を覆う様に逆円錐状をなし、その先端にはレーザ光と
液体が通る開口部が設けられ、根本部の集光レンズ近傍
にはエツチング液等の液体を該ノズル内に送り込む液体
供給管15が設けられている。
In this embodiment, the housing 16 includes, for example, a carbon dioxide laser,
A laser light source 17 such as a YAG laser, a reflecting mirror 18, and a condensing lens 1 airtightly attached by an O ring 19.
0 is provided, and the tip of the housing 16 is provided with a nozzle 13.
It becomes. The laser beam 11 emitted from the laser light source 17 passes through a reflecting mirror 18 and is focused by a condensing lens 10 onto a processing point of the workpiece 12. The nozzle 13 has an inverted conical shape so as to cover the outer periphery of the laser beam condensed by the condenser lens 10, and an opening through which the laser beam and liquid pass is provided at the tip, and the nozzle 13 has an opening near the condenser lens at the base. A liquid supply pipe 15 is provided for feeding a liquid such as an etching liquid into the nozzle.

(5) このように構成された本実施例の作用を第3図により説
明する。
(5) The operation of this embodiment configured as described above will be explained with reference to FIG.

本実施例の液体供給管15にはタンク20からポンプ2
1により液体が送られるパイプ22が接続され、ノズル
13の先端は被加工物12と共にエツチング液等の液体
14を満たした水槽23に浸漬される。そしてレーザ光
源17から出射したレーザ光11を反射ミラー18を経
て集光レンズ10で被加工物12の加工部に集光する。
The liquid supply pipe 15 in this embodiment is connected to a pump 2 from a tank 20.
1 is connected to a pipe 22 through which liquid is sent, and the tip of the nozzle 13 is immersed together with the workpiece 12 in a water tank 23 filled with a liquid 14 such as an etching liquid. Laser light 11 emitted from laser light source 17 passes through reflection mirror 18 and is focused by condenser lens 10 onto the processing portion of workpiece 12 .

同時にポンプ21によりエツチング液等の液体14を液
体供給管15を経てノズル13内に送り込み、その先端
の開口部から噴出させる。これにより液体14がレーザ
光で加熱されて生じた気泡を除去し加工部の奥まで液体
14を供給することができ、加工効率を向上させること
ができる。なお水槽23内の液体14は仕切り壁24を
オーバーフローして一定水位を保ち、またオーバーフロ
ーした液体14は戻りパイプ25によりタンク20に戻
り循環して使用される。
At the same time, a liquid 14 such as an etching liquid is fed into the nozzle 13 via the liquid supply pipe 15 by the pump 21, and is ejected from the opening at its tip. As a result, bubbles generated when the liquid 14 is heated by the laser beam can be removed, and the liquid 14 can be supplied deep into the processing section, thereby improving processing efficiency. The liquid 14 in the water tank 23 overflows the partition wall 24 to maintain a constant water level, and the overflowed liquid 14 returns to the tank 20 via a return pipe 25 and is used for circulation.

(6) 〔発明の効果〕 以上説明した様に本発明によれば、LAE加工において
従来の如き密閉容器が不要となり、被加工物の交換が容
易となる。また加工時に発生する気泡を効率良く除去し
エツチング液等の液体を加工部の奥まで供給することが
できるため加工効率の高い加工が可能となる。
(6) [Effects of the Invention] As explained above, according to the present invention, there is no need for a conventional sealed container in LAE processing, and workpieces can be easily replaced. In addition, since air bubbles generated during processing can be efficiently removed and liquid such as etching liquid can be supplied deep into the processing area, highly efficient processing is possible.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の原理説明図、 第2図は本発明の実施例を示す図、 第3図は本発明の実施例の作用を説明するための図、 第4図は従来のLAE加工装置を示す図である。 図において、 10は集光レンズ、 11はレーザ光、 12は被加工物、 13はノズノベ 14は液体、 15は液体供給管、 (7) 16はハウジング、 17はレーザ光源、 18は反射ミラー 19は○リング、 20はタンク、 23は水槽 を示す。 FIG. 1 is a diagram explaining the principle of the present invention, FIG. 2 is a diagram showing an embodiment of the present invention; FIG. 3 is a diagram for explaining the operation of the embodiment of the present invention; FIG. 4 is a diagram showing a conventional LAE processing device. In the figure, 10 is a condensing lens; 11 is a laser beam, 12 is a workpiece, 13 is Nozunobe 14 is liquid, 15 is a liquid supply pipe; (7) 16 is a housing; 17 is a laser light source; 18 is a reflective mirror 19 is ○ ring, 20 is a tank, 23 is an aquarium shows.

Claims (1)

【特許請求の範囲】[Claims] 1. 液体中に浸漬した被加工物にレーザ光を照射して
加工を行なうレーザ加工装置において、レーザ光照射部
は、レーザ光源(17)と、該レーザ光源(17)から
の光を集光するレンズ(10)と、該集光レンズ(10
)により集光されたビームの外側に沿って延びる逆円錐
状のノズル(13)とを具備し、該ノズルの集光レンズ
(10)に近い部分に液体供給管(15)を設けて成る
ことを特徴とするレーザ加工装置。
1. In a laser processing device that performs processing by irradiating a workpiece immersed in a liquid with laser light, the laser light irradiation unit includes a laser light source (17) and a lens that focuses the light from the laser light source (17). (10) and the condenser lens (10
), and a liquid supply pipe (15) is provided in a part of the nozzle near the condensing lens (10). Laser processing equipment featuring:
JP1235526A 1989-09-13 1989-09-13 Laser beam machine Pending JPH0399790A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1235526A JPH0399790A (en) 1989-09-13 1989-09-13 Laser beam machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1235526A JPH0399790A (en) 1989-09-13 1989-09-13 Laser beam machine

Publications (1)

Publication Number Publication Date
JPH0399790A true JPH0399790A (en) 1991-04-24

Family

ID=16987283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1235526A Pending JPH0399790A (en) 1989-09-13 1989-09-13 Laser beam machine

Country Status (1)

Country Link
JP (1) JPH0399790A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH079185A (en) * 1993-06-28 1995-01-13 Technol Res Assoc Of Medical & Welfare Apparatus Laser irradiating device
JPH07246483A (en) * 1994-03-09 1995-09-26 Toshiba Corp Laser peening method
US8304686B2 (en) 2006-05-11 2012-11-06 Kabushiki Kaisha Toshiba Laser shock hardening method and apparatus
DE102011107982A1 (en) * 2011-07-20 2013-01-24 Rena Gmbh Tool head (LCP head)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH079185A (en) * 1993-06-28 1995-01-13 Technol Res Assoc Of Medical & Welfare Apparatus Laser irradiating device
JPH07246483A (en) * 1994-03-09 1995-09-26 Toshiba Corp Laser peening method
US8304686B2 (en) 2006-05-11 2012-11-06 Kabushiki Kaisha Toshiba Laser shock hardening method and apparatus
US8330070B2 (en) * 2006-05-11 2012-12-11 Kabushiki Kaisha Toshiba Laser shock hardening method and apparatus
US8872058B2 (en) 2006-05-11 2014-10-28 Kabushiki Kaisha Toshiba Laser shock hardening apparatus
DE102011107982A1 (en) * 2011-07-20 2013-01-24 Rena Gmbh Tool head (LCP head)

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