JPH0994964A - Manufacture of ink jet head - Google Patents
Manufacture of ink jet headInfo
- Publication number
- JPH0994964A JPH0994964A JP25128495A JP25128495A JPH0994964A JP H0994964 A JPH0994964 A JP H0994964A JP 25128495 A JP25128495 A JP 25128495A JP 25128495 A JP25128495 A JP 25128495A JP H0994964 A JPH0994964 A JP H0994964A
- Authority
- JP
- Japan
- Prior art keywords
- flow path
- ink
- metal film
- partition wall
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000002184 metal Substances 0.000 claims abstract description 43
- 229910052751 metal Inorganic materials 0.000 claims abstract description 43
- 238000005192 partition Methods 0.000 claims abstract description 38
- 239000000463 material Substances 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims description 42
- 230000005684 electric field Effects 0.000 claims description 3
- 238000005498 polishing Methods 0.000 abstract description 7
- 238000000034 method Methods 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000000608 laser ablation Methods 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/10—Finger type piezoelectric elements
Landscapes
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
Description
【0001】[0001]
【発明の技術分野】本発明はインクジェットヘッドの製
造方法に関する。TECHNICAL FIELD The present invention relates to a method for manufacturing an inkjet head.
【0002】[0002]
【従来の技術】従来より、インクジェットヘッドにおい
て少なくとも一部が圧電材料からなる流路基板にインク
流路を刻設した構成のものがある。これは、インク流路
を区画する隔壁部分が圧電材料からなっており、この隔
壁の両面に金属膜からなる電極が形成されたものであ
る。この電極に印字信号に応じて電界が印加されると、
隔壁が圧電変形してインク流路の容積を変化させ、容積
の減少したインク流路内部のインクが圧力を受けて吐出
する。2. Description of the Related Art Conventionally, there has been a structure in which an ink flow path is formed in a flow path substrate of which at least a part is made of a piezoelectric material in an ink jet head. This is one in which a partition wall section that divides the ink flow path is made of a piezoelectric material, and electrodes made of a metal film are formed on both surfaces of this partition wall. When an electric field is applied to this electrode according to the print signal,
The partition wall is piezoelectrically deformed to change the volume of the ink flow path, and the ink in the ink flow path whose volume has been reduced receives pressure and is ejected.
【0003】このようなインクジェットヘッドを製造す
る際には、図11に示すように、まず圧電材料からなる
流路基板20に複数の平行な溝状のインク流路21およ
びそれと連続する浅溝部23を刻設した後、流路基板の
流路刻設面の上方から蒸着などにより流路刻設面および
隔壁22側面上部に金属膜を形成する。この状態では、
各隔壁側面の金属膜同士は流路刻設面および隔壁上端面
においてショートしており、任意のインク流路に対応し
た金属膜(電極)のみに選択的に導通させ隔壁を自在に
変形させることができない。そこで、通常は流路刻設面
および隔壁上端面を機械的に研磨してこの部分において
金属膜を除去し各流路毎に分離した電極としている。そ
の後、流路基板上面にカバープレートが貼着される。な
お、図11に示すように、流路基板20のインク流路2
1後端部は徐々に浅くなるように形成され、さらに浅溝
部23に連通しており、インク流路の深さの深い部分で
は隔壁22側面に金属膜が形成されるが、浅溝部23に
おいては溝の浅さ故に平面的に広がって溝内を埋めるよ
うに金属が充填される。ここがワイヤーボンディング等
が行われる電極接続部となっている。When manufacturing such an ink jet head, as shown in FIG. 11, first, a plurality of parallel groove-shaped ink flow paths 21 and a shallow groove portion 23 continuous with the flow path substrate 20 made of a piezoelectric material. After the engraving, a metal film is formed on the engraved surface of the channel and on the upper side surface of the partition wall 22 by vapor deposition or the like from above the engraved surface of the channel substrate. In this state,
The metal films on the side walls of each partition wall are short-circuited on the engraved surface of the flow path and the upper surface of the partition wall, and the partition wall can be freely deformed by selectively conducting only the metal film (electrode) corresponding to any ink flow path. I can't. Therefore, usually, the engraved surface of the flow path and the upper end surface of the partition wall are mechanically polished to remove the metal film at this portion to form separate electrodes for each flow path. Then, a cover plate is attached to the upper surface of the flow path substrate. As shown in FIG. 11, the ink channel 2 of the channel substrate 20 is
The rear end portion 1 is formed so as to be gradually shallower and communicates with the shallow groove portion 23, and a metal film is formed on the side surface of the partition wall 22 in a portion where the depth of the ink flow channel is deep. Is filled with metal so as to spread in a plane and fill the inside of the groove due to the shallowness of the groove. This is an electrode connection portion where wire bonding and the like are performed.
