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JPH07164591A - Laminated film of gas barrier properties - Google Patents

Laminated film of gas barrier properties

Info

Publication number
JPH07164591A
JPH07164591A JP6234947A JP23494794A JPH07164591A JP H07164591 A JPH07164591 A JP H07164591A JP 6234947 A JP6234947 A JP 6234947A JP 23494794 A JP23494794 A JP 23494794A JP H07164591 A JPH07164591 A JP H07164591A
Authority
JP
Japan
Prior art keywords
gas barrier
water
layer
film
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6234947A
Other languages
Japanese (ja)
Other versions
JP2790054B2 (en
Inventor
Ryukichi Matsuo
龍吉 松尾
Toshiaki Yoshihara
俊昭 吉原
Takashi Miyamoto
隆司 宮本
Mika Gamou
美香 蒲生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP23494794A priority Critical patent/JP2790054B2/en
Publication of JPH07164591A publication Critical patent/JPH07164591A/en
Application granted granted Critical
Publication of JP2790054B2 publication Critical patent/JP2790054B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Laminated Bodies (AREA)

Abstract

PURPOSE:To provide a laminated film of gas barrier properties having flexibility, super gas barrier properties to oxygen, water vapor and the like, resistance to heat, resistance to humidity and water resistance, and easy to manufacture. CONSTITUTION:A deposited layer 3 composed of an inorganic compound is formed as a first layer on a base 2 composed of a polymer resin composition, and a coating agent as an agent containing a water solution which contains a water-soluble polymer and also contains at least one kind of either of (a) metallic alcoxide or its hydrolyzate of one kind or more or (b) tin chloride, or the coating agent composed of water/alcohol mixed solution, is applied thereon, and heat dried film 4 of gas barrier properties is laminated thereon as a second layer to provide a film of superior gas barrier properties, of water resistance and of humidity resistance, which can be flexible enough for the deformation to a certain extent.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、食品、医薬品等の包装
分野に用いられるガスバリア性積層体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas barrier laminate used in the field of packaging foods, pharmaceuticals and the like.

【0002】[0002]

【従来の技術】近年、食品、医薬品等の包装に用いられ
る包装材料は、内容物の変質、とくに食品においては蛋
白質や油脂等の酸化、変質を抑制し、さらに味、鮮度を
保持するために、また無菌状態での取扱いが必要とされ
る医薬品においては有効成分の変質を抑制し、効能を維
持するために、包装材料を透過する酸素、水蒸気、その
他内容物を変質させる気体による影響を防止する必要が
あり、これら気体(ガス)を遮断するガスバリア性を備
えることが求められている。
2. Description of the Related Art In recent years, packaging materials used for packaging foods, pharmaceuticals, etc. are used to suppress deterioration of contents, particularly oxidation and deterioration of proteins, fats and oils in foods, and to maintain taste and freshness. In addition, in the case of pharmaceuticals that require aseptic handling, the effects of oxygen, water vapor and other gases that permeate the packaging material are prevented in order to prevent deterioration of the active ingredient and maintain efficacy. Therefore, it is required to have a gas barrier property of blocking these gases.

【0003】そのため、従来からポリビニルアルコール
(以下、PVAとする)、エチレンビニルアルコール共
重合体(EVOH)、或いはポリ塩化ビニリデン樹脂
(以下、PVDCとする)など一般にガスバリア性が比
較的高いと言われる高分子樹脂組成物をラミネート又は
コーティングによりガスバリア性積層体として包装材料
に用いた包装フィルムが一般的に使用されてきた。ま
た、適当な高分子樹脂組成物(単独では、高いガスバリ
ア性を有していない樹脂であっても)にAlなどの金属
又は金属化合物を蒸着した金属蒸着フィルムや最近では
一酸化珪素(SiO)などの珪素酸化物(SiOX )薄
膜、酸化マグネシウム(MgO)薄膜を透明性を有する
高分子材料からなる基材上に蒸着などの形成手段により
形成された蒸着フィルムが開発されており、これらは高
分子樹脂組成物からなるガスバリア材より優れたガスバ
リア特性を有しており、高湿度下での劣化も少なく、包
装材料に用いた包装フィルムが一般的に使用され始めて
いる。
Therefore, conventionally, it is generally said that polyvinyl alcohol (hereinafter referred to as PVA), ethylene vinyl alcohol copolymer (EVOH), polyvinylidene chloride resin (hereinafter referred to as PVDC), etc. has relatively high gas barrier properties. A packaging film used as a packaging material as a gas barrier laminate by laminating or coating a polymer resin composition has been generally used. In addition, a metal-deposited film obtained by vapor-depositing a metal or a metal compound such as Al on a suitable polymer resin composition (even a resin that does not have a high gas barrier property alone), and recently silicon monoxide (SiO) Vapor-deposited films formed by forming means such as vapor-deposition of a silicon oxide (SiO x ) thin film and a magnesium oxide (MgO) thin film on a substrate made of a transparent polymer material have been developed. It has superior gas barrier properties to a gas barrier material composed of a polymer resin composition, is less likely to deteriorate under high humidity, and packaging films used as packaging materials have begun to be generally used.

