JPH01198467A - Thin film-manufacturing equipment - Google Patents

Abstract

PURPOSE:To prevent evaporated grains from adhering to heaters for heating and reevaporating and to improve the homogeneity of a thin film to be formed by providing plates having shapes obstructing the advance of the evaporated grains generated by heating a specimen toward the heaters for heating. CONSTITUTION:In a vacuum chamber 1, a vapor deposition material M1 in a crucible 2 is heated by means of heaters 3 for heating and evaporated, by which a beam B of evaporated grains blowing out through a jet orifice 2a of the crucible 2 is applied to a specimen T and a thin film is formed on the surface of the specimen T. In the above thin film-manufacturing equipment, a reflector 4 is provided along the advancing region F of the evaporated grains between this region F and the heaters 3 for heating. By this reflector 4, the advance of the evaporated grains toward the heaters 3 for heating can be obstructed. By this method, the adhesion of the evaporated grains to the heaters 3 for heating and the reevaporation of these grains and their attendant deterioration in the homogeneity of a thin film to be obtained can be prevented.

Description

[Detailed Description of the Invention] <Industrial Application Field> The present invention involves heating and vaporizing a vapor deposition material in a crucible with a heater in a vacuum atmosphere, and causing the vaporized particles to collide with a sample such as a substrate. This invention relates to an apparatus for forming a thin film on the surface thereof.

<Prior Art> Conventionally, as shown in FIG. 2, for example, the above-mentioned apparatus includes a crucible 122 that houses a vapor deposition material M in a vacuum chamber (not shown) and is provided with an injection hole 122a. An evaporation source 120 comprising a heater 123 surrounding the side wall of the evaporation source 120. and a sample T are provided, the vapor deposition material M is heated and evaporated by the heater 123, and the injection hole 1
It is configured to form a thin film on the surface of the sample T by irradiating the surface of the sample T with the evaporated particle beam B blown out from 22a.

Note that the vapor deposition source 120 is a glue flutter 141 made of molybutton.
．． 142, and the deposition source 1
20 heat is prevented from scattering into the vacuum chamber.

<Problems to be Solved by the Invention> However, according to the conventional device configuration, there is a risk that some of the evaporated particles blown out from the injection hole 122a may be scattered around the side wall of the crucible 122 and adhere to the surface of the heater 123. There is. This deposit is heated again by the heater 123 and re-evaporated, and the re-evaporated material disturbs the flow of the evaporated particle beam B, resulting in a problem that the homogeneity of the obtained thin film is reduced.

Further, for example, if a thin film is first formed using a predetermined vapor deposition material and then the next vapor deposition is performed using a material different from the previous vapor deposition material, the thin film may be deposited on the surface of the heater 123 by the previous vapor deposition. There is a problem in that the scattered particles of the deposited material are re-evaporated during the next deposition, and the re-evaporated particles, that is, the previously deposited material, are mixed into the next thin film, reducing the purity of the thin film obtained by the next deposition. .

An object of the present invention is to provide a thin film manufacturing bag that can prevent evaporated particles of a vapor deposition material from adhering to a heated heater, thereby producing a high-quality thin film.

<Means for Solving the Problems> A configuration for achieving the above object will be described with reference to FIG. 1 corresponding to the embodiment. The device is characterized in that a plate (reflector) 4 having a shape that blocks the progress of evaporated particles toward the heater 3 is provided between the heater 3 and the heater 3 .

<Function> Even if some of the evaporated particles of the evaporation material M are scattered around the crucible 1, the progress of the scattered particles toward the heater 3 can be blocked by the plate 4, and the evaporated particles are not deposited on the surface of the heater 3. It will not stick.

<Example> Embodiments of the present invention will be described below based on the drawings.

FIG. 1 is a longitudinal sectional view of a main part of an embodiment of the present invention, and shows an example in which the present invention is applied to a molecular beam epitaxy apparatus.

