JPH0735396Y2 - Wafer cassette transport box - Google Patents
Wafer cassette transport boxInfo
- Publication number
- JPH0735396Y2 JPH0735396Y2 JP1989007244U JP724489U JPH0735396Y2 JP H0735396 Y2 JPH0735396 Y2 JP H0735396Y2 JP 1989007244 U JP1989007244 U JP 1989007244U JP 724489 U JP724489 U JP 724489U JP H0735396 Y2 JPH0735396 Y2 JP H0735396Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer cassette
- clean gas
- transfer box
- main body
- clean
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- Packaging Frangible Articles (AREA)
- Packages (AREA)
Description
【考案の詳細な説明】 [考案の目的] (産業上の利用分野) 本考案は、半導体装置の製造工場内等でウエハの移送に
利用されるウエハカセット搬送箱に関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial field of application) The present invention relates to a wafer cassette transfer box used for transferring wafers in a semiconductor device manufacturing factory or the like.
(従来の技術) 一般に半導体装置等の製造は、高度に清浄化された雰囲
気内で行われており、自動化された製造装置間において
は、製造装置内を含む作業室内全体を高度に清浄化し、
空気浮上方式や磁気浮上方式等によって半導体ウエハの
搬送が行われている。しかし、各製造装置間の搬送は、
作業者による運搬が今だ多く、このような工程間におい
ては、人体が大きな発塵源となるために塵等の付着を避
けるため、たとえば半導体ウエハを収容するウエハカセ
ットをウエハカセット搬送箱内に収納し、この状態で各
製造装置間を移送することが行われている。(Prior Art) Generally, semiconductor devices and the like are manufactured in a highly cleaned atmosphere, and between automated manufacturing devices, the entire working chamber including the inside of the manufacturing devices is highly cleaned,
Semiconductor wafers are transported by an air levitation method, a magnetic levitation method, or the like. However, the transportation between each manufacturing device is
There is still a lot of transportation by workers, and during such a process, the human body becomes a large source of dust generation, so in order to avoid adhesion of dust etc., for example, a wafer cassette containing a semiconductor wafer is placed in a wafer cassette transfer box. It is stored and transferred between the manufacturing apparatuses in this state.
このようなウエハカセット搬送箱内へのウエハカセット
の収納は、製造装置のアンロード部にウエハカセット搬
送箱をセットし、例えばウエハカセット搬送箱の下方か
ら製造装置内の清浄気体を供給してウエハカセット搬送
箱内をクリーンアップした後、ウエハカセットを昇降機
構等によって収納することによって行われており、この
後蓋によって内部を密閉し、各製造装置間の運搬が行わ
れる。In order to store the wafer cassette in the wafer cassette transfer box as described above, the wafer cassette transfer box is set at the unloading part of the manufacturing apparatus, and, for example, clean gas in the manufacturing apparatus is supplied from below the wafer cassette transfer box. After cleaning up the inside of the cassette carrying box, the wafer cassette is housed by an elevating mechanism and the like, and the inside is hermetically sealed by the rear lid, and the manufacturing apparatuses are carried.
(考案が解決しようとする課題) このようにウエハカセット搬送箱を用いることによっ
て、半導体ウエハへの塵等の付着をかなり防止できるも
のの、上述したように製造装置側からの清浄気体による
搬送箱内の清浄化方法では、搬送箱内の清浄化は充分と
は言えず、搬送箱内に塵等が残存し歩留を低下させる原
因となっている。また、搬送箱内に存在する塵等が製造
装置側に流入する危険性もある。このため、作業室内の
清浄度を充分に低下させることを可能にするまでには至
らず、作業室内の清浄化は搬送箱内に塵等が混入しない
ように保つ必要がある。(Problems to be solved by the invention) By using the wafer cassette transport box in this way, although dust and the like can be considerably prevented from adhering to the semiconductor wafer, as described above, the inside of the transport box by the clean gas from the manufacturing apparatus side. According to the cleaning method of No. 1, the inside of the transport box is not sufficiently cleaned, and dust or the like remains in the transport box, which causes a reduction in yield. Further, there is a risk that dust or the like existing in the transport box may flow into the manufacturing apparatus. For this reason, it is not possible to sufficiently reduce the cleanliness of the working chamber, and it is necessary to keep the working chamber clean so that dust and the like are not mixed in the transport box.