【0004】[0004]

【発明が解決しようとする課題】ところが、上述のPV
A、EVOH系の高分子樹脂組成物を用いてなるガスバ
リア性積層体は、温度依存性及び湿度依存性が大きいた
め、高温又は高湿下においてガスバリア性の低下が見ら
れ、とくに水蒸気バリア性がなく、包装の用途によって
は煮沸処理やレトルト処理を行うとガスバリア性が著し
く低下することがある。またPVDC系の高分子樹脂組
成物を用いてなるガスバリア性積層体は、湿度依存性は
小さいが、酸素バリア性を1cm3 /m2 ・day・a
tm以下とする高ガスバリア材(ハイガスバリア材)を
実現することは、困難であるという問題がある。また被
膜中に塩素を多量に含むため、焼却処理やリサイクリン
グなど廃棄物処理の面で問題がある。
However, the PV described above is used.
Since the gas barrier laminate using the A and EVOH-based polymer resin compositions has large temperature dependence and humidity dependence, the gas barrier properties are deteriorated at high temperature or high humidity, and particularly the water vapor barrier property is exhibited. However, depending on the application of the packaging, the gas barrier property may be significantly lowered when the boiling treatment or the retort treatment is performed. A gas barrier laminate using a PVDC-based polymer resin composition has a small humidity dependency, but has an oxygen barrier property of 1 cm 3 / m 2 · day · a.
It is difficult to realize a high gas barrier material (high gas barrier material) of tm or less. In addition, since the coating contains a large amount of chlorine, there is a problem in terms of waste treatment such as incineration and recycling.

【0005】さらに上述の金属又は金属化合物を蒸着し
た金属蒸着フィルムや一酸化珪素(SiO)などの珪素
酸化物薄膜、酸化マグネシウム(MgO)薄膜を蒸着し
た蒸着フィルムは、ガスバリア層に用いられる無機化合
物の薄膜が可撓性に欠けており、揉みや折り曲げに弱
く、また基材との密着性が悪いため、取り扱いに注意を
要し、とくに印刷、ラミネート、製袋など包装材料の後
加工の際に、クラックを発生しガスバリア性が著しく低
下する問題がある。また、形成方法に真空蒸着法、スパ
ッタリング法、プラズマ化学気相成長法などの真空プロ
セスを用いて形成するため、装置が高価であり、また形
成工程において局部的に高温となり、基材に損傷を生じ
たり、低分子量部或いは可塑剤などの添加剤部などの分
解、脱ガスなどを起因とする無機薄膜中に欠陥、ピンホ
ール等を発生することがあり、高いガスバリア性を達成
できないこと、コスト的に高価となるという問題を有し
ている。
Further, the above-mentioned metal vapor-deposited film vapor-deposited with a metal or metal compound, silicon oxide thin film such as silicon monoxide (SiO), vapor-deposited film magnesium oxide (MgO) thin film are inorganic compounds used for gas barrier layers. The film is lacking in flexibility, is weak against rubbing and bending, and has poor adhesion to the base material, so care must be taken when handling it, especially when post-processing packaging materials such as printing, laminating and bag making. In addition, there is a problem that cracks are generated and the gas barrier property is significantly deteriorated. Further, since the forming method is performed by using a vacuum process such as a vacuum vapor deposition method, a sputtering method, and a plasma chemical vapor deposition method, the apparatus is expensive, and the temperature becomes high locally at the forming step, which may damage the base material. In some cases, defects, pinholes, etc. may occur in the inorganic thin film due to decomposition or degassing of low molecular weight parts or additive parts such as plasticizers, etc., high gas barrier property cannot be achieved, cost There is a problem that it becomes expensive.

