JPH0280581A - Base material having black body film and production of base material fitted with black body film thereof - Google Patents
Base material having black body film and production of base material fitted with black body film thereofInfo
- Publication number
- JPH0280581A JPH0280581A JP63231760A JP23176088A JPH0280581A JP H0280581 A JPH0280581 A JP H0280581A JP 63231760 A JP63231760 A JP 63231760A JP 23176088 A JP23176088 A JP 23176088A JP H0280581 A JPH0280581 A JP H0280581A
- Authority
- JP
- Japan
- Prior art keywords
- film
- black body
- base material
- nickel
- phosphorus alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 42
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 229910001096 P alloy Inorganic materials 0.000 claims abstract description 37
- 238000007747 plating Methods 0.000 claims abstract description 37
- 238000005530 etching Methods 0.000 claims abstract description 15
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 11
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 claims description 29
- 238000000576 coating method Methods 0.000 claims description 15
- 150000003839 salts Chemical class 0.000 claims description 15
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 14
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 14
- SIGUVTURIMRFDD-UHFFFAOYSA-M sodium dioxidophosphanium Chemical compound [Na+].[O-][PH2]=O SIGUVTURIMRFDD-UHFFFAOYSA-M 0.000 claims description 14
- 229910001379 sodium hypophosphite Inorganic materials 0.000 claims description 14
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 12
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 9
- 150000002815 nickel Chemical class 0.000 claims description 8
- 239000004310 lactic acid Substances 0.000 claims description 7
- 235000014655 lactic acid Nutrition 0.000 claims description 7
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims description 6
- 239000001384 succinic acid Substances 0.000 claims description 6
- 235000011090 malic acid Nutrition 0.000 claims description 5
- 239000001630 malic acid Substances 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 13
- 239000010949 copper Substances 0.000 abstract description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 10
- 229910052802 copper Inorganic materials 0.000 abstract description 10
- 229910052759 nickel Inorganic materials 0.000 abstract description 10
- 239000007788 liquid Substances 0.000 abstract description 9
- 229910000990 Ni alloy Inorganic materials 0.000 abstract description 5
- 229910045601 alloy Inorganic materials 0.000 abstract description 4
- 239000000956 alloy Substances 0.000 abstract description 4
- 238000002310 reflectometry Methods 0.000 abstract 1
- 239000002585 base Substances 0.000 description 28
- 239000000243 solution Substances 0.000 description 28
- 230000003287 optical effect Effects 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- 239000004033 plastic Substances 0.000 description 10
- 229920003023 plastic Polymers 0.000 description 10
- 239000000919 ceramic Substances 0.000 description 9
- 239000011521 glass Substances 0.000 description 8
- 238000007654 immersion Methods 0.000 description 8
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 8
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000005238 degreasing Methods 0.000 description 5
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 239000003638 chemical reducing agent Substances 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 230000031700 light absorption Effects 0.000 description 4
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 3
- 229910000906 Bronze Inorganic materials 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000010974 bronze Substances 0.000 description 2
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 229940099690 malic acid Drugs 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000615 nonconductor Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 108091008695 photoreceptors Proteins 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910000570 Cupronickel Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012770 industrial material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229940116298 l- malic acid Drugs 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Chemically Coating (AREA)
- Chemical Treatment Of Metals (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、光学的な黒体皮膜を有する基材および該皮膜
の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a substrate having an optical black body film and a method for producing the film.
本発明の光学的な黒体皮膜は低い全反射率をもち、金属
、セラミックス、ガラス、プラスチックス等の基材表面
上に形成されるものである。その形成の方法は基材表面
上に発明者らが発明した黒体皮膜用ニッケル・リン合金
めっき液でニッケル・リン合金皮膜をめっきし、この合
金被膜に対して、特定の化学物質によるエツチングを施
して形成される。本発明の光学的な黒体皮膜は低い全反
射率をもち、その波長依存性も極めて小さい。このごと
から、理想的な黒体皮膜を実現でき、もって光カロリー
メータの受光部、光伝送系の終端素子系、光の導波路、
光コネクターの内面等に有効に利用することができる。The optical blackbody film of the present invention has a low total reflectance and is formed on the surface of a base material such as metal, ceramics, glass, or plastics. The method for forming it is to plate a nickel-phosphorus alloy film on the surface of the substrate using a nickel-phosphorus alloy plating solution for blackbody films invented by the inventors, and then to etch this alloy film with a specific chemical substance. It is formed by applying The optical blackbody film of the present invention has a low total reflectance, and its wavelength dependence is also extremely small. From this, it is possible to realize an ideal blackbody film, which can be used in the light receiving part of optical calorimeters, the termination element system of optical transmission systems, optical waveguides, etc.
It can be effectively used for the inner surface of optical connectors, etc.
[従来の技術]
従来、黒色皮膜として、黒色塗料を用いた塗膜、黒色の
表面酸化物、金属化合物の皮膜、電気めっき法による黒
色クロメート、黒色ニッケル皮膜、および陽極酸化法に
より成形した多孔質皮膜に黒色染料を入れた黒色被膜が
あった。しかし、これらの黒色皮膜は全反射率が3〜1
0%程度あり、かつ、波長依存性も高いという問題があ
り、光カロリーメーターの受光部として用いるには不満
足であった。[Conventional technology] Conventionally, black coatings include coatings using black paint, black surface oxides, coatings of metal compounds, black chromate by electroplating, black nickel coatings, and porous films formed by anodic oxidation. There was a black film containing black dye. However, these black films have a total reflectance of 3 to 1.
0% and high wavelength dependence, making it unsatisfactory for use as a light receiving section of a photocalorimeter.
一方、上記の皮膜よりも全反射率の低いものに、蒸着酸
化法による全黒がある。全黒の皮膜は全反射率が約0.
