JPH02203442A - Optical disk substrate - Google Patents
Optical disk substrateInfo
- Publication number
- JPH02203442A JPH02203442A JP1023216A JP2321689A JPH02203442A JP H02203442 A JPH02203442 A JP H02203442A JP 1023216 A JP1023216 A JP 1023216A JP 2321689 A JP2321689 A JP 2321689A JP H02203442 A JPH02203442 A JP H02203442A
- Authority
- JP
- Japan
- Prior art keywords
- bis
- polyester
- acid
- optical disk
- resorcinol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims description 21
- 239000000758 substrate Substances 0.000 title claims description 19
- 229920000728 polyester Polymers 0.000 claims abstract description 12
- 229920001169 thermoplastic Polymers 0.000 claims abstract description 4
- 239000004416 thermosoftening plastic Substances 0.000 claims abstract description 4
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 abstract description 18
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 abstract description 12
- 230000009477 glass transition Effects 0.000 abstract description 10
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 abstract description 8
- 229920001225 polyester resin Polymers 0.000 abstract description 8
- 239000004645 polyester resin Substances 0.000 abstract description 8
- 150000002009 diols Chemical class 0.000 abstract description 2
- 239000002253 acid Substances 0.000 abstract 1
- 238000006068 polycondensation reaction Methods 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 description 13
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 12
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical group C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- -1 aliphatic glycols Chemical class 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
- 229930185605 Bisphenol Natural products 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N monomethylhydroquinone Natural products CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 150000005207 1,3-dihydroxybenzenes Chemical class 0.000 description 1
- WPZJSWWEEJJSIZ-UHFFFAOYSA-N 2,6-dibromo-4-[(3,5-dibromo-4-hydroxyphenyl)methyl]phenol Chemical compound C1=C(Br)C(O)=C(Br)C=C1CC1=CC(Br)=C(O)C(Br)=C1 WPZJSWWEEJJSIZ-UHFFFAOYSA-N 0.000 description 1
- WIFDRXSVRSCMMY-UHFFFAOYSA-N 2,6-dichloro-4-[(3,5-dichloro-4-hydroxyphenyl)methyl]phenol Chemical compound C1=C(Cl)C(O)=C(Cl)C=C1CC1=CC(Cl)=C(O)C(Cl)=C1 WIFDRXSVRSCMMY-UHFFFAOYSA-N 0.000 description 1
- GMVRBNZMOQKAPI-UHFFFAOYSA-N 2-chloro-4-(3-chloro-4-hydroxyphenoxy)phenol Chemical compound C1=C(Cl)C(O)=CC=C1OC1=CC=C(O)C(Cl)=C1 GMVRBNZMOQKAPI-UHFFFAOYSA-N 0.000 description 1
- SWZVJOLLQTWFCW-UHFFFAOYSA-N 2-chlorobenzene-1,3-diol Chemical compound OC1=CC=CC(O)=C1Cl SWZVJOLLQTWFCW-UHFFFAOYSA-N 0.000 description 1
- ISPYQTSUDJAMAB-UHFFFAOYSA-N 2-chlorophenol Chemical compound OC1=CC=CC=C1Cl ISPYQTSUDJAMAB-UHFFFAOYSA-N 0.000 description 1
- ZTMADXFOCUXMJE-UHFFFAOYSA-N 2-methylbenzene-1,3-diol Chemical compound CC1=C(O)C=CC=C1O ZTMADXFOCUXMJE-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- GXDIDDARPBFKNG-UHFFFAOYSA-N 4,4'-(Butane-1,1-diyl)diphenol Chemical compound C=1C=C(O)C=CC=1C(CCC)C1=CC=C(O)C=C1 GXDIDDARPBFKNG-UHFFFAOYSA-N 0.000 description 1
- RXNYJUSEXLAVNQ-UHFFFAOYSA-N 4,4'-Dihydroxybenzophenone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1 RXNYJUSEXLAVNQ-UHFFFAOYSA-N 0.000 description 1
- VWGKEVWFBOUAND-UHFFFAOYSA-N 4,4'-thiodiphenol Chemical compound C1=CC(O)=CC=C1SC1=CC=C(O)C=C1 VWGKEVWFBOUAND-UHFFFAOYSA-N 0.000 description 1
