JPH0238578A - Surface treatment of polyphenylene oxide/polyamide alloy resin molded product - Google Patents
Surface treatment of polyphenylene oxide/polyamide alloy resin molded productInfo
- Publication number
- JPH0238578A JPH0238578A JP18778888A JP18778888A JPH0238578A JP H0238578 A JPH0238578 A JP H0238578A JP 18778888 A JP18778888 A JP 18778888A JP 18778888 A JP18778888 A JP 18778888A JP H0238578 A JPH0238578 A JP H0238578A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- solution
- etching
- soln
- product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011347 resin Substances 0.000 title claims abstract description 47
- 229920005989 resin Polymers 0.000 title claims abstract description 47
- 239000004952 Polyamide Substances 0.000 title claims abstract description 13
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 13
- 239000000956 alloy Substances 0.000 title claims abstract description 13
- 229920002647 polyamide Polymers 0.000 title claims abstract description 13
- 238000004381 surface treatment Methods 0.000 title claims description 8
- 239000004721 Polyphenylene oxide Substances 0.000 title abstract description 3
- 229920006380 polyphenylene oxide Polymers 0.000 title abstract description 3
- 238000005530 etching Methods 0.000 claims abstract description 47
- 238000007772 electroless plating Methods 0.000 claims abstract description 17
- 239000002253 acid Substances 0.000 claims abstract description 13
- 229910052500 inorganic mineral Inorganic materials 0.000 claims abstract description 11
- 239000011707 mineral Substances 0.000 claims abstract description 11
- 229920001955 polyphenylene ether Polymers 0.000 claims abstract description 10
- 230000002378 acidificating effect Effects 0.000 claims abstract description 5
- 239000000243 solution Substances 0.000 claims description 72
- 238000000034 method Methods 0.000 claims description 30
- 239000007864 aqueous solution Substances 0.000 claims description 15
- 206010070834 Sensitisation Diseases 0.000 claims description 8
- 230000004913 activation Effects 0.000 claims description 8
- 230000008313 sensitization Effects 0.000 claims description 8
- 239000004094 surface-active agent Substances 0.000 claims description 4
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 claims description 3
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 claims description 3
- 229910017053 inorganic salt Inorganic materials 0.000 claims description 3
- 238000007747 plating Methods 0.000 abstract description 61
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 49
- 238000007654 immersion Methods 0.000 abstract description 9
- 150000003839 salts Chemical class 0.000 abstract description 6
- 239000003093 cationic surfactant Substances 0.000 abstract description 5
- 239000003945 anionic surfactant Substances 0.000 abstract description 4
- 239000002736 nonionic surfactant Substances 0.000 abstract description 4
- 125000002091 cationic group Chemical group 0.000 abstract description 3
- 238000007788 roughening Methods 0.000 abstract description 3
- 229910019142 PO4 Inorganic materials 0.000 abstract description 2
- 239000010452 phosphate Substances 0.000 abstract description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 abstract description 2
- 230000003213 activating effect Effects 0.000 abstract 1
- 125000000129 anionic group Chemical group 0.000 abstract 1
- 230000003197 catalytic effect Effects 0.000 abstract 1
- 239000002932 luster Substances 0.000 abstract 1
- 230000001235 sensitizing effect Effects 0.000 abstract 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 28
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 27
- 229910001868 water Inorganic materials 0.000 description 27
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 22
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 20
- 239000008399 tap water Substances 0.000 description 19
- 235000020679 tap water Nutrition 0.000 description 19
- 238000005406 washing Methods 0.000 description 19
- JTJMJGYZQZDUJJ-UHFFFAOYSA-N phencyclidine Chemical compound C1CCCCN1C1(C=2C=CC=CC=2)CCCCC1 JTJMJGYZQZDUJJ-UHFFFAOYSA-N 0.000 description 15
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 11
- 229910052759 nickel Inorganic materials 0.000 description 11
- 239000000203 mixture Substances 0.000 description 10
- 229910052763 palladium Inorganic materials 0.000 description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 238000009713 electroplating Methods 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 6
- 238000001994 activation Methods 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 239000011780 sodium chloride Substances 0.000 description 6
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 5
- 229910000365 copper sulfate Inorganic materials 0.000 description 5
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- -1 oxyethylenedodecylamine Chemical class 0.000 description 5
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 5
- 229910052938 sodium sulfate Inorganic materials 0.000 description 5
- 235000011152 sodium sulphate Nutrition 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 150000007524 organic acids Chemical class 0.000 description 4
- 235000019832 sodium triphosphate Nutrition 0.000 description 4
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 3
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 239000001119 stannous chloride Substances 0.000 description 3
- 235000011150 stannous chloride Nutrition 0.000 description 3
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- BTBJBAZGXNKLQC-UHFFFAOYSA-N ammonium lauryl sulfate Chemical compound [NH4+].CCCCCCCCCCCCOS([O-])(=O)=O BTBJBAZGXNKLQC-UHFFFAOYSA-N 0.000 description 2
- 229940063953 ammonium lauryl sulfate Drugs 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 238000007602 hot air drying Methods 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 2
- 229940048086 sodium pyrophosphate Drugs 0.000 description 2
- 235000011149 sulphuric acid Nutrition 0.000 description 2
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 2
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 2
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 1
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 229910000570 Cupronickel Inorganic materials 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- VBIIFPGSPJYLRR-UHFFFAOYSA-M Stearyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)C VBIIFPGSPJYLRR-UHFFFAOYSA-M 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- TVJORGWKNPGCDW-UHFFFAOYSA-N aminoboron Chemical compound N[B] TVJORGWKNPGCDW-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 1
- 229910010277 boron hydride Inorganic materials 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- KPVWDKBJLIDKEP-UHFFFAOYSA-L dihydroxy(dioxo)chromium;sulfuric acid Chemical class OS(O)(=O)=O.O[Cr](O)(=O)=O KPVWDKBJLIDKEP-UHFFFAOYSA-L 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- YPTUAQWMBNZZRN-UHFFFAOYSA-N dimethylaminoboron Chemical compound [B]N(C)C YPTUAQWMBNZZRN-UHFFFAOYSA-N 0.000 description 1
- 235000019329 dioctyl sodium sulphosuccinate Nutrition 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- YHAIUSTWZPMYGG-UHFFFAOYSA-L disodium;2,2-dioctyl-3-sulfobutanedioate Chemical compound [Na+].[Na+].CCCCCCCCC(C([O-])=O)(C(C([O-])=O)S(O)(=O)=O)CCCCCCCC YHAIUSTWZPMYGG-UHFFFAOYSA-L 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- UPHWVVKYDQHTCF-UHFFFAOYSA-N octadecylazanium;acetate Chemical compound CC(O)=O.CCCCCCCCCCCCCCCCCCN UPHWVVKYDQHTCF-UHFFFAOYSA-N 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はポリフェニレンエーテル/ポリアミドアロイ樹
脂(以下PPE−PA樹脂という)成形品の表面処理方
法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for surface treatment of polyphenylene ether/polyamide alloy resin (hereinafter referred to as PPE-PA resin) molded articles.
従来プラスチックスめっき製品の素材としては、ABS
樹脂が多く用いられている。しかしABS樹脂はその物
理的特性、特に耐熱性・耐衝撃性が劣っており、機械的
強度及び耐熱性を要求される製品には使用できない。一
方、PPE−PA耐樹脂、剛性・耐熱性・耐衝撃性など
物理的特性の優れた樹脂であり、各種の用途に用いられ
ているが、めっきなどの表面処理は困難で、良好なめっ
き品は得られていないのが現状である。Conventionally, ABS is the material for plastic plated products.