5%で上記全黒色塗料等に比べて一段と低く、光カロリ
ーメーターの受光部として利用されている。On the other hand, a film with a lower total reflectance than the above-mentioned film is a completely black film produced by a vapor deposition oxidation method. The total black film has a total reflectance of approximately 0.
At 5%, it is much lower than the above-mentioned all-black paint, etc., and is used as the light receiving part of optical calorimeters.
また、C,E、 ジョンソン、Sr、の発明に係る米国
特許第4,233.107号明細書(対応特許:特開昭
57−114655号)には、ニッケル・リンめっき皮
膜を硝酸水溶液でエツチング処理して得られる黒色皮膜
とその製法が開示されている。In addition, U.S. Patent No. 4,233.107 (corresponding patent: JP-A-57-114655), invented by C.E., Johnson, Sr. A black film obtained by the treatment and a method for producing the same are disclosed.
また、同一発明者の米国特許第4,381.830号明
細書にも類似の発明が開示されている。この技術は、P
、L、グリーリンによって改良され、米国特許第4.5
11.614号明細書に開示されている。A similar invention is also disclosed in US Pat. No. 4,381.830 by the same inventor. This technology is
, L. Greenlin, U.S. Pat. No. 4.5.
No. 11.614.
[発明が解決しようとする課題]
光カロリーメータの受光部、光伝送系の終端素子のよう
に光を反射することなく完全に吸収する機能は実用上の
用途が多く、理想的な光の吸収体(あるいは黒体とも呼
ばれる)が望まれている。[Problem to be solved by the invention] The function of completely absorbing light without reflecting it, such as the light receiving part of a photocalorimeter or the terminal element of an optical transmission system, has many practical uses, and ideal light absorption is required. body (also called black body) is desired.
光の吸収だけの機能についてみれば、金の超微粒子で形
成される全黒が古くから知られている。Regarding the function of simply absorbing light, total blackness formed by ultrafine gold particles has been known for a long time.
たとえば、従来光パワー測定に用いられる全黒は、その
全反射率が小さく、このため黒色の受光体として利用さ
れている。しかし、全黒は、機械的振動や摩擦などで簡
単にはげ落ち、高湿条件下では水分を吸収して全反射率
が増加し、乾燥によっても元の反射率に回復しないとい
う問題があり、実用上難点が多い。For example, total black, which is conventionally used for optical power measurement, has a low total reflectance and is therefore used as a black photoreceptor. However, the problem with all black is that it easily flakes off due to mechanical vibration or friction, absorbs moisture under high humidity conditions, increases total reflectance, and does not recover to its original reflectance even when dry. There are many practical difficulties.
また、米国特許第4,233,107号および、4.3
G1,830号明細書に開示されている黒色皮膜は、全
反射率が0.5〜1.0%で、かつ、皮膜強度が高い点
で実用性が高い。しかし、全反射率に波長依存性があり
、320〜2200 ngという広い波長帯域で高精度
で光パワーを測定する受光体として用いるにはなお問題
がある。Also, U.S. Pat. No. 4,233,107 and 4.3
The black film disclosed in G1,830 has a total reflectance of 0.5 to 1.0% and is highly practical in that it has high film strength. However, the total reflectance is wavelength dependent, and there are still problems in using it as a photoreceptor for measuring optical power with high precision in a wide wavelength band of 320 to 2200 ng.
さらにまた、米国特許第4.511.814号明細書に
開示された技術は、ニッケル・リン皮膜中のリン含有量
に濃淡の差がある二つの層を重ねた二層構造の基材で構
成されている。このため、製造工程が増しており、また
前記2発明よりも全反射率が高い。Furthermore, the technology disclosed in U.S. Patent No. 4,511,814 is composed of a base material with a two-layer structure in which two layers with different concentrations of phosphorus in the nickel-phosphorous coating are stacked. has been done. Therefore, the number of manufacturing steps is increased, and the total reflectance is higher than the above two inventions.
本発明の目的は、第1に金属、セラミックス、ガラス、
プラスチックス等の基材表面に、光の全反射率が低く、
波長依存性が小さく、さらに機械的強度、耐湿性の優れ
た黒体皮膜が形成された光吸収基材およびそのための黒
体皮膜形成方法を提供することにある。The purpose of the present invention is to firstly use metals, ceramics, glass,
The total reflectance of light is low on the surface of base materials such as plastics,
It is an object of the present invention to provide a light-absorbing substrate on which a black body film with small wavelength dependence and excellent mechanical strength and moisture resistance is formed, and a method for forming a black body film therefor.
第2に、全黒よりも機械的強度が優れ、したがって容易
に損壊しない実用的な黒体皮膜を有する基材を提供する
ことにある。The second object is to provide a base material having a practical black body coating that has better mechanical strength than full black and is therefore not easily damaged.
第3に、先行技術である前記2発明のいずれよりも全反
射率及び全反射率の波長依存特性に優れた、実用的な黒
体皮膜を有する基材を提供することにある。Thirdly, it is an object of the present invention to provide a base material having a practical blackbody film that has better total reflectance and wavelength-dependent characteristics of total reflectance than either of the above two prior art inventions.
第4に、グリーリン開示の発明のように工程を増すこと
なく製造することができる実用的な黒体皮膜を有する基
材を提供することにある。The fourth object is to provide a base material having a practical black body film that can be manufactured without increasing the number of steps as in the invention disclosed by Greerin.
