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JPH02208949A - Semiconductor manufacturing device - Google Patents

Semiconductor manufacturing device

Info

Publication number
JPH02208949A
JPH02208949A JP3024989A JP3024989A JPH02208949A JP H02208949 A JPH02208949 A JP H02208949A JP 3024989 A JP3024989 A JP 3024989A JP 3024989 A JP3024989 A JP 3024989A JP H02208949 A JPH02208949 A JP H02208949A
Authority
JP
Japan
Prior art keywords
inspection
wafer
semiconductor
defect
machines
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3024989A
Other languages
Japanese (ja)
Inventor
Hiroshi Nakamura
宏志 中村
Toshiaki Omori
大森 寿朗
Kakutarou Suda
須田 核太郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP3024989A priority Critical patent/JPH02208949A/en
Publication of JPH02208949A publication Critical patent/JPH02208949A/en
Pending legal-status Critical Current

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  • Testing Of Individual Semiconductor Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To perform reliably the judgement of the good or bad of data in the stage in the middle of inspection by a method wherein inspecting machines for semiconductor wafers are provided with read means, the sampling numbers of the waters and inspection information are prepared and history data is stored. CONSTITUTION:A prescribed treatment is performed on semiconductor wafers 1 and thereafter, the wafers 1 are housed in a cassette 3. Moreover, the wafers 1 are carried in inspecting machines (a first inspecting machine, a second inspecting machine to a (n)th inspecting machine) A1, A2 to An to correspond to processes and an inspection of pattern defect and the like is performed by a wafer defect inspecting device 60 of the machines. Here, the wafers 1 are automatically read the wafer numbers of their numbering parts 2 by wafer number detectors 7 during the transfer to the device 60. Then, inspection information on the result of the pattern defect inspection performed by the device 60 and the water numbers from the detectors 7, which are shown in such a way as to correspond to 1:1, is prepared and is stored in a main computor 8 through a communication line 12. This process is repeated and when wafer numbers identical with the wafer numbers stored in the computor 8 are detected by the detectors 7, the good or bad of data is reliably judged.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、半導体製造装置に関し、特に半導体ウェハ
上のパターン欠陥等を検査する場合のウェハ番号の自動
識別及び検査結果の処理に関するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to semiconductor manufacturing equipment, and particularly relates to automatic identification of wafer numbers and processing of inspection results when inspecting pattern defects on semiconductor wafers. .

〔従来の技術〕[Conventional technology]

第3図は従来の半導体製造装置における半導体ウェハの
検査機を示す構成図、第4図はその動作を説明するため
の図である。図において1は半導体ウェハ、2は該半導
体ウェハ1の試料番号印字部で、この部分にはウェハ番
号が例えばバーコード等の形で刻印または露光法等によ
り印字しである。3は該半導体ウェハ1を収納している
ウェハ収納カセット、Aは該半導体ウェハ1の検査を行
う検査機で、4は該ウェハ1を上記カセット3及び検査
機A間で搬送する搬送部である。ここで、上記検査機A
はウェハ番号やその他の情報を入力するための情報入力
端末5、及び該搬送部4から搬入されたウェハ1の欠陥
等の検査を行うウェハ欠陥検査装置6等から構成されて
おり、この半導体製造装置においてはこのような検査機
は各工程段階の製造処理装置それぞれに対応して配設さ
れている。
FIG. 3 is a block diagram showing a semiconductor wafer inspection machine in a conventional semiconductor manufacturing apparatus, and FIG. 4 is a diagram for explaining its operation. In the figure, 1 is a semiconductor wafer, and 2 is a sample number printing portion of the semiconductor wafer 1. On this portion, the wafer number is printed, for example, in the form of a bar code or the like by stamping or exposure. 3 is a wafer storage cassette that stores the semiconductor wafer 1, A is an inspection machine that inspects the semiconductor wafer 1, and 4 is a transport unit that transports the wafer 1 between the cassette 3 and the inspection machine A. . Here, the above inspection machine A
is composed of an information input terminal 5 for inputting wafer numbers and other information, and a wafer defect inspection device 6 for inspecting defects, etc. of the wafer 1 carried in from the transport section 4, and is used for semiconductor manufacturing. In the apparatus, such an inspection machine is arranged corresponding to each manufacturing processing apparatus at each process stage.