- LJHSHQLVJKWRKL-UHFFFAOYSA-N 4-(4-hydroxy-2-methylphenoxy)-3-methylphenol Chemical compound CC1=CC(O)=CC=C1OC1=CC=C(O)C=C1C LJHSHQLVJKWRKL-UHFFFAOYSA-N 0.000 description 1
- NZGQHKSLKRFZFL-UHFFFAOYSA-N 4-(4-hydroxyphenoxy)phenol Chemical compound C1=CC(O)=CC=C1OC1=CC=C(O)C=C1 NZGQHKSLKRFZFL-UHFFFAOYSA-N 0.000 description 1
- NOGYFAIHVRCHRE-UHFFFAOYSA-N 4-[(3,5-difluoro-4-hydroxyphenyl)methyl]-2,6-difluorophenol Chemical compound C1=C(F)C(O)=C(F)C=C1CC1=CC(F)=C(O)C(F)=C1 NOGYFAIHVRCHRE-UHFFFAOYSA-N 0.000 description 1
- MIFGCULLADMRTF-UHFFFAOYSA-N 4-[(4-hydroxy-3-methylphenyl)methyl]-2-methylphenol Chemical compound C1=C(O)C(C)=CC(CC=2C=C(C)C(O)=CC=2)=C1 MIFGCULLADMRTF-UHFFFAOYSA-N 0.000 description 1
- RSSGMIIGVQRGDS-UHFFFAOYSA-N 4-[(4-hydroxyphenyl)-phenylmethyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C1=CC=CC=C1 RSSGMIIGVQRGDS-UHFFFAOYSA-N 0.000 description 1
- LCYRQNBSGYQLKY-UHFFFAOYSA-N 4-[2-(4-hydroxynaphthalen-1-yl)propan-2-yl]naphthalen-1-ol Chemical compound C1=CC=C2C(C(C)(C=3C4=CC=CC=C4C(O)=CC=3)C)=CC=C(O)C2=C1 LCYRQNBSGYQLKY-UHFFFAOYSA-N 0.000 description 1
- YZYGDZRBLOLVDY-UHFFFAOYSA-N 4-[cyclohexyl-(4-hydroxyphenyl)methyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C1CCCCC1 YZYGDZRBLOLVDY-UHFFFAOYSA-N 0.000 description 1
- HXDOZKJGKXYMEW-UHFFFAOYSA-N 4-ethylphenol Chemical compound CCC1=CC=C(O)C=C1 HXDOZKJGKXYMEW-UHFFFAOYSA-N 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- SDDLEVPIDBLVHC-UHFFFAOYSA-N Bisphenol Z Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)CCCCC1 SDDLEVPIDBLVHC-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 238000012695 Interfacial polymerization Methods 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- KYPYTERUKNKOLP-UHFFFAOYSA-N Tetrachlorobisphenol A Chemical compound C=1C(Cl)=C(O)C(Cl)=CC=1C(C)(C)C1=CC(Cl)=C(O)C(Cl)=C1 KYPYTERUKNKOLP-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000021736 acetylation Effects 0.000 description 1
- 238000006640 acetylation reaction Methods 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 125000001118 alkylidene group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 125000001142 dicarboxylic acid group Chemical group 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000000877 morphologic effect Effects 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical class C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- YCWSUKQGVSGXJO-NTUHNPAUSA-N nifuroxazide Chemical group C1=CC(O)=CC=C1C(=O)N\N=C\C1=CC=C([N+]([O-])=O)O1 YCWSUKQGVSGXJO-NTUHNPAUSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 150000003022 phthalic acids Chemical class 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 239000011345 viscous material Substances 0.000 description 1
Landscapes
- Polyesters Or Polycarbonates (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、複屈折が低く、耐熱性に優れたポリエステル
系光ディスク基板に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a polyester optical disk substrate that has low birefringence and excellent heat resistance.
[従来の技術]
従来、透明で耐熱性に優れたポリエステル樹脂としては
、テレフタル酸、イソフタル酸などのジカルボン酸ユニ
ットと、ビスフェノールAユニットからなるものが、主
に用いられ、特開昭38−3598号公報などで古くか
ら周知である。[Prior Art] Conventionally, polyester resins that are transparent and have excellent heat resistance have mainly been composed of dicarboxylic acid units such as terephthalic acid and isophthalic acid, and bisphenol A units. It has been well known for a long time in publications such as No.
