JPH09331123A - Metallic base multilayer wiring board - Google Patents
Metallic base multilayer wiring boardInfo
- Publication number
- JPH09331123A JPH09331123A JP15198196A JP15198196A JPH09331123A JP H09331123 A JPH09331123 A JP H09331123A JP 15198196 A JP15198196 A JP 15198196A JP 15198196 A JP15198196 A JP 15198196A JP H09331123 A JPH09331123 A JP H09331123A
- Authority
- JP
- Japan
- Prior art keywords
- insulating layer
- metal
- wiring board
- multilayer wiring
- circuit board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Insulated Metal Substrates For Printed Circuits (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、薄型でそりの少な
い金属ベース多層配線基板に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a metal-based multilayer wiring board which is thin and has a small amount of warpage.
【0002】[0002]
【従来の技術】DC−DCコンバータ等のオンボード電
源(プリント配線基板上に部品として載せる電源)など
の部品には、高出力で薄型、小型化が要求されている。
それにともない、そこに用いられる金属ベース配線基板
には、放熱性と部品の実装密度の向上が要求されてい
る。このため、この金属ベース配線基板は、ベースとし
て放熱性がよい金属を用いている。一方、小型化して実
装密度を上げるために、実装する部品は、多層回路にし
て実装密度を上げている。例えば、0.1mm程度の厚
さのガラスエポキシ基材の両面に導体回路を形成した多
層回路とし、この多層回路をガラスエポキシプリプレグ
を介して金属ベースの片面に接着して積層している。2. Description of the Related Art Components such as a DC-DC converter and other on-board power supplies (power supplies to be mounted as components on a printed wiring board) are required to have high output, thinness, and miniaturization.
Accordingly, the metal-based wiring board used therefor is required to have improved heat dissipation and mounting density of components. For this reason, this metal-based wiring board uses a metal having good heat dissipation as a base. On the other hand, in order to reduce the size and increase the packaging density, the components to be packaged are multilayer circuits to increase the packaging density. For example, a multilayer circuit in which conductor circuits are formed on both surfaces of a glass epoxy base material having a thickness of about 0.1 mm is formed, and the multilayer circuit is bonded and laminated on one surface of a metal base via a glass epoxy prepreg.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、上述の
金属ベース配線基板には、以下のような問題があった。
即ち、 1)金属ベースの片面に多層回路を積層する構造になっ
ているために、金属ベースを薄くすると、ガラスエポキ
シ基材とガラスエポキシプリプレグの線膨張率が共に金
属に比べて小さいので、積層接着時の加熱状態から冷却
して常温にすると、導体回路側が凸になるようにそりが
発生する。このそりが大きいと、DC−DCコンバータ
ユニットなどの厚さがそりの分だけ厚くなり、このユニ
ットの薄型化が困難になる。また、このそりが大きい
と、多層回路の上に部品を実装する際に、半田ペースト
印刷や自動マウント作業で不具合が生ずる恐れがある。
さらに、部品実装時にハンダリフロー槽内で高温に加熱
されると、部品が実装される導体回路側が凹そりにな
り、冷却時には導体回路側が凸そりになるため、6品を
固定するハンダに応力が加わり、亀裂が生ずる恐れがあ
る。 2)ガラスエポキシ基材は熱伝導性がよくなく、従って
両面に導体回路を形成し、ガラスエポキシプリプレグを
介して金属ベースに接着して積層すると、回路上の部品
や回路導体で発生した熱の放熱性が制約され、電源ユニ
ットの高出力化に限界が生ずる。また、同一電力出力の
場合には、発熱部品の実装密度が制限され、小型化に限
界が生ずる。However, the above-mentioned metal-based wiring board has the following problems.
