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JPH08138601A - Scanning electron microscope - Google Patents

Scanning electron microscope

Info

Publication number
JPH08138601A
JPH08138601A JP6270875A JP27087594A JPH08138601A JP H08138601 A JPH08138601 A JP H08138601A JP 6270875 A JP6270875 A JP 6270875A JP 27087594 A JP27087594 A JP 27087594A JP H08138601 A JPH08138601 A JP H08138601A
Authority
JP
Japan
Prior art keywords
sample
lens
secondary electron
deflection
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6270875A
Other languages
Japanese (ja)
Inventor
Takao Kumada
隆雄 熊田
Mitsugi Sato
佐藤  貢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6270875A priority Critical patent/JPH08138601A/en
Publication of JPH08138601A publication Critical patent/JPH08138601A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To easily make extremely low magnification observation high in image quality by a short-focus distance lens. CONSTITUTION: A primary electron beam 4 which is emitted from a negative electrode 1 by voltage V1 applied on the negative electrode 1 and a positive electrode 2 is accelerated by voltage Vacc applied on a positive electrode 3 and advances on a lens system of the rear stage. The primary electron beam 4 is finely converged on a sample 7 by a converged lens 5 and an objective lens 6, which are controlled by a lens control power supply 11, so as to be secondarily scanned on the sample 7 by deflection coils 8 and 9. Scanned signals of the deflection coils 8 and 9 are controlled by a deflection control circuit 13 according to observation magnification. And secondary electrons 21 generated from the primary electron beam irradiation point of the sample 7 are moved up around a magnetic field 20 of the objective lens 6 and detected by the secondary electron detector 17 so as to be changed into a secondary electron signal. The secondary electron signal and the scanned signals of the deflection control circuit 13 are input in an image display device 19 so that an expansion image (secondary electron image) of the sample is displayed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は電子線装置に係り、特
に、極低倍率像で像質を高めるのに好適な走査形電子顕
微鏡に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron beam apparatus, and more particularly to a scanning electron microscope suitable for enhancing the image quality in an extremely low magnification image.

【0002】[0002]

【従来の技術】従来、走査形電子顕微鏡では高倍率高分
解能を得るために、試料をレンズ磁界中に配置してレン
ズの焦点距離を短くしている。そして、対物レンズの上
部(電子源)に二次電子検出器を配置して、対物レンズ
の磁場に巻き上げられて上部に進む二次電子を検出して
試料の拡大像を表示している。一方、低倍率観察には試
料対物レンズの距離(ワーキングディスタンス)を30
mm〜40mmと、かなり長くして使用するため、極低倍率
の像観察では像質が悪い問題がある。そこで、通常の二
段偏向方式の短焦点レンズで低倍率を実現するには25
0倍が限度である。さらに数十倍の極低倍を実現するに
は、対物レンズの励磁をオフまたは、弱励磁にして、偏
向コイルを一段で用いて試料上での偏向量を大きくする
方法がある。この場合、レンズ磁場がオフまたは、弱励
磁のため二次電子は二次電子検出器に進まず、検出感度
の悪い像質の問題がある。
2. Description of the Related Art Conventionally, in a scanning electron microscope, in order to obtain high magnification and high resolution, a sample is placed in a lens magnetic field to shorten the focal length of the lens. Then, a secondary electron detector is arranged above the objective lens (electron source) to detect secondary electrons that are wound up by the magnetic field of the objective lens and proceed to the upper side to display an enlarged image of the sample. On the other hand, the distance (working distance) of the sample objective lens is set to 30 for low magnification observation.
Since it is used in a relatively long length of mm to 40 mm, there is a problem that the image quality is poor in image observation at an extremely low magnification. Therefore, in order to realize low magnification with a normal two-stage deflection type short focus lens, 25
The limit is 0 times. Further, in order to realize an extremely low magnification of several tens of times, there is a method in which the excitation of the objective lens is turned off or weakly excited and the deflection coil is used in one stage to increase the deflection amount on the sample. In this case, since the lens magnetic field is off or weakly excited, secondary electrons do not proceed to the secondary electron detector, and there is a problem of poor image quality of detection sensitivity.

