JPH03101863A - Device for applying viscous material - Google Patents
Device for applying viscous materialInfo
- Publication number
- JPH03101863A JPH03101863A JP24098289A JP24098289A JPH03101863A JP H03101863 A JPH03101863 A JP H03101863A JP 24098289 A JP24098289 A JP 24098289A JP 24098289 A JP24098289 A JP 24098289A JP H03101863 A JPH03101863 A JP H03101863A
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- viscous material
- tip
- recess
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011345 viscous material Substances 0.000 title claims abstract description 38
- 239000011248 coating agent Substances 0.000 claims description 12
- 238000000576 coating method Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 abstract description 8
- 239000011347 resin Substances 0.000 description 36
- 229920005989 resin Polymers 0.000 description 36
- 239000004065 semiconductor Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 5
- 238000013459 approach Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 235000002492 Rungia klossii Nutrition 0.000 description 1
- 244000117054 Rungia klossii Species 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はノズルを使用して粘性体を狭い部分に塗布する
装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an apparatus for applying a viscous material to a narrow area using a nozzle.
第4図(A).(B)に示すように、ワイヤボンディン
グが完了し樹脂月止を行う前の段階において、到止する
樹脂より半導体チツブ1の表面1aを保護するために、
回路防止用の樹脂2をチップ表面1al.:if+布し
ている。Figure 4 (A). As shown in (B), in order to protect the surface 1a of the semiconductor chip 1 from the arriving resin at the stage after the wire bonding is completed and before the resin sealing is performed,
The circuit prevention resin 2 is applied to the chip surface 1al. :if+clothing.
チップ表面1aは狭いため、ノズル3を有する塗荀装置
を使用し、ノズル3の先端を利用して樹脂2を第4図(
A)に示すように、チップ表而1aに一定ffi {t
Iさせる。この後、樹脂2が拡がって、第4図(B)
に示すように保護膜4が形成される。Since the chip surface 1a is narrow, a coating device with a nozzle 3 is used, and the tip of the nozzle 3 is used to apply the resin 2 as shown in FIG.
As shown in A), a constant ffi {t
Let me do it. After this, the resin 2 spreads, as shown in Fig. 4 (B).
A protective film 4 is formed as shown in FIG.
このノズルを備えた塗布装置は、ノズル3を23き上げ
たときに、樹脂2の糸引きが発少しにくく、樹脂切れが
良いことが望ましい。糸引きが発生すると、これが切れ
たときに生ずる樹脂の微小な粒が周囲に飛散し、例えば
ステージ5等に不要に付着し、障害の原因となるからで
ある。In a coating device equipped with this nozzle, it is desirable that when the nozzle 3 is raised 23 times, the resin 2 is less likely to become stringy and the resin can be easily cut. This is because when stringing occurs, minute particles of resin that are generated when the strings are cut are scattered around and unnecessarily adhere to, for example, the stage 5, causing trouble.
第5図は従来の粘性体塗布装置10の概略構成を示す。 FIG. 5 shows a schematic configuration of a conventional viscous material coating device 10. As shown in FIG.
11はノズル、12は樹脂を一定量ずつノズル先端に供
給する樹脂供給装置、13はノズル11を上下動させる
ノズル青降装置である。11 is a nozzle, 12 is a resin supply device that supplies a fixed amount of resin to the tip of the nozzle, and 13 is a nozzle drop device that moves the nozzle 11 up and down.
ノズル11の先ra1 1 aは平面である。The tip ra1 1a of the nozzle 11 is a flat surface.
樹脂の塗布動作は、装若12により樹脂2を所定量送り
出すところから開始される。樹脂2はノズル孔1lbよ
り吐出され、第6図(A)に符月28で示すようにボー
ル状となって先’IN 1 1 8に付着して留まる。The resin application operation starts with the feeding of a predetermined amount of resin 2 by the coating 12. The resin 2 is discharged from the nozzle hole 1lb, becomes a ball shape as shown by the dot 28 in FIG.
この後、ノズル冑降装置13が動作し、ノズル11は最
初に矢印Z1万向に下降されて半導体チツブ1に接近し
、その後矢印Z2方向に上界されて半導体チップ1より
離れる。Thereafter, the nozzle lowering device 13 operates, and the nozzle 11 is first lowered in the direction of arrow Z10,000 to approach the semiconductor chip 1, and then upwardly moved in the direction of arrow Z2 to move away from the semiconductor chip 1.
ノズル11が半導体チップ1に接近すると、第6図(B
)に丞すように、ボール状樹脂2aがチップ表面1aに
付着される。When the nozzle 11 approaches the semiconductor chip 1, as shown in FIG.
), a ball-shaped resin 2a is attached to the chip surface 1a.
