JPH0825771B2 - Glass composition and circuit board - Google Patents
Glass composition and circuit boardInfo
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- JPH0825771B2 JPH0825771B2 JP3143465A JP14346591A JPH0825771B2 JP H0825771 B2 JPH0825771 B2 JP H0825771B2 JP 3143465 A JP3143465 A JP 3143465A JP 14346591 A JP14346591 A JP 14346591A JP H0825771 B2 JPH0825771 B2 JP H0825771B2
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Description
【0001】[0001]
【産業上の利用分野】この発明は、ガラス組成物および
回路用基板に関する。FIELD OF THE INVENTION The present invention relates to a glass composition and a circuit board.
【0002】[0002]
【従来の技術】高度情報化時代を迎え、情報伝送はより
高速化・高周波化の傾向にある。自動車電話やパーソナ
ル無線等の移動無線、衛星放送、衛星通信やCATV等
のニューメディアでは、機器のコンパクト化が推し進め
られており、これに伴い誘電体共振器等のマイクロ波用
回路素子に対しても小型化が強く望まれている。2. Description of the Related Art In an advanced information age, information transmission tends to be faster and higher in frequency. In mobile radio such as car telephones and personal radios, satellite broadcasting, satellite communications, and new media such as CATV, downsizing of devices is being promoted, and accordingly, microwave circuit elements such as dielectric resonators are being promoted. However, miniaturization is strongly desired.
【0003】マイクロ波用回路素子の大きさは、使用電
磁波の波長が基準となる。比誘電率εr の誘電体中を伝
播する電磁波の波長λは、真空中の伝播波長をλ0 とす
るとλ=λ0 /(εr )0.5 となる。したがって、素子
は、使用されるプリント回路用基板の誘電率が大きい
程、小型になる。また、基板の誘電率が大きいと、電磁
エネルギーが基板内に集中するため、電磁波の漏れが少
なく好都合でもある。The size of the microwave circuit element is based on the wavelength of the electromagnetic wave used. The wavelength λ of the electromagnetic wave propagating through the dielectric having the relative permittivity ε r is λ = λ 0 / (ε r ) 0.5 when the propagation wavelength in vacuum is λ 0 . Therefore, the device becomes smaller as the permittivity of the printed circuit board used increases. Further, when the dielectric constant of the substrate is large, electromagnetic energy is concentrated in the substrate, which is convenient because there is little leakage of electromagnetic waves.
【0004】上記のプリント回路用基板として、樹脂を
ガラス組成物の繊維からなる補強材(以下、適宜「ガラ
ス製補強材」と言う)で補強してなる基板がある。この
プリント回路用基板は、アルミナ等のセラミック系基板
に比べ、価格や後加工(切断、孔開等)の点で優れる。
このプリント回路用基板の誘電率を高める方法として、
ポリフッ化ビニリデン(εr =13)やシアノ樹脂(ε
r =16〜20)など比誘電率の高い樹脂を用いる方法
があるが、この場合、誘電損失が大きく、高周波域では
誘電特性の安定性にも問題があり、特に高周波(特に1
00MHz以上)用としての適性に欠けるため、余り適切
な対策とは言えない。As the above-mentioned printed circuit board, there is a board in which a resin is reinforced with a reinforcing material made of fibers of a glass composition (hereinafter, appropriately referred to as "glass reinforcing material"). This printed circuit board is superior in price and post-processing (cutting, punching, etc.) to a ceramic board made of alumina or the like.
As a method of increasing the dielectric constant of this printed circuit board,
Polyvinylidene fluoride (ε r = 13) and cyano resin (ε
r = 16 to 20), there is a method using a resin having a high relative dielectric constant. In this case, however, the dielectric loss is large, and there is a problem in the stability of dielectric characteristics in a high frequency range.
It cannot be said that it is a very appropriate measure because it lacks the suitability for (00 MHz or more).
【0005】また、高比誘電率無機粒子(例えば、Ti
O2 粒子、BaTiO3 粒子)を分散させた樹脂を用い
るという誘電率向上策もあるが、高比誘電率無機粒子の
不均一分散により基板面に比誘電率の不均一が生じると
いう問題があったり、粒子・樹脂界面の現出は長期信頼
性の面で好ましくないため、やはり適切な対策とはいえ
ない。In addition, high relative dielectric constant inorganic particles (for example, Ti
Although there is a measure for improving the dielectric constant using a resin in which O 2 particles and BaTiO 3 particles are dispersed, there is a problem that the dielectric constant becomes uneven on the substrate surface due to the uneven dispersion of the high dielectric constant inorganic particles. Also, the appearance of the particle-resin interface is not preferable in terms of long-term reliability, and thus cannot be said to be an appropriate countermeasure.
【0006】上記以外に、ガラス製補強材(例えば、ガ
ラスクロス)に高比誘電率のものを用いる誘電率向上策
がある。通常の補強材用のガラスクロスは、Eガラスと
呼ばれるSiO2 −Al2 O3 −CaO系ガラス組成物
の繊維からなる。このEガラスは、より具体的には、S
iO2 :50〜60重量%、Al2 O3 :13〜16重
量%、B2 O3 :5〜9重量%、MgO:0〜6重量
%、CaO:15〜25重量%、Na2 O+K2 O:0
〜1重量%、F:0〜1重量%という組成を有してお
り、比誘電率は6〜7程度であって、比誘電率はそれほ
ど高くない。In addition to the above, there is a dielectric constant improving measure using a glass reinforcing material (for example, glass cloth) having a high relative dielectric constant. A usual glass cloth for reinforcing material is composed of fibers of a SiO 2 —Al 2 O 3 —CaO glass composition called E glass. More specifically, this E glass is made of S
iO 2: 50-60 wt%, Al 2 O 3: 13~16 wt%, B 2 O 3: 5~9 wt%, MgO: 0~6 wt%, CaO: 15-25 wt%, Na 2 O + K 2 O: 0
11% by weight and F: 00〜1% by weight, the relative dielectric constant is about 6-7, and the relative dielectric constant is not so high.
