JPH01227235A - Information recording medium - Google Patents
Information recording mediumInfo
- Publication number
- JPH01227235A JPH01227235A JP63051585A JP5158588A JPH01227235A JP H01227235 A JPH01227235 A JP H01227235A JP 63051585 A JP63051585 A JP 63051585A JP 5158588 A JP5158588 A JP 5158588A JP H01227235 A JPH01227235 A JP H01227235A
- Authority
- JP
- Japan
- Prior art keywords
- recording medium
- recording layer
- substrate
- information recording
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052711 selenium Inorganic materials 0.000 claims abstract description 11
- 229910052714 tellurium Inorganic materials 0.000 claims abstract description 10
- 229910052732 germanium Inorganic materials 0.000 claims abstract description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims description 2
- 238000004544 sputter deposition Methods 0.000 abstract description 15
- 239000000758 substrate Substances 0.000 abstract description 14
- 238000002425 crystallisation Methods 0.000 abstract description 9
- 230000008025 crystallization Effects 0.000 abstract description 9
- 229910002056 binary alloy Inorganic materials 0.000 abstract description 6
- 239000013078 crystal Substances 0.000 abstract description 2
- 230000007704 transition Effects 0.000 abstract 3
- 238000002310 reflectometry Methods 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 22
- 239000011669 selenium Substances 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 11
- 239000000463 material Substances 0.000 description 9
- 150000004770 chalcogenides Chemical class 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 239000011241 protective layer Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 4
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 3
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 206010011878 Deafness Diseases 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- -1 SiO2 Chemical class 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 231100000895 deafness Toxicity 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 208000016354 hearing loss disease Diseases 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
[発明の目的]
(産業上の利用分野)
本発明は記録用の光ビームの照射により記録層の原子配
列の変化に伴う光学的特性の変化を生じさせて、情報の
記録、消去を繰返し行い、光学的特性の変化を検出して
情報を再生する情報記録媒体に関する。Detailed Description of the Invention [Objective of the Invention] (Industrial Application Field) The present invention produces information by causing a change in optical properties due to a change in the atomic arrangement of the recording layer by irradiation with a recording light beam. The present invention relates to an information recording medium that reproduces information by repeatedly recording and erasing information and detecting changes in optical characteristics.
(従来の技術)
従来広(開発がなされている記録、消去が可能な情報記
録媒体には光ビームの照射による原子配列の変化に利用
したものがある。(Prior Art) Among the recordable and erasable information recording media that have been widely developed in the past, there are those that use light beam irradiation to change the atomic arrangement.
このような情報記録媒体に情報を記録する際には、まず
情報記録層に光ビームを全面照射して加熱し、記録層を
結晶性の高い状態(以下結晶状聾という)にする。次に
短い強いパルス光を照射し、記録層を加熱急冷する。す
るとパルス照射部の結晶性が低下しだ状態(以下非晶質
状態という)となり、情報が記録される。上記の結晶状
態と非晶質状態では、原子配列が異なることから、光学
的特性(反射率、透過率)が変化するため、この光学的
特性の変化を検出して情報を再生することができる。書
込まれた情報を消去するには、長い弱いパルス光を照射
して加熱徐冷し、原子配列を変化させ、再び結晶状態と
する。When recording information on such an information recording medium, the information recording layer is first irradiated with a light beam over the entire surface and heated to bring the recording layer into a highly crystalline state (hereinafter referred to as crystalline deafness). Next, a short, strong pulse of light is irradiated to heat and rapidly cool the recording layer. Then, the crystallinity of the pulse irradiated area begins to deteriorate (hereinafter referred to as an amorphous state), and information is recorded. The optical properties (reflectance, transmittance) change between the crystalline state and the amorphous state because the atomic arrangement is different, so information can be reproduced by detecting changes in these optical properties. . To erase the written information, the material is heated and slowly cooled by irradiation with long, weak pulsed light to change the atomic arrangement and return to a crystalline state.
このように光−ビームの照射条件によって原子配列を変
化させ、情報を記録、消去する記録層の材料としては、
反射率変化の特に大きなTe、Se。Materials for the recording layer that record and erase information by changing the atomic arrangement depending on the light beam irradiation conditions are as follows:
Te and Se have particularly large reflectance changes.