ノズル11が上青されると、第6図(C),(D)に示
すように、中央部が徐々にくびれでブップ表面1aに付
着した拐脂2bとノズル先端11aに付着している樹脂
2Cとに分かれ、第6図(E)に符号2dで示すように
長い糸引きが発生し、ノズル先端11aがチップ表面1
1aから約10#と高い位四口1まで上昇した後に、糸
弓き部分2dが僚置口18で切れ、符号2bで示す所定
屡の樹脂がチップ表面1aに付着して残り、ここに塗布
される。When the nozzle 11 is turned over, as shown in FIGS. 6(C) and (D), the central part gradually constricts to remove the fat 2b attached to the bop surface 1a and the resin attached to the nozzle tip 11a. 2C, and a long string is generated as shown by the symbol 2d in FIG.
After rising from 1a to a high level of about 10 #1, the threaded part 2d is cut off at the end hole 18, and a predetermined amount of resin shown by reference numeral 2b remains attached to the chip surface 1a, and is applied there. be done.
〔発明が解決しようとする課題)
長い糸引き2dが発生するため、これが切れる高さ日1
,もチップ表面1aから約5mと高い。[Problem to be solved by the invention] Since a long string 2d occurs, the height at which it breaks is 1.
, is also about 5 m high from the chip surface 1a.
このため、切れたときに生ずる微小な樹脂粒2eが周囲
に飛敗し、他の部分(第4図中のステージ5等)に不要
に付着してしまうことが起き易い。For this reason, the minute resin particles 2e generated when the resin is cut tend to fly off to the surroundings and unnecessarily adhere to other parts (such as the stage 5 in FIG. 4).
本発明は、粘性体の糸引きの発生を抑制することを可能
とする粘性体塗布装置を提供することを目的とする。SUMMARY OF THE INVENTION An object of the present invention is to provide a viscous material coating device that can suppress the occurrence of stringiness of a viscous material.
本発明は、粘性体をノズルよりこの先端に留まりつる所
定邑送り出し、上記ノズルを塗布対象物に接近させ、そ
の後離すことにより上記ノズル先端の粘竹体を上記塗布
対象物に付着させて乎布する粘性体塗布装置において、
+記ノズルを、その先端に上記所定量を収容しうる容積
の凹部を有する形状とし、
上記粘性体が上記凹部内に充満された状態で、上記ノズ
ルが上記塗布対象物に近接されるように構成したことを
特徴とする粘性体塗布装置。In the present invention, the viscous material is sent out from a nozzle to a predetermined position while remaining at the tip thereof, the nozzle is brought close to the object to be coated, and then separated, thereby causing the viscous material at the tip of the nozzle to adhere to the object to be coated. In a viscous material coating device, the nozzle marked + has a shape having a recessed portion at its tip with a volume capable of accommodating the predetermined amount, and the nozzle applies the viscous material to the object to be applied with the recessed portion filled with the viscous material. A viscous material application device characterized in that it is configured to be brought close to an object.
上記凹部は、ノズルを塗布対象物から離すときに、粘性
体を凹部が残留させようとする力を大きなものとする。The recess increases the force with which the recess tends to cause the viscous material to remain when the nozzle is separated from the object to be coated.
これにより、塗布対象物に付着した粘性体とノズル先端
に残留する粘性体とが糸引きを殆んど生ぜずに素早く切
れる。As a result, the viscous material adhering to the object to be coated and the viscous material remaining at the tip of the nozzle can be quickly cut off with almost no stringing.
第1図は本発明の一実施例になる粘性体塗布装置20を
示す。同図中、第5図に示す構成部分と対応する部分に
は同−符弓を付す。FIG. 1 shows a viscous material coating device 20 according to an embodiment of the present invention. In the figure, parts corresponding to the constituent parts shown in FIG. 5 are marked with the same symbol.
21はノズルであり、第2図(A>の断面図、同図(B
)の底面図に示すように、先端21aに略半球状の凹部
2lbが形成してある。ノズル孔21cは凹部21dの
中心に開口している。21 is a nozzle, which is shown in FIG.
), a substantially hemispherical recess 2lb is formed at the tip 21a. The nozzle hole 21c opens at the center of the recess 21d.
ノズル21の径Dは約2Mであり、凹部2lbの容梢V
は7#3程度である。The diameter D of the nozzle 21 is approximately 2M, and the diameter V of the recess 2lb is approximately 2M.
is about 7#3.
この容積Vは、樹脂供給装置12により1回に供給され
る樹脂の星に対応する値に定めてある。This volume V is set to a value corresponding to a star of resin supplied by the resin supply device 12 at one time.
次に、樹脂を塗布する動伺について説明する。Next, the motion of applying the resin will be explained.
装置12により樹脂2が所定母供給されると、樹脂2は
ノズル孔21Gより凹部21b内に叶出される。When the resin 2 is supplied in a predetermined amount by the device 12, the resin 2 is ejected into the recess 21b from the nozzle hole 21G.