【0007】高比誘電率のガラス組成物としては、Pb
Oを多量に含有する鉛系ガラス組成物がある。例えば、
PbO:72重量%、SiO2:26重量%、B2O
3:1.5重量%、K2O:0.5重量%の組成の鉛系
ガラス組成物は、13.0の比誘電率を有する。しか
し、鉛系ガラス組成物の場合、繊維化(直径7〜9μ
m)が難しいという問題がある。ガラス溶融時にPbO
の蒸発が激しくて不均質になって紡糸工程で糸切れが多
発するのである。また、鉛系ガラス組成物の場合、補強
として非常に適切なガラスクロス化が困難であるという
問題がある。ガラスクロスの製造の場合には、一次バイ
ンダーを除去するための熱処理工程があるが、鉛系ガラ
ス組成物は歪み点が低く劣化し易いため十分な処理を施
すことが難しい。一次バインダーの除去処理が十分でな
いガラスクロスは基板の長期信頼低下の原因となる。そ
れに、鉛系ガラス組成物の場合、鉛が有毒であるため取
扱が容易でないという問題もあるし、100MHz以上
の高周波域での誘電損失(tanδ)が大きいという問
題もある。As a glass composition having a high relative dielectric constant, Pb
There is a lead-based glass composition containing a large amount of O. For example,
PbO: 72% by weight, SiO 2 : 26% by weight, B 2 O
A lead-based glass composition having a composition of 3 : 1.5 wt% and K 2 O: 0.5 wt% has a relative dielectric constant of 13.0 . However, in the case of a lead-based glass composition, fiberization (diameter 7-9μ
There is a problem that m) is difficult. PbO when melting glass
Evaporation is severe and becomes inhomogeneous, resulting in frequent yarn breakage in the spinning process. Further, in the case of a lead-based glass composition, there is a problem that it is difficult to form a glass cloth which is extremely suitable for reinforcement. In the case of manufacturing glass cloth, there is a heat treatment step for removing the primary binder, but the lead-based glass composition has a low strain point and is easily deteriorated, so that it is difficult to sufficiently perform the treatment. The glass cloth, which is not sufficiently treated to remove the primary binder, causes deterioration of long-term reliability of the substrate. In addition, in the case of a lead-based glass composition, there is a problem that it is not easy to handle because lead is toxic, and there is a problem that the dielectric loss (tan δ) in a high frequency region of 100 MHz or more is large.
【0008】また、プリント回路用基板の補強材として
用いるガラスは、化学的耐久性も必要である。というの
は、プリント回路用基板に回路を形成する際に様々な化
学処理を経るが、この処理で補強材が損傷を受けないこ
とが必要だからである。Further, glass used as a reinforcing material for a printed circuit board also needs to have chemical durability. This is because various chemical treatments are performed when forming a circuit on a printed circuit board, and it is necessary that the reinforcing material is not damaged by this treatment.
【0009】[0009]
【発明が解決しようとする課題】この発明は、上記事情
に鑑み、良好な繊維化適性があって高周波域にも優れた
誘電特性を有し、化学的耐久性に富むガラス組成物を提
供することを第1の課題とし、高周波域でも優れた誘電
特性を有し長期信頼性の高い回路用基板を提供すること
を第2の課題とする。In view of the above-mentioned circumstances, the present invention provides a glass composition having good fiberization suitability, excellent dielectric properties even in a high frequency range, and excellent chemical durability. A second problem is to provide a circuit board having excellent dielectric characteristics even in a high frequency range and having high long-term reliability.
【0010】[0010]
【課題を解決するための手段】前記課題を解決するた
め、発明者らは、SiO2 −BaO−TiO2 −ZrO
2 系ガラス組成物に着目した。このガラス組成物は非鉛
系であって誘電特性が良好であるし、化学的耐久性(耐
酸性、耐アルカリ性、耐水性)に富むからである。しか
しながら、失透温度が高くて繊維化が難しいという問題
がある。ガラス繊維を得る場合、200〜800個の小
穴を底にあけたブッシングと呼ばれる白金製ポットの前
記小穴から融液を引き出し繊維を得るのであるが、失透
温度が高いとブッシングの底に失透による結晶が生じて
融液流出が妨げられ糸切れが起こる。普通、ブッシング
底部の温度と繊維の巻き取り速度の制御により、失透を
抑えながらガラス繊維を得るのであるが、失透温度が融
液粘度が102.5 ポアズ(316ポアズ)となる温度を
越えると制御し切れないのである。[Means for Solving the Problems]
Therefore, the inventors2-BaO-TiO2-ZrO
2Attention was paid to the system glass composition. This glass composition is non-lead
System with good dielectric properties and chemical durability
This is because they are rich in acidity, alkali resistance, and water resistance. Only
The problem is that the devitrification temperature is high and fiberization is difficult
There is. When obtaining glass fiber, 200-800 small
In front of a platinum pot called a bushing with a hole in the bottom
The melt is pulled out from the small hole to obtain the fiber, but the devitrification
When the temperature is high, devitrification crystals form on the bottom of the bushing.
Melt outflow is hindered and yarn breakage occurs. Normal, bushing
Devitrification is controlled by controlling the bottom temperature and the fiber winding speed.
Although glass fiber is obtained while suppressing the temperature, the devitrification temperature
Liquid viscosity is 102.5Poise (316 poise)
If you exceed it, you cannot control it.
【0011】そこで、発明者らは、必要な誘電特性や化
学的耐久性を確保しつつ繊維化適性をもたせる方途を求
めて鋭意検討を続け、前記のSiO2 −BaO−TiO
2 −ZrO2 系ガラス組成物に適当量のNbO5/2 を添
加することが、失透温度が融液粘度が102.5 ポアズ
(316ポアズ)となる温度を越えないようにすること
に有効であるという知見を得ることができた。[0011] Therefore, the present inventors have continued to earnestly investigate for a method of imparting the fiberization aptitude while ensuring the required dielectric properties and chemical durability, and the above-mentioned SiO 2 —BaO—TiO 2 is used.
It is effective to add an appropriate amount of NbO 5/2 to the 2- ZrO 2 glass composition so that the devitrification temperature does not exceed the temperature at which the melt viscosity becomes 10 2.5 poise (316 poise). I was able to obtain the knowledge that there is.
【0012】しかしながら、NbO5/2 の添加だけで十
分な繊維化適性をもたせることは困難であった。失透温
度と融液粘度が102.5 ポアズとなる温度との差がなか
なか十分に大きくならないからである。失透温度と融液
粘度が102.5 ポアズ温度との差が小さいと、ブッシン
グ内の温度変化により部分的なガラス融液温度の低下が
生じ、失透に伴う結晶化が起こり糸切れし易くなるた
め、繊維化のためのコントロールが非常に難しく、繊維
化適性が十分とは言えないのである。However, it was difficult to impart sufficient fiber-forming suitability only by adding NbO 5/2 . This is because the difference between the devitrification temperature and the temperature at which the melt viscosity becomes 10 2.5 poise does not easily become sufficiently large. When the difference between the devitrification temperature and the melt viscosity is 10 2.5 Poise temperature is small, the temperature change in the bushing causes a partial decrease in the glass melt temperature, which causes crystallization due to devitrification and facilitates yarn breakage. Therefore, it is very difficult to control fiberization, and it cannot be said that the suitability for fiberization is sufficient.
