JPH03209609A - Production of perpendicular magnetic thin-film head - Google Patents
Production of perpendicular magnetic thin-film headInfo
- Publication number
- JPH03209609A JPH03209609A JP429490A JP429490A JPH03209609A JP H03209609 A JPH03209609 A JP H03209609A JP 429490 A JP429490 A JP 429490A JP 429490 A JP429490 A JP 429490A JP H03209609 A JPH03209609 A JP H03209609A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- magnetic pole
- main magnetic
- main pole
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 45
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 239000010410 layer Substances 0.000 claims abstract description 73
- 239000011347 resin Substances 0.000 claims abstract description 16
- 229920005989 resin Polymers 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims abstract description 14
- 239000011229 interlayer Substances 0.000 claims abstract description 12
- 238000001312 dry etching Methods 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 239000010408 film Substances 0.000 abstract description 14
- 230000005415 magnetization Effects 0.000 abstract description 8
- 230000007704 transition Effects 0.000 abstract description 8
- 230000001681 protective effect Effects 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 4
- 238000007747 plating Methods 0.000 abstract description 4
- 229910020641 Co Zr Inorganic materials 0.000 abstract description 3
- 229910020520 Co—Zr Inorganic materials 0.000 abstract description 3
- 229920001187 thermosetting polymer Polymers 0.000 abstract description 3
- 229910000859 α-Fe Inorganic materials 0.000 abstract description 3
- 229910003271 Ni-Fe Inorganic materials 0.000 abstract 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 6
- 230000004907 flux Effects 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000002411 adverse Effects 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000000992 sputter etching Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 101100027969 Caenorhabditis elegans old-1 gene Proteins 0.000 description 1
- 229910018605 Ni—Zn Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
〔概 要〕
磁気ディスク装置、或いは磁気テープ装置等に用いられ
る高密度記録に好適な垂直磁気薄膜ヘッドの製造方法に
関し、
主磁極上に積層された主磁極盛上げ層の先端を、漏洩磁
界が弱められる形状にして、記録媒体の磁化遷移に対す
る悪影響を防止した垂直磁気薄膜ヘッドを容易に形成す
ることを目的とし、磁性基板上の磁極形成面に層間絶縁
層で挟まれた薄膜コイルを設け、該層間絶縁層上に後端
部が該基板と磁気的に接続された主磁極を設け、その主
磁極上の主磁極先端部を除いた面に主磁極盛上げ層を形
成してなる垂直磁気薄膜ヘッドの製造法であって、前記
主磁極上に主磁極盛上げ層を形成後、該盛上げ層上に先
端段差部分のみが露出するように樹脂層を被覆する工程
と、該樹脂層より露出した主磁極盛上げ層の先端段差部
分をドライエツチングによりテーパー状に形成する工程
とを施すことにより構成する。[Detailed Description of the Invention] [Summary] A method for manufacturing a perpendicular magnetic thin film head suitable for high-density recording used in magnetic disk devices, magnetic tape devices, etc. The tip is shaped to weaken the leakage magnetic field to easily form a perpendicular magnetic thin-film head that prevents any adverse effects on the magnetization transition of the recording medium. A thin film coil is provided, a main magnetic pole whose rear end is magnetically connected to the substrate is provided on the interlayer insulating layer, and a main magnetic pole raised layer is formed on the surface of the main magnetic pole excluding the main pole tip. A method for manufacturing a perpendicular magnetic thin film head comprising the steps of forming a main pole raised layer on the main pole, and then coating the raised layer with a resin layer so that only the tip step portion is exposed; It is constructed by performing a step of forming a step portion at the tip of the main pole raised layer exposed from the resin layer into a tapered shape by dry etching.
本発明は磁気ディスク装置、或いは磁気テープ装置等に
用いられる高密度記録に好適な垂直磁気薄膜ヘッドの製
造方法に関するものである。The present invention relates to a method of manufacturing a perpendicular magnetic thin film head suitable for high-density recording used in magnetic disk devices, magnetic tape devices, etc.
近来、コンピュータシステムの外部記憶装置である磁気
ディスク装置では、大容量化、高密度記録化に伴いより
高性能な磁気ヘッドが要求されており、このような要求
を満足するものとして、例えば高透磁率な軟磁性層上に
垂直異方性を有する垂直記録層が形成された二層膜構造
の垂直磁気記録媒体と組合わせて、該媒体面に対して垂
直方向に情報を磁化することによって高密度記録を実現
し得る単磁極型の垂直磁気薄膜ヘッドが提案されている
。In recent years, magnetic disk drives, which are external storage devices for computer systems, are required to have higher performance magnetic heads due to larger capacity and higher recording density. By combining a perpendicular magnetic recording medium with a two-layer structure in which a perpendicular recording layer with perpendicular anisotropy is formed on a soft magnetic layer with high magnetic flux, information can be magnetized in a direction perpendicular to the medium surface. A single-pole perpendicular magnetic thin-film head that can realize density recording has been proposed.