That is, 1) Since the multilayer circuit is laminated on one side of the metal base, when the metal base is made thin, the linear expansion coefficients of the glass epoxy base material and the glass epoxy prepreg are both smaller than that of the metal, so When the heating state at the time of bonding is cooled to normal temperature, warpage occurs so that the conductor circuit side becomes convex. If this warpage is large, the thickness of the DC-DC converter unit or the like is increased by the amount of the warpage, which makes it difficult to reduce the thickness of this unit. Further, if this warp is large, problems may occur in solder paste printing or automatic mounting work when components are mounted on the multilayer circuit.
Further, when the components are mounted and heated to a high temperature in the solder reflow bath, the conductor circuit side on which the components are mounted becomes concave and the conductor circuit side becomes convex at the time of cooling, so stress is applied to the solder fixing the six products. There is a risk of cracks being added. 2) The glass epoxy base material does not have good thermal conductivity. Therefore, if conductor circuits are formed on both sides and adhered and laminated to the metal base via the glass epoxy prepreg, the heat generated by the parts on the circuit or the circuit conductors The heat dissipation is limited, and there is a limit to increasing the output of the power supply unit. Further, in the case of the same power output, the mounting density of the heat-generating components is limited, and miniaturization is limited.
【0004】[0004]
【課題を解決するための手段】本発明は上記問題点を解
決すべくなされたもので、請求項1記載の発明は、金属
ベースの両面に絶縁層を設け、前記金属ベースの片面の
絶縁層上に多層回路基板を設けた金属ベース多層配線基
板であって、前記絶縁層は無機フィラーを加えた樹脂を
含浸させた織物状物からなり、前記多層回路基板の多層
回路基材は、前記織物状物に銅箔を張り合わせたものか
らなることを特徴とするものである。また、請求項2記
載の発明は、請求項1記載の発明において、金属ベース
の多層回路基板を設けた面と反対側の面に設けた絶縁層
は、表面に凹凸を有することを特徴とするものである。The present invention has been made to solve the above-mentioned problems, and the invention according to claim 1 provides an insulating layer on both surfaces of a metal base, and an insulating layer on one surface of the metal base. A metal-based multilayer wiring board having a multilayer circuit board provided thereon, wherein the insulating layer is a woven material impregnated with a resin containing an inorganic filler, and the multilayer circuit substrate of the multilayer circuit board is the woven material. It is characterized in that it is formed by laminating copper foil on a sheet. The invention according to claim 2 is characterized in that, in the invention according to claim 1, the insulating layer provided on the surface opposite to the surface on which the metal-based multilayer circuit board is provided has unevenness on the surface. It is a thing.
【0005】本発明において、金属ベースとなる金属と
しては、鉄、ステンレス、銅、アルミニウム、あるいは
これらの合金が含まれる。これらの金属のうちでは、比
重が小さいこと、熱伝導性がよいこと、加工性がよいこ
となどを考慮すると、アルミが望ましい。特に、純アル
ミ(JIS1100)にアルマイト処理を施したものが
接着性がよく、好ましい。また、金属ベースの表面にサ
ンドブラスト加工などの物理的粗化、あるいは化成処理
などの化学的研磨で接着性を付与したものを使用しても
よい。さらに、金属ベース厚さは、配線基板の薄型化の
ためにできるだけ薄くする。しかしながら、薄くして剛
性が低下すると、配線基板製造工程、あるいは電源ユニ
ット製作工程において、折れ曲がりなどで絶縁層に障害
が発生し易くなるので、0.5mm以上とすることが望
ましい。In the present invention, the metal serving as the metal base includes iron, stainless steel, copper, aluminum, or alloys thereof. Among these metals, aluminum is preferable in view of its small specific gravity, good thermal conductivity, and good workability. In particular, pure aluminum (JIS1100) subjected to alumite treatment is preferable because it has good adhesiveness. Further, a metal base whose surface is provided with adhesiveness by physical roughening such as sandblasting or chemical polishing such as chemical conversion treatment may be used. Further, the thickness of the metal base is made as thin as possible in order to make the wiring board thinner. However, if the thickness is reduced to lower the rigidity, the insulating layer is likely to be damaged due to bending or the like in the wiring board manufacturing process or the power supply unit manufacturing process. Therefore, the thickness is preferably 0.5 mm or more.