【0013】そのため、発明者らは、さらに検討を続
け、NbO5/2 の添加に加え適当量のAlO3/2 を添加
することが非常に有効であるという知見を得ることがで
きたのである。すなわち、SiO2 −BaO−TiO2
−ZrO2 系ガラス組成物は、必要な誘電特性を確保で
きる組成範囲においては失透によって主にSiO2 系の
クリストバライト結晶とBaO−TiO2 −ZrO2 系
の結晶が析出するのであるが、適当量のNbO5/2 の添
加は、後者のBaO−TiO2 −ZrO2 系結晶の析出
を抑制するために失透温度の低下が起こるけれども、前
者のSiO2 系クリストバライト結晶の析出は抑制し切
れず、失透温度の低下の程度に限度があったのである。
そこで、同時に適当量のAlO3/2 を添加することで、
SiO2 系クリストバライト結晶の析出も十分に抑制
し、更に失透温度を低下させられ、また、融液粘度が上
昇するため、失透温度と102.5 ポアズ温度との差がよ
り大きくさせられるということを見いだせたのである。
NbO5/2 抜きでAlO3/2 の添加だけでは失透温度を
102.5 ポアズ温度以下にするには至らない。Therefore, the inventors have conducted further studies, and have been able to obtain the finding that it is very effective to add an appropriate amount of AlO 3/2 in addition to the addition of NbO 5/2. . That is, SiO 2 —BaO—TiO 2
The --ZrO 2 -based glass composition is suitable because SiO 2 -based cristobalite crystals and BaO--TiO 2 --ZrO 2 -based crystals mainly precipitate due to devitrification within a composition range where necessary dielectric properties can be secured. Although the addition of a large amount of NbO 5/2 suppresses the precipitation of the latter BaO—TiO 2 —ZrO 2 system crystals, the devitrification temperature is lowered, but the former SiO 2 system cristobalite crystals are completely suppressed. However, there was a limit to the degree of devitrification temperature reduction.
Therefore, by adding an appropriate amount of AlO 3/2 at the same time,
Precipitation of SiO 2 -based cristobalite crystals is also sufficiently suppressed, the devitrification temperature is further lowered, and the melt viscosity is increased, so that the difference between the devitrification temperature and the 10 2.5 poise temperature can be made larger. I was able to find out.
The devitrification temperature cannot be lowered to 10 2.5 poise temperature or lower only by adding AlO 3/2 without NbO 5/2 .
【0014】したがって、第1の課題を解決するため、
請求項1記載の発明のガラス組成物は、SiO2 を40
〜65モル%、CaO,SrOおよびBaOの少なくと
もひとつを20〜45モル%、TiO2 およびZrO2
の少なくともひとつを5〜25モル%、NbO5/2 を
0.5〜15モル%、AlO3/2 を0.5〜15モル%
それぞれ含み、これらの酸化物の合計量が85モル%以
上であり、比誘電率(1MHz,25℃)9以上で、失透
温度が溶融粘度10 2.5 ポアズとなる温度よりも低く、
その温度差が85℃以上の繊維化適性を有する構成をと
り、請求項2記載の発明のガラス組成物は、加えて、S
iO2 の含有量が46〜60モル%、CaO,SrOお
よびBaOの少なくともひとつの含有量が25〜40モ
ル%、TiO2 およびZrO2 の少なくともひとつの含
有量が7〜24モル%、NbO5/2の含有量が1〜10
モル%、AlO3/2 の含有量が1〜10モル%とする構
成をとっている。Therefore, in order to solve the first problem,
The glass composition of the invention according to claim 1, a SiO 2 40
˜65 mol%, at least one of CaO, SrO and BaO 20 to 45 mol%, TiO 2 and ZrO 2
Of at least one of 5 to 25 mol%, NbO 5/2 of 0.5 to 15 mol% and AlO 3/2 of 0.5 to 15 mol%
The total amount of these oxides is 85 mol% or more, the relative dielectric constant (1 MHz, 25 ° C) is 9 or more , and devitrification is performed.
The temperature is lower than the temperature at which the melt viscosity is 10 2.5 poise,
The glass composition of the present invention according to claim 2 further comprises S
The content of iO 2 is 46 to 60 mol%, the content of at least one of CaO, SrO and BaO is 25 to 40 mol%, the content of at least one of TiO 2 and ZrO 2 is 7 to 24 mol%, and NbO 5 / 2 content is 1-10
The composition is such that the mol% and the content of AlO 3/2 are 1 to 10 mol%.
【0015】そして、前記第2の課題を解決するため、
請求項3記載の発明にかかる回路用基板は、請求項1ま
たは2記載のガラス組成物の繊維からなる補強材で樹脂
を強化してなる構成をとっている。以下、この発明を詳
しく説明する。この発明のガラス組成物は、上記の組成
構成をとるため、以下のように、9以上の比誘電率(1
MHz,25℃)で、失透温度が溶融粘度10 2.5 ポアズ
となる温度よりも低く、その温度差が85℃以上等の良
好な繊維化適性を始めとして優れた特性が確保できるよ
うになる。Then, in order to solve the second problem,
A circuit board according to a third aspect of the present invention has a structure in which a resin is reinforced with a reinforcing material made of fibers of the glass composition according to the first or second aspect. Hereinafter, the present invention will be described in detail. Since the glass composition of the present invention has the above compositional constitution, the relative dielectric constant (1
Devitrification temperature is 10 2.5 poise
It is possible to secure excellent properties such as good fiberization suitability, which is lower than the temperature at which the temperature difference is 85 ° C. or more .
【0016】 比誘電率(1MHz、25℃)9以上
の高誘電率である。 誘電損失(1MHz、25℃)即ちtanδ0.6
%以下の低損失である。 100MHz以上の高周波域でも、上記比誘電率お
よび誘電損失の変化が僅かで、優れた高周波誘電特性で
ある。 科学的耐久性(耐酸性、耐アルカリ性、耐水性)に
富む。The relative permittivity (1 MHz, 25 ° C.) has a high permittivity of 9 or more. Dielectric loss (1 MHz, 25 ° C.), ie, tan δ0.6
% Or less. Even in the high frequency region of 100 MHz or more, the relative dielectric constant and the dielectric loss are slightly changed, and the high frequency dielectric property is excellent. It has excellent scientific durability (acid resistance, alkali resistance, water resistance).