次に動作について説明する。Next, the operation will be explained.

まず、人が上記カセット3に収納された半導体ウェハ1
のウェハ番号を読み取り、これを情報入力端末5からウ
ェハ検査装置6に入力する。一方つエバ1は該番号入力
が行われた後搬送部4によりウェハ欠陥検査装置6内へ
搬入され、ここでその欠陥等の検査が行われる。そして
該検査終了後、ウェハ1は搬送部4によりカセット3内
に返却される。このような番号読み取り及び番号の入力
作業や欠陥検査は上記各検査機で行われる。
First, a person first removes the semiconductor wafer 1 stored in the cassette 3.
The wafer number is read and input into the wafer inspection device 6 from the information input terminal 5. On the other hand, after the number has been inputted, the evaporator 1 is carried into the wafer defect inspection apparatus 6 by the transport section 4, and is inspected for defects therein. After the inspection is completed, the wafer 1 is returned into the cassette 3 by the transport section 4. Such number reading and number input work and defect inspection are performed by each of the above-mentioned inspection machines.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

従来の半導体製造装置は以上のように構成されているの
で、ウェハ番号を人がT11!認し、さらにウェハ番号
を情報入力端末5から欠陥検査装置6へ手入力しなけれ
ばならず、このため半導体ウェハとその検査結果との対
応をとり難い等の問題点があった。そして個々の半導体
ウェハとその検査結果とが対応していない場合には、所
定の処理工程を経た半導体ウェハを検査する際に、該処
理工程の前の工程で生じた欠陥箇所を何回も検査するこ
とがあり、検査の時間を要するだけでなく、個々のウェ
ハについての途中段階での良不良判定を確実に行うこと
ができず、ファイナルテストまで工程が進まないとその
ウェハが良品か不良品かの判断ができない等の問題点が
あった。
Conventional semiconductor manufacturing equipment is configured as described above, so a person inputs the wafer number T11! In addition, it is necessary to manually input the wafer number from the information input terminal 5 to the defect inspection device 6, which poses problems such as difficulty in correlating semiconductor wafers with their inspection results. If the individual semiconductor wafers and their inspection results do not correspond, when inspecting the semiconductor wafers that have gone through a predetermined processing process, the defective areas that occurred in the process before the processing process are inspected many times. Not only does this require time for inspection, but it is also impossible to reliably determine whether each wafer is good or bad at an intermediate stage, and if the process does not proceed to the final test, it may be difficult to determine whether the wafer is good or defective. There were problems such as the inability to determine whether

この発明は上記のような問題点を解消するためになされ
たもので、ウェハ番号を自動的に認識することができ、
しかも個々の半導体ウェハの欠陥等の検査結果とそのウ
ェハ番号とを1対1に対応させて記憶保存することがで
きる半導体製造装置を得ることを目的とする。
This invention was made to solve the above problems, and it is possible to automatically recognize the wafer number.
Moreover, it is an object of the present invention to provide a semiconductor manufacturing apparatus that can store and store inspection results for defects, etc. of individual semiconductor wafers and their wafer numbers in one-to-one correspondence.

〔課題を解決するための手段〕[Means to solve the problem]

この発明に係る半導体製造装置は、各製造処理装置に対
して複数の検査機を配設し、かつこの検査機を、半導体
ウェハの試料番号を読み取る読取手段と、上記半導体ウ
ェハの欠陥検査をその欠陥履歴データに基づいて行うと
ともに、上記読取手段の出力を受け、個々のウェハの試
料番号と検査結果とが1対1に対応した検査情報を作成
するウェハ欠陥検査装置とから構成し、さらに各検査機
をメインコンピュータに接続して、各検査機からの検査
情報に基づいて各半導体ウェハについて上記欠陥履歴デ
ータを作成するようにしたものである。
The semiconductor manufacturing apparatus according to the present invention includes a plurality of inspection machines arranged for each manufacturing processing apparatus, and the inspection machine is equipped with a reading means for reading the sample number of the semiconductor wafer, and a defect inspection device for the semiconductor wafer. It is comprised of a wafer defect inspection device that performs inspection based on defect history data, receives the output of the reading means, and creates inspection information in which each wafer's sample number and inspection result correspond one-to-one; The inspection machines are connected to the main computer, and the defect history data is created for each semiconductor wafer based on inspection information from each inspection machine.