Resin is often used. However, ABS resin has poor physical properties, particularly heat resistance and impact resistance, and cannot be used in products that require mechanical strength and heat resistance. On the other hand, PPE-PA resin is a resin with excellent physical properties such as rigidity, heat resistance, and impact resistance, and is used for various purposes, but surface treatment such as plating is difficult, and good plated products cannot be obtained. The current situation is that it has not been obtained.
一般にプラスチックスにめっきする場合、無電解めっき
で樹脂表面に導電性を与える前に、表面粗化(エツチン
グ)、増感処理、活性化処理などの工程を必要とする。Generally, when plating plastics, processes such as surface roughening (etching), sensitization treatment, and activation treatment are required before imparting conductivity to the resin surface using electroless plating.
例えば、ABS樹脂の表面処理方法は、脱脂→エツチン
グ→増感処理→活性化処理→無電解めっき→電気めっき
の各工程からなる。エツチング液としてはクロム酸−硫
酸混液が使用されている。PPE−PA樹脂をこのクロ
ム酸−硫酸混液でエツチングすると、樹脂が溶解したり
、密着強度の乏しいめっき皮膜しか得られない。また、
PPE−PA樹脂をABS樹脂と同工程でめっきすると
、樹脂表面にクロムが残留し、無電解めっき時に無めっ
き現象(スキップ)が起こりやすい。For example, a surface treatment method for ABS resin includes the steps of degreasing, etching, sensitization, activation, electroless plating, and electroplating. A mixed solution of chromic acid and sulfuric acid is used as the etching solution. If PPE-PA resin is etched with this chromic acid-sulfuric acid mixture, the resin will dissolve or only a plating film with poor adhesion strength will be obtained. Also,
When PPE-PA resin is plated in the same process as ABS resin, chromium remains on the resin surface, which tends to cause a non-plating phenomenon (skip) during electroless plating.
したがって本発明の目的は、PPE−PA樹脂成形品に
密着性にすぐれ、かつ外観の優れためっきを施す方法を
提供することであり、特に、自動車部品等、機械的強度
や耐熱性が要求される、PPE−PA樹脂製部品のめっ
き処理方法を提供することである。Therefore, an object of the present invention is to provide a method for plating a PPE-PA resin molded product with excellent adhesion and an excellent appearance, especially for products such as automobile parts that require mechanical strength and heat resistance. An object of the present invention is to provide a method for plating PPE-PA resin parts.
本発明は、ポリフェニレンエーテル/ポリアミドアロイ
樹脂成形品にエツチング処理、増感・活性化処理、無電
解めっき処理及び必要により更に電気めっき処理をこの
順に施す成形品の表面処理方法において、前記エツチン
グ液として、クロム酸を含まない鉱酸の水溶液を使用す
ることを特徴とするポリフェニレンエーテル/ポリアミ
ドアロイ成形品の表面処理方法である。The present invention provides a method for surface treatment of polyphenylene ether/polyamide alloy resin molded articles in which etching treatment, sensitization/activation treatment, electroless plating treatment, and optionally further electroplating treatment are applied in this order to the polyphenylene ether/polyamide alloy resin molded article. , a method for surface treatment of polyphenylene ether/polyamide alloy molded articles, which is characterized by using an aqueous solution of a mineral acid that does not contain chromic acid.
本発明において、上記エツチング液はさらに、界面活性
剤および無機塩からなる群から選ばれる少なくとも1種
を含んでいてもよい。さらに、本発明の好ましい実施態
様によれば、成形品は、エツチング処理後かつ増感・活
性化処理前、酸性水溶液に浸漬される。In the present invention, the etching solution may further contain at least one selected from the group consisting of surfactants and inorganic salts. Furthermore, according to a preferred embodiment of the present invention, the molded article is immersed in an acidic aqueous solution after the etching treatment and before the sensitization/activation treatment.
本発明において、ポリフェニレンエーテル/ポリアミド
アロイ樹脂とは、特開昭60−58463、同6 k2
1146、同6]、−120855、同6l−296(
16L同62−81449、同62−127339、同
62−240354、同62−250050、同62−
257962、同62−270654、同62−273
256、同63−10655、特表昭59−50077
1および同61−502195等に記載されている、ポ
リフェニレンオキシド/ポリアミドアロイ樹脂(以下P
P○−PA樹脂という)等のポリフェニレンエーテル/
ポリアミドアロイ樹脂をいう。In the present invention, polyphenylene ether/polyamide alloy resin refers to JP-A-60-58463, JP-A-60-6K2.
1146, 6], -120855, 6l-296 (
16L 62-81449, 62-127339, 62-240354, 62-250050, 62-
257962, 62-270654, 62-273
256, 63-10655, special publication 59-50077
Polyphenylene oxide/polyamide alloy resin (hereinafter P
Polyphenylene ether such as P○-PA resin)
Refers to polyamide alloy resin.
以下本発明方法をその工程順に詳述する。The method of the present invention will be explained in detail below in the order of its steps.
本発明方法においては、まずPPE−PA樹脂成形品を
常法に従い洗浄後、エツチング処理を行なう。エツチン
グ工程に使用する鉱酸としては、塩酸、硫酸、硝酸など
の鉱酸が使用でき、特に塩酸が望ましく、10〜400
mβ/1の濃度の塩酸(36%HCjlりを含有するこ
とが好ましい。In the method of the present invention, first, a PPE-PA resin molded article is washed according to a conventional method and then subjected to an etching treatment. As the mineral acid used in the etching process, mineral acids such as hydrochloric acid, sulfuric acid, and nitric acid can be used, and hydrochloric acid is particularly preferable.
Hydrochloric acid at a concentration of mβ/1 (preferably containing 36% HCl).
これら鉱酸により樹脂表面が溶解し、樹脂とめっき皮膜
に密着を与える凹凸が樹脂表面に形成される。The resin surface is dissolved by these mineral acids, and irregularities are formed on the resin surface that provide close contact between the resin and the plating film.
本発明に使用されるエツチング液はカチオン、ノニオン
又はアニオン系の界面活性剤を含んでいることが好まし
い。カチオン系界面活性剤としては、オクタデシルトリ
メチルアンモニウムクロライド、テトラデンルジメチル
ベンジルアンモニウムクロライド、オキシエチレンドデ
シルアミン、オクタデシルアミン酢酸塩などがあげられ
る。ノニオン系界面活性剤としては、ポリオキシエチレ
ンノニルフェニルエーテノペポリオキシエチレンオレイ
ルエーテル、ポリオキシエチレンモノラウレート等があ
げられる。また、アニオン系界面活性剤としては、ラウ
リル硫酸アンモニウム、ドデシルベンゼンスルホン酸ナ
トリウム、ジオクチルスルホコハク酸ナトリウムなどが
あげられる。望ましくは、カチオン系とノニオン系の界
面活性剤を混合するのが良く、カチオン系0.01〜5
0g/I+ノニオン系0.01〜50 g/Rの濃度が
好ましい。これら界面活性剤を含有させることにより、
溶解した樹脂の再付着を防止し、めっき皮膜の密着・外
観をさらに向上させることができる。The etching solution used in the present invention preferably contains a cationic, nonionic or anionic surfactant. Examples of the cationic surfactant include octadecyltrimethylammonium chloride, tetradenyldimethylbenzylammonium chloride, oxyethylenedodecylamine, and octadecylamine acetate. Examples of nonionic surfactants include polyoxyethylene nonyl phenyl ether, polyoxyethylene oleyl ether, and polyoxyethylene monolaurate. Examples of anionic surfactants include ammonium lauryl sulfate, sodium dodecylbenzenesulfonate, and sodium dioctylsulfosuccinate. It is preferable to mix cationic and nonionic surfactants, with cationic surfactants ranging from 0.01 to 5
A concentration of 0 g/I+nonionic 0.01 to 50 g/R is preferred. By containing these surfactants,
It is possible to prevent the melted resin from re-adhering and further improve the adhesion and appearance of the plating film.