【0017】 失透温度が融液粘度が102.5 ポアズ
となる温度より遙に低く、極めて良好な繊維化適性を有
する。失透温度と102.5 ポアズ温度の間の温度差は8
5℃以上にもなるのである。 歪み点が約600℃と
高い。この発明のガラス組成物の組成範囲を上記のよう
に限定した理由は、以下の通りである。The devitrification temperature is much lower than the temperature at which the melt viscosity becomes 10 2.5 poise, and it has a very good fiberization suitability. The temperature difference between the devitrification temperature and the 10 2.5 Poise temperature is 8
It can reach over 5 ° C. The strain point is as high as about 600 ° C. The reason for limiting the composition range of the glass composition of the present invention as described above is as follows.
【0018】SiO2 :40〜65モル%(より好まし
くは46〜60モル%) SiO2 は、ガラスの骨格を形成する成分であり、40
モル%未満だと失透温度の上昇と融液粘度の低下を招来
し必要な繊維化適性の確保が難しくなるとともに、化学
的耐久性も十分でなくなる。65モル%を上回ると9以
上の比誘電率の確保が難しいとともに、ガラス粘度が高
く融液化困難で繊維化し難くなる。SiO 2 : 40 to 65 mol% (more preferably 46 to 60 mol%) SiO 2 is a component that forms the skeleton of glass, and 40
If it is less than mol%, the devitrification temperature will increase and the melt viscosity will decrease, making it difficult to ensure the necessary fibrillation aptitude, and the chemical durability will also be insufficient. If it exceeds 65 mol%, it is difficult to secure a relative permittivity of 9 or more, and the glass viscosity is high, so that it is difficult to melt and become fibrous.
【0019】CaO,SrOおよびBaOの少なくとも
ひとつ:20〜45モル%(より好ましくは25〜40
モル%) CaO,SrOおよびBaOは、ガラス構造の修飾イオ
ンとして作用し、融液化を容易とする。また、併用使用
は失透温度の低下をもたらす。CaO,SrOおよびB
aOは比誘電率を上昇させる働きをする。20モル%未
満だと、融液が得にくく繊維化適性が低下するとともに
9以上の比誘電率の確保が難しい。45モル%を越える
と失透温度の上昇と融液粘度の低下を招来し必要な繊維
化適性の確保が難しくなる。At least one of CaO, SrO and BaO: 20 to 45 mol% (more preferably 25 to 40)
Mol%) CaO, SrO, and BaO act as a modifying ion of the glass structure, and facilitate the melting. Further, the combined use causes a decrease in devitrification temperature. CaO, SrO and B
aO has a function of increasing the relative dielectric constant. If it is less than 20 mol%, it is difficult to obtain a melt, the suitability for fiber formation is reduced, and it is difficult to secure a relative dielectric constant of 9 or more. If it exceeds 45 mol%, the devitrification temperature will rise and the viscosity of the melt will decrease, making it difficult to secure the required fiber suitability.
【0020】TiO2 およびZrO2 の少なくともひと
つ:5〜25モル%(より好ましくは7〜24モル%) TiO2 、ZrO2 は比誘電率を上昇させる働きと化学
的耐久性を高める働きがある。TiO2 とZrO2 の併
用が望ましく、TiO2 をZrO2 よりも多くすること
が多い。5モル%未満だと9以上の比誘電率や必要な化
学的耐久性の確保が難しい。25モル%を越えると失透
温度が上昇し繊維化適性が失われる。At least one of TiO 2 and ZrO 2 : 5 to 25 mol% (more preferably 7 to 24 mol%) TiO 2 and ZrO 2 have a function of increasing the relative dielectric constant and a function of increasing chemical durability. . The combined use of TiO 2 and ZrO 2 is desirable, and the amount of TiO 2 is often larger than that of ZrO 2 . If it is less than 5 mol%, it is difficult to secure a relative dielectric constant of 9 or more and necessary chemical durability. If it exceeds 25 mol%, the devitrification temperature will rise and the suitability for fiber formation will be lost.
【0021】NbO5/2 :0.5〜15モル%(より好
ましくは1〜10モル%) NbO5/2 は比誘電率の低下を伴わずに失透温度を大き
く低下させる働きがある。0.5モル%未満では必要な
添加効果があらわれず、15モル%を越えると逆に失透
温度の上昇をもたらす。 AlO3/2 :0.5〜15モル%(より好ましくは1〜
10モル%) AlO3/2 はガラスの骨格を形成する成分であり、失透
温度の低下と、融液粘度の上昇をもたらす。0.5モル
%未満では必要な添加効果があらわれず、15モル%を
越えると比誘電率が低下するとともに、過度のガラス粘
度上昇を招来し融液化が困難で繊維化し難くなる。NbO 5/2 : 0.5 to 15 mol% (more preferably 1 to 10 mol%) NbO 5/2 has a function of significantly lowering the devitrification temperature without lowering the relative dielectric constant. If it is less than 0.5 mol%, the necessary addition effect is not exhibited, and if it exceeds 15 mol%, conversely the devitrification temperature rises. AlO 3/2 : 0.5-15 mol% (more preferably 1-
10 mol%) AlO 3/2 is a component that forms the skeleton of glass, and brings about a decrease in devitrification temperature and an increase in melt viscosity. If it is less than 0.5 mol%, the necessary addition effect is not exhibited, and if it exceeds 15 mol%, the relative dielectric constant is lowered, and the glass viscosity is excessively increased, which makes it difficult to melt and fiberize.
【0022】また、上記酸化物の合計量が85モル%未
満だと、9以上の比誘電率の確保が難しかったり、必要
な繊維化適性の確保が難しくなる。なお、この発明のガ
ラス組成物は、15モル%以下の範囲で、Li2 O,N
a 2 O,K2 O,ZnO,MnO2 ,TaO5/2 , BO
3/2 , LaO3/2 ,CeO 2 等の酸化物を少なくともひ
とつ含んでいてもよい。The total amount of the above oxides is 85 mol% or less.
If it is full, it is difficult or difficult to secure a relative permittivity of 9 or more.
It becomes difficult to secure proper fiberization suitability. In addition, the
The lath composition has a Li content of 15 mol% or less.2O, N
a 2O, K2O, ZnO, MnO2, TaO5/2,BO
3/2,LaO3/2, CeO 2At least oxides such as
It may be included.
