JPH0262548B2 - - Google Patents
Info
- Publication number
- JPH0262548B2 JPH0262548B2 JP56209785A JP20978581A JPH0262548B2 JP H0262548 B2 JPH0262548 B2 JP H0262548B2 JP 56209785 A JP56209785 A JP 56209785A JP 20978581 A JP20978581 A JP 20978581A JP H0262548 B2 JPH0262548 B2 JP H0262548B2
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- compound
- general formula
- formula
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000001875 compounds Chemical class 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 238000006462 rearrangement reaction Methods 0.000 claims description 2
- JMIYLNQBNSEKAO-UHFFFAOYSA-N 2-(2-phenylsulfanylphenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC=C1SC1=CC=CC=C1 JMIYLNQBNSEKAO-UHFFFAOYSA-N 0.000 claims 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 13
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 5
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 239000012359 Methanesulfonyl chloride Substances 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- QARBMVPHQWIHKH-UHFFFAOYSA-N methanesulfonyl chloride Chemical compound CS(Cl)(=O)=O QARBMVPHQWIHKH-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- -1 nitrile compound Chemical class 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- WPDWOCRJBPXJFM-UHFFFAOYSA-N 2-bromo-1-phenylpropan-1-one Chemical class CC(Br)C(=O)C1=CC=CC=C1 WPDWOCRJBPXJFM-UHFFFAOYSA-N 0.000 description 1
- KOJOJLCQJFRVOH-UHFFFAOYSA-N 2-methyl-3-(2-phenylsulfanylphenyl)butanedioic acid Chemical compound C(=O)(O)C(C)C(C(=O)O)C1=C(C=CC=C1)SC1=CC=CC=C1 KOJOJLCQJFRVOH-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- MUXFZBHBYYYLTH-UHFFFAOYSA-N Zaltoprofen Chemical compound O=C1CC2=CC(C(C(O)=O)C)=CC=C2SC2=CC=CC=C21 MUXFZBHBYYYLTH-UHFFFAOYSA-N 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- KDCIHNCMPUBDKT-UHFFFAOYSA-N hexane;propan-2-one Chemical compound CC(C)=O.CCCCCC KDCIHNCMPUBDKT-UHFFFAOYSA-N 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 231100001231 less toxic Toxicity 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 239000010446 mirabilite Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000007867 post-reaction treatment Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- MNWBNISUBARLIT-UHFFFAOYSA-N sodium cyanide Chemical compound [Na+].N#[C-] MNWBNISUBARLIT-UHFFFAOYSA-N 0.000 description 1
- RSIJVJUOQBWMIM-UHFFFAOYSA-L sodium sulfate decahydrate Chemical compound O.O.O.O.O.O.O.O.O.O.[Na+].[Na+].[O-]S([O-])(=O)=O RSIJVJUOQBWMIM-UHFFFAOYSA-L 0.000 description 1