【0006】そのため、上記問題に対して、特開昭62
−295931号公報に記載されるように、基材に金属
アルコキシドの被膜を形成してなるガスバリア材が提案
されている。このガスバリア材は、ある程度の可撓性を
有するとともに、液相コーティング法による製造ができ
るため、コスト的にも安価とすることができる。
Therefore, in order to solve the above problems, Japanese Patent Laid-Open No. 62-62
As described in JP-A-295931, a gas barrier material has been proposed in which a metal alkoxide coating film is formed on a base material. Since this gas barrier material has a certain degree of flexibility and can be manufactured by the liquid phase coating method, the cost can be reduced.

【0007】しかしながら、上記ガスバリア材は、基材
単体の場合に比べて、ガスバリア性が向上すると言える
が、絶対的なガスバリア性を有するとは言えないもので
あった。
However, although the gas barrier material can be said to have an improved gas barrier property as compared with the case where the base material alone is used, it cannot be said to have an absolute gas barrier property.

【0008】さらに、特開平5−9317号公報に記載
されるように、ガスバリア性の付与された樹脂成形品の
製造方法として、基材に酸化珪素(SiOX )の蒸着薄
膜を形成し、その蒸着薄膜上にSiO2 粒子と水溶性樹
脂あるいは水性エマルジョンの混合溶液をコーティング
した後、乾燥する方法が提案されている。この製造方法
による樹脂成形品は、外部応力による変形の際に、Si
X 蒸着薄膜上にコーティングされたSiO2 粒子と樹
脂との混合層がSiOX 蒸着薄膜に生じるマイクロクラ
ックの広がりを抑え、クラック部位を保護することによ
り、ガスバリア性の低下を抑制することができるもので
ある。しかしながら、この構成からなる樹脂成形品は、
SiOX 蒸着薄膜に生じるマイクロクラックの広がりを
抑え、ガスバリア性の低下を抑制するのみであり、その
効果は単なる蒸着薄膜の保護層としての役割に過ぎな
い。上記構成の樹脂成形品のガスバリア性は蒸着層の上
に形成されるコーティング層が単なるSiO2 粒子と樹
脂の混合被膜であるため、基材に単に蒸着薄膜を形成し
た蒸着フィルムのガスバリア性を示す程度であり、より
高いガスバリア性を得ることは不可能であった。
Further, as described in JP-A-5-9317, as a method for producing a resin molded product having a gas barrier property, a vapor-deposited thin film of silicon oxide (SiO x ) is formed on a substrate, and A method has been proposed in which a vapor-deposited thin film is coated with a mixed solution of SiO 2 particles and a water-soluble resin or an aqueous emulsion and then dried. The resin molded product produced by this manufacturing method is
A mixed layer of SiO 2 particles and a resin coated on the O X vapor-deposited thin film suppresses the spread of microcracks generated in the SiO X vapor-deposited thin film and protects the cracked portion, thereby suppressing the deterioration of the gas barrier property. It is a thing. However, the resin molded product with this configuration is
It only suppresses the spread of microcracks generated in the SiO x evaporated thin film and suppresses the deterioration of the gas barrier property, and the effect is merely a role as a protective layer of the evaporated thin film. The gas-barrier property of the resin molded product having the above-mentioned configuration shows the gas-barrier property of a vapor-deposited film in which a vapor-deposited thin film is simply formed on a substrate because the coating layer formed on the vapor-deposited layer is a simple mixed coating of SiO 2 particles and resin However, it was impossible to obtain a higher gas barrier property.

【0009】そこで、本発明は、可撓性を有するととも
に酸素、水蒸気などに対するガスバリア性に優れ、耐熱
性、耐湿性、耐水性を有し、かつ製造が容易なガスバリ
ア性積層フィルムを提供することを目的とする。
Therefore, the present invention provides a gas barrier laminate film which is flexible and has an excellent gas barrier property against oxygen, water vapor and the like, has heat resistance, moisture resistance and water resistance and is easy to manufacture. With the goal.

