JPH07239407A - Replica diffraction grating - Google Patents
Replica diffraction gratingInfo
- Publication number
- JPH07239407A JPH07239407A JP3027394A JP3027394A JPH07239407A JP H07239407 A JPH07239407 A JP H07239407A JP 3027394 A JP3027394 A JP 3027394A JP 3027394 A JP3027394 A JP 3027394A JP H07239407 A JPH07239407 A JP H07239407A
- Authority
- JP
- Japan
- Prior art keywords
- replica
- thin film
- diffraction grating
- metal thin
- grating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、超高真空中での分光な
どに利用されるレプリカ回折格子に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a replica diffraction grating used for spectroscopy in ultrahigh vacuum.
【0002】[0002]
【従来の技術】マスター回折格子から多くのレプリカを
作製して、回折格子(レプリカ回折格子)の量産を行う
手法は従来より行われており、その代表的な手法として
は次のものがある。2. Description of the Related Art A method of mass-producing diffraction gratings (replica diffraction gratings) by making many replicas from a master diffraction grating has been conventionally performed, and a typical method thereof is as follows.
【0003】すなわち、まず、ガラス基板にアルミニウ
ムなどの金属薄膜を蒸着し、該膜に格子溝を形成するこ
とによりマスター回折格子を製作する。このマスターを
母型として、その格子面に離形剤として薄く油膜を形成
し、その上に真空蒸着によりアルミニウム薄膜を形成し
た後、このアルミニウム薄膜上にガラス基板を接着剤
(耐熱性樹脂)を介して接着し、接着剤の硬化後、ガラ
ス基板を母型より剥離することによりアルミニウム薄膜
はガラス基板側に移り、レプリカ回折格子が得られる。That is, first, a master diffraction grating is manufactured by depositing a metal thin film such as aluminum on a glass substrate and forming a grating groove in the film. Using this master as a master, a thin oil film is formed on the lattice surface as a release agent, an aluminum thin film is formed on it by vacuum deposition, and then a glass substrate is coated with an adhesive (heat resistant resin) on this aluminum thin film. The aluminum thin film is moved to the glass substrate side by peeling the glass substrate from the mother die after the adhesive is cured and the adhesive is cured, and a replica diffraction grating is obtained.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、従来の
方法で製作したレプリカ回折格子は、表面がアルミニウ
ムなどの金属薄膜が露出した形となっているため、その
金属表面が酸化したり、酸、アルカリ等と化学的に反応
しやすく、問題となっていた。また、アルミニウムなど
の表面では高温条件の使用に対して、アルミニウム膜に
結晶粒が発生するという熱変化が生じ、回折格子として
の性能を著しく低下させていた。However, since the replica diffraction grating manufactured by the conventional method has a shape in which the metal thin film such as aluminum is exposed, the metal surface is oxidized, or the acid or alkali is used. It was a problem because it could easily chemically react with etc. In addition, on the surface of aluminum or the like, when used under high temperature conditions, thermal change occurs such that crystal grains are generated in the aluminum film, and the performance as a diffraction grating is significantly deteriorated.
【0005】また、大出力レーザ等に用いられる回折格
子は、温度上昇に耐え、放射損傷を受けにくいものであ
る必要があるが、表面がアルミニウム等では問題があっ
た。そこで、本発明は、前記課題のない長寿命型のレプ
リカ回折格子を提供することを目的とする。Further, the diffraction grating used for a high power laser or the like needs to be resistant to temperature rise and less susceptible to radiation damage, but there is a problem with the surface of aluminum or the like. Therefore, an object of the present invention is to provide a long-life replica diffraction grating that does not have the above problems.
【0006】[0006]
【課題を解決するための手段】本件発明は前記課題を解
決するため、マスター回折格子の格子面に金属薄膜を形
成し、該金属薄膜とレプリカ基板とを接着剤を介して圧
接した後剥離させ、該金属薄膜をレプリカ基板に反転接
着させてなるレプリカ回折格子において、前記反転接着
させた金属薄膜の表面に化学的に不活性な保護層を設け
たことを特徴とする。In order to solve the above problems, the present invention forms a metal thin film on the grating surface of a master diffraction grating, press-contacts the metal thin film and a replica substrate with an adhesive, and then peels them off. In a replica diffraction grating obtained by reversely adhering the metal thin film to a replica substrate, a chemically inert protective layer is provided on the surface of the reversely adhered metal thin film.
