JPH02233534A - Heat ray-reflecting glass plate - Google Patents
Heat ray-reflecting glass plateInfo
- Publication number
- JPH02233534A JPH02233534A JP5356789A JP5356789A JPH02233534A JP H02233534 A JPH02233534 A JP H02233534A JP 5356789 A JP5356789 A JP 5356789A JP 5356789 A JP5356789 A JP 5356789A JP H02233534 A JPH02233534 A JP H02233534A
- Authority
- JP
- Japan
- Prior art keywords
- glass plate
- film
- nitride
- layer
- heat ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 67
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims abstract description 66
- 150000004767 nitrides Chemical class 0.000 claims abstract description 32
- 238000000576 coating method Methods 0.000 claims abstract description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 20
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 10
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 9
- 229910052718 tin Inorganic materials 0.000 claims abstract description 6
- 229910000676 Si alloy Inorganic materials 0.000 claims abstract description 4
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 4
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 4
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 3
- 239000010408 film Substances 0.000 claims description 66
- 239000010409 thin film Substances 0.000 claims description 37
- 238000010030 laminating Methods 0.000 claims description 4
- 238000002834 transmittance Methods 0.000 abstract description 24
- 239000005357 flat glass Substances 0.000 abstract description 16
- 239000000126 substance Substances 0.000 abstract description 15
- 230000005855 radiation Effects 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 43
- 238000005299 abrasion Methods 0.000 description 16
- 239000010935 stainless steel Substances 0.000 description 14
- 229910001220 stainless steel Inorganic materials 0.000 description 14
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 11
- 239000012528 membrane Substances 0.000 description 11
- 229910052709 silver Inorganic materials 0.000 description 11
- 239000004332 silver Substances 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 10
- 239000007789 gas Substances 0.000 description 10
- 239000003513 alkali Substances 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- 239000002356 single layer Substances 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 238000009413 insulation Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- -1 TiNx Chemical class 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 239000005340 laminated glass Substances 0.000 description 3
- 150000002736 metal compounds Chemical class 0.000 description 3
- 229910001092 metal group alloy Inorganic materials 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910008332 Si-Ti Inorganic materials 0.000 description 2
- 229910006749 Si—Ti Inorganic materials 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910002064 alloy oxide Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910006854 SnOx Inorganic materials 0.000 description 1
- 229910003070 TaOx Inorganic materials 0.000 description 1
- 229910010421 TiNx Inorganic materials 0.000 description 1
- 229910003087 TiOx Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/281—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、冷暖房効果を向上させるよう日射の透過率を
減じるとともに、耐薬品性ならびに耐摩耗性を改善した
熱線反射ガラス板、特に可視光透過率が30%程度以下
、日射透過率20%程度以下、可視光反射率45%程度
以下の建築用窓ガラスに遺し、単板でも充分使用可能な
熱線反射ガラス板に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention provides a heat-reflecting glass plate that reduces the transmittance of solar radiation to improve the cooling and heating effect, and has improved chemical resistance and abrasion resistance, especially visible light. The present invention relates to a heat ray reflective glass plate which can be used as an architectural window glass having a transmittance of about 30% or less, a solar transmittance of about 20% or less, and a visible light reflectance of about 45% or less, and can also be used as a single plate.
従来、例えば建築用窓ガラスとして透明誘電体または透
明導電膜/銀/透明誘電体または透明導電膜の構成で高
い可視光透過率を達成し、銀の高反射性能を利用して日
射透過率の低い断熱ガラスとし、これを合せガラスにす
ることで−使用されている。しかしながら銀膜は耐摩耗
性、耐湿性に弱く、合せガラスに加工処理せずに放置し
ておくと数日以内で膜に異変が発現し、膜の変色変質が
起り、手で触れただけで剥離する現象が起こるという非
常に弱いものであった。Conventionally, high visible light transmittance has been achieved, for example, in architectural window glass with a transparent dielectric or transparent conductive film/silver/transparent dielectric or transparent conductive film composition, and the high reflective performance of silver has been used to reduce solar transmittance. It is used by making low insulating glass and making it into laminated glass. However, silver film has poor abrasion resistance and moisture resistance, and if it is left untreated on laminated glass, abnormalities will appear in the film within a few days, causing discoloration and deterioration of the film, and even if it is touched by hand. It was extremely weak, causing peeling phenomena.
このため最近では合せガラスでなくても単板のままでも
使用して耐候性、耐久性があるというものが種々提案さ
れている。例えば、特開昭63−242948号公報に
は、熱線反射ガラスについて記載されており、ガラス基
板表面に基板側から順に金属膜、窒化物膜及び酸化物膜
を積層して形成した膜側表面の可視光反射率20%以下
の熱線反射ガラスが開示され、金属膜としてCrs T
isZrs Hfs Tas Si及びこれらの合金、
並びにステンレスのなかから選ばれたもの、窒化物とし
てTis Zr, Tas CrSKfの窒化物及びこ
れらの複合窒化物のなかから選ばれたもの、酸化物とし
てTiSCrs Zrs st, AI% Hfs T
as Nbの酸化物及びこれらの複合酸化物のなかから
選ばれたものであり、具体的にはガラス基板/クロム膜
/窒化チタン膜/酸化チタン膜、あるいはガラス基板/
ステンレス膜/窒化チタンIIII/酸化チタン膜の構
成が記載されている。またそのほかに例えば、特開昭6
1−151045号公報には、太陽エネルギーの反射の
ための製品およびその製造法について記載されており、
透明な基材、該透明な基材の表面上に付着され吸収およ
び干渉効果により色を呈する金属化合物の透明なフィル
ム、および該金属化合物の透明フィルム上に付着された
高反射性の透明な金属フィルムからなることが開示され
、透明な基材はガラス、高反射性の透明な金厘フィルム
は銀、金、銅、アルミニウムおよびそれらの混合物より
なる群から選ばれたもの、金属化合物はステンレス鋼、
ニッケル合金、銅、鉄、コバルトおよびそれらの混合物
の酸化物およびチッ化物よりなる群から選ばれたもので
あること、スパッタリングでフィルム?形成すること、
ならびにガラス面側からの反射において金色を呈するこ
とが記載されている。For this reason, various types of glass panels have recently been proposed that are weather resistant and durable and can be used as a single sheet instead of laminated glass. For example, Japanese Unexamined Patent Publication No. 63-242948 describes a heat ray reflective glass, in which a metal film, a nitride film, and an oxide film are laminated on the surface of a glass substrate in order from the substrate side. A heat ray reflective glass with a visible light reflectance of 20% or less is disclosed, and Crs T as a metal film is disclosed.
