JPH0312276A - Washing apparatus - Google Patents
Washing apparatusInfo
- Publication number
- JPH0312276A JPH0312276A JP14685389A JP14685389A JPH0312276A JP H0312276 A JPH0312276 A JP H0312276A JP 14685389 A JP14685389 A JP 14685389A JP 14685389 A JP14685389 A JP 14685389A JP H0312276 A JPH0312276 A JP H0312276A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- solvent
- shutter
- tank
- paper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005406 washing Methods 0.000 title description 3
- 239000002904 solvent Substances 0.000 claims abstract description 92
- 238000004140 cleaning Methods 0.000 claims description 46
- 238000001816 cooling Methods 0.000 claims description 21
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000007789 sealing Methods 0.000 claims 1
- 238000009792 diffusion process Methods 0.000 abstract description 4
- 238000003912 environmental pollution Methods 0.000 abstract description 4
- 239000007789 gas Substances 0.000 description 41
- 238000011084 recovery Methods 0.000 description 10
- 238000005259 measurement Methods 0.000 description 8
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000000630 rising effect Effects 0.000 description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- 230000006378 damage Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000013020 steam cleaning Methods 0.000 description 3
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 2
- 239000011538 cleaning material Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 239000003673 groundwater Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000003915 air pollution Methods 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 238000003895 groundwater pollution Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は洗浄装置に関し、特に洗浄装置内の溶剤ガスの
拡散に伴なうオゾン層の破壊、地下水汚染等の環境汚染
を防止し、ランニングコストの低減及び回収再生溶剤の
品質の向上を図ることのできる洗浄装置に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a cleaning device, and in particular, to prevent environmental pollution such as ozone layer destruction and groundwater contamination due to the diffusion of solvent gas in the cleaning device, and The present invention relates to a cleaning device that can reduce costs and improve the quality of recovered and recycled solvent.
〔背景技術]
従来、この種の洗浄装置としては第7図及び第8図に示
すものがある。[Background Art] Conventionally, there are cleaning devices of this type as shown in FIGS. 7 and 8.
第7図(a)及び(b)は密閉構造形式であり、第8図
(a)及び(b)は密閉構造且排気形式のものである。7(a) and (b) are of a closed structure type, and FIGS. 8(a) and (b) are of a closed structure and exhaust type.
前者の洗浄装置(a)は搬送手段(図示せず)により搬
送路20上に搬送されてくる洗浄物を収納して洗浄し、
洗浄後は他工程に移送するものである。この洗浄装置は
装置最下部に設けられた溶剤室21と、この溶剤室21
の上部に設けられた溶剤ペーパー室22と、前記溶剤室
21と並列配置された蒸気発生槽23と、この溶剤ペー
パー室22の上部に位置するチャンバー24と、このチ
ャンバー24の出入口を開閉をする出入口シャッター2
5とで構成され、夫々の室若しくは槽は連通されている
。The former cleaning device (a) stores and cleans the cleaning items conveyed onto the conveyance path 20 by a conveyance means (not shown),
After cleaning, it is transferred to another process. This cleaning device includes a solvent chamber 21 provided at the bottom of the device, and a solvent chamber 21 provided at the bottom of the device.
a solvent paper chamber 22 provided above, a steam generation tank 23 arranged in parallel with the solvent chamber 21, a chamber 24 located above this solvent paper chamber 22, and an entrance/exit of this chamber 24 that opens and closes. Entrance shutter 2
5, and each chamber or tank is in communication with each other.
前記溶剤室21内には液中冷却コイル26が周囲に配設
され、この液中冷却コイル26により溶剤室21内の溶
剤27を冷却して洗浄物を浸漬洗浄する。溶剤ペーパー
室22に隣接する蒸気発生槽23内には溶剤27が満た
されており、この溶剤27は蒸気発生槽23に配設され
たヒータ23aにより加熱されて高濃度溶剤ガス(ペー
パー)22aを発生する。このペーパー2aは溶剤ペー
パー室22上部周壁に配設されたペーパー冷却コイル2
8により冷却されて凝縮回収される。このペーパー冷却
コイル28の管内には、水又は冷媒ガスにより冷却する
ものであるが、この冷却コイルがONのときはペーパー
22aがチャンバー24内に漏れないようにペーパー2
2aを凝縮回収するものである。また、搬送路20上に
載置された洗浄物収納篭29(以下、洗浄篭と称する。A submerged cooling coil 26 is disposed around the solvent chamber 21, and the submerged cooling coil 26 cools the solvent 27 in the solvent chamber 21 to immerse and wash the object. A steam generation tank 23 adjacent to the solvent paper chamber 22 is filled with a solvent 27, and this solvent 27 is heated by a heater 23a provided in the steam generation tank 23 to generate a highly concentrated solvent gas (paper) 22a. Occur. This paper 2a is a paper cooling coil 2 disposed on the upper peripheral wall of the solvent paper chamber 22.
