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JPH09246695A - Surface treatment and apparatus of copper pattern on printed circuit board - Google Patents

Surface treatment and apparatus of copper pattern on printed circuit board

Info

Publication number
JPH09246695A
JPH09246695A JP8316096A JP8316096A JPH09246695A JP H09246695 A JPH09246695 A JP H09246695A JP 8316096 A JP8316096 A JP 8316096A JP 8316096 A JP8316096 A JP 8316096A JP H09246695 A JPH09246695 A JP H09246695A
Authority
JP
Japan
Prior art keywords
printed circuit
circuit board
electroplating
copper pattern
nickel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8316096A
Other languages
Japanese (ja)
Inventor
Katsuya Hiroshige
勝也 広繁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP8316096A priority Critical patent/JPH09246695A/en
Publication of JPH09246695A publication Critical patent/JPH09246695A/en
Pending legal-status Critical Current

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  • Manufacturing Of Printed Wiring (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

PROBLEM TO BE SOLVED: To enable prevention of diffusion of tin alloy and copper by electroless plating with nickel to form a nickel plated film having a predetermined thickness on a copper pattern of a printed circuit board, etc., without using expensive palladium, electroplating tin or tin alloy on the nickel plated film and then electroplating it with nickel to form a nickel plated film having a thickness of 2μm or more. SOLUTION: In this method, surface treatment of a copper pattern on a printed circuit board is carried out by electroplating the copper pattern to promote its reaction at the time of starting electroless plating on the copper pattern and thereafter by electroless plating it to form thereon a nickel plated film having a predetermined thickness, and by electroplating the nickel plated film with tin or tin alloy. The apparatus includes an initial electroplating bath 1 for performing its electroplating operation for a short time at the time of electroplating the copper pattern of the printed circuit board with nickel, an electroless plating nickel bath 8, and a tin alloy electroplating bath 10, which are all disposed in a continuos processing positional relationship.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、プリント基板等の
銅パターン表面処理方法及び装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for treating a copper pattern surface of a printed circuit board or the like.

【0002】[0002]

【従来の技術】プリント基板の銅パターンの表面処理方
法としては、従来溶融半田槽にプリント基板を浸積し、
高温・高圧のエアーで余分の半田を吹き飛ばし銅パター
ンに半田を塗布することが一般的に行われていた。又、
図5の如くパラジューム等の活性剤を塗布してニッケル
を無電解メッキし、その上に無電解金メッキを施すこと
が行われていた。又、最近銅パターンに直接錫合金を無
電解メッキする方法が行われていた。
2. Description of the Related Art As a surface treatment method for a copper pattern on a printed circuit board, the printed circuit board is conventionally immersed in a molten solder bath,
It has been common practice to blow off excess solder with high-temperature, high-pressure air and apply the solder to the copper pattern. or,
As shown in FIG. 5, nickel has been electrolessly plated by applying an activator such as palladium, and then electroless gold plating has been performed thereon. Further, recently, a method of electrolessly plating a tin alloy directly on a copper pattern has been performed.

【0003】[0003]

