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JPH02298506A - Monomer for optical resin and optical resin consisting of same monomer - Google Patents

Monomer for optical resin and optical resin consisting of same monomer

Info

Publication number
JPH02298506A
JPH02298506A JP1042822A JP4282289A JPH02298506A JP H02298506 A JPH02298506 A JP H02298506A JP 1042822 A JP1042822 A JP 1042822A JP 4282289 A JP4282289 A JP 4282289A JP H02298506 A JPH02298506 A JP H02298506A
Authority
JP
Japan
Prior art keywords
formula
monomer
compound
resin
expressed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1042822A
Other languages
Japanese (ja)
Inventor
Yuichiro Iguchi
雄一朗 井口
Michio Kimura
木村 道男
Koichiro Oka
紘一郎 岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP1042822A priority Critical patent/JPH02298506A/en
Priority to CA002010364A priority patent/CA2010364C/en
Priority to AU49959/90A priority patent/AU629301B2/en
Priority to ES90301845T priority patent/ES2062331T3/en
Priority to KR1019900002102A priority patent/KR960015189B1/en
Priority to DK90301845.5T priority patent/DK0384725T3/en
Priority to AT90301845T priority patent/ATE99292T1/en
Priority to EP90301845A priority patent/EP0384725B1/en
Priority to DE69005477T priority patent/DE69005477T2/en
Publication of JPH02298506A publication Critical patent/JPH02298506A/en
Priority to US07/844,477 priority patent/US5247041A/en
Priority to US08/001,075 priority patent/US5294690A/en
Priority to US08/169,603 priority patent/US5399735A/en
Priority to US08/351,687 priority patent/US5502141A/en
Priority to US08/480,090 priority patent/US5612390A/en
Priority to KR1019960029899A priority patent/KR970005476B1/en
Pending legal-status Critical Current

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

PURPOSE:To obtain the title monomer expressed by a specific formula, having excellent transparency and light resistance and high refraction index and capable of providing an optical resin useful as lens for optical instrument, lens for glasses and prism and free from odor characteristic of sulfur in molding. CONSTITUTION:The aimed monomer expressed by the formula [R is H or methyl; n is 0 or 1; m is 1-3; X is group obtained by binding a residue expressed by the formula -CH2-, >CH-or >C< to a residue expressed by the formula -S- in the range of carbon numbers of 3-10 and sulfur numbers of 2-9 (provided that number of S is smaller than that of C]. Furthermore, the compound expressed by the formula is e.g. obtained by reacting a polyvalent mercaptan compound expressed by the formula S-X-(SH)m with a (meth)acrylic acid halide in the presence of an alkali such as a metal hydroxide or tert. amine.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、光学樹脂用単量体およびそれよりなる光学用
樹脂に関するものであり、さらに詳しくはチオールエス
テル基を有する光学樹脂用単量体およびそれよりなる光
学用樹脂、チオールウレタン基を有する光学樹脂用単量
体およびそれよりなる光学用樹脂に関する。
Detailed Description of the Invention [Industrial Field of Application] The present invention relates to a monomer for optical resins and optical resins made from the monomers, and more specifically to monomers for optical resins having a thiol ester group. The present invention also relates to optical resins made from the same, monomers for optical resins having a thiol urethane group, and optical resins made from the same.

[従来技術] レンズ、プリズム、オプティカルファイバーの様な光学
素子には、その軽量性及び生産性よりポリスチレン樹脂
やポリカーボネート樹脂等の汎用プラスチックが多く用
いられている。しかし、これらの汎用プラスチックは屈
折率が不十分であり、レンズの薄型化、光学機器の小型
化のためにより高い屈折率を有する樹脂の開発が望まれ
ており、これまでに、芳香環が硫黄原子と直接結合した
芳香族チオールエステルを主成分とする光学素子(特開
昭60−26009号公報)や脂肪族チオールエステル
(特開昭63−162671号公報や特開昭63−18
8660号公報)やチオールウレタン樹脂(特開昭62
−267316号公報)が提案されている。
[Prior Art] General-purpose plastics such as polystyrene resin and polycarbonate resin are often used for optical elements such as lenses, prisms, and optical fibers because of their light weight and productivity. However, these general-purpose plastics have insufficient refractive index, and there is a desire to develop resins with higher refractive index to make lenses thinner and optical equipment more compact. Optical elements whose main components are aromatic thiol esters directly bonded to atoms (Japanese Patent Laid-Open No. 60-26009) and aliphatic thiol esters (Japanese Patent Laid-Open Nos. 63-162671 and 63-18)
No. 8660) and thiol urethane resin (Japanese Unexamined Patent Publication No. 62
-267316) has been proposed.

