JPH032833A - Production of liquid crystal display device - Google Patents
Production of liquid crystal display deviceInfo
- Publication number
- JPH032833A JPH032833A JP13845989A JP13845989A JPH032833A JP H032833 A JPH032833 A JP H032833A JP 13845989 A JP13845989 A JP 13845989A JP 13845989 A JP13845989 A JP 13845989A JP H032833 A JPH032833 A JP H032833A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- liquid crystal
- photosensitive resin
- crystal display
- display device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 125000006850 spacer group Chemical group 0.000 claims abstract description 19
- 239000011347 resin Substances 0.000 claims abstract description 14
- 229920005989 resin Polymers 0.000 claims abstract description 14
- 230000000694 effects Effects 0.000 claims abstract description 13
- 238000000034 method Methods 0.000 claims description 15
- 239000002184 metal Substances 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 238000007747 plating Methods 0.000 claims description 3
- 238000009713 electroplating Methods 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 239000010408 film Substances 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000004642 Polyimide Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000011324 bead Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000012508 resin bead Substances 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Liquid Crystal (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、表示電極間に基板間距離を一定に保持するス
ペーサを有する液晶表示装置の製造法に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method of manufacturing a liquid crystal display device having spacers between display electrodes to maintain a constant distance between substrates.
従来の技術
近年、ニューメディア機器、OA機器への適用をめざし
て、液晶表示パネルの高精細化、大容量表示化が盛んに
進められている。高精細化、大容量表示化に伴って、従
来以上に大面積にわたって精度よく液晶表示装置の基板
間距離(ギャップ)を均一に制御する必要が生じてきた
。BACKGROUND OF THE INVENTION In recent years, progress has been made to increase the definition and capacity of liquid crystal display panels for application to new media equipment and OA equipment. With the trend toward higher definition and larger display capacity, it has become necessary to uniformly control the distance (gap) between substrates of a liquid crystal display device over a larger area with greater accuracy than ever before.
従来より、液晶表示装置のギャップ制御の方法として、
ガラスピーズ、樹脂ビーズ等のスペーサ粒子を基板上に
分散させるビーズ分散方法と、感光性樹脂をフォトマス
クを用いて露光、現像して、所定の位置にギャップ制御
用のスペーサを形成するフォトリソグラフィ方法がある
。Conventionally, as a method of gap control for liquid crystal display devices,
A bead dispersion method in which spacer particles such as glass beads and resin beads are dispersed on a substrate, and a photolithography method in which a photosensitive resin is exposed and developed using a photomask to form spacers for gap control at predetermined positions. There is.
発明が解決しようとする課題
スペーサ分散方法では、基板の帯電、スペーサ粒子の帯
電、吸湿によりスペーサ粒子が凝集して、基板上への分
散が均一にならないことがしばしば生じる。凝集し7た
部分では、基板貼り合せ時に局所的にギャップが厚くな
るため、ギャップの不均一性を生じたり、液晶の配向膜
れを引き起し、その結果表示品位の低下を招くという課
題がある。Problems to be Solved by the Invention In the spacer dispersion method, the spacer particles often aggregate due to the charging of the substrate, the charging of the spacer particles, and moisture absorption, and the dispersion on the substrate is not uniform. In the agglomerated areas, the gap locally becomes thicker when the substrates are bonded together, resulting in non-uniformity of the gap and failure of the alignment film of the liquid crystal, resulting in a reduction in display quality. be.
フォトリソグラフィー法の場合、感光性樹脂を露光する
際にフォトマスクをアライメント(マスク合せ)する必
要がある。表示電極の高精細化。In the case of photolithography, it is necessary to align the photomask when exposing the photosensitive resin. High-definition display electrodes.
大容量化に伴って、従来以上に大面積にわたって高精度
にマスク合せをする必要がある。そのためマスクの位置
合せ不良のため、スペーサが所定の位置に形成されない
状態がしばしば発生し、歩留りの低下を招いている。With the increase in capacity, it is necessary to perform mask alignment over a larger area with higher precision than ever before. Therefore, due to poor alignment of the mask, spacers are often not formed at predetermined positions, resulting in a decrease in yield.