[発明が解決しようとする課題]
しかしながら、かかるポリエステル樹脂を光ディスク基
板として用いた場合には、樹脂の溶融流動性が悪いため
に、−船釣な射出成形による精密加工に不向きな上に、
複屈折が大きいといった問題があり、光ディスク基板と
しては、正確な記録、再生が困難になるという欠点を有
していた。[Problems to be Solved by the Invention] However, when such a polyester resin is used as an optical disk substrate, it is not suitable for precise processing by injection molding due to the poor melt flowability of the resin.
It has a problem of high birefringence, and as an optical disk substrate, it has the disadvantage of making accurate recording and reproduction difficult.
本発明は、かかる従来技術の欠点を解消しようとするも
のであり、従来の非品性ポリエステル樹脂の長所である
優れた耐熱性、透明性、低吸湿性などの性能に加えて、
優れた溶融流動性を有し、かつ、複屈折が極めて小さい
ため、正確な記録、再生が可能な光ディスク基板を提供
することを目的とする。The present invention aims to eliminate the drawbacks of such conventional techniques, and in addition to the advantages of conventional non-grade polyester resins such as excellent heat resistance, transparency, and low moisture absorption,
It is an object of the present invention to provide an optical disc substrate that has excellent melt flowability and extremely low birefringence, so that accurate recording and reproduction can be performed.
[課題を解決するための手段]
本発明は、上記目的を達成するために下記の構成を有す
る。[Means for Solving the Problems] The present invention has the following configuration to achieve the above object.
「下記一般式[A]に示す構造単位を含有してなる熱可
塑性芳香族ポリエステルを主成分としてなリ、垂直入射
シングルパスの複屈折が60nm未満であることを特徴
とする光ディスク基板。``An optical disk substrate characterized in that the main component is a thermoplastic aromatic polyester containing a structural unit represented by the following general formula [A], and the birefringence in a single pass of normal incidence is less than 60 nm.
本発明のポリエステル樹脂は、レゾルシノールまたはそ
の反応性誘導体と、フタル酸、テレフタル酸およびイソ
フタル酸から選ばれる少なくとも1つあるいはそれらの
反応性誘導体を重縮合せしめることによって得られるも
のであり、レゾルシノールをジオールの主成分として含
有することを特徴とする。The polyester resin of the present invention is obtained by polycondensing resorcinol or a reactive derivative thereof with at least one selected from phthalic acid, terephthalic acid, and isophthalic acid, or a reactive derivative thereof. It is characterized by containing it as a main component.
一般にフェニル環に代表される芳香環は、電子の分布状
態において環の水平方向と垂直方向とで大きな差があり
、芳香環が配向したポリカーボネート等のポリマでは、
これが複屈折の原因となっている。本発明においてレゾ
ルシノールのフェニル環は、立体障害により隣接するフ
タル酸、テレフタル酸およびイソフタル酸のフェニル環
と同一平面上に配向しにくいため、ポリマ全体としてフ
平面上に配向しにくいため、ポリマ全体としてフェニル
環の光学異方性が分子内で相殺されて複屈折は極めて小
さ(なる。さらに、ポリマ鎖自体は剛直でありながら屈
曲が大きな構造となるため、高い耐熱性(ガラス転移温
度)を保持したまま優れた溶融流動性が達成できる。In general, aromatic rings such as phenyl rings have a large difference in electron distribution between the horizontal and vertical directions of the ring, and in polymers such as polycarbonate in which aromatic rings are oriented,
This is the cause of birefringence. In the present invention, the phenyl ring of resorcinol is difficult to align on the same plane as the phenyl rings of adjacent phthalic acid, terephthalic acid, and isophthalic acid due to steric hindrance. The optical anisotropy of the phenyl ring is canceled out within the molecule, resulting in extremely low birefringence.Furthermore, the polymer chain itself has a rigid but highly curved structure, so it maintains high heat resistance (glass transition temperature). Excellent melt fluidity can be achieved while maintaining the temperature.
レゾルシノールの反応性誘導体としては、ジアセチル化
物が挙げられ、フタル酸、テレフタル酸およびイソフタ
ル酸の反応性誘導体としては、それらジカルボン酸のジ
クロライド、ジアルキルエステル、ジアリールエステル
などが挙げられる。Reactive derivatives of resorcinol include diacetylated products, and reactive derivatives of phthalic acid, terephthalic acid, and isophthalic acid include dichlorides, dialkyl esters, diaryl esters, etc. of these dicarboxylic acids.
