JPH0310209B2 - - Google Patents
Info
- Publication number
- JPH0310209B2 JPH0310209B2 JP58162197A JP16219783A JPH0310209B2 JP H0310209 B2 JPH0310209 B2 JP H0310209B2 JP 58162197 A JP58162197 A JP 58162197A JP 16219783 A JP16219783 A JP 16219783A JP H0310209 B2 JPH0310209 B2 JP H0310209B2
- Authority
- JP
- Japan
- Prior art keywords
- weight
- magnetic head
- tic
- substrate
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 17
- 239000010409 thin film Substances 0.000 claims description 13
- 239000000696 magnetic material Substances 0.000 claims description 11
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 10
- 238000005245 sintering Methods 0.000 claims description 8
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 4
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 claims 1
- 239000010408 film Substances 0.000 description 8
- 230000007423 decrease Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 230000035939 shock Effects 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- -1 BaCO 3 Inorganic materials 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910018125 Al-Si Inorganic materials 0.000 description 1
- 229910018520 Al—Si Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000001513 hot isostatic pressing Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Description
産業上の利用分野
本発明は基板に蒸着された薄膜の皮膜強度を高
くする範膜磁気ヘツド用基板に関する。
従来例の構成とその問題点
従来、TiC系のセラミツクはその高い耐摩耗性
により広く普及している。特にTiC−Al2O3系セ
ラミツクは、薄膜用ベース基板として最近特に注
目されている。しかしながら、これら基板の鏡面
研摩面に磁性材料（特にフエライト系）を蒸着し
た場合、蒸着した皮膜強度が弱いという欠点があ
つた。原因としては、TiC−Al2O3と磁性材料と
の反応性が低いためである。
発明の目的
本発明は従来の欠点を除去し、蒸着した皮膜強
度を高めると共に、機械特性（特に加工時のチツ
ピング）を向上させることが可能な薄膜磁気ヘツ
ド用基板を得るにある。
発明の構成
本発明の薄膜磁気ヘツド用基板を、表面にFe
系磁気ヘツドコアが形成される薄膜磁気ヘツド用
基板であつて、TiC，Al2O3の両者合計70〜98重
量％と、Fe2O3又はFe2O3を主成分とし、NiO，
CoO，ZnOの１種以上よりなる磁性材料30〜２重
量％から成り、前記TiCは50重量％を超えず、焼
結助成剤10重量％以下を含有させ、前記焼結助成
剤が、アルカリ土類酸化物及びSiO2の１種以上
より成るよう構成したものである。
実施例の説明
本発明を実施例に基づいて説明する。
試料の調整工程としては市販の工業用原料（純
度99％以上）のTiC，Al2O3，BaCO3，MgO，
CaCO3，SiO2，Fe2O3，NiO，CoO，MnO，
ZnO粉末を準備し、第１表に示す組成比に薄膜磁
気ヘツド用基板組成物（以下単に組成物という。）
を配合する。
INDUSTRIAL APPLICATION FIELD The present invention relates to a substrate for a thin film magnetic head that increases the strength of a thin film deposited on the substrate. Conventional structure and its problems TiC-based ceramics have been widely used due to their high wear resistance. In particular, TiC-Al 2 O 3 ceramics have recently attracted particular attention as base substrates for thin films. However, when a magnetic material (especially ferrite type) is deposited on the mirror-polished surface of these substrates, the strength of the deposited film is low. This is because the reactivity between TiC-Al 2 O 3 and the magnetic material is low. OBJECTS OF THE INVENTION The object of the present invention is to obtain a thin film magnetic head substrate capable of eliminating the conventional drawbacks, increasing the strength of the deposited film, and improving mechanical properties (particularly chipping during processing). Structure of the Invention The substrate for a thin film magnetic head of the present invention is coated with Fe on the surface.
A thin film magnetic head substrate on which a system magnetic head core is formed, the main components being TiC and Al 2 O 3 in a total of 70 to 98% by weight, Fe 2 O 3 or Fe 2 O 3 , and NiO,
It consists of 30 to 2% by weight of a magnetic material consisting of one or more of CoO and ZnO, the TiC does not exceed 50% by weight, and it contains 10% by weight or less of a sintering aid, and the sintering aid is alkaline earth. It is composed of one or more of the following oxides and SiO 2 . Description of Examples The present invention will be described based on Examples. The sample preparation process involved commercially available industrial raw materials (purity of 99% or higher) such as TiC, Al 2 O 3 , BaCO 3 , MgO,
CaCO 3 , SiO 2 , Fe 2 O 3 , NiO, CoO, MnO,
ZnO powder was prepared and the composition ratio shown in Table 1 was prepared to form a thin film magnetic head substrate composition (hereinafter simply referred to as composition).