課題を解決するための手段
上記課題を解決するために、本発明の液晶表示装置と液
晶表示装置の製造法は?、tf#!!、のストライプ状
に形成した透明電極上に遮光作用を存する金属被膜をコ
ーティングした基板表面に、感光型の樹脂を塗布した後
、前記基板裏面より感光性の樹脂を露光するものである
。Means for Solving the Problems In order to solve the above problems, what is the liquid crystal display device of the present invention and the method for manufacturing the liquid crystal display device? , tf#! ! A photosensitive resin is applied to the surface of the substrate, in which transparent electrodes formed in stripes are coated with a metal film having a light-shielding effect, and then the photosensitive resin is exposed to light from the back surface of the substrate.
作用
上記構成によれば、透明電極上にコーティングした金属
波膜が遮光作用を有してフォトマスクとして作用するの
で、マスク合じを行う必要がなく、基板裏面より露光を
行うだけでギャンプ制御作用のあるスペーサを形成する
ことができる。Function According to the above structure, the metal wave film coated on the transparent electrode has a light shielding effect and acts as a photomask, so there is no need to perform mask alignment, and the gap control effect can be achieved by simply exposing from the back side of the substrate. It is possible to form a spacer with a
実施例
以下に本発明の実施例について図面を参照しながら説明
する。Examples Examples of the present invention will be described below with reference to the drawings.
第1図は本発明の製造法により作成した液晶表示装置断
面図の一例である。■はガラス基板、2は透明電極、3
はライン・スペーサ、4は配向膜、5はシール材、6は
液晶層である。第2図(a)〜(e)は本発明の液晶表
示装置の製造法の一例を示す工程図である。FIG. 1 is an example of a cross-sectional view of a liquid crystal display device manufactured by the manufacturing method of the present invention. ■ is a glass substrate, 2 is a transparent electrode, 3
4 is a line spacer, 4 is an alignment film, 5 is a sealing material, and 6 is a liquid crystal layer. FIGS. 2(a) to 2(e) are process diagrams showing an example of the method for manufacturing the liquid crystal display device of the present invention.
各図の順序に従って工程を説明すると、第2図(a)に
示す様に、ガラス基板1上に電子ビーム(EB)蒸着、
スパフクにより酸化インジュウム錫(ITO)の薄膜を
形成する。ITOの表面抵抗値は10Ω/口である。To explain the steps according to the order of each figure, as shown in FIG. 2(a), electron beam (EB) evaporation is performed on the glass substrate 1
A thin film of indium tin oxide (ITO) is formed by sputtering. The surface resistance value of ITO is 10Ω/hole.
その後、フォトレジストをスピンナー又はロール・コー
タにより塗布した後、所定の方法によりパターニングを
行い、エツチングを行うことにより透明電極2を形成す
る。Thereafter, a photoresist is applied using a spinner or a roll coater, patterned by a predetermined method, and etched to form the transparent electrode 2.
次に第2図伽)に示す様に、無電解Niメッキを行うこ
とにより、透明電極2上にN t−Pの金属被膜7を形
成する。Next, as shown in FIG. 2, a Nt-P metal film 7 is formed on the transparent electrode 2 by electroless Ni plating.
無電解Niメッキは選択性があり、金属>JH97はI
TOからなる透明電極2上のみに析出して、ガラス上に
析出することはない、金属被膜7の膜厚は約0.5〜1
μm程度であり、十分遮光作用を有する。Electroless Ni plating is selective, and metal > JH97 is I
The thickness of the metal coating 7, which is deposited only on the transparent electrode 2 made of TO and not on the glass, is approximately 0.5 to 1.
It is about μm and has a sufficient light shielding effect.
第2図(C)に示す様に、前記構成のガラス基板1表面
上にネガ型の感光性ポリイミド8をスピンナーまたはロ
ールコータにより塗布する0次にガラス基板lを裏面か
ら露光する。この時、金属被膜7はフォトマスクとして
作用するので、金属被膜7上の感光性ポリイミドは露光
されず、電極間のスペース部分のみ露光される0次に現
像することによって、スペース部分にのみ感光性ポリイ
ミドが残り、基板間距離制御用のライン・スペーサ9が
形成される(第2図(d))。As shown in FIG. 2(C), a negative photosensitive polyimide 8 is coated on the surface of the glass substrate 1 having the above structure using a spinner or a roll coater, and the zero-order glass substrate 1 is exposed to light from the back side. At this time, the metal coating 7 acts as a photomask, so the photosensitive polyimide on the metal coating 7 is not exposed, and only the space between the electrodes is exposed by zero-order development, which makes only the space part photosensitive. The polyimide remains, forming line spacers 9 for controlling the distance between the substrates (FIG. 2(d)).
