JPH028977B2 - - Google Patents
Info
- Publication number
- JPH028977B2 JPH028977B2 JP23585185A JP23585185A JPH028977B2 JP H028977 B2 JPH028977 B2 JP H028977B2 JP 23585185 A JP23585185 A JP 23585185A JP 23585185 A JP23585185 A JP 23585185A JP H028977 B2 JPH028977 B2 JP H028977B2
- Authority
- JP
- Japan
- Prior art keywords
- glaze
- ceramic
- glaze composition
- ceramic substrate
- thermal expansion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 28
- 239000000919 ceramic Substances 0.000 claims description 26
- 239000000203 mixture Substances 0.000 claims description 22
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 5
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 2
- 230000000694 effects Effects 0.000 description 7
- 238000004031 devitrification Methods 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000010292 electrical insulation Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000003513 alkali Substances 0.000 description 3
- 229910052593 corundum Inorganic materials 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910001845 yogo sapphire Inorganic materials 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- JVJQPDTXIALXOG-UHFFFAOYSA-N nitryl fluoride Chemical compound [O-][N+](F)=O JVJQPDTXIALXOG-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
- C03C8/08—Frit compositions, i.e. in a powdered or comminuted form containing phosphorus
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Electronic Switches (AREA)
- Glass Compositions (AREA)
Description
産業上の利用分野
本発明は、セラミツク基板に施釉するグレーズ
組成物に関するものである。
従来技術
近年、フアクシミリやマイクロコンピユータ端
末機などのプリンター用に印字音が静かで保守の
容易なサーマルヘツドが普及している。サーマル
ヘツドの電気回路を形成する方法には薄膜法と厚
膜法があるが、高速度で高密度の印刷が要求され
る場合には薄膜法が一般的であり、基板にはグレ
ーズドセラミツク基板が使用される。グレーズド
セラミツク基板は、セラミツク基板にグレーズ組
成物を施釉して作成するが、その上に厚さ数千オ
ングストローム未満の薄膜回路や抵抗体を高精度
に形成するために表面平滑度が良いこと、そりが
少ないこと、耐酸性に優れていることが要求さ
れ、さらに使用中における回路の電気絶縁性劣化
のないことが必要である。また、使用中、抵抗体
の発熱によるサーマルシヨツクがかかるため、耐
熱性に優れていることを必要である。
したがつて、グレーズ組成物は約1300℃以下で
の焼成で表面平滑性が良く、高耐熱性のグレーズ
層を形成し、弗硝混酸などに侵蝕されにくく、熱
膨張係数がセラミツクのそれとマツチングしてい
なければならない。グレーズ組成物とセラミツク
の熱膨張差が大きいとグレーズドセラミツク基板
のそりが大きくなり、寸法精度を著しく悪化させ
るばかりでなく、グレーズ層内に過剰な応力を発
生させサーマルヘツド使用に伴なうサーマルシヨ
ツクによりグレーズ層にマイクロクラツクが生じ
やすい問題がある。さらに最近では印刷の高速化
に伴なつてサーマルシヨツクの頻度が高くなり、
その温度差も大きくなるので、より耐熱性に優れ
たグレーズ組成物の開発が急務になつている。
従来のグレーズ組成物は熱膨張のセラミツクス
とのマツチングが良く、かつ表面平滑度も良好で
あるが、アルカリまたは鉛を含有しているため耐
熱性が低く、また反復使用により電気絶縁性も劣
化するという欠点がある。
このため最近ではアルカリや鉛を含有しない高
耐熱性グレーズ組成物も開発されているが、これ
らは熱膨張係数が低く、セラミツク基板との熱膨
差が大きすぎるという欠点がある。
発明の目的
本発明は、グレーズ表面の平滑度を保つととも
に、耐熱性、耐酸性に優れ、セラミツク基板との
膨張差が小さく、電気絶縁性劣化のないセラミツ
ク基板用グレーズ組成物を提供することを目的と
するものである。
発明の構成
本発明のセラミツク基板用グレーズ組成物は、
重量百分率で、SiO245〜60%、Al2O37〜17%、
CaO10〜25%、BaO1〜15%、SrO0〜15%、
P2O50.5〜5%からなることを特徴とする。
本発明のセラミツク基板用グレーズ組成物は、
好ましくは重量百分率で、SiO249〜56%、
Al2O39〜15%、CaO13〜22%、BaO3〜13%、
SrO1〜13%、P2O51〜3%からなることを特徴
とする。
本発明のセラミツク基板用グレーズ組成物を構
成する各成分の含有量を上記のように限定した理
由を以下に示す。
SiO2は、ガラス構造を形成する主成分であり、
その含量は45〜60%、好ましくは49〜56%であ
