JPH08199400A - Electropolishing of aluminum parts - Google Patents
Electropolishing of aluminum partsInfo
- Publication number
- JPH08199400A JPH08199400A JP798595A JP798595A JPH08199400A JP H08199400 A JPH08199400 A JP H08199400A JP 798595 A JP798595 A JP 798595A JP 798595 A JP798595 A JP 798595A JP H08199400 A JPH08199400 A JP H08199400A
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- soln
- electropolishing
- blade
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明はアルミニウム(およびア
ルミニウム合金)製部品に適用される電解研磨方法に関
する。FIELD OF THE INVENTION The present invention relates to an electrolytic polishing method applied to aluminum (and aluminum alloy) parts.
【0002】[0002]
【従来の技術】アルミニウムおよびアルミニウム合金製
部品の電解研磨においては陰極ガスの付着によるピット
が発生しやすいという問題がある。この問題を解決する
ために、本発明者は先に数十サイクルで上下に振動する
軸に取付けられた羽根板による液攪拌を用いた電解研磨
方法を提案した。(特願平6−241209号)2. Description of the Related Art In electrolytic polishing of aluminum and aluminum alloy parts, there is a problem that pits are apt to occur due to adhesion of cathode gas. In order to solve this problem, the present inventor previously proposed an electrolytic polishing method using liquid agitation by a blade plate attached to a shaft that vibrates up and down in several tens of cycles. (Japanese Patent Application No. 6-241209)
【0003】この提案方法の具体例を図2によって説明
する。図2において、1はアルミニウム又はアルミニウ
ム合金よりなる被研磨体、2は研磨液、4は液槽、5は
リード線、6は電極、7は羽根板、8は攪拌機を示す。
こゝにおいて、被研磨体1と電極6との間に羽根板7を
有する攪拌機8を配置し、液攪拌を行うようにしたもの
である。幅の広い大型パネルである被研磨体を電解研磨
しようとすると、上述した図2に示すような配置とな
る。A specific example of this proposed method will be described with reference to FIG. In FIG. 2, 1 is an object to be polished made of aluminum or aluminum alloy, 2 is a polishing liquid, 4 is a liquid tank, 5 is a lead wire, 6 is an electrode, 7 is a blade plate, and 8 is a stirrer.
Here, a stirrer 8 having a vane 7 is arranged between the object to be polished 1 and the electrode 6 to stir the liquid. When electrolytic polishing is performed on an object to be polished, which is a large and large panel, the arrangement is as shown in FIG. 2 described above.
【0004】[0004]
【発明が解決しようとする課題】被研磨体1と電極6と
の間に攪拌機8を配置する既提案方法では次の不具合が
生じる。However, the previously proposed method of disposing the stirrer 8 between the object to be polished 1 and the electrode 6 causes the following problems.
【0005】(1)金属製の攪拌機8は、被研磨体1と
電極6との間に生じるバイポーラ電位により、羽根板7
がアノード溶解して損傷する。(1) The stirrer 8 made of metal is caused by the bipolar potential generated between the object to be polished 1 and the electrode 6 to cause the blade plate 7 to move.
Will melt and damage the anode.
【0006】(2)羽根板7により電解電流の一部が遮
断される。すなわち、攪拌機8と被研磨体1との距離が
近いと羽根板7の影になる部分が良好に研磨されなくな
る。これを避けるために攪拌機8と被研磨体1とを遠ざ
けると液槽の所要スペースが大きくなるとともに液抵抗
が増大する。(2) A part of the electrolytic current is blocked by the vane plate 7. That is, when the distance between the stirrer 8 and the object 1 to be polished is short, the shadowed portion of the blade 7 cannot be polished well. In order to avoid this, if the stirrer 8 and the object to be polished 1 are moved away from each other, the required space of the liquid tank increases and the liquid resistance increases.
【0007】本発明は従来法がもつ以上の様な問題点を
解消させ、大型のアルミニウム又はアルミニウム合金を
処理できる電解研磨方法を提供しようとするものであ
る。The present invention aims to solve the above problems of the conventional method and to provide an electrolytic polishing method capable of treating a large-sized aluminum or aluminum alloy.