Blend.
【表】
前記組成物をステンレスポツト、ステンレスボ
ールを用い24時間混合し、乾燥し乾燥体とした。
前記乾燥体に精製水を加え50mm×50mm×10mmの
角形に1t／cm2の加圧力で成形し、これらの成形体
を水素ガス気流中、1600℃〜1700℃の温度で２時
間焼結した。前記焼結体をアルゴンガス中1500℃
−2000atmにて熱間静水圧プレス（HIP）し、そ
の後N2中1000〜1100℃にてアニール処理をした。
このようにして得られたTiC−Al2O3基板に
Fe2O3系磁気材料をスパツタ蒸着させる。
前記基板について第２表のような各諸特性を調
べた。[Table] The above composition was mixed for 24 hours using a stainless steel pot and a stainless steel ball, and dried to obtain a dry product. Purified water was added to the dried body to form it into a 50 mm x 50 mm x 10 mm square shape under a pressure of 1 t/cm 2 , and these formed bodies were sintered at a temperature of 1600°C to 1700°C for 2 hours in a hydrogen gas stream. . The sintered body was heated at 1500℃ in argon gas.
Hot isostatic pressing (HIP) was performed at -2000 atm, followed by annealing at 1000-1100°C in N2 .
The TiC−Al 2 O 3 substrate obtained in this way
Fe 2 O 3 based magnetic material is sputter deposited. Various properties of the substrate as shown in Table 2 were investigated.
【表】【table】
【表】
第１表、第２表より明らかなように本発明範囲
内の実施例はサンプルNo.１〜No.８、No.10であり、
他は範囲外の比較例である。本発明範囲内の試料
は、用途に適した機械的特性、皮膜強度などを示
している。またNo.９、No.11〜No.14は範囲外であ
り、皮膜強度、熱衝撃性が悪いものである。
なお、前記範囲において、TiC量が50重量％を
超えると焼結性が著しく低下する。TiC，Al2O3
の合計が70重量％未満では添加物相の結晶粒界へ
の偏析が起こり、熱衝撃性の低下及び機械強度の
低下をもたらす。98重量％を超えると、TiC−
Al2O3間の焼結助成分が少なくなり、焼結性の低
下をおこす。磁性材料が２重量％未満では皮膜強
度は添加しない場合に比較して差は発生しない。
30重量％を超えると、皮膜強度の増加がないばか
りか、磁性材料相の偏析がおこり、熱衝撃性が低
下するとともに、皮膜の磁気特性に悪影響を与え
る。また焼結助成剤が10重量部を超えると、機械
強度が低下するとともに、機械加工時のチツピン
グ発生率増加や、異相析出による熱衝撃性の低下
をきたす。
ここで焼結助成剤としてSiO2，CaCO3を用い
たが、BaCO3，MgOなどTiC−Al2O3，Al2O3−
Al2O3間の焼結を促進させる成分であれば特に限
定はしない。
また磁性材料としてFe2O3などを用いたが、薄
膜に用いる材料でも同等の結果が得られる。ただ
し、金属を薄膜にする場合は、前記金属の酸化物
を添加する。金属成分のまま添加すると、前記金
属が偏析し、磁気ヘツドの磁気特性に悪影響を与
える。
発明の効果
本発明の薄膜磁気ヘツド用基板は、基板中に
Fe2O3が入つているので、Fe系（Fe・Al−Si，
Fe−Ni，Fe2O3等）の磁気ヘツドコアであれば
どのようなものでも結合強度が大きくなる。
この理由として、基板中に存在しているFe原
子と、磁気ヘツドコア中に存在しているFe原子
とが密接に結合することが考えられる。
したがつて、本発明の基板では、Fe系の磁気
ヘツドコアであればよく、必ずしも基板と磁気ヘ
ツドコアの磁性材料を同一物にする必要はない。
本発明により磁気材料皮膜と薄膜磁気ヘツド用
基板間の結合強度が30〜70％アツプするものであ
る。[Table] As is clear from Tables 1 and 2, Examples within the scope of the present invention are Samples No. 1 to No. 8 and No. 10,
The others are comparative examples outside the scope. Samples within the scope of the present invention exhibit mechanical properties, film strength, etc. suitable for the application. Moreover, No. 9 and No. 11 to No. 14 were outside the range, and had poor film strength and thermal shock resistance. Note that in the above range, if the amount of TiC exceeds 50% by weight, the sinterability will be significantly reduced. TiC , Al2O3
If the total amount is less than 70% by weight, the additive phase will segregate to grain boundaries, resulting in a decrease in thermal shock resistance and mechanical strength. If it exceeds 98% by weight, TiC−
The sintering aid between Al 2 O 3 decreases, resulting in a decrease in sinterability. When the amount of magnetic material is less than 2% by weight, there is no difference in film strength compared to when no magnetic material is added.