る。45%より少ない場合は、グレーズの耐熱性が
不十分となると同時に、失透傾向があり良好なグ
レーズとなり難く、60%より多い場合は、熱膨張
係数が小さくなりすぎる。
Al2O3の含量は、7〜17%、好ましくは9〜15
%である。7%より少ない場合は、グレーズの粘
性が低下し、屈伏点が下がり十分な耐熱性が得ら
れず、17%より多い場合は、ガラスの溶融が困難
になり、グレーズの焼成温度が上がり良好なグレ
ース面が得られ難い。
CaOは、ガラスを溶融しやすくするとともにグ
レーズの熱膨張係数を増大させる効果があり、そ
の含量は10〜25%、好ましくは13〜22%である。
10%より少ない場合は、上記の効果が得られず、
25%より多い場合は失透傾向が現われる。
BaOは、CaOと同様の効果があり、両者を併
用することによつて失透傾向を低下させ、その含
量は、1〜15%、好ましくは3〜13%である。1
%より少ない場合は、上記の効果が得られず、15
%より多い場合は、失透傾向が現われ、耐熱性も
低下する。
SrOは、CaO、BaOと併用することにより、失
透傾向を低下させる効果があり、その含量は、0
〜15%、好ましくは、1〜13%である。15%より
多い場合は失透しやすくなる。
P2O5は、SiO2と置換することにより耐熱性を
低下することなく熱膨張係数を増大させる効果が
あり、その含量は、0.5〜5%、好ましくは1〜
3%である。0.5%より少ない場合は、セラミツ
ク基板との膨張差が大きくなり、基板が反つた
り、サーマルヘツド使用時にマイクロクラツクが
生じやすくなる。5%より多い場合は、分相傾向
や失透傾向が現われ良好なグレーズが得られな
い。
実施例
以下に本発明のセラミツク基板用グレーズ組成
物の実施例及び比較例を示す。次表は本発明品の
実施例の組成(試料No.1〜5)と比較例の組成
(試料No.6、7)及び熱膨張係数、転移点、屈伏
点を示したものである。
INDUSTRIAL APPLICATION FIELD The present invention relates to a glaze composition for glazing a ceramic substrate. BACKGROUND OF THE INVENTION In recent years, thermal heads, which print quietly and are easy to maintain, have become popular for use in printers such as facsimiles and microcomputer terminals. There are two methods for forming electrical circuits in thermal heads: thin-film and thick-film methods, but when high-speed, high-density printing is required, the thin-film method is common, and a glazed ceramic substrate is used as the substrate. used. Glazed ceramic substrates are created by applying a glaze composition to a ceramic substrate, and in order to form thin-film circuits and resistors with a thickness of less than several thousand angstroms with high precision on the ceramic substrate, it is necessary to have good surface smoothness and warpage. It is required that the electrical insulation properties of the circuit are not deteriorated during use, and that the electrical insulation properties of the circuit are not deteriorated during use. Furthermore, since the resistor is subject to thermal shock due to heat generation during use, it is necessary to have excellent heat resistance. Therefore, the glaze composition has good surface smoothness when fired at temperatures below about 1300°C, forms a highly heat-resistant glaze layer, is resistant to corrosion by fluoro-nitric acid mixed acids, and has a coefficient of thermal expansion that matches that of ceramic. must be maintained. If the difference in thermal expansion between the glaze composition and the ceramic is large, the warpage of the glazed ceramic substrate will become large, which not only significantly deteriorates dimensional accuracy but also generates excessive stress within the glaze layer, resulting in thermal shock when using a thermal head. Therefore, there is a problem in that microcracks are likely to occur in the glaze layer. Furthermore, as printing speeds have increased recently, thermal shocks have become more frequent.
