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JPH0973093A - Liquid crystal display device and its production - Google Patents

Liquid crystal display device and its production

Info

Publication number
JPH0973093A
JPH0973093A JP22896895A JP22896895A JPH0973093A JP H0973093 A JPH0973093 A JP H0973093A JP 22896895 A JP22896895 A JP 22896895A JP 22896895 A JP22896895 A JP 22896895A JP H0973093 A JPH0973093 A JP H0973093A
Authority
JP
Japan
Prior art keywords
substrate
liquid crystal
display device
crystal display
display area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22896895A
Other languages
Japanese (ja)
Inventor
Daisuke Miyazaki
大輔 宮崎
Makoto Hasegawa
誠 長谷川
Shoichi Kurauchi
昭一 倉内
Teruyuki Midorikawa
輝行 緑川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Development and Engineering Corp
Original Assignee
Toshiba Corp
Toshiba Electronic Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Electronic Engineering Co Ltd filed Critical Toshiba Corp
Priority to JP22896895A priority Critical patent/JPH0973093A/en
Priority to TW085110746A priority patent/TW373098B/en
Priority to US08/708,485 priority patent/US5978061A/en
Priority to KR1019960039204A priority patent/KR100227692B1/en
Publication of JPH0973093A publication Critical patent/JPH0973093A/en
Priority to US09/388,945 priority patent/US6445437B1/en
Priority to US10/196,142 priority patent/US6888608B2/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a liquid crystal display device having good display performance at a high yield by forming columnar spacers at a high density in the regions of the display in the outer peripheral parts of substrates, thereby decreasing the display defects by a cell gap defect. SOLUTION: A counter substrate 2 is constituted by forming black light shielding layers 11 on a glass substrate 10 and three colors of colored layers 12 (R), 12 (G), 12 (B) in the spacings between the black light shielding layers 11. The parts between respective pixels are formed to a matrix shape and the outer periphery parts are formed to a broad band shape. The inner side of the light shielding layers 11 disposed in the outer peripheral parts thereof is formed as the display regions. The parts including the light shielding layers 11 disposed in the outer periphery parts and the side outer than these layers are formed as the regions off the display. The outer side of a sealing material 4 is included in the regions off the display as well and further, the columnar spacers 13 are built into the display regions and the regions off the display of the counter substrate 2. The columnar spacers 13 are formed on the light shielding layers 11 and the density of the number of pieces of the columnar spacers 13 formed in the regions off the display is set higher than the density of the number of pieces of the columnar spacers formed in the display regions.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は液晶表示装置に係
り、詳しくは柱状スペーサー構造を持つ液晶表示装置に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly to a liquid crystal display device having a columnar spacer structure.

【0002】[0002]

【従来の技術】現在、液晶表示装置は形成工程で2枚の
基板を貼り合わせるときに、2枚の基板のうちの片側の
基板にシール材を塗布し、他方の基板と重ね合わせ、プ
レス装置で圧力を掛けながらシール材を硬化させる手法
がとられている。このとき基板の外周部に強い圧力が掛
かりやすいため、外周部の基板間隔が小さくなりやす
く、セルギャップ不良に起因する表示不良の原因となる
ことがあった。一方、セルギャップ不良対策として基板
全面のスペーサー密度を高くすると、液晶層に真空泡が
発生しやすくなるという問題があった。
2. Description of the Related Art At present, in a liquid crystal display device, when two substrates are bonded together in a forming process, a sealing material is applied to one of the two substrates and the other substrate is overlaid, and a pressing device is used. A method of curing the sealing material while applying pressure is used. At this time, a strong pressure is likely to be applied to the outer peripheral portion of the substrate, so that the substrate spacing in the outer peripheral portion is likely to be small, which may cause display defects due to defective cell gaps. On the other hand, when the spacer density on the entire surface of the substrate is increased as a countermeasure against the cell gap defect, there is a problem that vacuum bubbles are easily generated in the liquid crystal layer.

【0003】[0003]

【発明が解決しようとする課題】本発明は、上記問題点
に鑑みなされたもので、セルギャップ不良による表示不
良を低減し、歩留まりが高く表示性能の良い液晶表示装
置を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and an object of the present invention is to provide a liquid crystal display device which reduces display defects due to cell gap defects and has a high yield and good display performance. To do.

【0004】[0004]

【課題を解決するための手段】本発明の液晶表示装置の
構成及び製造方法によれば、基板外周部の表示外領域に
高密度で柱状スペーサーを形成する、または表示外領域
の柱状スペーサーを太く形成することによって、基板貼
り合わせ時に基板の外周部に強い圧力が掛かかっても、
強い圧力に耐えることができ、外周部のギャップが小さ
くなることがない。
According to the structure and manufacturing method of the liquid crystal display device of the present invention, the columnar spacers are formed at a high density in the non-display area of the peripheral portion of the substrate, or the columnar spacers of the non-display area are thickened. By forming, even if a strong pressure is applied to the outer peripheral portion of the substrate at the time of bonding the substrates,
It can withstand strong pressure and does not reduce the outer gap.