〔作用〕[Effect]

この発明においては、半導体ウェハの検査機に半導体ウ
ェハの試料番号を読み取る読取手段を設けたから、半導
体ウェハのウェハ番号を人手を介さずに自動的に読み取
ることができ、また上記検査機のウェハ欠陥検査装置を
、上記半導体ウェハの欠陥検査を行うとともに、上記読
取手段の出力を受け、個々のウェハの試料番号と検査結
果とが1対1に対応した検査情報を作成するよう構成し
たので、それぞれの製造処理段階で、個々の半導体ウェ
ハについての検査結果を得ることができる。
In this invention, since the semiconductor wafer inspection machine is provided with a reading means for reading the sample number of the semiconductor wafer, the wafer number of the semiconductor wafer can be automatically read without human intervention. The inspection device is configured to inspect the semiconductor wafers for defects, receive the output from the reading means, and create inspection information in which the sample number of each wafer corresponds to the inspection result on a one-to-one basis. Inspection results for individual semiconductor wafers can be obtained during the manufacturing process.

さらに上記検査情報をメインコンピュータに蓄えるとと
もに、所定の処理を施して個々の半導体ウェハについて
の欠陥履歴データを作成するようにしたので、欠陥検査
の際、前の製造処理に対する検査結果に基づいて検査を
行うことができ、つまり半導体ウェハ内の、すでに欠陥
と判定されている箇所については測定しなくても良くな
り、ファイナルテストまで工程が進んで検査する際にも
すでに欠陥と判定された場所は判定しないということが
可能となり、この結果検査時間を短縮することができる
。しかも各製造段階での検査結果を重ね合わせることに
より、半導体ウェハの欠陥等のマツピングも可能になる
In addition, the above inspection information is stored in the main computer and subjected to predetermined processing to create defect history data for each semiconductor wafer, so when inspecting defects, inspection results can be checked based on the inspection results from previous manufacturing processes. In other words, there is no need to measure locations within the semiconductor wafer that have already been determined to be defective, and even when the process progresses to the final test and is inspected, locations that have already been determined to be defective will not be measured. It becomes possible not to make a judgment, and as a result, the inspection time can be shortened. Moreover, by overlapping inspection results from each manufacturing stage, it is also possible to map defects in semiconductor wafers.

〔実施例〕〔Example〕

以下、この発明の一実施例を図について説明する。 An embodiment of the present invention will be described below with reference to the drawings.

第1図はこの発明の一実施例による半導体製造装置の構
成を示す図、第2図は該装置の動作を説明するためのブ
ロック図である。図において、第3図、第4図と同一符
号は同一または相当部分を示し、7は検査機Akのウェ
ハ搬送部4近傍に配置され、半導体ウェハ1のウェハ番
号を自動的に読み取るウェハ番号検知機(読取手段)、
60は該検知機7、情報入力端末5等から構成され、該
半導体ウェハ1の欠陥検査を行うとともに、該ウェハ番
号検知機7の出力を受け、個々のウェハの試料番号と検
査結果とが1対1に対応した検査情報1mを作成するウ
ェハ欠陥検査装置である。8は上記検査情報■にを蓄え
、しかも該情報IKを処理して個々の半導体ウェハにつ
いての欠陥履歴データを更新するメインコンピュータで
、上記検査機Akと同様な構成の各工程段階に対応した
検査機A、−A、%が接続されている。12はメインコ
ンピュータ8と検査機A1〜A、のウェハ欠陥検査装置
60とを接続している電話回線等の通信回線である。
FIG. 1 is a diagram showing the configuration of a semiconductor manufacturing apparatus according to an embodiment of the present invention, and FIG. 2 is a block diagram for explaining the operation of the apparatus. In the figure, the same reference numerals as in FIGS. 3 and 4 indicate the same or equivalent parts, and 7 is a wafer number detector placed near the wafer transfer section 4 of the inspection machine Ak, which automatically reads the wafer number of the semiconductor wafer 1. machine (reading means),
Reference numeral 60 is composed of the detector 7, the information input terminal 5, etc., and performs defect inspection of the semiconductor wafer 1, receives the output of the wafer number detector 7, and checks the sample number and inspection result of each wafer. This is a wafer defect inspection device that creates inspection information 1m corresponding to 1m. 8 is a main computer that stores the above inspection information (1) and processes the information IK to update defect history data for each semiconductor wafer, and has the same configuration as the above inspection machine Ak and performs inspection corresponding to each process step. Machines A, -A, and % are connected. 12 is a communication line such as a telephone line connecting the main computer 8 and the wafer defect inspection apparatus 60 of the inspection machines A1 to A.

