JPH0253829A - Production of aromatic polymide resin - Google Patents
Production of aromatic polymide resinInfo
- Publication number
- JPH0253829A JPH0253829A JP20437788A JP20437788A JPH0253829A JP H0253829 A JPH0253829 A JP H0253829A JP 20437788 A JP20437788 A JP 20437788A JP 20437788 A JP20437788 A JP 20437788A JP H0253829 A JPH0253829 A JP H0253829A
- Authority
- JP
- Japan
- Prior art keywords
- aromatic
- reacting
- polyamic acid
- blend
- mixed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 125000003118 aryl group Chemical group 0.000 title claims description 19
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000011347 resin Substances 0.000 title abstract description 4
- 229920005989 resin Polymers 0.000 title abstract description 4
- 229920005575 poly(amic acid) Polymers 0.000 claims abstract description 25
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000000126 substance Substances 0.000 claims abstract description 10
- 150000004984 aromatic diamines Chemical class 0.000 claims abstract description 9
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 9
- 229920001721 polyimide Polymers 0.000 claims description 14
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 claims description 13
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 7
- 125000006158 tetracarboxylic acid group Chemical group 0.000 claims description 7
- 239000009719 polyimide resin Substances 0.000 claims description 6
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 abstract description 12
- 239000000203 mixture Substances 0.000 abstract description 5
- 238000007363 ring formation reaction Methods 0.000 abstract description 5
- 239000002253 acid Substances 0.000 abstract description 3
- 239000002131 composite material Substances 0.000 abstract description 3
- 238000002156 mixing Methods 0.000 abstract description 3
- 229920000642 polymer Polymers 0.000 abstract description 3
- 238000001291 vacuum drying Methods 0.000 abstract description 3
- 125000006160 pyromellitic dianhydride group Chemical group 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 16
- 238000006068 polycondensation reaction Methods 0.000 description 9
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 5
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical class OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 3
- HWWYDZCSSYKIAD-UHFFFAOYSA-N 3,5-dimethylpyridine Chemical compound CC1=CN=CC(C)=C1 HWWYDZCSSYKIAD-UHFFFAOYSA-N 0.000 description 2
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- -1 p-phenylene pyromellitimide Chemical compound 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- XVMSFILGAMDHEY-UHFFFAOYSA-N 6-(4-aminophenyl)sulfonylpyridin-3-amine Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=N1 XVMSFILGAMDHEY-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 125000005462 imide group Chemical group 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000004986 phenylenediamines Chemical class 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- WYVAMUWZEOHJOQ-UHFFFAOYSA-N propionic anhydride Chemical compound CCC(=O)OC(=O)CC WYVAMUWZEOHJOQ-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、溶液キャスティング可能なと、成形性に優れ
るとともに、優れた耐熱性、機械特性、熱的特性を示す
芳香族ポリイミド樹脂の製造法に関するものである。[Detailed Description of the Invention] [Field of Industrial Application] The present invention provides a method for producing an aromatic polyimide resin that is solution castable and exhibits excellent moldability as well as excellent heat resistance, mechanical properties, and thermal properties. It is related to.
高分子材料は、アルミナ基板、金属板上に形成するプリ
ント回路用絶縁材料、フレキシブルプリント回路用基材
、LSIの多層配線用の眉間絶縁膜など、膜材、フィル
ム材の分野、また複合材料のマトリックス樹脂などの構
造材料の分野で、その優れた電気絶縁性、加工性の面よ
り使用されてきている。これらの分野においては、従来
高性能化のため、主として耐熱性向上が検討されてきた
が、近年部品としての信頼性の面から、寸法安定性やセ
ラミックなど、他材料と併用される際の熱膨張率のミス
マツチを防ぐため、高剛性、耐熱膨張率などの優れた機
械特性、熱的特性も要求されるようになってきている。Polymer materials are used in the field of membrane materials, such as alumina substrates, insulating materials for printed circuits formed on metal plates, base materials for flexible printed circuits, and glabella insulating films for multilayer wiring of LSIs, as well as composite materials. It has been used in the field of structural materials such as matrix resins due to its excellent electrical insulation and processability. In these fields, improvements in heat resistance have traditionally been considered in order to improve performance, but in recent years, improvements in dimensional stability and heat resistance when used in combination with other materials, such as ceramics, have been considered from the perspective of reliability as parts. In order to prevent expansion coefficient mismatches, excellent mechanical and thermal properties such as high rigidity and thermal expansion coefficient are also required.