金属被膜7をエツチングにより除去する。この時エンチ
ングによりライン・スペーサ9が除去されることはない
(第2図(e))。The metal coating 7 is removed by etching. At this time, the line spacer 9 is not removed by etching (FIG. 2(e)).
前記の方法によりライン・スペーサを形成した基板とラ
イン・スペーサを形成していない基板とに配向処理を施
した後、直交方向に2枚の基板をシール材により貼り合
せることによって、基板間距離を均一に保持することが
できる。After performing alignment treatment on the substrate on which line spacers are formed and the substrate on which no line spacers are formed by the method described above, the distance between the substrates is reduced by bonding the two substrates in orthogonal directions using a sealant. Can be held uniformly.
第3図に感光性樹脂塗布時のスピンナー回転数と基板間
距離との関係を示す。曲線Aは感光性樹脂の粘度が50
cpSBは25cpである。スピンナーの回転数、感光
性樹脂の粘度をパラメータにすることにより、基板間距
離を1.5〜6μm程度まで任意に変えることができる
。FIG. 3 shows the relationship between the spinner rotation speed and the distance between the substrates during coating of the photosensitive resin. Curve A indicates that the viscosity of the photosensitive resin is 50.
cpSB is 25 cp. By using the rotational speed of the spinner and the viscosity of the photosensitive resin as parameters, the distance between the substrates can be arbitrarily changed from about 1.5 to 6 μm.
次に他の実施例について説明する。Next, other embodiments will be described.
第2図(a)で形成した透明電極群に導電性のテープを
張り付け、すべての透明電極群を電気的に接続する。ガ
ラス基板を硫酸ニッケル溶液に漬け、透明電極群を陰極
にし、陽極にNi棒を用い、両極間にパルス電流波形、
または交直交互波形を加えることにより透明電極群上に
金1)iNiを析出させる。金属Niの膜圧は1〜3μ
m程度あり、十分遮光作用を有する。A conductive tape is attached to the transparent electrode groups formed in FIG. 2(a) to electrically connect all the transparent electrode groups. A glass substrate is immersed in a nickel sulfate solution, the transparent electrode group is used as a cathode, a Ni rod is used as an anode, and a pulse current waveform is generated between the two electrodes.
Alternatively, gold 1) iNi is deposited on the transparent electrode group by applying alternating alternating waveforms. The film thickness of metallic Ni is 1 to 3μ
It has a sufficient light-shielding effect.
上述の製造法により作製した液晶表示装置は画素全体に
わたって均一にギャップを制御できるので、表示ムラが
見られず、優れた表示品位を得ることができる。工法的
にもフォトマスクが不要であり、かつマスク合せをする
必要がないので、電極ピッチの高精細化、または大容量
化に対して、容易に実現できる。Since the liquid crystal display device manufactured by the above manufacturing method can control the gap uniformly over the entire pixel, display unevenness is not observed and excellent display quality can be obtained. Since the construction method does not require a photomask and does not require mask alignment, it is easy to achieve higher definition electrode pitch or larger capacity.
発明の効果
本発明の液晶表示装置の製造法は表示用の透明電極上に
コーティングした金属被膜がフォトマスクとして作用す
るので、マスク合せを行うことなくキャップ制御作用の
あるスペーサを画素全体にわたって均一に形成すること
ができ、表示品位を高めることができかつ表示の高精細
化、大容量表示化を図れ、非常に大きな効果がある。Effects of the Invention In the method for manufacturing a liquid crystal display device of the present invention, the metal film coated on the transparent electrode for display acts as a photomask, so the spacer with a cap control function can be uniformly distributed over the entire pixel without the need for mask alignment. The display quality can be improved, the display can be made in high definition, and the display capacity can be increased, which is very effective.
第1図は本発明の製造方法により作製した液晶表示装置
の断面図、第2図は液晶表示装置の製造法を示す工程図
、第3図は基板間距離とスピンナー回転数との関係を示
したグラフである。
l・・・・・・ガラス基板、2・・・・・・透明電極、
3・・・・・・ラインスペーサ、4・・・・・・配向膜
、5・・・・・・シール材、6・・・・・・液晶層。
代理人の氏名 弁理士 粟野重孝 はか1名第3図
2−fi期’*gIL
ターーーシーノムシらF
C−二5夜晶1
スビ°ソゲー回卑之蛋(
(XIQOII) rpm )
ζqFIG. 1 is a cross-sectional view of a liquid crystal display device manufactured by the manufacturing method of the present invention, FIG. 2 is a process diagram showing the manufacturing method of the liquid crystal display device, and FIG. 3 is a diagram showing the relationship between the distance between substrates and the spinner rotation speed. This is a graph. l...Glass substrate, 2...Transparent electrode,
3...Line spacer, 4...Alignment film, 5...Sealing material, 6...Liquid crystal layer. Name of agent Patent attorney Shigetaka Awano 1 person Fig. 3 2-fi period' *gIL Tar-shi-no-mushi et al.