【0004】[0004]
【発明が解決しようとする課題】上記の通り、従来は各
流路毎に独立した(ショートしない)電極を得るために
研磨により金属膜を分離しているが、この研磨作業時に
隔壁の割れや欠け等の破損を生じることがあり、歩留ま
り低下の原因となっている。また、電極接続部を設ける
ために、インク流路に浅溝部を形成しておき、研磨した
後もこの浅溝部内の金属膜を残留させているが、浅溝部
を形成するため加工速度の遅い切削工程が必要で加工時
間が長くなっている。As described above, conventionally, the metal film is separated by polishing in order to obtain an independent (non-short-circuit) electrode for each flow path. Damage such as chipping may occur, which causes a decrease in yield. Further, in order to provide the electrode connection portion, a shallow groove portion is formed in the ink flow path, and the metal film in the shallow groove portion is left after polishing, but since the shallow groove portion is formed, the processing speed is slow. A cutting process is required and processing time is long.
【0005】なお、ワイヤーボンディング工程において
ボンディング用ツールの先端を浅溝部低面に接触させて
作業する必要があるため、信頼性向上のためには浅溝部
が浅い方が望ましい(浅溝部が深過ぎるとボンディング
用ツールが浅溝部側壁に当たって低面に接触できないた
め、具体的には深さ15μm以下が望ましい)。一方、
浅溝部が浅過ぎると研磨時に浅溝部内の金属膜も除去さ
れてしまうおそれがある。従って、浅溝部は極めて精度
よく形成しなければならないが、圧電材料からなる基板
の厚みや平面度のばらつきの影響で、浅溝部を所望の深
さに一定に保つことは困難であり、上記のような不良を
生じ易かった。さらに、浅溝部底面は切削加工面である
ため、粗くて金属膜の付着強度が低く、ボンディング時
に金属膜が剥離するおそれがあった。またインク流路と
浅溝部との相対的な位置精度も要求された。In the wire bonding process, it is necessary to bring the tip of the bonding tool into contact with the lower surface of the shallow groove portion, and therefore it is desirable that the shallow groove portion is shallow in order to improve reliability (the shallow groove portion is too deep. Since the bonding tool hits the side wall of the shallow groove and cannot contact the lower surface, specifically, a depth of 15 μm or less is desirable). on the other hand,
If the shallow groove portion is too shallow, the metal film in the shallow groove portion may also be removed during polishing. Therefore, the shallow groove portion must be formed extremely accurately, but it is difficult to keep the shallow groove portion at a desired depth constant due to the influence of the thickness and the flatness of the substrate made of a piezoelectric material. Such defects were likely to occur. Further, since the bottom surface of the shallow groove portion is a machined surface, it is rough and has a low adhesion strength to the metal film, and the metal film may be peeled off during bonding. Further, relative positional accuracy between the ink flow path and the shallow groove portion is also required.
【0006】そこで本発明の目的は、浅溝部を形成せず
機械的な研磨工程をなくし、歩留まりの向上、加工時間
の短縮、ボンディング作業の簡単化が達成できるインク
ジェットヘッドの製造方法を提供することにある。Therefore, an object of the present invention is to provide a method for manufacturing an ink jet head which can achieve a yield improvement, a processing time reduction, and a bonding work simplification by eliminating a mechanical polishing step without forming a shallow groove portion. It is in.