8 and condensed and recovered. The inside of the pipe of this paper cooling coil 28 is cooled by water or refrigerant gas, and when this cooling coil is ON, the paper 22a is heated to prevent the paper 22a from leaking into the chamber 24.
2a is condensed and recovered. Further, a cleaning item storage basket 29 (hereinafter referred to as a cleaning basket) placed on the conveyance path 20.
)は出入口シャッター25により装置内部とを移動でき
るが、この洗浄篭29はチェーン等よりなる駆動手段(
図示せず)により装置内部を移動して洗浄される。) can be moved in and out of the apparatus by the entrance/exit shutter 25, but this cleaning basket 29 is moved by a driving means (
(not shown) moves inside the device and is cleaned.
また、洗浄装置(b)は、装置(a)と路間−の構成で
あるが、溶剤ペーパー室22と蒸気発生槽23との境界
に回動軸30を支点として矢印方向に回動するff[3
1と、溶剤ペーパー室22と、チャンバー24との間に
設けられた上昇板32を有する点で相違する。この上昇
板32は、ペーパー22aの上昇を防ぐためのものであ
り、洗浄篭29が出入口シャッター25から搬入若しく
は搬出される時に図示せぬ移動機構により図中仮想線で
示す間を昇降するように構成されている。溶剤ペーパー
室22で洗浄物の蒸気洗浄若しくは乾燥工程中等は、上
昇板32は仮想線の位置にあり密閉状態とされている。Further, the cleaning device (b) has a configuration between the device (a) and the passageway, but the cleaning device (b) rotates in the direction of the arrow with a rotation shaft 30 at the boundary between the solvent paper chamber 22 and the steam generation tank 23 as a fulcrum. [3
1 in that it has a rising plate 32 provided between a solvent paper chamber 22 and a chamber 24. This ascending plate 32 is for preventing the paper 22a from rising, and when the cleaning basket 29 is carried in or out from the entrance/exit shutter 25, it is raised and lowered by a moving mechanism (not shown) between the positions indicated by the imaginary lines in the figure. It is configured. During the steam cleaning or drying process of the cleaning material in the solvent paper chamber 22, the rising plate 32 is located at the position of the imaginary line and is in a sealed state.
このときn31は蒸気洗浄中は開いており、乾燥工程中
は図示のごとく閉じてペーパーが溶剤ペーパー室22へ
流れ込むのを防ぐように構成されている。At this time, n31 is open during steam cleaning and closed as shown in the drawing during the drying process to prevent paper from flowing into the solvent paper chamber 22.
次に、後者の洗浄装置(a)は、第7図(a)のものと
路間−構成であり、チャンバー24に排気口33を設け
、この排気口よりペーパー22aを排気して図示せぬ回
収器に送出するものである。また、装置(b)は、搬送
路20の下部に排気ダクト34を設け、このダクト34
より排気して回収器側に送出するものである。Next, the latter cleaning device (a) has an inter-way configuration similar to that in FIG. It is sent to a recovery device. Further, the device (b) is provided with an exhaust duct 34 at the lower part of the conveyance path 20, and this duct 34
The gas is evacuated and sent to the recovery device.
[発明が解決しようとする課題]
しかしながら、従来の洗浄装置では以下のような欠点が
ある。[Problems to be Solved by the Invention] However, conventional cleaning devices have the following drawbacks.
第1に、ペーパー化された溶剤を冷却コイルのみによっ
て完全に回収することはできない。First, the paperized solvent cannot be completely recovered by cooling coils alone.