次に動作について説明する。Next, the operation will be explained.

半導体ウェハ1は最初の製造工程で処理が施された後第
1図に示すようにカセット3に収納される。そして半導
体ウェハ1はこの工程に対応する検査機A1に搬入され
、その欠陥検査装置60によりパターン欠陥等の検査が
行われる。
After the semiconductor wafer 1 has been processed in the first manufacturing process, it is stored in a cassette 3 as shown in FIG. The semiconductor wafer 1 is then carried into an inspection machine A1 corresponding to this process, and its defect inspection device 60 inspects for pattern defects and the like.

すなわち、半導体ウェハ1は、ウェハ欠陥検査装置60
への搬送中、上記ウェハ番号検知機7によりその番号印
字部2のウェハ番号を自動的に読み取られる。
That is, the semiconductor wafer 1 is inspected by the wafer defect inspection device 60.
While the wafer is being transported, the wafer number on the number printing section 2 is automatically read by the wafer number detector 7.

次にウェハ欠陥検査装置60では、搬入されたウェハ1
の欠陥検査が行われてその検査結果が算出され、さらに
上記ウェハ番号検知機7からの検知出力、つまりウェハ
番号とこの検査結果とが1対1に対応した検査情報I、
が作成される。この検査情報11は通信回線12を介し
てメインコンピュータ8に送り込まれ、ここに蓄えられ
る。そして検査が終了するとウェハ1は再び搬送部4に
よりカセット3内に返却される。
Next, in the wafer defect inspection apparatus 60, the wafer 1
Defect inspection is performed and the inspection results are calculated, and the detection output from the wafer number detector 7, that is, inspection information I in which the wafer number and this inspection result correspond one-to-one,
is created. This inspection information 11 is sent to the main computer 8 via the communication line 12 and stored there. When the inspection is completed, the wafer 1 is returned to the cassette 3 by the transport section 4.

次に工程が進み、再びウェハを検査する際について説明
する。
Next, a description will be given of when the process advances and the wafer is inspected again.

上記工程の場合と同様に、2番目の工程を経てカセット
3に収納されているウェハ1は搬送部4により検査機A
2に搬入される。ここでも上記と同様にウェハ番号がウ
ェハ番号検知機7により自動認識され、ウェハ欠陥検査
装置60により検査されることとなる。この検査の際、
ウェハ番号検知機7により自動L’l R&されたウェ
ハ番号とメインコンピュータ8に蓄えられているウェハ
番号とが一致すれば、前の工程での検査で欠陥と判定さ
れた箇所はウェハ欠陥検査装置60では検査(走査)さ
れず、次の箇所にスキップすることとなる。そして検査
が終了すると、搬送部4によりカセット3内へ収納され
る。一方得られた検査結果は上記と同様、これとウェハ
の番号とが1対1に対応する検査情報■2として上記メ
インコンピュータ8に蓄積される。またメインコンピュ
ータ8では検査情報■、及びI2を重ね合わせて半導体
ウェハの製造での欠陥履歴データの作成も行う。
As in the case of the above process, the wafer 1 stored in the cassette 3 after the second process is transferred to the inspection machine A by the transport section 4.
2 will be carried in. Here too, the wafer number is automatically recognized by the wafer number detector 7 and inspected by the wafer defect inspection device 60 in the same manner as above. During this inspection,
If the wafer number automatically L'l R&ed by the wafer number detector 7 and the wafer number stored in the main computer 8 match, the wafer defect inspection device detects the location determined to be defective in the previous process. At 60, the inspection (scanning) is not performed and the process skips to the next location. When the inspection is completed, the paper is stored in the cassette 3 by the transport section 4. On the other hand, the obtained inspection results are stored in the main computer 8 as inspection information (2) in which the inspection results and the wafer numbers correspond one-to-one, as described above. The main computer 8 also creates defect history data in the manufacture of semiconductor wafers by superimposing the inspection information (1) and I2.