【0007】ここで、マスター回折格子とは、ガラス、
SiO2 などの無機材料基板に直接刻線を施すか、又は
基板にアルミニウムなどの金属薄膜を蒸着してそこに刻
線を施こしたものをいい、刻線を施こしたところが格子
面になる。刻線は、回折格子彫刻装置による機械刻線で
も、イオンビームエッチングによる刻線でも良い。Here, the master diffraction grating is glass,
An inorganic material such as SiO 2 is directly engraved on the substrate, or a metal thin film such as aluminum is vapor-deposited on the substrate and engraved on it. The engraved area becomes the lattice plane. . The engraved line may be a machine engraved line by a diffraction grating engraving device or an engraved line by ion beam etching.
【0008】金属薄膜としては、例えば、アルミニウ
ム、金、白金などの薄膜を挙げることができ、これら薄
膜は、マスター回折格子の格子面に例えば、真空蒸着に
より形成する。なお、金属薄膜を形成した後に、マスタ
ー回折格子の格子面に離形剤を塗布しておく。離形剤と
しては、例えば、シリコングリースなどを用いることが
できる。Examples of the metal thin film include thin films of aluminum, gold, platinum and the like, and these thin films are formed on the grating surface of the master diffraction grating by, for example, vacuum deposition. After forming the metal thin film, a release agent is applied to the grating surface of the master diffraction grating. As the release agent, for example, silicone grease or the like can be used.
【0009】レプリカ基板は、温度上昇に伴う溝間隔の
変化を抑えるため低膨張率の材質を用いるのが好まし
く、これに該当するものとして例えば、石英ガラス、ゼ
ロデュア(SCHOTT社製)のような低膨張結晶ガラ
スを挙げることができる。但し、材質はこれらに限定さ
れず、温度上昇の少ない領域で回折格子を使用する場合
には、BK7、BSC2、パイレックスガラス、ソーダ
ガラスなども用いることができる。It is preferable that the replica substrate is made of a material having a low expansion coefficient in order to suppress the change in the groove spacing due to the temperature rise. Expanded crystal glass can be mentioned. However, the material is not limited to these, and when the diffraction grating is used in a region where the temperature rise is small, BK7, BSC2, Pyrex glass, soda glass, etc. can also be used.
【0010】金属薄膜とレプリカ基板とを接着させる接
着剤としては、尿素樹脂、メラミン樹脂、フェノール樹
脂、エポキシ樹脂などの熱硬化性樹脂を用いることがで
きるが、熱歪の影響を少なくする目的で、可視光硬化樹
脂を用いることもできる。可視光硬化樹脂としては、例
えばBENEFIXVL((株)アーデル製)を挙げるこ
とができるが、これらに限定されない。A thermosetting resin such as urea resin, melamine resin, phenol resin, or epoxy resin can be used as an adhesive agent for adhering the metal thin film and the replica substrate, but for the purpose of reducing the influence of thermal strain. A visible light curable resin can also be used. Examples of the visible light curable resin include BENEFIX VL (manufactured by Adell Co., Ltd.), but are not limited thereto.
【0011】化学的に不活性な保護層としては、例えば
シリコングリースの薄膜を金属薄膜表面に形成したもの
が該当するが、これには限定されない。シリコングリー
スの薄膜は、例えば真空蒸着により形成する。また、マ
スター回折格子の格子面に離形剤としてシリコングリー
スを用いているときは、レプリカ作製時に残存している
シリコングリースを有効利用できる。The chemically inert protective layer corresponds to, for example, a thin film of silicon grease formed on the surface of a metal thin film, but is not limited thereto. The thin film of silicon grease is formed by vacuum vapor deposition, for example. Further, when silicon grease is used as a release agent on the grating surface of the master diffraction grating, the silicon grease remaining during replica production can be effectively used.