[本発明が解決しようとする課題] かかる特開昭60−26009号公報の樹脂は、屈折率
が高いが、熱可塑性であるため、研磨時の加熱で歪が生
じるため、メガネ等の用途には不向きであり、構造内に
含まれる芳香環が硫黄原子と直接結合する構造を有して
いるため、耐光性が低く、太陽光の照射や加熱によって
、変色したり脆くなるという欠点があった。また、切削
・研磨等の加熱を伴う加工時に強い臭気を発生するとい
う欠点があった。
[Problems to be Solved by the Present Invention] The resin disclosed in JP-A-60-26009 has a high refractive index, but since it is thermoplastic, distortion occurs when heated during polishing, so it is not suitable for applications such as glasses. It is unsuitable for use because the aromatic ring in its structure is directly bonded to the sulfur atom, so it has low light resistance and has the disadvantage of discoloration and becoming brittle when exposed to sunlight or heating. . Another drawback is that a strong odor is generated during processing that involves heating, such as cutting and polishing.

また、特開昭63−162671号公報や特開昭63−
188660号公報で提案されている脂肪族チオールエ
ステルより得られる樹脂は、耐光性は高いものの、原子
屈折が高い硫黄原子の含有率が低いため、十分な高屈折
率は得られていない。
Also, JP-A-63-162671 and JP-A-63-162671
Although the resin obtained from the aliphatic thiol ester proposed in Publication No. 188660 has high light resistance, it does not have a sufficiently high refractive index because the content of sulfur atoms, which have high atomic refraction, is low.

また、特開昭63−162671号公報のチオールエス
テルよりなる樹脂は研磨時に激しいメルカプタン臭を伴
うという欠点があった。
Furthermore, the resin made of thiol ester disclosed in JP-A No. 63-162671 has the disadvantage that it is accompanied by a strong mercaptan odor during polishing.

また、特開昭62−267316号公報に提案されてい
るチオールウレタン樹脂も、原子屈折が高い硫黄原子の
含有率が低いため、高屈折率の樹脂を得るためには芳香
環を導入する必要があった。しかしながら、このような
芳香族系チオールウレタン樹脂は、光照射によって黄変
するという光学樹脂としては致命的な欠点を有している
。 本発明は、かかる従来技術の欠点を解消しようとす
るものであり、高い屈折率及び耐光性を有し、さらに加
工時の臭気のない光学樹脂用単量体およびそれよりなる
光学用樹脂を提供することを目的とする[課題を解決す
るための手段] 上記目的を達成するために本発明は以下の構成よりなる
Furthermore, the thiol urethane resin proposed in JP-A No. 62-267316 also has a low content of sulfur atoms with high atomic refraction, so it is necessary to introduce an aromatic ring in order to obtain a resin with a high refractive index. there were. However, such aromatic thiol urethane resins have a fatal drawback as optical resins in that they yellow when irradiated with light. The present invention aims to eliminate the drawbacks of the prior art, and provides a monomer for optical resins that has a high refractive index and light resistance and has no odor during processing, and an optical resin made from the same. [Means for Solving the Problem] In order to achieve the above object, the present invention has the following configuration.

「(1)下記一般式(A)で示されることを特徴とする
光学樹脂用単量体。
(1) A monomer for optical resins, characterized by being represented by the following general formula (A).

(式中、Rは水素またはメチル基、nはOまたは1の整
数、mは1〜3の整数、Xは−CH2−残基、−CH−
残基、−C−残基から選ばれる少なくとも1一種類の残
基と、−8−残基とが、炭素数が3〜10、イオウ数が
2〜9(ただし、イオウ数は炭素数より少ない)となる
範囲で結合してなる基を示す。) (2)上記(1)項記載の単量体を主成分としてなる重
合体からなることを特徴とする光学用樹脂。」本発明の
一般式(A)に示した化合物は、下記一般式(B)に示
した多価メルカプタン化合物と(メタ)アクリル酸ハラ
イドとを、金属水酸化物や三級アミン等のアルカリの存
在下で反応させるか、もしくは、下記一般式(B)に示
した多価メルカプタン化合物と(メタ)アクリロイルイ
ソシアネートとを反応させることによって合成できる。
(In the formula, R is hydrogen or a methyl group, n is O or an integer of 1, m is an integer of 1 to 3, X is -CH2- residue, -CH-
At least one type of residue selected from residues, -C- residues, and -8-residues, the number of carbon atoms is 3 to 10, and the number of sulfur is 2 to 9 (however, the number of sulfur is smaller than the number of carbon atoms. Indicates a group formed by bonding within a range such that ) (2) An optical resin comprising a polymer containing the monomer described in item (1) above as a main component. '' The compound represented by the general formula (A) of the present invention is obtained by combining the polyvalent mercaptan compound represented by the following general formula (B) and (meth)acrylic acid halide with an alkali such as a metal hydroxide or a tertiary amine. It can be synthesized by reacting in the presence of the compound, or by reacting a polyvalent mercaptan compound represented by the following general formula (B) with (meth)acryloyl isocyanate.