【0007】[0007]
【課題を解決するための手段】上記目的を達成するため
に本発明では、インク流路が刻設してある流路基板と、
流路基板の流路刻設面上に固着されるカバープレートと
を有し、インク流路を区画する隔壁側面に電界を加えて
圧電変形させることによりインク流路内のインクを吐出
するインクジェットヘッドの製造方法において、少なく
とも一部が圧電材料からなる流路基板に複数の平行な溝
状のインク流路を刻設し、流路基板の流路刻設面と隔壁
上端面および側面上部とに金属膜を形成し、流路基板の
流路刻設面および隔壁上端面に対しレーザー照射により
金属膜をインク流路毎に分離する工程を含むことを特徴
とするものである。In order to achieve the above object, the present invention provides a flow channel substrate having an ink flow channel engraved therein,
An ink jet head having a cover plate fixed on the engraved surface of the flow path substrate, and ejecting ink in the ink flow path by applying an electric field to the side wall of the partition wall that partitions the ink flow path to cause piezoelectric deformation. In the manufacturing method of, a plurality of parallel groove-shaped ink channels are engraved on a channel substrate at least a part of which is formed of a piezoelectric material, and the channel engraved surface of the channel substrate and the partition wall upper end surface and upper side surface are formed. The method is characterized by including a step of forming a metal film and separating the metal film for each ink flow path by laser irradiation on the flow path engraved surface of the flow path substrate and the partition wall upper end surface.
【0008】[0008]
【発明の実施の形態】本発明に係るインクジェットヘッ
ドの完成状態の斜視図を図1に示す。その構成は、圧電
材料であるPZTからなる流路基板1の上面に複数の溝
状のインク流路2が設けてあり、この流路刻接面(上
面)にカバープレート3が接合され、流路基板の端面に
ノズルプレート4が接合され、各インク流路2の開口端
とノズルプレートに穿設してあるノズル5とがそれぞれ
連通している。流路基板1の各インク流路2を区画する
隔壁8には電極6が形成してあり、流路基板後部におい
てインク流路は徐々に浅くなっており、電極6から連続
する電極接続部7が設けられている。この電極6および
電極接続部7は、各インク流路2毎に分離されている。
カバープレート3の後部には窓孔3aが開設されてお
り、全インク流路2の後端部2aはこの窓孔3aを介し
て露出している。この窓孔3aには、図示しないが、全
インク流路2へインクを供給するための共通インク室を
有するマニホールドが接合される。そして、図示しない
ドライバ基板に接続されて電極接続部7のいずれかに駆
動電力が選択的に供給され、インク流路2を区画する隔
壁8側面の電極6に供給され、この隔壁8が圧電効果に
より変形しインク流路2の容積が減じられ内部のインク
がノズル5より外部へ吐出する。FIG. 1 is a perspective view showing a completed state of an ink jet head according to the present invention. The structure is such that a plurality of groove-shaped ink flow paths 2 are provided on the upper surface of a flow path substrate 1 made of PZT which is a piezoelectric material, and a cover plate 3 is bonded to the flow path contact surface (upper surface). The nozzle plate 4 is joined to the end surface of the path substrate, and the open end of each ink flow path 2 and the nozzle 5 formed in the nozzle plate communicate with each other. An electrode 6 is formed on a partition wall 8 that partitions each ink flow path 2 of the flow path substrate 1, and the ink flow path is gradually shallowed in the rear part of the flow path substrate, and an electrode connecting portion 7 continuous from the electrode 6 is formed. Is provided. The electrode 6 and the electrode connecting portion 7 are separated for each ink flow path 2.
A window hole 3a is formed in the rear portion of the cover plate 3, and the rear end portions 2a of all the ink flow paths 2 are exposed through the window hole 3a. Although not shown, a manifold having a common ink chamber for supplying ink to all the ink flow paths 2 is joined to the window 3a. Then, the driving power is connected to a driver substrate (not shown) and is selectively supplied to any of the electrode connecting portions 7, and is supplied to the electrodes 6 on the side surfaces of the partition walls 8 that partition the ink flow path 2. Due to this, the volume of the ink flow path 2 is reduced and the ink inside is ejected from the nozzle 5 to the outside.