【0003】[0003]

【発明が解決しようとする課題】本発明の目的は、高分
解能を得るワーキングディスタンスが比較的短い状態
で、極低倍率観察の像質向上ができる走査形電子顕微鏡
を提供することにある。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a scanning electron microscope capable of improving the image quality of extremely low magnification observation in a state where the working distance for obtaining high resolution is relatively short.

【0004】[0004]

【課題を解決するための手段】上記目的を達成するため
に、本発明では通常の高倍率で使用するときと極低倍率
で使用するときでは、二つの二次電子検出器を自動選択
できる切換スイッチを設け、二次電子検出器の位置を変
える。極低倍率を得るには、試料室に配置(対物レンズ
の外側)している二次電子検出器から二次電子を検出す
る。オペレータが観察視野探し等のために、極低倍率
(例えば250倍以下)に設定すると、自動的に制御回
路が切換スイッチを二次電子検出器側に切り変えるよう
にしたものである。
In order to achieve the above object, according to the present invention, two secondary electron detectors can be automatically selected when used at a normal high magnification and when used at an extremely low magnification. A switch is provided to change the position of the secondary electron detector. In order to obtain an extremely low magnification, secondary electrons are detected from a secondary electron detector arranged in the sample chamber (outside the objective lens). When the operator sets an extremely low magnification (for example, 250 times or less) for searching an observation field of view, the control circuit automatically switches the changeover switch to the secondary electron detector side.

【0005】[0005]

【作用】上記した本発明の特徴的構成によれば、次のよ
うな作用効果が得られる。すなわち、極低倍を必要とし
ない通常の高分解観察では、従来の二段偏向でかつ、レ
ンズ磁界で巻き上げた二次電子を二次電子検出器で検出
する。短焦点距離の対物レンズで極低倍率を得るには、
制御回路が一段偏向に切り変えて対物レンズの励磁をオ
フにする。そうすると、極低倍率状態は容易に得られ
る。しかし、対物レンズの励磁がオフのため、二次電子
は磁界の巻き上げによる二次電子検出器への検出が得ら
れない。そこで、倍率設定が極低倍率になると、制御回
路が二次電子検出器を二次電子検出器側に自動的に切り
変える。試料から発生した二次電子は二次電子検出器に
効率良く検出され、極低倍率で像質の高い観察ができ
る。
According to the above-mentioned characteristic structure of the present invention, the following operational effects can be obtained. That is, in the usual high-resolution observation that does not require extremely low magnification, the secondary electron wound by the conventional two-stage deflection and the lens magnetic field is detected by the secondary electron detector. To obtain extremely low magnification with a short focal length objective lens,
The control circuit switches to one-stage deflection and turns off the excitation of the objective lens. Then, the extremely low magnification state can be easily obtained. However, since the excitation of the objective lens is off, secondary electrons cannot be detected by the secondary electron detector due to the winding of the magnetic field. Therefore, when the magnification setting becomes extremely low, the control circuit automatically switches the secondary electron detector to the secondary electron detector side. Secondary electrons generated from the sample are efficiently detected by the secondary electron detector, and observation with high image quality can be performed at extremely low magnification.

【0006】[0006]

【実施例】以下図面を参照し、本発明の一実施例につい
て詳細に説明する。図1は本発明の一実施例の系統図で
ある。陰極1と陽極2に印加される電圧V1により陰極
1から放出された一次電子線4は、陽極3に印加される
電圧Vaccに加速されて後段のレンズ系に進行する。
一次電子線4は、レンズ制御電源11で制御された集束
レンズ5と対物レンズ6により試料7に細く絞られ、偏
向コイル8および9で試料上を二次元的に走査される。
偏向コイル8および9の走査信号は、観察倍率に応じて
偏向制御回路13により制御される。一方、試料7の一
次電子線照射点から発生した二次電子21は、対物レン
ズ6の磁界20に巻き上げられて、二次電子検出器17
に検出され、二次電子信号に変更される。二次電子信号
と偏向制御回路13の走査信号は像表示装置19に入力
され、試料の拡大像(二次電子像)が表示される。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the drawings. FIG. 1 is a system diagram of an embodiment of the present invention. The primary electron beam 4 emitted from the cathode 1 by the voltage V1 applied to the cathode 1 and the anode 2 is accelerated to the voltage Vacc applied to the anode 3 and advances to the lens system in the subsequent stage.
The primary electron beam 4 is narrowed down to the sample 7 by the focusing lens 5 and the objective lens 6 controlled by the lens control power source 11, and the deflection coils 8 and 9 two-dimensionally scan the sample.
The scanning signals of the deflection coils 8 and 9 are controlled by the deflection control circuit 13 according to the observation magnification. On the other hand, the secondary electrons 21 generated from the primary electron beam irradiation point of the sample 7 are wound up by the magnetic field 20 of the objective lens 6, and the secondary electron detector 17
Detected and converted into a secondary electron signal. The secondary electron signal and the scanning signal of the deflection control circuit 13 are input to the image display device 19, and an enlarged image (secondary electron image) of the sample is displayed.