【0005】[0005]

【発明の実施の形態】BEST MODE FOR CARRYING OUT THE INVENTION

(実施例1)以下に本発明の一実施例を図面を用いて詳
細に説明する。図1は、本実施例の液晶表示装置の断面
図であり、図2はアレイパターンを示す平面図であり、
図3は薄膜トランジスタ(TFT:Thin Film
Transistor)6部分の拡大断面図である。
なお、図1は図2におけるA−A‘での断面図である。
まず、下側基板であるアレイ基板1と上側基板である対
向基板2とが平行に配置され液晶3を挟持し、シール材
4によって封着されている。
(Embodiment 1) An embodiment of the present invention will be described in detail below with reference to the drawings. FIG. 1 is a cross-sectional view of the liquid crystal display device of this embodiment, and FIG. 2 is a plan view showing an array pattern.
FIG. 3 shows a thin film transistor (TFT).
7 is an enlarged cross-sectional view of a Transistor) 6 portion.
Note that FIG. 1 is a sectional view taken along the line AA ′ in FIG.
First, an array substrate 1 which is a lower substrate and a counter substrate 2 which is an upper substrate are arranged in parallel, sandwiching a liquid crystal 3 and sealed by a sealing material 4.

【0006】まず、アレイ基板1は、厚さ1.1mmの
ガラス基板5にスイッチング素子としてTFT6(図
2、図3)が形成され、そのTFT6に画素電極7が接
続されている。そして最上層に配向膜8が形成されてい
る。また、アレイ基板1には、後に対向基板2と貼り合
わせたときに対向基板2に形成されている柱状スペーサ
ー13の当たる部分に高さを合わせるためのダミーパタ
ーン25が形成されている。
First, in the array substrate 1, TFTs 6 (FIGS. 2 and 3) are formed as switching elements on a glass substrate 5 having a thickness of 1.1 mm, and the pixel electrodes 7 are connected to the TFTs 6. The alignment film 8 is formed on the uppermost layer. Further, the array substrate 1 is formed with a dummy pattern 25 for adjusting the height to a portion where the columnar spacers 13 formed on the counter substrate 2 come into contact when it is later bonded to the counter substrate 2.

【0007】次に対向基板2は、厚さ1.1mmのガラ
ス基板10上に黒色の遮光層11と遮光層11の間隙に
R、G、Bの3色の着色層12(R)、12(G)、1
2(B)が形成されている。遮光層11は各画素間はマ
トリクス状に、外周部は幅広の帯状に形成されている。
そして、外周部に配された遮光層11の内側を表示領域
とし、外周部に配された遮光層11を含みそれより外側
を表示外領域とする。表示外領域にはシール材4の外側
をも含むこととする。さらに対向基板2には、柱状スペ
ーサー13が表示領域と表示外領域とに作り込まれてい
る。柱状スペーサー13は遮光層11上に形成されてお
り表示外領域に形成されている柱状スペーサー13の本
数の密度が表示領域に形成されている柱状スペーサーの
本数の密度より高くなっている。さらに、対向基板2に
は全面に共通電極14が形成されており、そして最上層
に配向膜15が形成されている。
Next, the counter substrate 2 is a glass substrate 10 having a thickness of 1.1 mm, and black colored light-shielding layers 11 and colored layers 12 (R), 12 of three colors of R, G, B in a gap between the light-shielding layers 11. (G), 1
2 (B) is formed. The light-shielding layer 11 is formed in a matrix shape between the pixels and in a wide band shape in the outer peripheral portion.
Then, the inside of the light shielding layer 11 arranged on the outer peripheral portion is set as a display area, and the outer side including the light shielding layer 11 arranged on the outer peripheral portion is set as an outer display area. The non-display area also includes the outside of the sealing material 4. Further, on the counter substrate 2, columnar spacers 13 are formed in the display area and the non-display area. The columnar spacers 13 are formed on the light-shielding layer 11, and the density of the columnar spacers 13 formed in the non-display area is higher than the density of the columnar spacers formed in the display area. Further, a common electrode 14 is formed on the entire surface of the counter substrate 2, and an alignment film 15 is formed on the uppermost layer.

【0008】なお、本発明の第1の基板は本実施例中の
対向基板2に対応し、同様に第2の基板はアレイ基板1
に、第1の透明電極は共通電極14に、第2の透明電極
は画素電極7に、それぞれ対応する。
The first substrate of the present invention corresponds to the counter substrate 2 in this embodiment, and similarly, the second substrate is the array substrate 1
In addition, the first transparent electrode corresponds to the common electrode 14, and the second transparent electrode corresponds to the pixel electrode 7.