かかる垂直磁気薄膜ヘッドでは、記録再生用主磁極上に
更に主磁極盛上げ層を積層した構成により記録・再生効
率を高めているが、その主磁極盛上げ層の先端形状によ
って高密度記録が阻害される傾向があり、そのような問
題を解消した単磁極型の垂直磁気薄膜ヘッドを容易に製
造する方法が必要とされている。In such a perpendicular magnetic thin-film head, recording and reproducing efficiency is enhanced by a structure in which a main pole raised layer is further laminated on the main pole for recording and reproduction, but high-density recording is hindered by the shape of the tip of the main pole raised layer. There is a need for a method for easily manufacturing a single-pole type perpendicular magnetic thin film head that eliminates such problems.
従来の垂直磁気薄膜へ、ドは第5図に示すようにスライ
ダとなるNi−Zn、 Mn−Znなどのフェライトか
らなる磁性基板11上に、熱硬化性樹脂材等からなる層
間絶縁層12で挟まれた例えば渦巻状等からなる薄膜コ
イル13と、その薄膜コイル13を介して例えば0.3
〜0.5μmの膜厚のアモルファスCo−Zr系の磁性
薄膜からなる記録再生用の主磁極14をその後端部14
bが絶縁磁性基板11上に延在するように被着形成し、
該主磁極14上の主磁極先端部14aを除いた領域に3
μm程度の厚い膜厚の例えばNi−Feからなる主磁極
盛上げ層15を順に積層形成する。In the conventional perpendicular magnetic thin film, as shown in FIG. For example, a thin film coil 13 having a spiral shape or the like sandwiched therebetween, and a coil of 0.3
A main magnetic pole 14 for recording and reproduction made of an amorphous Co-Zr magnetic thin film with a film thickness of ~0.5 μm is attached to the rear end 14.
b is deposited and formed so as to extend on the insulated magnetic substrate 11,
3 in the area on the main pole 14 excluding the main pole tip 14a.
A main pole raised layer 15 made of, for example, Ni--Fe and having a thickness of approximately μm is sequentially laminated.
その主磁極盛上げ層15が形成された磁性基板Il上に
更にA ll 20:lなどからなる保護膜■6を被着
形成する。On the magnetic substrate Il on which the main pole raised layer 15 is formed, a protective film 6 made of A ll 20:l or the like is further deposited.
そしてかかるヘッド構成基板を前記主磁極先端部14a
の面が露出するように切断し、かつ平面研磨仕上げを行
って媒体対向面I7を形成し、更にその媒体対向面17
はスライダ形状に切削加工している。Then, the head component board is attached to the main pole tip portion 14a.
The medium facing surface I7 is formed by cutting the surface to expose the medium facing surface I7 and performing surface polishing.
is cut into a slider shape.
しかして、このような構成の垂直磁気薄膜ヘッドは通常
、ディスク基板22上に高透磁率な軟磁性層23を介し
て垂直記録層24が積層された二層膜構造の垂直磁気デ
ィスク21と組合わせ、該垂直磁気薄膜ヘッドの主磁極
14の主磁極先端部14aから発生する磁束は、前記磁
気ディスク21の垂直記録層24を垂直に通過し、その
直下の軟磁性層23内を水平方向に通り再び該垂直記録
層24を垂直に通過し、更に前記薄膜ヘッドの磁性基板
11を通って主磁極14に還流する。A perpendicular magnetic thin film head having such a configuration is usually assembled with a perpendicular magnetic disk 21 having a two-layer structure in which a perpendicular recording layer 24 is laminated on a disk substrate 22 via a high permeability soft magnetic layer 23. At the same time, the magnetic flux generated from the main pole tip 14a of the main pole 14 of the perpendicular magnetic thin-film head passes vertically through the perpendicular recording layer 24 of the magnetic disk 21, and horizontally within the soft magnetic layer 23 immediately below it. The magnetic flux passes through the perpendicular recording layer 24 perpendicularly again, passes through the magnetic substrate 11 of the thin film head, and returns to the main pole 14.