樹脂2は、凹部2lbの内壁而21ト,に付着して、第
3図(A>に符号2mで足すように凹部2Ib外にはは
み出さずに凹部21b内に留まる,1樹脂2mのうち凹
部2lbの開口に臨む部分は、表面張力Aにより、符号
211で示すように下方に凸状で水平に近い面となって
いる。The resin 2 adheres to the inner wall 21 of the recess 2lb and remains within the recess 21b without protruding outside the recess 2Ib, as shown in Fig. 3 (A> with 2 m added). Due to the surface tension A, the portion facing the opening of the recess 2lb has a downwardly convex, nearly horizontal surface as indicated by reference numeral 211.
この後、装置13が動作し、ノズル21は最初に矢印Z
+方向に下降されて半導体チツプ1に極く接近し、その
後矢印Z2方向に上昇されて半導体チップ1より離され
る。After this, the device 13 is activated and the nozzle 21 is first moved in the direction of the arrow Z.
It is lowered in the + direction to get very close to the semiconductor chip 1, and then raised in the direction of arrow Z2 and separated from the semiconductor chip 1.
ノズル21が半導体チップ1に接近すると、第3図(B
)に示すように、樹脂2mの下面2m−1がチップ表面
1aに付着される。When the nozzle 21 approaches the semiconductor chip 1, as shown in FIG.
), the lower surface 2m-1 of the resin 2m is attached to the chip surface 1a.
ノズル21が上昇されると、第3図(C)に示すように
、一部の樹脂2nがチップ表面1aに付着してここに残
ろうとし、残りの樹脂20は凹部21b内に残ろうとし
、符号2pで示すくびれが生ずる。When the nozzle 21 is raised, as shown in FIG. 3(C), some of the resin 2n adheres to the chip surface 1a and tends to remain there, and the remaining resin 20 tends to remain in the recess 21b. , a constriction indicated by the symbol 2p occurs.
樹脂20が凹部21b内に残ろうとする力は、表面張力
Aの合力となり、この力はノズル先端が平坦面である場
合より強力である。The force that causes the resin 20 to remain in the recess 21b is the resultant force of the surface tension A, and this force is stronger than when the nozzle tip is a flat surface.
このため、ノズル21の上動に伴って、上記くびれ2p
は第3図(D)中符S 2 Gで示すように急速に進み
、第3図(E)に示すように糸引きを殆んど生ぜずに、
樹脂20と2nとが索甲く切れる。Therefore, as the nozzle 21 moves upward, the constriction 2p
The process progresses rapidly as shown by the middle mark S 2 G in Figure 3 (D), with almost no stringing as shown in Figure 3 (E),
The resins 20 and 2n are cut sharply.
樹脂2oと2nとが切れるときのノズル先端21のチッ
プ表面1aよりの高さ目2は従来の場合に比べて約半分
となり、樹脂20と2nとが切れて高さ口28も低くな
る。The height 2 of the nozzle tip 21 from the chip surface 1a when the resins 2o and 2n are cut is approximately half that of the conventional case, and the height opening 28 is also lowered when the resins 20 and 2n are cut.
上記のように、糸引きが殆んど生じないため、切れると
きに樹脂の微小粒は殆んど1じない。しかも、生じたと
してもその高さは低いため、周囲に飛改する範囲は狭く
、チップ表面1aの範囲内に限られ、それ以上は広がら
ない。As mentioned above, since there is almost no stringing, there is hardly a single tiny particle of resin when it is cut. Moreover, even if it does occur, its height is low, so the range in which it spreads around is narrow, limited to the area of the chip surface 1a, and does not spread beyond that.
従って、樹脂性が半導体チツプ1の周囲の他の部分に付
着することは起きr、従来のような不都合は確実に避け
られる。Therefore, the resin does not adhere to other parts around the semiconductor chip 1, and the conventional inconvenience can be reliably avoided.
上記凹部21bの形状は、半球状に限られるものではな
く、例えば半楕円形状でもよい。The shape of the recessed portion 21b is not limited to a hemispherical shape, and may be, for example, a semi-elliptical shape.
また、本発明は、上記の半導体製造に限らず、他の用途
にも適用される。Furthermore, the present invention is applicable not only to the above semiconductor manufacturing but also to other uses.
また、塗布するのは樹脂に限らず、粘性を有するもので
あればよい。Moreover, the material to be applied is not limited to resin, and any material having viscosity may be used.