【0009】次に本実施例の液晶表示装置の製造工程を
説明する。まず、対向基板2の製造工程を説明する。厚
さ1.1mmのガラス基板10上に感光性の黒色樹脂を
スピンナー等を用いて塗布し、約90℃で10分乾燥さ
せた後、所定のパターン形状のフォトマスクを用いて露
光した後、アルカリ性の溶液にて現像を行い、200℃
で60分の焼成をして膜厚約2.0μmの遮光層11を
形成する。
Next, the manufacturing process of the liquid crystal display device of this embodiment will be described. First, the manufacturing process of the counter substrate 2 will be described. A photosensitive black resin is applied onto a glass substrate 10 having a thickness of 1.1 mm using a spinner or the like, dried at about 90 ° C. for 10 minutes, and then exposed using a photomask having a predetermined pattern shape, Develop with alkaline solution, 200 ℃
By baking for 60 minutes, the light shielding layer 11 having a film thickness of about 2.0 μm is formed.

【0010】次に、赤色の顔料を分散させた紫外線硬化
型アクリル樹脂をスピンナーにて塗布し、赤を着色した
い部分と柱状スペーサー13を形成したい部分とに紫外
線が照射されるようなフォトマスクを介して紫外線を照
射し、例えばKOHの1%水溶液で約10秒間現像し、
赤の着色層12(R)と3層構造の柱状スペーサー13
の一層を形成する。ここで、後に基板の外周部は切り落
とされることになるがその切り落とされる領域にも柱状
スペーサー13を形成しておく。(図4参照)こうする
ことにより、貼り合わせ時にセルギャップ不良を起こり
にくくなるという効果がある。同様に緑、青についても
着色したい部分と柱状スペーサー13を形成したい部分
に着色層12(G)、12(B)を繰り返し形成し、そ
れぞれ230℃で60分焼成する。このようにして着色
層12(R)、12(G)、12(B)と柱状スペーサ
ー13を形成する。このとき赤、緑、青の着色層12
(R)、12(G)、12(B)の膜厚はそれぞれ1.
5μmとし、柱状スペーサーの柱の直径は12(R)が
10μm、12(G)が13μm、12(B)が16μ
mで上層ほど太くした。このようにすることによって柱
状スペーサー13が逆テーパー状になり、後に共通電極
14を基板全面に被覆したときに柱状スペーサー13の
側面に共通電極14が付きにくくなるので、電気的にア
レイ基板1と導通する可能性が非常に小さくなる。そし
て、表示領域は1mm2あたり約30個、表示外領域は
1mm2あたり約60個の柱状スペーサーを形成した。
このとき柱状スペーサーは13遮光層11の上に形成さ
れ、さらに、表示領域に形成された柱状スペーサー13
はアレイ基板1と貼り合わせたときにゲート線20、ま
たは信号線30の上にくるように配置されており、表示
外領域は高さを合わせるためにダミーパターン25の上
にくるように配置されている。本実施例での柱状スペー
サー13は、表示領域はゲート絶縁膜21と信号線30
の上に、表示外領域はゲート線20とゲート絶縁膜21
のダミーパターンの上25に載っている。さらに、後の
ラビング処理で柱状スペーサー13が障害になってラビ
ングの陰の領域ができてしまうので、その陰の部分が遮
光層11の領域内でおさまり、表示に影響を及ぼさない
位置にくるように柱状スペーサー13の配置を考慮する
必要もある。
Next, an ultraviolet-curable acrylic resin in which a red pigment is dispersed is applied by a spinner, and a photomask is irradiated so that the portion to be colored red and the portion to form the columnar spacer 13 are irradiated with ultraviolet rays. Irradiate with ultraviolet light through, for example, develop with a 1% aqueous solution of KOH for about 10 seconds,
Red colored layer 12 (R) and columnar spacer 13 having a three-layer structure
Forming one layer of. Here, the outer peripheral portion of the substrate will be cut off later, but the columnar spacers 13 are also formed in the cut-off region. (Refer to FIG. 4) This has an effect that a cell gap defect is less likely to occur at the time of bonding. Similarly, for green and blue, the colored layers 12 (G) and 12 (B) are repeatedly formed on the portions to be colored and the portions on which the columnar spacers 13 are to be formed, and each is baked at 230 ° C. for 60 minutes. In this manner, the colored layers 12 (R), 12 (G), 12 (B) and the columnar spacer 13 are formed. At this time, the red, green, and blue colored layers 12
(R), 12 (G), and 12 (B) have film thicknesses of 1.
The diameter of the pillar of the pillar spacer is 10 μm for 12 (R), 13 μm for 12 (G), and 16 μ for 12 (B).
The upper layer was thicker in m. By doing so, the columnar spacers 13 have a reverse taper shape, and when the common electrode 14 is coated on the entire surface of the substrate later, it becomes difficult for the common electrodes 14 to be attached to the side surfaces of the columnar spacers 13. The chance of conduction is very small. Then, about 30 per display area 1 mm 2, the non-display region to form about 60 columnar spacer per 1 mm 2.
At this time, the columnar spacers 13 are formed on the light shielding layer 11, and the columnar spacers 13 formed in the display region are further formed.
Is arranged so as to be on the gate line 20 or the signal line 30 when it is bonded to the array substrate 1, and the non-display area is arranged so as to be on the dummy pattern 25 in order to adjust the height. ing. In the display region of the columnar spacer 13 in this embodiment, the gate insulating film 21 and the signal line 30 are provided.
In addition, the non-display area is covered with the gate line 20 and the gate insulating film 21.
It is on the top 25 of the dummy pattern. Further, since the columnar spacer 13 becomes an obstacle in the rubbing process later and a shadow area of the rubbing is formed, the shadow area is settled in the area of the light shielding layer 11 so as not to affect the display. It is also necessary to consider the arrangement of the columnar spacers 13.