Geなどカルコゲナイド系元素を主成分とする半導体非
晶質が提案されている。しかし半導体装置質以外にもG
rとNiとの2元合金においてはGrの含有率が15原
子%以上85%以下の範囲で上記と同様に光ビームの照
射条件の違いにより、金属結晶と金属非晶質とに繰返し
変化しうろことが見い出された。ところがこれらの金属
合金においては相変化に伴う光学的特性の変化が記録材
料として使用できるほど充分大きくない。又、結晶化温
度か低く室温での非晶質状態の安定性が悪いなどの問題
点があり、情報記録媒体として使うことができない。Semiconductor amorphous materials containing chalcogenide-based elements such as Ge as a main component have been proposed. However, in addition to semiconductor device quality, G
In a binary alloy of r and Ni, when the Gr content is in the range of 15 atomic % or more and 85 atomic % or less, it repeatedly changes into metallic crystal and metallic amorphous depending on the difference in the light beam irradiation conditions as described above. Scales were discovered. However, in these metal alloys, changes in optical properties due to phase change are not large enough to allow them to be used as recording materials. In addition, there are problems such as low crystallization temperature and poor stability of the amorphous state at room temperature, making it impossible to use it as an information recording medium.
(発明が解決しようとする課題)
以上詳述したようにNiとGr(15原子%≦Gr≦8
5原子%)との2元合金では、結晶化温度が低く室温に
おける非晶質状態の安定性が悪く、また、相変化に伴う
光学的特性の変化が小さいため、情報記録媒体の材料と
しては使用できなかった。(Problems to be Solved by the Invention) As detailed above, Ni and Gr (15 atomic %≦Gr≦8
5 at%), the crystallization temperature is low, the stability of the amorphous state at room temperature is poor, and the change in optical properties due to phase change is small, so it is not suitable as a material for information recording media. Couldn't use it.
上記課題を解決するために、本発明ではNlとG「との
2元合金にカルコゲナイド元素Te、Se、Geを加え
ることにより、結晶化温度を高めて室温における非晶質
状態を安定させ、又、相変化に伴う光学的特性の変化】
を増大させ、情報記録媒体として使いうる材料を提供す
ることを目的とする。In order to solve the above problems, the present invention adds chalcogenide elements Te, Se, and Ge to a binary alloy of Nl and G to increase the crystallization temperature and stabilize the amorphous state at room temperature. , change in optical properties due to phase change]
The purpose is to provide materials that can be used as information recording media.
[発明の構成]
(課題を解決するための手段と作用)
本発明の情報記録媒体は例えば第1図に示されるような
断′面構造を有する。第1図において情報記録媒体は基
板1とこの基板1上に無機物保護層3.光記録層2.無
機物保護層3.有機物保護層4を順次備えて構成されて
いる。[Structure of the Invention] (Means and Effects for Solving the Problems) The information recording medium of the present invention has a cross-sectional structure as shown in FIG. 1, for example. In FIG. 1, the information recording medium includes a substrate 1 and an inorganic protective layer 3 on the substrate 1. Optical recording layer 2. Inorganic protective layer 3. It is constructed by sequentially comprising organic protection layers 4.
基板1はガラスやプラスチック材料(例えばポリオレフ
ィン、エポキシ、ポリカーボネイト、ポリメシルメタク
リレート等)からなる。The substrate 1 is made of glass or plastic material (eg, polyolefin, epoxy, polycarbonate, polymethacrylate, etc.).
無機物保護層3は光記録層2の経時変化を防ぐために光
記録5噛2の両側を挾んだ構造となっており、金属又は
半金属の酸化物、弗化物、硫化物。The inorganic protective layer 3 has a structure sandwiching both sides of the optical recording layer 2 in order to prevent the optical recording layer 2 from deteriorating over time, and is made of a metal or metalloid oxide, fluoride, or sulfide.
窒化物例えばSiO2,Al□03.AIN。Nitride such as SiO2, Al□03. A.I.N.