【0006】また、無機フィラーを加えた樹脂として
は、エポキシ系、ポリイミド系、アクリル系、BTレン
ジあるいはこれらの混合物などの接着性絶縁樹脂に、シ
リカ(SiO2 )、アルミナ(Al2 O3 )などの無機
フィラーを70〜80wt%程度加えたものが使用され
る。As the resin containing the inorganic filler, an adhesive insulating resin such as epoxy type, polyimide type, acrylic type, BT range or a mixture thereof, silica (SiO 2 ), alumina (Al 2 O 3 ). An inorganic filler such as 70 to 80 wt% is used.
【0007】絶縁層は、上記無機フィラーを加えた樹脂
をガラスクロス、ガラスマットなどの基材に塗布含浸
し、乾燥して0.1〜0.2mm厚さの織物状物(プリ
プレグ状態としたもの)である。また、多層回路基板
は、上記したのと同様の織物状物のガラスエポキシプリ
プレグを基材として、その両面に銅箔を加熱加圧し、基
材を硬化させて銅張り基板とする。For the insulating layer, a resin such as the above-mentioned inorganic filler is applied and impregnated on a substrate such as a glass cloth or a glass mat and dried to obtain a woven material having a thickness of 0.1 to 0.2 mm (prepreg state). Stuff). In addition, the multilayer circuit board uses a glass epoxy prepreg similar to that described above as a base material, and heats and pressurizes copper foil on both surfaces thereof to cure the base material to form a copper-clad board.
【0008】上述のように、本発明の金属ベース多層配
線基板は、金属ベースの両面に絶縁層を形成し、片側に
多層回路基板を積層しているので、金属ベースの片側の
みに絶縁層を形成した従来の場合に比較して、厚み方向
の構成が対称に近くなり、金属ベースを薄くしても温度
変化により発生するそりが小さくなる。また、金属ベー
ス多層配線基板を構成する絶縁層、および多層回路基板
の基材は無機フィラーを加えて熱伝導性を向上させた織
物状物から構成されているので、放熱性に優れ、電源ユ
ニットの出力電力を大きくすることができる。なお、金
属ベースの多層回路基板を設けた面と反対側の面に設け
た絶縁層の表面に凹凸を設け、表面積を大きくすると、
金属ベースの多層回路基板裏面からの放熱性が一層向上
する。As described above, in the metal-based multilayer wiring board of the present invention, since the insulating layers are formed on both sides of the metal base and the multilayer circuit board is laminated on one side, the insulating layer is provided only on one side of the metal base. Compared with the conventional case of forming, the structure in the thickness direction becomes closer to symmetry, and even if the metal base is thinned, warpage caused by temperature change is reduced. Further, since the insulating layer that constitutes the metal-based multi-layer wiring board and the base material of the multi-layer circuit board are made of a woven material in which an inorganic filler is added to improve thermal conductivity, the heat dissipation is excellent and the power supply unit is excellent. Output power can be increased. In addition, when unevenness is provided on the surface of the insulating layer provided on the surface opposite to the surface provided with the metal-based multilayer circuit board, and the surface area is increased,
The heat dissipation from the back surface of the metal-based multilayer circuit board is further improved.
【0009】[0009]
【発明の実施の形態】以下、図面に基づいて本発明の実
施の形態を詳細に説明する。図1は、本発明にかかる金
属ベース多層配線基板の一実施形態の断面図である。本
実施形態は、アルマイト処理を施した0.5mm厚のA
lベース4の両面に、上面絶縁層3、下面絶縁層5を配
し、上面絶縁層3上には、基材2の両面に導体1を設け
た両面回路基板6を配して構成されている。Embodiments of the present invention will be described below in detail with reference to the drawings. FIG. 1 is a sectional view of one embodiment of a metal-based multilayer wiring board according to the present invention. In the present embodiment, an Alumite-treated A of 0.5 mm thickness is used.