【0009】上記のようなインクジェットヘッドの製造
方法について、以下に説明する。まず、図2に示すよう
に、圧電材料からなる流路基板1の上面にダイシングソ
ーなどを用いた切削加工により複数の溝状のインク流路
2を刻設する。このインク流路2のピッチは所望のノズ
ルピッチと同一となるようにし、インク流路2の後端部
は円形のダイシングソーの外周に対応する円弧状に形成
されているが、図11に示す従来例のような浅溝部23
は設けられていない。A method of manufacturing the above ink jet head will be described below. First, as shown in FIG. 2, a plurality of groove-shaped ink channels 2 are formed on the upper surface of a channel substrate 1 made of a piezoelectric material by cutting using a dicing saw or the like. The pitch of the ink flow paths 2 is set to be the same as the desired nozzle pitch, and the rear end of the ink flow paths 2 is formed in an arc shape corresponding to the outer circumference of the circular dicing saw, as shown in FIG. Shallow groove 23 as in the conventional example
Is not provided.
【0010】そこで、図3に示すように、流路基板1の
上方よりAlやNiなどの金属を真空蒸着して、隔壁8
の上端面を含む流路基板1上面と隔壁8側面の上部とに
金属膜9を形成する。なお、隔壁8に対して斜め方向に
左右1度ずつ蒸着を行うことにより、隔壁8側面下部に
は金属膜が形成されないようにしている。Therefore, as shown in FIG. 3, a metal such as Al or Ni is vacuum-deposited from above the flow path substrate 1 to form the partition wall 8.
The metal film 9 is formed on the upper surface of the flow path substrate 1 including the upper end surface and the upper portions of the side surfaces of the partition walls 8. It should be noted that the metal film is not formed on the lower portion of the side surface of the partition wall 8 by performing vapor deposition once on the partition wall 8 in the diagonal direction and once on the right and left sides.
【0011】次に、流路基板1の上方よりエキシマレー
ザーを照射し、レーザーアブレーション効果により、図
4に示すように金属膜9を部分的に除去して、金属膜9
を各インク流路毎に分離して電極6および電極接続部7
を構成する。なお、このレーザーアブレーション効果に
ついて補足すると、高エネルギーの紫外線レーザーパル
スを物体に照射して、分子間の結合を切断することによ
り物体を分解、除去する方法である。物体に入射するパ
ルスエネルギー密度を調整することにより1ショットあ
たりの分解深さを調節できる。ここでは、エキシマレー
ザーの照射幅を隔壁8上端面の幅よりも狭く設定し、パ
ルスエネルギー密度640mJ/cm2で5ショット以内
で2μmのNi膜が除去できた。Next, an excimer laser is irradiated from above the flow path substrate 1 to partially remove the metal film 9 by the laser ablation effect as shown in FIG.
Are separated for each ink flow path to separate the electrode 6 and the electrode connecting portion 7.
Is configured. A supplementary description of this laser ablation effect is a method of irradiating an object with a high-energy ultraviolet laser pulse to break an intermolecular bond to decompose and remove the object. The decomposition depth per shot can be adjusted by adjusting the pulse energy density incident on the object. Here, the irradiation width of the excimer laser was set to be narrower than the width of the upper end surface of the partition wall 8, and the Ni film of 2 μm could be removed within 5 shots at the pulse energy density of 640 mJ / cm 2 .