ZnSなどの誘電体からなる。この無機物保護層は反射
光を増幅させる機能も有する。有機物保護層4は、紫外
線硬化樹脂からなり、この情報記録媒体を取扱う場合の
表面での傷や埃を防止するために配設されている。It is made of dielectric material such as ZnS. This inorganic protective layer also has the function of amplifying reflected light. The organic protection layer 4 is made of an ultraviolet curing resin and is provided to prevent scratches and dust on the surface when handling this information recording medium.
このような組成の記録層は多元同時スパッタ法により成
膜する。すなわち、使用されるスパッタ装置は第2図及
び第3図に示す通りである。第2図中11は真空容器で
あり、ガス排気ボート12を介して排気装置13に接続
され、ガス導入ボート14を介してアルゴンガスボンベ
15に接続されている。真空容器11内の上部には、基
板16か支持装置17に水平に支架され支持装置17に
より回転駆動できる。又、真空容器11の底部には、所
定元素で形成されたスパッタ源18,19゜20か設け
られ、各スパッタ源上部にはモニタ装置21,22.2
3が設けられている。A recording layer having such a composition is formed by a multi-source simultaneous sputtering method. That is, the sputtering equipment used is as shown in FIGS. 2 and 3. Reference numeral 11 in FIG. 2 is a vacuum container, which is connected to an exhaust device 13 via a gas exhaust boat 12 and to an argon gas cylinder 15 via a gas introduction boat 14. At the upper part of the vacuum container 11, a substrate 16 is supported horizontally on a support device 17 and can be rotated by the support device 17. Furthermore, sputtering sources 18, 19.20 made of a predetermined element are provided at the bottom of the vacuum chamber 11, and monitor devices 21, 22.2 are provided above each sputtering source.
3 is provided.
この装置により、記録層の成膜を行なう場合には、まず
排気装置13により、真空容器11内を10−6T o
rr台の真空度まで排気する。次いでガス導入ボート1
4よりArガスを導入し排気装置13の排気量を調節し
て真空容器11内を所定の減圧下に保持する。そして基
板16を回転させつつスパッタ源18.19.20に所
定時間電力を印加する。これにより基板16に記録層が
形成される。When forming a recording layer using this apparatus, first, the inside of the vacuum chamber 11 is heated to 10-6T o using the exhaust device 13.
Evacuate to a vacuum level of rr level. Next, gas introduction boat 1
Ar gas is introduced from 4 and the exhaust amount of the exhaust device 13 is adjusted to maintain the inside of the vacuum container 11 under a predetermined reduced pressure. Then, while rotating the substrate 16, power is applied to the sputtering sources 18, 19, and 20 for a predetermined period of time. As a result, a recording layer is formed on the substrate 16.
(実施例)
上記のような構造の情報記録媒体の特性を試験した実験
結果を以下に述べる。(Example) The experimental results of testing the characteristics of the information recording medium having the above structure will be described below.
一実験1−
第2図の真空容器11内にNiとGrとTeのスパッタ
源を設け、容器内を5 X 1O−6T orrまで排
気した。次にArガスを導入して5 X 1O−3T
orrに全体の圧力を調節した。基板として充分に洗浄
した外径130nm 、板厚1.2■の円板状ポリカー
ボネート基板を用い、この基板を60rp11で回転1
つつモニタにより各元素のスパッタ量をモニタして各ス
パッタ源1こ投入する電力をコントロールし、全体の膜
厚LOOOAになるまで各元素を堆積させて・記録層を
成膜した。Ni2□Gr7gに対してテルルセレンの含
有量をしだいに増加させ高感度DSC(示差°走査熱量
計)で昇温速度10℃/ff1I11で結晶化温度を測
定しテルル、セレンの含有量と結晶化温度の関係を調べ
た。結果は第4図に示す通りである。テルル、セレンの
含有量に関係なく結晶化温度か充分高かった。又、Ge
でも同様の効果が得られた。Experiment 1 - Ni, Gr, and Te sputtering sources were provided in the vacuum container 11 shown in FIG. 2, and the inside of the container was evacuated to 5×1O−6 Torr. Next, introduce Ar gas to 5 x 1O-3T
The total pressure was adjusted to orr. A thoroughly cleaned disc-shaped polycarbonate substrate with an outer diameter of 130 nm and a plate thickness of 1.2 mm was used as the substrate, and this substrate was rotated 1 time at 60 rpm.
