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JPH0924346A - Mist collecting device - Google Patents

Mist collecting device

Info

Publication number
JPH0924346A
JPH0924346A JP19794695A JP19794695A JPH0924346A JP H0924346 A JPH0924346 A JP H0924346A JP 19794695 A JP19794695 A JP 19794695A JP 19794695 A JP19794695 A JP 19794695A JP H0924346 A JPH0924346 A JP H0924346A
Authority
JP
Japan
Prior art keywords
mist
vacuum pump
tank
sealing liquid
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19794695A
Other languages
Japanese (ja)
Other versions
JP3542415B2 (en
Inventor
Kiyoshi Shimada
清 嶋田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SPC Electronics Corp
Original Assignee
SPC Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SPC Electronics Corp filed Critical SPC Electronics Corp
Priority to JP19794695A priority Critical patent/JP3542415B2/en
Publication of JPH0924346A publication Critical patent/JPH0924346A/en
Application granted granted Critical
Publication of JP3542415B2 publication Critical patent/JP3542415B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

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  • Cleaning By Liquid Or Steam (AREA)
  • Extraction Or Liquid Replacement (AREA)

Abstract

PROBLEM TO BE SOLVED: To surely collect mist and also to prevent its release into the atmosphere by sucking a high concentration mist with a water seal type vacuum pump via a sucking pipe and discharging the sucked mist to a tank connected with a feed side of the water seal type vacuum pump. SOLUTION: The high concentration mist generated in a wet treating device 1 is sucked with the water seal type vacuum pump 19 via the sucking pipe 6. A discharge pipe 24 of this water seal type vacuum pump 19 is connected with a tank 27 for sealing liquid 21 via a heat exchanger 25. The sucked high concentration mist is conveyed to a heat exchanger 25 through the discharge pipe 24 together with the sealing liquid 21 and is cooled. After cooling, the liquid is returned to the tank 27. A drain piping 32 having a valve 31 is connected with the tank 27 and the sealing liquid 21 is collected.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は被洗浄物(半導体基
板、液晶基板等)をウエット処理する場合に発生するウ
エット処理部からのミストを回収するミスト回収装置に
関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mist collecting device for collecting mist from a wet processing unit which is generated when wet processing an object to be cleaned (semiconductor substrate, liquid crystal substrate, etc.).

【0002】[0002]

【従来の技術】此種装置のドライ法の1例としては図5
に示すように、ウエット処理装置1の内部に液体2を収
容したウエット処理槽3を設けて被洗浄物4を浸漬す
る。前記液体2は加熱されるか又は気化しやすいものを
用いるので矢印で示すようにミスト5となって上昇す
る。
2. Description of the Related Art FIG. 5 shows an example of a dry method of this kind of apparatus.
As shown in FIG. 3, a wet processing bath 3 containing the liquid 2 is provided inside the wet processing apparatus 1 to immerse the object 4 to be cleaned. Since the liquid 2 used is one that is heated or easily vaporized, it rises as a mist 5 as indicated by an arrow.

【0003】一方、ウエット処理槽3の上方には吸引管
6を設けて高濃度ミスト7を吸引し、排気側に設けたミ
スト補集箱8に設けたミスト濾材(ドライ法)9で吸収
し、吸収しきれなかったミストは低濃度なのでブロアー
10から放出していた。
On the other hand, a suction pipe 6 is provided above the wet treatment tank 3 to suck the high-concentration mist 7, and the mist filter medium (dry method) 9 provided in the mist collection box 8 provided on the exhaust side absorbs it. However, the mist that could not be absorbed was released from the blower 10 because of its low concentration.