【0023】上記ガラス組成物を作るための原料として
は、酸化物(複合酸化物を含む)、炭酸塩、硫酸塩、塩
化物、フッ化物など様々な化合物が使用でき、要は上記
組成が得られさえすればよい。この発明の回路用基板の
場合、上記のガラス組成物の繊維からなる補強材で樹脂
が補強されており、プリント回路が作り込まれるもので
ある。ガラス繊維製補強材はプリント回路用基板の機械
的強度や寸法安定性を向上させる。Various compounds such as oxides (including complex oxides), carbonates, sulfates, chlorides, and fluorides can be used as raw materials for producing the above glass composition. All you have to do is In the case of the circuit board of the present invention, the resin is reinforced with the reinforcing material made of the fiber of the above glass composition, and a printed circuit is formed. The glass fiber reinforcement improves the mechanical strength and dimensional stability of the printed circuit board.
【0024】ガラス繊維製補強材の形態としては、クロ
ス状の他に、マット状や単なるフィラメント状のものも
挙げられる。クロスやマットの場合、通常、繊維径0.
5〜20μm、厚み15μm〜1.5mm程度のものが
用いられる。フィラメントの場合、通常、繊維径2〜5
0μm、長さ20〜300μm程度のものが用いられ
る。Examples of the form of the glass fiber reinforcing material include a cloth form, a mat form and a simple filament form. In the case of cloth or mat, the fiber diameter is usually 0.
Those having a thickness of about 5 to 20 μm and a thickness of about 15 μm to 1.5 mm are used. In the case of a filament, the fiber diameter is usually 2 to 5
Those having a length of 0 μm and a length of 20 to 300 μm are used.
【0025】補強材と複合化される樹脂は、特に限定さ
れないが、高周波域の用途では、高周波損失の少ない
(低tanδ)樹脂が好ましく、例えば、PPO(ポリ
フェニレンオキサイド)樹脂、フッ素樹脂(例えば、テ
フロン:デュポン社の商品名のようなポリフッ化エチレ
ン系樹脂)、ポリカーボネート、ポリエチレン、ポリエ
チレンテレフタレート、ポリプロピレン、ポリスチレン
等が挙げられる。これらの樹脂の比誘電率εr は、普
通、2.0〜3.2程度である。より比誘電率の大きな
樹脂(例えば、エポキシ樹脂、ポリエステル樹脂、ポリ
フッ化ビニリデン、フェノール樹脂等)の場合、比誘電
率の点では好ましいが、誘電損失が大きく、特に高周波
用には適さない。The resin to be composited with the reinforcing material is not particularly limited, but for use in a high frequency range, a resin having a low high frequency loss (low tan δ) is preferable, and examples thereof include PPO (polyphenylene oxide) resin and fluororesin (for example, Teflon: a polyfluorinated ethylene resin such as the product name of DuPont), polycarbonate, polyethylene, polyethylene terephthalate, polypropylene, polystyrene and the like. The relative permittivity ε r of these resins is usually about 2.0 to 3.2. A resin having a higher relative dielectric constant (for example, an epoxy resin, a polyester resin, polyvinylidene fluoride, a phenol resin, etc.) is preferable in terms of the relative dielectric constant, but has a large dielectric loss and is not particularly suitable for high frequencies.
【0026】プリント回路用基板は、通常、厚みが0.
1〜2mm程度であり、樹脂と補強材の割合(体積割
合)は、通常、樹脂:30〜95体積%、補強材:5〜
70体積%である。プリント回路用基板を製造する場
合、例えば、予め作製しておいた樹脂ワニスをガラスク
ロスに含浸させて乾燥し、ついで、得られた樹脂含浸ク
ロス複数枚を積層して(必要に応じて)金属箔を表面に
配しておいて、金型で加熱加圧成形するようにする。そ
うすると、図1にみるように、ガラスクロス1に樹脂2
が複合化され表面に金属箔3を有するプリント回路用基
板4が完成する。The printed circuit board usually has a thickness of 0.
The ratio (volume ratio) of the resin and the reinforcing material is usually 30 to 95% by volume of the resin and 5 to 5% of the reinforcing material.
70% by volume. When manufacturing a printed circuit board, for example, a glass cloth is impregnated with a resin varnish prepared in advance and dried, and then a plurality of the obtained resin impregnated cloths are laminated (if necessary) on a metal. The foil is placed on the surface and heated and pressed by a mold. Then, as shown in FIG.
Are combined to complete the printed circuit board 4 having the metal foil 3 on the surface.
【0027】[0027]
【作用】この発明のガラス組成物は、SiO2 を40〜
65モル%、CaO,SrOおよびBaOの少なくとも
ひとつを20〜45モル%、TiO2 およびZrO2 の
少なくともひとつを5〜25モル%、NbO5/2 を0.
5〜15モル%、AlO 3/2 を0.5〜15モル%それ
ぞれ含み、これらの酸化物の合計量を85モル%以上と
する組成である。The glass composition of the present invention is made of SiO240 to
65 mol%, at least CaO, SrO and BaO
20 to 45 mol% of one, TiO2And ZrO2of
5-25 mol% of at least one, NbO5/20.
5-15 mol%, AlO 3/20.5 to 15 mol% it
The total amount of these oxides is 85 mol% or more.
Composition.
【0028】そのため、このガラス組成物、および、ガ
ラス組成物の繊維からなる補強材を用いた回路用基板
は、以下のような特徴を有する。まず、ガラス組成物と
補強材は、比誘電率(1MHz、25℃)9以上と高比誘
電率であり、誘電損失(1MHz、25℃)即ちtanδ
0.6%以下の低損失であって、しかも、100MHzの
高周波域でも、上記比誘電率および誘電損失の変化が僅
かで、優れた高周波誘電特性を有する。さらに、化学的
耐久性(耐酸性、耐アルカリ性、耐水性)に富む(Eガ
ラスより遙に優れる)ため、加工時の化学処理での損傷
の問題がない。また、PbOを多量に含む鉛系ガラスの
場合の毒性等の問題もない。Therefore, the glass composition and the circuit board using the reinforcing material composed of the fibers of the glass composition have the following characteristics. First, the glass composition and the reinforcing material have a high relative dielectric constant of 9 or more (1 MHz, 25 ° C.) and a dielectric loss (1 MHz, 25 ° C.), that is, tan δ.
It has a low loss of 0.6% or less and a small change in the relative permittivity and the dielectric loss even in a high frequency range of 100 MHz, and has excellent high frequency dielectric characteristics. Further, since it is rich in chemical durability (acid resistance, alkali resistance, and water resistance) (much better than E glass), there is no problem of damage during chemical treatment during processing. Further, there is no problem such as toxicity in the case of a lead-based glass containing a large amount of PbO.