isZrs Hfs Tas Si and alloys thereof,
and selected from stainless steel, nitrides selected from Tis Zr, Tas CrSKf nitrides and composite nitrides thereof, and oxides selected from TiSCrs Zrs st, AI% Hfs T
as Nb oxide and composite oxides thereof, specifically, glass substrate/chromium film/titanium nitride film/titanium oxide film, or glass substrate/
The structure of stainless steel film/titanium nitride III/titanium oxide film is described. In addition, for example, JP-A-6
1-151045 describes a product for reflecting solar energy and its manufacturing method,
a transparent substrate, a transparent film of a metal compound deposited on the surface of the transparent substrate and exhibiting color due to absorption and interference effects, and a highly reflective transparent metal deposited on the transparent film of the metal compound. The transparent substrate is glass, the highly reflective transparent metal film is selected from the group consisting of silver, gold, copper, aluminum and mixtures thereof, and the metal compound is stainless steel. ,
Films by sputtering, being selected from the group consisting of nickel alloys, oxides and nitrides of copper, iron, cobalt and their mixtures? to form,
It is also described that it exhibits a golden color when reflected from the glass surface side.
さらに特開昭64−3036号公報には、低反射性被覆
物品が記載されており、透明な基体(ガラス)の表面上
に付着された色を示す金属合金酸化物の透明なフィルム
及び該金属合金酸化物(ステンレス鋼、その酸化物)フ
ィルム上に付着された低反射性透明金属合金(ニッケル
及びクロムからなる群)フィルムからなるものが開示さ
れ、スパソターで成膜すること、あるいはガラス表面か
ら反射してブロンズ色を示すことが記載されている。さ
らにまた特開昭63−247352号公報には、反応性
スパッタリングによる透明コーティングについて記載さ
れており、基材、基材上のコーティング膜およびコーテ
ィング上の保護膜を含む構成のコートした物品であって
、この保護膜がアルミニウムおよびケイ素を含む合金で
あるターゲットを反応性ガス中、特に02%がN2+0
■ガス中の割合で10〜30%にあるなかでスパッタす
ることにより形成された反応生成物の?定形層を含む膜
であることが記載され、具体的にはAI−SiRx(但
しR:例えば0.3 o,+o.7Nz等反応ガス)の
保護膜とするものが開示されている。Further, JP-A-64-3036 describes a low-reflection coated article, which includes a transparent film of a colored metal alloy oxide deposited on the surface of a transparent substrate (glass) and a transparent film of a metal alloy oxide deposited on the surface of a transparent substrate (glass). A low-reflection transparent metal alloy (group consisting of nickel and chromium) film deposited on an alloy oxide (stainless steel, oxides thereof) film is disclosed, which can be deposited on a spasoter or from a glass surface. It is described that it exhibits a bronze color when reflected. Furthermore, JP-A-63-247352 describes a transparent coating by reactive sputtering, and the coated article includes a base material, a coating film on the base material, and a protective film on the coating. , the target whose protective film is an alloy containing aluminum and silicon is exposed to a reactive gas, especially 02% N2+0.
■Reaction products formed by sputtering in a proportion of 10 to 30% in the gas? It is described that the film includes a regular layer, and specifically, a film that is used as a protective film for AI-SiRx (R: reactive gas such as 0.3 o, +o.7 Nz, etc.) is disclosed.
前述したような従来のガラス基板の表面に第1層として
先ずSUS <ステンレス)薄膜を成膜した単独層ある
いは2層、例えばガラス基板/SUS/TiNの構成で
は熱線反射性能は得られるものの比較的耐薬品性に劣り
、特に耐酸性に劣るとともに耐アルカリ性についても比
較的うすいコンクリート溶融液のようなものだと膜が剥
離したりすることがあり、耐摩耗性も必ずしも充分であ
るものとは言い難く、仮りに建築窓ガラス等で膜面を室
内側にして使用したとしても、掃除などでかなり強く擦
ることがある場合には膜の劣化あるいは傷が発現し易い
等の懸念があるものであり、特開昭63−242948
号公報に記載のようにたとえ、TiO■等の酸化物膜を
オーバーコートしたとしても、また特開昭63−247
352号公報に記載のようなAI・SiRx等の保護膜
をオーバーコートしたとしても膜全体として充分耐薬品
性あるいは耐摩耗性等の耐久性があるものとは必ずしも
言い難いものであって単板の建築窓ガラスとしても改善
が望まれるところであった。With the conventional single-layer or double-layer structure in which a SUS (stainless steel) thin film is first formed on the surface of a glass substrate as described above, for example, a glass substrate/SUS/TiN structure, heat ray reflection performance can be obtained, but it is relatively poor. It has poor chemical resistance, especially acid resistance, and relatively weak alkali resistance, such as concrete melt, which may cause the film to peel off, and wear resistance is not necessarily sufficient. However, even if the membrane is used on architectural window glass with the membrane side facing indoors, there is a concern that the membrane may deteriorate or become scratched if it is rubbed very strongly during cleaning etc. , Japanese Patent Publication No. 63-242948
Even if an oxide film such as TiO■ is overcoated as described in Japanese Patent Application Laid-Open No. 63-247,
Even if a protective film such as AI or SiRx is overcoated as described in Publication No. 352, it cannot necessarily be said that the film as a whole has sufficient durability such as chemical resistance or abrasion resistance. Improvements were also desired for architectural window glass.
C問題点を解決するための手段〕
本発明は、従来のかかる欠点に鑑みてなしたものであっ
て、SUSの窒化物II膜を透明ガラス板の表面に第1
層として少な《とも成膜すること、ならびに順次、特定
の窒化物または窒素酸化物薄膜、特定の酸化物薄膜なら
びに特定の酸化物または窒素酸化物薄膜をそれぞれ巧み
に組み合わせることで、特に高耐薬品性、高耐摩耗性を
もたらし、可視光透過率が30%程度以下、日射透過率
が20%程度以下、可視光反射率が45%程度以下と熱
線反射性能を充分有し、単板使用で充分耐久性を有する
熱線反射ガラス板を提供するものである。Means for Solving Problem C] The present invention has been made in view of the above-mentioned drawbacks of the conventional art.