The upper surface insulating layer 3 and the lower surface insulating layer 5 are arranged on both surfaces of the base 4, and the double-sided circuit board 6 in which the conductors 1 are provided on both surfaces of the base material 2 is arranged on the upper surface insulating layer 3. There is.
【0010】ここで、上面絶縁層3は、0.1mm厚さ
のガラスクロスに、アルミナフィラーを82wt%加え
たエポキシ系接着材を塗布含浸し、半硬化状態に乾燥
し、厚さ0.15mmの無機フィラー充填ガラスプリプ
レグを作製し、これをAlベース4の上面に配したもの
である。また、下面絶縁層5は、前述の無機フィラー充
填ガラスプリプレグを2枚重ねて厚さ0.30mmと
し、Alベース4の下面に配したものである。Here, the upper surface insulating layer 3 has a thickness of 0.15 mm, which is obtained by coating and impregnating a glass cloth having a thickness of 0.1 mm with an epoxy adhesive containing 82 wt% of an alumina filler and drying the semi-cured state. Inorganic filler-filled glass prepreg (1) was prepared and placed on the upper surface of the Al base 4. In addition, the lower surface insulating layer 5 is formed by stacking two sheets of the above-mentioned inorganic filler-filled glass prepreg to have a thickness of 0.30 mm and arranged on the lower surface of the Al base 4.
【0011】さらに、両面回路基板6は以下のようにし
て作製した。即ち、上述の無機フィラー充填ガラスプリ
プレグの両面に、105μmの電解銅箔を重ね、真空プ
レスにより170℃×60分間、加熱圧着し、両面銅張
り基板を得た。この両面銅張り基板にスルーホールを開
け、20μmの銅めっきしたのち、エッチングにより回
路を形成したのものである。Further, the double-sided circuit board 6 was manufactured as follows. That is, a 105 μm electrolytic copper foil was placed on both sides of the above-mentioned inorganic filler-filled glass prepreg and heat-pressed by a vacuum press at 170 ° C. for 60 minutes to obtain a double-sided copper-clad substrate. A through hole is opened in this double-sided copper-clad substrate, 20 μm of copper is plated, and then a circuit is formed by etching.
【0012】本実施形態の金属ベース多層配線基板は、
Alベース4の上面に上面絶縁層3と両面回路基板6を
順次配し、Alベース4の下面に下面絶縁層5を配し
て、深さ0.1mmの凹凸をサンドブラストで形成した
ステンレスあて板にのせ、真空プレスにより170℃×
60分間、加熱圧着して製作した。The metal-based multilayer wiring board of this embodiment is
An upper surface insulating layer 3 and a double-sided circuit board 6 are sequentially arranged on the upper surface of the Al base 4, and a lower surface insulating layer 5 is arranged on the lower surface of the Al base 4, and a stainless steel cover plate in which unevenness having a depth of 0.1 mm is formed by sandblasting. Place on a vacuum press at 170 ℃ ×
It was manufactured by thermocompression bonding for 60 minutes.
【0013】次に、従来例として、アルマイト処理を施
した1.0mm厚のAlベースの上面に、厚さ0.15
mmのガラスエポキシプリプレグからなる上面絶縁層、
および厚さ0.1mmのガラスエポキシ基材からなる両
面回路基板を順次配し、上記実施形態と同様にして金属
ベース多層配線基板を作製した。この場合、Alベース
の下面絶縁層は設けていない。Next, as a conventional example, a thickness of 0.15 is formed on the upper surface of a 1.0 mm thick Al base which has been subjected to an alumite treatment.
mm upper surface insulating layer made of glass epoxy prepreg,
A double-sided circuit board made of a glass epoxy base material having a thickness of 0.1 mm was sequentially arranged, and a metal-based multilayer wiring board was produced in the same manner as in the above embodiment. In this case, the Al-based lower surface insulating layer is not provided.