しかし、このように作業室内を高度に清浄化するために
は、かなり大きなエネルギーを必要とし、また内部で作
業する作業者も無塵衣等の着用が必要となり、作業効率
も低下するという問題がある。However, in order to highly clean the inside of the work room in this way, a considerably large amount of energy is required, and the workers who work inside need to wear dust-free clothing, etc. is there.
そこで、作業室内の清浄度を低下させても、内部の清浄
化をほぼ完全に行うことが可能なウエハカセット搬送箱
が強く望まれている。Therefore, there is a strong demand for a wafer cassette transport box that can almost completely clean the inside even if the cleanliness of the working chamber is reduced.
本考案は、このような従来の事情に対処してなされたも
ので、清浄化度を低下させた作業室内においても塵等の
混入を防止し、かつ清浄化された雰囲気を容易に維持す
ることを可能にしたウエハカセット搬送箱を提供するこ
とを目的としている。The present invention has been made in response to such a conventional situation, and it is possible to prevent dust and the like from entering even in a working room where the degree of cleanliness is lowered and to easily maintain a clean atmosphere. It is an object of the present invention to provide a wafer cassette transport box that enables the above.
[考案の構成] (課題を解決するための手段) すなわち本考案のウエハカセット搬送箱は、本考案のウ
エハカセット搬送箱は、内部にウエハカセットを収納す
る搬送箱本体と、この搬送箱本体の下部に設けられ、閉
状態で前記搬送箱本体を気密に閉塞し、開状態で前記ウ
エハカセットの搬入、搬出を可能とする開閉自在の蓋
と、前記搬送箱本体に着脱自在に付設された清浄気体収
容部と、この清浄気体収容部から清浄気体を前記搬送箱
本体内に供給する清浄気体供給部と、前記搬送箱本体に
設けられた搬送用の取手とを備えていることを特徴とし
ている。[Means for Solving the Problem] (Means for Solving the Problems) That is, the wafer cassette transfer box of the present invention is a wafer cassette transfer box of the present invention, which is a transfer box main body for storing a wafer cassette therein, and a transfer box main body of the transfer box main body. An openable / closable lid provided in the lower part to hermetically close the transfer box main body in the closed state and to allow the wafer cassette to be loaded and unloaded in the open state, and a cleaning device detachably attached to the transfer box main body. It is characterized by comprising a gas storage part, a clean gas supply part for supplying a clean gas from the clean gas storage part into the carrier box body, and a carrying handle provided in the carrier box body. .
また、本考案は、上記ウエハカセット搬送箱において、
前記清浄気体供給部より供給される清浄気体は、ノズル
を介して前記搬送箱本体内に供給され、このノズルの噴
出側にはフィルタが設けられていることを特徴とするも
の、前記搬送箱本体は、帯電防止加工されていることを
特徴とするもの、前記清浄気体は、清浄空気又は清浄窒
素であることを特徴とするものを含む。Further, the present invention provides the above-mentioned wafer cassette carrying box,
The clean gas supplied from the clean gas supply unit is supplied into the carrier box body through a nozzle, and a filter is provided on the ejection side of the nozzle, the carrier box body. Include those characterized by being subjected to antistatic processing and those characterized in that said clean gas is clean air or clean nitrogen.