Particularly high chemical resistance can be achieved by depositing at least one layer as a layer and by skillfully combining, in sequence, a specific nitride or nitrogen oxide thin film, a specific oxide thin film, and a specific oxide or nitrogen oxide thin film. It has a visible light transmittance of about 30% or less, a solar radiation transmittance of about 20% or less, a visible light reflectance of about 45% or less, and has sufficient heat ray reflection performance, and can be used as a single plate. To provide a heat ray reflective glass plate having sufficient durability.
すなわち、本発明は、透明ガラス板の表面に、少なくと
もSUSの窒化物IIIIijIを成膜したことを?徴
とする熱線反射ガラス板、ならびに透明ガラス板の表面
に、SUSの窒化物薄膜を形成した後、被膜時の雰囲気
中でのNz:Og比が100:0〜50:50のもとで
Ti, Cr, Taの窒化物または窒素酸化物薄膜を
成膜したことを特徴とする熱線反射ガラス板、および透
明ガラス板の表面に、SUSの窒化物薄膜を形成した後
、被膜時の雰囲気中でのNz:02比が100:0〜5
0:50のもとでTiSCrSTaの窒化物または窒素
酸化物薄膿を成膜し、ついでTiSSns Crs T
aの酸化物薄膜を積層したことを特徴とする熱線反射ガ
ラス板、さらに透明ガラス板の表面に、SUSの窒化物
薄膿を形成した後、被膜時の雰回気中でのN2:O2比
が100:0〜50:50のもとでTi, Crs T
aの窒化物または窒素酸化物薄膜を成膜し、ついでTi
s Sns Crx Taの酸化物薄膜を積層し、さら
に該表面に被膜時の雰囲気中でのN2;O2比がO:1
00〜50:50のもとでSi・AI% Si−Ni−
. Si−TiのSi合金の酸化物または窒素酸化物m
sを積層したことを特徴とする熱線反射ガラス板を提供
するものである。That is, in the present invention, at least SUS nitride III is formed on the surface of a transparent glass plate. After forming a SUS nitride thin film on the surface of the heat-reflecting glass plate and transparent glass plate, Ti , Cr, Ta nitride or nitrogen oxide thin film is formed on the surface of the heat ray reflective glass plate and the transparent glass plate. After forming the SUS nitride thin film on the surface of the transparent glass plate, Nz:02 ratio of 100:0~5
A thin film of TiSCrSTa nitride or nitrogen oxide was deposited under 0:50, and then TiSSnsCrsT
A heat ray reflective glass plate characterized by laminating the oxide thin film of A, and after forming SUS nitride thin pus on the surface of the transparent glass plate, the N2:O2 ratio in the atmosphere at the time of coating Ti, Crs T when is 100:0~50:50
A nitride or nitrogen oxide thin film is formed, and then Ti
s Sns Crx Ta oxide thin film is laminated, and the N2:O2 ratio in the atmosphere at the time of coating is O:1 on the surface.
Si・AI% Si-Ni- under 00-50:50
.. Si-Ti Si alloy oxide or nitrogen oxide m
The present invention provides a heat ray reflective glass plate characterized by laminating s.
ここで、透明ガラス板の表面に成膜する第11として少
なくともSUSの窒化物薄111(S[JSNxとする
)を用いることとしたのは、該SUSNxの方がSUS
より透明ガラス板との密着力および膜自身の強度が向上
し、特に耐酸性が良化するからであり、膜厚については
30〜250人、より好ましくは50〜120人であっ
て、透明ガラス板側での反射色はシルバー系の色調とな
り、所要の色調、可視光透過率ならびに可視光反射率に
対し、前記範囲内で種々対応できるものであり、例えば
厚味が厚いほどよりシルバー色になり、また薄くして第
2層ならびに第3層の厚味を変えて色調の調整もできパ
リエーシ旨ンをもつようにできるものであり、30人未
満では膜が不均一となり好ましくな< 、250人を超
えるとミラー効果となりすぎるものとなって透視性が非
常に少なくなり、例えば可視光透過率が約10%以下と
なり建築用窓ガラスとしては好ましくなくなり第2層や
第3層等との色調バランスがとれなくなるものである。Here, we decided to use at least SUS nitride thin 111 (hereinafter referred to as S [JSNx) as the eleventh film to be formed on the surface of the transparent glass plate.
This is because the adhesion to the transparent glass plate and the strength of the film itself are improved, and the acid resistance is particularly improved. The reflected color on the plate side is a silver tone, and the required color tone, visible light transmittance, and visible light reflectance can be varied within the above range.For example, the thicker the plate, the more silver it becomes. It is also possible to make it thinner and adjust the color tone by changing the thickness of the second and third layers, and it can be made to have a paring effect. If it exceeds the size of a person, it becomes too much of a mirror effect and the visibility becomes very low.For example, the visible light transmittance becomes less than about 10%, making it unsuitable for architectural window glass, and the color tone with the second layer, third layer, etc. It becomes impossible to maintain balance.