A recording layer was formed by monitoring the amount of sputtering of each element using a monitor and controlling the power applied to each sputtering source, and depositing each element until the total film thickness was LOOOA. The tellurium selenium content was gradually increased for 7 g of Ni2□Gr, and the crystallization temperature was measured using a high-sensitivity DSC (differential degree scanning calorimeter) at a heating rate of 10°C/ff1I11 to determine the tellurium and selenium contents and crystallization temperature. We investigated the relationship between The results are shown in FIG. The crystallization temperature was sufficiently high regardless of the tellurium and selenium contents. Also, Ge
However, the same effect was obtained.
したがってNi 、Gr、X (X−Te、Se。Therefore, Ni, Gr, X (X-Te, Se.
Ge)からなる情報記録媒体は組成比に関係なく結晶化
温度が充分高く、非晶質状態が安定であることかわかる
。It can be seen that the information recording medium made of Ge) has a sufficiently high crystallization temperature regardless of the composition ratio, and the amorphous state is stable.
一実験2−
実験1と同様の方法でNi とG「とX (X−Te、
Se)の3元記録層を多元同時スパッタ法で成膜し波長
790nmの光を照射してその表面反射率を11定した
。結果は第4図に示す通りである。カコゲナイト元素T
e、Seの含有量が増すと反射率の変化量も増大するこ
とがわかる。NiとGrとの組成比を変えも同様の効果
が得られた。更にTe。1 Experiment 2 - Using the same method as Experiment 1, Ni, G' and X (X-Te,
A ternary recording layer of Se) was formed by a multi-component simultaneous sputtering method, and the surface reflectance was determined to be 11 by irradiating light with a wavelength of 790 nm. The results are shown in FIG. Chacogenite element T
It can be seen that as the content of e and Se increases, the amount of change in reflectance also increases. Similar effects were obtained by changing the composition ratio of Ni and Gr. Furthermore, Te.
Seの代わりにGeを加えた場合にも同様の効果が得ら
れた。以上の実験結果からNiとG「との2元合金にカ
ルコゲナイド元素を加えることにより相変化に伴なう反
射率変化量が増大し、ひいては得られる再生信号量も増
大することがわかる。A similar effect was obtained when Ge was added instead of Se. The above experimental results show that by adding a chalcogenide element to a binary alloy of Ni and G, the amount of change in reflectance due to phase change increases, and the amount of reproduced signal obtained also increases.
−実験3−
ここでは成膜された合金薄膜の非晶質状態の安全性を調
べた。-Experiment 3- Here, the safety of the amorphous state of the formed alloy thin film was investigated.
ガラス基板上にS i O21QOnm 、光記録材料
1100n、S i O□100t+m 、 U V硬
化樹脂層を前記のスパッタ法により形成した。成膜した
記録層の組成は(Ni 1oGr 70) 9oTe
lo+ (Ni 50GI” so)、oTe lo+
(Ni 70 Gr 30) *oTe 10の
3通りである。この記録層にまず光ビームを全面照射し
、次いで短い強いパルス光を照射し、X線構造回折によ
り非晶質となっていることを確かめた。On a glass substrate, a layer of SiO21QOnm, an optical recording material of 1100n, SiO□100t+m, and a UV curable resin layer were formed by the sputtering method described above. The composition of the formed recording layer is (Ni 1oGr 70) 9oTe
lo+ (Ni 50GI” so), oTe lo+
(Ni 70 Gr 30) *oTe 10. This recording layer was first irradiated with a light beam over its entire surface, and then with short, intense pulsed light, and it was confirmed by X-ray structural diffraction that it was amorphous.