【0010】[0010]

【課題を解決するための手段】請求項1記載の発明は、
高分子樹脂組成物からなる基材上に、無機化合物からな
る蒸着層を第1層とし、水溶性高分子と、(a)1種以
上の金属アルコキシド及びその加水分解物又は(b)塩
化錫の少なくとも一方を含む水溶液、或いは水/アルコ
ール混合溶液を主剤とするコーティング剤を塗布し、加
熱乾燥してなるガスバリア性被膜を第2層として積層し
てなることを特徴とするガスバリア性積層フィルムであ
る。
The invention according to claim 1 is
A vapor deposition layer made of an inorganic compound is used as a first layer on a base material made of a polymer resin composition, and a water-soluble polymer, (a) one or more metal alkoxides and hydrolysates thereof, or (b) tin chloride. A gas-barrier laminated film, characterized by comprising a second layer of a gas-barrier coating formed by applying a coating agent containing an aqueous solution containing at least one of is there.

【0011】請求項2に記載の発明は、請求項1記載の
発明に基づき、水溶性高分子がポリビニルアルコールで
あることを特徴とする請求項1記載のガスバリア性積層
フィルムである
The invention according to claim 2 is the gas barrier laminated film according to claim 1, wherein the water-soluble polymer is polyvinyl alcohol based on the invention according to claim 1.

【0012】請求項3に記載の発明は、請求項1記載の
発明に基づき、金属アルコキシドは、テトラエトキシシ
ラン又はトリイソプロポキシアルミニウム、或いはそれ
らの混合物であることを特徴とするガスバリア性積層フ
ィルムである。
The invention according to claim 3 is based on the invention according to claim 1, wherein the metal alkoxide is tetraethoxysilane or triisopropoxyaluminum, or a mixture thereof, in a gas barrier laminate film. is there.

【0013】請求項4に記載の発明は、請求項1記載の
発明に基づき、無機化合物からなる蒸着層が酸化アルミ
ニウム、酸化マグネシウム、酸化スズ、酸化珪素の何れ
かであることを特徴とするガスバリア性積層フィルムで
ある。
The invention according to claim 4 is based on the invention according to claim 1, characterized in that the vapor deposition layer comprising an inorganic compound is any one of aluminum oxide, magnesium oxide, tin oxide and silicon oxide. Laminated film.

【0014】[0014]

【作用】本発明によれば、高分子樹脂組成物からなる基
材上に、無機化合物からなる蒸着層を第1層とし、水溶
性高分子と、(a)1種以上の金属アルコキシド及びそ
の加水分解物又は(b)塩化錫の少なくとも一方を含む
水溶液、或いは水/アルコール混合溶液を主剤とするコ
ーティング剤を塗布し、加熱乾燥してなるガスバリア性
被膜を第2層として積層してなることにより、第2層が
反応性に富む無機成分を含有し、水溶性高分子との複合
被膜がガスバリア性に優れることから第1層と第2層と
の界面に両層の反応層を生じるか、或いは第2層が第1
層に生じるピンホール、クラック、粒界などの欠陥或い
は微細孔を充填、補強することで、緻密構造が形成され
るため、高いガスバリア性、耐水性、耐湿性を有すると
ともに、変形に耐えられる可撓性を有する。
According to the present invention, a vapor deposition layer made of an inorganic compound is used as a first layer on a substrate made of a polymer resin composition, a water-soluble polymer, and (a) one or more metal alkoxides and A gas barrier coating formed by applying a coating agent containing an aqueous solution containing at least one of a hydrolyzate or (b) tin chloride or a water / alcohol mixed solution as a main component and heating and drying as a second layer. As a result, since the second layer contains a highly reactive inorganic component and the composite coating with the water-soluble polymer has excellent gas barrier properties, will both reaction layers be formed at the interface between the first layer and the second layer? , Or the second layer is the first
By filling and reinforcing pinholes, cracks, grain boundaries, and other defects or micropores that occur in the layer, a dense structure is formed, so it has high gas barrier properties, water resistance, moisture resistance, and can withstand deformation. It has flexibility.

【0015】[0015]

【実施例】本発明の一実施例を詳細に説明する。図1は
本発明のガスバリア性積層体の構成を説明する概略図で
ある。
EXAMPLE An example of the present invention will be described in detail. FIG. 1 is a schematic diagram illustrating the structure of the gas barrier laminate of the present invention.