従来、耐熱性の優れた高分子材料として、芳香族ポリイ
ミドが良く知られている。このポリイミドは可溶性の前
駆体を持つため、溶液キャスティング可能なコーティン
グ材料もしくは膜材としてよく用いられているが、その
機械特性は一般に通常の高分子材料と同程度であり、熱
膨張率も大きく、熱特性的にも優れたものではなかった
。また一方、P−フェニレンジアミンとピロメリット酸
ジ無水物の重縮合、加熱硬化によって得られるポリイミ
ドは、分子構造上高剛性が期待できるにもかかわらず、
得られる膜は脆弱で実用的ではなかった。Aromatic polyimides have been well known as polymeric materials with excellent heat resistance. Because this polyimide has a soluble precursor, it is often used as a solution-castable coating or membrane material, but its mechanical properties are generally on the same level as ordinary polymer materials, and its coefficient of thermal expansion is large. It also did not have excellent thermal properties. On the other hand, although polyimide obtained by polycondensation of P-phenylenediamine and pyromellitic dianhydride and heat curing is expected to have high rigidity due to its molecular structure,
The resulting membrane was brittle and impractical.
本発明は、特にp−フェニレンピロメリットイミドを含
有する芳香族ポリイミドにおける上記のような欠点を解
消するもので、その前旺体が有機溶剤に可溶、もしくは
安定に分散でき、溶液キャスティング、化学環化(US
P Nα3,1.79,630)により、機械特性およ
び熱的特性の優れた強靭なフィルム、塗膜となる芳香族
ポリイミド樹脂の製造法を提供することを目的とするも
のである。The present invention specifically solves the above-mentioned drawbacks of aromatic polyimides containing p-phenylene pyromellitimide. Cyclization (US
The object of the present invention is to provide a method for producing an aromatic polyimide resin that can be used as a tough film or coating film with excellent mechanical properties and thermal properties.
本発明は、p−フェニレンジアミンとピロメリット酸ジ
無水物を反応させて得られるポリアミック酸と、芳香族
ジアミンと芳香族テトラカルボン酸ジ無水物を反応させ
て得られるポリアミック酸を混合相溶させた後、化学環
化剤を用いてイミド化させることを特徴とする芳香族ポ
リイミド樹脂の製造法である。The present invention involves mixing and dissolving a polyamic acid obtained by reacting p-phenylene diamine and pyromellitic dianhydride with a polyamic acid obtained by reacting an aromatic diamine with an aromatic tetracarboxylic dianhydride. This is a method for producing an aromatic polyimide resin, which is characterized in that the aromatic polyimide resin is then imidized using a chemical cyclizing agent.
本発明で用いる芳香族ジアミンとしては、2N
4\
\−1
−NH2
などが挙げられる。これら芳香族ジアミンは単独あるい
は2種以上を混合して用いることも可能である。Examples of the aromatic diamine used in the present invention include 2N 4\-1 -NH2. These aromatic diamines can be used alone or in combination of two or more.
また芳香族テトラカルボン酸ジ無水物としては、などが
挙げられ、単独あるいは2種以上を混合して用いること
も可能である。ただし本発明の主旨からして、芳香族ジ
アミンと芳香族テトラカルボン酸ジ無水物は、同時にp
−フェニレンジアミンとピロメリット酸ジ無水物であっ
てはならない。Further, examples of the aromatic tetracarboxylic dianhydride include the following, and it is also possible to use it alone or in a mixture of two or more kinds. However, in view of the gist of the present invention, aromatic diamine and aromatic tetracarboxylic dianhydride are simultaneously p
- Must not be phenylene diamine and pyromellitic dianhydride.