(作用) 本考案のウエハカセット搬送箱は、清浄気体収容部を備
えている。そして、この清浄気体収容部からウエハカセ
ットが収納される搬送箱本体内に清浄気体を供給するこ
とによって、外部の雰囲気に拘らず容易に搬送箱本体内
部を清浄化することができるとともに、搬送箱本体内部
を陽圧に保つことによって塵等の混入も防止できる。ま
た、この状態で製造装置にセットすることによって、清
浄化された搬送箱内にウエハカセットを容易に収納する
ことができ、充分に清浄化された状態を保って各工程間
の移送が行えるとともに、製造装置側への塵等の流入も
防止できる。(Operation) The wafer cassette carrying box of the present invention is provided with a clean gas container. By supplying the clean gas from the clean gas storage unit into the transfer box main body in which the wafer cassette is stored, the inside of the transfer box main body can be easily cleaned regardless of the external atmosphere, and the transfer box can be easily cleaned. By keeping the inside of the main body at positive pressure, it is possible to prevent dust from entering. By setting the wafer cassette in the manufacturing apparatus in this state, the wafer cassette can be easily stored in the cleaned transfer box, and the wafer cassette can be transferred between the steps while maintaining the sufficiently cleaned state. It is also possible to prevent dust and the like from flowing into the manufacturing apparatus.
また、清浄気体を供給するノズルの噴出側にフィルタを
設けることによって、さらに清浄化を図ることかでき
る。さらに、搬送箱本体を帯電防止加工することによっ
て、塵埃の静電気による付着を防止できる。清浄気体と
しては、清浄空気又は清浄窒素を用いることにより、安
全性の確保と低コスト化を図ることができる。Further, by providing a filter on the ejection side of the nozzle that supplies the clean gas, it is possible to achieve further cleaning. Furthermore, by making the carrier box body antistatic, it is possible to prevent dust from adhering due to static electricity. By using clean air or clean nitrogen as the clean gas, it is possible to secure safety and reduce costs.
(実施例) 以下、本考案のウエハカセット搬送箱の実施例を図面を
参照して説明する。(Embodiment) An embodiment of the wafer cassette carrying box of the present invention will be described below with reference to the drawings.
内部にウエハカセット(図示せず)が1または複数収納
される搬送箱本体1は、例えばポリプロピレン、ポリエ
チレン、スチレン、テフロン等によって筐体形状に形成
されている。必要に応じて帯電防止例えば帯電防止加工
されている。搬送箱本体1の下部にはスライド式の蓋2
が設けられており、この蓋2は閉状態の際に気密に封止
可能とされている。塵の発生の可能性のある場合は開閉
蓋にしてもよい。また、搬送箱本体1の上部には、搬送
用の取手3が設置されている。The carrier box main body 1 in which one or a plurality of wafer cassettes (not shown) are housed is formed in a housing shape from, for example, polypropylene, polyethylene, styrene, Teflon or the like. If necessary, antistatic processing, for example, antistatic processing is performed. A slide-type lid 2 is provided at the bottom of the carrier box body 1.
Is provided, and the lid 2 can be hermetically sealed in the closed state. An opening / closing lid may be used when dust may be generated. Further, a carrying handle 3 is installed on the upper part of the carrying box body 1.
搬送箱本体1の側部には、充分に清浄化された気体、例
えば清浄空気、清浄窒素等が充填された清浄気体収容ボ
ンベ4が、取付け部5によって着脱自在に付設されてい
る。また、搬送箱本体1内部の上方には、清浄気体を搬
送箱本体内部下方に向けて均一に供給する如く複数のノ
ズル6が設置されており、これらノズル6は清浄気体供
給配管7によってカップラ8を介して清浄気体収容ボン
ベ4側の配管4aに接続されている。ノズル6の噴出側に
エアフィルタを設けるとさらによい。A clean gas storage cylinder 4 filled with a sufficiently cleaned gas, for example, clean air or clean nitrogen, is removably attached to a side portion of the transport box body 1 by a mounting portion 5. Further, a plurality of nozzles 6 are installed above the inside of the carrier box body 1 so as to uniformly supply the clean gas toward the inside of the carrier box body. These nozzles 6 are connected to the coupler 8 by a clean gas supply pipe 7. Is connected to a pipe 4a on the clean gas storage cylinder 4 side. It is more preferable to provide an air filter on the ejection side of the nozzle 6.