[課題を解決するための手段]
これらの目的を達成するために、この発明では硝酸水溶
液でエツチング処理を行ったとき全反射率が低く、かつ
波長依存性の小さい黒体皮膜が得られるような、黒体皮
膜用無電解ニッケル・リン合金めっき液として、
(1)ニッケル塩、ホスフィン酸ナトリウム、D、L−
リンゴ酸またはその塩、コハク酸またはその塩の浴、又
は
(2)ニッケル塩、ホスフィン酸ナトリウム、D、L−
リンゴ酸またはその塩、乳酸またはその塩、マロン酸ま
たはその塩の浴
の2種類のニッケル・リン合金めっき液を用いた。[Means for Solving the Problems] In order to achieve these objects, the present invention provides a black body film that has low total reflectance and small wavelength dependence when etched with a nitric acid aqueous solution. , As an electroless nickel-phosphorus alloy plating solution for black body film, (1) Nickel salt, sodium phosphinate, D, L-
Malic acid or its salt, succinic acid or its salt bath, or (2) nickel salt, sodium phosphinate, D, L-
Two types of nickel-phosphorus alloy plating solutions were used: malic acid or its salt, lactic acid or its salt, and malonic acid or its salt.
このめっき液は本発明者の実験によって決定されたもの
である。This plating solution was determined through experiments by the inventor.
この発明において、黒体皮膜の形成される基材としては
、金属、ガラス、セラミックス、プラスチックス等が用
いられる。In this invention, metals, glass, ceramics, plastics, etc. are used as the base material on which the black body film is formed.
基材には先ず、黒体皮膜用ニッケル・リン合金めっき液
によりニッケル・リン合金めっき皮膜が施される。First, a nickel-phosphorus alloy plating film is applied to the base material using a nickel-phosphorus alloy plating solution for black body film.
このめっきには無電解めっき法が用いられる。An electroless plating method is used for this plating.
基材が金属の場合は、1,1.1−トリクロルエタンお
よびアルカリ脱脂液で脱脂した後、酸洗いし、次いでニ
ッケルストライクめっきを行い、黒体皮膜用無電解ニッ
ケル・リン合金めっき液に浸漬して基材表面にリン濃度
7〜10%のニッケル・リン合金皮膜を形成せしめる。If the base material is metal, it is degreased with 1,1.1-trichloroethane and an alkaline degreasing solution, then pickled, followed by nickel strike plating, and then immersed in an electroless nickel-phosphorus alloy plating solution for black body coating. A nickel-phosphorus alloy film having a phosphorus concentration of 7 to 10% is formed on the surface of the substrate.
基材がガラス、セラミックス、プラスチックスのような
電気の不導体の場合には、塩化錫溶液および塩化パラジ
ウム溶液で表面の活性化処理を行った後黒体皮膜用無電
解ニッケル・リンめっき液によるニッケル・リン合金皮
膜形成が行われる。When the base material is an electrically nonconducting material such as glass, ceramics, or plastics, the surface is activated with a tin chloride solution and a palladium chloride solution, and then an electroless nickel-phosphorous plating solution for black body coating is applied. A nickel-phosphorus alloy film is formed.
黒体皮膜用無電解ニッケル・リン合金めっきには、めっ
き液として、
(1)ニッケル塩として、硫酸ニッケル0.11〜0.
20M
還元剤として、ホスフィン酸ナトリウム0.24〜0.
36M
オキシカルボン酸として、D、Lリンゴ酸0.4〜0.
8M
ジカルボン酸として、コハク酸
0.4〜0.8M
含有する浴、又は
(2)ニッケル塩として、硫酸ニッケル0、11〜0.
20M
還元剤として、ホスフィン酸ナトリウム0.24〜0.
36M
オキシカルボン酸として、D、Lリンゴ酸屹2〜0.4
M
オキシカルボン酸として、乳酸
0.3〜0.6M
ジカルボン酸として、マロン酸
0.2〜0.4M
含有する浴のいずれかを使用し、通常80〜95℃の液
温で60分〜5時間浸漬させる。ニッケル・リン合金皮
膜の厚さは少なくとも30μm以上必要である。For electroless nickel-phosphorus alloy plating for blackbody film, the plating solution is (1) 0.11 to 0.0% of nickel sulfate as nickel salt.
20M As a reducing agent, sodium phosphinate 0.24-0.
36M oxycarboxylic acid, D, L malic acid 0.4-0.
A bath containing 0.4 to 0.8 M of succinic acid as an 8M dicarboxylic acid, or (2) a bath containing 0.4 to 0.8 M of nickel sulfate as a nickel salt.
20M As a reducing agent, sodium phosphinate 0.24-0.
36M oxycarboxylic acid, D, L malic acid 2-0.4
M oxycarboxylic acid, lactic acid 0.3-0.6M dicarboxylic acid, malonic acid 0.2-0.4M Use any of the baths containing the liquid temperature, usually 60 minutes to 5 minutes at a liquid temperature of 80 to 95°C. Let soak for an hour. The thickness of the nickel-phosphorus alloy film is required to be at least 30 μm or more.
ニッケル・リン合金皮膜の形成された基材は、水洗乾燥
した後、黒体化のためにエツチング処理される。The base material on which the nickel-phosphorus alloy film has been formed is washed with water, dried, and then etched to form a black body.
エツチング処理で用いられる硝酸水溶液の濃度は硝酸:
水−1:2から濃硝酸までの範囲の濃度を持ったもので
、液温は30〜80℃、浸漬時間10秒〜5分で処理さ
れるが、これらの濃度、液温、時間等のエツチング処理
条件はニッケル・リン合金皮膜の状態との関係で最適な
ものが選択される。The concentration of the nitric acid aqueous solution used in the etching process is nitric acid:
It has a concentration ranging from water-1:2 to concentrated nitric acid, and is treated at a liquid temperature of 30 to 80°C and an immersion time of 10 seconds to 5 minutes, but these concentrations, liquid temperature, time, etc. The optimum etching conditions are selected in relation to the condition of the nickel-phosphorus alloy film.
