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JPH02267896A - X-ray generator - Google Patents

X-ray generator

Info

Publication number
JPH02267896A
JPH02267896A JP8741889A JP8741889A JPH02267896A JP H02267896 A JPH02267896 A JP H02267896A JP 8741889 A JP8741889 A JP 8741889A JP 8741889 A JP8741889 A JP 8741889A JP H02267896 A JPH02267896 A JP H02267896A
Authority
JP
Japan
Prior art keywords
plasma
pinch
ray
aperture
ray generator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8741889A
Other languages
Japanese (ja)
Inventor
Seiichi Iwamatsu
誠一 岩松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP8741889A priority Critical patent/JPH02267896A/en
Publication of JPH02267896A publication Critical patent/JPH02267896A/en
Pending legal-status Critical Current

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  • X-Ray Techniques (AREA)

Abstract

PURPOSE:To provide exposure unit with high through-put as a light source for X-ray exposure by arranging an aperture for taking up X-ray generated by the pinch effect of plasma. CONSTITUTION:An aperture 2 made of such as Be film for taking up X-ray is formed in a vessel 1 made from iron, quartz or the like. This vessel 1 is vacuum 3 sucked and gas 4 such as Ar is introduced therein, then high frequency is applied to a coil made of RF 5 or an electrode to form plasma 7. A pinch part 8 in the plasma 7 is formed by flowing a large current to the coil 6 with respect to thermal diffusion of the plasma 7 and X-ray 9 is discharged through the aperture 2 from the pinch part 8. It is thus possible to provide a strong X-ray generator utilizing the pinch effect of plasma.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明はX線発生装置に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to an X-ray generator.

[従来の技術] 従来、プラズマのピンチ効果は「理化学辞典」丸善刊、
によると、プラズマ中に流れる電流と、それによりつく
られる磁場との相互作用で、プラズマ自身が紐状にしぼ
られる現象であり、柱状または環状の高温プラズマをつ
くるのに利用される。柱状プラズマの軸方向(Z方向)
に電流を流し方位角方向(θ方向)の磁場によってプラ
ズマをピンチさせるZピンチと、外からの誘導によりθ
方向に電流を流し、Z方向の磁場をつくるθピンチとに
大別される。Zピンチはくびれや曲がりに対して不安定
でかつ電極からの不純物が多く、核融合研究には適さな
い、θピンチは比較的安定でかつ不純物も少なく、比較
的高温高密度のプラズマが短時間ではあるが容易に得ら
れる。Zピンチの過熱は主としてジュール熱に頼ってい
る。θピンチでは、ピンチ効果によりプラズマが内向き
に大きく加速され、それが軸上に集中して熱化される衝
撃波加熱を用いており、イオン温度が電子温度よりも高
いのが特徴である。と記されている。又、本プラズマの
ピンチ効果を応用してトカマク型の核融合炉が開発され
ているのが現状である。
[Conventional technology] Conventionally, the pinch effect of plasma has been described in "Physical and Chemistry Dictionary" published by Maruzen,
According to , it is a phenomenon in which the plasma itself is squeezed into a string by the interaction between the electric current flowing in the plasma and the magnetic field created by it, and is used to create columnar or ring-shaped high-temperature plasma. Axial direction of columnar plasma (Z direction)
Z-pinch, in which the plasma is pinched by a magnetic field in the azimuth direction (θ direction), and θ
It is broadly divided into θ pinch, which causes a current to flow in the Z direction and creates a magnetic field in the Z direction. Z-pinch is unstable due to constrictions and bends, and has many impurities from the electrode, making it unsuitable for fusion research. Theta-pinch is relatively stable and has few impurities, and relatively high-temperature, high-density plasma can be generated for a short period of time. However, it is easily obtained. Z-pinch overheating mainly relies on Joule heat. Theta pinch uses shock wave heating in which plasma is greatly accelerated inward due to the pinch effect, concentrated on the axis and thermalized, and is characterized by the fact that the ion temperature is higher than the electron temperature. It is written. Currently, a tokamak-type fusion reactor is being developed by applying the pinch effect of this plasma.

[発明が解決しようとする課題] しかし、上記従来技術によると、プラズマのピンチ効果
によりX線発生がある事はどこにも記されて居らず、ま
してやトカマク等の核融合炉の周辺は厚い磁石で囲まれ
て居り、該611石で実質的にプラズマのピンチ効果に
より発生するX線を防止し−(いる訳ではあるが、X線
取り出し用の窓などは設置された事もない。
[Problems to be Solved by the Invention] However, according to the above-mentioned prior art, there is no mention anywhere that X-rays are generated due to the pinch effect of plasma, and even more so, there is no mention of X-rays being generated due to the pinch effect of plasma. The 611 stones substantially prevent X-rays generated by the pinch effect of the plasma (although there is, no window for taking out X-rays was ever installed).

本発明は、1つはプラズマのピンチ効果によりX線が発
生するという現象の発明ではあるが、具体的には該プラ
ズマのピンチ効果により発生するX線をX線露光用のX
線源とするところに目的がある。
One aspect of the present invention is the invention of the phenomenon that X-rays are generated due to the pinch effect of plasma.
There is a purpose in using it as a radiation source.

