JPH0754916Y2 - Ion implanter - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to an ion implantation apparatus of a type which mechanically scans a sample to be ion-implanted without scanning an ion beam.

[Conventional technology]

 A conventional example of this type of ion implantation apparatus is shown in FIG.

Reference numeral 4 denotes a vacuum container, and in this example, it is partitioned by a vacuum valve 6 into an injection chamber 4a for ion-implanting the sample 8 and a preliminary chamber 4b for putting the sample 8 in and out. Each is evacuated. Injection chamber 4a
The ion beam 2 whose position is fixed is introduced into the device (in this example, it is introduced from the front side to the back side of the paper).

A bearing portion 12 having a vacuum sealing function is provided at the end of the vacuum container 4.
Is provided, and the holder shaft 14 penetrates therethrough so as to be linearly movable. A holder 10 for holding the sample 8 is attached to the inside end of the vacuum container 4 of the holder and the shaft 14.

A direct acting mechanism 15 is provided outside the vacuum container 4.

The linear motion mechanism 15 includes a ball screw 24 pivotally supported by a support base 16.
And a ball nut 26 screwed with the ball nut 26. The ball nut 26 is attached to the movable body 22 attached to the end of the holder shaft 14. The movable body 22 is provided with a linear bearing 20, and is guided by a guide rail 18 provided on the support base 16.

Further, a reversible motor 34 is attached to the support base 16, whereby the pulley 32 and the timing belt 30 are provided.
The ball screw 24 can be rotated left and right via the pulley 28, and the holder shaft 14 can be linearly driven reciprocally via the ball nut 26 and the like.

Therefore, the direct-acting mechanism 15 can mechanically scan the sample 8 mounted on the holder 10 in the injection chamber 4a in the axial direction of the holder shaft 14, thereby irradiating the sample 8 with the ion beam 2 and ion. Injection can be performed.

[Problems to be solved by the device]

In the ion implantation apparatus as described above, there is a demand for increasing the size of the sample 8. However, the conventional apparatus can scan the sample 8 in only one direction. Ion implantation cannot be performed.

Therefore, the main object of the present invention is to provide an ion implantation apparatus by improving the above-mentioned apparatus so that even a large sample can be ion-implanted over the entire surface with good uniformity.

[Means for Solving the Problems]

In order to achieve the above object, the ion implanter of the present invention is a spherical bearing that linearly supports the holder shaft in a portion where the holder shaft penetrates the vacuum container as described above and has a vacuum sealing function. And a supporting member swingable around the center line of the spherical bearing is provided to support the linear motion mechanism as described above by the supporting member, and further the supporting member swings together with the linear motion mechanism and the holder shaft. It is characterized in that a swinging mechanism for moving is provided.

[Action]

According to the above configuration, the holder shaft can be mechanically scanned in the axial direction of the holder shaft in the vacuum container by driving the holder shaft to reciprocate linearly by the linear motion mechanism.

Moreover, the swing mechanism can swing and tilt the holder shaft together with the linear motion mechanism.

Therefore, by using the direct-acting mechanism and the swinging mechanism together, it is possible to perform uniform ion implantation on the entire surface of a large sample.

〔Example〕

FIG. 1 is a diagram showing an ion implantation apparatus according to an embodiment of the present invention as viewed in the direction of travel of an ion beam. FIG. 2 is a view of the ion implantation apparatus of FIG. 1 looking up from below. FIG. 3 is a left side view of the linear motion mechanism portion of FIG. The same or corresponding portions as those of the conventional example shown in FIG. 7 are designated by the same reference numerals, and the differences from the conventional example will be mainly described below.

In this embodiment, the holder shaft 14 as described above holds the vacuum container 4 (more specifically, the side wall portion of the auxiliary chamber 4b).
A spherical bearing for supporting the holder shaft 14 in a penetrating portion so as to be linearly movable as shown by an arrow A and having a vacuum sealing function.
36 are provided. That is, the spherical bearing 36 and the holder shaft 14 are vacuum-sealed with a packing 40 such as an O-ring, and the spherical bearing 36 is vacuum-sealed with a packing 38 such as an O-ring.

Then, two pins 42 are provided at positions on the left and right of the spherical bearing 36 and in line with the center of the spherical bearing 36, so that the support member 44 having a U-shaped planar shape can be freely rotated as shown by an arrow B. Supporting. More specifically, the support member 44 has side plates 44a parallel to each other on the left and right sides thereof, and each side plate 44a is rotatably supported by the pins 42 as indicated by arrow B.

The support member 44 supports the linear motion mechanism 54 corresponding to the linear motion mechanism 15 described above.

In this example, the linear motion mechanism 54 is a ball screw as described above.
24, ball nut 26, pulley 28, timing belt 30,
In addition to the pulley 32 and the motor 34, it has three guide rods 46 arranged in a triangular shape, which guide the movable plate 50 via the ball bush 52. The end of the holder shaft 14 is fixed to the movable plate 50 and the ball nut 26 is attached. 48 is a support plate.

Also in the case of the linear motion mechanism 54, the holder shaft 14 is reciprocally linearly driven in the axial direction thereof, that is, in the direction of arrow A through the ball screw 24, the ball nut 26, etc. by rotating the motor 34 in the forward and reverse directions. can do.