【0004】又、他のウエット法の1側としては図6に
示すように、吸引管6の排気側にミスト回収スクラバー
11を設け、このミスト回収スクラバー11中にスプレ
ーノズル12を設けて液体13を噴出させてミストと接
触させ、ミストを噴出した液体13で溶解させて液体化
し、ミスト回収スクラバー11に回収し、回収した液体
13をポンプ14でスプレーノズル12に送って噴出さ
せるようになっている。液体化しなかった濃度の低いミ
ストはブロアー15を介して大気に放出させる。他は図
5と同一なので、同一符号を付し説明を省略する。
As another side of the wet method, as shown in FIG. 6, a mist collecting scrubber 11 is provided on the exhaust side of the suction pipe 6, and a spray nozzle 12 is provided in the mist collecting scrubber 11 to provide a liquid 13. Is sprayed and brought into contact with the mist, and the mist is melted and liquefied by the sprayed liquid 13, collected in the mist recovery scrubber 11, and the recovered liquid 13 is sent to the spray nozzle 12 by the pump 14 to be sprayed. There is. The low-concentration mist that has not been liquefied is discharged to the atmosphere through the blower 15. Since the others are the same as those in FIG. 5, the same reference numerals are given and the description thereof will be omitted.

【0005】[0005]

【発明が解決しようとする課題】前記従来の装置にあっ
ては、いずれの場合でも低濃度ではあるが回収しきれな
いミストを大気中に放出することになり、環境を汚染す
るという問題があった。そこで、本発明においてはミス
トを確実に回収して大気に放出することのない装置を提
供しようとするものである。
In any of the above-mentioned conventional devices, there is a problem that the mist, which has a low concentration but cannot be completely recovered, is released into the atmosphere and pollutes the environment. It was Therefore, the present invention is intended to provide a device that reliably collects mist and does not release it to the atmosphere.

【0006】[0006]

【課題を解決するための手段】本発明は前記課題を解決
するために、ウエット処理装置の高濃度ミストを吸引す
る吸引管を設け、この吸引管を封止用液体を封入した水
封式真空ポンプに接続し、水封式真空ポンプの排出側に
水封式真空ポンプの供給側に接続し、水封式真空ポンプ
とタンクとの間に封止用液体を冷却する熱交換器を設け
たスト回収装置を構成する。
In order to solve the above-mentioned problems, the present invention is provided with a suction pipe for sucking high-concentration mist of a wet processing apparatus, and this suction pipe is a water-sealed vacuum in which a sealing liquid is sealed. Connected to the pump, connected to the supply side of the water-sealed vacuum pump on the discharge side of the water-sealed vacuum pump, and provided a heat exchanger for cooling the sealing liquid between the water-sealed vacuum pump and the tank. Configure a strike recovery device.

【0007】[0007]

【発明の実施の形態】本発明の実施の形態を図1に基い
て説明すると、ミスト発生の状態は従来のウエット処理
装置1と同様なので、図5と同一符号を付し、説明を省
略する。
BEST MODE FOR CARRYING OUT THE INVENTION The embodiment of the present invention will be described with reference to FIG. 1. Since the state of mist generation is the same as that of the conventional wet processing apparatus 1, the same reference numerals as in FIG. .

【0008】他のミスト発生手段としては図2に示すよ
うにウエット処理装置1内にモータ16で駆動される回
転台座17を設け、この回転台座17上に被洗浄物4を
載置固定し、被洗浄物4にスプレーノズル又は高圧ジエ
ットノズル18から処理液を噴射し、発生した高濃度ミ
スト7を吸引管6で吸引する。
As another mist generating means, as shown in FIG. 2, a rotary pedestal 17 driven by a motor 16 is provided in the wet processing apparatus 1, and the object 4 to be cleaned is placed and fixed on the rotary pedestal 17, The treatment liquid is jetted from the spray nozzle or the high-pressure jet nozzle 18 to the object to be cleaned 4, and the generated high-concentration mist 7 is sucked by the suction pipe 6.

【0009】そして、吸引管6の排気側には図1に示す
ような水封式真空ポンプ19を設けている。この水封式
真空ポンプ19は図4に示すようにケーシング20内に
封止用液体21を封入し、吸入管6に連通する吸入口2
2から高濃度ミスト7を吸引し、羽根23の駆動により
封止用液体21に溶解させ、封止用液体21とともに排
出配管24から排出させるようになっている。
A water-sealed vacuum pump 19 as shown in FIG. 1 is provided on the exhaust side of the suction pipe 6. As shown in FIG. 4, the water-sealed vacuum pump 19 has a casing 20 in which a sealing liquid 21 is sealed and a suction port 2 communicating with a suction pipe 6.
The high-concentration mist 7 is sucked from 2, is dissolved in the sealing liquid 21 by driving the blade 23, and is discharged from the discharge pipe 24 together with the sealing liquid 21.