- XHFLOLLMZOTPSM-UHFFFAOYSA-M sodium;hydrogen carbonate;hydrate Chemical compound [OH-].[Na+].OC(O)=O XHFLOLLMZOTPSM-UHFFFAOYSA-M 0.000 description 1
- SUBJHSREKVAVAR-UHFFFAOYSA-N sodium;methanol;methanolate Chemical compound [Na+].OC.[O-]C SUBJHSREKVAVAR-UHFFFAOYSA-N 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
本発明は抗炎症剤として有用な2−(10,11−
ジヒドロ−10−オキソジベンゾ〔b,f〕チエピ
ン−2−イル)プロピオン酸()
K0273
の製造における中間体としてきわめて有用な5−
(1−カルボキシエチル)−2−フエニルチオフエ
ニル酢酸()の製造方法に関する。
現在、()を製造するに有用な方法としてニ
トリル体を経由する方法ぎ挙げられている(特願
昭56−56028)。
K0274
しかしながらこの方法において用いるKCN(又は
NaCN)は毒性が非常に強く、大量に用いる製造
においてはなるべく用いたくない試薬である。
又、このニトリル化反応においては脱ハロゲン化
水素によるスチレン型の副生成物をはじめとし、
数多くの副生成物を生じ、ニトリル体の収率は好
ましくない。
ニトリル化を経由しない方法としてダルゼンス縮
合反応を利用する方法
K0275
又は、CHBr3の付加反応を利用する方法(特開
昭56−16437)
K0276
等が挙げられるが反応の選択性に乏しく、式
()で示される化合物を工業的に製造する方法
としては適さない。
本発明者らはかかる欠点を解決し得る新規な製
造方法について鋭意検討した結果、安全かつ経済
的は製造法を見い出し、本発明を完成した。
本発明の製造法は次の反応工程により示され
る。
K0277
(式中,X;Cl,BrR:C1〜C5のアルキル基
又はH
R′:C1〜C5のアルキル基,
R″:−CH3又は
The present invention provides 2-(10,11-
Dihydro-10-oxodibenzo[b,f]thiepin-2-yl)propionic acid () K0273 is a very useful 5-
The present invention relates to a method for producing (1-carboxyethyl)-2-phenylthiophenyl acetic acid (). At present, a method using a nitrile compound is cited as a useful method for producing () (Japanese Patent Application No. 56,028/1982). K0274 However, KCN (or
NaCN) is extremely toxic and is a reagent that should be avoided if possible in large-scale production.
In addition, this nitrification reaction produces styrene-type byproducts due to dehydrohalogenation,
Many by-products are produced and the yield of nitrile is unfavorable. As a method that does not involve nitrification, there is a method using Dalzens condensation reaction K0275 or a method using addition reaction of CHBr 3 (JP-A-16437-1983) K0276 etc., but the reaction selectivity is poor and the formula () This is not suitable as a method for industrially producing the compound represented by. The inventors of the present invention have conducted intensive studies on new manufacturing methods that can solve these drawbacks, and as a result, have found a safe and economical manufacturing method, and have completed the present invention. The production method of the present invention is illustrated by the following reaction steps. K0277 (In the formula, X; Cl, BrR: C 1 to C 5 alkyl group or H
【式】)
すなわち、一般式()のα−ハルゲノプロピ
オフエノン誘導体をアルコラートによりヒドロキ
シアセタール化(Rとアルコラート−アルコール
のアルキル基が異る場合エステル交換が同時進行
する)した後、R″SO2ClにてR″SO2化し、さらに