【0029】ガラス組成物については、失透温度が融液
粘度が102.5ポアズとなる温度よりも遙に低いため、
繊維化適性に優れ、容易に補強材用ガラス繊維とするこ
とができるし、また、歪み点が約600℃と高く、クロ
ス化の際の一次バインダー除去処理も適切に行えるた
め、補強材として有用な適切なガラスクロスとすること
ができる。With respect to the glass composition, the devitrification temperature is much lower than the temperature at which the melt viscosity becomes 10 2.5 poise,
It is highly suitable as a reinforcing material because it has excellent suitability for fiberization and can be easily used as a glass fiber for reinforcing material. Moreover, the strain point is as high as about 600 ° C, and the primary binder removal treatment at the time of crossing can be performed appropriately. Can be any suitable glass cloth.
【0030】この発明にかかる回路用基板については、
補強材で誘電特性を高める構成であって、高比誘電率無
機粒子で誘電特性を高める構成でないため長期信頼性も
よい。Regarding the circuit board according to the present invention,
The structure is such that the reinforcing material enhances the dielectric property, and the dielectric property is not enhanced by the high relative dielectric constant inorganic particles, so that the long-term reliability is also good.
【0031】[0031]
【実施例】以下、実施例および比較例の説明を行う。 「ガラス組成物の実施例および比較例」 −実施例1〜25および比較例1〜4− 表1〜3に示す組成となるように、ガラス組成物原料を
調合し、白金ルツボに入れて加熱(4時間、1500
℃)し溶融した。なお、原料としては、SiO2 にはS
iO2 を、CaO,SrOおよびBaOには炭酸塩を、
TiO2 にはアナターゼ型TiO2 を、ZrO2 にはZ
rO2 を、NbO5/2 にはNbO5/2の1級試薬を、A
lO3/2 にはAlO3/2 の1級試薬をそれぞれ用いた。EXAMPLES Examples and comparative examples will be described below. "Examples and Comparative Examples of Glass Compositions" -Examples 1 to 25 and Comparative Examples 1 to 4 4-Glass composition raw materials were prepared so as to have the compositions shown in Tables 1 to 3, put in a platinum crucible and heated. (4 hours, 1500
° C) and melted. It should be noted that, as the raw material, the SiO 2 S
iO 2 , carbonate for CaO, SrO and BaO,
Anatase type TiO 2 to TiO 2, the ZrO 2 Z
rO 2 and NbO 5/2 with NbO 5/2 primary reagent
The lO 3/2 was used as the primary reagent of AlO 3/2.
【0032】ついで、融液をカーボン板上に流し出し板
状に成形しアニール処理し板状ガラスを得た。各実施例
および比較例の板状ガラスについて下記のデータを得
た。 −比誘電率および誘電損失− まず、得られた板状ガラスを一部切断し研磨して誘電特
性評価用試料を作製した。ついで、この試料の両面に金
電極を蒸着形成し、インピーダンスアナライザーで比誘
電率および誘電損失(誘電正接)を測定した。測定周波
数は1MHz、1GHz、温度は25℃である。Then, the melt was cast onto a carbon plate, shaped into a plate, and annealed to obtain a plate glass. The following data were obtained for the plate glasses of each of the examples and comparative examples. —Relative Dielectric Constant and Dielectric Loss— First, the obtained plate-shaped glass was partially cut and polished to prepare a sample for dielectric property evaluation. Then, gold electrodes were formed on both surfaces of this sample by vapor deposition, and the relative permittivity and the dielectric loss (dielectric loss tangent) were measured by an impedance analyzer. The measurement frequency is 1 MHz and 1 GHz, and the temperature is 25 ° C.
【0033】−102.5 ポアズ温度− 板状ガラスの一部を溶かし融液の粘度を白金球引き上げ
法により測定し102. 5 ポアズ温度を測定した。 −失透温度− 板状ガラスの一部を297〜500μmの粉末としてか
ら白金ボートに入れ温度勾配を有する電気炉に16時間
保持したのち空気中で放冷し顕微鏡下で失透出現位置を
求めることで測定した。[0033] -10 2.5 poise temperature - were measured measured 10 2.5 poise temperature the viscosity of the melt is dissolved a portion of sheet glass by a platinum ball pulling method. -Devitrification temperature-A part of the sheet glass is converted into a powder of 297 to 500 µm, placed in a platinum boat, kept in an electric furnace having a temperature gradient for 16 hours, then cooled in air, and a devitrification appearance position is determined under a microscope. Was measured.
【0034】−繊維化適性− 板状ガラスの残部を粉砕し白金ブッシングに入れ、白金
ブッシングに直接通電してガラスを溶かし、ブッシング
温度を102.5 ポアズ温度に設定しておいて、ブッシン
グ底部の小穴(ノズル)から引き出し巻き取ってガラス
繊維を得るようにした。-Fiberization Suitability-The rest of the plate glass is crushed and put in a platinum bushing, and the platinum bushing is directly energized to melt the glass, and the bushing temperature is set to 10 2.5 poise temperature. It was drawn out from the (nozzle) and wound to obtain glass fiber.
【0035】上記データを表1〜3に記す。なお、上記
実施例では、板状ガラスにしてから再溶融してガラス繊
維を得たが、最初の融液から直接ガラス繊維を得るよう
にしてもよい。同様にガラス繊維を得ることができる。
大量生産の場合は、最初の融液から直接ガラス繊維を得
るようにするのが適当である。The above data are shown in Tables 1-3. In addition, in the said Example, although it made into plate glass and was re-melted and obtained glass fiber, you may make it obtain glass fiber directly from the first melt. Glass fibers can likewise be obtained.
For mass production, it is expedient to obtain the glass fibers directly from the initial melt.
【0036】[0036]
【表1】 [Table 1]
【0037】[0037]
【表2】 [Table 2]
【0038】[0038]
【表3】 [Table 3]
【0039】実施例の場合は、比較例1、2に比べて失
透温度と102.5 ポアズ温度の間の差が大きく、十分な
繊維化適性を有するため、容易に繊維化できた。比較例
1、2の場合も、なんとか繊維化することは出来るが、
失透温度と102.5 ポアズ温度の間の差が小さく、作業
時に失透が発生しないように厳密な温度管理が必要であ
り作業は容易でなかった。比較例3、4は、NbO5/2
を含んでおらず、失透温度が102.5ポアズ温度よりも
高いため繊維化できなかった。In the case of the example, the difference between the devitrification temperature and the 10 2.5 poise temperature was large as compared with the comparative examples 1 and 2, and there was sufficient aptitude for fiber formation, so that the fiber formation was easy. In the case of Comparative Examples 1 and 2 as well, although it is possible to somehow make fibers,
The work was not easy because the difference between the devitrification temperature and the 10 2.5 poise temperature was small, and strict temperature control was necessary so that devitrification did not occur during the work. Comparative Examples 3 and 4 are NbO 5/2.