また、後工程での無電解めっきの触媒核となるパラジウ
ムの樹脂への吸着を促進し、無電解めっきの未着(スキ
ップ)を防止することができる。Furthermore, it is possible to promote the adsorption of palladium, which will serve as a catalyst nucleus for electroless plating in a subsequent process, onto the resin, thereby preventing non-adherence (skip) of electroless plating.
本発明に使用されるエツチング液はさらに、無機塩を含
有することが好ましい。無機塩としては縮合リン酸塩(
たとえばトリポリリン酸ナトリウム、ピロリン酸ナトリ
ウムなど)、硫酸ナトリウム、塩化ナトリウムなどがあ
げられる。好ましい濃度は、1〜100 g/Rである
。これら無機塩により界面活性剤の効果が更に促進され
る。Preferably, the etching solution used in the present invention further contains an inorganic salt. As an inorganic salt, condensed phosphate (
Examples include sodium tripolyphosphate, sodium pyrophosphate, etc.), sodium sulfate, and sodium chloride. Preferred concentrations are 1-100 g/R. These inorganic salts further promote the effect of the surfactant.
このエツチング液に素材を10〜60℃好ましくは20
〜40℃、1〜30分好ましくは5〜20分浸漬ずろこ
とにより、密着・外観の良好なめっき皮膜を与える表面
粗化が行なわれる。Add the material to this etching solution at 10 to 60℃, preferably at 20℃.
By dipping at ~40°C for 1 to 30 minutes, preferably 5 to 20 minutes, the surface is roughened to provide a plating film with good adhesion and good appearance.
表面粗化後、素材は鉱酸または有機酸或いは鉱酸・有機
酸の混液に浸漬することが好ましい。鉱酸としては塩酸
、硫酸、硝酸など、有機酸としては酢酸、ギ酸、乳酸な
どがあげられる。好ましくは塩酸溶液が良く、10〜1
50mβ/β (36% HC41! ) ’a度テ、
10〜40℃、1〜10分処理するのが望ましい。この
処理は、素材表面に溶解付着している樹脂の再同化を防
止し、めっき皮膜の密着・外観を更に向上させる。After surface roughening, the material is preferably immersed in mineral acid, organic acid, or a mixed solution of mineral acid and organic acid. Examples of mineral acids include hydrochloric acid, sulfuric acid, and nitric acid; examples of organic acids include acetic acid, formic acid, and lactic acid. Preferably, a hydrochloric acid solution is used, with a concentration of 10 to 1
50mβ/β (36% HC41!) 'a degree,
It is desirable to process at 10 to 40°C for 1 to 10 minutes. This treatment prevents the re-assimilation of the resin that has melted and adhered to the material surface, further improving the adhesion and appearance of the plating film.
水洗後、素材は増感・活性化処理を行なう。この工程は
無電解めっきの触媒核となるパラジウムを樹脂表面に吸
着させる処理であるが、その処理方法としては、通常A
BS樹脂などのプラスヂノクスめっきで使用されている
、キャタリスト→アクセレークー法及びセンシクイザー
→アクチベークー法、またはポリアミド樹脂・スルホー
ル基板等のめっきに使用されるパラジウム溶液浸漬→還
元溶液浸漬法のいずれも使用できる。ここで言うキャタ
リストとは、パラジウムとススのコロイドを塩酸または
塩化ナトリウム等の塩化物或いはそれらの混合水溶液に
希釈した溶液で、処理条件としては、塩化パラジウム3
0mg/β以上、塩化第スズ1ピ/f!、以上、塩酸3
0mβ/、&(36%HCj2)或いは、塩化ナトリウ
ム10g/β以上の濃度で、20℃以上、1分以上浸漬
するのが良い。水洗後、アクセレーター溶液に浸漬する
。After washing with water, the material undergoes sensitization and activation treatment. This process is a process in which palladium, which serves as the catalyst nucleus for electroless plating, is adsorbed onto the resin surface.
Any of the Catalyst → Accelerate method and Sensixizer → Activate method used in Plasdinox plating such as BS resin, or Palladium solution immersion → Reducing solution immersion method used in plating polyamide resin, through-hole substrates, etc. can be used. The catalyst referred to here is a solution prepared by diluting a colloid of palladium and soot with a chloride such as hydrochloric acid or sodium chloride, or a mixed aqueous solution thereof.The treatment conditions include palladium chloride 3
0 mg/β or more, stannous chloride 1 p/f! , above, hydrochloric acid 3
0 mβ/, &(36%HCj2) or immersion in sodium chloride at a concentration of 10 g/β or higher at 20° C. or higher for 1 minute or longer. After washing with water, immerse in accelerator solution.
アクセレーター溶液としては、塩酸、硫酸などの鉱酸水
溶液及びそれらの混合水溶液、または水酸化ナトリウム
、水酸化カリウムなどのアルカリ性水溶液及びそれらの
混合水溶液が使用できる。As the accelerator solution, a mineral acid aqueous solution such as hydrochloric acid or sulfuric acid, or a mixed aqueous solution thereof, or an alkaline aqueous solution such as sodium hydroxide or potassium hydroxide, or a mixed aqueous solution thereof can be used.
処理条件としては、塩酸溶液は30〜150mβ/β(
36%HCjl’)、20〜50℃、1〜10分て、硫
酸溶液は50〜150mR/R(98%H2S口、)、
30〜60℃、1〜10分浸漬するのが良い。また、酸
性水溶液のアクセレーターを用いた場合、アクモレ−ク
ー浸漬後水洗し、アルカリ性の水溶液に浸漬することに
より(ポスドアクセレーク−)、更に無電解めっきの樹
脂への付き回りが向上する。As for the treatment conditions, the hydrochloric acid solution is 30 to 150 mβ/β(
36% HCjl'), 20-50°C, 1-10 minutes, sulfuric acid solution 50-150 mR/R (98% H2S,),
It is best to soak at 30-60°C for 1-10 minutes. In addition, when an acidic aqueous solution accelerator is used, the adhesion of electroless plating to the resin can be further improved by immersing the product in an aqueous solution, rinsing it with water, and then immersing it in an alkaline aqueous solution (post-accelerator).
ポスドアクセレーク−溶液としては、水、酸化ナトリウ
ム、水酸化カリウムなどの水溶液が使用でき、処理条件
としては、5〜50g/f2.10〜40℃、0.5〜
5分浸漬するのが良い。アルカリ性水溶液のアクセレー
ターの使用条件は、水酸化ナトリウム又は水酸化カリウ
ムを5〜50g/f!、、10〜50℃、1〜10分処
理するのが好ましい。As the post-accelerate solution, an aqueous solution of water, sodium oxide, potassium hydroxide, etc. can be used, and the processing conditions are 5-50g/f2.10-40℃, 0.5-50g/f2.