アルカリにて転位反応を生じせしめることにより
式()で示される5−(1−カルボキシエチル)
−2−フエニルチオフエニル酢酸を得る。
本発明は前記公知製法に比べ毒性の非常に少い
物質を扱うため設備上特別な配慮を施す必要がな
く設備費が低減出来る。又高い反応選択性により
各工程とも高収率であるため、工業的かつ経済的
に有利な製造法である。
例えば、本発明の実施において、α−ブロモプ
ロピオフエノン誘導体()からヒドロキシアセ
タール()への反応は、メタノール溶媒中、水
冷下、ナトリウムメトキサイド−メタノール溶液
を滴下後、撹拌(好ましくは5時間)すると置換
基Rのメチル基への変換を伴いながらほぼ定量的
に進行し、収率は97.6%である。
さらに、少量の塩基(例えばピリジン,トリエ
チルアミン,ナトリウムメトキサイドなど)を
HClトラツプ剤として添加した系(溶媒として例
えば塩化メチレン,酢酸エチル,トルエンなど)
に化合物()を溶解し、メタンスルホニルクロ
ライドを、氷冷下にて滴下すると直ちにメタンス
ルホニル基が進行し、化合物()を定量的に得
る。ついで、化合物()を水−有機溶剤−アル
カリ系の溶剤に溶解し加熱還流すると80.4%の収
率で目的物()を得ることが出来る。ここで有
機溶媒として例えばメタノール,エタノール,ジ
メチルホルムアミド等を挙げることが出来る。
又、その含有率は10〜90%好ましくは30〜80%で
ある。さらに、アルカリとして例えば、NaOH,
KOH,K2CO3,Na2CO3,NaHCO3,Ca
(OH)2,CaCO3,トリエチルアミン,モルホリ
ン,ピペリジン,ピペラジン等を挙げることが出
来、その含有率は1〜20%好ましくは1〜10%で
ある。この工程の反応機構は、フエニル基の1,
2転位が起り、ついで加水分解反応が起るものと
考えられる。各工程における反応後の処理は反応
物中の有機溶剤を留去させて減らした後、反応物
を水にあけてから有機溶剤により抽出し、ついで
その溶剤を留去させるだけである。必要なら再結
晶を行い容易に精製することが可能である。再結
晶溶媒としてベンゼン及びトルエン−n−ヘキサ
ン,アセトン−n−ヘキサン,酢酸エチル−n−
ヘキサンの混合溶媒等を挙げることが出来る。
すなわち、本発明の製法は()〜()全収
率が78%以上で、その反応及び処理設備は特殊な
装備を必要とせずその操作も非常に簡単、安全
で、ニトリル化法をはじめとする公知技術に比べ
著しく秀れた方法である。
以下、実施例によつて本発明を説明する。
実施例 (1)
(A) 300mlの三ツ口フラスコに3−エトキシカル
ボニルメチル−4−フエニルチオ−α−ブロモ
プロピオフエノン75g,エタノール150mlを採
り水浴中で充分撹拌した。ついでナトリウムメ
トキサイド28%メタノール液42.1gを約20分か
けて滴下した。滴下後約5時間水浴中で撹拌を
続けた。反応後、水(100ml)中に注ぎ、ジク
ロロメタンにて抽出し、5%食塩水にて洗浄、
ついで芒硝にて脱水を行い、目的物(一般式
においてR=CH3,R′=CH3)のジクロロメタ
ン溶液を得た。(目的成分量67.5g)
(B) 500mlの三ツ口フラスコに(A)で得られた液を
入れ、氷浴中で充分撹拌した。ついで、メタン
スルホニルクロライド25.6gを反応温度が30℃
以下になる様に滴下速度を調節しながら添加し
た。添加後、更に1時間反応させ、ついで水
(60ml)を加えて、余剰のメタンスルホニルク
ロライドを分解した。分液後、5%食塩水で洗
浄し、溶剤を減圧下で除去すると目的物(一般
式においてR=CH3,R′,R″=CH3)84.6g
が得られた。
(C) 2の三ツ口フラスコに(3)で得られた化合物
(一般式においてR=CH3,R′,R″=CH3)
86.6g,メタノール860ml,8%重曹水−860ml
を採り19時間還流した。反応後、減圧下でメタ
ノールを留去させ、ついで、ジクロロメタン
120mlを加えて未反応物を有機層に移し除去し
た。水溶液に濃塩酸52mlを滴下すると目的物
()が酸析して来た。これを酢酸エチル(200
ml)で抽出・水洗・芒硝脱水した後減圧下液量
が4分の1になるまで濃縮し、n−ヘキサン
(100ml)を添加して白色結晶(49.0g)を得
た。
mp 140℃
(A)より(C)に至るまでの全収率は84.1%であつた。
実施例 (2)
300mlの三ツ口フラスコに3−メトキシカルボ
ニルル−4−フエニルチオ−α−ブロモプロピオ
フエノン72g,メタノール150mlを採り実施例(1)
と同様の方法で反応させたところ目的物()を
47.0g得た。この全収率は78.4%であつた。
(NMRの各シグナルは実施例(1)に同じ)
実施例における各化合物のNMRスペクトル
〔δ値〕(溶媒アセトンd6)
K0279
K0280
K0281[Formula]) That is, after hydroxyacetalizing the α-halgenopropiophenone derivative of the general formula () with an alcoholate (if the alkyl groups of R and the alcoholate-alcohol are different, transesterification proceeds simultaneously), R″ 5-(1-carboxyethyl) represented by the formula () is obtained by converting R ″ SO 2 with SO 2 Cl and further rearrangement reaction with an alkali.