エツチング処理後、水洗乾燥して得られた基材の黒体皮
膜は、極めて安定で、機械的にも、耐湿性においても優
れており、その全反射率は320〜22000Iの波長
域において、0.04〜0.1%である。After the etching treatment, the blackbody film on the base material obtained by washing with water and drying is extremely stable and has excellent mechanical and moisture resistance, and its total reflectance is 0 in the wavelength range of 320 to 22,000I. It is .04 to 0.1%.
走査形電子顕微鏡による観察によれば、本発明の方法に
より得られた黒体皮膜の表面には、主に開口部の穴径が
1〜6μmの円錐状の穴を隣接して多数形成し、かつ該
穴の壁面にはこの穴よりも微細な凹凸を多数形成してい
る。この微細な凹凸が、さらに全反射率を低下させてい
るものと考えられる。According to observation using a scanning electron microscope, on the surface of the blackbody film obtained by the method of the present invention, a large number of adjacent conical holes with an opening diameter of 1 to 6 μm were mainly formed. In addition, the wall surface of the hole has a large number of irregularities that are finer than the hole. It is thought that these fine irregularities further reduce the total reflectance.
[作 用]
黒体皮膜用無電解ニッケル・リン合金めっき液によるニ
ッケル・リン合金皮膜をエツチングにより、基材表面に
微細穴がランダムに配列し、かっ該穴の壁面には微細な
凹凸を多数形成することによって、低い全反射率の黒体
が得られる。[Function] By etching the nickel-phosphorus alloy film using an electroless nickel-phosphorus alloy plating solution for black body film, micro holes are arranged randomly on the surface of the base material, and many microscopic irregularities are formed on the wall surface of the holes. By forming this, a black body with low total reflectance can be obtained.
この発明の方法で形成される黒体は、電子顕微鏡による
観察で証明されるところによれば、従来技術のものに比
較して、
(1)微細な円錐大群の大きさの分布が比較的均一であ
る。As evidenced by observation using an electron microscope, the black body formed by the method of the present invention has (1) a relatively uniform size distribution of fine cone groups compared to those of the prior art; It is.
(2) 穴の径が主に1〜6μmと小さく、深い円錐
状の穴であることが観察される。(2) It is observed that the holes are small in diameter, mainly 1 to 6 μm, and are deep conical holes.
(3)特に重要な点であるが、微細穴の壁面に無数の微
細凹凸を有しており、従来観察されながった新しい構造
の表面となっている。(3) A particularly important point is that the walls of the microscopic holes have countless microscopic irregularities, creating a surface with a new structure that has not been observed before.
この構造の故に全反射率が従来よりも極めて低下し、特
に320〜2200 nmという広い波長領域で0.0
4〜0.1%の光の全反射率を有する黒体が得られる。Because of this structure, the total reflectance is much lower than before, and is 0.0 in the wide wavelength range of 320 to 2200 nm.
A black body with a total light reflectance of 4-0.1% is obtained.
[実施例]
実施例1
この例では基材として金属を用い、代表として銅を用い
る。[Examples] Example 1 In this example, metal is used as the base material, and copper is used as a representative example.
直径8璽鶴厚さ0.3mmの銅板の基材を1.1.1−
トリクロルエタンおよびアルカリ脱脂液で脱脂処理し、
水洗後1:1塩酸により酸洗いし、次いでニッケルスト
ライクめっき(電気めっき)を行った後、浴温90℃の
黒体皮膜用無電解ニッケル・リン合金めっき液(液組成
:硫酸ニッケル0.1M1ホスフィン酸ナトリウム0.
25M、D、L−リンゴ酸0.2M、乳酸0.4M、マ
ロン酸0.25M)または(硫酸ニッケル0.1M、ホ
スフィン酸ナトリウム0.25M、D、L−リンゴ酸0
.4M、コハク酸0.45M)に3時間浸漬し、基材表
面にニッケル・リン合金めっき皮膜を70〜80μ■析
出させた。このようにしてニッケル・リン合金めっき皮
膜の形成された銅の基材を水洗した。ついで、この合金
被膜を黒体化するために、浴温50℃の1=1硝酸水溶
液で1分間エツチング処理し、水洗し乾燥した。1.1.1- A copper plate base material with a diameter of 8 square cranes and a thickness of 0.3 mm.
Degreased with trichloroethane and alkaline degreasing solution,
After washing with water, pickling with 1:1 hydrochloric acid, and then performing nickel strike plating (electroplating), electroless nickel-phosphorus alloy plating solution for black body film (liquid composition: nickel sulfate 0.1M1) with a bath temperature of 90°C. Sodium phosphinate 0.
25M, D, L-malic acid 0.2M, lactic acid 0.4M, malonic acid 0.25M) or (nickel sulfate 0.1M, sodium phosphinate 0.25M, D,L-malic acid 0
.. 4M, succinic acid 0.45M) for 3 hours to deposit a nickel-phosphorus alloy plating film of 70 to 80 µm on the surface of the substrate. The copper base material on which the nickel-phosphorus alloy plating film was formed in this way was washed with water. Next, in order to make this alloy film a black body, it was etched for 1 minute in a 1=1 nitric acid aqueous solution at a bath temperature of 50°C, washed with water, and dried.
銅の基材表面に形成された黒体皮膜は極めて安定で、機
械的振動および摩擦、耐湿に対して優れていた。The blackbody film formed on the surface of the copper base material was extremely stable and had excellent resistance to mechanical vibration, friction, and moisture.