【発明が解決しようとする課題】上記従来技術に於て、
第1の方法は銅パターン上の溶融半田が表面張力により
中央部が盛り上り部品が傾いて付着し、顕微鏡で正常位
に直さなければならず、高圧エアーのノズルの状態によ
りプリント基板スルーホール内に半田がつまり部品の足
が入らなくなったりするという問題点があった。第2の
方法はメッキ時間の管理で厚みが銅の表面積に関係なく
均一にフラットにメッキできるという利点はあるが、パ
ラジュームの濃度の温度管理が非常にむずかしく、濃す
ぎると図6の如く、銅パターンの間にパラジュームが残
り全面にニッケルが析出し、濃度がうすいとニッケルが
析出せず、パターンが高精度になるとパターン以外のパ
ラジュームを除去することが困難で、ニッケルのはみ出
し現象を生じ正しいニッケルメッキを行うことが困難で
あり、パラジューム自体高価であるという問題点があっ
た。又、第3の方法は錫合金が0.8〜1μ程度にしか
メッキされず、銅と錫との拡散が生じ、メッキ後の外形
加工も困難であるという問題点があった。
In the above prior art,
The first method is that the molten solder on the copper pattern rises in the central part due to surface tension and the parts incline and adhere, and it has to be corrected to the normal position with a microscope. However, there was a problem that the solder was clogged and the legs of the component could not be inserted. The second method has an advantage that the thickness can be uniformly plated regardless of the surface area of the copper by controlling the plating time, but it is very difficult to control the temperature of the concentration of the palladium, and if the concentration is too high, the copper cannot be plated as shown in FIG. During the pattern, the palladium remains and nickel is deposited on the entire surface.If the concentration is low, nickel does not deposit.If the pattern becomes highly precise, it is difficult to remove the palladium other than the pattern, and nickel squeeze-out phenomenon occurs and correct nickel is generated. There is a problem that it is difficult to perform plating, and the palladium itself is expensive. Further, the third method has a problem that the tin alloy is plated only to about 0.8 to 1 μm, copper and tin are diffused, and the outer shape processing after plating is difficult.

【0004】[0004]

【課題を解決するための手段】本発明は上記問題点を解
決することを目的とし、銅パターンの表面に無電解ニ
ッケルメッキスタート時、電気メッキにより反応を促進
し、以後無電解メッキにより所定厚みのニッケルメッキ
を施し、このニッケルメッキ上に錫又は錫合金を電気メ
ッキする如くしたプリント基板等の銅パターンの表面処
理方法及び、プリント基板の銅パターン上にニッケル
メッキスタート時、短時間電気メッキを行う初期電気メ
ッキ槽と、無電解ニッケルメッキ槽と、錫合金電気メッ
キ槽を連続に配設したことを特徴とするプリント基板等
の銅パターンの表面処理装置を特徴とする。
SUMMARY OF THE INVENTION The present invention is intended to solve the above-mentioned problems, and at the start of electroless nickel plating on the surface of a copper pattern, the reaction is promoted by electroplating, and thereafter electroless plating is performed to a predetermined thickness. Nickel plating, and the surface treatment method of the copper pattern of the printed circuit board such as electroplating tin or tin alloy on the nickel plating, and short time electroplating on the copper pattern of the printed circuit board at the start of nickel plating. The present invention is characterized by a surface treatment apparatus for a copper pattern on a printed circuit board or the like, in which an initial electroplating bath to be performed, an electroless nickel plating bath, and a tin alloy electroplating bath are continuously arranged.

【0005】[0005]

【発明の実施の形態】本発明の実施の形態を図1乃至図
5に示した一実施例に基づいて詳細に説明する。1はニ
ッケル初期電気メッキ槽で、ニッケルメッキ液タンク2
よりポンプ3でニッケル液を供給する。4はプリント基
板、5はブラン陰極、6は陽極、7は送りローラであ
る。8は無電解ニッケルメッキ槽である。9はシャワー
水洗槽である。10は錫合金電気メッキ槽、11は錫合
金メッキ液タンク、12はポンプ、13は陰極で0.5
〜1.0mmφのピン14を基板巾方向に1mm間隔程度で
ボード15の孔に挿通し、各ピン14をバネ16で下方
に押圧している。17は陽極、18は送りローラ、19
はシャワー水洗槽である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail based on one embodiment shown in FIGS. 1 is a nickel initial electroplating tank, and a nickel plating liquid tank 2
The nickel liquid is supplied by the pump 3. Reference numeral 4 is a printed circuit board, 5 is a blank cathode, 6 is an anode, and 7 is a feed roller. 8 is an electroless nickel plating bath. 9 is a shower water washing tank. 10 is a tin alloy electroplating tank, 11 is a tin alloy plating solution tank, 12 is a pump, and 13 is a cathode, which is 0.5.
Pins 14 of about 1.0 mmφ are inserted into the holes of the board 15 at intervals of about 1 mm in the board width direction, and each pin 14 is pressed downward by the spring 16. 17 is an anode, 18 is a feed roller, 19
Is a shower flush tank.

