JPH09267270A - Diamond abrasive belt and cement slab grinding method therewith - Google Patents

Abstract

PROBLEM TO BE SOLVED: To make improvements in production efficiency by way of reducing a span of dwell time necessary for changing such expendables as an abrasive roll and an abrasive belt in a process for grinding a cement slab as well as hold the extent of cost requiring the regeneration and replacement of these expendables down, insofar as possible. SOLUTION: After conveying the surface of a cement slab S finished through the extrusion molding in a state of being exposed, first of all, an abrasive roll 31 on which diamond abrasive grains D1 are attached tight is rotated and a surface of the cement slab S is roughly ground. Next, an abrasive belt 41, where an electrocoating abrasive grain part secured with diamond abrasive grains D2 smaller than the abrasive grains D1 by means of a metal plating layer is plurally installed on the surface, is rotated as well, and the surface of the cement slab S roughly ground is a little finely ground. Finally, a finishing abrasive belt 51 on which silicon carbide abrasive grains C are attached tight is rotated, thereby finishing the surface of the cement slab S somewhat finely ground after grinding it further once more.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a diamond polishing belt using diamond abrasive grains, and a polishing method for finish polishing the surface of a cement plate extruded and molded using the diamond polishing belt.

[0002]

2. Description of the Related Art Cement plates used for decorative plates of buildings are subjected to finish polishing after extrusion to eliminate unevenness in thickness and to finish the surface more smoothly and finely. As shown in FIG. 5, the polishing apparatus for performing the final polishing conveys the cement plate S above the belt conveyor (conveying means) 1 that conveys the cement plate S that has been extruded with the surface thereof exposed. A plurality of polishing means are arranged along the direction.

These polishing means are coarse (medium coarse) polishing means 3 and 4 which perform polishing by rotating the polishing rolls 3a and 4a to which the abrasive grains of diamond are fixed on the upstream side in the conveying direction of the cement plate S. Further, on the downstream side in the transport direction of the cement plate S, there are constituted final polishing means 5 and 6 for polishing by rotating annular polishing belts 5a and 6a to which abrasive grains of silicon carbide are fixed. While carrying the surface of the cement plate S by 4, 5, and 6, polishing is performed in four steps.

[0004]

The polishing rolls 3a, 4a used in this polishing apparatus have abrasive grains of diamond adhered to the surface of the roll body by metal plating. It has been pointed out that it takes time to replace it when it drops and the cost required for re-plating is high. Further, although the polishing belts 5a and 6a require a short time for replacement, the deterioration of the grinding ability is faster than the polishing rolls and the frequency of replacement is high, and therefore the time required for replacement is long in the long run. It was pointed out that the cost was high because it was disposable.

The present invention has been made in view of the above circumstances, and improves the production efficiency by reducing the operation stop time required for exchanging consumable parts such as a polishing roll and a polishing belt in the step of polishing a cement plate. The present invention provides a method for polishing a cement plate and a polishing belt, which keeps costs for reclaiming and replacing consumable parts low.

[0006]

A diamond polishing belt according to a first aspect of the present invention has a ring-shaped surface of a cloth material,
A plurality of electro-deposited abrasive grain parts in which diamond abrasive grains are fixed by a metal plating layer are provided, and the electro-deposited abrasive grain parts are arranged apart from each other in the circumferential direction of the cloth material. .

A diamond polishing belt according to a second aspect of the invention is characterized in that the electrodeposition abrasive grain portions of the polishing belt according to the first aspect are arranged in a dot shape on the surface of the cloth material.

According to a third aspect of the present invention, in the diamond polishing belt according to the second aspect, the electrodeposition abrasive grains in the polishing belt are aligned vertically and horizontally so that they are arranged at the intersections of the lattice pattern, and the polishing belt. Is arranged obliquely with respect to the fiber direction of the cloth material arranged so as to coincide with the rotation direction of.