第1図は得られた黒体皮膜の320〜2200nlの波
長域での全反射率を積分球分光光度計で測定した結果を
示す。実線がその測定値で、320〜2200 nsの
波長域で全反射率は0.05〜0.08%と低く、波長
による変動も極めて小さい。この皮膜を85℃で相対湿
度85%RHの環境に200時間および500時間暴露
したのちにDI定した全反射率を示すが、なお全波長域
での全反射率は0.1%前後であり、波長依存性は殆ど
見られず、本発明で作られた黒体皮膜は320〜220
0nsの全波長域にわたってすぐれた黒体であることが
示されている。FIG. 1 shows the results of measuring the total reflectance of the obtained black body film in the wavelength range of 320 to 2200 nl using an integrating sphere spectrophotometer. The solid line is the measured value, and the total reflectance is as low as 0.05 to 0.08% in the wavelength range of 320 to 2200 ns, and the variation depending on the wavelength is extremely small. After exposing this film to an environment with a relative humidity of 85% RH at 85°C for 200 and 500 hours, the total reflectance determined by DI is shown, and the total reflectance in the entire wavelength range is around 0.1%. , almost no wavelength dependence is observed, and the black body film made by the present invention has a wavelength of 320 to 220
It has been shown that it is an excellent black body over the entire wavelength range of 0 ns.
第2図において、Aは本実施例で得られた本発明の黒体
皮膜の全反射率測定値である。Bは米国特許第4.23
3.107号および第4.361,830号明細書に開
示されている黒色皮膜の全反射率で、Aの皮膜に比して
、全反射率が0.5〜1.0%と高く、かつ、波長依存
性が見られる。Cは全黒皮膜についての測定値である。In FIG. 2, A is the total reflectance measurement value of the black body film of the present invention obtained in this example. B is U.S. Patent No. 4.23
The total reflectance of the black film disclosed in No. 3.107 and No. 4.361,830 is as high as 0.5 to 1.0% compared to the film A. Moreover, wavelength dependence is observed. C is the measured value for the all-black film.
このように、本発明は全反射率およびその波長依存性に
おいて、従来技術よりも格段に優れている。As described above, the present invention is significantly superior to the prior art in terms of total reflectance and its wavelength dependence.
第3図は、実施例1で製造した黒体皮膜を有°する基材
の表面を走査形電子顕微鏡で観察した写真である。a、
b、c、dは順次倍率を増加したときのものである。拡
大倍率は傍に示したスケールで見当がつけられる。FIG. 3 is a photograph of the surface of the base material having the blackbody film produced in Example 1, observed with a scanning electron microscope. a,
b, c, and d are the results when the magnification is increased sequentially. The magnification factor can be estimated from the scale shown nearby.
aで示すように、表面には円錐状の微細な穴が全面にラ
ンダムに分布しており、穴の直径は比較的均一である。As shown in a, fine conical holes are randomly distributed over the surface, and the diameter of the holes is relatively uniform.
穴径の分布の一例を第6図に示す。An example of the hole diameter distribution is shown in FIG.
この図から穴の開口部の穴径が主に1〜6μmであ・る
ことがわかる。第3図において、b、c、dと次第に倍
率を上げていくと微細穴の壁面には、さらに小さい微細
な凹凸が作られていることが判明する。すなわち微細穴
の壁面の表面により小さい微細な凹凸が形成している点
において本発明の方法で形成された黒体皮膜に表面構造
上の特徴が認められる。第4図も同様である。It can be seen from this figure that the hole diameter of the hole opening is mainly 1 to 6 μm. In FIG. 3, as the magnification is gradually increased from b to c to d, it becomes clear that even smaller microscopic irregularities are formed on the walls of the microscopic holes. That is, the black body film formed by the method of the present invention has a surface structural feature in that smaller fine irregularities are formed on the surface of the wall surface of the microhole. The same applies to FIG.
第5図は、先行技術である米国特許第4.233゜10
7号および第4.361.830号明細書に開示された
方法に基いて作成した黒色皮膜の表面を走査形電子顕微
鏡で観察した写真である。第3.4図と対比させるため
に、a、b、c、dは同様に順次倍率を増加させた。第
5図aは、表面に円錐状穴がランダムに分布しており、
円錐穴の直径は大小さまざまに分布していることが判る
。その穴径の分布を第6図に示す。第3図、第4図と第
5図との表面写真観察で最も重要と考えられる差異はd
において認められる。第3図、第4図には、微細穴の壁
面の表面により小さい微細な凹凸が形成されている点で
ある。Figure 5 shows prior art U.S. Patent No. 4.233°10.
This is a photograph of the surface of a black film prepared based on the method disclosed in No. 7 and No. 4.361.830, observed with a scanning electron microscope. In order to contrast with Fig. 3.4, a, b, c, and d have been similarly increased in magnification sequentially. Figure 5a shows conical holes randomly distributed on the surface.
It can be seen that the diameters of the conical holes vary in size. The hole diameter distribution is shown in FIG. The most important difference in surface photograph observation between Figures 3, 4, and 5 is d
It is recognized in In FIGS. 3 and 4, smaller fine irregularities are formed on the walls of the microholes.
表1に、先行技術と本発明の方法とを比較して表示した
。Table 1 displays a comparison between the prior art and the method of the present invention.
なお、鉄、ニッケル、コバルト等の基材についてもt、
i、t −トリクロルエタンを用い脱脂を行い、次ぎに
アルカリ脱脂し、水洗後、1:1塩酸により酸洗いをし
水洗した後、浴温90℃の黒体皮膜用無電解ニッケル・
リン合金めっき液に3時間浸漬し、基材表面にニッケル
・リン合金めっき皮膜を約70〜80μm析出させた。In addition, for base materials such as iron, nickel, and cobalt, t,
Degreasing is performed using i, t-trichloroethane, followed by alkali degreasing, washing with water, pickling with 1:1 hydrochloric acid, washing with water, and electroless nickel for blackbody film at a bath temperature of 90°C.