As the temperature difference increases, there is an urgent need to develop a glaze composition with better heat resistance. Conventional glaze compositions have good matching with thermally expanding ceramics and good surface smoothness, but because they contain alkali or lead, they have low heat resistance and their electrical insulation properties deteriorate with repeated use. There is a drawback. For this reason, highly heat-resistant glaze compositions that do not contain alkali or lead have recently been developed, but these have the disadvantage of having a low coefficient of thermal expansion and an excessively large difference in thermal expansion from the ceramic substrate. Purpose of the Invention The present invention aims to provide a glaze composition for a ceramic substrate that maintains the smoothness of the glaze surface, has excellent heat resistance and acid resistance, has a small expansion difference with the ceramic substrate, and does not cause electrical insulation deterioration. This is the purpose. Structure of the Invention The glaze composition for ceramic substrates of the present invention includes:
In weight percentage, SiO2 45-60%, Al2O3 7-17 %,
CaO10~25%, BaO1~15%, SrO0~15%,
It is characterized by consisting of 0.5 to 5% P 2 O 5 . The glaze composition for ceramic substrates of the present invention includes:
Preferably in weight percentage, SiO 2 49-56%,
Al2O3 9 ~15%, CaO13~22%, BaO3~13%,
It is characterized by consisting of 1 to 13% SrO and 1 to 3% P 2 O 5 . The reason why the content of each component constituting the glaze composition for ceramic substrates of the present invention is limited as described above will be explained below. SiO 2 is the main component forming the glass structure,
Its content is 45-60%, preferably 49-56%. If it is less than 45%, the heat resistance of the glaze will be insufficient and at the same time it will tend to devitrify, making it difficult to form a good glaze. If it is more than 60%, the coefficient of thermal expansion will become too small. The content of Al2O3 is 7-17%, preferably 9-15
%. If it is less than 7%, the viscosity of the glaze will decrease, the yield point will drop, and sufficient heat resistance will not be obtained. If it is more than 17%, it will be difficult to melt the glass and the firing temperature of the glaze will rise, making it difficult to obtain a good result. It is difficult to obtain grace. CaO has the effect of making the glass easier to melt and increasing the thermal expansion coefficient of the glaze, and its content is 10 to 25%, preferably 13 to 22%.
If it is less than 10%, the above effect will not be obtained,
If it exceeds 25%, a tendency towards devitrification appears. BaO has the same effect as CaO, and by using both in combination, the tendency to devitrify is reduced, and its content is 1 to 15%, preferably 3 to 13%. 1
If it is less than 15%, the above effect will not be obtained and
%, a tendency toward devitrification appears and heat resistance also decreases. When SrO is used in combination with CaO and BaO, it has the effect of reducing the tendency to devitrify, and its content is 0.
-15%, preferably 1-13%. If it exceeds 15%, devitrification tends to occur. P2O5 has the effect of increasing the thermal expansion coefficient without reducing heat resistance by replacing it with SiO2 , and its content is 0.5 to 5%, preferably 1 to 5%.
It is 3%. If it is less than 0.5%, the difference in expansion with the ceramic substrate becomes large, causing the substrate to warp or causing microcracks when using a thermal head. If it is more than 5%, a tendency of phase separation and devitrification will appear, making it impossible to obtain a good glaze. Examples Examples and comparative examples of the glaze composition for ceramic substrates of the present invention are shown below. The following table shows the compositions of Examples of the products of the present invention (Samples Nos. 1 to 5) and the compositions of Comparative Examples (Samples Nos. 6 and 7), as well as their thermal expansion coefficients, transition points, and yield points.
【表】【table】
【表】
表のNo.1〜7の試料は次のように調製した。表
に示した酸化物組成になるように原料を調合し、
十分に混合する。各原料は酸化物、水酸化物、炭
酸塩あるいは硝酸塩のいずれでも良いが、微粉原
料を使用したほうが溶融しやすい。混合した原料
を白金ルツボにて1500〜1600℃で溶融したのち、
急冷して得られたガラスをアルミナ製ボールミル
で微粉砕する。
こうして調製したグレーズ組成物をスプレー法
やスクリーン印刷法などでセラミツク基板に塗布
し、1200〜1300℃で焼成して、泡や失透などの表
面欠点のないグレーズ基板が得られた。
表より明らかなように本発明品はアルカリと酸
化鉛とを含有せず、750℃以上の転移点と800℃以
上の屈伏点を有しており、比較例No.6に比べ耐熱
性が良好でかつ熱膨張係数が67.0〜71.0であり、
比較例No.7に比べ、セラミツク基板と熱膨張係数
が近似している。また実施例のNo.4と比較例のNo.