【0008】[0008]
【課題を解決するための手段】本発明は上下に振動させ
ることにより電解液に振動を伴った液流動を発生させる
ことができる羽根板を有するチタン又はチタン合金製電
極を用いることを特徴とするアルミニウム製部品の電解
研磨方法である。The present invention is characterized in that a titanium or titanium alloy electrode having a vane plate capable of generating a liquid flow accompanied by vibration in an electrolytic solution by vibrating vertically is used. This is an electrolytic polishing method for aluminum parts.
【0009】すなわち、本発明は電極を羽根板を有する
チタン又はチタン合金製の電極構造とし、かつこの電極
を数十サイクル(20〜55サイクル)で上下に振動さ
せて研磨液を攪拌しながらアルミニウム(アルミニウム
合金を含む)よりなる被研磨体と対面配置して電解研磨
を行なうものである。羽根の材質もチタン又はチタン合
金を用いるのが好ましい。That is, in the present invention, the electrode has an electrode structure made of titanium or a titanium alloy having a vane plate, and this electrode is vibrated up and down for several tens of cycles (20 to 55 cycles) to agitate the polishing liquid and then aluminum. Electrolytic polishing is performed by facing the object to be polished (including aluminum alloy). It is preferable to use titanium or titanium alloy as the material of the blades.
【0010】[0010]
(1)羽根板を有する電極は数十サイクルで上下に振動
することによって研磨液を攪拌し、対置した被研磨体上
に電解研磨に適した強度でかつ振動を伴った液流を導く
ことができる。(電極兼攪拌機として作用)(1) An electrode having a vane plate vibrates up and down in several tens of cycles to stir the polishing liquid, and to guide a liquid flow having a strength suitable for electrolytic polishing and vibrating to the opposite object to be polished. it can. (Acts as an electrode and agitator)
【0011】(2)電極(陰極)にチタン又はチタン合
金を用いることにより、アルミニウム又はアルミニウム
合金製被研磨体との間の腐食電流発生が防止され、良好
に電解研磨することができる。(陰極にステンレスを用
いると有害な腐食電流が発生する)(2) By using titanium or a titanium alloy for the electrode (cathode), it is possible to prevent corrosion current from being generated between the electrode and the aluminum or aluminum alloy polishing object, and to perform favorable electrolytic polishing. (Use of stainless steel for the cathode causes harmful corrosion current)
【0012】(3)被研磨体の幅に対応して陰極の幅を
広げて対置することにより、幅の広い大型スキンの電解
研磨が可能となる。(3) By widening the width of the cathode corresponding to the width of the object to be polished and placing the cathode opposite to each other, it is possible to electrolytically polish a large and wide skin.
【0013】[0013]
【実施例】本発明の一実施例を図1を参照しながら説明
する。内面をテフロンコーティングした角型のステンレ
ス容器を液槽4とし、りん酸(比重1.74)800c
c、硫酸(比重1.80)200cc、無水クロム酸5
0gの割合で調合した混合液を研磨液2とした。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described with reference to FIG. A rectangular stainless steel container with an inner surface coated with Teflon is used as the liquid tank 4, and phosphoric acid (specific gravity 1.74) 800c
c, sulfuric acid (specific gravity 1.80) 200 cc, chromic anhydride 5
The mixed liquid prepared at a rate of 0 g was used as the polishing liquid 2.
【0014】上下に振動する純チタン製軸に純チタン製
羽根板7を取付けたものを電極(陰極)3とし、この電
極3と対面させて被研磨体(陽極)1を配置した。被研
磨体1は表面粗度Ra=0.1μmまでバフ研磨し、そ
の後軽く酸エッチングを施して梨地としたA2024材
クラッド板平板とした。An electrode (cathode) 3 was formed by attaching a pure titanium vane plate 7 to a vertically oscillating pure titanium shaft, and an object to be polished (anode) 1 was placed facing the electrode 3. The polishing target 1 was buffed to a surface roughness Ra = 0.1 μm, and then lightly acid-etched to obtain a satin-finished A2024 material clad plate.
【0015】電解研磨は下記表1の処理条件で実施し
た。Electropolishing was carried out under the processing conditions shown in Table 1 below.