On the other hand, as a structure of the swinging mechanism 68, in this example, a support base 56 is provided above the auxiliary chamber 4b, and a reversible motor 60 is attached to the support base 56 via a pin 58, and a ball screw 62 is attached to its output shaft. Are connected. A ball nut 64 is rotatably attached to the upper portion of the support member 44 via a pin 66, and the ball screw 62 is passed through the ball nut 64 to be screwed together.
The pins 58 and 66 are for allowing the rotation of the motor 60 and the ball nut 64 accompanying the swinging of the support member 44 and the like, respectively.

According to the swing mechanism 68, the motor 60 is rotated in the normal direction and the reverse direction, so that the support member is centered around the pin 42 through the ball screw 62, the ball nut 64, and the like.
It is possible to swing the 44 together with the linear motion mechanism 54 and the holder shaft 14 in the arrow B direction intersecting the arrow A direction.

In addition, 70 shown in FIG. 2 is a door of the spare chamber 4b, and 72 is a hinge for supporting it. Also in this example, the injection chamber
Other processing chambers (both not shown) are connected to the downstream side of 4a via a vacuum valve so that the ion beam 2 can be introduced into the processing chamber as well. It's not something that doesn't happen.

Explaining an operation example of the ion implantation apparatus of this embodiment, the sample 8 is attached to the holder 10 in the state shown in FIG. 1, the preliminary chamber 4b is evacuated, the vacuum valve 6 is opened, and the holder 10 is moved by the linear motion mechanism 54. It is moved to the origin of horizontal scanning in the injection chamber 4a (on the line C shown in FIG. 4). Next, as shown in FIG. 4, the swing mechanism 68 tilts the holder shaft 14 from the horizontal position (0 degree) by + θ, for example, in the clockwise direction to move the holder 10 to the position shown by the chain double-dashed line, and the linear mechanism 54 The holder 10 is moved to the position shown by the solid line in the figure (that is, the center of the holder 10 is moved from the C line position to the D line position). As a result, the holder 10 and the sample 8 are irradiated with the ion beam 2 in the hatched region E and ion-implanted.

Next, the swing mechanism 68 rotates (swings) the holder shaft 14 counterclockwise. Here, as an example, scanning is performed 5 times, and in the second time, the angle of the holder shaft 14 from the horizontal is set to + θ / 2 degrees, and the holder is moved by the linear motion mechanism 54 in this state.
Scan 10 from D line to C line.

Thereafter, similarly, the holder shaft 14 is set to 0 °, the holder 10 is scanned from the line C to the line D, and then the holder shaft 14 is moved to −θ / 2.
Scan the holder 10 from the D line to the C line, and then as shown in FIG. 5, set the holder shaft 14 to −θ degrees.
Is scanned from the C line to the D line. In the final scan, the ion beam 2 is applied to the area F indicated by the diagonal lines.

The trajectory of the center 2a of the ion beam 2 in the above case is shown in FIG. That is, relatively speaking, the ion beam 2 is scanned parallel to the sample 8 at a constant interval.

As described above, by using the direct-acting mechanism 54 and the swinging mechanism 68 together, it is possible to perform ion implantation into the sample 8 at regular intervals. Injection can be performed.

In order to perform the ion implantation more uniformly with the sample 8,
It is preferable to increase the number of times of scanning by reducing the vertical scanning interval of the holder 10 and the like. Further, as a measure against the fluctuation of the beam current of the ion beam 2 during the ion implantation, it is preferable to control the scanning speed of the holder 10 in proportion to the beam current of the ion beam 2.

[Effect of device]

As described above, according to the present invention, in addition to the linear motion mechanism that linearly drives the holder shaft in a reciprocating manner, the swing mechanism that swings the linear motion mechanism together with the holder shaft is provided. Also, it is possible to perform ion implantation on the entire surface with good uniformity.

[Brief description of drawings]

FIG. 1 is a diagram showing an ion implantation apparatus according to an embodiment of the present invention as viewed in the direction of travel of an ion beam. FIG. 2 is a view of the ion implanter in FIG. 1 looking up from below. FIG. 3 is a left side view of the linear motion mechanism portion of FIG. FIG. 4 and FIG. 5 are diagrams showing examples of operating states of the ion implantation apparatus of FIG. 1, respectively. FIG. 6 is a diagram showing an example of the locus of the center of the ion beam. FIG. 7 is a diagram showing an example of a conventional ion implantation apparatus as viewed in the traveling direction of an ion beam. 2 ... ion beam, 4 ... vacuum container, 4a ... injection chamber,
4b ... spare room, 8 ... sample, 10 ... holder, 14 ... holder shaft, 34 ... motor, 36 ... spherical bearing, 44 ... supporting member, 54 ... linear motion mechanism, 60 ... motor , 68 …… Swing mechanism.

Claims (1)

[Scope of utility model registration request] 1. A vacuum container into which an ion beam is introduced, a holder which is contained in the vacuum container and holds a sample to be ion-implanted, a holder shaft for supporting the holder, and a holder shaft for the holder shaft. An ion implantation apparatus including a linear motion mechanism that linearly reciprocates in the axial direction, in a portion where the holder shaft penetrates the vacuum container, a spherical bearing that linearly supports the holder shaft and has a vacuum sealing function. And a supporting member swingable about the center line of the spherical bearing is provided to support the linear motion mechanism by the supporting member, and further the supporting member is rocked together with the linear motion mechanism and the holder shaft. An ion implanter having a moving mechanism.