例えば、フロン(R−113)では−30’cの時、公
知の飽和表を用いると密度(蒸気)として0.2658
6Kg/m”存在するが、第10図で示すようにペーパ
ーされた溶剤を−30’cに冷却しても溶剤濃度が薄い
ので回収効率は0である。しかも、冷却コイルによる冷
却温度は一5〜0°C程度までしか通常冷却できないの
で、回収効率は更に悪化する。For example, for Freon (R-113), at -30'c, using a known saturation table, the density (vapor) is 0.2658
6Kg/m'', but as shown in Figure 10, even if the papered solvent is cooled to -30'C, the recovery efficiency is 0 because the solvent concentration is low.Moreover, the cooling temperature by the cooling coil is constant. Since it can usually be cooled only to about 5 to 0°C, the recovery efficiency is further deteriorated.
第2に、洗浄装置から洗浄物を搬送する時は可動シャッ
タにより開閉を行なうため、溶剤ガスの漏れが生ずる。Second, since a movable shutter is opened and closed when the cleaning item is transported from the cleaning device, leakage of solvent gas occurs.
しかし、この可動シャッターが全閉状態であっても構造
的に完全な密閉状態ではないため、気体状の溶剤ガスが
シールされている隙間等から漏れる恐れがある。更に、
この可動シャッタは洗浄物の搬送を行なうチェーン等の
構造物の可動部からも漏れが生ずる欠点がある。However, even when the movable shutter is fully closed, it is not structurally completely sealed, so there is a risk that gaseous solvent gas may leak from the sealed gap. Furthermore,
This movable shutter has the disadvantage that leakage occurs from the movable parts of structures such as chains that transport the cleaning items.
以上のような従来装置の欠点について第7図及び第8図
の装置について夫々述べる。Regarding the above-mentioned drawbacks of the conventional devices, the devices shown in FIGS. 7 and 8 will be described respectively.
■第7図(a)及び(b)の装置は出入口シャッタ及び
ペーパーインに囲まれた空間に高濃度溶剤ガスが存在す
るが、このガスは冷却4イルでは充分回収することがで
きない、したがって、出入口シャッターを開けた際に多
量のガスが装置系外に漏れ出す欠点がある。また、可動
シャッターのシール搬送構造物等の可動部からのガス漏
れも起る欠点がある。■In the equipment shown in Figures 7(a) and (b), there is a highly concentrated solvent gas in the space surrounded by the entrance/exit shutter and the paper in, but this gas cannot be sufficiently recovered by four cooling cycles. There is a drawback that a large amount of gas leaks out of the system when the entrance/exit shutter is opened. Another disadvantage is that gas leaks from movable parts such as the seal conveying structure of the movable shutter.
更に、第7図(b)の装置では槽内シャッターを上下に
移動させて装置内部の密着性を向上させているが、この
シャッターの上下動及び気流の乱れによる高濃度ガスの
扇り出し及び洗浄物の搬送に伴なう気流の乱れ等により
、槽内のシャッターと出入口シャッターに囲まれる空間
に存在する高濃度溶剤ガスは出入口シャッターを開けた
時に多量に系外に漏れ出す。第9図は高濃度溶剤ガスが
多量に存在している状態を示している。Furthermore, in the device shown in Fig. 7(b), the shutter inside the tank is moved up and down to improve the adhesion inside the device, but due to the vertical movement of the shutter and the turbulence of the airflow, high concentration gas is fanned out and Due to the turbulence of airflow caused by the transport of the cleaning material, a large amount of the highly concentrated solvent gas existing in the space surrounded by the shutter in the tank and the entrance/exit shutter leaks out of the system when the entrance/exit shutter is opened. FIG. 9 shows a state where a large amount of highly concentrated solvent gas is present.
■次に、第8図(a)の装置では排気風量を多くしない
と出入口シャッターからの高濃度溶剤ガスの流出が生じ
る。逆に、排気風量を多くすると洗浄装置内のガスの消
耗が多くなるためガスの回収器も大型のものが必要とな
る。しかも、装置系外より多量の空気を吸入するため他
工程からの異種ガスの影響が大きくなり回収再生溶剤の
品質の低下を招く欠点がある。(2) Next, in the apparatus shown in FIG. 8(a), unless the exhaust air volume is increased, high concentration solvent gas will flow out from the entrance/exit shutter. Conversely, if the exhaust air volume is increased, the gas in the cleaning device will be consumed more, and a large gas recovery device will also be required. Moreover, since a large amount of air is sucked in from outside the apparatus system, the influence of foreign gases from other processes becomes large, resulting in a disadvantage that the quality of the recovered and regenerated solvent deteriorates.