A method for polishing a cement plate according to a fourth aspect is a method for polishing a cement plate using the diamond polishing belt according to any one of the first, second and third aspects, wherein extrusion molding is completed. The cement plate is transported with the surface exposed, and in the process of transportation, first, the polishing roll to which the diamond abrasive grains are fixed is rotated to scrape the surface of the cement plate to roughen the surface. Rotate the annular diamond polishing belt to which the finer diamond grains are fixed than the one used when doing, and perform fine polishing a little more by scraping the surface of the roughened cement plate again, the annular polishing belt It is characterized by performing final polishing by rotating and rotating the surface of the cement plate that has been slightly finely ground again. .

[0010]

DESCRIPTION OF THE PREFERRED EMBODIMENTS A diamond polishing belt according to the present invention and a cement plate polishing method using the same will be described with reference to FIGS. The cement plate polishing apparatus shown in FIG. 1 includes a belt conveyor 10 that conveys the cement plate S that has been extruded, and a polishing means 20 that polishes the surface of the cement plate S above the belt conveyor. .

The polishing means 20 is arranged on the upstream side of the cement plate S in the conveying direction, and rough polishing means 30 for roughly polishing the cement plate S, and downstream of the rough polishing means 30 in the conveying direction of the cement plate S. The medium rough polishing means 40 is arranged and slightly finely polishes, and the final polishing means 50 is arranged downstream of the medium rough polishing means 40 in the transport direction of the cement plate S and finely polishes the cement plate S.

The rough polishing means 30 is a diamond abrasive grain D.
A polishing roll 31 to which ₁ is fixed is rotatably supported, and polishing is performed by rotating this polishing roll 31 along a cement plate S in the course of conveyance. The abrasive grains D ₁ are fixed by the metal plating phase formed on the surface of the roll body 32, and # 30
Coarse grain is used.

In the medium rough polishing means 40, an annular polishing belt (diamond polishing belt) 41, to which abrasive grains D _{2 of} diamond finer than the abrasive grains D ₁ are fixed, is provided with a rotating roller 42 arranged at a distance. , 42 is rotatably supported, and polishing is performed by rotating the polishing belt 41 along the cement plate S in the course of conveyance, as in the rough polishing means 30.

The final polishing means 50 comprises an annular polishing belt 51 to which silicon carbide abrasive grains C, which are slightly larger than the abrasive grains D _2, are fixed, and a rotating roller 52, which is arranged at a distance.
The polishing belt 51 is rotatably supported between 52, and polishing is performed by rotating the polishing belt 51 along the cement plate S in the course of transportation, similarly to the rough polishing means 30 and the medium rough polishing means 40. Has become. The abrasive grains C are fixed to the cloth as the base of the polishing belt 51 with an adhesive, and fine grains of # 120 are used.

By the way, the polishing belt 41 in the rough grinding unit 40 in, as shown in FIGS. 2 and 3, the table cloth, which is the annular surface of the (fabric material) 43, a metal abrasive grains D ₂ diamond Electrodeposited abrasive grain portion 45 fixed by the plating layer 44
Are provided in plural. In addition, on the back surface of the front cloth material 43, an annular back cloth material 46 similar to the front cloth material 43,
It is attached to the entire surface via the adhesive layer 47.

The surface cloth material 43 is made of a chemical fiber such as polyester, and may be woven by plain weave, twill weave, or other weaves, but the weave is dense to prevent elongation. desirable. The thickness of the weaving yarn depends on the type and use of the fiber, but is about 75 to 400 denier,
In particular, it is desirable that the denier is 75 to 300. 75
If it is less than denier, the fabric is too thin and lacks strength.
If it is thicker than denier, the cloth becomes too thick and the required flexibility cannot be obtained.

On the surface cloth material 43, an electroless plating layer 48 of Cu (copper) is formed on the entire surface in order to impart conductivity. The amount of the electroless plating layer 48 deposited is 0.1 to 0.5.
g / dm ^2, preferably it is 0.2 to 0.3 g / dm ^2. If it is less than 0.1 g / dm ² , sufficient conductivity cannot be obtained, and if it is more than 0.5 g / dm ² , the fiber is too hard.