If it exceeds 30% by weight, not only will there be no increase in film strength, but also segregation of the magnetic material phase will occur, reducing thermal shock resistance and having an adverse effect on the magnetic properties of the film. If the amount of the sintering aid exceeds 10 parts by weight, the mechanical strength decreases, the incidence of chipping increases during machining, and thermal shock resistance decreases due to precipitation of foreign phases. Here, SiO 2 and CaCO 3 were used as sintering aids, but TiC-Al 2 O 3 , Al 2 O 3 - such as BaCO 3 and MgO
There is no particular limitation on the component as long as it promotes sintering between Al 2 O 3 . Furthermore, although Fe 2 O 3 and the like were used as the magnetic material, similar results can be obtained with materials used for thin films. However, when forming a metal into a thin film, an oxide of the metal is added. If added as a metal component, the metal will segregate and adversely affect the magnetic properties of the magnetic head. Effects of the Invention The thin film magnetic head substrate of the present invention has
Since it contains Fe 2 O 3 , it is Fe-based (Fe・Al−Si,
Any type of magnetic head core (Fe-Ni, Fe 2 O 3, etc.) will have a high coupling strength. The reason for this is thought to be that Fe atoms present in the substrate and Fe atoms present in the magnetic head core are closely bonded. Therefore, in the substrate of the present invention, it is sufficient to use an Fe-based magnetic head core, and it is not necessary that the substrate and the magnetic head core be made of the same magnetic material. The present invention increases the bonding strength between the magnetic material film and the thin film magnetic head substrate by 30 to 70%.
Claims (1)
膜磁気ヘツド用基板であつて、TiC，Al2O3の両
者合計70〜98重量％と、Fe2O3又はFe2O3を主成
分とし、NiO，CoO，ZnOの１種以上よりなる磁
性材料30〜２重量％から成り、前記TiCは50重量
％を超えず、焼結助成剤10重量％以下を含有する
薄膜磁気ヘツド用基板。 ２ 前記焼結助成剤が、アルカリ土類酸化物及び
SiO2の１種以上よりなることを特徴とする特許
請求の範囲第１項記載の薄膜磁気ヘツド用基板。[Scope of Claims] 1. A substrate for a thin film magnetic head on which an Fe-based magnetic head core is formed, which comprises TiC and Al 2 O 3 in a total of 70 to 98% by weight, and Fe 2 O 3 or Fe 2 O. 3 as a main component, 30 to 2% by weight of a magnetic material consisting of one or more of NiO, CoO, and ZnO, the TiC does not exceed 50% by weight, and the sintering aid is 10% by weight or less. Head board. 2 The sintering aid comprises an alkaline earth oxide and
A thin film magnetic head substrate according to claim 1, characterized in that it is made of one or more types of SiO 2 .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58162197A JPS6054410A (en) | 1983-09-03 | 1983-09-03 | Substrate composition for thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58162197A JPS6054410A (en) | 1983-09-03 | 1983-09-03 | Substrate composition for thin film magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6054410A JPS6054410A (en) | 1985-03-28 |
| JPH0310209B2 true JPH0310209B2 (en) | 1991-02-13 |
Family
ID=15749833
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58162197A Granted JPS6054410A (en) | 1983-09-03 | 1983-09-03 | Substrate composition for thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6054410A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5060097A (en) * | 1989-01-06 | 1991-10-22 | Hitachi, Ltd. | Magnetic disc file including a slider which exhibits reduced deformation during operation |
| JP2549095Y2 (en) * | 1991-06-18 | 1997-09-24 | 株式会社サンエー化研 | Bags containing aquatic organisms such as goldfish |
-
1983
- 1983-09-03 JP JP58162197A patent/JPS6054410A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6054410A (en) | 1985-03-28 |
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