以上説明した様に、本発明によれば、ノズルを塗布対象
物より離すときに、塗布対象物に句着した粘性体とノズ
ル先端に残留する粘性体が糸引きを殆んど生ぜずに素早
く切れる。このため、粘性体の周囲への飛散を最小限に
抑えられ、粘性体の不要な部分への付着を無くすること
が出来る。As explained above, according to the present invention, when the nozzle is separated from the object to be coated, the viscous material stuck to the object to be coated and the viscous material remaining at the tip of the nozzle are quickly removed without causing stringiness. It can be cut. Therefore, scattering of the viscous material to the surroundings can be minimized, and adhesion of the viscous material to unnecessary parts can be eliminated.
第1図は本発明の一実施例になる粘性休塗荀装買を示す
図、
第2図は第1図中ノズルの先端を拡大して示す図、
第3図は第1図の装置による塗布動作を説明する図、
第4図は本発明装置の適用例を示す図、第5図は従来例
を示す図、
第6図は従来例の装直による塗布動作を説明する図であ
る。
図において、
1は半導体チップ、
1aは表面、
2は回路防止用樹脂、
12は樹脂供給装置、
13はノズル昇降装置、
20は粘性体塗布装置、
21はノズル、
21aは先端、
21bは凹部、
2 l b−1は内壁而、
21Cはノズル孔
をボす。
(A)
(B)
(C)
1
(D)
(E)
ぞ清槽圀乍t′v)I月すダ圀
第3図
(A)
ノズ冫レダヒ^も乞わ秦ブ(して雪ζT谷3第2図
(A)
(B)
判ひ嘩量/)急粗例乞ホす母
第4図
且
中ツ計1乞示丁菌
第5図Fig. 1 is a diagram showing a viscous coating system according to an embodiment of the present invention, Fig. 2 is an enlarged view of the tip of the nozzle in Fig. 1, and Fig. 3 is a diagram showing the apparatus shown in Fig. 1. FIG. 4 is a diagram illustrating an application example of the apparatus of the present invention, FIG. 5 is a diagram illustrating a conventional example, and FIG. 6 is a diagram illustrating a coating operation by reinstallation of the conventional example. In the figure, 1 is a semiconductor chip, 1a is a surface, 2 is a circuit prevention resin, 12 is a resin supply device, 13 is a nozzle lifting device, 20 is a viscous material coating device, 21 is a nozzle, 21a is a tip, 21b is a recess, 2l b-1 is the inner wall, and 21C is the nozzle hole. (A) (B) (C) 1 (D) (E) Tani 3 Figure 2 (A) (B) Amount of dispute/) Rapid rough example Figure 4, and a total of 1 figure Figure 5
Claims (1)
送り出し、上記ノズルを塗布対象物(1、1a)に接近
させ、その後離すことにより上記ノズル先端の粘性体を
上記塗布対象物に付着させて塗布する粘性体塗布装置に
おいて、 上記ノズル(21)を、その先端に上記所定量を収容し
うる容積の凹部(21b)を有する形状とし、 上記粘性体(2)が上記凹部(21b)内に充満された
状態で、上記ノズルが上記塗布対象物に近接離間される
ように構成したことを特徴とする粘性体塗布装置。[Scope of Claims] A predetermined amount of the viscous material (2) is sent out from the nozzle so that it can remain at the tip, and the nozzle is brought close to the object to be coated (1, 1a), and then moved away, thereby displacing the viscous material at the tip of the nozzle. In the viscous material coating device that applies the viscous material by adhering it to the object to be coated, the nozzle (21) has a shape having a recess (21b) at its tip with a volume capable of accommodating the predetermined amount of the viscous material (2), and the viscous material (2) A viscous material coating device characterized in that the nozzle is arranged to be close to and separated from the object to be coated when the recess (21b) is filled.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24098289A JPH03101863A (en) | 1989-09-18 | 1989-09-18 | Device for applying viscous material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24098289A JPH03101863A (en) | 1989-09-18 | 1989-09-18 | Device for applying viscous material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03101863A true JPH03101863A (en) | 1991-04-26 |
Family
ID=17067561
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24098289A Pending JPH03101863A (en) | 1989-09-18 | 1989-09-18 | Device for applying viscous material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03101863A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006064452A (en) * | 2004-08-25 | 2006-03-09 | Yazaki Corp | Fixed structure of internal rotary mechanism for pointer instruments |
JP2010245128A (en) * | 2009-04-01 | 2010-10-28 | Showa Denko Kk | Method of forming resin object, method of manufacturing light emitting body, resin object forming apparatus, and light emitting body manufacturing apparatus |
-
1989
- 1989-09-18 JP JP24098289A patent/JPH03101863A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006064452A (en) * | 2004-08-25 | 2006-03-09 | Yazaki Corp | Fixed structure of internal rotary mechanism for pointer instruments |
JP2010245128A (en) * | 2009-04-01 | 2010-10-28 | Showa Denko Kk | Method of forming resin object, method of manufacturing light emitting body, resin object forming apparatus, and light emitting body manufacturing apparatus |
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