その還流の過程において前記磁気ディスク21の垂直記
録層24が磁化されて情報が記録される。また情報が既
に記録された磁気ディスク21からの漏洩磁束により前
記薄膜ヘッドの主磁極14が磁化されて近傍の薄膜コイ
ル13に発生する起電力による信号を取り出すことによ
り再生を行っている。During the reflux process, the perpendicular recording layer 24 of the magnetic disk 21 is magnetized and information is recorded. Further, the main magnetic pole 14 of the thin film head is magnetized by leakage magnetic flux from the magnetic disk 21 on which information has already been recorded, and reproduction is performed by extracting a signal due to an electromotive force generated in the nearby thin film coil 13.
ところで、上記したような従来の垂直磁気薄膜ヘッドに
あっては、主磁極先端部14aへの磁束の集中による記
録効率の向上と、主磁極14の磁気抵抗の低減による再
生効率の向上を図るために、前記主磁極14上に主磁極
盛上げ層15をレジストマスクを用いたマスクめっき法
により積層形成していることから、形成された主磁極盛
上げ[15の先端が該レジストマスクのパターン形状に
より直角に切り立った段差形状となり、かかる主磁極盛
上げ層15の主に段差エッヂからの漏洩磁界により、本
来の主磁極先端部14aからの記録磁界による記録媒体
の磁化遷移が乱されという悪影響を受けて高密度記録が
阻害されるといった欠点があった。By the way, in the conventional perpendicular magnetic thin film head as described above, in order to improve the recording efficiency by concentrating the magnetic flux on the main pole tip 14a and to improve the reproduction efficiency by reducing the magnetic resistance of the main pole 14. In addition, since the main pole build-up layer 15 is laminated on the main pole 14 by a mask plating method using a resist mask, the tip of the formed main pole build-up [15] is at right angles due to the pattern shape of the resist mask. The leakage magnetic field mainly from the step edges of the main pole raised layer 15 disturbs the magnetization transition of the recording medium due to the original recording magnetic field from the main pole tip 14a, resulting in a high magnetic field. There was a drawback that density recording was inhibited.
本発明は上記した従来の欠点に鑑み、主磁極上に積層さ
れた主磁極盛上げ層の先端を、漏洩磁界が弱められる形
状にして、記録媒体の磁化遷移に対する悪影響を防止し
た垂直磁気薄膜ヘッドを容易に形成する新規な製造方法
を提供することを目的とするものである。In view of the above-mentioned conventional drawbacks, the present invention provides a perpendicular magnetic thin film head in which the tip of the main pole raised layer stacked on the main pole is shaped to weaken the leakage magnetic field, thereby preventing an adverse effect on the magnetization transition of the recording medium. The object is to provide a new manufacturing method that allows easy formation.
本発明は上記した目的を達成するため、磁性基板上の磁
極形成面に層間絶縁層で挟まれた薄膜コイルを設け、該
層間絶縁層上に後端部が該基板と磁気的に接続された主
磁極を設け、その主磁極上の主磁極先端部を除いた面に
主磁極盛上げ層を形成してなる垂直磁気薄膜ヘッドの製
造法であって、前記主磁極上に主磁極盛上げ層を形成後
、該盛上げ層上に先端段差部分のみが露出するように樹
脂層を被覆する工程と、該樹脂層より露出した主磁極盛
上げ層の先端段差部分をドライエツチングによりテーパ
ー状に形成する工程とを施すことにより構成する。In order to achieve the above object, the present invention provides a thin film coil sandwiched between interlayer insulating layers on the magnetic pole forming surface of a magnetic substrate, and has a rear end portion magnetically connected to the substrate on the interlayer insulating layer. A method for manufacturing a perpendicular magnetic thin film head in which a main pole is provided and a main pole raised layer is formed on a surface of the main pole excluding the tip of the main pole, the main pole raised layer being formed on the main pole. After that, a step of coating the raised layer with a resin layer so that only the stepped portion at the tip is exposed, and a step of forming the stepped portion at the tip of the main pole raised layer exposed from the resin layer into a tapered shape by dry etching. Construct by applying.