また、搬送箱本体1内部への清浄気体の供給は、清浄気
体供給配管7に介挿された開閉スイッチ9によって行わ
れ、さらに同様に清浄気体供給配管8に介挿された流量
制御バルブ10によって、供給量が調節される。上記蓋2
または側壁に貫通孔を複数個設け清浄流体の流路を形成
するとよい。この場合、この貫通孔にエアフィルタを設
けるとさらによい。Further, the supply of the clean gas to the inside of the carrier box main body 1 is performed by the opening / closing switch 9 inserted in the clean gas supply pipe 7, and similarly by the flow rate control valve 10 inserted in the clean gas supply pipe 8. , The supply is adjusted. The lid 2
Alternatively, a plurality of through holes may be provided in the side wall to form a flow path for the clean fluid. In this case, it is more preferable to provide an air filter in this through hole.
上記構成のこの実施例のウエハカセット搬送箱は、例え
ば以下のようにして使用される。The wafer cassette carrying box of this embodiment having the above configuration is used, for example, as follows.
まず清浄気体収容ボンベ4を取付け部5にセットし、清
浄気体収容ボンベ4側の配管4aと清浄気体供給配管7と
をカップラ8によって接続する。次いで、清浄気体収容
ボンベ4側のバルブ4bを開状態とし、蓋2を開状態とし
たままで清浄気体を搬送箱本体1内部に供給することに
よって搬送箱本体1内部を清浄化した後、蓋2を閉じて
準備が終了する。First, the clean gas storage cylinder 4 is set on the mounting portion 5, and the pipe 4a on the clean gas storage cylinder 4 side and the clean gas supply pipe 7 are connected by the coupler 8. Then, the valve 4b on the clean gas storage cylinder 4 side is opened, and the inside of the transport box main body 1 is cleaned by supplying the clean gas into the transport box main body 1 while keeping the lid 2 open. 2 is closed and the preparation is completed.
次に、この内部が清浄化されたウエハカセット搬送箱を
ウエハカセットの搬送を行おうとする製造装置等のアン
ロード側にセットし、清浄気体収容ボンベ4から搬送箱
本体1内部に清浄気体を供給しつつ蓋2を開けて、ウエ
ハカセットの収納準備を行う。Next, the wafer cassette transfer box whose inside is cleaned is set on the unloading side of a manufacturing apparatus or the like for transferring the wafer cassette, and clean gas is supplied from the clean gas storage cylinder 4 into the transfer box main body 1. Then, the lid 2 is opened while the wafer cassette is prepared for storage.
この後、清浄気体収容ボンベ4から搬送箱本体1内部に
清浄気体を供給しつつ、搬送箱本体1の内部にその下方
からウエハカセットを製造装置側の昇降機構等によって
収納し、搬送箱本体1内部を陽圧に保ちうるように蓋2
を閉じるとともに清浄気体の供給を停止し、ウエハカセ
ットの収納が終了する。Thereafter, while supplying the clean gas from the clean gas storage cylinder 4 to the inside of the transfer box main body 1, the wafer cassette is stored in the inside of the transfer box main body 1 from below under the elevating mechanism on the manufacturing apparatus side. Lid 2 to maintain positive pressure inside
And the supply of clean gas is stopped, and the storage of the wafer cassette is completed.
このように、ウエハカセット搬送箱自体に清浄気体の収
容部と供給部とを設けることによって、外雰囲気の清浄
化度に拘らずウエハカセット内部を容易に高度に清浄化
することが可能になる。また、ウエハカセットの収納時
においても、この清浄化された状態を容易に維持するこ
とができ、ウエハカセットを高度に清浄化された状態で
搬送することができる。As described above, by providing the wafer cassette carrying box itself with the clean gas storage portion and the supply portion, the inside of the wafer cassette can be easily and highly cleaned regardless of the degree of cleanliness of the outside atmosphere. Further, even when the wafer cassette is stored, this cleaned state can be easily maintained, and the wafer cassette can be transported in a highly cleaned state.
[考案の効果] 以上説明したように、本考案のウエハカセット搬送箱に
よれば、清浄化度を低下させた作業室内等においても塵
等の混入を防止しつつウエハカセットを収納することが
でき、この状態を維持しての搬送が可能となる。[Advantages of the Invention] As described above, according to the wafer cassette transport box of the present invention, the wafer cassette can be housed while preventing dust and the like from entering even in a working room or the like where the cleanliness is lowered. It is possible to carry the sheet while maintaining this state.
