JPH07508491A - 機能性の導電性及び/又は低放射性層を有する窓ガラス - Google Patents
機能性の導電性及び/又は低放射性層を有する窓ガラスInfo
- Publication number
- JPH07508491A JPH07508491A JP6523942A JP52394295A JPH07508491A JP H07508491 A JPH07508491 A JP H07508491A JP 6523942 A JP6523942 A JP 6523942A JP 52394295 A JP52394295 A JP 52394295A JP H07508491 A JPH07508491 A JP H07508491A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- window glass
- oxide
- substrate
- doped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000005357 flat glass Substances 0.000 title claims description 32
- 238000000576 coating method Methods 0.000 claims description 126
- 239000011248 coating agent Substances 0.000 claims description 104
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 42
- 239000000758 substrate Substances 0.000 claims description 29
- 239000011787 zinc oxide Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 16
- 229910044991 metal oxide Inorganic materials 0.000 claims description 15
- 150000004706 metal oxides Chemical class 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 239000002243 precursor Substances 0.000 claims description 13
- 238000005229 chemical vapour deposition Methods 0.000 claims description 11
- 239000011521 glass Substances 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 238000000197 pyrolysis Methods 0.000 claims description 9
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 9
- 239000000843 powder Substances 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 125000002524 organometallic group Chemical group 0.000 claims description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 235000012239 silicon dioxide Nutrition 0.000 claims description 6
- 229910052718 tin Inorganic materials 0.000 claims description 6
- 229910001887 tin oxide Inorganic materials 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- 229910003437 indium oxide Inorganic materials 0.000 claims description 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 3
- 150000003377 silicon compounds Chemical class 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- 239000012686 silicon precursor Substances 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 1
- UOUJSJZBMCDAEU-UHFFFAOYSA-N chromium(3+);oxygen(2-) Chemical class [O-2].[O-2].[O-2].[Cr+3].[Cr+3] UOUJSJZBMCDAEU-UHFFFAOYSA-N 0.000 claims 1
- 238000000407 epitaxy Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 239000011701 zinc Substances 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 229910052799 carbon Inorganic materials 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- -1 n(C2H5)+ Chemical class 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- JGFBRKRYDCGYKD-UHFFFAOYSA-N dibutyl(oxo)tin Chemical compound CCCC[Sn](=O)CCCC JGFBRKRYDCGYKD-UHFFFAOYSA-N 0.000 description 4
- UTLYKVGGKZYRRQ-UHFFFAOYSA-L dibutyltin(2+);difluoride Chemical compound CCCC[Sn](F)(F)CCCC UTLYKVGGKZYRRQ-UHFFFAOYSA-L 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000005979 thermal decomposition reaction Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 230000001627 detrimental effect Effects 0.000 description 2