6とNo.7の耐酸性を比較するためにHF:HNO3
=1:1の混酸中にグレーズド基板を10秒間浸漬
し、そのエツチング深さを測定したところNo.4は
5.0μmであり、No.6の7.5μm、No.の8.0μmに対し
てきわめてすぐれた結果が得られた。
発明の効果
以上のように本発明のセラミツク基板用グレー
ズ組成物は、泡や失透等の表面欠点がなく、表面
平滑度が良好で、耐酸性に優れていると共にセラ
ミツク基板との膨張差が小さいため、特にサーマ
ルヘツドのセラミツク基板をグレーズするのに適
している。[Table] Samples No. 1 to 7 in the table were prepared as follows. Mix raw materials to have the oxide composition shown in the table,
Mix thoroughly. Each raw material may be an oxide, hydroxide, carbonate, or nitrate, but it is easier to melt if a fine powder raw material is used. After melting the mixed raw materials at 1500-1600℃ in a platinum crucible,
The glass obtained by rapid cooling is pulverized using an alumina ball mill. The glaze composition thus prepared was applied to a ceramic substrate by a spray method or screen printing method, and fired at 1200 to 1300°C to obtain a glaze substrate free of surface defects such as bubbles and devitrification. As is clear from the table, the product of the present invention does not contain alkali or lead oxide, has a transition point of 750°C or higher and a yield point of 800°C or higher, and has better heat resistance than Comparative Example No. 6. and has a coefficient of thermal expansion of 67.0 to 71.0,
Compared to Comparative Example No. 7, the coefficient of thermal expansion is similar to that of the ceramic substrate. Also, Example No. 4 and Comparative Example No. 4.
To compare the acid resistance of No. 6 and No. 7, HF:HNO 3
When the glazed substrate was immersed in a mixed acid of =1:1 for 10 seconds and the etching depth was measured, No. 4 was
The diameter was 5.0 μm, which was extremely superior to No. 6's 7.5 μm and No.'s 8.0 μm. Effects of the Invention As described above, the glaze composition for ceramic substrates of the present invention has no surface defects such as bubbles and devitrification, has good surface smoothness, excellent acid resistance, and has a small expansion difference with respect to ceramic substrates. Its small size makes it particularly suitable for glazing ceramic substrates in thermal heads.
Claims (1)
%、CaO10〜25%、BaO1〜15%、SrO0〜15%、
P2O50.5〜5%からなることを特徴とするセラミ
ツク基板用グレーズ組成物。 2 重量百分率で、SiO249〜56%、Al2O39〜15
%、CaO13〜22%、BaO3〜13%、SrO1〜13%、
P2O51〜3%からなることを特徴とする特許請求
の範囲第1項記載のセラミツク基板用グレーズ組
成物。 3 セラミツク基板が、アルミナ基板である特許
請求の範囲第1項記載のセラミツク基板用グレー
ズ組成物。[Claims] 1. In weight percentage, SiO 2 45-60%, Al 2 O 3 7-17
%, CaO10~25%, BaO1~15%, SrO0~15%,
A glaze composition for ceramic substrates, characterized in that it consists of 0.5 to 5% P 2 O 5 . 2 In weight percentage, SiO 2 49-56%, Al 2 O 3 9-15
%, CaO13~22%, BaO3~13%, SrO1~13%,
The glaze composition for ceramic substrates according to claim 1, characterized in that it consists of 1 to 3% P 2 O 5 . 3. The glaze composition for a ceramic substrate according to claim 1, wherein the ceramic substrate is an alumina substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23585185A JPS6296344A (en) | 1985-10-21 | 1985-10-21 | Glaze composition for ceramic substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23585185A JPS6296344A (en) | 1985-10-21 | 1985-10-21 | Glaze composition for ceramic substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6296344A JPS6296344A (en) | 1987-05-02 |
JPH028977B2 true JPH028977B2 (en) | 1990-02-28 |
Family
ID=16992194
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23585185A Granted JPS6296344A (en) | 1985-10-21 | 1985-10-21 | Glaze composition for ceramic substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6296344A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19851927A1 (en) * | 1998-11-11 | 2000-05-18 | Schott Glas | Heat resistant alkaline earth metal aluminosilicate glass for molybdenum component-containing lamp bulbs and display and photovoltaic device substrates has related aluminum, phosphorus and zirconium oxide contents |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0818845B2 (en) * | 1987-11-11 | 1996-02-28 | 日本板硝子株式会社 | Glass substrate for electronic equipment |
TWI467706B (en) | 2009-04-09 | 2015-01-01 | Ind Tech Res Inst | Ceramic substrate and method for fabricating the same |
CN116081950B (en) * | 2023-03-10 | 2024-11-29 | 萍乡学院 | A method for preparing low expansion electrical porcelain glaze |
-
1985
- 1985-10-21 JP JP23585185A patent/JPS6296344A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19851927A1 (en) * | 1998-11-11 | 2000-05-18 | Schott Glas | Heat resistant alkaline earth metal aluminosilicate glass for molybdenum component-containing lamp bulbs and display and photovoltaic device substrates has related aluminum, phosphorus and zirconium oxide contents |
DE19851927C2 (en) * | 1998-11-11 | 2001-02-22 | Schott Glas | Thermally resistant glass and its use |
Also Published As
Publication number | Publication date |
---|---|
JPS6296344A (en) | 1987-05-02 |
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