The electrodeposited abrasive grain portion 45 comprises abrasive grain D ₂ of # 170 diamond and a metal plating layer 44 for adhering these abrasive grains D ₂ to the surface cloth material 43. The thickness of the metal plating layer 44 is 30 to 70 of the average particle diameter of the abrasive grains D _2.
%, Especially 40 to 50% is desirable. If it is less than 30%, the abrasive grain holding power is lowered and the drop of the abrasive grains D ₂ is increased, and if it is more than 70%, the protrusion amount of the abrasive grains D ₂ is decreased and the sharpness of polishing is lowered.

Each of the electro-deposited abrasive grain portions 45 is a small circle, and these are arranged vertically and horizontally on the surface of the surface cloth material 43 so as to be spaced apart from each other at the intersections of the lattice pattern to form a dot shape. In addition, the zigzag pattern is arranged obliquely (θ = 72 °) with respect to the fiber direction (the arrow X direction in the drawing) of the cloth material that is arranged to match the rotation direction of the polishing belt 41.

On the other hand, the back cloth material 46 mainly increases the tensile strength of the polishing belt 41, and a cloth thicker than the front cloth material is selected according to the required strength. The material and weave may be the same as those of the surface cloth material, but various reinforcing fibers may be mixed in the longitudinal direction in order to further increase the tensile strength.

The adhesive forming the adhesive layer 47 is preferably highly elastic and is appropriately selected from rubber adhesives, urethane adhesives, epoxy elastic adhesives and the like. It should be noted that foaming may be performed in order to enhance elasticity as long as the requirement for adhesive strength can be satisfied.

Now, a method of manufacturing the above-mentioned polishing belt 41 will be described. First, C is applied to the surface cloth material 43 during electroless plating.
A surface catalyzation treatment for precipitating u is performed. In addition, it is desirable that the surface cloth material 43 be sufficiently stretched in advance. By doing so, the microscopic looseness of the fibers is corrected and the flatness of the surface is enhanced.

The surface-catalyzed treatment is a treatment in which noble metal catalyst nuclei such as Au, Pt, Pd, and Ag are provided on the front surface of the fiber yarn constituting the surface cloth material. The surface cloth material 43 is first reduced with SnCl ₂ or the like. After immersing in an agent solution for sensitizing, it is washed with water, and further immersed in a salt solution of a noble metal such as PdCl ₂ and washed with water.

Next, the surface cloth material 43 obtained in this manner is made of Cu.
The electroless plating solution is used to deposit a metal coating on the surface of the fiber which has been subjected to the surface catalyzation treatment, to impart conductivity to the entire cloth.

Next, after thoroughly cleaning the surface cloth material 43 on which the electroless plating layer 48 is formed, the surface of the surface cloth material 43 is masked so that the portion forming the electrodeposition abrasive grain portion 45 is removed in a round shape. Then, it is immersed in a Cu electroplating solution in which abrasive grains D ₂ are dispersed, connected to a power source cathode, and an electric current is applied to an anode arranged in the electroplating solution to polish the portion where the masking is removed. The particles D ₂ are fixed by the metal plating layer 44 to form the electrodeposition abrasive grain portion 45.

Then, after removing the masking, the back cloth material 46 is attached to the back surface of the front cloth material 43 with an adhesive to obtain the polishing belt 41.

Next, the process of polishing the cement plate S that has been extruded using the above-mentioned cement plate polishing apparatus will be described.

While the cement plate S, which has been extruded, is conveyed by the belt conveyor 10, the rough polishing means 30 first performs rough polishing by rotating the polishing roll 31 to which the diamond abrasive grains D ₁ are fixed. .

Next, in the medium rough polishing means 40, the medium rough polishing is performed by rotating the polishing belt 41 to which the diamond abrasive grains D ₂ are fixed. At this time, since the small circular electro-deposited abrasive grain portions 45 are spaced apart from each other and arranged in the vertical and horizontal directions to form a dot shape on the polishing belt 41, the polishing belt 41 is It becomes very flexible in the circumferential direction, and the grinding powder of the cement plate S is made to flow backward from between the electrodeposition abrasive grain portions 45. Moreover, the electrodeposited abrasive grain portions 45 arranged in dots
However, since they are arranged in a zigzag pattern obliquely with respect to the fiber direction of the cloth material arranged in conformity with the rotation direction of the polishing belt 41, the electroplated abrasive grain portions 45 are evenly distributed on the surface of the cement plate S. The surfaces of the cement plate S are contacted and ground smoothly.