【0010】排出配管24は図1に示すように熱交換器
24と接続して封止用液体21を冷却し、冷却配管26
を介してタンク27に冷却した封止用液体21を送るよ
うになっている。尚、図中28は冷却水供給管、29は
冷却水排出管である。
The discharge pipe 24 is connected to the heat exchanger 24 to cool the sealing liquid 21 as shown in FIG.
The cooled sealing liquid 21 is sent to the tank 27 via the. In the figure, 28 is a cooling water supply pipe and 29 is a cooling water discharge pipe.

【0011】タンク27は封止用液体21を水封用真空
ポンプ19と供給配管30で接続して常時封止用液体2
1を水封用真空ポンプ19に送るようになっており、バ
ルブ31を有するドレン配管32で封止用液体21を回
収できるようになっている。
In the tank 27, the sealing liquid 21 is connected to the water-sealing vacuum pump 19 through the supply pipe 30, and the sealing liquid 2 is constantly supplied.
1 is sent to the water-sealing vacuum pump 19, and the sealing liquid 21 can be collected by the drain pipe 32 having the valve 31.

【0012】本発明は前記のように構成したもので、ウ
エット処理装置1で発生した高濃度ミストは吸引管6か
ら水封式真空ポンプ19に送られ、この内部に封止され
ている封止用液体21により高濃度ミストは溶解し、封
止用液体21と混合される。
The present invention is configured as described above, and the high-concentration mist generated in the wet processing apparatus 1 is sent from the suction pipe 6 to the water-sealed vacuum pump 19 and sealed inside. The high-concentration mist is dissolved by the working liquid 21 and mixed with the sealing liquid 21.

【0013】その結果、高濃度ミスト7と混合された封
止用液体21は排出配管24から熱交換器25に送られ
て冷却され、タンク27に送られる。このタンク27か
ら水封式真空ポンプ19に送られて水封式の封止用液体
21となって高濃度ミスト7を溶解する。タンク27内
の余分な封止用液体21はドレン配管32で外部に放出
する。
As a result, the sealing liquid 21 mixed with the high-concentration mist 7 is sent from the discharge pipe 24 to the heat exchanger 25, cooled, and sent to the tank 27. It is sent from the tank 27 to the water-sealed vacuum pump 19 and becomes the water-sealed sealing liquid 21 to dissolve the high-concentration mist 7. The excess sealing liquid 21 in the tank 27 is discharged to the outside through the drain pipe 32.

【0014】[0014]

【発明の効果】本発明は前記のように高濃度ミストを封
止用液体に溶解させるのでミストを確実に外部へ放出す
るのを防止し、環境を汚染することがない。又、封止用
液体を循環の途中において冷却するので、封止用液体の
温度上昇により気泡が水封式真空ポンプ内で発生し、吸
引能力が低下するのを防止することができる。
As described above, according to the present invention, since the high-concentration mist is dissolved in the sealing liquid, it is possible to prevent the mist from being discharged to the outside without being polluted. In addition, since the sealing liquid is cooled during the circulation, it is possible to prevent air bubbles from being generated in the water-sealed vacuum pump due to the temperature rise of the sealing liquid and the suction ability from being lowered.

【0015】[0015]

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明装置の一実施例の配置図。FIG. 1 is a layout view of an embodiment of the device of the present invention.

【図2】ウエット処理装置の他の例を示す断面図。FIG. 2 is a sectional view showing another example of the wet processing apparatus.

【図3】水封式真空ポンプの側面図。FIG. 3 is a side view of a water-sealed vacuum pump.

【図4】図3のA−A断面図。FIG. 4 is a sectional view taken along line AA of FIG. 3;

【図5】従来のドライ法の装置の配置図。FIG. 5 is a layout diagram of a conventional dry method apparatus.

【図6】従来のウエット法の装置の配置図。FIG. 6 is a layout view of a conventional wet method apparatus.