【0014】上記実施例および従来例について、100
mm×60mmのサイズの金属ベース多層配線基板を作
製し、そりを常温で測定した。そりの測定は、平板上に
金属ベース多層配線基板を載せ、金属ベース多層配線基
板の中央部と平板の間の隙間の距離をマイクロゲージで
測定することにより行った。また、発熱部品であるパワ
ートランジスタを実装した状態で、所定時間、所定の通
電をおこない、パワートランジスタの表面温度の上昇
(周囲温度との差)を測定した。これらの測定結果を表
1に示す。For the above-mentioned embodiment and the conventional example, 100
A metal-based multilayer wiring board having a size of mm × 60 mm was manufactured, and the warpage was measured at room temperature. The warpage was measured by placing a metal-based multilayer wiring board on a flat plate and measuring the distance between the central portion of the metal-based multilayer wiring board and the flat plate with a micro gauge. Further, with the power transistor, which is a heat-generating component, mounted, a predetermined energization was performed for a predetermined time, and an increase in surface temperature of the power transistor (difference from ambient temperature) was measured. Table 1 shows the measurement results.
【0015】 ここで、全体厚さとは、導体となる銅箔の厚さを除いた
金属ベース多層配線基板全体の厚さである。[0015] Here, the total thickness is the total thickness of the metal-based multilayer wiring board excluding the thickness of the copper foil which becomes the conductor.
【0016】表1からわかるように、実施形態は従来例
に比較して、金属ベース多層配線基板全体の厚さが薄く
なっているにもかかわらず、そりの量は小さくなってい
る。従って、そり量と全体の厚さの合計した値が減少す
るので、この金属ベース多層配線基板を使用することに
より、電源ユニットなどの薄型化が可能になる。また、
温度差については、薄いAlベースを用いているにもか
かわらず、実施形態の方が従来例よりも小さい値を示
し、温度上昇も小さく、放熱性の点でも従来例よりも優
れていることを示している。As can be seen from Table 1, in the embodiment, as compared with the conventional example, the amount of warpage is small, although the thickness of the entire metal-based multilayer wiring board is thin. Therefore, the total value of the amount of warpage and the total thickness is reduced, so that by using this metal-based multilayer wiring board, it is possible to make the power supply unit thinner. Also,
Regarding the temperature difference, although the thin Al base is used, the embodiment shows a smaller value than the conventional example, the temperature rise is small, and the heat dissipation is superior to the conventional example. Shows.
【0017】なお、本発明は上記実施例に限定されず、
回路基板としては2層以上の回路基板を用いてもよい。The present invention is not limited to the above embodiment,
A circuit board having two or more layers may be used as the circuit board.
【0018】[0018]
【発明の効果】以上説明したように本発明によれば、金
属ベースの両面に絶縁層を設け、前記金属ベースの片面
の絶縁層上に多層回路基板を設けた金属ベース多層配線
基板であって、前記絶縁層は無機フィラーを加えた樹脂
を含浸させた織物状物からなり、前記多層回路基板の多
層回路基材は、前記織物状物に銅箔を張り合わせたもの
からなるため、温度変化により発生するそりを小さくす
ることができ、また、放熱性が向上するという優れた効
果がある。As described above, according to the present invention, there is provided a metal-based multilayer wiring board in which insulating layers are provided on both sides of a metal base, and a multilayer circuit board is provided on the insulating layer on one side of the metal base. The insulating layer is made of a woven material impregnated with a resin to which an inorganic filler is added, and the multilayer circuit substrate of the multilayer circuit board is made by laminating a copper foil on the woven material. There is an excellent effect that the generated warp can be reduced and the heat dissipation is improved.
【図1】本発明に係る金属ベース多層配線基板の一実施
形態の断面図である。FIG. 1 is a sectional view of an embodiment of a metal-based multilayer wiring board according to the present invention.