H3−X−(SH)m       (B)(式中、R
は水素またはメチル基、nはOまたは1の整数、mは1
〜3の整数、Xは−CH2−残基、−CH−残基、−C
−残基から選ばれる少なくとも1種類の残基と、−S−
残基とが、炭素数が3〜10、イオウ数が2〜9(ただ
し、イオウ数は炭素数より少ない)となる範囲で結合し
てなる基は、X中に、2つ以上台まれず、さらに、−8
−残基が、2つ以上続けて結合した残基、例えば、−8
−8−などもX中には含まれない。)前記一般式(B)
に示した多価メルカプタン化合物とは、1分子中に一3
H基を2〜4個有する含硫黄脂肪族化合物であり、例え
ば、下記式(C)〜(G)に示される化合物である。
H3-X-(SH)m (B) (wherein R
is hydrogen or methyl group, n is O or an integer of 1, m is 1
An integer of ~3, X is -CH2- residue, -CH- residue, -C
- at least one type of residue selected from residues, and -S-
A group formed by bonding with a residue in such a range that the number of carbon atoms is 3 to 10 and the number of sulfur is 2 to 9 (however, the number of sulfur is less than the number of carbon atoms) is not present two or more times in X. , furthermore, -8
- residues in which two or more residues are bonded in succession, e.g. -8
-8- etc. are also not included in X. ) Said general formula (B)
The polyvalent mercaptan compound shown in
It is a sulfur-containing aliphatic compound having 2 to 4 H groups, and is, for example, a compound represented by the following formulas (C) to (G).

H3−R,−8−R2−3−R3−3H(C)H8−R
4−8−R5−8−R6−3−R7−8)I    (
D)H3−Rs −3−R9−3−RID−8−R11
−3−R12−3H(E)S−R,−8H 1(S−R,3−3−CI(−8−R□、−8)l  
       (F )H8−R□6−3      
S−R,□−8H/ \              
 (G)H8R18−35−Rl9−3H (前記式(C)〜(G)中、R1−R1,は−CH2−
または−C82CR2−を示す。) 本発明の光学樹脂用単量体に、過酸化物系あるいはアゾ
系の開始剤を単量体100重量部に対して0.01〜5
重量部加えた後、加熱あるいは光照射することによって
重合することにより、透明性に優れた樹脂を製造するこ
とができる。この時、単量体として本発明の前記一般式
(A)で示される単量体に、これ以外の単量体を加えて
共重合させることができる。
H3-R, -8-R2-3-R3-3H(C)H8-R
4-8-R5-8-R6-3-R7-8) I (
D) H3-Rs-3-R9-3-RID-8-R11
-3-R12-3H(E)S-R,-8H 1(S-R,3-3-CI(-8-R□,-8)l
(F)H8-R□6-3
S-R, □-8H/ \
(G) H8R18-35-Rl9-3H (In the above formulas (C) to (G), R1-R1, is -CH2-
or -C82CR2-. ) A peroxide-based or azo-based initiator is added to the optical resin monomer of the present invention in an amount of 0.01 to 5 parts by weight per 100 parts by weight of the monomer.
After adding part by weight, the resin is polymerized by heating or irradiation with light, thereby producing a resin with excellent transparency. At this time, other monomers can be added to the monomer represented by the general formula (A) of the present invention and copolymerized.

この場合、得られる樹脂の特性上、本発明の単量体を2
0%以上加えることが好ましい。
In this case, due to the characteristics of the resulting resin, the monomer of the present invention may be
It is preferable to add 0% or more.