なおミラー効果を求める際に?この限りでないことは言
うまでもない。第2層として被膜時の雰囲気中でのN2
二〇■比が100:0〜50:50のもとでTis C
rSTaの窒化物または窒素酸化物薄膜を用いることと
したのは、TiNxOy(0〈X≦1,0≦y≦2)、
CrNxOy (0 < x≦1,0≦y≦372)、
TaNxOy (0 < x≦1, O≦y≦572)
として第1層のSUSNx !!膜との密着力が大きく
、しかもついで成膜する第3層の酸化物膜とも密着性が
よいからであり、さらに干渉膜として色調ならびに可視
光透過率の調整に役立つものであり、また耐摩耗性なら
びに耐薬品性についても向上傾向を示すものであり、さ
らにまた窒化物ならびに窒素酸化物例えばTiNx〜T
iNxOyが用いられるなかで、どちらかといえば酸化
物例えばTidyが多少、好ましくは10%以下含まれ
る方がより耐摩耗性が向上するような傾向が見られるも
のであり、膜厚については150〜600人、好まし《
は200〜500人であって、150人未満であれば、
膜面倒の可視光反射率が高くなりすぎ、色調のバリエー
シコンがとり難くなり、膜の強度も低下するものである
からであり、600人を超えると可視光透過率が低下し
すぎるためである。第3層としてTISSns CrS
Taの酸化物薄膜を用いることとしたのは、TiOxな
らびにSnOx (0 < x≦2)、Crux (0
くχ≦372)、TaOx (0 < x≦572)と
して窒化物例えばTiNxと密着性が比較的よいが、特
に第2層がTiNxOy等の窒素酸化物の際に有効であ
って第1層から第3層までの密着力もよくなるものであ
り、耐薬品性、耐摩耗性も良好なものとなって保護膜性
がより発揮できるものとなり、さらに膜面の反射防止の
役目をも発揮するからであり、膜厚については50〜4
00人、好ましくは100〜300人であって、50人
未満であれば、保護膜性能ならびに反射防止性能が劣る
ものとなって好ましくな<、400人を超えると逆に反
射防止性能が減少する傾向があり、また酸化物の成膜に
はどちらかと言えば時間がかかるので必要以上の膜厚に
すると生産性に直接影響するからである。What about when looking for the mirror effect? Needless to say, this is not the case. N2 in the atmosphere during coating as the second layer
20 ■ Tis C when the ratio is 100:0 to 50:50
The reason for using rSTa nitride or nitrogen oxide thin film is TiNxOy (0<X≦1, 0≦y≦2),
CrNxOy (0<x≦1, 0≦y≦372),
TaNxOy (0<x≦1, O≦y≦572)
As the first layer SUSNx! ! This is because it has great adhesion to the film and also has good adhesion to the third layer of oxide film that is subsequently formed.Furthermore, as an interference film, it is useful for adjusting color tone and visible light transmittance, and it also has excellent wear resistance. It also shows an improvement trend in properties and chemical resistance, and furthermore, nitrides and nitrogen oxides such as TiN
When iNxOy is used, there is a tendency that the wear resistance is improved more when an oxide such as Tidy is contained to some extent, preferably 10% or less, and the film thickness is 150~100%. 600 people, preferred《
is between 200 and 500 people, and if it is less than 150 people,
This is because the visible light reflectance of the membrane becomes too high, making it difficult to maintain color tone variation and reducing the strength of the membrane.If the number of people exceeds 600, the visible light transmittance decreases too much. . TISSns CrS as the third layer
The reason for using the Ta oxide thin film is because of TiOx, SnOx (0 < x≦2), Crux (0
χ≦372), TaOx (0<x≦572) has relatively good adhesion with nitrides such as TiNx, but it is particularly effective when the second layer is made of nitrogen oxides such as TiNxOy, and the adhesion from the first layer to This improves adhesion to the third layer, improves chemical resistance and abrasion resistance, and allows the protective film to be more effective, and also serves as an anti-reflection coating on the film surface. Yes, the film thickness is 50-4
00 people, preferably 100 to 300 people, if it is less than 50 people, the protective film performance and anti-reflection performance will be inferior, and it is not preferable.If it exceeds 400 people, the anti-reflection performance will decrease. This is because forming an oxide film is rather time consuming, so making the film thicker than necessary will directly affect productivity.
なおSnOxに替えてZnSnOx (0 < x≦3
)を採用することができる。ことに第4層をオーバコー
トする際には有効である。第4Nとして被膜時の雰囲気
中i’(7)NzFOz比がO:100〜5o:5oノ
も(7)1?Si・AIXSi・Nis Si−Tiの
Si合金の酸化物または窒素酸化物薄膜を用いることと
したのは、Si・AINxOy(0≦X≦7/3, Q
<y≦772)、Si−TiNxOy(0≦x<7/3
,O<y≦4)、SiNiNxOy(0≦x<7/3.
0<y≦3)としてDCスバ7夕法で成膜でき製造上
非常に有利であって生産性も向上し、充分SingやA
120i等を含んだ酸化物だけあるいは酸化物と窒化物
との複合薄膜となるためガラスに近い組成物となって高
耐摩耗性を有する薄膜となるものであり、第1層から第
4層までに至る各層間の密着性を向上することにもなり
、積層した多層膜全体としても剥離等の発現を防止して
強度アップにつなげることができるものであり、膜厚に
ついては300人以上、好ましくは400〜2000人
、最適には500〜1000人であって、特に第3層と
第4層をあわせトータル膜厚で5oo人以上であること
が好ましいものであり、例えばCS−10F(摩耗輸)
を用勺)でのテーバ試験にて1000回回転後における
可視光透過率の変化を4%以下とするためには本第4層
ならびに上記膜厚が必要であり、より耐久性をもたしめ
ることとなってより長い間膜の欠陥等が目立たないもの
となるという効果をもたらすものであり、2000人以
内が好ましいとしたのは2000人を超えて厚すぎると
次第にクラック等の不具合を発現し易くなる傾向がある
こと、ならびに2000人を超える厚みとしても保l[
膜としての効果の増大をほとんど期待できずほぼ一定と
なることからである.いずれにしても上述のように第4
層まで順次禎層するようにしたものは全体として耐摩耗
性ならびに耐薬品性を著しく向上して単板窓ガラスとし
て有用なものとすることができるためである.
なお、透明ガラス板としては無色または着色の無機質あ
るいは有機質ガラス板であれば、いずれも採用できるこ
とは言うまでもない。Note that ZnSnOx (0 < x≦3
) can be adopted. This is particularly effective when overcoating the fourth layer. As the fourth N, the i'(7)NzFOz ratio in the atmosphere during coating is O:100 to 5o:5o(7)1? Si・AIXSi・Nis The reason why we decided to use Si alloy oxide or nitrogen oxide thin film of Si-Ti is because Si・AINxOy (0≦X≦7/3, Q
<y≦772), Si-TiNxOy (0≦x<7/3
, O<y≦4), SiNiNxOy (0≦x<7/3.
0<y≦3), the film can be formed by the DC coating method, which is very advantageous in terms of manufacturing, and improves productivity.
Since it is a thin film of only oxide containing 120i or a composite of oxide and nitride, it has a composition close to glass and has high wear resistance. It also improves the adhesion between each layer leading to the layering, and prevents peeling etc. of the laminated multilayer film as a whole, leading to increased strength.The film thickness is preferably 300 or more, preferably is 400 to 2,000 people, optimally 500 to 1,000 people, and it is particularly preferable that the total thickness of the third and fourth layers is 500 people or more.For example, CS-10F (wear-resistant) )
In order to keep the change in visible light transmittance to 4% or less after 1,000 rotations in the Taber test using the same method as shown in Fig. This has the effect of making film defects less noticeable for a longer period of time, and it is preferable to use less than 2,000 people because if it is too thick, defects such as cracks will gradually appear. There is a tendency for it to become easier to maintain, as well as a thickness of more than 2000 people.
This is because the effect as a film cannot be expected to increase much and remains almost constant. In any case, as mentioned above, the fourth
This is because glass in which the layers are layered one after another can significantly improve the abrasion resistance and chemical resistance as a whole, making it useful as a single-pane window glass. It goes without saying that any colorless or colored inorganic or organic glass plate can be used as the transparent glass plate.