■また、第8図(b)の装置は上記(a)の装置と同じ
形式のものであるが、この装置では出入口シャッタ部か
ら漏れ出てきた溶剤ガスの他にシステム系外からの異種
ガスの影響が大きくなり回収再生溶剤の品質の低下を招
く。しかも、排気ガスの回収器も大容量で且低ガス濃度
処理可能なものが必要となり大型化する欠点がある。■The device shown in Figure 8 (b) is of the same type as the device shown in (a) above, but in addition to the solvent gas leaking from the entrance/exit shutter, this device also collects foreign gas from outside the system. The influence of this will become greater and the quality of recovered recycled solvent will deteriorate. Moreover, the exhaust gas recovery device must also have a large capacity and be capable of processing low gas concentrations, resulting in a large size.
そこで、本発明は上記従来技術の欠点に鑑みなされたも
ので、洗浄装置内の溶剤ガスの拡散に伴なうオゾン層の
破壊、地下水汚染等の環境汚染を防止し、ランニングコ
ストの低減及び回収再生溶剤の品質の向上を図ることの
できる洗浄装置を提供することを目的とするものである
。The present invention was developed in view of the above-mentioned drawbacks of the prior art, and it prevents environmental pollution such as destruction of the ozone layer and groundwater contamination due to the diffusion of solvent gas in cleaning equipment, and reduces and recovers running costs. The object of the present invention is to provide a cleaning device that can improve the quality of recycled solvent.
本発明の洗浄装置は、冷却槽からなる溶剤室と、該溶剤
室と並列して一体に設けられ加熱によって高濃度溶剤ガ
スを発生させる蒸気発生槽と、前記溶剤室の上部に位置
し前記蒸気発生槽で発生された高濃度溶剤ガスを冷却す
る手段を備えた溶剤ペーパー室と、該溶剤ペーパー室の
上部に設けられ外部との開閉をするシャッター及び排気
口を有するチャンバーとを備えてなる洗浄装置であって
、
前記チャンバーと溶剤ペーパー室との境界に装置筺体と
一体で直交方向に突出して形成されたシャッターボック
スと、該シャッターボックス内を移動可能に構成され前
記チャンバーと溶剤ペーパー室とを閉塞して密閉状態と
する槽内シャッターと、前記槽内シャッターを駆動する
駆動手段とを備えるようにしたものである。The cleaning device of the present invention includes a solvent chamber consisting of a cooling tank, a steam generation tank that is provided integrally in parallel with the solvent chamber and generates high concentration solvent gas by heating, and a steam generation tank that is located above the solvent chamber and that generates the steam. Cleaning comprising a solvent paper chamber equipped with means for cooling high concentration solvent gas generated in a generation tank, and a chamber provided above the solvent paper chamber and having a shutter and an exhaust port for opening and closing with the outside. The apparatus includes: a shutter box formed integrally with the apparatus housing and protruding in an orthogonal direction at a boundary between the chamber and the solvent paper chamber; and a shutter box configured to be movable within the shutter box and connecting the chamber and the solvent paper chamber. The tank is equipped with an in-tank shutter that is closed to create an airtight state, and a driving means that drives the in-tank shutter.
[実施例] 次に本発明について第1図を用いて詳細に説明する。[Example] Next, the present invention will be explained in detail using FIG. 1.
第1図において、洗浄装置は搬送手段(図示せず)によ
り搬送路1上に搬送されてくる洗浄物を収納して洗浄し
、洗浄後は他工程に移送するものであって、装置内部は
密閉構造で構成されている。この洗浄装置は装置最下部
に設けられた溶剤室2と、この溶剤室2の上部に設けら
れた溶剤ペーパー室3と、前記溶剤室2と並列に配置さ
れた蒸気発生槽4と、この溶剤ペーパー室3の上部に設
けられたチャンバー5と、このチャンバー5と溶剤ペー
パー室3とを区切る槽内シャッタ6及び装置系外との開
閉をする出入口シャッター7とで構成されている。In FIG. 1, the cleaning device stores and cleans the cleaning items conveyed onto a conveying path 1 by a conveying means (not shown), and after cleaning, transfers them to other processes, and the inside of the device is It consists of a closed structure. This cleaning device includes a solvent chamber 2 provided at the bottom of the device, a solvent paper chamber 3 provided at the top of the solvent chamber 2, a steam generation tank 4 arranged in parallel with the solvent chamber 2, and a It consists of a chamber 5 provided above the paper chamber 3, an in-tank shutter 6 that separates this chamber 5 from the solvent paper chamber 3, and an entrance/exit shutter 7 that opens and closes the system to the outside of the apparatus system.