-2-phenylthiophenyl acetic acid is obtained. Since the present invention handles substances that are much less toxic than the above-mentioned known production methods, there is no need to take special precautions in terms of equipment, and equipment costs can be reduced. Furthermore, each step has a high yield due to high reaction selectivity, so it is an industrially and economically advantageous manufacturing method. For example, in the practice of the present invention, the reaction from α-bromopropiophenone derivative () to hydroxyacetal () is carried out by dropping a sodium methoxide-methanol solution in a methanol solvent under water cooling, followed by stirring (preferably for 5 hours). ) The reaction proceeds almost quantitatively with the conversion of the substituent R into a methyl group, and the yield is 97.6%. Additionally, a small amount of base (e.g. pyridine, triethylamine, sodium methoxide, etc.)
Systems added as HCl trapping agents (e.g. methylene chloride, ethyl acetate, toluene, etc. as solvents)
When the compound () is dissolved in the solution and methanesulfonyl chloride is added dropwise under ice cooling, the methanesulfonyl group immediately proceeds to quantitatively obtain the compound (). Next, the compound () is dissolved in water-organic solvent-alkaline solvent and heated under reflux to obtain the target compound () with a yield of 80.4%. Examples of organic solvents include methanol, ethanol, dimethylformamide, and the like.
Further, its content is 10 to 90%, preferably 30 to 80%. Furthermore, as an alkali, for example, NaOH,
KOH, K 2 CO 3 , Na 2 CO 3 , NaHCO 3 , Ca
(OH) 2 , CaCO 3 , triethylamine, morpholine, piperidine, piperazine, etc. can be mentioned, and the content thereof is 1 to 20%, preferably 1 to 10%. The reaction mechanism of this step is that the phenyl group has 1,
It is thought that two rearrangements occur and then a hydrolysis reaction occurs. The post-reaction treatment in each step is simply to distill off and reduce the organic solvent in the reactant, pour the reactant into water, extract with an organic solvent, and then distill off the solvent. If necessary, it can be easily purified by recrystallization. Benzene and toluene-n-hexane, acetone-n-hexane, ethyl acetate-n- as recrystallization solvents
Examples include a mixed solvent of hexane. In other words, the production method of the present invention has a total yield of 78% or more, and its reaction and processing equipment does not require special equipment, and its operation is very simple and safe, and it can be used in a variety of ways, including the nitrification method. This method is significantly superior to known techniques. The present invention will be explained below with reference to Examples. Example (1) (A) 75 g of 3-ethoxycarbonylmethyl-4-phenylthio-α-bromopropiophenone and 150 ml of ethanol were placed in a 300 ml three-necked flask and thoroughly stirred in a water bath. Then, 42.1 g of a 28% methanol solution of sodium methoxide was added dropwise over about 20 minutes. Stirring was continued in a water bath for about 5 hours after the dropwise addition. After the reaction, pour into water (100ml), extract with dichloromethane, wash with 5% saline,
The mixture was then dehydrated using Glauber's salt to obtain a dichloromethane solution of the target product (R=CH 3 , R'=CH 3 in the general formula). (Target component amount: 67.5 g) (B) The liquid obtained in (A) was placed in a 500 ml three-necked flask and thoroughly stirred in an ice bath. Next, 25.6 g of methanesulfonyl chloride was added at a reaction temperature of 30°C.
The addition was carried out while adjusting the dropping rate as follows. After the addition, the reaction was continued for an additional hour, and then water (60 ml) was added to decompose excess methanesulfonyl chloride. After separation, washing with 5% saline and removing the solvent under reduced pressure yielded 84.6 g of the target product (R=CH 3 , R′, R″=CH 3 in the general formula)
was gotten. (C) The compound obtained in (3) (in the general formula, R=CH 3 , R′, R″=CH 3 ) in the three-necked flask of 2.