前述したとおり、本発明の熱線反射ガラス板は、透明ガ
ラス板表面に、第1層としてSilSNx薄膜を形成せ
しめたもの、さらに該SUSNX薄膜の表面に特定のT
is Cr, Taの窒化物または窒素酸化物薄膜を積
層したもの、さらにまた前記SUSNx薄膜と特定のT
i, Crs Taの窒化物または窒素酸化物薄膜につ
いでTi,. Sns CrSTaの酸化物薄膜を順次
積層したもの、さらにまた前記3層の表面に特定のSi
合金の酸化物または窒素酸化物II膜をオーバーコート
したものと、単層から411まで巧みに組み合せ配した
ことにより、可視光透過率が30%程度以下、日射透過
率が20%程度以下、可視光反射率が45%程度以下と
充分断熱効果を有し、シルバー系色調を有するものとな
り、しかも各薄膜層の密着性を高めることができるとと
もに、より耐薬品性がある特定の窒化物、酸化物、窒素
酸化物を特異に配して、積層した多層膜全体としての耐
摩耗性ならびに耐食性を向上せしめることになって、し
たがって耐久性のある単板の熱線反射ガラス板として充
分建築用窓ガラスはもちろん車輌用窓ガラスとしても特
異場所に採用可能ならしめたものである。特に本発明の
薄膜層を遠宜特異な模様、例えば格子状、すだれ状、水
玉状、蜂の巣状等を透明ガラス板に配設すればさらに透
視度を向上せしめることができ、断熱性能とともに調整
できて特異なものとすることができるものである。As mentioned above, the heat ray reflective glass plate of the present invention has a SilSNx thin film formed as the first layer on the surface of the transparent glass plate, and a specific T on the surface of the SUSNX thin film.
is a stack of Cr, Ta nitride or nitrogen oxide thin films, and also the SUSNx thin film and a specific T
i, Crs Ta nitride or nitrogen oxide thin film followed by Ti, . Sns CrSTa oxide thin films are sequentially laminated, and a specific Si layer is added to the surface of the three layers.
By skillfully combining and disposing the alloy oxide or nitrogen oxide II film overcoated with a single layer to 411, the visible light transmittance is about 30% or less, the solar transmittance is about 20% or less, and the visible light transmittance is about 20% or less. It has a light reflectance of about 45% or less, has a sufficient heat insulation effect, has a silver tone, and can improve the adhesion of each thin film layer. The special arrangement of nitrogen oxides and nitrogen oxides improves the abrasion resistance and corrosion resistance of the laminated multilayer film as a whole, making it suitable for use as a durable single-panel heat-reflecting glass sheet for architectural window glass. Of course, it can also be used in special locations as vehicle window glass. In particular, if the thin film layer of the present invention is arranged on a transparent glass plate in a unique pattern such as a lattice, blind, polka dot, honeycomb, etc., the visibility can be further improved and the insulation performance can be adjusted. It is something that can be made unique.
以下、実施例により本発明を具体的に説明する。ただし
本発明は係る実施例に限定されるものではない。Hereinafter, the present invention will be specifically explained with reference to Examples. However, the present invention is not limited to these embodiments.
スIL上
大きさ600 X 600鶴2、厚さ3 , O nの
可視光透過率約89.5%のクリア板ガラス(FL3)
を中性洗剤、水すすぎ、イソブロビルアルコールで順次
洗浄し、乾燥した後、DCマグネトロン反応スパッタリ
ング装置の真空槽内にセットしてあるSuS316のタ
ーゲットに対向して上方を往復できるようセットし、つ
ぎに前記槽内を真空ポンプで約5 X IO−”Tor
rまでに脱気した後、該真空槽内にN2ガスを導入して
真空度を約2.5 X 10− ’Torrに保持し、
前記SuS316のターゲットに約2.5KHの電力を
印加し、DCマグネトロン反応スパッタのなかを、前記
SuS316ターゲット上方においてスピード約40O
n/winで前記板ガラスを搬送することによって約1
50人厚さのSUSNxll膜を単層として成膜した。Clear plate glass (FL3) with visible light transmittance of approximately 89.5%, size 600 x 600 2, thickness 3, On
After sequentially washing with a neutral detergent, rinsing with water, and isobrobyl alcohol, and drying, the sample was set so that it could reciprocate above the SuS316 target set in the vacuum chamber of the DC magnetron reaction sputtering device. Then, the inside of the tank was heated to about 5 X IO-”Tor using a vacuum pump.
After degassing to r, N2 gas is introduced into the vacuum chamber to maintain the degree of vacuum at approximately 2.5 x 10-' Torr,
A power of about 2.5KH was applied to the SuS316 target, and the speed was about 40O above the SuS316 target in the DC magnetron reaction sputtering.
By conveying the plate glass at n/win, approximately 1
A SUSNxll film with a thickness of 50 mm was formed as a single layer.