前記溶剤室2内には液中冷却コイル8が周囲に配設され
ており、この液中冷却コイル8により溶剤室2内に満た
されている溶剤9を冷却して洗浄物を浸漬洗浄する。溶
剤ペーパー室3に隣接する蒸気発生槽4内には溶剤9が
満たされており、この溶剤9は蒸気発生槽4に配設され
たヒータ4aにより加熱されて高濃度溶剤ガス(ペーパ
ー)3aとなる。このペーパーaは溶剤ペーパー室3の
上部周壁に配設されたペーパー冷却コイル10により冷
却されて凝縮回収される。この溶剤ペーパー室3内は槽
内シャッタ6によりチャンバー5と区切られているが、
この槽内シャッター6は装置系外、すなわち連通された
溶剤ペーパー室3及びチャンバー5と直交する方向に突
出して一体に形成されたシャッタボックス11内をシリ
ンダー等の図示せぬ駆動手段により往動する。このシリ
ンダーの作動によるシャッタの開閉動作により溶剤ペー
パー室3内が密閉状態となるように構成されている。ま
た、チャンバー5には溶剤ペーパー室3かも漏れて上昇
してくるガスを排気する排気口12が設けられており、
この排気口12より排気されたガスは図示せぬ回収器1
3により回収される。また、搬送路1上に載置された洗
浄物収納篭14(以下、洗浄篭と称する。)は出入口シ
ャッター7により装置内部とを移動できるが、この洗浄
篭14はチェーン等よりなる駆動手段(図示せず)によ
り装置内部を移動して洗浄される。A submerged cooling coil 8 is disposed around the solvent chamber 2, and the submerged cooling coil 8 cools the solvent 9 filling the solvent chamber 2 to immerse and wash the object. A steam generation tank 4 adjacent to the solvent paper chamber 3 is filled with a solvent 9, and this solvent 9 is heated by a heater 4a provided in the steam generation tank 4 to form a highly concentrated solvent gas (paper) 3a. Become. This paper a is cooled by a paper cooling coil 10 disposed on the upper circumferential wall of the solvent paper chamber 3, and is condensed and recovered. The inside of this solvent paper chamber 3 is separated from the chamber 5 by an in-tank shutter 6.
This in-tank shutter 6 is reciprocated by an unillustrated driving means such as a cylinder inside a shutter box 11 that is integrally formed and protrudes outside the apparatus system, that is, in a direction orthogonal to the solvent paper chamber 3 and the chamber 5 that are in communication with each other. . The interior of the solvent paper chamber 3 is sealed by the opening and closing operations of the shutter caused by the operation of this cylinder. Further, the chamber 5 is provided with an exhaust port 12 for exhausting gas that leaks from the solvent paper chamber 3 and rises.
The gas exhausted from this exhaust port 12 is collected by a recovery device 1 (not shown).
It is recovered by 3. Further, the cleaning basket 14 placed on the conveyance path 1 (hereinafter referred to as the cleaning basket) can be moved inside and outside the apparatus by the entrance/exit shutter 7. (not shown) moves inside the device and is cleaned.
上記構成よりなる本発明の動作について第2図を用いて
詳細に説明する。The operation of the present invention having the above configuration will be explained in detail using FIG. 2.