【0016】[0016]
【表1】 上記の電解研磨処理により、被研磨体1は鏡面に仕上
り、かつピットの発生も認められなかった。[Table 1] By the above electrolytic polishing treatment, the object to be polished 1 had a mirror finished surface and no pit was observed.
【0017】[0017]
【発明の効果】本発明により、(1)バイポーラ電位に
よる金属製羽根板の損傷防止、(2)羽根板による電解
電流の遮断防止、(3)液槽の小型化及び(4)大型パ
ネルへの電解研磨処理の適用可能化の効果を得ることが
できる。EFFECTS OF THE INVENTION According to the present invention, (1) prevention of damage to a metallic vane plate due to bipolar potential, (2) prevention of interruption of electrolytic current by the vane plate, (3) miniaturization of liquid tank, and (4) large panel The effect of making the electrolytic polishing treatment applicable can be obtained.
【図1】本発明の一実施例の説明図。FIG. 1 is an explanatory diagram of an embodiment of the present invention.
【図2】既提案のアルミニウムの電解研磨方法の一態様
の説明図。FIG. 2 is an explanatory view of one aspect of a proposed electrolytic electrolytic polishing method for aluminum.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 神畠 尚文 愛知県名古屋市港区大江町10番地 三菱重 工業株式会社名古屋航空宇宙システム製作 所内 (72)発明者 磯部 規也 愛知県名古屋市港区大江町10番地 三菱重 工業株式会社名古屋航空宇宙システム製作 所内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Naofumi Kanata 10 Oemachi, Minato-ku, Nagoya, Aichi Mitsubishi Heavy Industries, Ltd. Nagoya Aerospace Systems Works (72) Inventor Noriya Isobe, Minato-ku, Aichi 10 Oemachi Mitsubishi Heavy Industries Ltd. Nagoya Aerospace Systems Works
Claims (1)
動を伴った液流動を発生させることができる羽根板を有
するチタン又はチタン合金製電極を用いることを特徴と
するアルミニウム製部品の電解研磨方法。1. A method for electropolishing an aluminum component, which comprises using a titanium or titanium alloy electrode having a vane plate capable of generating a liquid flow accompanied by vibration in an electrolytic solution by vertically vibrating the electrolytic solution. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP798595A JPH08199400A (en) | 1995-01-23 | 1995-01-23 | Electropolishing of aluminum parts |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP798595A JPH08199400A (en) | 1995-01-23 | 1995-01-23 | Electropolishing of aluminum parts |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH08199400A true JPH08199400A (en) | 1996-08-06 |
Family
ID=11680730
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP798595A Withdrawn JPH08199400A (en) | 1995-01-23 | 1995-01-23 | Electropolishing of aluminum parts |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH08199400A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6182603B1 (en) * | 1998-07-13 | 2001-02-06 | Applied Komatsu Technology, Inc. | Surface-treated shower head for use in a substrate processing chamber |
US7338586B2 (en) | 2001-06-25 | 2008-03-04 | Japan Techno Co., Ltd. | Vibratingly stirring apparatus, and device and method for processing using the stirring apparatus |
JP2009069807A (en) * | 2007-09-13 | 2009-04-02 | Samsung Electro Mech Co Ltd | Method for manufacturing optical waveguide, and method for manufacturing package board |
-
1995
- 1995-01-23 JP JP798595A patent/JPH08199400A/en not_active Withdrawn
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6182603B1 (en) * | 1998-07-13 | 2001-02-06 | Applied Komatsu Technology, Inc. | Surface-treated shower head for use in a substrate processing chamber |
US7338586B2 (en) | 2001-06-25 | 2008-03-04 | Japan Techno Co., Ltd. | Vibratingly stirring apparatus, and device and method for processing using the stirring apparatus |
US7678246B2 (en) | 2001-06-25 | 2010-03-16 | Japan Techno Co., Ltd. | Vibratingly stirring apparatus, and device and method for processing using the stirring apparatus |
JP2009069807A (en) * | 2007-09-13 | 2009-04-02 | Samsung Electro Mech Co Ltd | Method for manufacturing optical waveguide, and method for manufacturing package board |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20020402 |