加える単量体としては、オレフィン系化合物であれば特
に限定はせず、好ましくは(メタ)アクリル系化合物や
スチレン系化合物、アリル系化合物、アクリロニトリル
、N−フェニルマレイミド等があげられる。具体的には
、メチル(メタ)アクリレート、エチル(メタ)アクリ
レート、プロピル(メタ)アクリレート、ベンジル(メ
タ)アクリレート、フェニル(メタ)アクリレート、ベ
ンジル(メタ)アクリレート、シクロヘキシル(メタ)
アクリレート、シクロへキシルメチレン(メタ)アクリ
レート、スチレン、ビニルナフタレン、ハロゲン置換ス
チレン、α−メチルスチレン、ジビニルベンゼン、ジア
リルフタレート、エチレングリコールジ(メタ)アクリ
レート、ジエチレングリコールビスアリルカーボネート
、ペンタエリスリトールテトラキス(メタ)アクリレー
トなどである。
The monomer to be added is not particularly limited as long as it is an olefinic compound, and preferred examples include (meth)acrylic compounds, styrene compounds, allyl compounds, acrylonitrile, and N-phenylmaleimide. Specifically, methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, benzyl (meth)acrylate, phenyl (meth)acrylate, benzyl (meth)acrylate, and cyclohexyl (meth)acrylate.
Acrylate, cyclohexylmethylene (meth)acrylate, styrene, vinylnaphthalene, halogen-substituted styrene, α-methylstyrene, divinylbenzene, diallyl phthalate, ethylene glycol di(meth)acrylate, diethylene glycol bisallyl carbonate, pentaerythritol tetrakis (meth) Such as acrylate.

また、共重合成分として、前述のオレフィン系化合物以
外に多官能チオール化合物を加えることによって、研磨
等の加工性に優れた樹脂を得ることができる。
Moreover, by adding a polyfunctional thiol compound in addition to the above-mentioned olefin compounds as a copolymerization component, a resin having excellent processability such as polishing can be obtained.

多官能チオール化合物としては、前記式(C)〜(G)
で示される化合物やペンタエリスリトールテトラキスチ
オグリコレート、トリスメルカプトプロピルイソシアヌ
レート等がある。
As the polyfunctional thiol compound, the above formulas (C) to (G) are used.
Examples include compounds represented by , pentaerythritol tetrakisthioglycolate, trismercaptopropyl isocyanurate, and the like.

また、本発明の光学樹脂用単量体においては、イオウ含
有率が35wt%以上であるものが、屈折率の点で、特
に好ましい。
Further, in the optical resin monomer of the present invention, one having a sulfur content of 35 wt% or more is particularly preferable from the viewpoint of refractive index.

本発明の樹脂は、注型重合法によって成形できる。この
場合の成形方法の好ましい一例としては、本発明の単量
体あるいは前述の共重合成分のうち少なくとも1成分と
本発明の単量体を混合した液体を重合開始剤とともに、
ガラスあるいは金属製のモールドと粘着テープあるいは
塩ビ製のガスケットよりなる型に注入し、30〜150
℃で0゜1〜40時間加熱、あるいは、紫外線を照射す
ることによって成形できる。
The resin of the present invention can be molded by a cast polymerization method. A preferred example of the molding method in this case is to use a liquid mixture of the monomer of the present invention or at least one component of the above-mentioned copolymer components and the monomer of the present invention together with a polymerization initiator.
Pour into a mold made of glass or metal mold and adhesive tape or PVC gasket,
It can be molded by heating at 0°C for 1 to 40 hours or by irradiating it with ultraviolet light.

本発明の光学樹脂用単量体を用いて透明性に優れた樹脂
を製造することができ、得られた樹脂は硫黄含有樹脂で
あるにも関わらず、加工時に臭気はしなかった。
Using the optical resin monomer of the present invention, a resin with excellent transparency could be produced, and although the obtained resin was a sulfur-containing resin, it did not emit any odor during processing.

本発明の光学樹脂用単量体あるいは光学用樹脂に紫外線
吸収剤や酸化防止剤を加えてもよい。
An ultraviolet absorber or an antioxidant may be added to the optical resin monomer or optical resin of the present invention.

[実施例] 以下実施例により、本発明を具体的に説明する。[Example] The present invention will be specifically described below with reference to Examples.

 9 一 実施例1〜4及び比較例に示した樹脂の性質を表1に示
した。
9 Properties of the resins shown in Examples 1 to 4 and Comparative Examples are shown in Table 1.

屈折率及びアツベ数は、プルフリッヒ屈折計を用いて測
定した。透過率及び耐光性はカラーコンピューターとフ
ェードメーターを用いて測定した。
The refractive index and Atsube number were measured using a Pulfrich refractometer. Transmittance and light resistance were measured using a color computer and a fade meter.