まず、搬送路1上に載置された洗浄篭14は、第1図の
■に位置する。第2図に示す流れにしたがって出入口シ
ャッター7が開くと、洗浄篭14は装置内の駆動手段に
より位置■まで移動する。この移動後出入口シャッター
7が閉じ、槽内シャッター6が開いて洗浄篭14は溶剤
室2まで下降移動して位置◎に達する。その後、槽内シ
ャッター6が閉じて装置内部が密閉されると共にこの溶
剤室2内で洗浄篭14は所定時間浸漬洗浄された後、溶
剤ペーパー室3内の位置■まで弓き上げられ溶剤ペーパ
ー3aによりガス状の雰囲気化で蒸気洗浄される。更に
、洗浄篭14は■の位置まで上昇して乾燥処理されると
ともに、ペーパー冷却コイル10によりガス状のペーパ
ーは凝縮回収されている。この洗浄工程が終了すると槽
内シャッター6は再び開き、洗浄篭14はチャンバー5
内の0の位置まで引き上げられる。ここで、槽内シャッ
ター6が閉じると同時に出入口シャッター7が開いて洗
浄篭14は■の位置に搬送され再び出入口シャッター7
が閉じる。First, the cleaning basket 14 placed on the conveyance path 1 is located at position (■) in FIG. When the entrance/exit shutter 7 is opened according to the flow shown in FIG. 2, the cleaning basket 14 is moved to position (2) by the drive means within the apparatus. After this movement, the entrance/exit shutter 7 is closed, the in-tank shutter 6 is opened, and the cleaning basket 14 moves downward to the solvent chamber 2 and reaches the position ◎. Thereafter, the in-tank shutter 6 is closed to seal the inside of the apparatus, and the cleaning basket 14 is immersed in the solvent chamber 2 for a predetermined period of time and then lifted up to the position (2) in the solvent paper chamber 3, where the solvent paper 3a Steam cleaning is performed by creating a gaseous atmosphere. Further, the cleaning basket 14 is raised to the position (3) to undergo drying processing, and the gaseous paper is condensed and recovered by the paper cooling coil 10. When this cleaning process is finished, the tank shutter 6 is opened again, and the cleaning basket 14 is moved to the chamber 5.
It is pulled up to the 0 position within. Here, at the same time as the in-tank shutter 6 is closed, the entrance/exit shutter 7 is opened, and the cleaning basket 14 is transported to the position (■) and the entrance/exit shutter 7 is opened again.
closes.
以上の工程を繰り返すことによって、洗浄篭14内の洗
浄物は洗浄される。By repeating the above steps, the objects in the cleaning basket 14 are cleaned.
なお、上記工程におけるシャッター6及び7の開閉動作
中におけるチャンバー5内へのペーパーの漏れは第2図
に示すようにタイミング的にいずれか一方のシャッター
が閉じた状態になっており、密閉室内は負圧になってい
るので排気口12から回収器13に効率よく確実に回収
される。Note that the leakage of paper into the chamber 5 during the opening and closing operations of the shutters 6 and 7 in the above process is caused by the timing of one of the shutters being closed, as shown in FIG. Since the pressure is negative, the gas is efficiently and reliably recovered from the exhaust port 12 to the recovery device 13.
また、第3図は上記構成よりなる装置を用いて排気中の
フロンガス濃度の測定結果を示したものであ9、第2′
i品。よ出入。、ヤツ?−7(7)近(1,おけるフロ
ンガス濃度の測定結果を示したものである。これは第7
図(b)の従来装置を用いて測定した第9図の測定結果
と比較できる。ここで、第3図、第4図及び第9図の測
定は濃度測定器としてメタンガス校正を行なっているの
で実フロンガス濃度との相関関係を第5図に示した。Furthermore, Fig. 3 shows the measurement results of the fluorocarbon gas concentration in the exhaust gas using the apparatus constructed as described above.
i item. Yo in and out. , that guy? -7 (7) This shows the measurement results of the fluorocarbon gas concentration near (1).
It can be compared with the measurement results shown in FIG. 9, which were measured using the conventional device shown in FIG. 9(b). Here, in the measurements shown in FIGS. 3, 4, and 9, methane gas calibration was performed as a concentration measuring instrument, so the correlation with the actual fluorocarbon gas concentration is shown in FIG.
次に、本発明の他の実施例を第6図に示す。Next, another embodiment of the present invention is shown in FIG.
第6図のものは、第4図の測定結果では瞬間的に、ピー
クレベルで101000PP第5図より実フロンガス濃
度として430PPMとなる。)のガス漏れが認められ
る。したがって、第6図に示すようにチャンバー5に更
に隣接してもう一つのチャンバーを並設することにより
ガス漏れを生ずることな(確実に回収することができる
。In the case of FIG. 6, the peak level is 101,000 PP instantaneously according to the measurement results of FIG. 4, and the actual fluorocarbon gas concentration is 430 PPM from FIG. 5. ) Gas leakage is observed. Therefore, by arranging another chamber adjacent to the chamber 5 as shown in FIG. 6, gas leakage can be prevented (reliably recovered).
なお、本実施例ではフロンガスの場合を説明したが、フ
ロンガス以外の洗浄ガスにも適用し得ることは言うまで
もない。Note that although the case of using fluorocarbon gas has been described in this embodiment, it goes without saying that the present invention can also be applied to cleaning gases other than fluorocarbon gas.