【0016】図1において、1はガスバリア性積層体あ
り、基材2、第1層である無機蒸着層3、第2層である
ガスバリア性被膜層4である。基材2は、シート状また
はフィルム状のものであって、ポリオレフィン(ポリエ
チレン、ポリプロピレン等)、ポリエステル(ポリエチ
レンテレフタレート、ポリブチレンテレフタレート、ポ
リエチレンナフタレート等)、ポリアミド(ネイロン−
6、ナイロン−66等)、ポリ塩化ビニル、ポリイミド
など、或いはこれら高分子の共重合体など通常包装材料
として用いられるものが使用できる。基材は用途に応じ
て上記材料から適宜選択される。
In FIG. 1, reference numeral 1 denotes a gas barrier laminate, which is a substrate 2, an inorganic vapor deposition layer 3 as a first layer, and a gas barrier coating layer 4 as a second layer. The substrate 2 is in the form of a sheet or a film, and is made of polyolefin (polyethylene, polypropylene, etc.), polyester (polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, etc.), polyamide (Nelon-
6, nylon-66, etc.), polyvinyl chloride, polyimide, etc., or those commonly used as packaging materials such as copolymers of these polymers can be used. The base material is appropriately selected from the above materials according to the application.

【0017】この基材2に用いられる高分子樹脂材料
に、例えば帯電防止剤、紫外線吸収剤、可塑剤、滑剤、
着色剤など公知の添加剤を加えることができ、必要に応
じて適宜添加される。
The polymer resin material used for the base material 2 includes, for example, an antistatic agent, an ultraviolet absorber, a plasticizer, a lubricant,
Known additives such as colorants can be added, and they are appropriately added as necessary.

【0018】さらに基材2の表面をコロナ処理、アンカ
ーコート処理等の表面改質を行い、被膜の密着性を向上
させることも可能である。
Further, the surface of the substrate 2 may be subjected to surface modification such as corona treatment and anchor coat treatment to improve the adhesion of the coating.

【0019】第1層である無機蒸着層3は、珪素、アル
ミニウム、チタン、ジルコニウム、錫、マグネシウムな
どの酸化物、窒化物、弗化物の単体、或いはそれらの複
合物からなり、真空蒸着法、スパッタリング法、プラズ
マ気相成長法(CVD法)などの真空プロセスにより形
成される。とくに酸化アルミニウムは、無色透明であ
り、ボイル・レトルト耐性等の特性にも優れており、広
範囲の用途に用いることができる。
The first inorganic vapor deposition layer 3 is made of oxides, nitrides or fluorides of silicon, aluminum, titanium, zirconium, tin, magnesium or the like, or a composite thereof, and is vacuum deposited. It is formed by a vacuum process such as a sputtering method or a plasma vapor deposition method (CVD method). In particular, aluminum oxide is colorless and transparent and has excellent characteristics such as resistance to boiling and retort, and can be used in a wide range of applications.

【0020】無機蒸着層3の膜厚は、用途や第2層の膜
厚によって異なるが、数十Åから5000Åの範囲が望
ましいが、50Å以下では薄膜の連続性に問題があり、
また3000Åを越えるとクラックが発生しやすく、可
撓性が低下するため、好ましくは50〜3000Åであ
る。
The thickness of the inorganic vapor-deposited layer 3 varies depending on the application and the thickness of the second layer, but is preferably in the range of several tens Å to 5,000 Å, but below 50 Å there is a problem with the thin film continuity.
Further, when it exceeds 3000 Å, cracks are likely to occur and flexibility is lowered, so that it is preferably 50 to 3000 Å.

【0021】第2層であるガスバリア性被膜層4は、水
溶性高分子と、(a)1種以上の金属アルコキシド及び
その加水分解物又は(b)塩化錫の少なくとも一方を含
む水溶液、或いは水/アルコール混合溶液を主剤とする
コーティング剤からなる。水溶性高分子と塩化錫を水系
(水或いは水/アルコール混合)溶媒で溶解させた溶
液、或いはこれに金属アルコキシドを直接、或いは予め
加水分解させるなど処理を行ったものを混合した溶液を
基材2上の無機薄膜層3にコーティング、加熱乾燥し、
形成したものである。コーティング剤に含まれる各成分
について以下に詳述する。
The gas barrier coating layer 4, which is the second layer, is an aqueous solution containing a water-soluble polymer and at least one of (a) at least one metal alkoxide and its hydrolyzate or (b) tin chloride, or water. / Coating agent consisting mainly of alcohol solution. The base material is a solution in which a water-soluble polymer and tin chloride are dissolved in a water-based (water or water / alcohol mixed) solvent, or a solution in which a metal alkoxide is directly or previously hydrolyzed. 2 is coated on the inorganic thin film layer 3, heated and dried,
It was formed. Each component contained in the coating agent will be described in detail below.