【符号の説明】[Explanation of symbols]

1 ウエット処理装置 2 液体 3 ウエット処理槽 4 被洗浄物 5 ミスト 6 吸引管 7 高濃度ミスト 8 ミスト補集箱 9 ミスト濾材 10 ブロアー 11 ミスト回収スクラバー 12 スプレーノズル 13 液体 14 ポンプ 15 ブロアー 16 モータ 17 回転台座 18 ジエットノズル 19 水封式真空ポンプ 20 ケーシング 21 封止用液体 22 吸入口 23 羽根 24 排出配管 25 熱交換器 26 冷却配管 27 タンク 28 冷却水供給管 29 冷却水排出管 30 供給排管 31 バルブ 32 ドレン配管 1 Wet treatment device 2 Liquid 3 Wet treatment tank 4 Cleaning object 5 Mist 6 Suction tube 7 High concentration mist 8 Mist collection box 9 Mist filter medium 10 Blower 11 Mist recovery scrubber 12 Spray nozzle 13 Liquid 14 Pump 15 Blower 16 Motor 17 Rotation Base 18 Jet nozzle 19 Water-sealed vacuum pump 20 Casing 21 Sealing liquid 22 Intake port 23 Blade 24 Discharge pipe 25 Heat exchanger 26 Cooling pipe 27 Tank 28 Cooling water supply pipe 29 Cooling water discharge pipe 30 Supply and discharge pipe 31 Valve 32 drain piping

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 ウエット処理装置に高濃度ミストを吸引
する吸引管を設け、この吸引管を封止用液体を封入した
水封式真空ポンプに接続し、水封式真空ポンプの排出側
に水封式真空ポンプの供給側に接続するタンクを接続し
たことを特徴とするミスト回収装置。
1. A wet treatment device is provided with a suction pipe for sucking high-concentration mist, and the suction pipe is connected to a water-sealed vacuum pump in which a sealing liquid is sealed, and water is discharged to the discharge side of the water-sealed vacuum pump. A mist collecting device having a tank connected to the supply side of a sealed vacuum pump.
【請求項2】 水封式真空ポンプとタンクとの間に封止
用液体を冷却する熱交換器を設けたことを特徴とする請
求項1記載のミスト回収装置。
2. The mist recovery device according to claim 1, further comprising a heat exchanger provided between the water-sealed vacuum pump and the tank for cooling the sealing liquid.
JP19794695A 1995-07-12 1995-07-12 Mist collection device Expired - Fee Related JP3542415B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19794695A JP3542415B2 (en) 1995-07-12 1995-07-12 Mist collection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19794695A JP3542415B2 (en) 1995-07-12 1995-07-12 Mist collection device

Publications (2)

Publication Number Publication Date
JPH0924346A true JPH0924346A (en) 1997-01-28
JP3542415B2 JP3542415B2 (en) 2004-07-14

Family

ID=16382939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19794695A Expired - Fee Related JP3542415B2 (en) 1995-07-12 1995-07-12 Mist collection device

Country Status (1)

Country Link
JP (1) JP3542415B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002144181A (en) * 2000-11-10 2002-05-21 Disco Abrasive Syst Ltd Vacuum generating mechanism for machining device
CN112299619A (en) * 2019-07-26 2021-02-02 株式会社迪思科 Waste liquid treatment device
CN112299618A (en) * 2019-07-26 2021-02-02 株式会社迪思科 Waste liquid treatment device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002144181A (en) * 2000-11-10 2002-05-21 Disco Abrasive Syst Ltd Vacuum generating mechanism for machining device
JP4608074B2 (en) * 2000-11-10 2011-01-05 株式会社ディスコ Vacuum generation mechanism of processing equipment
CN112299619A (en) * 2019-07-26 2021-02-02 株式会社迪思科 Waste liquid treatment device
CN112299618A (en) * 2019-07-26 2021-02-02 株式会社迪思科 Waste liquid treatment device
JP2021020274A (en) * 2019-07-26 2021-02-18 株式会社ディスコ Waste liquid disposal device
JP2021020273A (en) * 2019-07-26 2021-02-18 株式会社ディスコ Waste liquid disposal device

Also Published As

Publication number Publication date
JP3542415B2 (en) 2004-07-14

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