【0006】次に作用について説明する。プリント基板
4を送りローラ7でニッケル初期電気メッキ槽1内に供
給する。ブラン陰極5と陽極6間に5〜6Vの電圧を印
加し、2〜5秒ブラン陰極をプリント基板に柔らかいタ
ッチで接触する。この電気的ショックでニッケル析出は
促進され、電圧印加を止めてもニッケル析出は継続され
る。次いで、次の無電解ニッケルメッキ槽8内に送ら
れ、この中を通過する間に2〜3μの厚みのニッケルが
メッキされる。次いで、シャワー水洗槽9内で水洗し、
次の錫合金電気メッキ槽10に送られる。この中でプリ
ント基板4はピン陰極13で強く押圧されて停止する。
この間に通電され電解メッキされる。1A/dm2〜30
A/dm2くらいの電流が流れる錫メッキ液を用いること
により独立パターンの面積に差があってもメッキ不良は
生じない。このピン陰極13は1列だけでなく3列位な
らべ、別個の整流器から電流をとりメッキするとメッキ
厚は平均される。約5〜60秒間通電し、ピン陰極13
をプリント基板4から離す。この電気錫メッキはメッキ
面にピン跡(メッキされない部分)が残る心配がある
が、ピン陰極13を上下させてプリント基板を間歇移送
するのでメッキされない部分はなくなりピン跡は問題と
ならない。又、下地にニッケルが2〜3μメッキされて
いるので銅の拡散は止められる。次いでシャワー水洗槽
19で水洗され次いで乾燥し、図4の如く銅の上に2μ
以上のニッケルがメッキされ、更にその上に錫又は錫合
金メッキがされたプリント基板が成形される。
Next, the operation will be described. The printed circuit board 4 is supplied into the nickel initial electroplating bath 1 by the feed roller 7. A voltage of 5 to 6 V is applied between the blank cathode 5 and the anode 6, and the blank cathode is brought into contact with the printed board with a soft touch for 2 to 5 seconds. Nickel deposition is promoted by this electric shock, and nickel deposition is continued even if the voltage application is stopped. Then, it is sent into the next electroless nickel plating tank 8 and nickel having a thickness of 2 to 3 μ is plated while passing through this. Next, rinse with water in the shower rinse tank 9,
It is sent to the next tin alloy electroplating bath 10. In this, the printed circuit board 4 is strongly pressed by the pin cathode 13 and stops.
During this period, electricity is applied and electroplating is performed. 1 A / dm 2 to 30
By using the tin plating solution in which a current of about A / dm 2 flows, no defective plating occurs even if there is a difference in the area of the independent pattern. The pin cathodes 13 are arranged not only in one row but also in three rows, and if current is taken from a separate rectifier and plating is performed, the plating thickness is averaged. Energize for about 5 to 60 seconds, pin cathode 13
Is separated from the printed circuit board 4. This electro-tin plating may leave a pin mark (non-plated part) on the plated surface, but since the printed circuit board is intermittently moved by moving the pin cathode 13 up and down, the non-plated part disappears and the pin mark is not a problem. Also, since the base is plated with nickel of 2 to 3 μm, the diffusion of copper can be stopped. Then, it is washed with water in the shower water washing tank 19 and then dried, and 2 μm is put on the copper as shown in FIG.
The above nickel is plated, and a tin or tin alloy plated printed circuit board is formed thereon.