【0011】本実施例のように着色層12と同時に柱状
スペーサー13を形成すれば、スペーサーを形成する工
程を1つ減らすことができるが、着色層と同時に形成し
なくても、着色層を形成した後に顔料の入っていない樹
脂を用いて別に形成してもかまわない。
By forming the columnar spacers 13 at the same time as the colored layer 12 as in the present embodiment, the number of steps for forming the spacers can be reduced by one, but the colored layer can be formed without forming the spacers at the same time. After that, a resin not containing a pigment may be separately formed.

【0012】その後、共通電極14としてITO(In
dium Tin Oxide)膜をスパッタ法にて1
500オングストロームの厚さに形成する。この上に、
例えばポリイミドを形成しラビング処理を行って配向膜
15を形成し、対向基板2が完成する。
Thereafter, ITO (In
1Din Tin Oxide) film by sputtering method
Form to a thickness of 500 Å. On top of this,
For example, polyimide is formed and a rubbing process is performed to form the alignment film 15, and the counter substrate 2 is completed.

【0013】次にアレイ基板1の製造方法は、厚さ1.
1mmのガラス基板5上に成膜とパターニングを繰り返
してTFT6を形成する。図3に示すようにMoW(モ
リブデン・タングステン)、あるいはMoTa(モリブ
デン・タンタル)等から成るゲート線20、図示しない
補助容量線、及び補助容量線と一体のトランスファ用の
引き出し電極を形成し、そのうえにSiOXをプラズマ
CVD法により、4000オングストロームの暑さに堆
積し、ゲート絶縁膜21を形成する。ここで、後に対向
基板2と貼り合わせたときに対向基板2に形成されてい
る柱状スペーサー13が当たる位置に、高さ合わせのた
めにゲート線20とゲート絶縁膜21とでダミーパター
ン25を形成しておく。このダミーパターン25はゲー
ト絶縁膜21と信号線30によって形成してもかまわな
い。
Next, the method for manufacturing the array substrate 1 has a thickness of 1.
The TFT 6 is formed by repeating film formation and patterning on the 1 mm glass substrate 5. As shown in FIG. 3, a gate line 20 made of MoW (molybdenum / tungsten) or MoTa (molybdenum / tantalum), an auxiliary capacitance line (not shown), and a lead-out electrode for transfer integrated with the auxiliary capacitance line are formed. SiO x is deposited at a heat of 4000 angstrom by plasma CVD method to form a gate insulating film 21. Here, a dummy pattern 25 is formed by the gate line 20 and the gate insulating film 21 for height adjustment at a position where the columnar spacer 13 formed on the counter substrate 2 is abutted when it is later bonded to the counter substrate 2. I'll do it. The dummy pattern 25 may be formed by the gate insulating film 21 and the signal line 30.

【0014】その上に、a−Si(アモルファスシリコ
ン)から成る半導体層22をプラズマCVD法により形
成し所定の形状にパターニングする。さらに、場合によ
っては図示しないn+a−Siオーミックコンタクト層
を介して、Mo/Al/Moから成る電極を形成し、所
望の形状にパターニングすることによってソース電極2
3、ドレイン電極24を形成する。
A semiconductor layer 22 made of a-Si (amorphous silicon) is formed thereon by a plasma CVD method and patterned into a predetermined shape. Further, depending on the case, an electrode made of Mo / Al / Mo is formed via an n + a-Si ohmic contact layer (not shown), and patterned into a desired shape to form the source electrode 2
3, the drain electrode 24 is formed.

【0015】次に、透明電極であるITOをソース電極
23に接触させるようにパターニングして画素電極7を
形成する。最後に、ポリイミド等を形成し、ラビング処
理を行うことにより配向膜8を形成する。
Next, the pixel electrode 7 is formed by patterning the transparent electrode ITO so as to contact the source electrode 23. Finally, polyimide or the like is formed and a rubbing process is performed to form the alignment film 8.

【0016】この後、対向基板2の配向膜15の周辺に
沿って注入口の部分以外にシール材4を印刷する。次に
アレイ基板1の配向膜8と、対向基板2の配向膜15が
それぞれ対向し、かつラビング方向が90°の角度をな
すように重ね合わせ、加熱することでシール材4を硬化
させ、貼り合わせる。
After that, the sealing material 4 is printed along the periphery of the alignment film 15 of the counter substrate 2 except the injection port. Next, the alignment film 8 of the array substrate 1 and the alignment film 15 of the counter substrate 2 face each other and are stacked so that the rubbing direction forms an angle of 90 °, and the sealing material 4 is hardened and bonded by heating. To match.