【0022】本発明でコーティング剤に用いられる水溶
性高分子はポリビニルアルコール、ポリビニルピロリド
ン、デンプン、メチルセルロース、カルボキシメチルセ
ルロース、アルギン酸ナトリウムなどが挙げられる、と
くにポリビニルアルコール(以下、PVAとする)を本
発明のガスバリア性積層体のコーティング剤に用いた場
合にガスバリア性が最も優れる。ここでいうPVAは、
一般にポリ酢酸ビニルをけん化して得られるもので、酢
酸基が数十%残存している、いわゆる部分けん化PVA
から酢酸基が数%しか残存していない完全けん化PVA
までを含み、とくに限定されるものではない。
The water-soluble polymer used in the coating agent of the present invention includes polyvinyl alcohol, polyvinylpyrrolidone, starch, methyl cellulose, carboxymethyl cellulose, sodium alginate, etc. In particular, polyvinyl alcohol (hereinafter referred to as PVA) is used in the present invention. The gas barrier property is most excellent when used as a coating agent for a gas barrier laminate. PVA here is
Generally obtained by saponification of polyvinyl acetate, so-called partially saponified PVA in which several tens% of acetic acid groups remain.
Saponified PVA with only a few percent of acetic acid groups remaining
Up to and including, but not limited to.

【0023】また塩化錫は塩化第一錫(SnCl2 )、
塩化第二錫(SnCl4 )、或いはそれらの混合物であ
ってもよく、無水物でも水和物でも用いることができ
る。
Further, tin chloride is stannous chloride (SnCl 2 ),
It may be stannic chloride (SnCl 4 ), or a mixture thereof, and either anhydrous or hydrated can be used.

【0024】さらら金属アルコキシドは、テトラエトキ
シシラン〔Si(OC2 5 4 〕、トリイソプロポキ
シアルミニウム〔Al(O−2’−C3 7 3 〕など
の一般式、 M(OR)n (M:Si Ti Ai Zr等の金属, R:CH3
2 5 等のアルキル基)で表せるものである。なかで
もテトラエトキシシラン、トリイソプロポキシアルミニ
ウムが加水分解後、水系の溶媒中において比較的安定で
あるので好ましい。
The metal alkoxide is a general formula such as tetraethoxysilane [Si (OC 2 H 5 ) 4 ] or triisopropoxyaluminum [Al (O-2′-C 3 H 7 ) 3 ], M (OR). n (M: Si Ti Ai Zr or other metal , R: CH 3 ,
And an alkyl group such as C 2 H 5 ). Of these, tetraethoxysilane and triisopropoxyaluminum are preferable because they are relatively stable in an aqueous solvent after hydrolysis.

【0025】上述した各成分を単独またはいくつかを組
み合わせてコーティング剤に加えることができ、さらに
コーティング剤のバリア性を損なわない範囲で、イソシ
アネート化合物、シランカップリング剤、或いは分散
剤、安定化剤、粘度調整剤、着色剤など公知の添加剤を
加えることができる。
Each of the above-mentioned components can be added to the coating agent alone or in combination, and the isocyanate compound, the silane coupling agent, the dispersant or the stabilizer can be added as long as the barrier properties of the coating agent are not impaired. Well-known additives such as a viscosity modifier and a colorant can be added.

【0026】例えばコーティング剤に加えられるイソシ
アネート化合物は、その分子中に2個以上のイソシアネ
ート基(NCO基)を有するものであり、例えばトリレ
ンジイソシアネート(以下、TDIとする)、トリフェ
ニルメタントリイソシアネート(以下、TTIとす
る)、テトラメチルキシレンジイソシアネート(以下、
TMXDIとする)などのモノマー類と、これらの重合
体、誘導体などがある。
For example, the isocyanate compound added to the coating agent has two or more isocyanate groups (NCO groups) in its molecule. For example, tolylene diisocyanate (hereinafter referred to as TDI) and triphenylmethane triisocyanate. (Hereinafter, referred to as TTI), tetramethyl xylene diisocyanate (hereinafter, referred to as TTI)
TMXDI) and their polymers and derivatives.