得られた単層膜を有する熱線反射ガラス板について、可
視光透過率ならびに可視光反射率(380〜780r+
m)ならびに日射透過率(340〜1800nm)につ
いては340型自記分光光度計(日立製作所製)とJI
SZ8722、JISR3106によってそれぞれその
光学的特性を求めた。またテーバ試験による透過率の差
については、テーバ試験機(MODEL503, TY
BER社製)に膜面を上にした10CII1角の試験片
をセットし、膜面に荷重500gのかかった摩耗輪(C
S−10F)が2ケ所で当たるようになっているもので
、試料を300回ならびに1000回回転した後、可視
光透過率を測定し、試験前の測定値と対比し、その変化
量すなわち差をもって表わした数値である。さらに耐薬
品性のうち耐酸試験については、酸Aとして常温で約I
Nの}ICl溶液中に前記試験片を豹6時間浸漬した後
、ならびに酸Bとして約60℃の温度で0. 15Nの
HCI溶液中に前記試験片を約48時間浸漬した後、膜
の劣化状態を見て判断したものであり、耐アルカリ試験
については、アルカリ八として常温で約INのNail
{溶液中に試験片を約6時間浸漬した後、またアルカリ
Bとして約60℃の温度で約0. 125NのNaOH
溶液に試験片を約48時間浸漬した後、ならびにアルカ
リCとして約60℃の温度で約0.58のNaOH溶液
中に試験片を約48時間漫潰した後、膜の劣化状態を目
視によって判断したものであり、それぞれO印はほとん
ど劣化が見られなかったもの、X印は劣化が明らかに目
立ったもので、Δ印はその中間である。前述の各測定値
は表1に示す通りで断熱性に優れる等、より優れた住居
性を示す光学的特性を有し、耐摩耗性、耐食性を充分有
し、耐候性耐久性を向上したものとなり、単板窓ガラス
としても有用なものとなり得るものとなり、後記の比較
例1、2のSUSIMのものより優れたものが得られた
ことが明らかである。なお本実施例のガラス面から見た
色調としては淡いシルバー系色であった。Regarding the heat ray reflective glass plate having the obtained single-layer film, visible light transmittance and visible light reflectance (380 to 780r+
m) and solar transmittance (340 to 1800 nm) using a 340-type self-recording spectrophotometer (manufactured by Hitachi) and JI
The optical properties were determined according to SZ8722 and JISR3106, respectively. In addition, regarding the difference in transmittance due to the Taber test, a Taber tester (MODEL503, TY
A 10CII 1 square test piece with the membrane side facing up was set in a wear ring (C
After rotating the sample 300 times and 1000 times, the visible light transmittance is measured and compared with the measured value before the test to determine the amount of change, that is, the difference. It is a numerical value expressed by . Furthermore, regarding the acid resistance test of chemical resistance, approximately I
After immersing the specimen for 6 hours in an ICl solution of N. The test piece was immersed in a 15N HCI solution for about 48 hours, and then the deterioration state of the membrane was observed.In the alkali resistance test, the test piece was immersed in a 15N HCI solution for about 48 hours, and the alkali resistance test was conducted with a Nail of about IN at room temperature as alkali 8.
{After immersing the test piece in the solution for about 6 hours, also as alkali B at a temperature of about 60°C, about 0. 125N NaOH
After immersing the test piece in the solution for about 48 hours, and after crushing the test piece in a NaOH solution of about 0.58 as alkali C at a temperature of about 60°C for about 48 hours, the state of deterioration of the membrane was visually determined. The O marks indicate almost no deterioration, the X marks indicate clearly noticeable deterioration, and the Δ marks are in between. The above measured values are as shown in Table 1, and the product has optical properties such as excellent heat insulation, which indicates better livability, sufficient abrasion resistance and corrosion resistance, and improved weather resistance and durability. Therefore, it can be useful as a single-pane window glass, and it is clear that it is superior to the SUSIM of Comparative Examples 1 and 2 described later. Note that the color tone of this example when viewed from the glass surface was a pale silver color.
裏隻史1
前記実施例1と同様の方法で行い、透明ガラス板の搬送
スピードのみ約300鶴/minにより、約200人厚
さのSilSNdl膜を成膜した。Urasenshi 1 A SilSNdl film with a thickness of about 200 mm was formed using the same method as in Example 1, except that the transparent glass plate was conveyed at a speed of about 300/min.
得られた熱線反射ガラス板は前記実施例1と同様に試験
した結果、表1に示す通り、前記実施例1と同等以上の
ものを得ることができ、比較例1ならびに2より優れた
ものが得られたことが明らかである。なお本実施例の色
調も実施例1とほぼ同色系となった。The obtained heat ray reflective glass plate was tested in the same manner as in Example 1, and as shown in Table 1, it was found to be equivalent to or better than Example 1, and was superior to Comparative Examples 1 and 2. It is clear that this has been achieved. Note that the color tone of this example was also approximately the same as that of Example 1.
大1■工
前記実施例1と同様の方法で、まず第1層として真空度
約2.5 X 10−3TorrでN2ガス中を電力約
2.5K一の印加して搬送スピード約100On/wi
nにより約60人厚さのSUSNx @膜を形成し、つ
いで第2層としてTiターゲットでもって、真空度約2
.5X10−3Torr, Nz:Ot:O.95:0
.05ガス、電力約2.5KW、搬送スピード約86m
m/winにより約350人厚さのTiNxOy薄膜を
積層した。1st process In the same manner as in Example 1 above, the first layer was prepared in N2 gas at a vacuum level of about 2.5 x 10-3 Torr by applying a power of about 2.5K to a conveying speed of about 100 On/wi.
A SUSNx@ film with a thickness of about 60 mm was formed using n, and then a Ti target was used as the second layer at a vacuum degree of about 2.
.. 5X10-3Torr, Nz:Ot:O. 95:0
.. 05 gas, electricity approximately 2.5KW, conveyance speed approximately 86m
A TiNxOy thin film approximately 350 mm thick was deposited using m/win.
得られた熱線反射ガラス板は実施例1と同様に試験した
結果、表1に示す通り、実施例1、2と同様に断熱性に
優れ、耐食性ならびに耐摩耗性については実施例1、2
より優れたものとなり、後記比較例3、4のガラス板/
SUS/TiNまたはTaNの膜構成より優れたものが
得られていることがわかる。なお本実施例等のガラス面
から見た色調としては淡いブルー系シルバー色であった
。The obtained heat ray reflective glass plate was tested in the same manner as in Example 1, and as shown in Table 1, it had excellent heat insulation properties as in Examples 1 and 2, and its corrosion resistance and abrasion resistance were as good as in Examples 1 and 2.
The glass plates of Comparative Examples 3 and 4 below/
It can be seen that a film structure superior to that of SUS/TiN or TaN was obtained. Note that the color tone of this example and the like when viewed from the glass surface was a pale blue-ish silver color.
ス1』1Lユl
実施例3と同様の方法で、まず第1層として透明ガラス
板の搬送スピードのみ約667u/winで約90人厚
さ、約500mn/winで約120人厚さ、ついで第
2層としてTiNxOy薄膜にづいては実施例3と同様
に、またTaNxOy 11膜についてはTaターゲッ
トを用いて真空度約2.5X10”’TorrSNz:
Q!−0.95:0.05ガス、電力約2.5κ獣搬送
スビー?約78n/sinで約450人厚さ、さらにT
iN薄膜についてはTiターゲットを用いて真空度2.
5 X 10−’Torrs電力2.5KW,搬送スピ
ード約10On+/minで約350人厚さにそれぞれ
実施して、表1に示す3層の膜構成で積層した.