【0007】[0007]

【発明の効果】本発明によると、無電解ニッケルメッキ
槽に於てスタート時のみ電気メッキを行い電気的ショッ
クを与えることにより無電解メッキを行うことができる
ので、フラットな表面を有するニッケルメッキ槽を極め
て高価なパラジュームを使用することなく形成でき、
又、充分な厚みに形成できる。ニッケルは銅と錫合金の
バリヤ層となり銅の拡散を防止する。又、硬いため銅パ
ターンを保護する。ニッケルは通常3μの厚みがあれば
その上の錫又は錫合金は1μ以下でも部品の半田付は確
実に行える。又、ニッケルは無電解で析出されるのでメ
ッキ時間の管理のみで厚みが銅パターンの表面積に関係
なしにすべて均一にメッキできるので、ニッケルを電気
メッキのみで析出する場合よりもメッキの厚みの均一性
を得ることができる。
EFFECTS OF THE INVENTION According to the present invention, since electroless plating can be performed by electroplating only at the start in the electroless nickel plating bath and applying an electric shock, the nickel plating bath having a flat surface. Can be formed without the use of extremely expensive paradium,
Further, it can be formed to a sufficient thickness. Nickel serves as a barrier layer of copper and tin alloy and prevents diffusion of copper. Moreover, since it is hard, it protects the copper pattern. If nickel has a thickness of usually 3 μ, tin or tin alloy on it can be reliably soldered even if its thickness is 1 μ or less. Also, since nickel is deposited electrolessly, the thickness can be uniformly plated regardless of the surface area of the copper pattern only by controlling the plating time, so the plating thickness is more uniform than when nickel is deposited only by electroplating. You can get sex.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明方法を施す装置全体概略正面図である。FIG. 1 is a schematic front view of an entire apparatus for applying the method of the present invention.

【図2】図1の錫合金電気メッキ槽の要部拡大図であ
る。
FIG. 2 is an enlarged view of a main part of the tin alloy electroplating bath of FIG.

【図3】図2のピン陰極外観斜視図である。FIG. 3 is an external perspective view of the pin cathode of FIG.

【図4】本発明方法で成形されたメッキ部断面図であ
る。
FIG. 4 is a sectional view of a plated portion formed by the method of the present invention.

【図5】パラジュームを用いたニッケルメッキ断面図で
ある。
FIG. 5 is a nickel plating sectional view using palladium.

【図6】図4のパラジューム液がはみ出した状態を示す
図である。
FIG. 6 is a diagram showing a state in which the paradium solution of FIG. 4 has overflowed.

【符号の説明】[Explanation of symbols]

1 ニッケル初期電気メッキ槽 2 ニッケルメッキ液タンク 4 プリント基板 5 ブラン陰極 7 送りローラ 8 無電解ニッケルメッキ槽 9 シャワー水洗槽 10 錫合金電気メッキ槽 11 錫合金メッキ液タンク 13 ピン陰極 14 ピン 15 ボード 16 バネ 17 陽極 18 送りローラ 19 シャワー水洗槽 1 Nickel initial electroplating tank 2 Nickel plating solution tank 4 Printed circuit board 5 Blanc cathode 7 Feed roller 8 Electroless nickel plating tank 9 Shower washing bath 10 Tin alloy electroplating tank 11 Tin alloy plating solution tank 13 pin cathode 14 pin 15 board 16 Spring 17 Anode 18 Feed roller 19 Shower Wash tank