【0012】[0012]
【作用】本発明によれば、化学的に不活性な保護層を金
属薄膜表面に形成することにより、酸化・炭化等が極め
て起こりにくく、酸、アルカリ溶液に対しても耐性が増
す。また、耐熱、耐寒、耐放射線性も増大するととも
に、撥水性を付与し、耐侵性も高まる。According to the present invention, by forming a chemically inactive protective layer on the surface of a metal thin film, oxidation and carbonization are extremely unlikely to occur, and resistance to acid and alkali solutions is increased. Further, heat resistance, cold resistance, and radiation resistance are increased, water repellency is imparted, and erosion resistance is also increased.
【0013】また、表面の金属膜に結晶粒が発生するの
を防ぐことができる。また、これによりレプリカ回折格
子の接着剤層に耐熱性接着剤を用いることにより、ベー
カブルレプリカ回折格子の製作が可能となった。さら
に、保護層を設けることにより、表面についたごみやほ
こりがブロア等で除去しやすくなった。Further, it is possible to prevent the generation of crystal grains in the metal film on the surface. In addition, by using a heat-resistant adhesive for the adhesive layer of the replica diffraction grating, it has become possible to manufacture a bakable replica diffraction grating. Furthermore, by providing the protective layer, dust and dirt on the surface can be easily removed with a blower or the like.
【0014】[0014]
【実施例】本発明のレプリカ回折格子を製作する工程を
図に基づいて説明する。EXAMPLE A process for producing a replica diffraction grating according to the present invention will be described with reference to the drawings.
【0015】先ず、平面ガラス基板1(石英ガラス:6
0mm×60mm×11.3mm)にフォトレジストO
FPR5000(東京応化製)を0.4μmコーティン
グし、そこにホログラフィック露光法(レーザー波長4
41.6nm)により格子溝(1200本/mm)を形
成する。その後、イオンビーム・エッチングによりブレ
ーズ角4度の溝断面形状が鋸歯状になるようにし、その
上にアルミニウム薄膜(厚さ0.2μm)2を真空蒸着
し、マスター回折格子を製作する。この状態が図1
(a)である。First, the flat glass substrate 1 (quartz glass: 6)
0mm x 60mm x 11.3mm) photoresist O
FPR5000 (manufactured by Tokyo Ohka Co., Ltd.) is coated to a thickness of 0.4 μm, and the holographic exposure method (laser wavelength 4
41.6 nm) to form lattice grooves (1200 / mm). After that, a groove cross-section with a blaze angle of 4 degrees is formed into a sawtooth shape by ion beam etching, and an aluminum thin film (thickness: 0.2 μm) 2 is vacuum-deposited on the groove to manufacture a master diffraction grating. This state is shown in Figure 1.
It is (a).
【0016】このマスター回折格子にシリコングリコー
スを離形剤として薄い油膜3(厚さ約1nm)を形成
し、その上にアルミニウム薄膜(厚さ0.2μm)4を
真空蒸着する。この状態が図1(b)である。A thin oil film 3 (thickness: about 1 nm) is formed on the master diffraction grating using silicon glycose as a release agent, and an aluminum thin film (thickness: 0.2 μm) 4 is vacuum-deposited on the thin oil film 3. This state is shown in FIG.
【0017】次にレプリカ基板(石英ガラス;60mm
×60mm×11.3mm)6を用意し、その表面をフ
レオンなどで洗浄した後、接着剤(耐熱性エポキシ樹
脂)5を塗布する。そして、レプリカ基板6と前述のマ
スター回折格子を接着させる。この状態が図1(c)、
(d)である。Next, a replica substrate (quartz glass; 60 mm)
X 60 mm x 11.3 mm) 6 is prepared, the surface thereof is washed with Freon or the like, and then an adhesive (heat resistant epoxy resin) 5 is applied. Then, the replica substrate 6 and the above-mentioned master diffraction grating are bonded. This state is shown in FIG.
It is (d).
【0018】接着硬化後、離形剤3を境にしてレプリカ
基板6を剥離すると、アルミニウム薄膜4はレプリカ基
板6に移りレプリカ回折格子が作製される。このときの
状態が図1(e)である。After the adhesive is hardened, the replica substrate 6 is peeled off with the release agent 3 as a boundary, and the aluminum thin film 4 is transferred to the replica substrate 6 to form a replica diffraction grating. The state at this time is shown in FIG.