【0017】次に、真空中に空セルを置き、注入口に液
晶材料を浸した状態で徐々に真空状態から大気圧に戻す
ことによって液晶3を注入することができる。そして、
基板外周部を切り落として本実施例における所望の液晶
表示装置が得られる。
Next, the liquid crystal 3 can be injected by placing an empty cell in a vacuum and gradually returning the vacuum state to atmospheric pressure with the liquid crystal material immersed in the inlet. And
The desired liquid crystal display device in this embodiment is obtained by cutting off the outer peripheral portion of the substrate.

【0018】なお、本実施例はTFTアレイ基板を用い
たアクティブマトリクス型液晶表示装置であり、対向基
板側に遮光層が形成された構造であるが、本発明は遮光
層がアレイ基板上に形成された構造の液晶表示装置にも
適用できる。この場合、柱状スペーサーが形成される基
板と、遮光層が形成される基板とが異なることもある。
Although this embodiment is an active matrix type liquid crystal display device using a TFT array substrate and has a structure in which a light shielding layer is formed on the counter substrate side, the present invention forms the light shielding layer on the array substrate. It is also applicable to a liquid crystal display device having the above structure. In this case, the substrate on which the columnar spacer is formed may be different from the substrate on which the light shielding layer is formed.

【0019】また、TFTの構造は本実施例のように逆
スタガ型のみに限るものでなく、さらには上下基板にス
トライプ状の電極を備えたシンプルマトリクス型液晶表
示装置にも適用可能である。
Further, the structure of the TFT is not limited to the inverted staggered type as in the present embodiment, and it is also applicable to a simple matrix type liquid crystal display device having striped electrodes on the upper and lower substrates.

【0020】このように、本実施例は多くの変更及び修
正をつけ加えるられることは勿論である。 (実施例2)本実施例は、図5に示すように、実施例1
における対向基板2の表示外領域を表示領域に近い側の
領域(D1)と表示領域から遠い側の領域(D2)との
2つの領域に分割し、柱状スペーサーの本数の密度を、
表示領域は1mm2に約30個、D1は1mm2に約45
個、D2は1mm2に約60個とした。
As described above, it goes without saying that many changes and modifications can be added to this embodiment. (Embodiment 2) In this embodiment, as shown in FIG.
The non-display area of the counter substrate 2 is divided into two areas, that is, the area (D1) near the display area and the area (D2) far from the display area, and the density of the number of columnar spacers is
About 30 in the display area is 1 mm 2, D1 is about to 1 mm 2 45
And D2 was about 60 per 1 mm 2 .

【0021】なお、上記のD1、D2ように領域を明確
に分けることなく、表示領域から離れていくに従い、徐
々に密度を高くしていってもかまわない。他の構成等は
実施例1と同様である。
It should be noted that the density may be gradually increased as the distance from the display area is increased without clearly dividing the areas as D1 and D2. Other configurations and the like are similar to those of the first embodiment.

【0022】本実施例によれば、柱状スペーサー13の
密度を高くすることで発生し易くなる真空泡を、表示領
域の近くに発生させることを防止でき、かつセルギャプ
不良をも低減することができる。
According to this embodiment, it is possible to prevent vacuum bubbles, which are easily generated by increasing the density of the columnar spacers 13, from being generated in the vicinity of the display area, and also to reduce cell gap defects. .

【0023】(実施例3)本実施例は図6に示すよう
に、表示領域と表示外領域とで柱状スペーサー13の体
積を変える構造である。液晶表示装置の場合2枚の基板
がほぼ平行に配置されているので、柱状スペーサーの体
積を変えることが柱状スペーサーの太さを変えることと
ほぼ同義であるといえる。ただし、柱状スペーサーがテ
ーパー状であったり、太さが途中で変化している柱状ス
ペーサーの場合はこの限りではない。
(Embodiment 3) In this embodiment, as shown in FIG. 6, the volume of the columnar spacer 13 is changed between the display area and the non-display area. In the case of a liquid crystal display device, since the two substrates are arranged substantially in parallel, it can be said that changing the volume of the columnar spacer is substantially synonymous with changing the thickness of the columnar spacer. However, this is not the case when the columnar spacer has a tapered shape or the columnar spacer has a thickness that changes in the middle.

【0024】本実施例は、表示領域には、柱状スペーサ
ー13を形成する12(R)の直径を約10μm、12
(G)の直径を約13μm、12(B)の直径を約16
μmの太さとし、表示外領域には12(R)の直径を約
20μm、12(G)の直径を約26μm、12(B)
の直径を約32μmの太さで形成した柱状スペーサー1
3を形成した。
In the present embodiment, the diameter of 12 (R) forming the columnar spacers 13 is about 10 μm and 12 in the display area.
The diameter of (G) is about 13 μm, and the diameter of 12 (B) is about 16 μm.
In the non-display area, the diameter of 12 (R) is about 20 μm, the diameter of 12 (G) is about 26 μm, and 12 (B).
Columnar spacer 1 with a diameter of about 32 μm
3 was formed.