A crucible 2 containing a vapor deposition material M and having an injection hole 2a and a reflector 4 having a stepped cylindrical shape are integrally formed. Two through holes 4a and 4b are provided on the upper side of the reflector 4, and are open to the outside of the reflector 4 above the injection hole 2a of the crucible 2. Further, a through hole 4c is provided at the bottom of the reflector 4, and a hole 2b for inserting a thermocouple formed in the roof 2 is exposed to the outside. Further, a predetermined number of support members 41...41 are provided on the surface 4d of the reflector 4.

In this way, the flaper 4 is removably attached to the holes 51...51 of the water jacket 5 provided in the vacuum chamber 1 via the support members 41...41, and when attached, the inside of the The lateral periphery of the crucible 2 is surrounded by a heater 3 provided inside a water shut 5. Further, above the injection hole 2a of the crucible 2, a sample T such as a substrate is placed. Note that a thermocouple 6 is inserted into the hole 2b at the bottom of the crucible 2 to measure the temperature of its wall.

With the above configuration, the side wall of the crucible 2 is heated by the heater 3 to evaporate the vapor deposition material M inside, and the surface of the sample T is irradiated with the evaporated particle beam B blown out from the injection hole 2b. A thin film can be formed. Here, even if some of the evaporated particles blown out from the injection hole 2b are scattered around the crucible 20, the scattered particles are prevented by the wall of the reflector 4 in front of the heater 3.
Its progress is blocked, and evaporated particles of the evaporation material M do not adhere to the surface of the heater 3. Further, the upper part of the water jacket 5 is covered with a reflector 4, so that the heat of the heater 3 is not scattered into the vacuum chamber 1.

According to this embodiment, the crucible 2 and the flutter 4 are integrally formed, and the crucible 2 is detachably attached to a predetermined position in the vacuum chamber 1 via the reflector 4. Crucible 2 by simply pulling it upwards
can be exchanged. Here, according to the conventional apparatus, the crucible is either fixed in the vacuum chamber by a flush cage or sunk into a heating section provided in the vacuum chamber, and in the former case, the crucible is replaced. In the latter case, it is necessary to remove the crucible from the heater section using a jig, etc. However, in this embodiment, the crucible can be replaced without requiring these complicated operations.

In the above embodiments, the crucible 2 and the flask 4 are integrally formed, but they do not necessarily need to be integrally formed.

In addition, although the above has described an example in which the present invention is applied to a molecular beam epitaxy apparatus, the present invention is not limited to this, and the evaporated particle beam blown out from the injection hole of the crucible is ionized, further accelerated, and sampled. It can be applied to a so-called cluster ion beam device that forms a thin film on a surface by colliding with the surface, and can also be applied to other thin film manufacturing devices equipped with a crucible whose top is open.

<Effects of the Invention> As explained above, according to the present invention, a plate is provided between the area where evaporated particles advance to the sample and the heater, and this plate blocks the evaporated particles from advancing toward the heater. With this structure, the evaporated particles will not adhere to the heated heater, and as a result, the homogeneity of the thin film can be improved. In addition, for example, even when performing evaporation operations of different evaporation materials in succession, the previous evaporation material will not be mixed into the thin film obtained by subsequent evaporation, and the reduction in purity of the thin film due to subsequent evaporation can be suppressed. Can be done.

Here, the present invention can also be configured such that the plate and the crucible are integrally formed and the crucible is detachably attached to a predetermined position in the vacuum chamber via the plate. In this case, the above effects can be obtained. In addition, the crucible can be replaced much more easily and in a shorter time than in the past.

[Brief explanation of the drawing]

FIG. 1 is a vertical cross-sectional view of a main part of an embodiment of the present invention, and FIG. 2 is a vertical cross-sectional view of a main part of a conventional example of a thin film manufacturing apparatus. 1... Vacuum chamber 2... Crucible 3... Heater 4... Reflector F... Evaporated particle advancing region M... Vapor deposition material Fig. 1 Fig. 2

Claims (1)

[Claims] (1) In a device that evaporates the material to form a thin film on the surface of the sample by heating the evaporation material in the crucible in a vacuum atmosphere using a heater that surrounds the side wall of the crucible, evaporated particles A thin film manufacturing apparatus, characterized in that a plate having a shape that blocks the progress of evaporated particles to the heater is provided between the region advancing toward the sample and the heater.