本発明では、ドライエツチング法、例えばイオンエツチ
ングにおいては、第2図に示すように被エツチング物に
対するイオンエツチング速度は、不活性ガスイオン、或
いは反応性ガスイオンの入射角度θに大きく依存し、第
3図(alに示すような入射角度θで段差部分32を有
する被エツチング物31上に前記ガスイオンを照射した
際のイオンエツチング速度は該段差部分32が最も大き
くなり、このイオンエツチングが第3図(blから(C
)、 (d)へと進行するに伴って前記段差部分32が
他の部分よりも速く傾斜状にエツチングされることを利
用して、主磁極上に積層された主磁極−盛上げ層の先端
段差部分を前記ガスイオンによりエツチングすることに
より、その部分の膜厚が徐々に薄層化されてテーパー状
(先細り状)に形成されるので、該主磁極盛上げ層の先
端部からの漏洩する磁界が微弱となり、その結果、記録
媒体の磁化遷移に対して悪影響を及ぼすことがなくなる
。In the present invention, in the dry etching method, for example, ion etching, as shown in FIG. When the gas ions are irradiated onto the object to be etched 31 having a stepped portion 32 at an incident angle θ as shown in FIG. Figure (from bl (C
) and (d), the step portion 32 is etched in an inclined manner faster than other portions. By etching the part with the gas ions, the film thickness of that part is gradually thinned and formed into a tapered shape, so that the magnetic field leaking from the tip of the main pole raised layer is reduced. It becomes very weak, and as a result, there is no adverse effect on the magnetization transition of the recording medium.
以下図面を用いて本発明の実施例について詳細に説明す
る。Embodiments of the present invention will be described in detail below with reference to the drawings.
第1図(a)〜(e)は本発明に係る垂直磁気薄膜ヘッ
ドの製造方法の一実施例を工程順に示す要部断面図であ
る。FIGS. 1(a) to 1(e) are sectional views of essential parts showing an embodiment of a method for manufacturing a perpendicular magnetic thin film head according to the present invention in the order of steps.
先ず第1図(alに示すようにスライダとなるNi−Z
n。First, as shown in Figure 1 (a.
n.
或いはMn−Znなどのフェライトからなる磁性基板4
1上の主磁極形成領域に、熱硬化性樹脂材等からなる層
間絶縁層42で挟まれた例えば渦巻状等からなる薄膜コ
イル43を形成し、その薄膜コイル43をを覆う層間絶
縁層42上にスパッタリング法により例えば0.3〜0
.5μmの膜厚のアモルファスCo−Zr系の磁性薄膜
からなる記録再生用の主磁極44をその後端部44bが
前記基板41上に延在するように被着形成し、引き続き
該主磁極44上の主磁極先端部44aを除いた領域に3
μm程度の厚い膜厚のNi−Feからなる主磁極盛上げ
層45をマスクめっき法によりパターン形成する。Alternatively, a magnetic substrate 4 made of ferrite such as Mn-Zn
A thin film coil 43 having a spiral shape, for example, sandwiched between interlayer insulating layers 42 made of a thermosetting resin material or the like is formed in the main magnetic pole forming region on the main magnetic pole forming region 1, and a thin film coil 43 having a spiral shape or the like is formed on the interlayer insulating layer 42 that covers the thin film coil 43. For example, 0.3 to 0 by sputtering method.
.. A main magnetic pole 44 for recording and reproducing made of an amorphous Co--Zr magnetic thin film with a film thickness of 5 μm is deposited so that its rear end 44b extends on the substrate 41, and then a layer on the main magnetic pole 44 is formed. 3 in the area excluding the main pole tip 44a.
A main pole raised layer 45 made of Ni--Fe having a thickness of approximately μm is patterned by mask plating.
次に第1図(b)に示すように層間絶縁層42、主磁極
先端部分44aを含む主磁極盛上げ層45上にその先端
段差部分45aのみが露出するようにフォトレジスト等
からなる樹脂材を粘度を調整して回転塗布法により塗布
して樹脂層46を形成する。Next, as shown in FIG. 1(b), a resin material made of photoresist or the like is applied on the main pole raised layer 45 including the interlayer insulating layer 42 and the main pole tip portion 44a so that only the tip stepped portion 45a is exposed. The resin layer 46 is formed by adjusting the viscosity and coating by a spin coating method.
次に第1図(C)に示すように前記樹脂層46を形成し
た面に、例えばアルゴン(Ar)等の不活性ガスイオン
を矢印で示すように照射してイオンエツチングを行い、
該樹脂層46より露出する主磁極盛上げ層45の先端段
差部分45aをテーパー状に加工する。Next, as shown in FIG. 1C, the surface on which the resin layer 46 is formed is irradiated with ions of an inert gas such as argon (Ar) in the direction shown by the arrow to perform ion etching.
The tip stepped portion 45a of the main pole raised layer 45 exposed from the resin layer 46 is processed into a tapered shape.