It is best to soak for 5 minutes. The conditions for using an alkaline aqueous solution accelerator are 5 to 50 g/f of sodium hydroxide or potassium hydroxide! Preferably, the treatment is carried out at 10 to 50°C for 1 to 10 minutes.
センンタイザー→アクチベーターの処理条件としては、
センンタイザーは塩化第−スズ0.5〜50g/βを塩
酸(36%HC,i?)0.5〜100mβ/lで溶解
し、水で11に合わせた後、10〜40℃、0.5〜1
0分浸漬する。水洗後アクヂベークーに浸漬するが、ア
クセレーターとしては、塩化パラジウム005〜Ig/
βを塩酸0.05〜100m、Il’/β (36%H
CI)に溶解し、水て1βに合わせた後、10〜50℃
、0.5〜10分浸漬するのが好ましい。The processing conditions for Sentizer → Activator are as follows:
Sentizer is made by dissolving 0.5 to 50 g/β of stannous chloride in 0.5 to 100 mβ/l of hydrochloric acid (36% HC, i?), adjusting to 11 with water, and then heating at 10 to 40°C to 0.5 ~1
Soak for 0 minutes. After washing with water, it is immersed in Akujibake, but as an accelerator, palladium chloride 005 to Ig/
β with hydrochloric acid 0.05-100m, Il'/β (36%H
Dissolve in CI) and adjust to 1β with water, then heat at 10 to 50°C.
, it is preferable to soak for 0.5 to 10 minutes.
パラジウム溶液浸漬→還元溶液浸漬法に用いるパラジウ
ム溶液とは、無機或いは有機のパラジウム塩を塩酸、硝
酸などの鉱酸または酢酸、クエン酸などの有機酸に溶解
したもの、或いはパラジウムのキレート剤を含むアルカ
リ性溶液に溶解したものが使用できる。水洗後、還元溶
液に浸漬するが、還元溶液には次亜リン酸、アミノボラ
ン、水素化ホウ素、ヒドラジン、ホルマリンなどの還元
剤及びそれらの塩類の水溶液を使用することができる。The palladium solution used in the palladium solution immersion → reduction solution immersion method includes an inorganic or organic palladium salt dissolved in a mineral acid such as hydrochloric acid or nitric acid or an organic acid such as acetic acid or citric acid, or a palladium chelating agent. It can be used dissolved in an alkaline solution. After washing with water, it is immersed in a reducing solution, and an aqueous solution of a reducing agent such as hypophosphorous acid, aminoborane, boron hydride, hydrazine, formalin, or a salt thereof can be used as the reducing solution.
好ましい条件としては、塩化パラジウム005〜1g/
l、塩酸005〜200mβ/β、20〜40℃、1〜
10分浸漬し、水洗後次亜リン酸(50%溶液)5〜2
00+nn/β、20〜40℃、1〜10分浸漬するの
が良い。As preferable conditions, palladium chloride 005 to 1 g/
l, hydrochloric acid 005-200mβ/β, 20-40℃, 1-
After soaking for 10 minutes and washing with water, add hypophosphorous acid (50% solution) 5 to 2
00+nn/β, 20-40°C, immersion for 1-10 minutes is preferable.
前記増感・活性化後水洗を行い、樹脂表面に導電性を与
えるため、無電解めっきを行なう。無電解めっき液とし
ては、アルカリ性及び中性の銅めっき液、またはアルカ
リ性、中性、酸性のニッケルめっき液、或いは無電解銅
ニッケルめっき液等の現在使用されている全ての無電解
めっき液が使用できる。必要に応じ無電解めっき後電気
めっきを施す場合は、無電解めっき後或いは電気めっき
後に、熱乾燥を行なうのが、望ましい。この処理により
密着は更に良好となる。好ましい条件としては、50〜
150℃、0,5〜20時間乾燥するのが良い。After the sensitization and activation, washing with water is performed, and electroless plating is performed to impart conductivity to the resin surface. All electroless plating solutions currently used include alkaline and neutral copper plating solutions, alkaline, neutral, and acidic nickel plating solutions, and electroless copper-nickel plating solutions. can. When performing electroplating after electroless plating if necessary, it is desirable to perform heat drying after electroless plating or after electroplating. This treatment further improves adhesion. As a preferable condition, 50~
It is best to dry at 150°C for 0.5 to 20 hours.
めっき後常温で乾燥させた場合、密着力が上昇し一定す
るまでに、かなりの時間を必要とする(約2ケ月)。あ
る程度密着強度が高くなるまで(0,5kg/ cm)
は、わずかな衝撃によりめっき品にフクロやキズが発生
しやすく、取り扱いが難しくなるので、上記熱乾燥を行
なうことが好ましい。When dried at room temperature after plating, it takes a considerable amount of time (about 2 months) for the adhesion to increase and become constant. Until the adhesion strength reaches a certain level (0.5kg/cm)
It is preferable to carry out the above-mentioned heat drying because the slight impact easily causes flakes and scratches on the plated product, making it difficult to handle.
以下実施例により本発明を更に詳細に説明する。The present invention will be explained in more detail with reference to Examples below.
実施例I
PPE−PA樹脂〔レマロイ:三菱油化■製10100
X100X3平板(2dm’T、 P、 ) 〕を予め
エタノール液に常温で3分間浸漬後乾燥し、試験片とし
て利用した。Example I PPE-PA resin [Remalloy: 10100 manufactured by Mitsubishi Yuka ■
A 100X3 flat plate (2 dm'T, P, )] was immersed in an ethanol solution for 3 minutes at room temperature, dried, and used as a test piece.
上記試験片を以下のエツチング処理液を用い、30℃、
10分間エツチングした。The above test piece was etched at 30°C using the following etching solution.
Etched for 10 minutes.
塩酸(36%HCjり 260mj!/42
トリポリリン酸ナトリウム 5g/β塩化ナト
リウム 10g/β水道水
残り次いで、塩酸60mβ/1の溶液に
25℃、1分浸漬し、水洗後辺下の組成のパラジウム溶
液に30℃、3分浸ン貴した。Hydrochloric acid (36% HCj 260mj!/42
Sodium tripolyphosphate 5g/β Sodium chloride 10g/β tap water
The remaining sample was then immersed in a solution of 60 mβ/1 hydrochloric acid at 25°C for 1 minute, and after washing with water, it was immersed in a palladium solution having the composition below at 30°C for 3 minutes.
塩化パラジウム 0.2g/j2塩酸(
36%HCjり 60mR/R水道水
残り水洗後、以下の組成の還元溶
液に30℃、3分浸漬した。Palladium chloride 0.2g/j2hydrochloric acid (
36% HCjri 60mR/R tap water
After washing the remaining portion with water, it was immersed in a reducing solution having the following composition at 30° C. for 3 minutes.
ジメチルアミノボラン 1g/l水道水
残り次いで水洗後、以下の組成の
無電解ニッケルめっき液で、40℃、10分無電解ニッ
ケルめっきを行なった。Dimethylaminoborane 1g/l tap water
After washing with water, electroless nickel plating was performed at 40° C. for 10 minutes using an electroless nickel plating solution having the following composition.