- 239000005329 float glass Substances 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 238000010583 slow cooling Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- YMLFYGFCXGNERH-UHFFFAOYSA-K butyltin trichloride Chemical compound CCCC[Sn](Cl)(Cl)Cl YMLFYGFCXGNERH-UHFFFAOYSA-K 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- JAONJTDQXUSBGG-UHFFFAOYSA-N dialuminum;dizinc;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Zn+2].[Zn+2] JAONJTDQXUSBGG-UHFFFAOYSA-N 0.000 description 1
- PXBRQCKWGAHEHS-UHFFFAOYSA-N dichlorodifluoromethane Chemical compound FC(F)(Cl)Cl PXBRQCKWGAHEHS-UHFFFAOYSA-N 0.000 description 1
- 235000019404 dichlorodifluoromethane Nutrition 0.000 description 1
- HQWPLXHWEZZGKY-UHFFFAOYSA-N diethylzinc Chemical compound CC[Zn]CC HQWPLXHWEZZGKY-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- NEXSMEBSBIABKL-UHFFFAOYSA-N hexamethyldisilane Chemical compound C[Si](C)(C)[Si](C)(C)C NEXSMEBSBIABKL-UHFFFAOYSA-N 0.000 description 1
- SBFKENUEAOCRNR-UHFFFAOYSA-K indium(3+);triformate Chemical compound [In+3].[O-]C=O.[O-]C=O.[O-]C=O SBFKENUEAOCRNR-UHFFFAOYSA-K 0.000 description 1
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000005344 low-emissivity glass Substances 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 150000004812 organic fluorine compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000002798 spectrophotometry method Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical class [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 1
- OTRPZROOJRIMKW-UHFFFAOYSA-N triethylindigane Chemical compound CC[In](CC)CC OTRPZROOJRIMKW-UHFFFAOYSA-N 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
Abstract
Description
Claims (16)
- 1.透明な、特にガラスの基材(1)であって、1種又は複数種の金属酸化物を 基礎材料とする透明な、導電性の及び/又は低放射性の機能性被覆(3)と、こ の機能性被覆(3)と上記の基材(1)との間に配置された、幾何学的厚さが7 0〜135nmであって且つ屈折率が1.65〜1.90である「内側」被覆( 2)と、上記の機能性被覆(3)の上に位置し、幾何学的厚さが70〜110n mであって且つ屈折率が1.40〜1.70である「外側」被覆(4)とを備え てなる基材を含む窓ガラス。
- 2.前記機能性被覆(3)の屈折率が2に近く、厚さが300〜450nm、特 に330〜410nm、好ましくはおよそ330、360又は410nmである ことを特徴とする、請求の範囲第1項記載の窓ガラス。
- 3.前記外側被覆(4)の幾何学的厚さが80〜100nm、特におよそ90〜 95nmであることを特徴とする、請求の範囲第1項又は第2項記載の窓ガラス 。
- 4.前記内側被覆(2)の幾何学的厚さが90〜120nmであることを特徴と する、請求の範囲第1項から第3項までのいずれか1項に記載の窓ガラス。
- 5.前記機能性被覆(3)が、スズをドープした酸化インジウムIT0インジウ ムをドープした酸化亜鉛Zn0:ln、フッ素をドープした酸化亜鉛Zn0:F 、アルミニウムをドープした酸化亜鉛Zn0:Al、スズをドープした酸化亜鉛 Zn0:Sn、又はフッ素をドープした酸化スズSnO2:Fを包含する群に属 する少なくとも1種のドープされた金属酸化物を有することを特徴とする、請求 の範囲第1項から第4項までのいずれか1項に記載の窓ガラス。
- 6.前記内側被覆(2)が、チタン、アルミニウム、亜鉛、スズ及びインジウム の酸化物を包含する群に属する金属酸化物のうちの少なくとも1種により構成さ れていることを特徴とする、請求の範囲第1項から第5項までのいずれか1項に 記載の窓ガラス。
- 7.前記内側被覆(2)が酸炭化ケイ素及び/又は酸窒化ケイ素により形成され ていることを特徴とする、請求の範囲第1項から第6項までのいずれか1項に記 載の窓ガラス。
- 8.前記外側被覆(4)が、二酸化ケイ素、酸炭化ケイ素及び/又は酸窒化ケイ 素のうちから選ばれたケイ素の化合物から構成されていることを特徴とする、請 求の範囲第1項から第7項までのいずれか1項に記載の窓ガラス。
- 9.前記外側被覆(4)が、酸化アルミニウム、酸化チタン、酸化ジルコニウム 及び酸化クロムの群に属する金属酸化物のうちの少なくとも1種のうちから選ば れていることを特徴とする、請求の範囲第1項から第7項までのいずれか1項に 記載の窓ガラス。
- 10.その被覆(2、3、4)を備えた前記基材(1)をもう一つの透明基材と 組み合わせてなる多重窓ガラス、特に二重窓ガラスであり、当該二重窓ガラスが 当該被覆の側に反射色を有し、その彩度が5未満であり且つ465〜480nm のその主波長が青色範囲に属し、また光の反射率の値RLが15%に等しいか又 はそれ未満であることを特徴とする、請求の範囲第1項から第9項までのいずれ か1項に記載の窓ガラス。
- 11.被覆(2、3、4)を有する前記基材(1)にもう一つのガラス基材を組 み合わせてなる二重窓ガラスであり、当該被覆(2、3、4)が面3にあり、且 つ他方の基材が面2を二酸化ケイ素タイプの低屈折率を有する被覆で任意的に被 覆されていることを特徴とする、請求の範囲第1項から第10項までのいずれか 1項に記載の窓ガラス。
- 12.1種又は複数種の金属酸化物を基礎材料とする前記被覆(2、4)及び/ 又は前記機能性被覆(3)のうちの少なくとも一つを真空を利用する技術により 、特に、任意的に反応性でもよい陰極スパッタリングにより、酸素の存在下で適 当な組成を有する金属合金又はセラミックに基づくターゲットを使用して堆積さ せることを特徴とする、請求の範囲第1項から第11項までに記載の窓ガラスを 得るための方法。