[課題を解決するための手段1 上記課題を解決するために本発明は、X線発生装置に関
し、プラズマのピンチ効果により発生するX線を取り出
し窓より取り出す窓を具備する手段を取る事を基本とす
る。
[Means for Solving the Problems 1] In order to solve the above problems, the present invention relates to an X-ray generator, and basically provides a means for taking out the X-rays generated by the pinch effect of plasma through a window. shall be.

[実 施 例] 以下、実施例により本発明を詳述する。[Example] Hereinafter, the present invention will be explained in detail with reference to Examples.

第1図は本発明の一実施例を示すX線発生装置の断面模
式図である。すなわち、鉄や石英等から成る容器1には
X線取り出し用の例えばBe膜等から成る窓2を形成し
、該容器1を真空3で真空に引きながらアルゴン等のガ
ス4を導入し、容器内を数Torrの真空度に保ちつつ
容器内のガスをRF5から成るコイル又は電極に高周波
を印加してプラズマ7を形成し、該プラズマ7の熱拡散
流に対しコイル6に大電流を流すことによりプラズマの
ピンチ8部を形成し、該ピンチ8部からのX線9を前記
窓2部から放出させる。
FIG. 1 is a schematic cross-sectional view of an X-ray generator showing an embodiment of the present invention. That is, a window 2 made of, for example, a Be film for extracting X-rays is formed in a container 1 made of iron, quartz, etc., and a gas 4 such as argon is introduced while the container 1 is evacuated with a vacuum 3. Plasma 7 is formed by applying high frequency waves to the gas inside the container to a coil or electrode made of RF5 while maintaining a vacuum level of several Torr inside, and a large current is passed through the coil 6 in response to the thermal diffusion flow of the plasma 7. A pinch 8 portion of plasma is formed by this, and X-rays 9 from the pinch 8 portion are emitted from the window 2 portion.

本例は一例であり1例えばトカマク炉の周辺コイルの一
部をはふいて容器壁を露出させて窓部とする事や、プラ
ズマ中に電極を挿入してプラズマに電流を流すことによ
りX線の発生強度を増す事や、外部からの磁界を印加す
る為の1if1石を併せて容器周辺に設置する事等がで
きる事は云うまでもない。
This example is just one example. 1 For example, by wiping off a part of the peripheral coil of a tokamak reactor to expose the vessel wall and use it as a window, or by inserting an electrode into the plasma and passing a current through the plasma, X-ray Needless to say, it is possible to increase the intensity of the magnetic field generated, and to install 1if1 stones around the container in order to apply an external magnetic field.

又、柱状プラズマのピンチ効果を応用することができる
ことも本実施例からも明らかである。
It is also clear from this example that the pinch effect of columnar plasma can be applied.

〔発明の効果] 本発明によりプラズマのピンチ効果を用いた強力なX線
発生装置が得られる効果があり、X線露光用の光源とし
てスルーブツトの高い露光装置が得られる効果もある。
[Effects of the Invention] The present invention has the effect of providing a powerful X-ray generator using the pinch effect of plasma, and also provides an exposure device with a high throughput as a light source for X-ray exposure.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例を示すX線発生装置の断面模
式図である。 ・容器 ・窓 ・真空 ・ガス ・RF ・コイル ・プラズマ ・ピンチ ・X線 以上 出願人 セイコーエプソン株式会社
FIG. 1 is a schematic cross-sectional view of an X-ray generator showing an embodiment of the present invention.・Container, Window, Vacuum, Gas, RF ・Coil, Plasma, Pinch, X-ray and above Applicant: Seiko Epson Corporation

Claims (1)

【特許請求の範囲】[Claims] プラズマのピンチ効果により発生するX線を取出し窓よ
り取り出す窓を具備する事を特徴とするX線発生装置。
An X-ray generator characterized by comprising a window through which X-rays generated by the pinch effect of plasma are taken out.
JP8741889A 1989-04-06 1989-04-06 X-ray generator Pending JPH02267896A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8741889A JPH02267896A (en) 1989-04-06 1989-04-06 X-ray generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8741889A JPH02267896A (en) 1989-04-06 1989-04-06 X-ray generator

Publications (1)

Publication Number Publication Date
JPH02267896A true JPH02267896A (en) 1990-11-01

Family

ID=13914330

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8741889A Pending JPH02267896A (en) 1989-04-06 1989-04-06 X-ray generator

Country Status (1)

Country Link
JP (1) JPH02267896A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008506238A (en) * 2004-07-09 2008-02-28 エナジェティック・テクノロジー・インコーポレーテッド Inductive drive plasma light source
US7948185B2 (en) 2004-07-09 2011-05-24 Energetiq Technology Inc. Inductively-driven plasma light source
US8143790B2 (en) 2004-07-09 2012-03-27 Energetiq Technology, Inc. Method for inductively-driven plasma light source

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008506238A (en) * 2004-07-09 2008-02-28 エナジェティック・テクノロジー・インコーポレーテッド Inductive drive plasma light source
US7948185B2 (en) 2004-07-09 2011-05-24 Energetiq Technology Inc. Inductively-driven plasma light source
US8143790B2 (en) 2004-07-09 2012-03-27 Energetiq Technology, Inc. Method for inductively-driven plasma light source

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