硫酸ニッケル 2.0g/lクエン酸
アンモニウム ’20g/’It次亜リン酸ソ
ーダ 20g/l水道水
残りアンモニア水でpH9,5に調整
水洗後、硫酸50m1/11 (98%H2So4)溶
液で常温、30秒間活性化を行なった後、水洗を行い、
電気酸性光沢硫酸銅めっき液で、銅めっき20μmを施
し、次いで電気半光沢ニッケルめっき→電気光沢ニッケ
ルtつきの順に、ニッケルめっきをそれぞれ10μmず
つ施した。次いで電気クロムめっき液で、クロムめっき
を043μm施した。但し、各電気めっき間の処理方法
は常法に従って行なった。次いでめっきを施した試験片
を70℃、10時間熱風乾燥処理した。Nickel sulfate 2.0g/l Ammonium citrate '20g/'It Sodium hypophosphite 20g/l Tap water
Adjust the pH to 9.5 with the remaining ammonia water. After washing with water, activate with a 50ml sulfuric acid solution (98% H2So4) at room temperature for 30 seconds, and then wash with water.
Copper plating of 20 μm was applied using an electro-acidic bright copper sulfate plating solution, and then nickel plating was applied in the order of electro-semi-bright nickel plating → electro-bright nickel plating, each having a thickness of 10 μm. Next, chromium plating was applied to a thickness of 043 μm using an electrochromium plating solution. However, the treatment method between each electroplating was carried out according to a conventional method. Next, the plated test piece was dried with hot air at 70° C. for 10 hours.
このようにして得られためっき品は、ピット、スターダ
ストが無く、光沢良好で、外観の優れたものであった。The plated product thus obtained was free of pits and stardust, had good gloss, and had an excellent appearance.
また密着強度は2.2kg/cmであった。この密着強
度は、JIS H8630附属書6記載の密着性試験
方法に従い、測定した。Further, the adhesion strength was 2.2 kg/cm. This adhesion strength was measured according to the adhesion test method described in JIS H8630 Annex 6.
実施例2
PPE−PA樹脂(レマロイ;三菱油化側製2dm’T
: P、)を予めエタノール液に常温で3分間浸漬後
乾燥し、試験片として利用した。Example 2 PPE-PA resin (Remalloy; 2dm'T manufactured by Mitsubishi Yuka)
: P, ) was previously immersed in an ethanol solution at room temperature for 3 minutes, dried, and used as a test piece.
上記試験片を以下のエツチング処理液を用い、30℃、
10分間エツチングした。The above test piece was etched at 30°C using the following etching solution.
Etched for 10 minutes.
硫酸(98%H2SO4”) 180mn/j!
アニオン系界面活性剤 30g/l(ラウリル
硫酸アンモニウム)
トリポリリン酸ナトリウム 5 g/l硫酸ナ
トリウム 20g/R水道水
残り以下のめっき処理工程は実施例1
と同様に行なった。Sulfuric acid (98% H2SO4”) 180mn/j!
Anionic surfactant 30g/l (ammonium lauryl sulfate) Sodium tripolyphosphate 5 g/l Sodium sulfate 20g/R tap water
The remaining plating process is as in Example 1.
I did the same thing.
めっき後100℃、5時間熱風乾燥を行なった。After plating, hot air drying was performed at 100°C for 5 hours.
得られためっき品の密着強度は、1.8kg/cmであ
り、ピン)、スターダストが無く、光沢良好で外観に優
れていた。The resulting plated product had an adhesion strength of 1.8 kg/cm (pins), no stardust, good gloss, and excellent appearance.
実施例3
PPE−PA樹脂(レマロイ 三菱油化側型(2d、m
’T、 P、 )を予めエタノール液に常温で3分間
浸漬後乾燥し、試験片として利用した。Example 3 PPE-PA resin (Remalloy Mitsubishi Yuka side type (2d, m
'T, P, ) was previously immersed in an ethanol solution for 3 minutes at room temperature, dried, and used as a test piece.
上記試験片を以下のエツチング処理液を用い、40℃、
15分間エッチンクした。The above test piece was etched at 40°C using the following etching solution.
Etched for 15 minutes.
塩酸(36%HCA) 150mf2/A硫
酸ナトリウム 50g/β水道水
残り以下のめっき処理工程は実
施例1と同様に行なった。Hydrochloric acid (36%HCA) 150mf2/A Sodium sulfate 50g/β tap water
The remaining plating steps were performed in the same manner as in Example 1.
めっき後120℃、3時間熱風乾燥を行なっためっき品
の密着強度は、1.8kg/cmであり、ピット、スタ
ーダストが無く、光沢良好で外観の優れためっき品であ
った。After plating, the plated product was dried with hot air at 120° C. for 3 hours. The adhesion strength of the plated product was 1.8 kg/cm, and the plated product had no pits or stardust, had good gloss, and had an excellent appearance.
実施例4
PPE−PA樹脂(レマロイ:三菱油化■製2dm’T
、 P、 )を予めエタノール液に常温で3分間浸漬
後乾燥し、試験片として利用した。Example 4 PPE-PA resin (Remalloy: 2dm'T manufactured by Mitsubishi Yuka ■)
, P, ) was previously immersed in an ethanol solution at room temperature for 3 minutes, dried, and used as a test piece.
上記試験片を以下のエツチング処理液を用い、20℃、
20分間エッチンク゛した。The above test piece was etched at 20°C using the following etching solution.
Etching was performed for 20 minutes.
塩酸(36%HC,i!> 300mR/R
ピロリン酸ナトリウム 20g/j2トリポ
リリン酸ナトリウム 20g/β塩化ナトリウム
30g/β水道水
残り以下のめっき処理工程は実施例1と同様に
行なった。Hydrochloric acid (36%HC, i! > 300mR/R
Sodium pyrophosphate 20g/j2 Sodium tripolyphosphate 20g/β Sodium chloride 30g/β tap water
The remaining plating steps were performed in the same manner as in Example 1.
めっき後100℃、5時間熱風乾燥を行なっためっき品
の密着強度は、1.9kg/cmであり、ピント、スタ
ーダストが無く、光沢良好で外観の優れためっき品であ
った。After plating, the plated product was dried with hot air at 100° C. for 5 hours. The adhesion strength of the plated product was 1.9 kg/cm, and the plated product had no focus or stardust, had good gloss, and had an excellent appearance.
実施例5
PPE−PA崩脂(レマロイ・三菱油化■製2dm’T
、’ P、)を予めエタノール液に常温で3分間浸漬後
乾燥し、試験片として利用した。Example 5 PPE-PA fat loss (Remalloy/Mitsubishi Yuka ■ 2dm'T
, 'P,) was previously immersed in an ethanol solution for 3 minutes at room temperature, dried, and used as a test piece.
上記試験片を以下のエツチング処理液を用い、40℃、
5分間エツチングした。The above test piece was etched at 40°C using the following etching solution.
Etched for 5 minutes.
硫酸(98%H2SO4) 300mfl/ff
l以下のめっき処理工程は実施例1と同様に行なった。Sulfuric acid (98% H2SO4) 300mfl/ff
The following plating steps were performed in the same manner as in Example 1.
めっき後70℃、10時間熱風乾燥を行なっためっき品
の密着強度は、1.9kg/cmであり、ピント、スタ
ーダストが無く、光沢良好で外観の優れためっき品であ
った。After plating, the plated product was dried with hot air at 70° C. for 10 hours. The adhesion strength of the plated product was 1.9 kg/cm, and the plated product had no focus or stardust, had good gloss, and had an excellent appearance.