【符号の説明】 1 導体 2 基材 3 上面絶縁層 4 Alベース 5 下面絶縁層 6 両面回路基板[Explanation of reference numerals] 1 conductor 2 base material 3 upper surface insulating layer 4 Al base 5 lower surface insulating layer 6 double-sided circuit board
───────────────────────────────────────────────────── フロントページの続き (72)発明者 小安 光一 東京都千代田区丸の内2丁目6番1号 古 河電気工業株式会社内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Koichi Oyasu 2-6-1, Marunouchi, Chiyoda-ku, Tokyo Furukawa Electric Co., Ltd.
Claims (2)
金属ベースの片面の絶縁層上に多層回路基板を設けた金
属ベース多層配線基板であって、前記絶縁層は無機フィ
ラーを加えた樹脂を含浸させた織物状物からなり、前記
多層回路基板の多層回路基材は、前記織物状物に銅箔を
張り合わせたものからなることを特徴とする金属ベース
多層配線基板。1. A metal-based multi-layer wiring board in which an insulating layer is provided on both sides of a metal base, and a multi-layer circuit board is provided on the insulating layer on one side of the metal base, wherein the insulating layer is a resin containing an inorganic filler. 2. A metal-based multilayer wiring board, comprising a woven fabric impregnated with a woven fabric, wherein the multilayer circuit substrate of the multilayer circuit board is formed by laminating a copper foil on the woven fabric.
反対側の面に設けた絶縁層は、表面に凹凸を有すること
を特徴とする請求項1記載の金属ベース多層配線基板。2. The metal-based multilayer wiring board according to claim 1, wherein the insulating layer provided on the surface opposite to the surface provided with the metal-based multilayer circuit board has irregularities on the surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15198196A JPH09331123A (en) | 1996-06-13 | 1996-06-13 | Metallic base multilayer wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15198196A JPH09331123A (en) | 1996-06-13 | 1996-06-13 | Metallic base multilayer wiring board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09331123A true JPH09331123A (en) | 1997-12-22 |
Family
ID=15530460
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15198196A Pending JPH09331123A (en) | 1996-06-13 | 1996-06-13 | Metallic base multilayer wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH09331123A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007317701A (en) * | 2006-05-23 | 2007-12-06 | Koha Co Ltd | Substrate for light source, and illuminator employing it |
JP2008053362A (en) * | 2006-08-23 | 2008-03-06 | Mitsubishi Electric Corp | Printed wiring board and its manufacturing method |
KR100919975B1 (en) * | 2009-04-14 | 2009-10-05 | 주식회사 엘아이테크 | Print circuit board having excellent heat dissipating and light emitting diode module using thereof |
JP2011187477A (en) * | 2010-03-04 | 2011-09-22 | Nhk Spring Co Ltd | Manufacturing method for metal base circuit board, and metal base circuit board |
JP2012144687A (en) * | 2010-12-20 | 2012-08-02 | Panasonic Corp | Resin sheet, metallic foil with resin, substrate material, and component-mounting substrate |
-
1996
- 1996-06-13 JP JP15198196A patent/JPH09331123A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007317701A (en) * | 2006-05-23 | 2007-12-06 | Koha Co Ltd | Substrate for light source, and illuminator employing it |
JP2008053362A (en) * | 2006-08-23 | 2008-03-06 | Mitsubishi Electric Corp | Printed wiring board and its manufacturing method |
KR100919975B1 (en) * | 2009-04-14 | 2009-10-05 | 주식회사 엘아이테크 | Print circuit board having excellent heat dissipating and light emitting diode module using thereof |
JP2011187477A (en) * | 2010-03-04 | 2011-09-22 | Nhk Spring Co Ltd | Manufacturing method for metal base circuit board, and metal base circuit board |
JP2012144687A (en) * | 2010-12-20 | 2012-08-02 | Panasonic Corp | Resin sheet, metallic foil with resin, substrate material, and component-mounting substrate |
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