Since the devitrification temperature was higher than 10 2.5 Poise temperature, it could not be formed into fibers.
【0040】なお、実施例の誘電特性は高周波域も含め
て良好である。 「プリント回路用基板の実施例および比較例」 −実施例A〜Eおよび、比較例A、B− 実施例2のガラス組成物から得た繊維を用いてガラスク
ロスを常法により得た。このガラスクロスは、平織ガラ
スクロスであって、厚み:100μm、繊維径:7μ
m、織密度:25mm当たり、縦60本,横58本であ
る。The dielectric properties of the examples are good including the high frequency range. "Examples and Comparative Examples of Printed Circuit Boards" -Examples A to E and Comparative Examples A and B-Using the fibers obtained from the glass composition of Example 2, a glass cloth was obtained by a conventional method. This glass cloth is a plain woven glass cloth, having a thickness of 100 μm and a fiber diameter of 7 μm.
m, weave density: 60 lengths and 58 widths per 25 mm.
【0041】比較のため、下記組成の鉛系ガラス、およ
び、Eガラスを用いたガラスクロスも作製した。 「鉛ガラス」 組成 PbO:41.2モル%、SiO2 :55.3モ
ル%、B2 O3 :2.8モル%、K2 O:0.7モル% 比誘電率 1MHz:13.0、1GHz:12.9 誘電損失 1MHz:0.09%、1GHz:0.54% 「Eガラス」 組成 SiO2 :57.9モル%、Al2 O3 :8.7
モル%、B2 O3 :7.3モル%、CaO:24.2モ
ル%、MgO:1.6モル%、K2 O:0.3モル% 比誘電率 1MHz:6.5、1GHz:6.5 誘電損失 1MHz:0.15%、1GHz:0.28% 一方、PPO樹脂100容量部に150容量部のトリク
レンを添加して攪拌しPPO樹脂を完全に溶解させた樹
脂ワニスを作製した。For comparison, a lead-based glass having the following composition and a glass cloth using E glass were also manufactured. "Lead glass" compositions PbO: 41.2 mol%, SiO 2: 55.3 mol%, B 2 O 3: 2.8 mol%, K 2 O: 0.7 mol% relative permittivity 1 MHz: 13.0 , 1 GHz: 12.9 dielectric loss 1MHz: 0.09%, 1GHz: 0.54 % "E-glass" compositions SiO 2: 57.9 mol%, Al 2 O 3: 8.7
Mol%, B 2 O 3: 7.3 mol%, CaO: 24.2 mol%, MgO: 1.6 mol%, K 2 O: 0.3 mol% relative permittivity 1MHz: 6.5,1GHz: 6.5 Dielectric Loss 1 MHz: 0.15%, 1 GHz: 0.28% On the other hand, 150 parts by volume of tricrene was added to 100 parts by volume of PPO resin and stirred to prepare a resin varnish in which the PPO resin was completely dissolved. .
【0042】ついで、樹脂ワニスをガラスクロス含浸さ
せたあと乾燥した。含浸量はPPO樹脂とガラスクロス
の体積割合が表4、5に示すようになるように調整し
た。このようにして得られたワニス含浸ガラスクロスを
5枚重ね上下に銅箔(厚み17μm)を配して、温度2
50℃、圧力33kg/cm2 、10分間の条件で成形
し、両面銅箔張りプリント回路用基板を得た。Then, the resin varnish was impregnated with glass cloth and then dried. The impregnation amount was adjusted so that the volume ratio between the PPO resin and the glass cloth was as shown in Tables 4 and 5. Five varnish-impregnated glass cloths thus obtained were stacked, copper foil (thickness: 17 μm) was placed on the top and bottom, and the temperature was adjusted to 2
Molding was performed at 50 ° C. under a pressure of 33 kg / cm 2 for 10 minutes to obtain a double-sided copper foil-clad printed circuit board.
【0043】実施例および比較例の基板の比誘電率およ
び誘電損失を測定した。測定結果を表4、5に示す。The relative permittivity and the dielectric loss of the substrates of Examples and Comparative Examples were measured. The measurement results are shown in Tables 4 and 5.
【0044】[0044]
【表4】 [Table 4]
【0045】[0045]
【表5】 [Table 5]
【0046】表4、5にみるように、実施例Aのプリン
ト回路用基板は、鉛ガラスを用いた比較例Aのものに比
べて1GHzでの誘電損失が少なく、Eガラスを用いた比
較例Bの基板に比べて比誘電率が高く、高周波域用の回
路基板として適性を有することがよく分かる。As can be seen from Tables 4 and 5, the printed circuit board of Example A has a smaller dielectric loss at 1 GHz than the comparative example A using lead glass, and the comparative example using E glass. It can be clearly seen that it has a higher relative permittivity than the B substrate and is suitable as a circuit substrate for a high frequency range.
【0047】[0047]
【発明の効果】以上に述べたように、この発明のガラス
組成物は、SiO2 を40〜65モル%、CaO,Sr
OおよびBaOの少なくともひとつを20〜45モル
%、TiO2 およびZrO2 の少なくともひとつを5〜
25モル%、NbO5/2 を0.5〜15モル%、AlO
3/2 を0.5〜15モル%それぞれ含み、これらの酸化
物の合計量が85モル%以上の組成であり、高い比誘電
率(9以上)で、失透温度が溶融粘度10 2.5 ポアズと
なる温度よりも低く、その温度差が85℃以上の良好な
繊維化適性が確保され、さらには、優れた高周波誘電特
性を有し、化学的耐久性にも富み、回路用基板の補強材
に適したものとなっている。As described above, the glass composition of the present invention contains 40 to 65 mol% of SiO 2 , CaO and Sr.
20 to 45 mol% of at least one of O and BaO and 5 to at least one of TiO 2 and ZrO 2.
25 mol%, NbO 5/2 0.5 to 15 mol%, AlO
3/2 is contained in an amount of 0.5 to 15 mol%, and the total amount of these oxides is 85 mol% or more, the high relative dielectric constant (9 or more), and the devitrification temperature is 10 2.5 poise. When
The temperature is lower than the temperature, the temperature difference is 85 ° C or more, good fiberization suitability is ensured, and it also has excellent high frequency dielectric properties, and has excellent chemical durability as a reinforcing material for circuit boards. It is suitable.