Claims (4)
の透明電極を有する基板表面に感光性の樹脂を塗布した
後、前記基板裏面より感光性の樹脂を露光することによ
り前記透明電極間に基板間距離を一定に保持するスペー
サを形成することを特徴とする液晶表示装置の製造法。(1) After applying a photosensitive resin to the surface of a substrate having a plurality of transparent electrodes coated with a metal film having a light-shielding effect, the photosensitive resin is exposed to light from the back side of the substrate, thereby creating a space between the transparent electrodes. A method for manufacturing a liquid crystal display device, characterized by forming a spacer that maintains a constant distance.
によって形成することを特徴とする請求項(1)記載の
液晶表示装置の製造法。(2) The method for manufacturing a liquid crystal display device according to claim (1), wherein the metal film having a light-shielding effect is formed by electroless nickel plating.
成することを特徴とする請求項(1)記載の液晶表示装
置の製造法。(3) The method for manufacturing a liquid crystal display device according to claim (1), wherein the metal film having a light-shielding effect is formed by electroplating.
求項(1)記載の液晶表示装置の製造法。(4) The method for manufacturing a liquid crystal display device according to claim (1), wherein the photosensitive resin is of negative type.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13845989A JPH032833A (en) | 1989-05-31 | 1989-05-31 | Production of liquid crystal display device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13845989A JPH032833A (en) | 1989-05-31 | 1989-05-31 | Production of liquid crystal display device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH032833A true JPH032833A (en) | 1991-01-09 |
Family
ID=15222519
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13845989A Pending JPH032833A (en) | 1989-05-31 | 1989-05-31 | Production of liquid crystal display device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH032833A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5490001A (en) * | 1990-11-19 | 1996-02-06 | Semiconductor Energy Laboratory Co., Ltd. | Ferroelectric liquid crystal device with an AC electric field producing a helical structure |
EP0725303A1 (en) * | 1995-02-06 | 1996-08-07 | International Business Machines Corporation | Liquid crystal display device |
US5739882A (en) * | 1991-11-18 | 1998-04-14 | Semiconductor Energy Laboratory Co., Ltd. | LCD polymerized column spacer formed on a modified substrate, from an acrylic resin, on a surface having hydrophilic and hydrophobic portions, or at regular spacings |
US5861932A (en) * | 1997-03-31 | 1999-01-19 | Denso Corporation | Liquid crystal cell and its manufacturing method |
JP2004145084A (en) * | 2002-10-25 | 2004-05-20 | Fujitsu Ltd | Liquid crystal panel and its manufacturing method |
KR20220027843A (en) | 2019-07-08 | 2022-03-08 | 가부시키가이샤 월드메탈 | Bonding body of bonding material and metal layer |
-
1989
- 1989-05-31 JP JP13845989A patent/JPH032833A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5490001A (en) * | 1990-11-19 | 1996-02-06 | Semiconductor Energy Laboratory Co., Ltd. | Ferroelectric liquid crystal device with an AC electric field producing a helical structure |
US5739882A (en) * | 1991-11-18 | 1998-04-14 | Semiconductor Energy Laboratory Co., Ltd. | LCD polymerized column spacer formed on a modified substrate, from an acrylic resin, on a surface having hydrophilic and hydrophobic portions, or at regular spacings |
EP0725303A1 (en) * | 1995-02-06 | 1996-08-07 | International Business Machines Corporation | Liquid crystal display device |
US5861932A (en) * | 1997-03-31 | 1999-01-19 | Denso Corporation | Liquid crystal cell and its manufacturing method |
JP2004145084A (en) * | 2002-10-25 | 2004-05-20 | Fujitsu Ltd | Liquid crystal panel and its manufacturing method |
KR20220027843A (en) | 2019-07-08 | 2022-03-08 | 가부시키가이샤 월드메탈 | Bonding body of bonding material and metal layer |
US11889635B2 (en) | 2019-07-08 | 2024-01-30 | World Metal Co., Ltd | Joined body of joining base material and metal layer |
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