得られた熱線反射ガラス板は実施例1と同様に試験した
結果、表1に示す通り、実施例3とほぼ同等の光学的特
性ならびに耐食性を示し、特に耐摩耗性については実施
例3以上の耐久性のある数値を示すものでより向上した
ものであった。なお色調としては実施例3とほぼ同色系
であった。Using the same method as in Example 3, the first layer was a transparent glass plate with a conveyance speed of about 667 u/win and a thickness of about 90 layers, a thickness of about 120 layers at a speed of about 500 m/win, and then A TiNxOy thin film was used as the second layer in the same manner as in Example 3, and a Ta target was used for the TaNxOy 11 film at a vacuum degree of approximately 2.5X10'''TorrSNz:
Q! -0.95: 0.05 gas, electric power approximately 2.5k Approximately 78n/sin, approximately 450 people thick, and T
For the iN thin film, a Ti target is used at a vacuum level of 2.
Each test was carried out to a thickness of about 350 people at a power of 2.5 KW at 5 x 10-' Torrs and a conveyance speed of about 10 On+/min, and the three-layer film structure shown in Table 1 was laminated. The obtained heat ray reflective glass plate was tested in the same manner as in Example 1, and as shown in Table 1, it showed almost the same optical properties and corrosion resistance as Example 3, and in particular, in terms of abrasion resistance, it was better than Example 3. It showed improved durability. The color tone was almost the same as that of Example 3.
裏11エニ則
前記実施例3〜6と同様な方法で第2層までを積層し、
その表面に第3層としてTiO■薄膜をTiターゲット
を用いて、真空度2.5X10−3Torr,0.ガス
、電力2.5KW、搬送スピード約500mm/min
で約200人厚さに積層した。またTazOsf!膜に
ついてはTaターゲットを用いて、上述の条件のなか搬
送スピードのみ約400m/winで約250人厚さに
それぞれ積層し、表1のとおりの3層の膜構成を得た。Layer up to the second layer in the same manner as in Examples 3 to 6 above,
A TiO2 thin film was formed on the surface as a third layer using a Ti target, and the vacuum level was 2.5 x 10-3 Torr. Gas, electricity 2.5KW, conveyance speed approximately 500mm/min
The layers were stacked to a thickness of about 200 people. TazOsf again! The films were laminated to a thickness of about 250 layers using a Ta target under the above-mentioned conditions at a transport speed of about 400 m/win to obtain a three-layer film structure as shown in Table 1.
得られた熱線反射ガラス板は実施例1と同様な試験した
結果、表1に示す通り、実施例1〜6とほぼ同等の光学
的特性を示し、耐薬品性のうち耐アルカリ性がより向上
するばかりでなく特に耐摩耗性についてはテーバ試験で
の透過率差が1000回テストで5%以下の数値となり
、単板用窓ガラスとしても採用して耐久性ある好ましい
ものとなるものであった。後記比較例5、6の3層膜構
成のものに比し、耐摩耗性ならびに耐薬品性ことに耐ア
ルカリ性においてより優れたものが得られていることが
わかる。なお本実施例等のガラス面から見た色調として
は淡いグリーン系シルバー色を呈するものであった。The obtained heat ray reflective glass plate was tested in the same manner as in Example 1, and as shown in Table 1, it exhibited almost the same optical properties as Examples 1 to 6, and among chemical resistance, alkali resistance was further improved. In addition, especially regarding abrasion resistance, the transmittance difference in the Taber test was less than 5% after 1000 tests, making it a durable and desirable product that can be used as a single-pane window glass. It can be seen that, compared to the three-layer film configurations of Comparative Examples 5 and 6 described later, better abrasion resistance, chemical resistance, and alkali resistance were obtained. Note that the color tone of this example and the like when viewed from the glass surface was a pale greenish silver color.
スl匹迂ヱ怜
前記実施例7〜10と一部の膜厚のみ変更しほぼ同様の
方法で3層に積層した後、その表面に第4層として、A
I・Si(Al:Si・50 : 50)ターゲソトを
用いて、真空度2.5X10弓Torrs Nz:Oz
=1:1ガス、電力3.0κ讐、搬送スピード約201
1/minで約500人厚さのA1・SiNxOyll
膜を積層し表1の4層の膜構成のものを得た。After laminating three layers in almost the same manner as in Examples 7 to 10, except for changing some of the film thicknesses, a fourth layer of A was added to the surface.
Using I・Si (Al:Si・50:50) target soto, vacuum degree 2.5X10 Torrs Nz:Oz
= 1:1 gas, power 3.0k, conveyance speed approx. 201
A1/SiNxOyll with a thickness of about 500 at 1/min
The membranes were laminated to obtain a four-layer membrane structure as shown in Table 1.
得られた熱線反射ガラス板は実施例1と同様に試験した
結果、表1に示す通り、光学的特性については前記実施
例1〜10までとほぼ同等であり、耐薬品性および耐摩
耗性についてはより優れたものとなり、特に耐摩耗性は
テーバ試験での透過率差が1000回テストで4%以下
という数値となり、単板用窓ガラスとして充分耐久性が
あるものとなった。なお後記比較例7の4層膜構成のも
のに比し、耐摩耗性ならびに耐薬品性ことに耐アルカリ
性においてより優れたものが得られた。また本実施例等
のガラス面から見た色調としては淡いグリーン系からイ
エロー系までのシルバー色を呈するものであった。The obtained heat ray reflective glass plate was tested in the same manner as in Example 1, and as shown in Table 1, the optical properties were almost the same as those of Examples 1 to 10, and the chemical resistance and abrasion resistance were In particular, the abrasion resistance showed a transmittance difference of 4% or less after 1000 tests, making it sufficiently durable as a single-pane window glass. It should be noted that, compared to the four-layered film structure of Comparative Example 7 described later, a film with better abrasion resistance, chemical resistance, and alkali resistance was obtained. Further, the color tone of the present example and the like when viewed from the glass surface was a silver color ranging from pale green to yellow.
里翌五土二工
前記各実施例と同様の方法によって表1に示す膜構成に
積層し得た。なおSUSIIIIIについては、SUS
316のターゲットを用いて、真空度3.0X 10−
3Torr, Arガス、電力1.0XW、激送スピ
ード約60On/Illinで約100人厚さ、約30
0m/winで約200人厚さ、約2000 n /屠
iロで約30人厚さ等の要領で成膜した。The membrane structure shown in Table 1 could be laminated by the same method as in each of the above Examples. Regarding SUSIII, SUS
Using a 316 target, vacuum degree 3.0X 10-
3 Torr, Ar gas, power 1.0XW, rapid delivery speed of about 60 On/Illin, thickness of about 100 people, about 30
The film was formed to a thickness of about 200 at a rate of 0 m/win, to a thickness of about 30 at a rate of about 2000 n/win, and so on.