It was immersed in a phosphorus alloy plating solution for 3 hours to deposit a nickel-phosphorus alloy plating film of about 70 to 80 μm on the surface of the base material.
この皮膜を前項に記載したエツチング処理を行い、皮膜
を黒体化させた。このようにして得られた黒体皮膜の表
面構造、光の吸収特性などは、銅の基材で得られた黒体
皮膜のそれらと同じであった。This film was subjected to the etching treatment described in the previous section to turn the film into a black body. The surface structure, light absorption characteristics, etc. of the blackbody film thus obtained were the same as those of the blackbody film obtained using a copper base material.
さらに、基材の金属としてアルミニウムについても、1
.1.1− トリクロルエタンで脱脂を行い、常温の水
酸化ナトリウム溶液で3〜5分間エツチングをおこなっ
た。水洗後常温の硝酸とフッ化水素酸の混合液に15〜
20秒間浸漬し、アルミニウム表面に生じたスマット除
去し、水洗後亜鉛置換し、水洗して銅ストライク、ニッ
ケルストライクめっき(電気めっき)を行った後、温浴
90℃の黒体皮膜用無電解ニッケル・リン合金めっき皮
膜を約70〜80μl析出させる。この皮膜を前項に記
載したエツチング処理を行い皮膜を黒体化させた。この
ようにして得られた黒体皮膜の表面組織、光の吸収特性
などは、銅の基材で得られた黒体皮膜のそれらと同じで
あった。Furthermore, regarding aluminum as a base metal, 1
.. 1.1- Degreasing was performed with trichloroethane, and etching was performed for 3 to 5 minutes with a sodium hydroxide solution at room temperature. After washing with water, soak in a mixture of nitric acid and hydrofluoric acid at room temperature for 15~
Dip for 20 seconds to remove smut generated on the aluminum surface, wash with water, replace with zinc, wash with water and perform copper strike and nickel strike plating (electroplating), then electroless nickel for black body coating in a warm bath of 90°C. Approximately 70 to 80 μl of phosphorus alloy plating film is deposited. This film was subjected to the etching treatment described in the previous section to turn the film into a black body. The surface texture, light absorption characteristics, etc. of the blackbody film thus obtained were the same as those of the blackbody film obtained using a copper base material.
さらにまた、真ちゅう、青銅、白銅、りん青銅、ステン
レス鋼、18金等の基材についても、銅の基材の前処理
と同じ前処理を行い、基材表面に黒体皮膜用ニッケル・
リン合金皮膜を約70〜80μm析出させ、前項に記載
した黒体化のためのエツチング処理を行りた。得られた
黒体皮膜の表面構造、光の吸収特性などは、銅の基材で
得られた黒体皮膜のそれらと同じであった。Furthermore, base materials such as brass, bronze, cupronickel, phosphor bronze, stainless steel, and 18-karat gold are subjected to the same pretreatment as the copper base material, and the surface of the base material is coated with nickel for black body coating.
A phosphorus alloy film was deposited to a thickness of about 70 to 80 μm, and the etching treatment for forming a black body described in the previous section was performed. The surface structure, light absorption characteristics, etc. of the obtained blackbody film were the same as those of the blackbody film obtained on a copper base material.
実施例2
この例では基材として、セラミックス、ガラスを用いた
。セラミックス、ガラスは、不導体であるため真空蒸着
法を用い、まずニクロムを蒸着させ、次ぎに金を蒸着し
、ニッケルストライクめっきを行って表面を金属化した
。または化学的還元法として、コロイド状パラジウム懸
濁液に浸漬、塩化パラジウム溶液に浸漬するか、または
塩化錫溶液次ぎに塩化パラジウム溶液に浸漬することに
よってセラミックス、ガラス表面を活性化した。Example 2 In this example, ceramics and glass were used as the base material. Since ceramics and glass are nonconductors, a vacuum evaporation method was used to first deposit nichrome, then gold, and nickel strike plating to metalize the surface. Alternatively, as a chemical reduction method, ceramic and glass surfaces were activated by immersion in a colloidal palladium suspension, immersion in a palladium chloride solution, or immersion in a tin chloride solution and then a palladium chloride solution.
これら表面を金属化および活性化したセラミックス、ガ
ラスを温浴90℃の黒体皮膜用無電解ニッケル・リン合
金めっき液(液組成:硫酸ニッケル0、IM、ホスフィ
ン酸ナトリウム0.25M。These surface-metallized and activated ceramics and glasses were heated in a hot bath at 90°C using an electroless nickel-phosphorus alloy plating solution for black body coatings (liquid composition: nickel sulfate 0, IM, sodium phosphinate 0.25M).
D、L−リンゴ酸0.5M、乳酸0.4M、マロン酸0
.25M)または(液組成:硫酸ニッケル0.1M、ホ
スフィン酸ナトリウム0.25M。D, L-malic acid 0.5M, lactic acid 0.4M, malonic acid 0
.. 25M) or (liquid composition: nickel sulfate 0.1M, sodium phosphinate 0.25M.
D、L−リンゴ酸0.4M、コハク酸0.45M)に3
時間浸漬し、これらの基材表面にニッケル・リン合金め
っき皮膜を約70〜80μ−析出させ、次いで実施例1
に記載した黒体化のためのエツチング処理を行った。そ
の結果、得られた黒体皮膜の表面構造、光の全反射率な
どの諸特性は、実施例1で得られた黒体皮膜のそれらと
同じで、特別な差異は発見できなかった。D, L-malic acid 0.4M, succinic acid 0.45M) to 3
A nickel-phosphorus alloy plating film of about 70 to 80 μm was deposited on the surface of these substrates by dipping for a time, and then Example 1
The etching process for black body conversion described in . As a result, various properties such as the surface structure and total reflectance of the black body film obtained were the same as those of the black body film obtained in Example 1, and no particular differences were found.