耐光性については、フェードメーター100時間後のΔ
YI値が、0〜5を○、5〜10を△、10以上を×と
した。゛ 耐衝撃性はFDA規格に基づき、厚さ1.3mmの硬化
物の平板に高さ127cmより直径15゜9mm重さ1
6.2gの鋼球を落下し、破損しなかったものを○それ
以外のものを×とした。
Regarding light resistance, Δ after 100 hours on a fade meter
YI values of 0 to 5 were rated as ◯, 5 to 10 as △, and 10 or more as ×.゛Impact resistance is based on FDA standards.
A 6.2 g steel ball was dropped, and those that did not break were marked as ○.Others were marked as ×.

耐熱性については、100°CでのシヨアD硬度がO〜
30を×、30〜50を△、50〜100を○とした。
Regarding heat resistance, shore D hardness at 100°C is O~
30 was marked as x, 30 to 50 was marked as Δ, and 50 to 100 was marked as ○.

研磨性は眼鏡レンズ用研磨機を用いて研磨し、研磨面が
良好なものを○、それ以外のものを×とした。
The polishability was determined by polishing using an eyeglass lens polishing machine, and those with a good polished surface were rated as ○, and the others were rated as ×.

実施例1 1000ccの三ツロフラスコに下記式(H)= 10
− に示した化合物100 g、テトラヒドロフラン300
g1ナトリウムボロヒドライド1g1ヒドロキノンモノ
メチルエーテル100mgを仕込み、0℃、窒素下でか
くはんしながら、メタクリル酸クロライド75gをゆっ
くり連子後、トリエチルアミン90gを滴下し、0°C
で2時間かくはんした。その後、ろ過、溶媒の留去を行
い、下記式(1)の化合物を得た。この化合物99重量
部にベンゾイルパーオキサイドを1重量部加えた溶液を
ガラスモールドと粘着テープよりなるモールド型に注入
し、50℃から120°Cまで15時間かけて昇温し樹
脂を得た。
Example 1 The following formula (H) = 10 was added to a 1000cc Mitsuro flask.
- 100 g of the compound shown in, 300 g of tetrahydrofuran
1 g1 Sodium borohydride 1 g1 100 mg hydroquinone monomethyl ether was charged, and 75 g of methacrylic acid chloride was slowly added to the mixture at 0°C while stirring under nitrogen, and 90 g of triethylamine was added dropwise to the mixture at 0°C.
I stirred it for 2 hours. Thereafter, filtration and distillation of the solvent were performed to obtain a compound of the following formula (1). A solution prepared by adding 1 part by weight of benzoyl peroxide to 99 parts by weight of this compound was poured into a mold made of a glass mold and adhesive tape, and the temperature was raised from 50°C to 120°C over 15 hours to obtain a resin.

H8CH2−3CH,CH2−−8CH,SH(H)C
)(3CH3 C)12=C−C−3−C)l yscH丁C)IrS
C1I TS−C−C=C)12]111 0             0   (I)実施例2 メタクリル酸クロライドをアクリル酸クロライドに代え
た以外は、実施例1と同様にして、下記式(J)に示す
化合物を製造・重合した。
H8CH2-3CH, CH2--8CH, SH(H)C
)(3CH3C)12=C-C-3-C)lyscHdingC)IrS
C1I TS-C-C=C)12]111 0 0 (I) Example 2 A compound represented by the following formula (J) was prepared in the same manner as in Example 1 except that methacrylic acid chloride was replaced with acrylic acid chloride. Manufactured and polymerized.

CH2・CH−CS  CH25CHTCH2SCH2
5−C−C1(−CI(□II           
       IIo               
   0   (J)実施例3 実施例1で得た式(1)の化合物70重量部とジビニル
ベンゼン30重量部を混合し、実施例1−と同様にして
重合を行い樹脂を得た。
CH2・CH-CS CH25CHTCH2SCH2
5-C-C1(-CI(□II
IIo
0 (J) Example 3 70 parts by weight of the compound of formula (1) obtained in Example 1 and 30 parts by weight of divinylbenzene were mixed and polymerized in the same manner as in Example 1- to obtain a resin.

実施例4 化合物(H)を化合物(K)に代えた以外は、実施例1
と同様にして、下記式(I、)に示す化合物を製造・重
合した。
Example 4 Example 1 except that compound (H) was replaced with compound (K)
In the same manner as above, a compound represented by the following formula (I) was produced and polymerized.