P−フェニレンジアミンとピロメリット酸ジ無水物より
得られるポリアミック酸と、芳香族ジアミンと芳香族テ
トラカルボン酸ジ無水物より得られるポリアミック酸の
重量比は10対90ないし95対5であることが望まし
い。これはp−フェニレンジアミンとピロメリット酸誘
導体の合計量が10重量%未満では良好な機械特性、熱
的特性を示さなくなる傾向があり、95重量%を超える
と、もろくなる傾向があるためである。The weight ratio of the polyamic acid obtained from P-phenylene diamine and pyromellitic dianhydride to the polyamic acid obtained from aromatic diamine and aromatic tetracarboxylic dianhydride is 10:90 to 95:5. desirable. This is because if the total amount of p-phenylenediamine and pyromellitic acid derivative is less than 10% by weight, it tends not to exhibit good mechanical and thermal properties, and if it exceeds 95% by weight, it tends to become brittle. .
本発明におけるポリアミック酸の合成方法は、通常用い
られている重縮合法であればいずれも適用可能ではある
が、特に低温溶液重縮合が好ましい。すなわち、上記の
p−フェニレンジアミンとピロメリット酸ジ無水物、お
よび芳香族ジアミンと芳香族テトラカルボン酸ジ無水物
をそれぞれ溶解し、0〜10℃の低温で重縮合すると高
分子量の芳香族ポリアミック酸が得られる。この溶液を
上記の割合となるように混合し、基板上にキャスティン
グし、溶媒を濃縮することにより、混合相溶したポリア
ミック酸の膜が得られる。Although any commonly used polycondensation method can be applied to the method for synthesizing polyamic acid in the present invention, low-temperature solution polycondensation is particularly preferred. That is, by dissolving the above-mentioned p-phenylene diamine and pyromellitic dianhydride, and aromatic diamine and aromatic tetracarboxylic dianhydride, respectively, and polycondensing them at a low temperature of 0 to 10°C, a high molecular weight aromatic polyamic acid is obtained. Acid is obtained. By mixing this solution in the above ratio, casting it on a substrate, and concentrating the solvent, a film of mixed and compatible polyamic acid can be obtained.
上記の反応時およびキャスティング時の溶媒としては、
前記のP−フェニレンジアミン、ピロメリット酸ジ無水
物、芳香族ジアミン、芳香族テトラカルボン酸ジ無水物
を含有している反応試薬を溶解し、かつ本質的に反応し
ないもので、生成する芳香族ポリアミック酸を溶解する
か、安定に分散させるものが望ましい。このような溶媒
としては、N−メチルピロリドン、N、N−ジメチルア
セトアミド、N、N−ジメチルホルムアミド、ヘキサメ
チルホスホリックトリアミドなどが挙げられ、これらの
混合溶媒も使用できる。The solvent during the above reaction and casting is as follows:
The aromatic compound produced by dissolving the reaction reagent containing the above-mentioned P-phenylene diamine, pyromellitic dianhydride, aromatic diamine, and aromatic tetracarboxylic dianhydride and essentially not reacting with it. It is desirable that the polyamic acid be dissolved or stably dispersed. Examples of such a solvent include N-methylpyrrolidone, N,N-dimethylacetamide, N,N-dimethylformamide, hexamethylphosphoric triamide, and mixed solvents thereof can also be used.