[発明の効果]
以上説明したように本発明によれば、
■溶剤ガスの拡散を防止することができるので、オゾン
層の破壊、大気汚染、地下水汚染等の環境汚染を招くこ
とがないので人体に悪影響を及ぼすことがない、また、
装置全体の構成も簡略化できるのでコストも低減され優
れた効果を発揮できる。[Effects of the Invention] As explained above, according to the present invention, ■ Diffusion of solvent gas can be prevented, so environmental pollution such as destruction of the ozone layer, air pollution, groundwater pollution, etc. will not be caused, and the human body will be protected. has no adverse effect on, and
Since the configuration of the entire device can be simplified, costs can be reduced and excellent effects can be achieved.
■また、溶剤が異種ガスによる影響を受けずに確実に回
収できるので品質も向上させることができる。したがっ
て、溶剤に要するコストを低減できると共に、従来のよ
うな溶剤精製装置が不要となる。仮に、このような装置
を設ける場合でも簡素化、小型化を図ることができる。■Also, quality can be improved because the solvent can be reliably recovered without being affected by foreign gases. Therefore, the cost required for the solvent can be reduced, and a conventional solvent purification device is not required. Even if such a device is provided, it can be simplified and downsized.
■本発明によれば溶剤回収装置の小型化を図ることがで
きるので、これに要するコストを低減できる効果もある
。(2) According to the present invention, it is possible to downsize the solvent recovery device, which has the effect of reducing the cost required for this.
第1図は本発明の洗浄装置の構成を示す図、第2図は第
1図の洗浄装置を用いて洗浄する工程の流れを説明する
図、第3図及び第4図は本発明の洗浄装置の測定図、第
5図は第3図及び第4図の測定結果と実フロン濃度との
相関を示す図、第6図は本発明の他の実施例、第7図(
a)及び(b)は密閉構造形式の従来例、第8図(a)
及び(b)は密閉構造且排気形式の従来例、第9図は第
7図(b)の従来装置の測定結果を示す図、第10図は
フロン−113の理論回収効率と溶剤濃度との関係を示
す図である。
1・・・搬送路、2・・・溶剤室、3・・・溶剤ペーパ
ー室、4・・・蒸気発生槽、5・・チャンバー、6・・
・槽内シャッター、7・・・出入口シャッター 8・・
・液中冷却コイル、9・・・溶剤、10・・・ペーパー
冷却コイル、11・・・シャッターボックス、12・・
・排気口、13・・・回収器、14・・・洗浄物収納篭
、20・・・搬送路、21・・・溶剤室、22・・・溶
剤ペーパー室、23・・・蒸気発生槽、24・・・チャ
ンバー、25・・・出入口シャッター、26・・・液中
冷却コイル、27・・・溶剤、28・・・ペーパー冷却
コイル、29・・・洗浄物収納篭、30・・・回動軸、
31・・・扉、32・・・上昇板、33・・・排気口、
34・・・排気ダクト。FIG. 1 is a diagram showing the configuration of the cleaning device of the present invention, FIG. 2 is a diagram explaining the flow of the cleaning process using the cleaning device of FIG. 1, and FIGS. 3 and 4 are the cleaning device of the present invention. A measurement diagram of the apparatus, FIG. 5 is a diagram showing the correlation between the measurement results of FIGS. 3 and 4 and the actual fluorocarbon concentration, FIG. 6 is a diagram showing another embodiment of the present invention, and FIG.
a) and (b) are conventional examples of closed structure type, Fig. 8 (a)
9 shows the measurement results of the conventional device shown in FIG. 7(b), and FIG. 10 shows the relationship between the theoretical recovery efficiency of Freon-113 and the solvent concentration. It is a figure showing a relationship. DESCRIPTION OF SYMBOLS 1... Conveyance path, 2... Solvent chamber, 3... Solvent paper chamber, 4... Steam generation tank, 5... Chamber, 6...
・Inside tank shutter, 7...Entrance/exit shutter 8...
・Liquid cooling coil, 9...solvent, 10...paper cooling coil, 11...shutter box, 12...
・Exhaust port, 13...Collector, 14...Washing material storage basket, 20...Transport path, 21...Solvent chamber, 22...Solvent paper chamber, 23...Steam generating tank, 24...Chamber, 25...Entrance/exit shutter, 26...Liquid cooling coil, 27...Solvent, 28...Paper cooling coil, 29...Washing item storage basket, 30...times moving axis,
31...Door, 32...Rising plate, 33...Exhaust port,
34...Exhaust duct.