Finally, in the final polishing means 50, final polishing is performed by rotating the annular polishing belt 51 to which the abrasive grains C of silicon carbide are fixed. A cement board S having a smooth surface is manufactured through the above three steps of polishing process.

In the polishing belt 41 used for the medium roughing in the above-mentioned cement plate polishing apparatus, small circular electrodeposition abrasive grain portions 45 are vertically and horizontally arranged so as to be spaced from each other and arranged at the intersections of the lattice pattern. Since the polishing belt 41 is aligned and formed into a dot shape, the polishing belt 41 becomes very flexible in the circumferential direction and smoothly rotates, and the electro-deposited abrasive grain portion 45 does not easily peel off from the surface cloth material 43. Further, since the grinding powder of the cement plate S is made to flow backward from between the electrodeposition abrasive grain portions 45, the grinding powder is also formed on the surface of the belt, particularly on a slight step on the front portion in the traveling direction of the electrodeposition abrasive grain portions 45. Difficult to collect.

Further, the electrodeposited abrasive grain portions 45 arranged in dots are arranged obliquely with respect to the fiber direction of the surface cloth material 43 arranged so as to coincide with the rotation direction of the polishing belt 41 to form a zigzag pattern. As a result, the electro-deposited abrasive grain portions 45 evenly contact the surface of the cement plate S, and the cement plate S is unlikely to have streaks due to polishing.

As described above, since the polishing belt 41 has a high grinding ability and excellent durability, it is replaced less frequently. Moreover, this polishing belt 41 is adopted as the medium rough polishing means 40,
The rough polishing means 30 is provided at the front stage, and the finish polishing means 5 is provided at the rear stage.
0 are arranged respectively, a polishing roll 31 using diamond abrasive grains, and a polishing belt 51 using silicon carbide abrasive grains
Since the number of each is one, the work interruption time due to replacement is halved compared to the conventional polishing apparatus. That is, as compared with the conventional polishing apparatus, the work interruption time due to replacement of consumable parts is halved to improve the production efficiency, and the frequency of replacement with a new product is extremely reduced to reduce the running cost.

[0034]

EXAMPLE A cement plate S was actually subjected to a polishing test using the polishing belt 41 configured as described above, and the grinding ability and life of the polishing belt 41 were investigated. In this test, the rough polishing means 30 and the finish polishing means 50 are not used for polishing, and only the medium rough polishing means 40 is used. Of the surface of the cement plate S with respect to the total length of grinding of the cement plate S in the case where the conventional polishing belt to which the abrasive grains of silicon carbide are fixed under the same condition is mounted The reduced size (thickness to be ground) was measured. The test conditions for the polishing test are shown below. Cement plate feed speed: 5 m / min Belt speed: 800 m / min Belt size: 100 mm x 1525 mm Grinding load: 0.288 HP / 25 mm Grinding material: Extruded cement plate 60 mm (width) x 60
0 (length) mm Contact (rotating roller): 38φ steel plain roll

FIG. 4 is a graph showing the size of the conversion allowance on the surface of the cement board with respect to the total grinding length of the cement board S measured by the test. As is clear from the graph, when the polishing belt 41 was attached, the conversion allowance 148 to 169 μm was maintained until the completion of the test. From the start to the end of the test (up to a total length of cement board S of 1200 m)
An almost stable grinding ability was shown. Further, even when the total length is 1200 m, the grinding ability is still not deteriorated, so it is presumed that the life is longer than this.

[0036]

According to the diamond polishing belt of the first aspect of the invention, a plurality of electrodeposited abrasive grains having diamond abrasive grains fixed by a metal plating layer are provided on the surface of an annular cloth material. Since the electro-deposited abrasive grain portions are arranged apart from each other in the circumferential direction of the cloth material, the metal-plated portion is reduced, and the belt itself becomes very flexible in the circumferential direction of the cloth material, and the belt is not rotated. It becomes smooth, and the electro-deposited abrasive grain portion can be made difficult to peel off from the cloth material.