【0012】以上のようにして製造した流路基板1に前
述のカバープレート2,ノズルプレート3を接合して図
1に示すインクジェットヘッドが完成する。これによる
と、流路基板1の流路刻設面を機械的に研磨する工程が
必要ないので、隔壁8を破損したりするおそれがなくな
る。また、従来精密な作業が要求された浅溝部形成工程
も必要ないので、作業が簡単になるとともに加工時間が
短くなる。浅溝部ではなく平滑な流路基板上に金属膜を
設けて電極接続部を形成しているので、剥離しにくく信
頼性が高いとともにボンディングなどの作業が簡単で信
頼性が高い。The ink jet head shown in FIG. 1 is completed by joining the above-mentioned cover plate 2 and nozzle plate 3 to the flow path substrate 1 manufactured as described above. According to this, the step of mechanically polishing the engraved surface of the flow path substrate 1 is not required, so that there is no risk of damaging the partition wall 8. Further, since the shallow groove portion forming step, which has conventionally required a precise work, is not required, the work is simplified and the processing time is shortened. Since the metal film is provided on the smooth flow path substrate instead of the shallow groove portion to form the electrode connection portion, peeling is unlikely to occur, reliability is high, and work such as bonding is easy and reliable.
【0013】レーザー照射による金属膜9の分離工程の
第2の例について、図5〜7を参照して説明する。この
例では、金属膜9を残留させるべき部分をレーザーから
保護する遮蔽部10aを有するマスク10を用いるもの
である。すなわち、流路刻設面に金属膜9が形成された
図3に示す状態の流路基板1上に、マスク10を載置ま
たは近接させてレーザー照射(矢印方向)を行う。する
と透過部10bよりレーザーが透過しその部分の金属膜
9が除去され、遮蔽部10aの部分のみ金属膜9が残留
し、図6に示すように電極6と千鳥配列の電極接続部7
ができる。この場合、第1の例のようにレーザー照射幅
を隔壁8上端面の幅に合わせる必要はなく、レーザーア
ブレーションが可能なエネルギー密度が確保できれば、
可能な限りビーム形状を広げてマスク10前面を覆う面
積で照射できる。そうすると、一括して広面積の電極膜
を除去できるため、レーザービームのスキャンまたは基
板の移動が不要で、より少ないショット数、短時間で加
工が完了する。また、図6のように千鳥配列にするなど
電極接続部が任意の位置、形状に形成できるため、高密
度化への対応が容易である。図5に示す例では、形成す
べきパターンと同縮尺のマスク10を流路基板1と当接
または近接させてレーザーを照射するコンタクトマスク
法を用いているが、異なった縮尺のマスクを変倍レンズ
を介して流路基板1上に結像させるイメージングマスク
法を用いることもできる。A second example of the step of separating the metal film 9 by laser irradiation will be described with reference to FIGS. In this example, a mask 10 having a shielding portion 10a for protecting the portion where the metal film 9 is to be left from the laser is used. That is, laser irradiation (in the direction of the arrow) is performed with the mask 10 placed or brought close to the flow path substrate 1 in the state shown in FIG. 3 in which the metal film 9 is formed on the flow path engraved surface. Then, the laser is transmitted through the transmitting portion 10b to remove the metal film 9 in that portion, and the metal film 9 remains only in the portion of the shielding portion 10a. As shown in FIG. 6, the electrodes 6 and the electrode connecting portions 7 in a staggered arrangement are formed.
Can be. In this case, it is not necessary to match the laser irradiation width with the width of the upper end surface of the partition wall 8 as in the first example, and if the energy density capable of laser ablation can be secured,
It is possible to irradiate the surface of the mask 10 by expanding the beam shape as much as possible. Then, since the electrode film having a large area can be removed at once, the scanning of the laser beam or the movement of the substrate is unnecessary, and the processing is completed in a smaller number of shots and in a shorter time. Further, as shown in FIG. 6, since the electrode connecting portions can be formed in arbitrary positions and shapes such as a zigzag arrangement, it is easy to cope with high density. In the example shown in FIG. 5, the contact mask method is used in which the mask 10 having the same scale as the pattern to be formed is brought into contact with or close to the flow path substrate 1 to irradiate the laser, but a mask having a different scale is scaled. An imaging mask method of forming an image on the flow path substrate 1 via a lens can also be used.