【0019】そして、アルミニウム薄膜4の表面にシリ
コングリース7を真空蒸着する。このときの状態が図1
(e)である。これを、ベーク炉で300℃まで加熱
し、レーザ干渉計で面精度を測定し、また回折効率と散
乱光強度を効率測定装置で調べた結果、全く変化は見ら
れなかった。Then, silicon grease 7 is vacuum-deposited on the surface of the aluminum thin film 4. The state at this time is shown in Figure 1.
(E). This was heated to 300 ° C. in a baking oven, surface accuracy was measured with a laser interferometer, and diffraction efficiency and scattered light intensity were examined with an efficiency measuring device. As a result, no change was observed.
【0020】さらにシリコングリースは無色透明で、透
過性も良いため表面に金属層を形成せずに、シリコング
リース層を蒸着すれば透過型素子として利用できる。Furthermore, since the silicone grease is colorless and transparent and has good transparency, it can be used as a transmissive element by depositing a silicone grease layer without forming a metal layer on the surface.
【0021】[0021]
【発明の効果】本発明によれば、従来の金属薄膜が表面
に露出したものと比して、化学的に不活性となり酸化、
炭化、固化、蒸発等が極めて起こりにくくなり、30%
以下の酸、アルカリには腐触されない。According to the present invention, compared with the conventional metal thin film exposed on the surface, it becomes chemically inactive and is oxidized,
Carbonization, solidification, evaporation, etc. are extremely unlikely to occur, and 30%
It is not corroded by the following acids and alkalis.
【0022】また、従来品では150℃程度に加熱する
と、表面の金属薄膜に結晶粒が発生するという熱変化が
生じ、回折格子としての性能を著しく低下させていた
が、本発明によりそれを防ぐことができる。Further, in the conventional product, when heated to about 150 ° C., a thermal change occurs in which crystal grains are generated in the metal thin film on the surface, and the performance as a diffraction grating is remarkably deteriorated. The present invention prevents this. be able to.
【0023】更に、接着剤層に耐熱性接着剤を用いるこ
とにより、300℃まで耐え得るベーカブルレプリカ回
折格子の製作が可能となった。また、これにより表面は
撥水性を有し、耐候性を高める効果があり、表面につい
たゴミやほこりもブロア等で除去しやすくなった。Furthermore, by using a heat-resistant adhesive for the adhesive layer, it becomes possible to manufacture a bakeable replica diffraction grating that can withstand temperatures up to 300.degree. In addition, this has the surface having water repellency and has the effect of increasing the weather resistance, and it is easy to remove dust and dirt attached to the surface with a blower or the like.
【0024】しかも、近年急速に発展しつつある大出力
レーザやSRを光源とした分光研究によって、ベーキン
グに十分耐え得る回折格子の製作が可能となる。また、
シリコングリース層を形成することにより、放射線に対
しても耐性が増す。Moreover, a spectroscopic study using a high-power laser or SR as a light source, which has been rapidly developing in recent years, makes it possible to manufacture a diffraction grating that can sufficiently withstand baking. Also,
By forming the silicon grease layer, resistance to radiation is also increased.
【図1】本発明のレプリカ回折格子を製作する工程図FIG. 1 is a process drawing of manufacturing a replica diffraction grating of the present invention.