実施例6
PPE−PA樹脂(レマロイ°三菱油化■製2dm’T
、 P、 )を予めエタノール液に常温で3分間浸漬
後乾燥し、試験片として利用した。Example 6 PPE-PA resin (2dm'T made by Remalloy Mitsubishi Yuka)
, P, ) was previously immersed in an ethanol solution at room temperature for 3 minutes, dried, and used as a test piece.
上記試験片を以下のエツチング処理液を用い、30℃、
10分間エッチンクした。The above test piece was etched at 30°C using the following etching solution.
Etched for 10 minutes.
塩酸(36%HCβ) 400mj2/j!硫
酸ナトリウム
水道水
80g/jl!
残り
硫酸ナトリウム
水道水
80g/β
残り
以下のめっき処理工程は実施例1と同様に行なった。Hydrochloric acid (36% HCβ) 400mj2/j! Sodium sulfate tap water 80g/jl! Remaining sodium sulfate tap water 80g/β Remaining plating process was performed in the same manner as in Example 1.
めっき後100℃、5時間熱風乾燥を行なっためっき品
の密着強度は、1.9kg/cmであり、ピット、スタ
ーダストが無く、光沢良好で外観の優れためっき品であ
った。After plating, the plated product was dried with hot air at 100° C. for 5 hours. The adhesion strength of the plated product was 1.9 kg/cm, and the plated product had no pits or stardust, had good gloss, and had an excellent appearance.
実施例7
実施例1と同様の試験片及びエツチング処理液を用いて
、20℃、15分エツチング処理後、ギ酸(85%)2
0m7/βの溶液に、20℃、1分浸漬した。水洗後、
以下の組成のキャタリスト溶液に30℃、3分浸漬した
。Example 7 After etching at 20°C for 15 minutes using the same test piece and etching solution as in Example 1, formic acid (85%) 2
It was immersed in a solution of 0 m7/β at 20°C for 1 minute. After washing with water,
It was immersed in a catalyst solution having the following composition at 30°C for 3 minutes.
塩化パラジウム 0.1g/j2塩化第一
スズ ゛10g/β塩酸(36%HCβ)
100mA/A塩化ナトリウム
100g/β水道水 残り
水洗後、塩酸(36%HCI 1. OOmj!/j
!溶液に、30℃、3分浸漬のアクセレーター処理を行
なった。水洗後、水酸化ナトリウム10g/l、20℃
、2分間ポスドアクセレーク−処理を行なった後水洗し
、以下の組成の無電解銅めっき液で、25℃、10分無
電解めっきを行なった。Palladium chloride 0.1g/j2 stannous chloride ゛10g/β hydrochloric acid (36% HCβ)
100mA/A Sodium Chloride
100g/β tap water After washing with remaining water, add hydrochloric acid (36% HCI 1. OOmj!/j
! The solution was subjected to an accelerator treatment of immersion at 30° C. for 3 minutes. After washing with water, sodium hydroxide 10g/l, 20℃
After performing a post-acceleration treatment for 2 minutes, the specimen was washed with water, and electroless plating was performed at 25° C. for 10 minutes using an electroless copper plating solution having the following composition.
硫酸銅 15g/f!。 Copper sulfate 15g/f! .
ロッセル塩 30g/βパラホルムア
ルデヒド 20g/A水酸化ナトリウム −
1(Ig/j!水道水 残り
水洗後、硫酸(98%H2S○4)3.0m*/1の溶
液に、常温、30秒浸漬した後水洗した。電気酸性光沢
硫酸銅めっき以降の電気めっき処理条件は、実施例1と
同様に行なった。120℃、3時間熱風乾燥後、密着強
度を測定したところ、1.8kg/cmであった。ピッ
ト、スターダストがなく、光沢も良好で外観の優れため
っき品であった。Rossell salt 30g/β-paraformaldehyde 20g/A sodium hydroxide -
1 (Ig/j!Tap water After washing with remaining water, immerse in 3.0 m*/1 solution of sulfuric acid (98% H2S○4) for 30 seconds at room temperature and then washing with water.Electroplating after electroacidic bright copper sulfate plating The processing conditions were the same as in Example 1. After drying with hot air at 120°C for 3 hours, the adhesion strength was measured to be 1.8 kg/cm. There were no pits or stardust, and the gloss was good and the appearance was good. It was an excellent plated product.
実施例8
PPC)−PA樹脂[:/ !JルGTX : EPL
@製150X150X3mm平板(4,5drri’T
、 P、、 ) ]を予めエタノールに常温で3分間
浸漬乾燥後、試験片として使用した。Example 8 PPC)-PA resin [:/! J Le GTX: EPL
@150X150X3mm flat plate (4,5 drri'T
, P, , ) ] was previously immersed in ethanol at room temperature for 3 minutes to dry, and then used as a test piece.
上記試験片を実施例1と同じ方法でめっきし、次いでめ
っきを施した試験片を100℃、5時間熱風乾燥処理を
した。このようにして得られためっき品は、ピット、ス
ターダストが無く、光沢良好で、外観の優れたものであ
った。また密着強度は2.0kg/cmであった。The above test piece was plated in the same manner as in Example 1, and then the plated test piece was dried with hot air at 100° C. for 5 hours. The plated product thus obtained was free of pits and stardust, had good gloss, and had an excellent appearance. Further, the adhesion strength was 2.0 kg/cm.
実施例9
実施例8と同様の試験片を実施例2と同じ方法でめっき
した。めっき後70℃、10時間熱風乾燥処理を行なっ
ためっき品の密着強度は1.8kg/cmで、ピット、
スターダストが無く、光沢良好で外観の優れためっき品
であった。Example 9 A test piece similar to Example 8 was plated in the same manner as Example 2. After plating, the adhesion strength of the plated product was 1.8 kg/cm, which was dried with hot air at 70°C for 10 hours.
The plated product was free of stardust, had good gloss, and had an excellent appearance.
実施例10
実施例8と同様の試験片を実施例7と同じ方法で必つき
した。めっき後120℃、3時間熱風乾燥処理を行なっ
ためっき品の密着強度は1.8kg/cmで、ピント、
スターダストが無く、光沢良好で外観の優れためっき品
であった。Example 10 A test piece similar to that in Example 8 was prepared in the same manner as in Example 7. After plating, the adhesion strength of the plated product, which was dried with hot air at 120℃ for 3 hours, was 1.8 kg/cm.
The plated product was free of stardust, had good gloss, and had an excellent appearance.
実施例11
PPE−PA樹脂(レマロイ:三菱油化■製2dm’T
、P、)を予めエタノール液に常温で3分間浸漬後乾燥
し、試験片として利用した。Example 11 PPE-PA resin (Remalloy: 2dm'T manufactured by Mitsubishi Yuka ■)
, P,) was previously immersed in an ethanol solution for 3 minutes at room temperature, dried, and used as a test piece.
上記試験片を以下のエツチング処理液を用い、30℃、
10分間エツチングした。The above test piece was etched at 30°C using the following etching solution.
Etched for 10 minutes.