その後、第1図(d)に示すように前記樹脂層46を有
機溶側等により溶解除去し、かかるヘッド構成基板上の
全面にA N 20.などからなる保護膜47を被着形
成し、更に前記主磁極先端部44aが露出するように図
中のAで示す一点鎖線の位置で切断し、その切断面をス
ライダ形状に研削・研磨仕上げを行って媒体対向面48
を形成する。Thereafter, as shown in FIG. 1(d), the resin layer 46 is dissolved and removed using an organic solvent, etc., and A N 20. A protective film 47 consisting of the like is deposited and then cut at the position indicated by the dashed line A in the figure so that the main pole tip 44a is exposed, and the cut surface is ground and polished into a slider shape. Go to the medium facing surface 48
form.
かくすれば、第1図(e)に示すように主磁極44上に
積層された主磁極盛上げ層45の先端部をテーパー状(
先細り状)にした垂直磁気薄膜ヘッドが容易に得られ、
該主磁極盛上げ層45の先端部からの漏洩磁界が微弱と
なるので、記録媒体の磁化遷移に対する悪影響が解消す
る。In this way, as shown in FIG.
A perpendicular magnetic thin film head with a tapered shape can be easily obtained.
Since the leakage magnetic field from the tip of the main pole raised layer 45 becomes weak, the adverse effect on the magnetization transition of the recording medium is eliminated.
更に第4図(a)〜(elは本発明に基づく製造方法の
他の実施例を工程順に示すもの、第1図(a)〜(e)
と同等部分には同一符号を付している。これらの図で示
す実施例が第1図(a)〜(e)の実施例と異なる点は
、第4図(a)に示すようにスライダとなるNi−Zn
等のフェライトからなる磁性基板41上の主磁極形成領
域に、熱硬化性樹脂材等からなる層間絶縁層42で挟ま
れた例えば渦巻状等からなる薄膜コイル43を形成し、
その薄膜コイル43上を覆う層間絶縁層42上にスパッ
タリング法により例えば0.3〜0.5μmの膜厚のア
モルファスCo−Zr系の主磁極形成用の磁性薄膜51
を被着形成し、その主磁極形成用の磁性薄膜51上に3
μ鞘程度の厚い膜厚のNi−Feからなる主磁極盛上げ
層45をマスクめっき法によりパターン形成する。Furthermore, FIGS. 4(a) to 4(el) show other embodiments of the manufacturing method based on the present invention in the order of steps, and FIGS. 1(a) to (e)
The same parts are given the same symbols. The difference between the embodiment shown in these figures and the embodiment shown in FIGS. 1(a) to (e) is that, as shown in FIG. 4(a), the Ni-Zn slider
A thin film coil 43, for example, in a spiral shape, sandwiched between interlayer insulating layers 42 made of a thermosetting resin material, etc., is formed in the main pole formation region on a magnetic substrate 41 made of ferrite such as;
On the interlayer insulating layer 42 covering the thin film coil 43, an amorphous Co-Zr based magnetic thin film 51 for forming a main magnetic pole having a film thickness of, for example, 0.3 to 0.5 μm is formed by sputtering.
3 on the magnetic thin film 51 for forming the main magnetic pole.
A main magnetic pole raised layer 45 made of Ni--Fe and having a thickness as thick as a μ-sheath is patterned by mask plating.
次に第4図(′b)に示すように主磁極形成用の磁性薄
膜51上を含む主磁極盛上げ層45上に、その先端段差
部分45aのみが露出するように粘度等を調整したフォ
トレジストを回転塗布法により塗布した後、主磁極形状
にパターニングして主磁極パターン形状のレジスト膜5
2を形成する。Next, as shown in FIG. 4('b), a photoresist whose viscosity etc. have been adjusted so that only the tip stepped portion 45a is exposed is applied on the main pole heaping layer 45 including the magnetic thin film 51 for forming the main pole. is coated by a spin coating method, and then patterned in the shape of the main pole to form a resist film 5 in the shape of the main pole pattern.
form 2.
次に第4図(e)に示すようにパターニングした前記レ
ジスト膜52上及び露呈する主磁極形成用の磁性薄膜5
1上に、例えばアルゴン(^r)等の不活性ガスイオン
を矢印で示すように照射してイオンエツチングを行い、
該レジスト膜52より露出する主磁極形成用の磁性薄膜
51部分を除去して主磁極53を形成すると共に、主磁
極盛上げ層45の先端段差部分45aをテーパー状に加
工する。Next, as shown in FIG. 4(e), the magnetic thin film 5 for forming the main magnetic pole is exposed on the patterned resist film 52.