得られた熱線反射ガラスについては、実施例1と同様の
測定法等に従ってそれぞれ評価し、表1に示した。単層
から4層まで各膜層をそれぞれ実施例と対比してみれば
明らかなように耐摩耗性ならびに耐薬品性において劣る
ものであり、単板用窓ガラスとして採用し難い熱線反射
ガラス板であった。なお色調としては単1から4層まで
前記実施例に対応してほぼ同色系のものであった。The obtained heat ray reflective glass was evaluated according to the same measuring method as in Example 1, and the results are shown in Table 1. Comparing each film layer from a single layer to four layers with the examples, it is clear that the abrasion resistance and chemical resistance are inferior, and it is a heat ray reflective glass plate that is difficult to use as a single-pane window glass. there were. It should be noted that the color tone was almost the same from single layer to four layers corresponding to the above embodiment.
以上前述したように本発明は通常のスパッタリングで、
特定物であるSUSNx、窒化物、酸化物ならびに窒素
酸化物の薄膜を特異に組み合わせて単層から多層膜とし
て積層した構成とすることにより、光学的特性も特異性
を有するものとすることができ、高品位の断熱ガラスで
あって特に耐摩耗性、耐食性ならびに耐候耐久性に優れ
たものであり、単板窓ガラスとしても有用な熱線反射ガ
ラス板を提供することができるものである。As mentioned above, the present invention uses normal sputtering,
By uniquely combining thin films of specific substances such as SUSNx, nitrides, oxides, and nitrogen oxides, the optical properties can be made to have specific properties. The present invention is a high-grade insulating glass that is particularly excellent in abrasion resistance, corrosion resistance, and weather resistance, and can provide a heat-reflecting glass plate that is also useful as a single-pane window glass.
Claims (4)
物薄膜を成膜したことを特徴とする熱線反射ガラス板。(1) A heat ray reflective glass plate characterized in that at least a SUS nitride thin film is formed on the surface of the transparent glass plate.
成した後、被膜時の雰囲気中でのN_2:O_2比が1
00:0〜50:50のもとでTi、Cr、Taの窒化
物または窒素酸化物薄膜を成膜したことを特徴とする熱
線反射ガラス板。(2) After forming a SUS nitride thin film on the surface of a transparent glass plate, the N_2:O_2 ratio in the atmosphere during coating is 1.
A heat ray reflective glass plate characterized in that a thin film of Ti, Cr, Ta nitride or nitrogen oxide is formed under the conditions of 00:0 to 50:50.
成した後、被膜時の雰囲気中でのN_2:O_2比が1
00:0〜50:50のもとでTi、Cr、Taの窒化
物または窒素酸化物薄膜を成膜し、ついでTi、Sn、
Cr、Taの酸化物薄膜を積層したことを特徴とする熱
線反射ガラス板。(3) After forming a SUS nitride thin film on the surface of a transparent glass plate, the N_2:O_2 ratio in the atmosphere during coating is 1.
A thin film of Ti, Cr, Ta nitride or nitrogen oxide is formed under the conditions of 00:0 to 50:50, and then Ti, Sn,
A heat ray reflective glass plate characterized by laminating Cr and Ta oxide thin films.
成した後、被膜時の雰囲気中でのN_2:O_2比が1
00:0〜50:50のもとでTi、Cr、Taの窒化
物または窒素酸化物薄膜を成膜し、ついでTi、Sn、
Cr、Taの酸化物薄膜を積層し、さらに該表面に被膜
時の雰囲気中でのN_2:O_2比が0:100〜50
:50のもとでSi・Al、Si・Ni、Si・Tiの
Si合金の酸化物または窒素酸化物薄膜を積層したこと
を特徴とする熱線反射ガラス板。(4) After forming a SUS nitride thin film on the surface of a transparent glass plate, the N_2:O_2 ratio in the atmosphere during coating is 1.
A thin film of Ti, Cr, Ta nitride or nitrogen oxide is formed under the conditions of 00:0 to 50:50, and then Ti, Sn,
A thin oxide film of Cr and Ta is laminated, and the N_2:O_2 ratio in the atmosphere at the time of coating is 0:100 to 50.
A heat ray reflective glass plate characterized in that a thin film of an oxide or nitrogen oxide of an Si alloy of Si.Al, Si.Ni, or Si.Ti is laminated under the following conditions: :50.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5356789A JPH02233534A (en) | 1989-03-06 | 1989-03-06 | Heat ray-reflecting glass plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5356789A JPH02233534A (en) | 1989-03-06 | 1989-03-06 | Heat ray-reflecting glass plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02233534A true JPH02233534A (en) | 1990-09-17 |
Family
ID=12946404
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5356789A Pending JPH02233534A (en) | 1989-03-06 | 1989-03-06 | Heat ray-reflecting glass plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02233534A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5342675A (en) * | 1991-02-21 | 1994-08-30 | Nippon Sheet Glass Co., Ltd. | Heat-screening glass |
US5411794A (en) * | 1991-08-29 | 1995-05-02 | Nippon Sheet Glass Co., Ltd. | Heat-screening glass |
US5543229A (en) * | 1991-10-30 | 1996-08-06 | Asahi Glass Company Ltd. | Method of making a heat treated coated glass |
FR2766174A1 (en) * | 1997-07-21 | 1999-01-22 | Saint Gobain Vitrage | TRANSPARENT SUBSTRATE COATED WITH AT LEAST ONE THIN LAYER |
-
1989
- 1989-03-06 JP JP5356789A patent/JPH02233534A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5342675A (en) * | 1991-02-21 | 1994-08-30 | Nippon Sheet Glass Co., Ltd. | Heat-screening glass |
US5411794A (en) * | 1991-08-29 | 1995-05-02 | Nippon Sheet Glass Co., Ltd. | Heat-screening glass |
US5543229A (en) * | 1991-10-30 | 1996-08-06 | Asahi Glass Company Ltd. | Method of making a heat treated coated glass |
FR2766174A1 (en) * | 1997-07-21 | 1999-01-22 | Saint Gobain Vitrage | TRANSPARENT SUBSTRATE COATED WITH AT LEAST ONE THIN LAYER |
WO1999005072A1 (en) * | 1997-07-21 | 1999-02-04 | Saint-Gobain Vitrage | Transparent substrate coated with at least one thin deposit |
US7527868B2 (en) | 1997-07-21 | 2009-05-05 | Saint-Gobain Vitrage | Transparent substrate coated with at least one thin layer |
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