塩酸(36%HC,1り 26Qmjl!/j
2水道水 残り
以下のめっき処理工程は実施例1と同様に行なった。Hydrochloric acid (36% HC, 1 liter 26Qmjl!/j
2 Tap water The remaining plating treatment steps were performed in the same manner as in Example 1.
めっき後70℃、10時間熱風乾燥を行なっためっき品
の密着強度は、1.6kg/cmであり、ピット、スタ
ーダストが無く、光沢良好で外観の優れためっき品であ
った。After plating, the plated product was dried with hot air at 70° C. for 10 hours. The adhesion strength of the plated product was 1.6 kg/cm, and the plated product had no pits or stardust, had good gloss, and had an excellent appearance.
実施例12
PPC)−PA樹脂(/ リルGTX : EPL@J
製4.5dm’T、 P、 )を予めエタノール液に
常温で3分間浸漬後乾燥し、試験片として利用した。Example 12 PPC)-PA resin (/Lil GTX: EPL@J
4.5 dm'T, P, ) was previously immersed in an ethanol solution at room temperature for 3 minutes, then dried and used as a test piece.
上記試験片を以下のエツチング処理液を用い、30℃、
10分間エツチングした。The above test piece was etched at 30°C using the following etching solution.
Etched for 10 minutes.
塩N(36%HCI) 260mA/j!水道
水 残り
以下のめっき処理工程は実施例1と同様に行なった。Salt N (36% HCI) 260mA/j! Tap water The remaining plating steps were performed in the same manner as in Example 1.
めっき後70℃、10時間熱風乾燥を行なっためっき品
の密着強度は、1.2kg/cmであり、ピット、スタ
ーダストが無く、光沢良好で外観の優れためっき品であ
った。After plating, the plated product was dried with hot air at 70° C. for 10 hours. The adhesion strength of the plated product was 1.2 kg/cm, and the plated product had no pits or stardust, had good gloss, and had an excellent appearance.
比較例1
実施例]と同様の試験片を、以下の組成のエツチング処
理液で、68℃、10分エツチングした。Comparative Example 1 A test piece similar to Example] was etched at 68° C. for 10 minutes with an etching solution having the following composition.
このエツチング方法及び処理条件は、一般に行なわれて
いるABS樹脂のエツチング処理と同様である。The etching method and processing conditions are the same as those for commonly used ABS resin etching processing.
無水クロム酸 4DOg/12硫酸(9
8%) 400 g/β水道水
残り
水洗後、塩酸(36%H(1)50mβ/1の溶液に、
25℃、2分浸漬し、水洗機実施例1のパラジウム溶液
に同条件で浸漬した。以下の処理工程は実施例1と同様
に行なった。Chromic anhydride 4DOg/12 sulfuric acid (9
8%) 400 g/β tap water
After washing the remaining water, add to a solution of hydrochloric acid (36% H(1) 50 mβ/1,
It was immersed at 25° C. for 2 minutes, and then immersed in the palladium solution of Example 1 in a water washer under the same conditions. The following processing steps were performed in the same manner as in Example 1.
クロムめっき後、70℃、10時間熱風乾燥を行い、密
着強度を測定したところ、0.2〜0.4kg/ cm
程度の密着強度しか得られなかった。また、ピット、ス
ターダストが多く外観に乏しいめっき品であった。After chrome plating, hot air drying was performed at 70°C for 10 hours, and the adhesion strength was measured, and it was 0.2 to 0.4 kg/cm.
Only a moderate adhesion strength was obtained. In addition, the plated product had many pits and stardust and had a poor appearance.
比較例2 比較例1とエツチング処理までは同条件で行なった。Comparative example 2 The conditions up to the etching treatment were the same as in Comparative Example 1.
水洗後、塩酸(36%H(1り50mn/Aの溶液に、
25℃、2分浸漬し、水洗機実施例7と同条件下でキャ
クリスト処理を行ない、水洗後これも実施例7と同条件
下でアクセレークー処理を行なった。水洗した後、実施
例1と同条件で無電解ニッケルめっきを行なったが、1
υ分浸漬しても、樹脂にめっきが完全に付き回らなかっ
たため(50%析出)以下電気めっきは行なえなかった
。After washing with water, add hydrochloric acid (36% H) to a solution of 50 mn/A.
It was immersed at 25° C. for 2 minutes and subjected to a cacrystal treatment under the same conditions as in Example 7 in a water washer. After washing with water, it was also subjected to an accelerator treatment under the same conditions as in Example 7. After washing with water, electroless nickel plating was performed under the same conditions as in Example 1.
Even after immersion for υ minutes, the plating did not completely cover the resin (50% precipitation), so electroplating could not be performed.
このめっき処理方法は、通常のABS樹脂へのめっき工
程と同様である。This plating treatment method is the same as the usual plating process for ABS resin.
比較例3
実施例1と同様の試験片を用いて、以下の組成ノエンヂ
ング処理液で、68℃、10分エツチングした。このエ
ツチング処理方法及び条件はABS樹脂めっきのだとの
エツチング法と同様である。Comparative Example 3 Using the same test piece as in Example 1, etching was carried out at 68° C. for 10 minutes with an etching solution having the following composition. The etching method and conditions are the same as those for ABS resin plating.
硫酸(98%) 900 g/i’無
水クロム酸 15g/β水道水
残り
上記条件でエツチング゛したところ、樹脂表面が完全に
溶解し、以後の処理が不可能であった。Sulfuric acid (98%) 900 g/i' Chromic anhydride 15 g/β tap water
When the remaining resin was etched under the above conditions, the resin surface was completely dissolved and subsequent processing was impossible.
比較例4
実施例8と同様の試験片を比較例1と同じ方法でめっき
した。めっき後、70℃、10時間熱風乾燥を行い密着
強度を測定したところ、0.4〜0.6kg/cm程度
の密着強度しか得られず、ピット、スターダストが多く
、外観に乏しいめっき品であった。Comparative Example 4 A test piece similar to Example 8 was plated in the same manner as Comparative Example 1. After plating, the adhesion strength was measured by drying with hot air at 70°C for 10 hours, and the adhesion strength was only about 0.4 to 0.6 kg/cm, indicating that the plated product had many pits and stardust and had a poor appearance. Ta.
比較例5
実施例8と同じ試験片を比較例2と同じ方法でめっきし
たが、無電解ニッケルめっきに15分浸漬しても、樹脂
にめっきが完全に付き回らなかった。従って、電気めっ
きは行なえなかった。Comparative Example 5 The same test piece as in Example 8 was plated in the same manner as in Comparative Example 2, but the plating did not completely adhere to the resin even after being immersed in electroless nickel plating for 15 minutes. Therefore, electroplating could not be performed.
比較例6
実施例8と同様の試験片を比較例3と同じエツチング液
組成及び条件でエツチングしたところ、樹脂表面が完全
に溶解し、以後の処理が不可能であった。Comparative Example 6 When a test piece similar to Example 8 was etched using the same etching solution composition and conditions as Comparative Example 3, the resin surface was completely dissolved and subsequent processing was impossible.
各実施例及び比較例に使用した電気めっき液組成及び条
件は次のとおりである。The electroplating solution composition and conditions used in each example and comparative example are as follows.