1, perform ion etching by irradiating inert gas ions such as argon (^r) in the direction shown by the arrow,
The portion of the magnetic thin film 51 for forming the main pole exposed from the resist film 52 is removed to form the main pole 53, and the tip stepped portion 45a of the main pole raised layer 45 is processed into a tapered shape.
その後、第4図(diに示すように前記レジスト膜52
を有機溶削等により溶解除去し、かかるヘッド構成基板
上の全面に1Z03などからなる保護膜47を被着形成
し、更に前記主磁極先端部53aが露出するように図中
のBで示す一点鎖線の位置で切断し、その切断面をスラ
イダ形状に研削・研磨仕上げを行って媒体対向面48を
形成したことである。After that, as shown in FIG. 4 (di), the resist film 52
A protective film 47 made of 1Z03 or the like is formed on the entire surface of the head constituting substrate by dissolving and removing it by organic cutting or the like, and a point indicated by B in the figure is formed so that the main pole tip 53a is exposed. The medium facing surface 48 is formed by cutting at the position of the chain line and grinding and polishing the cut surface into a slider shape.
このような実施例によっても第4図telに示すように
主磁極53上の主磁極盛上げ層45の先端部をテーパー
状(先細り状)にした垂直磁気薄膜ヘッドが容易に得ら
れ、第1図(e)により説明したと同様に咳主磁極盛上
げ層45の先端部からの漏洩磁界を微弱化し、記録媒体
の磁化遷移に対する悪影響を解消することができる。Even with such an embodiment, a perpendicular magnetic thin film head in which the tip of the main pole raised layer 45 on the main pole 53 is tapered can be easily obtained as shown in FIG. As explained in (e), the leakage magnetic field from the tip of the main magnetic pole heaping layer 45 can be weakened, and the adverse effect on the magnetization transition of the recording medium can be eliminated.
以上の説明から明らかなように、本発明に係る垂直磁気
薄膜ヘッドの製造方法によれば、主磁極上の主磁極盛上
げ層の先端部を容易にテーパー状(先細り状)にするこ
とができ、そのような構成とすることにより、該主磁極
盛上げ層先端部からの漏洩磁界が弱められるので、記録
媒体の磁化遷移に対する影響が解消され、高密度記録化
が容易となる等、実用上価れた効果を奏する。As is clear from the above description, according to the method of manufacturing a perpendicular magnetic thin film head according to the present invention, the tip of the main pole heaping layer on the main pole can be easily made into a tapered shape. With such a configuration, the leakage magnetic field from the tip of the main pole heaping layer is weakened, eliminating the influence on the magnetization transition of the recording medium, facilitating high-density recording, and improving practical cost. It has a great effect.
第1図(a)〜telは本発明に係る垂直磁気薄膜ヘッ
ドの製造方法の一実施例を工程順に示
す要部断面図、
第2図は被エツチング物に対するイオンの入射角度とエ
ツチング速度との関係を示す
図、
第3図(a)〜((11はイオンエツチングによる段差
部分の形状変化を順に示す要部断面図、
第4図(a)〜(e)は本発明に係る垂直磁気薄膜ヘッ
ドの製造方法の他の実施例を工程順に
示す要部断面図、
第5図は従来の垂直磁気薄膜ヘッドを説明するための要
部断面図である。
第1図(al〜(e)及び第4図(al〜(elにおい
て、31は被エツチング物、32は段差部分、41は磁
性基板、42は層間絶縁層、43は薄膜コイル、44.
53は主磁極、45は主磁極盛上げ層、46は樹脂層、
47は保護膜、48は媒体対向面、51は磁性薄膜、5
2はレジスト膜をそれぞれ示す。
(e)
A→bR@イ配磯力J奪ル舜へ一1F^引−!オヲ乏n
−突方会?」を打平(チーtdb閃第1図
→ イオ〉λ#′r山θ(71)
ィ才〉4入船“角とエヅ+>7”i!廣關間係9才1を
訂第2図
(0)
イ、t>r−y千>7″l?jり!2ノ1@/l形イt
−1<t9イ1−;零jt舒Jす“6うG1第3図
第
図
従東南緯気11饗ヘツp1建明tJl郵4を向1第5mFIGS. 1(a) to tel are cross-sectional views of main parts showing the process order of an embodiment of the method for manufacturing a perpendicular magnetic thin film head according to the present invention. FIG. Figures 3(a) to (11 are cross-sectional views of main parts sequentially showing changes in shape of stepped portions due to ion etching, and Figures 4(a) to (e) are perpendicular magnetic thin films according to the present invention. FIG. 5 is a cross-sectional view of a main part showing another embodiment of a head manufacturing method in the order of steps. FIG. 5 is a cross-sectional view of a main part for explaining a conventional perpendicular magnetic thin film head. 4 (al to (el), 31 is the object to be etched, 32 is the stepped portion, 41 is the magnetic substrate, 42 is the interlayer insulating layer, 43 is the thin film coil, 44.