本発明においては、ポリマの溶融流動性や強度を高める
ため、また、成形性を向上する目的で、ジオール成分の
30モル%未満の範囲で、エチレングリコール、プロピ
レングリコール、シクロヘキサン−1,4−ジメタツー
ルのごとく炭素数2〜10の脂肪族グリコールの1種ま
たは2種以上を併用したり、下記の一般式で表わされる
ビスフェノールを共重合することができる。In the present invention, in order to enhance the melt flowability and strength of the polymer, and also for the purpose of improving moldability, ethylene glycol, propylene glycol, cyclohexane-1,4-dimetatool, etc. It is possible to use one type or two or more types of aliphatic glycols having 2 to 10 carbon atoms in combination, or to copolymerize bisphenols represented by the following general formula.
(ただし、Xは、o、S、SO2,Co、アルキレン基
およびアルキリデン基よりなる群から選ばれ、Yは、O
Hおよびその反応性誘導体基から選ばれる。A I 、
A 2は、ハロゲンおよび炭化水素基からなる群から選
ばれる。m、 nは、0〜4の整数を示す。)
ここで好ましいハロゲンとしては、塩素、臭素などが挙
げられ、好ましい炭化水素基の例としては、メチル基、
エチル基、n−プロピル基などが挙げられる。また、Y
はOHおよびその反応性誘導体基から選ばれるが、反応
性誘導体基としては、CH3CO2基などが挙げられる
。ビスフェノールの具体例としては、4.4’−ジヒド
ロキシ−ジフェニルエーテル、ビス(4−ヒドロキシ−
2−メチルフェニル)−エーテル、ビス(4−ヒドロキ
シ−3−クロロフェニル)−エーテル、ビス(4−ヒド
ロキシフェニル)−サルファイド、ビス(4−ヒドロキ
シフェニル)−スルホン、ビス(4−ヒドロキシフェニ
ル)−ケトン、ビス(4−ヒドロキシフェニル)−メタ
ン、ビス(4−ヒドロキシ−3−メチルフェニル)−メ
タン、ビス(4−ヒドロキシ−3,5−ジクロロフェニ
ル)−メタン、ビス(4−ヒドロキシ−3,5−ジブロ
モフェニル)−メタン、ビス(4−ヒドキシ−3,5−
ジフルオロフェニル)−メタン、1.1−ビス(4−ヒ
ドロキシフェニル)−エタン、2.2−ビス(4−ヒド
ロキシ−3−メチルフェニル)−プロパン、2.2〜ビ
ス(4−ヒドロキシ−3−クロロフェニル)−プロパン
、2.2−ビス(4〜ヒドロキシ−3,5−ジクロロフ
ェニル)プロパン、1,1−ビス(4−ヒドロキシフェ
ニル)−n−ブタン、2,2−ビス(4−ヒドロキシ−
3,5−ジブロモフェニル)プロパン、ビス(4−ヒド
ロキシフェニル)−フェニルメタン、ビス(4−ヒドロ
キシフェニル)−シフエルメタン、ビス(4−ヒドロキ
シフェニル)−4′−メチルフェニルメタン、1゜1−
ビス(4−ヒドロキシフェニル) −2,2,21リ
クロロエタン、ビス(4−ヒドロキシフェニル)−4’
−クロロフェニルメタン、1,1−ビス(4−ヒドロキ
シフェニル)−シクロヘキサン、ビス(4−ヒドロキシ
フェニル)−シクロヘキシルメタン、2.2−ビス(4
−ヒドロキシナフチル)−プロパンなどがあげられるが
、もっとも−船釣に製造され代表的なものとしては、2
.2−ビス(4−ヒドロキシフェニル)プロパンすなわ
ちビスフェノールAが挙げられる。これらのビスフェノ
ール類は2種類以上の混合物として用いてもよく、また
、アセチル化などによる誘導体として用いてもよい。ま
た必要に応じて、少量の他の2価の化合物、例えば、2
.6−ジヒドロキシナフタレンのごときジヒドロキシナ
フタレン、ヒドロキノン、2.6−シヒドロキシトルエ
ン、2.6−シヒドロキシクロロベンゼン、3,6−シ
ヒドロキシトルエンなどを使用することができる。(However, X is selected from the group consisting of o, S, SO2, Co, alkylene group and alkylidene group, and Y is O
selected from H and its reactive derivative groups. AI,
A 2 is selected from the group consisting of halogen and hydrocarbon groups. m and n represent integers of 0 to 4. ) Here, preferred halogens include chlorine, bromine, etc., and preferred examples of hydrocarbon groups include methyl group,
Examples include ethyl group and n-propyl group. Also, Y
is selected from OH and its reactive derivative groups, and reactive derivative groups include CH3CO2 groups and the like. Specific examples of bisphenol include 4,4'-dihydroxy-diphenyl ether, bis(4-hydroxy-