第1図は本考案の一実施例のウエハカセット搬送箱を示
す斜視図である。 1……搬送箱本体、2……蓋、4……清浄気体収容ボン
ベ、6……ノズル、7……清浄気体供給配管。FIG. 1 is a perspective view showing a wafer cassette carrying box according to an embodiment of the present invention. 1 ... Transport box body, 2 ... Lid, 4 ... Clean gas storage cylinder, 6 ... Nozzle, 7 ... Clean gas supply pipe.
Claims (4)
体と、 この搬送箱本体の下部に設けられ、閉状態で前記搬送箱
本体を気密に閉塞し、開状態で前記ウエハカセットの搬
入、搬出を可能とする開閉自在の蓋と、 前記搬送箱本体に着脱自在に付設された清浄気体収容部
と、 この清浄気体収容部から清浄気体を前記搬送箱本体内に
供給する清浄気体供給部と、 前記搬送箱本体に設けられた搬送用の取手と を備えていることを特徴とするウエハカセット搬送箱。1. A transfer box main body for accommodating a wafer cassette therein, and a transfer box main body provided in a lower portion of the transfer box main body, airtightly closing the transfer box main body in a closed state, and loading and unloading the wafer cassette in an open state. An openable and closable lid for enabling the above, a clean gas storage part detachably attached to the transfer box body, and a clean gas supply part for supplying a clean gas from the clean gas storage part into the transfer box body, A wafer cassette transfer box, comprising: a transfer handle provided on the transfer box body.
体は、ノズルを介して前記搬送箱本体内に供給され、こ
のノズルの噴出側にはフィルタが設けられていることを
特徴とする実用新案登録請求の範囲第1項記載のウエハ
カセット搬送箱。2. The clean gas supplied from the clean gas supply unit is supplied into the main body of the carrying box through a nozzle, and a filter is provided on the ejection side of the nozzle. The wafer cassette carrying box according to claim 1 of the new model registration claim.
ることを特徴とする実用新案登録請求の範囲第1項記載
のウエハカセット搬送箱。3. The wafer cassette carrying box according to claim 1, wherein the carrying box body is antistatic processed.
あることを特徴とする実用新案登録請求の範囲第1項記
載のウエハカセット搬送箱。4. The wafer cassette carrying box according to claim 1, wherein the clean gas is clean air or clean nitrogen.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989007244U JPH0735396Y2 (en) | 1989-01-25 | 1989-01-25 | Wafer cassette transport box |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989007244U JPH0735396Y2 (en) | 1989-01-25 | 1989-01-25 | Wafer cassette transport box |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0298640U JPH0298640U (en) | 1990-08-06 |
JPH0735396Y2 true JPH0735396Y2 (en) | 1995-08-09 |
Family
ID=31212092
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1989007244U Expired - Lifetime JPH0735396Y2 (en) | 1989-01-25 | 1989-01-25 | Wafer cassette transport box |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0735396Y2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003007813A (en) * | 2001-06-20 | 2003-01-10 | Nec Corp | Storing box for semiconductor wafer, carrying device, carrying method and storage house |
CN103662424B (en) * | 2012-09-21 | 2016-06-08 | 上海航天精密机械研究所 | The tr of a kind of band vibration damping, sealing storing |
JP6689672B2 (en) * | 2016-05-25 | 2020-04-28 | 信越ポリマー株式会社 | Substrate storage container, management system thereof, and substrate storage container management method |
JP6689673B2 (en) * | 2016-05-25 | 2020-04-28 | 信越ポリマー株式会社 | Board storage container management system |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55134239A (en) * | 1979-04-04 | 1980-10-18 | Toshiba Corp | Clean box |
JPS6218317U (en) * | 1985-07-18 | 1987-02-03 |
-
1989
- 1989-01-25 JP JP1989007244U patent/JPH0735396Y2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0298640U (en) | 1990-08-06 |
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