○電気酸性光沢硫酸銅めっき液
・硫酸銅 225g/ffl・硫酸
(98%H2S○、) 56g/β・水道水
・温度
・電流密度
残り
25′c
2、5 A/ d m’
○電気半光沢ニッケル必っき液
・硫酸ニッケル 250g//2・塩化ニ
ッケル 40 g/A・硼酸
40g/β・水道水
・温度
・電流密度
○電気光沢ニッケルめっき液
・硫酸ニッケル
・塩化ニッケル
・硼酸
残り
52℃
3 A / d m’
250 g/ll
50g/β
40g/β
・水道水
・温度
・電流密度
○電気クロムめっき液
・無水クロム酸
・3価クロム
残り
55℃
3 A / d m’
250g/β
L2g/β
・硫酸(98%H2S 04 ) 2.5 g/
β・水道水 残り〔発明の効果
〕
本発明によれば、ポリフェニレンエーテル/ポリアミド
アロイ樹脂成形品に、ピット、スターダストがなく、光
沢が良好である外観を持ち、しかも良好な密着力を持っ
ためっき皮膜を形成することができる。○Electro-acidic bright copper sulfate plating solution・Copper sulfate 225g/ffl・Sulfuric acid (98% H2S○,) 56g/β・Tap water・Temperature・Current density remaining 25'c 2,5 A/d m' ○Electric semi-gloss Nickel plating solution, nickel sulfate 250g//2, nickel chloride 40g/A, boric acid
40g/β・Tap water・Temperature・Current density ○Electro-bright nickel plating solution・Nickel sulfate・Nickel chloride・Boric acid Remaining 52℃ 3 A/d m' 250 g/ll 50g/β ・Tap water・Temperature・Current density○Electrochromium plating solution・Chromic anhydride・Trivalent chromium remaining 55℃ 3 A/d m' 250g/β L2g/β・Sulfuric acid (98% H2S 04) 2.5 g/
β・Tap water Remaining [Effect of the invention] According to the present invention, a polyphenylene ether/polyamide alloy resin molded product is plated without pits or stardust, has a glossy appearance, and has good adhesion. A film can be formed.
Claims (3)
成形品にエッチング処理、増感・活性化処理、無電解め
っき処理をこの順に施す成形品の表面処理方法において
、 前記エッチング液として、クロム酸を含まない鉱酸の水
溶液を使用することを特徴とするポリフェニレンエーテ
ル/ポリアミドアロイ成形品の表面処理方法。(1) In a surface treatment method for a polyphenylene ether/polyamide alloy resin molded product, in which etching treatment, sensitization/activation treatment, and electroless plating treatment are performed in this order, the etching solution is a mineral acid that does not contain chromic acid. A method for surface treatment of polyphenylene ether/polyamide alloy molded products, characterized by using an aqueous solution of.
からなる群から選ばれる少なくとも1種を含んでいる請
求項1記載の方法。(2) The method according to claim 1, wherein the etching solution further contains at least one selected from the group consisting of a surfactant and an inorganic salt.
前、酸性水溶液に浸漬することを特徴とする請求項1記
載の方法。(3) The method according to claim 1, characterized in that the molded article is immersed in an acidic aqueous solution after the etching treatment and before the sensitization/activation treatment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18778888A JPH0238578A (en) | 1988-07-27 | 1988-07-27 | Surface treatment of polyphenylene oxide/polyamide alloy resin molded product |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18778888A JPH0238578A (en) | 1988-07-27 | 1988-07-27 | Surface treatment of polyphenylene oxide/polyamide alloy resin molded product |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0238578A true JPH0238578A (en) | 1990-02-07 |
Family
ID=16212236
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18778888A Pending JPH0238578A (en) | 1988-07-27 | 1988-07-27 | Surface treatment of polyphenylene oxide/polyamide alloy resin molded product |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0238578A (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0604131A2 (en) * | 1992-12-24 | 1994-06-29 | Ge Plastics Japan Limited | Coating method for molded resin |
US5430177A (en) * | 1991-12-23 | 1995-07-04 | Albemarle Corporation | Polyfunctional Michael addition products |
US5538661A (en) * | 1993-03-22 | 1996-07-23 | Albemarle Corporation | Ester lubricants |
US5569779A (en) * | 1991-12-23 | 1996-10-29 | Albemarle Corporation | Polyfunctional michael addition products |
US5683618A (en) * | 1991-12-23 | 1997-11-04 | Albemarle Corporation | Refrigeration compositions in which the lubricant comprises at least one ester, ketoester, or ester-nitrile oil |
JP2006299366A (en) * | 2005-04-22 | 2006-11-02 | Okuno Chem Ind Co Ltd | Plating method on resin formed body |
WO2008143190A1 (en) * | 2007-05-22 | 2008-11-27 | Okuno Chemical Industries Co., Ltd. | Pretreatment process for electroless plating of resin molded body, method for plating resin molded body, and pretreatment agent |
PL421938A1 (en) * | 2017-06-19 | 2019-01-02 | Galwan Spółka Z Ograniczoną Odpowiedzialnością | Method for preparation of a surface of elements produced from glass fibre reinforced polyamide for application of electrolytic coatings |
WO2021024599A1 (en) * | 2019-08-02 | 2021-02-11 | 上村工業株式会社 | Pretreatment method for electroless plating, and pretreatment solution for electroless plating |
-
1988
- 1988-07-27 JP JP18778888A patent/JPH0238578A/en active Pending
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5430177A (en) * | 1991-12-23 | 1995-07-04 | Albemarle Corporation | Polyfunctional Michael addition products |
US5569779A (en) * | 1991-12-23 | 1996-10-29 | Albemarle Corporation | Polyfunctional michael addition products |
US5683618A (en) * | 1991-12-23 | 1997-11-04 | Albemarle Corporation | Refrigeration compositions in which the lubricant comprises at least one ester, ketoester, or ester-nitrile oil |
EP0604131A2 (en) * | 1992-12-24 | 1994-06-29 | Ge Plastics Japan Limited | Coating method for molded resin |
EP0604131A3 (en) * | 1992-12-24 | 1995-12-13 | Ge Plastics Japan Ltd | Coating method for molded resin. |
US5538661A (en) * | 1993-03-22 | 1996-07-23 | Albemarle Corporation | Ester lubricants |
JP2006299366A (en) * | 2005-04-22 | 2006-11-02 | Okuno Chem Ind Co Ltd | Plating method on resin formed body |
WO2008143190A1 (en) * | 2007-05-22 | 2008-11-27 | Okuno Chemical Industries Co., Ltd. | Pretreatment process for electroless plating of resin molded body, method for plating resin molded body, and pretreatment agent |
JP5585980B2 (en) * | 2007-05-22 | 2014-09-10 | 奥野製薬工業株式会社 | Pretreatment method of electroless plating for resin molding, plating method for resin molding, and pretreatment agent |
PL421938A1 (en) * | 2017-06-19 | 2019-01-02 | Galwan Spółka Z Ograniczoną Odpowiedzialnością | Method for preparation of a surface of elements produced from glass fibre reinforced polyamide for application of electrolytic coatings |
WO2021024599A1 (en) * | 2019-08-02 | 2021-02-11 | 上村工業株式会社 | Pretreatment method for electroless plating, and pretreatment solution for electroless plating |
JP2021025077A (en) * | 2019-08-02 | 2021-02-22 | 上村工業株式会社 | Electroless plating pretreatment method and electroless plating pretreatment liquid |
CN114207185A (en) * | 2019-08-02 | 2022-03-18 | 上村工业株式会社 | Pretreatment method for electroless plating and pretreatment liquid for electroless plating |
US20220275516A1 (en) * | 2019-08-02 | 2022-09-01 | Tetsuji Ishida | Pretreatment Method for Electroless Plating, and Pretreatment Solution for Electroless Plating |
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