2-methylphenyl)-ether, bis(4-hydroxy-3-chlorophenyl)-ether, bis(4-hydroxyphenyl)-sulfide, bis(4-hydroxyphenyl)-sulfone, bis(4-hydroxyphenyl)-ketone , bis(4-hydroxyphenyl)-methane, bis(4-hydroxy-3-methylphenyl)-methane, bis(4-hydroxy-3,5-dichlorophenyl)-methane, bis(4-hydroxy-3,5- dibromophenyl)-methane, bis(4-hydroxy-3,5-
difluorophenyl)-methane, 1.1-bis(4-hydroxyphenyl)-ethane, 2.2-bis(4-hydroxy-3-methylphenyl)-propane, 2.2-bis(4-hydroxy-3- chlorophenyl)-propane, 2,2-bis(4-hydroxy-3,5-dichlorophenyl)propane, 1,1-bis(4-hydroxyphenyl)-n-butane, 2,2-bis(4-hydroxy-
3,5-dibromophenyl)propane, bis(4-hydroxyphenyl)-phenylmethane, bis(4-hydroxyphenyl)-cyphelmethane, bis(4-hydroxyphenyl)-4'-methylphenylmethane, 1゜1-
Bis(4-hydroxyphenyl)-2,2,21lichloroethane, bis(4-hydroxyphenyl)-4'
-chlorophenylmethane, 1,1-bis(4-hydroxyphenyl)-cyclohexane, bis(4-hydroxyphenyl)-cyclohexylmethane, 2,2-bis(4
-Hydroxynaphthyl)-propane, etc., but the most typical ones manufactured for boat fishing are 2
.. 2-bis(4-hydroxyphenyl)propane or bisphenol A is mentioned. These bisphenols may be used as a mixture of two or more types, or may be used as derivatives by acetylation or the like. Also, if necessary, small amounts of other divalent compounds, e.g.
.. Dihydroxynaphthalenes such as 6-dihydroxynaphthalene, hydroquinone, 2,6-dihydroxytoluene, 2,6-dihydroxychlorobenzene, 3,6-dihydroxytoluene, and the like can be used.
また、ジカルボン酸成分の30モル%未満の範囲で、マ
ロン酸、コハク酸、アジピン酸のごとく、炭素数2〜1
0の脂肪族ジカルボン酸またはその反応性誘導体の1種
または2種以上を併用することも好ましい。In addition, within the range of less than 30 mol% of the dicarboxylic acid component, such as malonic acid, succinic acid, and adipic acid, which have 2 to 1 carbon atoms,
It is also preferable to use one or more types of aliphatic dicarboxylic acids or reactive derivatives thereof in combination.
ジオール成分中のレゾルシノールの割合が70モル%未
満になると複屈折が大きくなり、ジカルボン酸成分中の
フタル酸、テレフタル酸およびイソフタル酸合計の割合
が70モル%未満になると耐熱性が低下する。When the proportion of resorcinol in the diol component is less than 70 mol%, birefringence increases, and when the total proportion of phthalic acid, terephthalic acid and isophthalic acid in the dicarboxylic acid component is less than 70 mol%, heat resistance decreases.
本発明のポリエステルの製造法としては、特に制限を受
けることなく種々の方法が採用できる。Various methods can be employed for producing the polyester of the present invention without particular limitations.