【0014】上記第1,2の例では、レーザー照射方向
は特に限定していないが、レーザー入射光軸に対して垂
直な面に対する分解効率が最も高く、入射光軸から傾く
に従って分解効率は低下する。したがって、除去すべき
金属膜9が設けてある流路基板上面がレーザー光軸と垂
直に、かつ金属膜9を除去すべきでない隔壁8側面がレ
ーザー光軸と平行になるようにすることが望ましい。特
に、隔壁8側面がレーザー光軸と平行であると、この面
の金属膜9が除去されることは殆どないため、インク流
路2上には第2の例のようなマスクを配置する必要がな
い。In the above-mentioned first and second examples, the laser irradiation direction is not particularly limited, but the decomposition efficiency is highest for the plane perpendicular to the laser incident optical axis, and the decomposition efficiency decreases as it is inclined from the incident optical axis. To do. Therefore, it is desirable that the upper surface of the flow path substrate provided with the metal film 9 to be removed is perpendicular to the laser optical axis, and the side surface of the partition wall 8 where the metal film 9 is not to be removed is parallel to the laser optical axis. . Particularly, when the side surface of the partition wall 8 is parallel to the laser optical axis, the metal film 9 on this surface is hardly removed. Therefore, it is necessary to dispose a mask as in the second example on the ink flow path 2. There is no.
【0015】図8〜10に第3の例を図示している。こ
の例では、流路基板1上面と隔壁8とが垂直でなく傾斜
して設けられている。この上に配置されるマスク11は
電極接続部を形成すべき部分にのみ遮蔽部11aを有
し、それ以外の部分は透過部11bとなっている。そし
て、レーザーは隔壁8側面と平行な方向(矢印方向)に
照射される。インク流路2の部分はレーザーが透過する
が、隔壁8側面の金属膜9は殆ど影響を受けない。ま
た、流路基板1上面に対して傾斜してレーザーが入射す
るため若干効率は落ちるが、流路基板1上面の金属膜9
は除去可能で、遮蔽部11aに対向する金属膜9のみ残
留する。従って、図10に示すように、電極6と電極接
続部7とを有する流路基板1が完成する。これによると
マスク11の位置合わせにそれほどの精度を必要とせ
ず、作業が容易になる。A third example is shown in FIGS. In this example, the upper surface of the flow path substrate 1 and the partition wall 8 are provided not vertically but at an angle. The mask 11 arranged on this has the shielding portion 11a only in the portion where the electrode connecting portion is to be formed, and the other portion is the transmitting portion 11b. Then, the laser is irradiated in a direction (arrow direction) parallel to the side surface of the partition wall 8. The laser passes through the ink flow path 2, but the metal film 9 on the side surface of the partition wall 8 is hardly affected. Further, since the laser is incident on the upper surface of the flow path substrate 1 with a tilt, the efficiency is slightly lowered, but the metal film 9 on the upper surface of the flow path substrate 1 is reduced.
Can be removed, and only the metal film 9 facing the shield portion 11a remains. Therefore, as shown in FIG. 10, the flow path substrate 1 having the electrodes 6 and the electrode connecting portions 7 is completed. According to this, the positioning of the mask 11 does not require so much accuracy, and the work becomes easy.
【0016】上記実施例ではエキシマレーザーでの金属
膜除去を行っているが、YAGレーザーやCO2ガスレ
ーザーによっても同様な加工が可能である。Although the metal film is removed by the excimer laser in the above embodiment, the same processing can be performed by the YAG laser or the CO 2 gas laser.
【0017】[0017]
【発明の効果】以上の通り、本発明によると、流路基板
の機械的研磨による隔壁の破損が防げるとともに、浅溝
部を形成する必要がなく、このため作業が簡単になると
ともに加工時間が短くなる。また、マスクを用いてレー
ザー照射を行うと、一括して広面積の電極膜を除去でき
るため作業効率がよい。さらに、隔壁側面と平行な方向
にレーザー照射を行うと、隔壁側面の電極を確保しつ
つ、マスクの簡略化および作業の容易化が図れる。As described above, according to the present invention, it is possible to prevent the partition walls from being damaged by mechanical polishing of the flow path substrate, and it is not necessary to form a shallow groove portion, which simplifies the work and shortens the processing time. Become. Further, when laser irradiation is performed using a mask, it is possible to remove a wide area of the electrode film in a batch, and thus work efficiency is good. Further, when the laser irradiation is performed in the direction parallel to the side wall of the partition wall, the mask can be simplified and the work can be facilitated while ensuring the electrode on the side surface of the partition wall.