かくして得た混合相溶したポリアミック酸膜を基板から
はがし、鉄枠に固定した後、イミド化させるために、化
学環化剤に浸漬する。ここで用いる環化剤としては、無
水酢酸、無水プロピオン酸などの脂肪族酸無水物が適し
ており、特に無水酢酸が好ましい。また、この化学環化
には、ピリジン、3−メチルピリジン、3,5−ルチジ
ン、キノリンなどの有機塩基を触媒として用いることが
でき、上記無水酢酸とピリジンを組み合わせて用いるこ
とが好適である。この化学環化時に他の有機溶剤を希釈
剤として用いてもよい。The thus obtained mixed and compatible polyamic acid film is peeled off from the substrate, fixed on an iron frame, and then immersed in a chemical cyclizing agent for imidization. As the cyclizing agent used here, aliphatic acid anhydrides such as acetic anhydride and propionic anhydride are suitable, and acetic anhydride is particularly preferred. Further, in this chemical cyclization, an organic base such as pyridine, 3-methylpyridine, 3,5-lutidine, or quinoline can be used as a catalyst, and it is preferable to use the above-mentioned acetic anhydride and pyridine in combination. Other organic solvents may be used as diluents during this chemical cyclization.
希釈剤としては、ジオキサン、テトラヒドロフラン、ベ
ンゼン、クロロホルム、四塩化炭素、アセトニトリル、
酢酸エチルなどがあげられる。化学環化の処理条件は温
度10〜50℃、処理時間は10分から24時間で、好
ましくは12時間以上である。Diluents include dioxane, tetrahydrofuran, benzene, chloroform, carbon tetrachloride, acetonitrile,
Examples include ethyl acetate. The chemical cyclization treatment conditions are a temperature of 10 to 50°C and a treatment time of 10 minutes to 24 hours, preferably 12 hours or more.
その後、50〜200℃で1時間以上真空乾燥させると
、本発明の芳香族ポリイミド樹脂が得られる。Thereafter, the aromatic polyimide resin of the present invention is obtained by vacuum drying at 50 to 200°C for 1 hour or more.
本発明において、重縮合反応後の芳香族ポリアミック酸
溶液をそのまま混合して用いて成膜を行ってもよいが、
−度重縮合反応液を大量のメタノールなどに注ぎ、ポリ
アミック酸を沈殿精製した後混合し、溶媒に再溶解させ
た溶液を用いることも可能である。混合ポリアミック酸
溶液は、スピナーもしくはコーターで基板上に流延し、
その後ポリマー濃度が40〜70%になるように、加熱
あるいは真空乾燥させて溶媒を濃縮することが望ましい
。ポリマー濃度が40%未満であると、環化剤に浸漬す
る際、白濁をおこす傾向があるためである。In the present invention, the aromatic polyamic acid solution after the polycondensation reaction may be mixed as it is to form a film.
It is also possible to use a solution in which the polycondensation reaction solution is poured into a large amount of methanol, etc., the polyamic acid is precipitated and purified, and then mixed and redissolved in the solvent. The mixed polyamic acid solution is cast onto the substrate using a spinner or coater,
After that, it is desirable to concentrate the solvent by heating or vacuum drying so that the polymer concentration becomes 40 to 70%. This is because if the polymer concentration is less than 40%, it tends to become cloudy when immersed in the cyclizing agent.
本発明における混合相溶した芳香族ポリアミック酸は、
」二記のような溶液を用い、キャスティング、濃縮、成
膜、次いで化学環化剤に浸漬することにより、高剛性か
つ強靭なフィルム、塗膜等が得られるが、通常のフィル
ム製造と同様に化学環化剤に浸漬する前に延伸処理を行
うことが可能である。また種々の充填剤1強化剤と併用
し、複合材料として用いる方法も可能である。The mixed and compatible aromatic polyamic acid in the present invention is
Highly rigid and tough films, coatings, etc. can be obtained by casting, concentrating, forming a film, and then immersing it in a chemical cyclizing agent using a solution such as that described in 2. It is possible to carry out a stretching treatment before immersion in the chemical cyclizing agent. It is also possible to use it in combination with various filler 1 reinforcing agents to form a composite material.
以下、実施例により本発明を説明する。 The present invention will be explained below with reference to Examples.