【0007】偏向コイル8および9の巻き数比は、偏向
制御回路13の走査信号が両偏向コイルに同じ電流で流
れたときに、一次電子線4の偏向支点が対物レンズ6の
レンズ主面になるように設定されている。偏向コイル9
は、一段切換スイッチ14が設けられて、スイッチ制御
回路12の切換信号でオフにすることができる。さら
に、対物レンズ6も励磁電流切換スイッチ16でオン/
オフができる。また、二次電子検出器17の他に18が
対物レンズ6の外側に配置されている。そして、検出器
切換スイッチ16は、二次電子検出器17または18の
どちらかを選択することができる。切換スイッチ14,
15,16は、いずれもスイッチ制御回路12から個々
にまたは連動で制御できる。
The winding ratio of the deflection coils 8 and 9 is such that the deflection fulcrum of the primary electron beam 4 is on the lens main surface of the objective lens 6 when the scanning signal of the deflection control circuit 13 flows through both deflection coils with the same current. Is set to. Deflection coil 9
Is provided with a one-stage changeover switch 14, and can be turned off by a changeover signal from the switch control circuit 12. Further, the objective lens 6 is also turned on / off by the exciting current selector switch 16.
You can turn it off. In addition to the secondary electron detector 17, 18 is arranged outside the objective lens 6. Then, the detector changeover switch 16 can select either the secondary electron detector 17 or 18. Changeover switch 14,
Both 15 and 16 can be controlled individually or by interlocking with the switch control circuit 12.

【0008】図2は、本発明の実施例を示す系統図であ
る。本実施例では極低倍率における一次電子線4の偏向
軌道(実線および点線)と、切換スイッチ14,15お
よび16の状態と、二次電子21の進行状態を表してい
る。通常、高分解観察のワーキングディスタンスで極低
倍率を得ることは困難である。そこで、励磁電流切換ス
イッチ16で対物レンズ6をオフにする。そして、一段
切換スイッチ14で偏向コイル9をオフにして一段偏向
にすることで容易に短焦点距離でも極低倍率観察状態が
得られる。しかし、極低倍率を得るために、対物レンズ
6をオフにすることで二次電子21は上部に巻き上げら
れないため、二次電子検出器17に検出されない。そこ
で、極低倍率(例えば250倍以下)に設定すると、ス
イッチ制御回路12が検出器切換スイッチ15を二次電
子検出器18に自動的に切換るので、試料7から発生し
た二次電子7は二次電子検出器18に効率良く検出さ
れ、像質の高い極低倍率の観察が行える。
FIG. 2 is a system diagram showing an embodiment of the present invention. In this embodiment, the deflection trajectory (solid line and dotted line) of the primary electron beam 4 at extremely low magnification, the states of the changeover switches 14, 15 and 16, and the traveling state of the secondary electron 21 are shown. Usually, it is difficult to obtain an extremely low magnification with a working distance of high resolution observation. Therefore, the objective lens 6 is turned off by the exciting current switching switch 16. Then, the deflection coil 9 is turned off by the one-stage changeover switch 14 to perform the one-stage deflection, so that an extremely low magnification observation state can be easily obtained even at a short focal length. However, in order to obtain the extremely low magnification, the secondary electron 21 is not wound up by turning off the objective lens 6, so that it is not detected by the secondary electron detector 17. Therefore, when set to an extremely low magnification (for example, 250 times or less), the switch control circuit 12 automatically switches the detector changeover switch 15 to the secondary electron detector 18, so that the secondary electrons 7 generated from the sample 7 The secondary electron detector 18 efficiently detects it, and observation with extremely low magnification with high image quality can be performed.