【0048】この発明の回路用基板は、上記組成のガラ
ス組成物の繊維からなる補強材で誘電特性を高めている
ため、優れた高周波誘電特性を有し長期信頼性の高い有
用な基板となっている。Since the circuit board of the present invention has a dielectric material enhanced by a reinforcing material composed of fibers of the glass composition having the above composition, it is a useful board having excellent high frequency dielectric characteristics and high long-term reliability. ing.
【図1】 請求項3記載の発明にかかるプリント回路用
基板の構成例をあらわす概略断面図である。FIG. 1 is a schematic cross-sectional view showing a configuration example of a printed circuit board according to a third aspect of the invention.
1 ガラスクロス(補強材) 2 樹脂 3 金属箔 4 プリント回路用基板 1 Glass cloth (reinforcing material) 2 Resin 3 Metal foil 4 Printed circuit board
───────────────────────────────────────────────────── フロントページの続き (72)発明者 中 淳 滋賀県大津市晴嵐2丁目7番1号日本電気 硝子株式会社内 (72)発明者 山本 茂 滋賀県大津市晴嵐2丁目7番1号日本電気 硝子株式会社内 (72)発明者 小久保 正 京都府長岡京市梅ヶ丘2丁目50番地 (56)参考文献 特開 平3−297009(JP,A) 特開 平4−106806(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Atsushi Naka, 2-7-1, Harashirashi, Otsu-shi, Shiga Nippon Electric Glass Co., Ltd. (72) Inventor Shigeru Yamamoto 2-7-1 Harusan, Otsu, Shiga Japan Electric Glass Co., Ltd. (72) Inventor Tadashi Kokubo 2-chome, Umegaoka, Nagaokakyo-shi, Kyoto (56) References JP-A-3-297009 (JP, A) JP-A-4-106806 (JP, A)
Claims (3)
SrOおよびBaOの少なくともひとつを20〜45モ
ル%、TiO2 およびZrO2 の少なくともひとつを5
〜25モル%、NbO5/2 を0.5〜15モル%、Al
O3/2 を0.5〜15モル%それぞれ含み、これらの酸
化物の合計量が85モル%以上であり、比誘電率(1M
Hz,25℃)9以上で、失透温度が溶融粘度10 2.5 ポ
アズとなる温度よりも低く、その温度差が85℃以上の
繊維化適性を有するガラス組成物。1. SiO 2 of 40 to 65 mol%, CaO,
20 to 45 mol% of at least one of SrO and BaO and 5 of at least one of TiO 2 and ZrO 2.
-25 mol%, NbO 5/2 0.5-15 mol%, Al
O 3/2 is contained in an amount of 0.5 to 15 mol%, the total amount of these oxides is 85 mol% or more, and the relative dielectric constant (1M
Hz, 25 ° C.) with 9 or more, the devitrification temperature melt viscosity 10 2.5 po
A glass composition having a fiberizing aptitude that is lower than the temperature at which it becomes azu and the temperature difference is 85 ° C. or more .
CaO,SrOおよびBaOの少なくともひとつの含有
量が25〜40モル%、TiO2 およびZrO2 の少な
くともひとつの含有量が7〜24モル%、NbO5/2 の
含有量が1〜10モル%、AlO3/2 の含有量が1〜1
0モル%である請求項1記載のガラス組成物。 2. The content of SiO 2 is 46 to 60 mol%,
The content of at least one of CaO, SrO and BaO is 25 to 40 mol%, the content of at least one of TiO 2 and ZrO 2 is 7 to 24 mol%, and the content of NbO 5/2 is 1 to 10 mol%, The content of AlO 3/2 is 1 to 1
The glass composition according to claim 1, which is 0 mol%.
繊維からなる補強材で樹脂を強化してなる回路用基板。3. A circuit board obtained by reinforcing a resin with a reinforcing material composed of the fiber of the glass composition according to claim 1.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3143465A JPH0825771B2 (en) | 1991-06-14 | 1991-06-14 | Glass composition and circuit board |
CA002060709A CA2060709C (en) | 1991-02-08 | 1992-02-05 | Glass fiber forming composition, glass fibers obtained from the composition and substrate for circuit board including the glass fibers as reinforcing material |
EP92101994A EP0498425B1 (en) | 1991-02-08 | 1992-02-06 | Glass fiber forming composition, glass fibers obtained from the composition and substrate for circuit board including the glass fibers as reinforcing material |
DE69210270T DE69210270T2 (en) | 1991-02-08 | 1992-02-06 | Composition for the production of glass fibers, glass fibers produced therewith and substrate for printed circuit board with the glass fibers as reinforcing material |
US07/832,267 US5284807A (en) | 1991-02-08 | 1992-02-07 | Glass fiber forming composition, glass fibers obtained from the composition and substrate for circuit board including the glass fibers as reinforcing material |
US08/148,330 US5334645A (en) | 1991-02-08 | 1993-11-08 | Substrate for circuit board including the glass fibers as reinforcing material |
US08/148,539 US5407872A (en) | 1991-02-08 | 1993-11-08 | Glass fiber forming composition, glass fibers obtained from the composition and substrate for circuit board including the glass fibers as reinforcing material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3143465A JPH0825771B2 (en) | 1991-06-14 | 1991-06-14 | Glass composition and circuit board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04367537A JPH04367537A (en) | 1992-12-18 |
JPH0825771B2 true JPH0825771B2 (en) | 1996-03-13 |
Family
ID=15339341
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3143465A Expired - Fee Related JPH0825771B2 (en) | 1991-02-08 | 1991-06-14 | Glass composition and circuit board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0825771B2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2733160B2 (en) * | 1991-06-18 | 1998-03-30 | 松下電工株式会社 | Circuit board |
JP3067917B2 (en) * | 1992-12-28 | 2000-07-24 | 太陽誘電株式会社 | Low frequency sinterable porcelain composition for high frequency |
JP3067919B2 (en) * | 1992-12-28 | 2000-07-24 | 太陽誘電株式会社 | Low frequency sinterable porcelain composition for high frequency |
JP3067918B2 (en) * | 1992-12-28 | 2000-07-24 | 太陽誘電株式会社 | Low frequency sinterable porcelain composition for high frequency |
EP1561732A4 (en) | 2002-10-15 | 2008-10-08 | Nippon Electric Glass Co | Glass composition and glass fiber |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2520970B2 (en) * | 1990-04-16 | 1996-07-31 | 松下電工株式会社 | Composite dielectric |
JPH04106806A (en) * | 1990-08-27 | 1992-04-08 | Matsushita Electric Works Ltd | Complex dielectric |
-
1991
- 1991-06-14 JP JP3143465A patent/JPH0825771B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH04367537A (en) | 1992-12-18 |
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