Claims (1)
けられ加熱によって高濃度溶剤ガスを発生させる蒸気発
生槽と、前記溶剤室の上部に位置し前記蒸気発生槽で発
生された高濃度溶剤ガスを冷却する手段を備えた溶剤ペ
ーパー室と、該溶剤ペーパー室の上部に設けられ外部と
の開閉をするシャッター及び排気口を有するチャンバー
とを備えてなる洗浄装置であって、 前記チャンバーと溶剤ペーパー室との境界に装置筺体と
一体で直交方向に突出して形成されたシャッターボック
スと、該シャッターボックス内を移動可能に構成され前
記チャンバーと溶剤ペーパー室とを閉塞して密閉状態と
する槽内シャッターと、前記槽内シャッターを駆動する
駆動手段とを備えてなる洗浄装置。[Scope of Claims] A solvent chamber consisting of a cooling tank; a steam generating tank that is provided integrally in parallel with the solvent chamber and generates high concentration solvent gas by heating; and a steam generating tank that is located above the solvent chamber and that generates the steam. A cleaning device comprising a solvent paper chamber equipped with a means for cooling highly concentrated solvent gas generated in a tank, and a chamber provided above the solvent paper chamber and having an exhaust port and a shutter that opens and closes with the outside. a shutter box formed integrally with the device housing and protruding in the orthogonal direction at the boundary between the chamber and the solvent paper chamber; and a shutter box configured to be movable within the shutter box to close the chamber and the solvent paper chamber. A cleaning device comprising: an in-tank shutter for sealing the tank; and a driving means for driving the in-tank shutter.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1146853A JP2814569B2 (en) | 1989-06-12 | 1989-06-12 | Cleaning equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1146853A JP2814569B2 (en) | 1989-06-12 | 1989-06-12 | Cleaning equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0312276A true JPH0312276A (en) | 1991-01-21 |
JP2814569B2 JP2814569B2 (en) | 1998-10-22 |
Family
ID=15417030
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1146853A Expired - Fee Related JP2814569B2 (en) | 1989-06-12 | 1989-06-12 | Cleaning equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2814569B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0754179A (en) * | 1993-08-06 | 1995-02-28 | Kimura Chem Plants Co Ltd | Washing and drying device |
JP5676033B1 (en) * | 2014-04-15 | 2015-02-25 | ジャパン・フィールド株式会社 | Cleaning method |
CN109454042A (en) * | 2017-09-06 | 2019-03-12 | 株式会社富利美 | Workpiece cleaning device and workpiece clean method |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017170424A (en) * | 2016-03-18 | 2017-09-28 | 株式会社クリンビー | Work washing device and work washing method |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5224575U (en) * | 1975-08-11 | 1977-02-21 | ||
JPS599228A (en) * | 1982-06-29 | 1984-01-18 | Toray Ind Inc | Production of spun yarn with fluffs laid |
JPS62186978A (en) * | 1986-02-10 | 1987-08-15 | トヨタ自動車株式会社 | Organic-solvent washer |
JPH0225087U (en) * | 1988-08-02 | 1990-02-19 |
-
1989
- 1989-06-12 JP JP1146853A patent/JP2814569B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5224575U (en) * | 1975-08-11 | 1977-02-21 | ||
JPS599228A (en) * | 1982-06-29 | 1984-01-18 | Toray Ind Inc | Production of spun yarn with fluffs laid |
JPS62186978A (en) * | 1986-02-10 | 1987-08-15 | トヨタ自動車株式会社 | Organic-solvent washer |
JPH0225087U (en) * | 1988-08-02 | 1990-02-19 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0754179A (en) * | 1993-08-06 | 1995-02-28 | Kimura Chem Plants Co Ltd | Washing and drying device |
JP5676033B1 (en) * | 2014-04-15 | 2015-02-25 | ジャパン・フィールド株式会社 | Cleaning method |
JP2015202463A (en) * | 2014-04-15 | 2015-11-16 | ジャパン・フィールド株式会社 | Cleaning method for cleaning object |
CN109454042A (en) * | 2017-09-06 | 2019-03-12 | 株式会社富利美 | Workpiece cleaning device and workpiece clean method |
Also Published As
Publication number | Publication date |
---|---|
JP2814569B2 (en) | 1998-10-22 |
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