【0009】[0009]

【発明の効果】本発明によれば、短焦点距離レンズで像
質の高い極低倍率観察が容易に行える。
According to the present invention, very low magnification observation with high image quality can be easily performed with a short focal length lens.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の系統図。FIG. 1 is a system diagram of an embodiment of the present invention.

【図2】極低倍率における一次電子線の偏向軌道と切換
スイッチの状態と二次電子の進行状態を示す系統図。
FIG. 2 is a system diagram showing a deflection trajectory of a primary electron beam, a state of a changeover switch, and a traveling state of secondary electrons at an extremely low magnification.

【符号の説明】[Explanation of symbols]

1…陰極、2,3…陽極、4…一次電子線、5…集束レ
ンズ、6…対物レンズ、7…試料、8…上側偏向コイ
ル、9…下側偏向コイル、10…対物レンズ絞り、11
…レンズ制御電源、12…スイッチ制御回路、13…偏
向制御回路、14…一段切換スイッチ、15…検出器切
換スイッチ、16…励磁電流切換スイッチ、17,18
…二次電子検出器、19…像表示装置、20…磁界、2
1…二次電子。
1 ... Cathode, 2, 3 ... Anode, 4 ... Primary electron beam, 5 ... Focusing lens, 6 ... Objective lens, 7 ... Sample, 8 ... Upper deflection coil, 9 ... Lower deflection coil, 10 ... Objective lens diaphragm, 11
... Lens control power source, 12 ... Switch control circuit, 13 ... Deflection control circuit, 14 ... One-stage changeover switch, 15 ... Detector changeover switch, 16 ... Excitation current changeover switch, 17, 18
... secondary electron detector, 19 ... image display device, 20 ... magnetic field, 2
1 ... Secondary electron.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】一次電子線を細く絞って試料に照射するた
めの集束レンズ系と,前記一次電子線を前記試料上で二
次元的に走査するために光軸上に配置した二段偏向器を
具備した電子光学系、および前記試料から発生する二次
電子を検出して前記試料の拡大像を表示する表示手段と
からなる走査形電子顕微鏡において、一段偏向切り換え
動作と試料室に具備した二次電子検出器の動作を倍率設
定に連動して使用することを特徴とする走査形電子顕微
鏡。
1. A focusing lens system for narrowing a primary electron beam to irradiate a sample and a two-stage deflector arranged on an optical axis for two-dimensionally scanning the primary electron beam on the sample. In a scanning electron microscope comprising an electron optical system including: and a display unit that detects a secondary electron generated from the sample and displays an enlarged image of the sample, a single-stage deflection switching operation and a sample chamber A scanning electron microscope characterized by using the operation of a secondary electron detector in conjunction with the magnification setting.
【請求項2】請求項1において、前記倍率設定に連動し
て、自動的に切り換えるための制御回路を設けている走
査形電子顕微鏡。
2. The scanning electron microscope according to claim 1, further comprising a control circuit for automatically switching in association with the magnification setting.
JP6270875A 1994-11-04 1994-11-04 Scanning electron microscope Pending JPH08138601A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6270875A JPH08138601A (en) 1994-11-04 1994-11-04 Scanning electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6270875A JPH08138601A (en) 1994-11-04 1994-11-04 Scanning electron microscope

Publications (1)

Publication Number Publication Date
JPH08138601A true JPH08138601A (en) 1996-05-31

Family

ID=17492189

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6270875A Pending JPH08138601A (en) 1994-11-04 1994-11-04 Scanning electron microscope

Country Status (1)

Country Link
JP (1) JPH08138601A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998032153A3 (en) * 1997-01-16 1998-11-26 Kla Tencor Corp Electron beam dose control for scanning electron microscopy andcritical dimension measurement instruments
JP2012018812A (en) * 2010-07-08 2012-01-26 Keyence Corp Magnifying observation device, magnifying observation method, program for magnifying observation, and computer-readable recording medium

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998032153A3 (en) * 1997-01-16 1998-11-26 Kla Tencor Corp Electron beam dose control for scanning electron microscopy andcritical dimension measurement instruments
JP2012018812A (en) * 2010-07-08 2012-01-26 Keyence Corp Magnifying observation device, magnifying observation method, program for magnifying observation, and computer-readable recording medium

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