86.6g, methanol 860ml, 8% sodium bicarbonate water - 860ml
was collected and refluxed for 19 hours. After the reaction, methanol was distilled off under reduced pressure, and then dichloromethane
120 ml was added and unreacted substances were transferred to the organic layer and removed. When 52 ml of concentrated hydrochloric acid was added dropwise to the aqueous solution, the desired product () precipitated out. This was mixed with ethyl acetate (200
After extraction, washing with water, and dehydration of Glauber's sulfate (ml), the mixture was concentrated under reduced pressure until the liquid volume was reduced to one-fourth, and n-hexane (100 ml) was added to obtain white crystals (49.0 g). mp 140°C The overall yield from (A) to (C) was 84.1%. Example (2) Place 72 g of 3-methoxycarbonyl-4-phenylthio-α-bromopropiofenone and 150 ml of methanol in a 300 ml three-necked flask and prepare Example (1).
When reacting in the same manner as
Obtained 47.0g. The overall yield was 78.4%.
(Each NMR signal is the same as in Example (1)) NMR spectrum [δ value] of each compound in Example (solvent acetone d 6 ) K0279 K0280 K0281
Claims (1)
はHを表わす) で示されるα−ハルゲノプロピオフエノン誘導体
をアルコラートによりヒドロキシアセタール化し
て一般式()で化合物となし、 K0269 (Rは前記と同様、R′はC1〜C5のアルキル基
を表わす) 一般式()の化合物をR″SO2Cl(R″は−CH3
又は【式】を表わす)でR″SO2−化 して一般式()で化合物となし K0271 (R及びR″は前記と同様である) 次いで一般式()の化合物をアルカリ性の条
件下にて転位反応を生じさせることを特徴とする
式()で示される5−(1−カルボキシエチル)
−2−フエニルチオフエニル酢酸の製造方法。 K0272[Claims] 1. An α-halgenopropiophenone derivative represented by the general formula () K0268 (X represents Cl or Br, R represents a C 1 to C 5 alkyl group or H) is converted into a hydroxyacetal using an alcoholate. K0269 (R is the same as above, R' represents a C 1 to C 5 alkyl group) The compound of general formula () is converted to R″SO 2 Cl (R″ is − CH 3
or [Formula]) to form a compound with the general formula () K0271 (R and R″ are the same as above) Then, the compound of the general formula () is converted to 5-(1-carboxyethyl) represented by formula () characterized by causing a rearrangement reaction
- A method for producing 2-phenylthiophenyl acetic acid. K0272
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20978581A JPS58113168A (en) | 1981-12-28 | 1981-12-28 | Production of 5-(1-carboxyethyl)-2-phenylthiophenyl- acetic acid |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20978581A JPS58113168A (en) | 1981-12-28 | 1981-12-28 | Production of 5-(1-carboxyethyl)-2-phenylthiophenyl- acetic acid |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58113168A JPS58113168A (en) | 1983-07-05 |
JPH0262548B2 true JPH0262548B2 (en) | 1990-12-26 |
Family
ID=16578555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20978581A Granted JPS58113168A (en) | 1981-12-28 | 1981-12-28 | Production of 5-(1-carboxyethyl)-2-phenylthiophenyl- acetic acid |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58113168A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2612161B2 (en) * | 1986-06-10 | 1997-05-21 | 日本ケミファ 株式会社 | Method for producing dibenzothiepine derivatives |
EP0309626B1 (en) * | 1987-09-30 | 1992-05-06 | Nippon Chemiphar Co., Ltd. | Process for the preparation of dibenzothiepin derivative |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5553282A (en) * | 1978-10-17 | 1980-04-18 | Nippon Chemiphar Co Ltd | Dibenzothiepin derivative and its preparation |
-
1981
- 1981-12-28 JP JP20978581A patent/JPS58113168A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5553282A (en) * | 1978-10-17 | 1980-04-18 | Nippon Chemiphar Co Ltd | Dibenzothiepin derivative and its preparation |
Also Published As
Publication number | Publication date |
---|---|
JPS58113168A (en) | 1983-07-05 |
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