1:ガラス基板 2:アルミニウム薄膜 3:離形剤 4:アルミニウム薄膜 5:接着剤 6:レプリカ基板 7:シリコングリース 1: Glass substrate 2: Aluminum thin film 3: Release agent 4: Aluminum thin film 5: Adhesive 6: Replica substrate 7: Silicon grease
Claims (1)
形成し、該金属薄膜とレプリカ基板とを接着剤を介して
圧接した後剥離させ、該金属薄膜をレプリカ基板に反転
接着させてなるレプリカ回折格子において、前記反転接
着させた金属薄膜の表面に化学的に不活性な保護層を設
けたことを特徴とするレプリカ回折格子。1. A replica obtained by forming a metal thin film on a grating surface of a master diffraction grating, press-contacting the metal thin film and a replica substrate with an adhesive, and then peeling the metal thin film and inverting and adhering the metal thin film to the replica substrate. In the diffraction grating, a replica diffraction grating, characterized in that a chemically inactive protective layer is provided on the surface of the metal thin film that has been reverse-bonded.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3027394A JPH07239407A (en) | 1994-02-28 | 1994-02-28 | Replica diffraction grating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3027394A JPH07239407A (en) | 1994-02-28 | 1994-02-28 | Replica diffraction grating |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH07239407A true JPH07239407A (en) | 1995-09-12 |
Family
ID=12299104
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3027394A Pending JPH07239407A (en) | 1994-02-28 | 1994-02-28 | Replica diffraction grating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07239407A (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0953161A1 (en) * | 1997-01-17 | 1999-11-03 | Cymer, Inc. | Reflective overcoat for replicated diffraction gratings |
EP1027172A1 (en) * | 1997-09-29 | 2000-08-16 | Cymer, Inc. | Protective overcoat for replicated diffraction gratings |
WO2002045475A3 (en) * | 2000-12-07 | 2002-10-10 | Cymer Inc | Protective overcoat for replicated diffraction gratings |
JP2003084114A (en) * | 2001-09-13 | 2003-03-19 | Asahi Glass Co Ltd | Reflection diffraction device |
WO2003025633A1 (en) * | 2001-09-13 | 2003-03-27 | Asahi Glass Company, Limited | Diffraction device |
JP2006084885A (en) * | 2004-09-17 | 2006-03-30 | Shimadzu Corp | Method for manufacturing replica grating |
JP2006295129A (en) * | 2005-02-03 | 2006-10-26 | Corning Inc | Excimer laser device with improved endurance |
JP2008262217A (en) * | 2008-07-02 | 2008-10-30 | Asahi Glass Co Ltd | Diffraction device |
JP2009524814A (en) * | 2006-01-26 | 2009-07-02 | シュルンベルジェ ホールディングス リミテッド | Downhole spectral analysis tool including inorganic replica diffraction grating |
-
1994
- 1994-02-28 JP JP3027394A patent/JPH07239407A/en active Pending
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0953161A1 (en) * | 1997-01-17 | 1999-11-03 | Cymer, Inc. | Reflective overcoat for replicated diffraction gratings |
EP0953161A4 (en) * | 1997-01-17 | 2000-05-24 | Cymer Inc | Reflective overcoat for replicated diffraction gratings |
EP1027172A1 (en) * | 1997-09-29 | 2000-08-16 | Cymer, Inc. | Protective overcoat for replicated diffraction gratings |
US6511703B2 (en) * | 1997-09-29 | 2003-01-28 | Cymer, Inc. | Protective overcoat for replicated diffraction gratings |
EP1027172A4 (en) * | 1997-09-29 | 2006-07-05 | Cymer Inc | Protective overcoat for replicated diffraction gratings |
WO2002045475A3 (en) * | 2000-12-07 | 2002-10-10 | Cymer Inc | Protective overcoat for replicated diffraction gratings |
WO2003025633A1 (en) * | 2001-09-13 | 2003-03-27 | Asahi Glass Company, Limited | Diffraction device |
JP2003084114A (en) * | 2001-09-13 | 2003-03-19 | Asahi Glass Co Ltd | Reflection diffraction device |
US7430076B2 (en) | 2001-09-13 | 2008-09-30 | Asahi Glass Company, Limited | Diffraction element |
JP2006084885A (en) * | 2004-09-17 | 2006-03-30 | Shimadzu Corp | Method for manufacturing replica grating |
JP2006295129A (en) * | 2005-02-03 | 2006-10-26 | Corning Inc | Excimer laser device with improved endurance |
JP2009524814A (en) * | 2006-01-26 | 2009-07-02 | シュルンベルジェ ホールディングス リミテッド | Downhole spectral analysis tool including inorganic replica diffraction grating |
JP2008262217A (en) * | 2008-07-02 | 2008-10-30 | Asahi Glass Co Ltd | Diffraction device |
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