そしてこのような半導体ウェハの検査は各工程の製造処
理毎に行われ、それぞれの検査において得られた検査情
報1.がメインコンピュータ8に蓄積され、またこれに
基づく欠陥履歴データも蓄えられる。
Such semiconductor wafer inspection is performed for each manufacturing process, and the inspection information 1. obtained in each inspection is used. is stored in the main computer 8, and defect history data based on this is also stored.

このように本実施例では、ウェハの検査機A1〜A7に
ウェハ番号検知機7を設けてウェハ番号を自動認識する
ようにしたので、ウェハ番号の確認を人が行う必要がな
くなり、人間が介在しなくても検査可能となる。また検
査機A1〜A、のウェハ欠陥検査装置60を、半導体ウ
ェハ1の欠陥検査を行うとともに、上記ウェハ番号検知
機7の出力を受け、個々のウェハの試料番号と検査結果
とが1対1に対応した検査情報を作成するよう構成した
ので、それぞれの製造処理段階で、個々の半導体ウェハ
についての検査結果を得ることができる。
As described above, in this embodiment, the wafer number detector 7 is installed in the wafer inspection machines A1 to A7 to automatically recognize the wafer number, so there is no need for a person to check the wafer number, and human intervention is eliminated. Inspection is possible even if you do not. In addition, the wafer defect inspection device 60 of the inspection machines A1 to A is used to inspect the semiconductor wafer 1 for defects, and receives the output of the wafer number detector 7, so that the sample number of each wafer and the inspection result are 1:1. Since the configuration is configured to create inspection information corresponding to the above, inspection results for each semiconductor wafer can be obtained at each manufacturing processing stage.

またウェハ欠陥検査装置60をメインコンピュータに接
続し、ウェハ番号と検査結果を1対1に対応した検査情
報を蓄えておくようにしたので、欠陥検査の際、前の製
造処理に対する検査結果に基づいて検査を行うことがで
き、つまり半導体ウェハ内の、すでに欠陥と判定されて
いる箇所については測定しなくても良くなり、次の検査
の際に前の検査の段階で欠陥と判定された場所は再び検
査されない。このことはファイナルテストまで工程が進
まなくても、そのウェハの欠陥状態が認識でき、途中の
工程でも不良品の判定ができることにもなる。さらに次
の工程で不良箇所を修復することも可能となる。つまり
次の工程でも前の工程と同様な処理を行う場合には、上
記検査結果に基づいて不良箇所に対して修復処理を施す
こともできる。
In addition, the wafer defect inspection device 60 is connected to the main computer to store inspection information that corresponds one-to-one between wafer numbers and inspection results. In other words, it is not necessary to measure the parts of the semiconductor wafer that have already been determined to be defective, and during the next inspection, the parts that were determined to be defective at the previous inspection stage can be inspected. is not checked again. This means that even if the process does not proceed to the final test, the defective state of the wafer can be recognized, and defective products can be determined even during the process. Furthermore, it becomes possible to repair defective parts in the next process. In other words, if the same process as the previous process is to be performed in the next process, it is also possible to perform a repair process on the defective location based on the above inspection results.

また個々の半導体ウェハについての欠陥履歴データを各
製造段階での検査結果に基づいて作成するようにしたの
で、ウェハマンピングが可能となり欠陥場所も一目でわ
かる。そのため検査時における時間の短縮、さらには、
写真製版技術工程(特に露光技術)でも欠陥場所は写真
製版技術を行わない等して処理時間の短縮を図ることが
できる。
Furthermore, since defect history data for each semiconductor wafer is created based on the inspection results at each manufacturing stage, wafer manipulating is possible and defect locations can be seen at a glance. As a result, the time required for inspection is reduced, and furthermore,
Even in the photolithography process (particularly exposure technology), processing time can be shortened by not performing photolithography on defective locations.