1(SCH「5CIIrCH2−8CII、CH,V−
3CII、SH(K)CH3 CH2=C−C−8−CH2−5CH2−CH「SCH
,CH2−5CH2CI(3 ■ −5−C−C=CH2 ]) 0               (L)実施例5 化合物(H)を化合物(M)に代えた以外は、実施例1
と同様にして、下記式(N)に示す化合物を製造・重合
した。
1 (SCH "5CIIrCH2-8CII, CH, V-
3CII, SH(K)CH3 CH2=C-C-8-CH2-5CH2-CH "SCH
, CH2-5CH2CI(3 ■ -5-C-C=CH2 ]) 0 (L) Example 5 Example 1 except that compound (H) was replaced with compound (M)
In the same manner as above, a compound represented by the following formula (N) was produced and polymerized.

n5cH,、−C)+2−8C)I「SCH,CH2−
3H(M)CH3 CH2=C−C−8−C1h CH25CI(28CH
2C1(23C−1]1] CH3 −C=CH2(N) 実施例6 化合物(H)を化合物(0)に代えた以外は、実施例1
と同様にして、下記式(P)に示す化合物を製造・重合
した。
n5cH,, -C)+2-8C)I"SCH,CH2-
3H(M)CH3 CH2=C-C-8-C1h CH25CI(28CH
2C1(23C-1]1] CH3 -C=CH2(N) Example 6 Example 1 except that compound (H) was replaced with compound (0)
A compound represented by the following formula (P) was produced and polymerized in the same manner as above.

5−CHrCHr−3H )1s−C)l、CH2−3−C)l−3−CI(rc
H,S)l     (0)CH3 (C112・C−C−3−CHyC)I2−3) 3−
CH(P)実施例7 化合物(H)を化合物(Q)に代えた以外は、実施例1
と同様にして、下記式(S)に示す化合物を製造し、こ
の化合物50重量部にペンタエリストールテトラキスチ
オグリコレート20重量部エチレングリコールジメタク
リレート30重量部を加えて、実施例1と同様に重合を
行った。
5-CHrCHr-3H)1s-C)l, CH2-3-C)l-3-CI(rc
H,S)l (0)CH3 (C112・C-C-3-CHyC)I2-3) 3-
CH(P) Example 7 Example 1 except that compound (H) was replaced with compound (Q)
In the same manner as in Example 1, a compound represented by the following formula (S) was produced, and 20 parts by weight of pentaerythol tetrakisthioglycolate and 30 parts by weight of ethylene glycol dimethacrylate were added to 50 parts by weight of this compound. Polymerization was performed.

H8CHrC1(、−8S−CH2−CHrSH/ \
         (Q) 1(SCH2CH2S    S−CH2−CL 5H
CI(3 (CH2・C−C−8−08丁CH2−8)4−C(S
)実施例8 1000ccの三ツロフラスコに前記式(H)の化合物
50g1テトラヒドロフラン300 gsナナトリウム
ロヒドライド1g1ヒドロキノンモノメチルエーテル1
00mgを仕込み、0℃、窒素下でかくはんしながら、
メタクリロイルイソシアネート70gをゆっくり連子後
、OoCで2時間かくはんした。その後、ろ過、溶媒の
留去を行い、下記式(T)の化合物を得た。
H8CHrC1(, -8S-CH2-CHrSH/ \
(Q) 1(SCH2CH2S S-CH2-CL 5H
CI(3 (CH2・CC-8-08 CH2-8) 4-C(S
) Example 8 In a 1000 cc three-tube flask, 50 g of the compound of formula (H) 1 300 gs of tetrahydrofuran 1 g of sodium hydride 1 1 hydroquinone monomethyl ether
00mg and stirred at 0℃ under nitrogen.
After slowly adding 70 g of methacryloyl isocyanate, the mixture was stirred at OoC for 2 hours. Thereafter, filtration and distillation of the solvent were performed to obtain a compound of the following formula (T).

この化合物にベンゾイルパーオキサイド1重量部を加え
た液体を実施例1に示した方法で重合し−1A   − 樹脂を得た。
A liquid obtained by adding 1 part by weight of benzoyl peroxide to this compound was polymerized by the method shown in Example 1 to obtain -1A- resin.