53 is a main pole, 45 is a main pole build-up layer, 46 is a resin layer,
47 is a protective film, 48 is a medium facing surface, 51 is a magnetic thin film, 5
2 indicates a resist film, respectively. (e) A→bR@I distribution force J take Le Shun to 11F^ pull-! Owo lack n
-A meeting? ” was struck (Chi tdb flash 1st figure → Io〉λ#'r mountain θ (71) 〉4〉4 Irifune “Kaku to Ezu +>7” i! Hirokanma 9 years old 1 revised 2nd Figure (0) I, t>ry 1,000>7″l?j ri! 2 no 1 @/l shape I
-1<t9I1-; Zero jt Shu Jsu "6UG1 Figure 3 Figure Southeast latitude Qi 11 Hetsu p1 Jianmei tJl Post 4 facing 1 5m
Claims (1)
で挟まれた薄膜コイル(43)を設け、該層間絶縁層(
42)上に後端部(44b)が該基板(41)と磁気的
に接続された主磁極(44)を設け、その主磁極(44
)上の主磁極先端部(44a)を除いた面に主磁極盛上
げ層(45)を形成してなる垂直磁気薄膜ヘッドの製造
法であって、 前記主磁極(44)上に主磁極盛上げ層(45)を形成
後、該盛上げ層(45)上に先端段差部分(45a)の
みが露出するように樹脂層(46)を被覆する工程と、
該樹脂層(46)より露出した主磁極盛上げ層(45)
の先端段差部分(45a)をドライエッチングによりテ
ーパー状に形成する工程とを施すことを特徴とする垂直
磁気薄膜ヘッドの製造方法。[Claims] An interlayer insulating layer (42) is provided on the magnetic pole formation surface on the magnetic substrate (41).
A thin film coil (43) sandwiched between the interlayer insulating layer (43) is provided.
42) A main magnetic pole (44) whose rear end (44b) is magnetically connected to the substrate (41) is provided on the main magnetic pole (44).
) A method for manufacturing a perpendicular magnetic thin film head in which a main pole raised layer (45) is formed on a surface other than a main pole tip (44a) on the main pole (44), the main pole raised layer (45) being formed on the main pole (44). After forming (45), a step of covering the raised layer (45) with a resin layer (46) so that only the tip stepped portion (45a) is exposed;
Main pole raised layer (45) exposed from the resin layer (46)
A method of manufacturing a perpendicular magnetic thin film head, comprising: forming a step portion (45a) at a tip end into a tapered shape by dry etching.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP429490A JPH03209609A (en) | 1990-01-10 | 1990-01-10 | Production of perpendicular magnetic thin-film head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP429490A JPH03209609A (en) | 1990-01-10 | 1990-01-10 | Production of perpendicular magnetic thin-film head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03209609A true JPH03209609A (en) | 1991-09-12 |
Family
ID=11580496
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP429490A Pending JPH03209609A (en) | 1990-01-10 | 1990-01-10 | Production of perpendicular magnetic thin-film head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03209609A (en) |
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---|---|---|---|---|
KR100446728B1 (en) * | 2001-11-30 | 2004-09-01 | 엘지전자 주식회사 | Apparatus for near field optical recorder |
US7006326B2 (en) | 2000-09-18 | 2006-02-28 | Hitachi, Ltd. | Single pole type recording head with tapered edges |
EP1148473A3 (en) * | 2000-04-10 | 2006-10-18 | Samsung Electronics Co., Ltd. | Method and apparatus for perpendicular magnetic recording |
US7159302B2 (en) | 2004-03-31 | 2007-01-09 | Hitachi Global Storage Technologies Netherlands B.V. | Method for manufacturing a perpendicular write head |
US7212379B2 (en) | 2004-03-31 | 2007-05-01 | Hitachi Global Storage Technologies Netherlands B.V. | Perpendicular magnetic recording head with flare and taper configurations |
US7251878B2 (en) | 2004-06-30 | 2007-08-07 | Hitachi Global Storage Technologies Netherlands B.V. | Method and apparatus for defining leading edge taper of a write pole tip |
US8201320B2 (en) | 2009-12-17 | 2012-06-19 | Hitachi Global Storage Technologies Netherlands B.V. | Method for manufacturing a magnetic write head having a wrap around shield that is magnetically coupled with a leading magnetic shield |