なお、上記実施例ではウェハ番号検知機7をウェハ欠陥
検査装置60とは別体で独立したものとしたが、これは
該ウェハ欠陥装置60内に組み込んでもよく、この場合
も上記実施例と同様な効果を奏する。
In the above embodiment, the wafer number detector 7 is separate and independent from the wafer defect inspection device 60, but it may be incorporated into the wafer defect inspection device 60. It has a great effect.

〔発明の効果〕〔Effect of the invention〕

以上のようにこの発明に係る半導体製造装置によれば、
各製造処理装置に対して複数の検査機を配設し、かつこ
の検査機を、半導体ウェハの試料番号を読み取る読取手
段と、上記半導体ウェハの欠陥検査をその欠陥履歴デー
タに基づいて行うとともに、上記読取出力に基づいて個
々のウェハの試料番号と検査結果とが1対1に対応した
検査情報の作成を行うウェハ欠陥検査装置とから構成し
、さらに各検査機をメインコンピュータに接続し、各検
査機からの検査情報に基づいて各半導体ウェハについて
上記欠陥履歴データを作成するようにしたので、ウェハ
番号を自動的に認識することができるとともに、半導体
ウェハの検査をその欠陥状態に応じて行うことができ、
これにより半導体ウェハの検査処理、ひいては製造処理
を効率よく短時間で行うことができる効果がある。
As described above, according to the semiconductor manufacturing apparatus according to the present invention,
A plurality of inspection machines are arranged for each manufacturing processing device, and the inspection machine is equipped with a reading means for reading the sample number of the semiconductor wafer, and performs defect inspection of the semiconductor wafer based on the defect history data, The system consists of a wafer defect inspection device that creates inspection information with a one-to-one correspondence between the sample number of each wafer and the inspection result based on the read output, and each inspection device is connected to the main computer. Since the defect history data described above is created for each semiconductor wafer based on the inspection information from the inspection machine, the wafer number can be automatically recognized and the semiconductor wafer can be inspected according to its defect status. It is possible,
This has the effect that semiconductor wafer inspection processing and, by extension, manufacturing processing can be carried out efficiently and in a short time.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の一実施例による半導体製造装置を示
す構成図、第2図は該装置の動作を説明するためのブロ
ック図、第3図は従来の半導体製造装置における検査機
の構成図、第4図はその動作を説明するための図である
。 1・・・半導体ウェハ、2・・・ウェハ番号印字部、3
・・・ウェハ収納カセット、4・・・ウェハ搬送部、5
・・・情報入力端末、6,60・・・ウェハ欠陥検査装
置、7・・・ウェハ番号検知機、8・・・メインコンピ
ュータ、A1〜A、、・・・検査機、r・・・検査情報
、12は通信回線。 なお図中同一符号は同−又は相当部分を示す。
FIG. 1 is a configuration diagram showing a semiconductor manufacturing device according to an embodiment of the present invention, FIG. 2 is a block diagram for explaining the operation of the device, and FIG. 3 is a configuration diagram of an inspection machine in a conventional semiconductor manufacturing device. , FIG. 4 is a diagram for explaining the operation. 1... Semiconductor wafer, 2... Wafer number printing section, 3
... Wafer storage cassette, 4... Wafer transport section, 5
... Information input terminal, 6,60... Wafer defect inspection device, 7... Wafer number detector, 8... Main computer, A1-A,... Inspection machine, r... Inspection Information, 12 is a communication line. Note that the same reference numerals in the figures indicate the same or equivalent parts.