CH3 CI(2=C−N−C−3−、CH,2−8CH2−C
H2−−3CH2−8−C−N−1II       
       If IHOOH −C=CI(2 実施例9 1000ccの三ツロフラスコに前記式(K)に示した
化合物100 g、テトラヒドロフラン300g1ナト
リウムボロヒドライド1g1ヒドロキノンモノメチルエ
ーテル100mgを仕込み、0℃、窒素下でかくはんし
ながら、メタクリロイルイソシアネート75gをゆっく
り滴下後、0°Cで2時間かくはんした。その後、ろ過
、溶媒の留去を行い、下記式(U)の化合物を得た。こ
の化合物99重量部にをベンゾイルパーオキサイドを1
重量部加えた溶液をガラスモールドと粘着テープよりな
るモールド型に注入し、50℃から120℃まで15時
間かけて昇温し樹脂を得た。
CH3 CI (2=C-N-C-3-, CH, 2-8CH2-C
H2--3CH2-8-C-N-1II
If IHOOH -C=CI (2 Example 9 100 g of the compound shown in the formula (K) above, 300 g of tetrahydrofuran, 1 g of sodium borohydride, 100 mg of hydroquinone monomethyl ether were placed in a 1000 cc Mitsulo flask, and the mixture was stirred at 0° C. under nitrogen. After slowly dropping 75 g of methacryloyl isocyanate, the mixture was stirred at 0°C for 2 hours.Then, filtration and distillation of the solvent were performed to obtain a compound of the following formula (U).99 parts by weight of this compound was added with benzoyl peroxide. 1 oxide
The solution added in parts by weight was injected into a mold made of a glass mold and adhesive tape, and the temperature was raised from 50°C to 120°C over 15 hours to obtain a resin.

OH3 □ 1]] OH 比較例1 1000ccの三ツロフラスコに下記式(V)に示した
化合物i o o g、テトラヒドロフラン300g、
ナトリウムボロヒドライド1g1 ヒドロキノンモノメ
チルエーテル100mgを仕込み、0℃、窒素下でかく
はんしながら、メタクリル酸クロライド75gをゆっく
り滴下後、トリエチルアミン90gを滴下し、0℃で2
時間がくはんした。その後、ろ過、溶媒の留去を行い、
下記式(W)の化合物を得た。この化合物49重量部を
実施例1に示した方法で重合し樹脂を得た。
OH3 □ 1]] OH Comparative Example 1 In a 1000 cc Mitsulo flask, i o o g of the compound shown in the following formula (V), 300 g of tetrahydrofuran,
1 g of sodium borohydride 100 mg of hydroquinone monomethyl ether was charged, and while stirring under nitrogen at 0°C, 75 g of methacrylic acid chloride was slowly added dropwise, and then 90 g of triethylamine was added dropwise, and the mixture was stirred at 0°C for 2 hours.
Time passed. After that, filtration and distillation of the solvent are performed.
A compound of the following formula (W) was obtained. 49 parts by weight of this compound was polymerized by the method shown in Example 1 to obtain a resin.

H3CH2CH25CH2CB28H(V)CH3CH
3 比較例2 100・Occの三ツロフラスコに前記式(Y)に示し
た化合物i o o g、テトラヒドロフラン300g
1ナトリウムボロヒドライド1g1ヒドロキノンモノメ
チルエーテル100mgを仕込み、0°C1窒素下でか
くはんしながら、メタクリロイルイソシアネート75g
をゆっくり滴下後、トリエチルアミン90gを滴下し、
0℃で2時間がくはんした。その後、ろ過、溶媒の留去
を行い、下記式(Z)の化合物を得た。この化合物49
重量部を実施例1に示した方法で重合し樹脂を得た。
H3CH2CH25CH2CB28H(V)CH3CH
3 Comparative Example 2 I o o g of the compound shown in the above formula (Y) and 300 g of tetrahydrofuran were placed in a 100 Occ Mitsuro flask.
1g of sodium borohydride 100mg of hydroquinone monomethyl ether was charged, and while stirring under nitrogen at 0°C, 75g of methacryloyl isocyanate was added.
After slowly dropping 90 g of triethylamine,
Stirred at 0°C for 2 hours. Thereafter, filtration and distillation of the solvent were performed to obtain a compound of the following formula (Z). This compound 49
Parts by weight were polymerized by the method shown in Example 1 to obtain a resin.

H3CH2べΣh CH2−3H(Y )[発明の効果
] 本発明の光学用単量体により製造した光学用樹脂は、透
明性に優れ、耐光性が良く、さらに、屈折率が高く、光
学機器用レンズ、眼鏡用レンズやプリズムとして非常に
有効である。
H3CH2beΣh CH2-3H(Y) [Effects of the Invention] The optical resin produced using the optical monomer of the present invention has excellent transparency, good light resistance, and has a high refractive index, making it suitable for optical equipment. Very effective as lenses, eyeglass lenses and prisms.

また、加工する際、イオウ特有の臭気がしない。Also, during processing, there is no odor typical of sulfur.