つぎにこの試料を45℃、70%RHの環境に供し反射
率の変化を測定した。基板側での表面反射率の初期値を
−Ro、経時での反射率の値をRとし、経時4間に対し
てR/ Roの値をプロットした(第5図)。(Ni
3oZr 70) 9oTe 1o、 (Ni so
Zr so) ’90”re IO+ (Ni
70 Zr 3o) 9゜Te、、いずれの組成の記
録層についても3力月経過しても反射率にはほとんど変
化がないことがわかる。又Teの代わりにSe、Geを
加えた場合にも同様の効果が得られる。Next, this sample was subjected to an environment of 45° C. and 70% RH, and changes in reflectance were measured. The initial value of the surface reflectance on the substrate side is -Ro, and the value of the reflectance over time is R, and the value of R/Ro is plotted for 4 hours (Fig. 5). (Ni
3oZr 70) 9oTe 1o, (Ni so
Zr so) '90"re IO+ (Ni
70 Zr 3o) 9°Te, It can be seen that there is almost no change in the reflectance even after 3 months of recording layer composition. Similar effects can also be obtained when Se or Ge is added instead of Te.
以上の実験結果によりNiとGrとからなる2元合金に
Te、Se、Ge等のカルコゲナイド元素を加えた材料
は非晶質状態が充分に安定であり、情報記録媒体として
使いうる材料であることがわかる。The above experimental results show that the amorphous state of a material made by adding chalcogenide elements such as Te, Se, and Ge to a binary alloy of Ni and Gr is sufficiently stable and can be used as an information recording medium. I understand.
[発明の効果コ
以上詳述したように結晶状態と非晶質状態との相変化を
可逆的に起こすNiとGrとの2元合金に更にカルコゲ
ナイド元素Te、Se、Geを加えると相変化に伴なう
反射率変化が増大し、再生信号量の大きな情報記録媒体
が得られる。[Effects of the invention] As detailed above, when chalcogenide elements Te, Se, and Ge are further added to a binary alloy of Ni and Gr that causes a reversible phase change between a crystalline state and an amorphous state, a phase change occurs. The accompanying change in reflectance increases, and an information recording medium with a large amount of reproduced signal can be obtained.
第1図は、本発明の情報記録媒体の断面構造図、第2図
は、スパッタ装置の側面図、
第3図は、スパッタ装置の底面図、
第4図は、カルコゲナイド元素の添加量と結晶化温度の
相関を示すグラフ、
第5図は、カルコゲナイド元素の添加量と反射率変化量
の相関を示すグラフ、
第6図は、Ni 、Gr、Teの3元記録層の経時反射
率変化量を示すグラフである。
1・・・基板
2・・・記録層
3・・・無機物保護層
4・・・有機物保護層
同 山王 −
第 1 図
第 3 図
カルコテナイト元*、杏崩1(
第 4 図 −
第 5 図
第 6 図FIG. 1 is a cross-sectional structural diagram of the information recording medium of the present invention, FIG. 2 is a side view of the sputtering device, FIG. 3 is a bottom view of the sputtering device, and FIG. 4 is the amount of chalcogenide added and the crystallization. Figure 5 is a graph showing the correlation between the amount of chalcogenide added and the amount of change in reflectance; Figure 6 is the amount of change in reflectance over time of a ternary recording layer of Ni, Gr, and Te. This is a graph showing. 1...Substrate 2...Recording layer 3...Inorganic protective layer 4...Organic protective layer Same 6 Figure
Claims (1)
を記録しうる記録層を有する情報記録媒体において前記
記録層がNiとGrとX(XはSe、Te、Geの中か
ら選ばれた元素)とを含有する合金薄膜からなることを
特徴とする情報記録媒体。In an information recording medium having a recording layer capable of recording information by causing a change in atomic arrangement by irradiation with a light beam, the recording layer may include Ni, Gr, and X (X is an element selected from Se, Te, and Ge). ) An information recording medium comprising an alloy thin film containing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63051585A JPH01227235A (en) | 1988-03-07 | 1988-03-07 | Information recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63051585A JPH01227235A (en) | 1988-03-07 | 1988-03-07 | Information recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01227235A true JPH01227235A (en) | 1989-09-11 |
Family
ID=12891011
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63051585A Pending JPH01227235A (en) | 1988-03-07 | 1988-03-07 | Information recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01227235A (en) |
-
1988
- 1988-03-07 JP JP63051585A patent/JPH01227235A/en active Pending
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