【図1】インクジェットヘッドの完成状態を示す一部切
欠斜視図FIG. 1 is a partially cutaway perspective view showing a completed state of an inkjet head.
【図2】インク流路形成工程を示す斜視図FIG. 2 is a perspective view showing an ink flow path forming step.
【図3】金属膜蒸着工程を示す平面図および正面図FIG. 3 is a plan view and a front view showing a metal film vapor deposition process.
【図4】金属膜分離工程後の流路基板の平面図および正
面図FIG. 4 is a plan view and a front view of the flow path substrate after the metal film separation step.
【図5】金属膜分離工程の第2の例を示す正面図FIG. 5 is a front view showing a second example of the metal film separation step.
【図6】第2の例に用いるマスクの平面図FIG. 6 is a plan view of a mask used in a second example.
【図7】第2の例の金属膜分離工程後の流路基板の平面
図FIG. 7 is a plan view of the flow path substrate after the metal film separation step of the second example.
【図8】金属膜分離工程の第3の例を示す正面図FIG. 8 is a front view showing a third example of the metal film separation step.
【図9】第3の例に用いるマスクの平面図FIG. 9 is a plan view of a mask used in a third example.
【図10】第3の例の金属膜分離工程後の流路基板の平
面図および正面図FIG. 10 is a plan view and a front view of the flow path substrate after the metal film separation step of the third example.
【図11】従来のインク流路および浅溝部形成工程を示
す斜視図FIG. 11 is a perspective view showing a conventional ink flow path and shallow groove forming step.
1 流路基板 2 インク流路 3 カバープレート 8 隔壁 9 金属膜 10,11 マスク 1 flow path substrate 2 ink flow path 3 cover plate 8 partition wall 9 metal film 10, 11 mask
Claims (1)
上記流路基板の流路刻設面上に固着されるカバープレー
トとを有し、上記インク流路を区画する隔壁側面に電界
を加えて圧電変形させることにより上記インク流路内の
インクを吐出するインクジェットヘッドの製造方法にお
いて、 少なくとも一部が圧電材料からなる上記流路基板に複数
の平行な溝状のインク流路を刻設し、上記流路基板の流
路刻設面と上記隔壁上端面および側面上部に金属膜を形
成し、上記流路基板の流路刻設面および上記隔壁上端面
に対しレーザー照射により上記金属膜をインク流路毎に
分離する工程を含むことを特徴とするインクジェットヘ
ッドの製造方法。1. A flow channel substrate having an ink flow channel engraved therein,
A cover plate fixed to the flow path engraving surface of the flow path substrate, and ejecting ink in the ink flow path by applying an electric field to the side wall of the partition wall that partitions the ink flow path to cause piezoelectric deformation In the method of manufacturing an ink jet head according to claim 1, a plurality of parallel groove-shaped ink channels are engraved on the channel substrate, at least a part of which is made of a piezoelectric material, and the channel engraved surface of the channel substrate and the partition wall are And a step of forming a metal film on the end face and the upper part of the side face, and separating the metal film for each ink flow path by laser irradiation on the flow path engraving surface of the flow path substrate and the partition wall upper end surface. Inkjet head manufacturing method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25128495A JP3331835B2 (en) | 1995-09-28 | 1995-09-28 | Method of manufacturing inkjet head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25128495A JP3331835B2 (en) | 1995-09-28 | 1995-09-28 | Method of manufacturing inkjet head |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0994964A true JPH0994964A (en) | 1997-04-08 |
JP3331835B2 JP3331835B2 (en) | 2002-10-07 |
Family
ID=17220521
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25128495A Expired - Lifetime JP3331835B2 (en) | 1995-09-28 | 1995-09-28 | Method of manufacturing inkjet head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3331835B2 (en) |
-
1995
- 1995-09-28 JP JP25128495A patent/JP3331835B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP3331835B2 (en) | 2002-10-07 |
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