Claims (1)

【特許請求の範囲】[Claims] (1)試料番号を付した半導体ウェハに製造処理を施す
複数の製造処理装置と、該各装置に対応して配設され、
処理された半導体ウェハを検査履歴データに基づいて検
査する複数の検査機とを備えた半導体製造装置において
、 上記検査機を、 上記試料番号を読み取る読取手段と、 上記半導体ウェハの検査を行うとともに、上記読取出力
に基づいて個々のウェハの試料番号と検査結果とが1対
1に対応した検査情報の作成を行うウェハ欠陥検査装置
とから構成し、 上記各検査機からの検査情報を記憶し、かつ該検査情報
に基づき各半導体ウェハについて上記検査履歴データを
作成し記憶するデータ作成記憶手段を設けたことを特徴
とする半導体製造装置。
(1) A plurality of manufacturing processing equipment that performs manufacturing processing on semiconductor wafers with sample numbers attached, and arranged corresponding to each of the equipment,
In a semiconductor manufacturing apparatus equipped with a plurality of inspection machines that inspect processed semiconductor wafers based on inspection history data, the inspection machines are equipped with reading means for reading the sample number, and inspect the semiconductor wafers; a wafer defect inspection device that creates inspection information in which each wafer's sample number and inspection result correspond one-to-one based on the read output, and stores inspection information from each of the inspection machines; A semiconductor manufacturing apparatus, further comprising data creation storage means for creating and storing the inspection history data for each semiconductor wafer based on the inspection information.
JP3024989A 1989-02-09 1989-02-09 Semiconductor manufacturing device Pending JPH02208949A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3024989A JPH02208949A (en) 1989-02-09 1989-02-09 Semiconductor manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3024989A JPH02208949A (en) 1989-02-09 1989-02-09 Semiconductor manufacturing device

Publications (1)

Publication Number Publication Date
JPH02208949A true JPH02208949A (en) 1990-08-20

Family

ID=12298436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3024989A Pending JPH02208949A (en) 1989-02-09 1989-02-09 Semiconductor manufacturing device

Country Status (1)

Country Link
JP (1) JPH02208949A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04159747A (en) * 1990-10-23 1992-06-02 Nec Corp Data control analyzation system
JPH0574888A (en) * 1991-09-17 1993-03-26 Nec Yamagata Ltd Wafer probing device
JPH05121521A (en) * 1991-10-29 1993-05-18 Komatsu Electron Metals Co Ltd Apparatus and method for manufacture of semiconductor wafer
EP0654739A1 (en) * 1993-11-22 1995-05-24 Nec Corporation Automatic repair data editing system associated with repairing system for semiconductor integrated circuit device
JPH09148387A (en) * 1995-11-22 1997-06-06 Nec Corp Apparatus for processing semiconductor product
WO2000014790A1 (en) * 1998-09-03 2000-03-16 Hitachi, Ltd. Inspection system and method for producing electronic device by using the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58103151A (en) * 1981-12-16 1983-06-20 Matsushita Electric Ind Co Ltd Inspection of semiconductor substrate
JPS62118512A (en) * 1985-11-19 1987-05-29 Matsushita Electric Ind Co Ltd Manufacture of semiconductor element
JPH01308042A (en) * 1988-06-06 1989-12-12 Nec Corp Manufacture of semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58103151A (en) * 1981-12-16 1983-06-20 Matsushita Electric Ind Co Ltd Inspection of semiconductor substrate
JPS62118512A (en) * 1985-11-19 1987-05-29 Matsushita Electric Ind Co Ltd Manufacture of semiconductor element
JPH01308042A (en) * 1988-06-06 1989-12-12 Nec Corp Manufacture of semiconductor device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04159747A (en) * 1990-10-23 1992-06-02 Nec Corp Data control analyzation system
JPH0574888A (en) * 1991-09-17 1993-03-26 Nec Yamagata Ltd Wafer probing device
JPH05121521A (en) * 1991-10-29 1993-05-18 Komatsu Electron Metals Co Ltd Apparatus and method for manufacture of semiconductor wafer
EP0654739A1 (en) * 1993-11-22 1995-05-24 Nec Corporation Automatic repair data editing system associated with repairing system for semiconductor integrated circuit device
US5568408A (en) * 1993-11-22 1996-10-22 Nec Corporation Automatic repair data editing system associated with repairing system for semiconductor integrated circuit device
JPH09148387A (en) * 1995-11-22 1997-06-06 Nec Corp Apparatus for processing semiconductor product
WO2000014790A1 (en) * 1998-09-03 2000-03-16 Hitachi, Ltd. Inspection system and method for producing electronic device by using the same

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