US8230583B2 (en) | 2007-03-08 | 2012-07-31 | Hitachi Global Storage Technologies Netherlands B.V. | Method for manufacturing a magnetic write head |
US8233235B2 (en) | 2009-12-09 | 2012-07-31 | Hitachi Global Storage Technologies Netherlands B.V. | PMR writer having a tapered write pole and bump layer and method of fabrication |
US8347488B2 (en) | 2009-12-09 | 2013-01-08 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic write head manufactured by damascene process producing a tapered write pole with a non-magnetic step and non-magnetic bump |
US8451560B2 (en) | 2009-12-09 | 2013-05-28 | HGST Netherlands B.V. | Magnetic head with flared write pole with multiple non-magnetic layers thereover |
US8498078B2 (en) | 2009-12-09 | 2013-07-30 | HGST Netherlands B.V. | Magnetic head with flared write pole having multiple tapered regions |
US8553360B2 (en) | 2009-12-09 | 2013-10-08 | HGST Netherlands B.V. | Magnetic recording head having write pole with higher magnetic moment towards trailing edge |
-
1990
- 1990-01-10 JP JP429490A patent/JPH03209609A/en active Pending
Cited By (16)
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---|---|---|---|---|
EP1148473A3 (en) * | 2000-04-10 | 2006-10-18 | Samsung Electronics Co., Ltd. | Method and apparatus for perpendicular magnetic recording |
US7006326B2 (en) | 2000-09-18 | 2006-02-28 | Hitachi, Ltd. | Single pole type recording head with tapered edges |
US7133252B2 (en) | 2000-09-18 | 2006-11-07 | Hitachi Global Storage Technologies Japan, Ltd. | Single pole type recording head with trailing side tapered edges |
KR100446728B1 (en) * | 2001-11-30 | 2004-09-01 | 엘지전자 주식회사 | Apparatus for near field optical recorder |
US7159302B2 (en) | 2004-03-31 | 2007-01-09 | Hitachi Global Storage Technologies Netherlands B.V. | Method for manufacturing a perpendicular write head |
US7212379B2 (en) | 2004-03-31 | 2007-05-01 | Hitachi Global Storage Technologies Netherlands B.V. | Perpendicular magnetic recording head with flare and taper configurations |
US7251878B2 (en) | 2004-06-30 | 2007-08-07 | Hitachi Global Storage Technologies Netherlands B.V. | Method and apparatus for defining leading edge taper of a write pole tip |
US8230583B2 (en) | 2007-03-08 | 2012-07-31 | Hitachi Global Storage Technologies Netherlands B.V. | Method for manufacturing a magnetic write head |
US8634162B2 (en) | 2007-03-08 | 2014-01-21 | HGST Netherlands B.V. | Perpendicular write head having a stepped flare structure and method of manufacture thereof |
US8797685B2 (en) | 2007-03-08 | 2014-08-05 | HGST Netherlands B.V. | Perpendicular write head having a stepped flare structure and method of manufacture thereof |
US8233235B2 (en) | 2009-12-09 | 2012-07-31 | Hitachi Global Storage Technologies Netherlands B.V. | PMR writer having a tapered write pole and bump layer and method of fabrication |
US8347488B2 (en) | 2009-12-09 | 2013-01-08 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic write head manufactured by damascene process producing a tapered write pole with a non-magnetic step and non-magnetic bump |
US8451560B2 (en) | 2009-12-09 | 2013-05-28 | HGST Netherlands B.V. | Magnetic head with flared write pole with multiple non-magnetic layers thereover |
US8498078B2 (en) | 2009-12-09 | 2013-07-30 | HGST Netherlands B.V. | Magnetic head with flared write pole having multiple tapered regions |
US8553360B2 (en) | 2009-12-09 | 2013-10-08 | HGST Netherlands B.V. | Magnetic recording head having write pole with higher magnetic moment towards trailing edge |
US8201320B2 (en) | 2009-12-17 | 2012-06-19 | Hitachi Global Storage Technologies Netherlands B.V. | Method for manufacturing a magnetic write head having a wrap around shield that is magnetically coupled with a leading magnetic shield |
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