実施例1
p−フェニレンジアミン9.733g(0,09モル)
トN−メチルピロリドン500m(lを撹拌機、窒素
ガス導入管、温度計を備えた四ツ目フラスコに仕込み、
溶解後、水冷下にピロメリット酸ジ無水物19.631
g(0,09モル)を加え、 0〜10℃で1時間、つ
いで室温で4時間撹拌下に重縮合反応を行った。同様に
ジアミノジフェニルエーテル2.002g(0,01モ
ル)とピロメリット酸ジ無水物2.181g(0,01
モル)をN−メチルピロリドン50mfl中で重縮合反
応させた。Example 1 p-phenylenediamine 9.733g (0.09mol)
Pour 500 ml (l) of N-methylpyrrolidone into a four-eye flask equipped with a stirrer, nitrogen gas inlet tube, and thermometer.
After dissolving, add pyromellitic dianhydride 19.631 under water cooling.
g (0.09 mol) was added thereto, and the polycondensation reaction was carried out with stirring at 0 to 10°C for 1 hour and then at room temperature for 4 hours. Similarly, 2.002 g (0.01 mol) of diaminodiphenyl ether and 2.181 g (0.01 mol) of pyromellitic dianhydride
mol) was subjected to a polycondensation reaction in 50 mfl of N-methylpyrrolidone.
ついで上記2種類のアミック酸溶液を室温下で混合し、
約2時間撹拌して均一な混合ポリアミック酸溶液とした
。Then, the above two types of amic acid solutions were mixed at room temperature,
The mixture was stirred for about 2 hours to obtain a uniform mixed polyamic acid solution.
つぎに」二記混合溶液をガラス板に塗布し、80’Cで
2時間風乾した後、ガラス板から取りはずし、鉄枠に固
定した後、 ピリジン120m12、無水酢酸5゜mρ
、ベンゼン1.80m+Qの混合溶媒に、12時間以上
浸漬した。これを180℃で2時間真空乾燥し、ポリイ
ミドフィルムを得た。このフィルムは1.780cm”
−”付近にイミド基による赤外吸収があられれ、イミド
化が確認された。このフィルムのガラス転移温度は40
0℃以上(DSC法)であり、各種特性は表1に示すと
おりである。Next, the mixed solution mentioned above was applied to a glass plate, air-dried at 80'C for 2 hours, then removed from the glass plate and fixed on an iron frame.
, benzene 1.80m+Q for 12 hours or more. This was vacuum dried at 180° C. for 2 hours to obtain a polyimide film. This film is 1.780cm"
Infrared absorption due to imide groups was observed near "-", confirming imidization.The glass transition temperature of this film was 40
0° C. or higher (DSC method), and various characteristics are as shown in Table 1.
実施例2
実施例1に準じて、p−フェニレンジアミン5.407
g(0,05モル)とピロメリット酸ジ無水物10.9
06g(0,05モル)、 ジアミノジフェニルエーテ
ル]、0.012g(0,05モル)とピロメリット酸
ジ無水物1.0.906g(0,05モル)をそれぞれ
N−メチルピロリドン300mQ中で重縮合反応させ、
混合ポリアミック酸溶液を得た。Example 2 According to Example 1, p-phenylenediamine 5.407
g (0.05 mol) and pyromellitic dianhydride 10.9
0.06 g (0.05 mol), diaminodiphenyl ether], 0.012 g (0.05 mol) and 1.0.906 g (0.05 mol) of pyromellitic dianhydride were each polycondensed in 300 mQ of N-methylpyrrolidone. react,
A mixed polyamic acid solution was obtained.
上記で得られた混合ポリアミック酸溶液を実施例1に準
じて化学環化させ、ポリイミドフィルムを得た。このフ
ィルムの各種特性は表1に示すとおりである。The mixed polyamic acid solution obtained above was chemically cyclized according to Example 1 to obtain a polyimide film. Various properties of this film are shown in Table 1.