例えば水と相溶性のない有機溶剤に溶解せしめた芳香族
ジカルボン酸クロライドとアルカリ水溶液に溶解せしめ
たジヒドロキシ化合物とを混合反応せしめる界面重合法
(特公昭40−1959号公報参照)、芳香族ジカルボ
ン酸クロライドとジヒドロキシ化合物とを有機溶媒中で
反応せしめる溶液重合法(特公昭37−5599号公報
参照)、芳香族ジカルボン酸フェニルエステルとジヒド
ロキシ化合物を溶融状態で重合せしめる方法(特公昭3
8−115247号公報、同43−28119号公報参
照)、芳香族ジカルボン酸とジヒドロキシ化合物のアセ
テートとを溶融状態で重合せしめる方法[1ndust
rial andEngineering Chemi
str7 vol 51 P47(1959)参照コな
どの方法を°適用することができる。For example, an interfacial polymerization method in which an aromatic dicarboxylic acid chloride dissolved in an organic solvent incompatible with water and a dihydroxy compound dissolved in an alkaline aqueous solution are mixed and reacted (see Japanese Patent Publication No. 40-1959), aromatic dicarboxylic acid A solution polymerization method in which a chloride and a dihydroxy compound are reacted in an organic solvent (see Japanese Patent Publication No. 37-5599), a method in which an aromatic dicarboxylic acid phenyl ester and a dihydroxy compound are polymerized in a molten state (Japanese Patent Publication No. 37-5599)
No. 8-115247, No. 43-28119), a method of polymerizing an aromatic dicarboxylic acid and an acetate of a dihydroxy compound in a molten state [1ndust
real and Engineering Chemi
A method such as that described in Str7 Vol 51 P47 (1959) can be applied.
この際通常の触媒、亜リン酸、リン酸またはこれらの誘
導体、フェノール誘導体などの安定剤などを必要に応じ
て使用してもよい。At this time, conventional catalysts, stabilizers such as phosphorous acid, phosphoric acid or derivatives thereof, phenol derivatives, etc. may be used as necessary.
また、本発明においては、光ディスクとして成形する方
法としては、生産性に優れた射出成形が好ましく適用で
きる。Furthermore, in the present invention, injection molding, which has excellent productivity, can be preferably applied as a method for molding the optical disc.
また、本発明の光ディスク基板は、前記のポリエステル
を主成分としてなるが、主成分とは基板のうち95重量
%以上含有してなることを意味する。光ディスク基板用
ポリマには透明性を損う添加剤の使用は避けなければな
らないが、離型剤、帯電防止剤、紫外線吸収剤、酸化防
止剤などの向および有機化合物の添加剤を必要に応じて
使用することができる。Further, the optical disc substrate of the present invention contains the above-mentioned polyester as a main component, and the term "main component" means that it contains 95% by weight or more of the substrate. Additives that impair transparency must be avoided in polymers for optical disk substrates, but additives such as mold release agents, antistatic agents, ultraviolet absorbers, and antioxidants, as well as organic compound additives, may be added as necessary. can be used.
レーザーで記録再生を行なう光ディスクでは、基板に用
いる樹脂の耐熱性の尺度であるガラス転移温度は100
℃以上であることが必要である。For optical discs that perform recording and playback using a laser, the glass transition temperature, which is a measure of the heat resistance of the resin used for the substrate, is 100%.
The temperature must be above ℃.
本発明においては、剛直な高分子鎖を構成するモノマを
使用することによってガラス転移温度を100℃以上、
好ましくは120℃以上にすることができる。ポリマの
ガラス転移温度は差動走査型熱量計(D S C)によ
って測定することができる。In the present invention, by using monomers constituting rigid polymer chains, the glass transition temperature can be increased to 100°C or higher.
Preferably, the temperature can be set to 120°C or higher. The glass transition temperature of a polymer can be measured by differential scanning calorimetry (D SC).
本発明のポリエステル樹脂は高いガラス転移温度を示す
にもかかわらず、比較的低い温度で溶融し、溶融ポリマ
の流動性が良好なため、比較的低温で成形することがで
きる。Although the polyester resin of the present invention exhibits a high glass transition temperature, it melts at a relatively low temperature and the molten polymer has good fluidity, so it can be molded at a relatively low temperature.
本発明のポリエステル樹脂から得られる光ディスク基板
の複屈折は、シングルパス垂直入射において60nm未
満であることが必要であり、好ましくは30nm以下、
さらに好ましくは10nm以下におさえることができる
。本発明においては、成形条件を厳密にコントロールす
ることなく、60nm未満の複屈折に押さえることがで
き、成形の歩留まりが高い。また、複屈折はエリプソメ
ーターによって測定することができる。また、透明性は
、ASTM D−1003法によって、測定すること
ができる。The birefringence of the optical disk substrate obtained from the polyester resin of the present invention needs to be less than 60 nm at single-pass normal incidence, preferably 30 nm or less,
More preferably, the thickness can be kept to 10 nm or less. In the present invention, the birefringence can be suppressed to less than 60 nm without strictly controlling the molding conditions, and the molding yield is high. Moreover, birefringence can be measured with an ellipsometer. Moreover, transparency can be measured by the ASTM D-1003 method.