実施例3 この例では基材としてプラスチックを用いた。Example 3 In this example, plastic was used as the base material.
プラスチックは、不導体であるため陰極スパッタリング
法を用い、金属化した。または化学的還元法として、コ
ロイド状パラジウム懸濁液に浸漬、塩化パラジウム溶液
に浸漬するか、塩化錫溶液次ぎに塩化パラジウム溶液に
浸漬することによってプラスチック表面を活性化しても
よい。これら表面を金属化および活性化したプラスチッ
クを浴温90℃の黒体皮膜用無電解ニッケル・リン合金
めっき液(液組成:硫酸ニッケル0. 1M、ホスフィ
ン酸ナトリウム0.25M、D、L−リンゴ酸0.5M
、乳酸14M、70:/酸0.3M)またはぐ硫酸ニッ
ケル0.1M、ホスフィン酸ナトリウム0.25M、D
、L−’)>ゴ酸0.4M。Since plastic is a nonconductor, it was metallized using cathode sputtering. Alternatively, as a chemical reduction method, the plastic surface may be activated by immersion in a colloidal palladium suspension, immersion in a palladium chloride solution, or immersion in a tin chloride solution and then a palladium chloride solution. These surface-metallized and activated plastics were coated with an electroless nickel-phosphorus alloy plating solution for blackbody coatings at a bath temperature of 90°C (liquid composition: nickel sulfate 0.1M, sodium phosphinate 0.25M, D, L-apple). acid 0.5M
, lactic acid 14M, 70:/acid 0.3M) or nickel sulfate 0.1M, sodium phosphinate 0.25M, D
, L-') > Golic acid 0.4M.
コ/l酸0.45M)に3時間浸漬しプラスチック表面
にニッケル・リン合金めっき皮膜を約70〜80μ厘析
出させ、実施例1に記載した黒色化のためのエツチング
処理を行って得られた黒体皮膜の表面構造、光の全反射
率などの諸特性は、実施例1で得られた黒体皮膜のそれ
らと同じで、特別な差異は発見できながった。A nickel-phosphorus alloy plating film was deposited on the surface of the plastic by about 70 to 80 μm by immersion in 0.45 M chloride/l acid for 3 hours, and was then subjected to the etching treatment for blackening as described in Example 1. The various properties of the black body film, such as the surface structure and total reflectance of light, were the same as those of the black body film obtained in Example 1, and no particular differences could be found.
[発明の効果]
本発明は基材の種類を問わず、
(1)ニッケル塩、ホスフィン酸ナトリウム、D、L−
リンゴ酸またはその塩、及びコハク酸またはその塩の組
成のめっき液、若しくは(2) ニッケル塩、ホスフ
ィン酸ナトリウム、D。[Effects of the Invention] The present invention applies regardless of the type of base material. (1) Nickel salt, sodium phosphinate, D, L-
A plating solution having a composition of malic acid or its salt, and succinic acid or its salt, or (2) nickel salt, sodium phosphinate, D.
L−リンゴ酸またはその塩、乳酸またはその塩、及びマ
ロン酸またはその塩の組成のめっき液を使用してニッケ
ル合金めっき皮膜を析出形成し、これを硝酸水溶液のエ
ツチング処理で馬体化したことにより、理想的な黒体皮
膜を形成した。Precipitating a nickel alloy plating film using a plating solution with a composition of L-malic acid or its salt, lactic acid or its salt, and malonic acid or its salt, and converting it into a horse body by etching with an aqueous nitric acid solution. As a result, an ideal blackbody film was formed.
この黒体皮膜は、主に開口部の穴径が1〜6μmの円錐
状の穴が隣接して多数形成し、かつ該穴の壁面に微細な
凹凸を多数形成してるので、光の全反射率を広い波長範
囲で低くしている。すなわち320〜2200 nmの
波長範囲において波長依存性が小さく、機械的振動およ
び摩擦に強く、耐湿性に対しても安定し、全反射率が0
.04〜0.1%と極めて低い反射率を有する皮膜が形
成される。This black body film mainly consists of a large number of adjacent conical holes with an opening diameter of 1 to 6 μm, and many fine irregularities formed on the walls of the holes, so that light is totally reflected. The rate is low over a wide wavelength range. In other words, it has low wavelength dependence in the wavelength range of 320 to 2200 nm, is resistant to mechanical vibration and friction, is stable against moisture resistance, and has a total reflectance of 0.
.. A film having an extremely low reflectance of 0.04 to 0.1% is formed.
こうして理想的な黒体皮膜を、金属、セラミックス、プ
ラスチックスなどほとんどの工業材料上に形成できるか
ら、光吸収体として有益であり、得られた皮膜は精密な
光パワー絶対値測定用の光吸収体としであるいは光伝送
系の終端素子として極めて有用であり、また、光学機器
内部反射防止材、光コネクター内部の反射防止材等に利
用することができる。In this way, an ideal blackbody film can be formed on most industrial materials such as metals, ceramics, and plastics, making it useful as a light absorber. It is extremely useful as a terminal element for optical transmission systems, and can also be used as an antireflection material inside optical equipment, an antireflection material inside optical connectors, etc.