【0025】他の構成等は実施例1と同様である (実施例4)本実施例は図7に示すように、表示外領域
を表示領域に近い側の領域D3と表示領域から遠い側の
領域D4とに分割し、表示領域には、柱状スペーサー1
3を形成する12(R)の直径を約10μm、12
(G)の直径を約13μm、12(B)の直径を約16
μmの太さとし、表示外領域のD3には12(R)の直
径を約15μm、12(G)の直径を約20μm、12
(B)の直径を約24μmの太さで形成した柱状スペー
サー13を形成し、表示外領域のD4には12(R)の
直径を約20μm、12(G)の直径を約26μm、1
2(B)の直径を約32μmの太さで形成した柱状スペ
ーサー13を形成した。
Other configurations are similar to those of the first embodiment. (Fourth Embodiment) In this embodiment, as shown in FIG. 7, the non-display area is divided into the area D3 near the display area and the area far from the display area. The columnar spacer 1 is divided into a region D4 and a display region.
The diameter of 12 (R) forming 3 is about 10 μm, 12
The diameter of (G) is about 13 μm, and the diameter of 12 (B) is about 16 μm.
The diameter of 12 (R) is about 15 μm, and the diameter of 12 (G) is about 20 μm in D3 of the non-display area.
A columnar spacer 13 having a diameter of (B) is formed with a thickness of about 24 μm, and a diameter of 12 (R) is about 20 μm and a diameter of 12 (G) is about 26 μm in D4 of the non-display area.
A columnar spacer 13 having a diameter of 2 (B) and a thickness of about 32 μm was formed.

【0026】なお、上記のD3、D4のように明確に領
域を分割せずに表示領域から遠くにいくに従い徐々に柱
状スペーサーの直径を大きくしていってもかまわない。
(図8参照)他の構成等は実施例1と同様である。各実
施例とも実施例1と同様に、遮光層がアレイ基板上に形
成された構造等をはじめ、さまざまな変形が可能なこと
は言うまでもない。
Incidentally, the diameter of the columnar spacer may be gradually increased as the distance from the display area is increased without dividing the area clearly like D3 and D4.
(See FIG. 8) Other configurations and the like are similar to those of the first embodiment. Needless to say, each embodiment can be modified in various ways, such as a structure in which the light-shielding layer is formed on the array substrate, as in the first embodiment.

【0027】[0027]

【発明の効果】本発明によれば、貼り合わせ時に起因す
るセルギャップ不良による歩留まりの悪さを改善し、表
示性能の良い液晶表示装置を安価に提供することができ
る。
According to the present invention, it is possible to provide a liquid crystal display device having a good display performance at a low cost by improving the poor yield due to the defective cell gap caused by the bonding.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例1における液晶表示装置の断面
図である。
FIG. 1 is a cross-sectional view of a liquid crystal display device according to a first embodiment of the present invention.

【図2】本発明の一実施例における液晶表示装置のアレ
イパターンを示す平面図である。
FIG. 2 is a plan view showing an array pattern of a liquid crystal display device according to an embodiment of the present invention.

【図3】本発明の一実施例における液晶表示装置の薄膜
トランジスタの構造を示す拡大断面図である。
FIG. 3 is an enlarged cross-sectional view showing a structure of a thin film transistor of a liquid crystal display device according to an embodiment of the present invention.

【図4】本発明の一実施例における液晶表示装置の断面
図であり、基板外週部の切り落とされる領域に形成され
た柱状スペーサー、及びダミーパターンを示す図であ
る。
FIG. 4 is a cross-sectional view of a liquid crystal display device according to an embodiment of the present invention, showing a columnar spacer and a dummy pattern formed in a region to be cut off in the outer peripheral portion of the substrate.

【図5】本発明の実施例2における液晶表示装置の断面
図である。
FIG. 5 is a sectional view of a liquid crystal display device according to a second embodiment of the present invention.

【図6】本発明の実施例3における液晶表示装置の断面
図である。
FIG. 6 is a sectional view of a liquid crystal display device according to a third embodiment of the present invention.

【図7】本発明の実施例4における液晶表示装置の断面
図である。
FIG. 7 is a sectional view of a liquid crystal display device according to a fourth embodiment of the present invention.

【図8】本発明の実施例4の変形例における液晶表示装
置の断面図である。
FIG. 8 is a cross-sectional view of a liquid crystal display device in a modified example of Example 4 of the present invention.