さらに、本発明のポリエステルは常法に従い、加水分解
することにより構成単位を分析することができる。Further, the polyester of the present invention can be hydrolyzed to analyze its constituent units according to a conventional method.
本発明により得られたポリエステル系光ディスク基板は
、従来の優れた耐熱性、透明性、低吸湿性における性能
に加えて、複屈折が60nm未満であり、かつガラス転
移点が100℃以上という性能も満たし、その用途とし
ては、光ディスク基板の他にも、例えば、光学レンズ、
光カード用フィルムなどとして用いることができる。In addition to the conventional properties of excellent heat resistance, transparency, and low moisture absorption, the polyester optical disk substrate obtained by the present invention also has birefringence of less than 60 nm and a glass transition point of 100°C or higher. In addition to optical disk substrates, its uses include optical lenses,
It can be used as a film for optical cards, etc.
[実施例]
以下実施例をあげて本発明を説明する。実施例中のガラ
ス転移温度は、Dupont−990DSCを用い、1
0℃/分の昇温速度で加熱することによって測定した値
であり、極限粘度は25℃でオルソクロルフェノール溶
液として測定したときの値である。飽和吸水率は75℃
温水中に24時間放置後、重量変化によって計算した。[Example] The present invention will be described below with reference to Examples. The glass transition temperature in the examples was determined using Dupont-990DSC.
It is a value measured by heating at a temperature increase rate of 0° C./min, and the intrinsic viscosity is a value measured as an orthochlorophenol solution at 25° C. Saturated water absorption rate is 75℃
The weight change was calculated after being left in warm water for 24 hours.
複屈折はエリプソメーターを利用して、830nmにて
測定した。Birefringence was measured at 830 nm using an ellipsometer.
実施例1
5.5g (0,05モル)のレゾルシノール、4.2
gの水酸化ナトリウム、0.06gのトリエチルベンジ
ルアンモニウムクロライドを300m1の水に溶解した
。一方、5.08g (0,025モル)のテレフタル
酸クロライドと、同じく5゜08g (0,025モル
)のイソフタル酸クロライド(0,025モル)を15
0ccの塩化メチレンに溶解して、滴下ロートに仕込ん
だ。前記レゾルシノールのアルカリ水溶液を10℃に冷
却し、ホモミキサーで激しく撹拌しながら、テレフタル
酸およびイソフタル酸クロライドの塩化メチレン溶液を
5分間かけて滴下した。反応混合物を25℃でさらに1
時間撹拌したところポリマは粘稠物として析出した。上
部水性層を除き、残留物を強く撹拌しながら、500m
1の水で5回洗浄し、その後ポリマ溶液を塩化メチレン
150m1で希釈し濾過した。この溶液をメタノール中
に注入してポリマを分離し、これを120℃12時間真
空乾燥した。Example 1 5.5 g (0.05 mol) resorcinol, 4.2
g of sodium hydroxide, 0.06 g of triethylbenzylammonium chloride were dissolved in 300 ml of water. On the other hand, 5.08 g (0,025 mol) of terephthalic acid chloride and 5.08 g (0,025 mol) of isophthalic acid chloride (0,025 mol) were added to 15
It was dissolved in 0 cc of methylene chloride and charged into a dropping funnel. The alkaline aqueous solution of resorcinol was cooled to 10° C., and a methylene chloride solution of terephthalic acid and isophthalic acid chloride was added dropwise thereto over 5 minutes while vigorously stirring with a homomixer. The reaction mixture was heated at 25°C for an additional 1
After stirring for an hour, the polymer precipitated out as a viscous substance. The upper aqueous layer was removed and the residue was stirred vigorously for 500 m
The polymer solution was then diluted with 150 ml of methylene chloride and filtered. This solution was poured into methanol to separate the polymer, which was vacuum dried at 120° C. for 12 hours.
このポリエステルを280℃で射出成形し、厚み1.
2mm、 130mmφの円板を得た。This polyester was injection molded at 280°C to a thickness of 1.
A disk with a diameter of 2 mm and a diameter of 130 mm was obtained.
性能につい′て、結果を表1に示した。Regarding performance, the results are shown in Table 1.