- 13.前記被覆(2、4)及び/又は前記機能性被覆(3)のうちの少なくとも 一つを熱分解法によって堆積させることを特徴とする、請求の範囲第1項から第 11項までに記載の窓ガラスを得るための方法。
- 14.前記内側被覆(2)を有機金属前躯物質もしくはケイ素前駆物質の化学気 相成長(CVD)により、又は有機金属前駆物質の粉末熱分解により堆積させる ことを特徴とする、請求の範囲第1項から第11項までに記載の窓ガラスを得る ための方法。
- 15.前記機能性被覆(3)を有機金属前駆物質の粉末熱分解により堆積させる ことを特徴とする、請求の範囲第1項から第11項までの一つに記載の窓ガラス を得るための方法。
- 16.前記外側被覆(4)を、それがケイ素化合物のものである場合にはケイ素 前駆物質の化学気相成長により、あるいはそれが金属酸化物のものである場合に は粉末熱分解により堆積させることを特徴とする、請求の範囲第1項から第11 項までの一つに記載の窓ガラスを得るための方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7523942A JP2813066B2 (ja) | 1994-04-18 | 1994-03-18 | ポリオワクチンの神経毒力試験方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR93/05056 | 1993-04-29 | ||
JP7523942A JP2813066B2 (ja) | 1994-04-18 | 1994-03-18 | ポリオワクチンの神経毒力試験方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH07508491A true JPH07508491A (ja) | 1995-09-21 |
JP2813066B2 JP2813066B2 (ja) | 1998-10-22 |
Family
ID=18527654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP7523942A Expired - Lifetime JP2813066B2 (ja) | 1994-04-18 | 1994-03-18 | ポリオワクチンの神経毒力試験方法 |
Country Status (1)
Country | Link |
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JP (1) | JP2813066B2 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000109342A (ja) * | 1998-06-19 | 2000-04-18 | Saint Gobain Vitrage | ガラス基材上に金属酸化物を主成分とする層を堆積させる方法及びそれによってコ―ティングされたガラス基材 |
USRE43817E1 (en) | 2004-07-12 | 2012-11-20 | Cardinal Cg Company | Low-maintenance coatings |
JP2014516019A (ja) * | 2011-05-24 | 2014-07-07 | エージーシー グラス ユーロップ | 連続層の被覆を持つ透明ガラス基板 |
US9738967B2 (en) | 2006-07-12 | 2017-08-22 | Cardinal Cg Company | Sputtering apparatus including target mounting and control |
US10604442B2 (en) | 2016-11-17 | 2020-03-31 | Cardinal Cg Company | Static-dissipative coating technology |
JP2022543529A (ja) * | 2019-07-01 | 2022-10-13 | エージーシー オートモーティヴ アメリカズ アールアンドディー,インコーポレイテッド | 高放射率および低放射率のコーティング層を有する実質的に透明な基板 |
-
1994
- 1994-03-18 JP JP7523942A patent/JP2813066B2/ja not_active Expired - Lifetime
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000109342A (ja) * | 1998-06-19 | 2000-04-18 | Saint Gobain Vitrage | ガラス基材上に金属酸化物を主成分とする層を堆積させる方法及びそれによってコ―ティングされたガラス基材 |
JP4541462B2 (ja) * | 1998-06-19 | 2010-09-08 | サン−ゴバン グラス フランス | ガラス基材上に金属酸化物を主成分とする層を堆積させる方法及びそれによってコーティングされたガラス基材 |
USRE43817E1 (en) | 2004-07-12 | 2012-11-20 | Cardinal Cg Company | Low-maintenance coatings |
USRE44155E1 (en) | 2004-07-12 | 2013-04-16 | Cardinal Cg Company | Low-maintenance coatings |
US9738967B2 (en) | 2006-07-12 | 2017-08-22 | Cardinal Cg Company | Sputtering apparatus including target mounting and control |
JP2014516019A (ja) * | 2011-05-24 | 2014-07-07 | エージーシー グラス ユーロップ | 連続層の被覆を持つ透明ガラス基板 |
US10604442B2 (en) | 2016-11-17 | 2020-03-31 | Cardinal Cg Company | Static-dissipative coating technology |
US11325859B2 (en) | 2016-11-17 | 2022-05-10 | Cardinal Cg Company | Static-dissipative coating technology |
JP2022543529A (ja) * | 2019-07-01 | 2022-10-13 | エージーシー オートモーティヴ アメリカズ アールアンドディー,インコーポレイテッド | 高放射率および低放射率のコーティング層を有する実質的に透明な基板 |
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JP2813066B2 (ja) | 1998-10-22 |
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