According to the diamond polishing belt of the second aspect, since the electrodeposition abrasive grain portions of the polishing belt are arranged in a dot pattern on the surface of the cloth material, the grinding powder of the cement plate is the electrodeposition abrasive grain. It will be washed backward from between the parts,
As a result, it becomes difficult for the grinding powder to collect on the surface of the belt, particularly on the slight step portion in the front portion in the traveling direction of the electrodeposition abrasive grain portion. Therefore, the grinding ability can be kept high for a longer time as compared with the conventional polishing belt.

According to the diamond polishing belt of the third aspect, the electrodeposited abrasive grain portions are vertically and horizontally aligned as they are arranged at the intersections of the lattice pattern, and are arranged so as to match the rotation direction of the polishing belt. Since they are arranged obliquely with respect to the fiber direction of the formed cloth material, the electrodeposited abrasive grains come into uniform contact with the surface of the cement plate. Therefore, it is possible to make the surface of the cement plate smooth by making it difficult to generate streaks due to polishing.

According to the cement plate polishing method of the fourth aspect, the polishing process is performed in three stages of rough polishing, medium rough polishing, and final polishing, so that the polishing process has more wear than conventional ones. By using a diamond polishing belt that has fewer parts as a whole and has higher durability and grinding ability than conventional polishing belts in the process of medium-rough polishing, overall work interruption time due to replacement of these consumable parts The production cost can be shortened to improve the production efficiency, and the running cost for recycling consumable parts and replacement with new ones can be kept low.

[Brief description of drawings]

FIG. 1 is a perspective view showing an embodiment of a cement plate grinding apparatus including a diamond polishing belt according to the present invention.

FIG. 2 is a plan view showing an embodiment of a diamond polishing belt according to the present invention.

FIG. 3 is a sectional view taken along the line III-III in FIG.

FIG. 4 is a graph showing the results of a polishing test of the diamond polishing belt according to the present invention.

FIG. 5 is a perspective view showing a conventional cement plate polishing apparatus.

[Explanation of symbols]

10 Belt Cobber 20 Polishing Means 30 Rough Polishing Means 31 Polishing Rolls 40 Medium Rough Polishing Means 41 Polishing Belts (Diamond Polishing Belts) 43 Surface Cloth Materials (Cloth Materials) 44 Metal Plating Layers 45 Electrodeposited Grain Layers 48 Electroless Plating Layers 50 Finishing Polishing means 51 Polishing belt D ₁ , D ₂ Diamond abrasive grains C Silicon carbide abrasive grains S Cement plate

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Naoki Shimozene 246-1 Ekoshi, Kurosuno, Izumi-cho, Iwaki-shi, Fukushima Mitsubishi Materials Corporation Iwaki Works

Claims (4)

[Claims] 1. A ring-shaped cloth material is provided with a plurality of electro-deposited abrasive particles, in which diamond abrasive particles are fixed by a metal plating layer, on the surface of the cloth material. A diamond polishing belt, characterized in that they are spaced apart in the circumferential direction. 2. The diamond polishing belt according to claim 1, wherein the electrodeposition abrasive grain portions are arranged in a dot shape on the surface of the cloth material. 3. The diamond polishing belt according to claim 2, wherein the electro-deposited abrasive grain portions are aligned vertically and horizontally as arranged at intersections of a lattice pattern, and are aligned with a rotation direction of the polishing belt. A diamond polishing belt, wherein the diamond polishing belt is arranged obliquely with respect to the fiber direction of the arranged cloth material. 4. A method for polishing a cement plate using the diamond polishing belt according to claim 1, wherein the cement plate after extrusion molding is conveyed with its surface exposed. However, during the transportation process, the polishing roll to which the diamond abrasive grains are adhered is rotated in the circumferential direction to scrape the surface of the cement plate to perform rough polishing. Rotate the ring-shaped diamond polishing belt to which the diamond grains are fixed in the circumferential direction, and grind the surface of the cement plate that has been roughly polished to perform fine grinding, and rotate the ring-shaped polishing belt in the circumferential direction. A method for polishing a cement board, which comprises performing finish polishing by shaving the surface of a slightly finely ground cement board.