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 銅パターンの表面に無電解ニッケルメッ
キスタート時、電気メッキにより反応を促進し、以後無
電解メッキにより所定厚みのニッケルメッキを施し、こ
のニッケルメッキ上に錫又は錫合金を電気メッキする如
くしたプリント基板等の銅パターン表面処理方法。
1. At the start of electroless nickel plating on the surface of a copper pattern, the reaction is promoted by electroplating, then nickel plating of a predetermined thickness is applied by electroless plating, and tin or tin alloy is electroplated on the nickel plating. A method for treating a copper pattern surface of a printed circuit board or the like.
【請求項2】 プリント基板の銅パターン上にニッケル
メッキスタート時、短時間電気メッキを行う初期電気メ
ッキ槽と、無電解ニッケルメッキ槽と、錫合金電気メッ
キ槽を連続に配設したことを特徴とするプリント基板等
の銅パターンの表面処理装置。
2. An initial electroplating bath for performing electroplating for a short time at the start of nickel plating on a copper pattern of a printed circuit board, an electroless nickel plating bath, and a tin alloy electroplating bath, which are successively arranged. A surface treatment device for copper patterns on printed circuit boards, etc.
【請求項3】 移送されるプリント基板の銅パターンに
接触するブラン陰極とその近傍に陽極を配設した請求項
1記載のプリント基板等の銅パターンの表面処理装置。
3. The surface treatment device for a copper pattern of a printed circuit board or the like according to claim 1, wherein a blank cathode that contacts the copper pattern of the printed circuit board to be transferred and an anode are provided in the vicinity thereof.
【請求項4】 多数のピンをプリント基板の巾方向に配
設したピン陰極を上下動し得る如くして複数列配設し、
その近傍に陽極を配設した請求項1記載のプリント基板
等の銅パターンの表面処理装置。
4. A pin cathode having a large number of pins arranged in the width direction of a printed circuit board is arranged in a plurality of rows so as to be vertically movable.
The surface treatment device for a copper pattern of a printed circuit board or the like according to claim 1, wherein an anode is provided in the vicinity thereof.
JP8316096A 1996-03-12 1996-03-12 Surface treatment and apparatus of copper pattern on printed circuit board Pending JPH09246695A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8316096A JPH09246695A (en) 1996-03-12 1996-03-12 Surface treatment and apparatus of copper pattern on printed circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8316096A JPH09246695A (en) 1996-03-12 1996-03-12 Surface treatment and apparatus of copper pattern on printed circuit board

Publications (1)

Publication Number Publication Date
JPH09246695A true JPH09246695A (en) 1997-09-19

Family

ID=13794510

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8316096A Pending JPH09246695A (en) 1996-03-12 1996-03-12 Surface treatment and apparatus of copper pattern on printed circuit board

Country Status (1)

Country Link
JP (1) JPH09246695A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007148785A1 (en) * 2006-06-23 2007-12-27 Neomax Materials Co., Ltd. ELECTROLESS Ni-P PLATING METHOD AND SUBSTRATE FOR ELECTRONIC COMPONENT
JP2009108337A (en) * 2007-10-26 2009-05-21 Fujifilm Corp Electroless plating method, electroless plating apparatus and electromagnetic interference shield material
JP2012526914A (en) * 2009-05-13 2012-11-01 ゲブリューダー シュミット ゲゼルシャフト ミット ベシュレンクテル ハフツング Method and device for processing a wafer
CN105442010A (en) * 2014-06-11 2016-03-30 深南电路有限公司 PCB (printed circuit board) electroplating method and PCB electroplating apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007148785A1 (en) * 2006-06-23 2007-12-27 Neomax Materials Co., Ltd. ELECTROLESS Ni-P PLATING METHOD AND SUBSTRATE FOR ELECTRONIC COMPONENT
US8101867B2 (en) 2006-06-23 2012-01-24 Neomax Materials Co., Ltd. Electroless Ni-P plating method and substrate for electronic component
JP4870761B2 (en) * 2006-06-23 2012-02-08 株式会社Neomaxマテリアル Electroless Ni-P plating method and substrate for electronic parts
JP2009108337A (en) * 2007-10-26 2009-05-21 Fujifilm Corp Electroless plating method, electroless plating apparatus and electromagnetic interference shield material
JP2012526914A (en) * 2009-05-13 2012-11-01 ゲブリューダー シュミット ゲゼルシャフト ミット ベシュレンクテル ハフツング Method and device for processing a wafer
CN105442010A (en) * 2014-06-11 2016-03-30 深南电路有限公司 PCB (printed circuit board) electroplating method and PCB electroplating apparatus

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