【符号の説明】[Explanation of symbols]

1…アレイ基板 2…対向基板 3…液晶 4…シール材 5、10…ガラス基板 6…薄膜トランジスタ 7…画素電極 8、15…配向膜 11…遮光層 12(R)、12(G)、12(B)…着色層 13…柱状スペーサー 14…共通電極 20…ゲート線 21…ゲート絶縁膜 25…ダミーパターン 30…信号線 DESCRIPTION OF SYMBOLS 1 ... Array substrate 2 ... Counter substrate 3 ... Liquid crystal 4 ... Sealing material 5, 10 ... Glass substrate 6 ... Thin film transistor 7 ... Pixel electrode 8, 15 ... Alignment film 11 ... Light-shielding layer 12 (R), 12 (G), 12 ( B) ... Colored layer 13 ... Columnar spacer 14 ... Common electrode 20 ... Gate line 21 ... Gate insulating film 25 ... Dummy pattern 30 ... Signal line

───────────────────────────────────────────────────── フロントページの続き (72)発明者 倉内 昭一 神奈川県横浜市磯子区新杉田町8番地 株 式会社東芝横浜事業所内 (72)発明者 緑川 輝行 神奈川県川崎市川崎区日進町7番地1 東 芝電子エンジニアリング株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Shoichi Kurauchi, 8 Shinsitada-cho, Isogo-ku, Yokohama, Kanagawa Prefecture Yokohama Corporation, Ltd. (72) Inventor, Teruyuki Midorikawa 7-1, Nisshin-cho, Kawasaki-ku, Kawasaki, Kanagawa Shiba Electronics Engineering Co., Ltd.

Claims (11)