第1図は、湿度による本発明の黒体皮膜の全反射率変化
を示すグラフである。
第2図は、従来技術である米国特許第4.361゜63
0号明細書に開示されている黒色皮膜および全黒の全反
射率を本発明の黒体皮膜と比較したグラフである。
第3図(a)〜第3図(d)及び第4図(a)〜第4図
(d)は、それぞれエツチング処理液でエツチングした
本発明の黒体皮膜の表面構造を順に拡大して示す走査形
電子顕微鏡写真で、第5図(a)〜第5図(d)は、従
来技術である米国特許第4.233.107号および第
4.181.830号明細書に開示されている黒色皮膜
に相当する皮膜の表面構造を順に拡大して示す走査形電
子顕微鏡写真である。
第6図は、第3図、第4図及び第5図に示した本発明に
係わる黒体被膜の表面にある穴の穴径分布を示す図であ
る。
出願人代理人 弁理士 鈴江武彦
全反M(0ム)
!′;r
図
第3
図
第
図
第4図
第5図FIG. 1 is a graph showing changes in total reflectance of the black body film of the present invention depending on humidity. Figure 2 shows the prior art, U.S. Patent No. 4.361゜63.
1 is a graph comparing the total reflectance of the black film disclosed in the specification of No. 0 and the total black film with the black body film of the present invention. Figures 3(a) to 3(d) and 4(a) to 4(d) are enlarged views of the surface structure of the blackbody film of the present invention etched with an etching solution, respectively. 5(a) to 5(d) are scanning electron micrographs shown in FIGS. 5(a) to 5(d), which are disclosed in prior art US Pat. These are scanning electron micrographs showing enlarged sequentially the surface structure of a film corresponding to a black film. FIG. 6 is a diagram showing the hole diameter distribution of holes on the surface of the blackbody coating according to the present invention shown in FIGS. 3, 4, and 5. FIG. Applicant's agent Patent attorney Takehiko Suzue Zentai M (0mu)! ';r Figure 3 Figure 4 Figure 5
Claims (3)
合金の黒体被膜とを具備し、この黒体被膜の表面は、主
に開口部の穴径が1〜6μmの円錐状の穴を隣接して多
数形成し、かつ該穴の壁面にこの穴よりも微細な凹凸を
多数形成し、波長域320nm〜2200nmにおいて
黒体の全反射率が0.04〜0.1%である黒体皮膜を
有する基材。(1) Comprising a base material and a black body coating of a nickel-phosphorus alloy formed on the surface of the base material, the surface of this black body coating is mainly conical with an opening hole diameter of 1 to 6 μm. A large number of holes are formed adjacent to each other, and a large number of irregularities finer than the holes are formed on the wall surface of the hole, so that the total reflectance of the black body is 0.04 to 0.1% in the wavelength range of 320 nm to 2200 nm. A substrate with a certain blackbody film.
リンゴ酸またはその塩、コハク酸またはその塩とからな
る黒体皮膜用ニッケル・リン合金めっき液を用いて、基
材上にニッケル・リン合金皮膜をめっきする工程と、該
ニッケル・リン合金皮膜表面を、硝酸水溶液でエッチン
グ処理する工程から成る黒体皮膜付基材の製造方法。(2) Nickel salt, sodium phosphinate, D,L-
A step of plating a nickel-phosphorus alloy film on a substrate using a nickel-phosphorus alloy plating solution for black body film consisting of malic acid or its salt, succinic acid or its salt, and the surface of the nickel-phosphorus alloy film. A method for producing a base material with a blackbody film, which comprises etching with an aqueous nitric acid solution.
リンゴ酸またはその塩、乳酸またはその塩、マロン酸ま
たはその塩とからなる黒体皮膜用ニッケル・リン合金め
っき液を用いて、基材上にニッケル・リン合金皮膜をめ
っきする工程と、該ニッケル・リン合金皮膜表面を、硝
酸水溶液でエッチング処理する工程から成る黒体皮膜付
基材の製造方法。(3) Nickel salt, sodium phosphinate, D,L-
a step of plating a nickel-phosphorus alloy film on a substrate using a nickel-phosphorus alloy plating solution for black body film consisting of malic acid or its salt, lactic acid or its salt, malonic acid or its salt; - A method for producing a substrate with a blackbody film, which comprises etching the surface of the phosphorus alloy film with an aqueous nitric acid solution.
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63231760A JPH0280581A (en) | 1988-09-16 | 1988-09-16 | Base material having black body film and production of base material fitted with black body film thereof |
US07/268,509 US4984855A (en) | 1987-11-10 | 1988-11-08 | Ultra-black film and method of manufacturing the same |
EP88118758A EP0317838B1 (en) | 1987-11-10 | 1988-11-10 | Ultra-Black film and method of manufacturing the same |
DE3887832T DE3887832T2 (en) | 1987-11-10 | 1988-11-10 | Deep black coating and process for its production. |
US07/595,593 US5083222A (en) | 1987-11-10 | 1990-10-11 | Ultra-black film and method of manufacturing the same |
US07/595,608 US5074957A (en) | 1987-11-10 | 1990-10-11 | Method of manufacturing ultra-black film |
US07/595,606 US5111335A (en) | 1987-11-10 | 1990-10-11 | Ultra-black film and method of manufacturing the same |
US07/595,561 US5096300A (en) | 1987-11-10 | 1990-10-11 | Ultra-black film and method of manufacturing the same |
US07/595,607 US5079643A (en) | 1987-11-10 | 1990-10-11 | Ultra-black film and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63231760A JPH0280581A (en) | 1988-09-16 | 1988-09-16 | Base material having black body film and production of base material fitted with black body film thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0280581A true JPH0280581A (en) | 1990-03-20 |
JPH0527708B2 JPH0527708B2 (en) | 1993-04-22 |
Family
ID=16928600
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63231760A Granted JPH0280581A (en) | 1987-11-10 | 1988-09-16 | Base material having black body film and production of base material fitted with black body film thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0280581A (en) |
-
1988
- 1988-09-16 JP JP63231760A patent/JPH0280581A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH0527708B2 (en) | 1993-04-22 |
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