実施例3
実施例1に準じてp−フェニレンジアミン9.733g
(0,09モル)とピロメリット酸ジ無水物19.63
1g(0,09モル)、ジアミノジフェニルエーテル2
.002g(0,01モル)とベンゾフェノンテトラカ
ルボン酸ジ無水物(0,01モル)をそれぞれN−メチ
ルピロリドン300mQ中で重縮合反応させ、混合ポリ
アミック酸溶液を得た。Example 3 9.733 g of p-phenylenediamine according to Example 1
(0.09 mol) and pyromellitic dianhydride 19.63
1 g (0.09 mol), diaminodiphenyl ether 2
.. 002g (0.01 mol) and benzophenonetetracarboxylic dianhydride (0.01 mol) were each subjected to a polycondensation reaction in 300 mQ of N-methylpyrrolidone to obtain a mixed polyamic acid solution.
上記で得られた混合ポリアミック酸溶液を実施例1に準
じて化学環化させ、ポリイミドフィルムを得た。このフ
ィルムの各種特性は表1に示すとおりである。The mixed polyamic acid solution obtained above was chemically cyclized according to Example 1 to obtain a polyimide film. Various properties of this film are shown in Table 1.
比較例1
実施例1に準じて、p−フェニレンジアミン9.733
g(0,09モル)とピロメリット酸19.631g(
0,09モル)、ジアミノジフェニルエーテル2.00
2g(0,01モル)とピロメリット酸ジ無水物2.1
81g(0,01モル)をそれぞれN−メチルピロリド
ン中で重縮合反応させ、混合ポリアミック酸溶液を得た
。Comparative Example 1 According to Example 1, p-phenylenediamine 9.733
g (0.09 mol) and pyromellitic acid 19.631 g (
0.09 mol), diaminodiphenyl ether 2.00
2g (0.01 mol) and pyromellitic dianhydride 2.1
81 g (0.01 mol) of each were subjected to a polycondensation reaction in N-methylpyrrolidone to obtain a mixed polyamic acid solution.
上記で得られた混合ポリアミック酸溶液をガラス板上に
塗布し、80℃のオーブン中で2時間風乾した後、ガラ
ス板から取りはずし、鉄枠に固定した後、200℃で1
時間、300℃で1時間加熱硬化してポリイミドフィル
ムを得た。しかし得られたフィルムは非常に脆弱で各種
特性の測定が不可能であった。The mixed polyamic acid solution obtained above was applied onto a glass plate, air-dried in an oven at 80°C for 2 hours, removed from the glass plate, fixed on an iron frame, and then heated at 200°C for 1 hour.
The polyimide film was cured by heating at 300° C. for 1 hour. However, the resulting film was so fragile that it was impossible to measure its various properties.
Claims (1)
物を反応させて得られるポリアミック酸と、芳香族ジア
ミンと芳香族テトラカルボン酸ジ無水物を反応させて得
られるポリアミック酸を混合相溶させた後、化学環化剤
を用いてイミド化させることを特徴とする芳香族ポリイ
ミド樹脂の製造法。(1) Polyamic acid obtained by reacting p-phenylene diamine and pyromellitic dianhydride and polyamic acid obtained by reacting aromatic diamine and aromatic tetracarboxylic dianhydride were mixed and made compatible. A method for producing an aromatic polyimide resin, which is then imidized using a chemical cyclizing agent.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20437788A JPH0253829A (en) | 1988-08-17 | 1988-08-17 | Production of aromatic polymide resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20437788A JPH0253829A (en) | 1988-08-17 | 1988-08-17 | Production of aromatic polymide resin |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0253829A true JPH0253829A (en) | 1990-02-22 |
Family
ID=16489515
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20437788A Pending JPH0253829A (en) | 1988-08-17 | 1988-08-17 | Production of aromatic polymide resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0253829A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04299885A (en) * | 1990-12-17 | 1992-10-23 | E I Du Pont De Nemours & Co | Tetrapolyimide film that incorporates benzophenone tetracarboxylic acid two anhydride |
-
1988
- 1988-08-17 JP JP20437788A patent/JPH0253829A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04299885A (en) * | 1990-12-17 | 1992-10-23 | E I Du Pont De Nemours & Co | Tetrapolyimide film that incorporates benzophenone tetracarboxylic acid two anhydride |
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