ガラス転移温度は134℃と光ディスク基板として充分
に高く、複屈折はPMMAなみに優れていた。飽和吸水
率はポリカーボネートと同等で、吸水時の寸法変化は測
定誤差の範囲であった。さらに実用上充分な強度を有し
、光透過率は90%以上であった。The glass transition temperature was 134° C., which is high enough to be used as an optical disk substrate, and the birefringence was as good as that of PMMA. The saturated water absorption rate was equivalent to that of polycarbonate, and the dimensional change upon water absorption was within the measurement error. Furthermore, it had a strength sufficient for practical use, and a light transmittance of 90% or more.
実施例2
実施例1において、ビスフェノールAを20モル%用い
、さらに、レゾルシノールの割合を80モル%とした以
外は、実施例1と同様にしてポリエステル光ディスク基
板を得た。Example 2 A polyester optical disk substrate was obtained in the same manner as in Example 1, except that 20 mol% of bisphenol A was used and the proportion of resorcinol was 80 mol%.
結果を表1に示した。The results are shown in Table 1.
比較例ル
ゾルシノールを用いずに、ビスフェノールAを用いた以
外は、実施例1と同様に行なってポリエステル光ディス
ク基板を得た。Comparative Example A polyester optical disk substrate was obtained in the same manner as in Example 1, except that bisphenol A was used instead of lusorcinol.
結果を表1に示した。耐熱性は極めて良好であり、光透
過率も87%と優れているが、350°Cという高い成
形温度を必要とし、また、複屈折が大きいという致命的
な欠点を有していた。The results are shown in Table 1. Although it has extremely good heat resistance and excellent light transmittance of 87%, it requires a high molding temperature of 350°C and has the fatal disadvantage of high birefringence.
比較例2
レゾルシノールを用いずに、ヒドロキノンを用いて実施
例1と同様に重合を行ない、ポリマを分離した。得られ
たポリマは結晶性で不透明であり、500℃に加熱して
も溶融せず射出成形できなかった。Comparative Example 2 Polymerization was carried out in the same manner as in Example 1 using hydroquinone without using resorcinol, and the polymer was separated. The obtained polymer was crystalline and opaque, and even when heated to 500° C., it did not melt and could not be injection molded.
[発明の効果]
本発明の光ディスク基板は、複屈折が60nm未満とい
う特徴を有するため、ディスク基板材料として正確な記
録、再生が可能となる。[Effects of the Invention] Since the optical disc substrate of the present invention has a birefringence of less than 60 nm, accurate recording and reproduction can be performed as a disc substrate material.
また、耐熱性、低吸湿性が特に優れるため、寸法、形態
安定性に優れる。In addition, it has particularly excellent heat resistance and low moisture absorption, so it has excellent dimensional and morphological stability.
さらに、本発明のポリエステル樹脂は、高いガラス転移
温度を示すにもかかわらず、比較的低い温度で溶融し、
溶融ポリマの流動性が良好なため、加工成形が容易であ
る。Furthermore, although the polyester resin of the present invention exhibits a high glass transition temperature, it melts at a relatively low temperature,
Since the molten polymer has good fluidity, it is easy to process and mold.
Claims (1)
熱可塑性芳香族ポリエステルを主成分としてなり、垂直
入射シングルパスの複屈折が60nm未満であることを
特徴とする光ディスク基板。 ▲数式、化学式、表等があります▼[A](1) An optical disk substrate characterized in that the main component is a thermoplastic aromatic polyester containing a structural unit represented by the following general formula [A], and the birefringence at normal incidence single pass is less than 60 nm. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ [A]
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1023216A JPH02203442A (en) | 1989-02-01 | 1989-02-01 | Optical disk substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1023216A JPH02203442A (en) | 1989-02-01 | 1989-02-01 | Optical disk substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02203442A true JPH02203442A (en) | 1990-08-13 |
Family
ID=12104465
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1023216A Pending JPH02203442A (en) | 1989-02-01 | 1989-02-01 | Optical disk substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02203442A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007179680A (en) * | 2005-12-28 | 2007-07-12 | Toyobo Co Ltd | Magnetic recording medium |
-
1989
- 1989-02-01 JP JP1023216A patent/JPH02203442A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007179680A (en) * | 2005-12-28 | 2007-07-12 | Toyobo Co Ltd | Magnetic recording medium |
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