Claims (2)

【特許請求の範囲】[Claims] (1)下記一般式(A)で示されることを特徴とする光
学樹脂用単量体。 ▲数式、化学式、表等があります▼[A] (式中、Rは水素またはメチル基、nは0または1の整
数、mは1〜3の整数、Xは−CH_2−残基、▲数式
、化学式、表等があります▼残基、▲数式、化学式、表
等があります▼残基から選ばれる少なくとも1種類の残
基と、−S−残基とが、炭素数が3〜10、イオウ数が
2〜9(ただし、イオウ数は炭素数より少ない)となる
範囲で結合してなる基を示す。)
(1) A monomer for optical resins characterized by being represented by the following general formula (A). ▲There are mathematical formulas, chemical formulas, tables, etc.▼[A] (In the formula, R is hydrogen or methyl group, n is an integer of 0 or 1, m is an integer of 1 to 3, X is -CH_2- residue, ▲Mathical formula , chemical formulas, tables, etc. ▼ Residues ▲ Numerical formulas, chemical formulas, tables, etc. Indicates a group formed by bonding within the range of 2 to 9 numbers (however, the number of sulfurs is less than the number of carbons).
(2)請求項(1)記載の単量体を主成分としてなる重
合体からなることを特徴とする光学用樹脂。
(2) An optical resin comprising a polymer containing the monomer according to claim (1) as a main component.
JP1042822A 1989-02-07 1989-02-22 Monomer for optical resin and optical resin consisting of same monomer Pending JPH02298506A (en)

Priority Applications (15)

Application Number Priority Date Filing Date Title
JP1042822A JPH02298506A (en) 1989-02-07 1989-02-22 Monomer for optical resin and optical resin consisting of same monomer
CA002010364A CA2010364C (en) 1989-02-22 1990-02-19 Thiol methacrylate or acrylate and resin made therefrom
AT90301845T ATE99292T1 (en) 1989-02-22 1990-02-21 THIOL(METH)ACRYLATE AND RESIN MADE THEREOF.
DE69005477T DE69005477T2 (en) 1989-02-22 1990-02-21 Thiol (meth) acrylate and resin made from it.
ES90301845T ES2062331T3 (en) 1989-02-22 1990-02-21 METHACRYLATE OR THYL ACRYLATE AND RESIN FROM THEM.
KR1019900002102A KR960015189B1 (en) 1989-02-22 1990-02-21 Thiol metacrylate or acrylate
DK90301845.5T DK0384725T3 (en) 1989-02-22 1990-02-21 Thiol methacrylate or acrylate and resin made therefrom
AU49959/90A AU629301B2 (en) 1989-02-22 1990-02-21 Thiol methacrylate or acrylate and resin made therefrom
EP90301845A EP0384725B1 (en) 1989-02-22 1990-02-21 Thiol methacrylate or acrylate and resin made therefrom
US07/844,477 US5247041A (en) 1989-02-22 1992-03-02 Thiol methacrylate or acrylate resin obtained by polymerizing a thiol methacrylate or acrylate compound
US08/001,075 US5294690A (en) 1989-02-22 1993-01-06 Thiol methacrylate or acrylate resin
US08/169,603 US5399735A (en) 1989-02-22 1993-12-17 Thiol methacrylate or acrylate, method of making same and a lens made therefrom
US08/351,687 US5502141A (en) 1989-02-22 1994-12-08 Method of making thiol methacrylate or acrylate and a lens made therefrom
US08/480,090 US5612390A (en) 1989-02-22 1995-06-07 Thiol Methacrylate or acrylate resin and a method of making same
KR1019960029899A KR970005476B1 (en) 1989-02-22 1996-07-19 Thiol methacrylate or acrylate and resin made therefrom

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2836689 1989-02-07
JP1-28366 1989-02-07
JP1042822A JPH02298506A (en) 1989-02-07 1989-02-22 Monomer for optical resin and optical resin consisting of same monomer

Publications (1)

Publication Number Publication Date
JPH02298506A true JPH02298506A (en) 1990-12-10

Family

ID=26366454

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1042822A Pending JPH02298506A (en) 1989-02-07 1989-02-22 Monomer for optical resin and optical resin consisting of same monomer

Country Status (1)

Country Link
JP (1) JPH02298506A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5288844A (en) * 1991-08-01 1994-02-22 Teruo Sakagami High-refractive index plastic optical material
JP2014019862A (en) * 2012-07-24 2014-02-03 Mitsui Chemicals Inc (meth)acrylate compound, and polymerizable composition and resin using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5288844A (en) * 1991-08-01 1994-02-22 Teruo Sakagami High-refractive index plastic optical material
JP2014019862A (en) * 2012-07-24 2014-02-03 Mitsui Chemicals Inc (meth)acrylate compound, and polymerizable composition and resin using the same

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