【特許請求の範囲】[Claims] 【請求項1】 第1の基板と第2の基板とに液晶が挟持
され、 前記第1の基板には、前記第1の基板と前記第2の基板
との間隔を保つ複数の柱状スペーサーと、前記液晶に電
圧を与える第1の透明電極とを備え、 前記第2の基板には前記液晶に電圧を与える第2の透明
電極を備えた液晶表示装置において、 前記液晶表示装置は外周部に表示を行わない表示外領域
と、その内側に表示を行う表示領域とが存在し、前記表
示外領域に形成された前記柱状スペーサーの本数の密度
は、前記表示領域に形成された前記柱状スペーサーの本
数の密度より高いことを特徴とする液晶表示装置。
1. A liquid crystal is sandwiched between a first substrate and a second substrate, and the first substrate is provided with a plurality of columnar spacers for maintaining a space between the first substrate and the second substrate. A liquid crystal display device comprising: a first transparent electrode for applying a voltage to the liquid crystal; and a second transparent electrode for applying a voltage to the liquid crystal on the second substrate, wherein the liquid crystal display device is provided on an outer peripheral portion. There is a non-display area that does not perform display and a display area that performs display inside thereof, and the density of the number of the columnar spacers formed in the non-display area is equal to that of the columnar spacers formed in the display area. A liquid crystal display device having a higher density than the number of liquid crystal display devices.
【請求項2】 前記表示外領域に形成された柱状スペー
サーの本数の密度は前記表示領域から遠ざかるほど高い
ことを特徴とする請求項1記載の液晶表示装置。
2. The liquid crystal display device according to claim 1, wherein the density of the number of columnar spacers formed in the non-display area increases as the distance from the display area increases.
【請求項3】 前記表示外領域は表示領域からの距離に
より複数の領域に分割され、分割された領域のうち表示
領域から遠い領域ほど前記柱状スペーサーの本数の密度
が高いことを特徴とする請求項1記載の液晶表示装置。
3. The non-display area is divided into a plurality of areas according to a distance from the display area, and the area farther from the display area among the divided areas has a higher density of the columnar spacers. Item 3. The liquid crystal display device according to item 1.
【請求項4】 第1の基板と第2の基板とに液晶が挟持
され、 前記第1の基板には、前記第1の基板と前記第2の基板
との間隔を保つ複数の柱状スペーサーと、前記液晶に電
圧を与える第1の透明電極とを備え、 前記第2の基板には前記液晶に電圧を与える透明電極を
備えた液晶表示装置において、 前記液晶表示装置は外周部に表示を行わない表示外領域
と、その内側に表示を行う表示領域とが存在し、前記表
示外領域に形成された前記柱状スペーサーの体積が、前
記表示領域に形成された前記柱状スペーサーの体積より
大きいことを特徴とする液晶表示装置。
4. A liquid crystal is sandwiched between a first substrate and a second substrate, and the first substrate is provided with a plurality of columnar spacers for keeping a distance between the first substrate and the second substrate. A liquid crystal display device comprising: a first transparent electrode for applying a voltage to the liquid crystal; and a transparent electrode for applying a voltage to the liquid crystal on the second substrate, wherein the liquid crystal display device performs display on an outer peripheral portion. There is a non-display area and a display area for displaying inside, and the volume of the columnar spacer formed in the display area is larger than the volume of the columnar spacer formed in the display area. Characteristic liquid crystal display device.
【請求項5】 前記表示外領域に形成された柱状スペー
サーの体積は前記表示領域から遠ざかるほど大きいこと
を特徴とする請求項4記載の液晶表示装置。
5. The liquid crystal display device according to claim 4, wherein the volume of the columnar spacer formed in the non-display area increases as the distance from the display area increases.
【請求項6】 前記表示外領域は表示領域からの距離に
より複数の領域に分割され、分割された領域のうち表示
領域から遠い領域ほど前記柱状スペーサーの体積が大き
いことを特徴とする請求項4記載の液晶表示装置。
6. The non-display area is divided into a plurality of areas according to a distance from the display area, and a volume of the columnar spacer is larger in a region farther from the display region among the divided regions. The described liquid crystal display device.
【請求項7】 前記第2の基板には、前記柱状スペーサ
ーの当たる領域にダミーパターンが形成されていること
を特徴とする請求項1または4記載の液晶表示装置。
7. The liquid crystal display device according to claim 1, wherein a dummy pattern is formed on a region of the second substrate which is in contact with the columnar spacer.
【請求項8】 第1の基板と第2の基板とに液晶が挟持
され、前記第1の基板には、前記第1の基板と前記第2
の基板との間隔を保つ複数の柱状スペーサーと、第1の
透明電極とを備え、 前記第2の基板には、ゲート線、ゲート絶縁膜、信号線
を含む薄膜トランジスタと、第2の透明電極とを備えた
液晶表示装置の製造方法であって、 前記第2の基板の製造工程は、 前記薄膜トランジスタを形成する工程の一部で、前記柱
状スペーサーと当たる領域にダミーパターンを形成する
ことを特徴とする液晶表示装置の製造方法。
8. A liquid crystal is sandwiched between a first substrate and a second substrate, and the first substrate and the second substrate are attached to the first substrate.
A plurality of columnar spacers for keeping a distance from the substrate and a first transparent electrode, and the second substrate includes a thin film transistor including a gate line, a gate insulating film and a signal line, and a second transparent electrode. A method of manufacturing a liquid crystal display device comprising: forming a dummy pattern in a region corresponding to the columnar spacer, which is a part of a process of forming the thin film transistor. Method for manufacturing liquid crystal display device.
【請求項9】 前記ダミーパターンを形成する工程は、
前記ゲート線を形成する工程と、前記ゲート絶縁膜を形
成する工程とからなることを特徴とする請求項8記載の
液晶表示装置の製造方法。
9. The step of forming the dummy pattern comprises:
9. The method for manufacturing a liquid crystal display device according to claim 8, comprising a step of forming the gate line and a step of forming the gate insulating film.
【請求項10】 前記ダミーパターンを形成する工程
は、前記ゲート絶縁膜を形成する工程と、前記信号線を
形成する工程とからなることを特徴とする液晶表示装置
の製造方法。
10. The method of manufacturing a liquid crystal display device, wherein the step of forming the dummy pattern includes a step of forming the gate insulating film and a step of forming the signal line.
【請求項11】 第1の基板と第2の基板とに液晶が挟
持され、前記第1の基板には、前記第1の基板と前記第
2の基板との間隔を保つ複数の柱状スペーサーと、第1
の透明電極とを備えた液晶表示装置であって、 前記第1の基板に前記柱状スペーサーを形成する工程
と、 前記打2の基板の前記柱状スペーサーが当たる領域にダ
ミーパターンを形成する工程と、 前記第1の基板と前記第2の基板を貼り合わせる工程
と、 前記貼り合わされた第1及び第2の基板を切り落とす工
程と、を含む液晶表示装置の製造方法において、 前記柱状スペーサーを形成する工程で前記第1の基板の
切り落とされる領域にも前記柱状スペーサーを形成し、 前記ダミーパターンを形成する工程で、前記切り落とさ
れる領域に形成された柱状スペーサーの当たる領域にも
ダミーパターンを形成することを特徴とする液晶表示装
置の製造方法。
11. A liquid crystal is sandwiched between a first substrate and a second substrate, and the first substrate includes a plurality of columnar spacers for keeping a distance between the first substrate and the second substrate. , First
A step of forming the columnar spacers on the first substrate, and a step of forming a dummy pattern in a region of the substrate of the striking 2 where the columnar spacers contact, In a method of manufacturing a liquid crystal display device, including a step of bonding the first substrate and the second substrate, and a step of cutting off the bonded first and second substrates, forming a columnar spacer In the step of forming the columnar spacer in the cut-off region of the first substrate and forming the dummy pattern, the dummy pattern is also formed in the region where the columnar spacer formed in the cut-out region hits. A method for manufacturing a characteristic liquid crystal display device.
JP22896895A 1995-09-06 1995-09-06 Liquid crystal display device and its production Pending JPH0973093A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP22896895A JPH0973093A (en) 1995-09-06 1995-09-06 Liquid crystal display device and its production
TW085110746A TW373098B (en) 1995-09-06 1996-09-03 Liquid crystal exposure component and its fabricating method
US08/708,485 US5978061A (en) 1995-09-06 1996-09-05 Liquid crystal display device
KR1019960039204A KR100227692B1 (en) 1995-09-06 1996-09-06 Lcd and its fabrication method
US09/388,945 US6445437B1 (en) 1995-09-06 1999-09-02 Liquid crystal display device
US10/196,142 US6888608B2 (en) 1995-09-06 2002-07-17 Liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22896895A JPH0973093A (en) 1995-09-06 1995-09-06 Liquid crystal display device and its production

Related Child Applications (1)

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JP2004324362A Division JP3987522B2 (en) 2004-11-08 2004-11-08 Manufacturing method of liquid crystal display device

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Publication Number Publication Date
JPH0973093A true JPH0973093A (en) 1997-03-18

Family

ID=16884694

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