【0027】コーティング剤の塗布方法には、通常用い
られる、ディッピング法、ロールコーティング法、スク
リーン印刷法、スプレー法など従来公知の手段が用いら
れる。被膜の厚さはコーティング剤の種類によって異な
るが、乾燥後の厚さが約0.01〜100μmの範囲で
あればよいが、50μm以上では、膜にクラックが生じ
やすくなるため、0.01〜50μmとすることが望ま
しい。
As a coating method of the coating agent, conventionally known means such as a dipping method, a roll coating method, a screen printing method and a spraying method which are usually used can be used. Although the thickness of the coating varies depending on the type of coating agent, the thickness after drying may be in the range of about 0.01 to 100 μm. It is desirable to set it to 50 μm.

【0028】なお、詳細は不明なところが多いが、この
第1層としての無機蒸着層3と第2層としての上記コー
ティング剤からなる被膜との間に、何らかの反応層が形
成されるか、或いは第2層が第1層に生じるピンホー
ル、クラック、粒界などの欠陥或いは微細孔を充填、補
強することで、緻密構造が形成され、これがガスバリア
性の向上と第1層である蒸着薄膜層の保護層としての役
割を果たす。またコーティング剤の組成が、金属アルコ
キシド或いは塩化錫からなる無機成分とPVA等の水溶
性高分子を主剤とするものであることから、ガスバリア
性の向上が図れるものである。すなわち金属アルコキシ
ド或いは塩化錫からなる無機成分は溶液中で加水分解、
重縮合反応して鎖状或いは三次元樹枝状のポリマーを形
成し、乾燥加熱にともなう溶媒の蒸発によってさらに重
合が進行する、反応性に富む無機成分であり、水溶性高
分子とは分子レベルの複合体を形成していると考えられ
る。したがって、特定の粒子径からなるシリカ(SiO
2 )などの微粒子や珪酸ソーダ(水ガラス)から得られ
るシリカゾル(コロイダルシリカ)など単に微粒子を分
散したものとは異なるものである。
Although the details are often unclear, some kind of reaction layer is formed between the inorganic vapor-deposited layer 3 as the first layer and the coating film made of the coating agent as the second layer, or The second layer fills and reinforces defects or fine pores such as pinholes, cracks, and grain boundaries generated in the first layer to form a dense structure, which improves the gas barrier property and is a vapor deposition thin film layer that is the first layer. Plays the role of a protective layer. Moreover, since the composition of the coating agent is mainly composed of an inorganic component composed of a metal alkoxide or tin chloride and a water-soluble polymer such as PVA, the gas barrier property can be improved. That is, an inorganic component composed of metal alkoxide or tin chloride is hydrolyzed in a solution,
A polycondensation reaction is performed to form a chain-like or three-dimensional dendritic polymer, and the polymerization proceeds further by evaporation of the solvent accompanied by drying and heating. It is a highly reactive inorganic component. It is considered to form a complex. Therefore, silica (SiO 2) having a specific particle size is used.
2 ) and other fine particles, and silica sol (colloidal silica) obtained from sodium silicate (water glass) are simply different from those in which fine particles are dispersed.

【0029】さらに本発明のガスバリア性積層体上に
は、必要に応じてヒートシール可能な熱可塑性樹脂層、
印刷層をガスバリア性被膜層上または基材2上に積層す
ることができ、また複数の樹脂を接着層を介して積層す
ることも可能である。
Further, on the gas barrier laminate of the present invention, a thermoplastic resin layer capable of being heat-sealed, if necessary,
The printing layer can be laminated on the gas barrier coating layer or the substrate 2, and it is also possible to laminate a plurality of resins via an adhesive layer.

【0030】本発明のガスバリア性積層体を具体的な実
施例を挙げて説明する。
The gas barrier laminate of the present invention will be described with reference to specific examples.

【0031】〔実施例1〕厚さ12μmのポリエチレン
テレフタレート(以下、PETとする)を基材とし、そ
の上面にSiO(酸化珪素)を蒸着源とし、電子線加熱
方式による真空蒸着法により、膜厚400Åの薄膜層を
形成し、さらに下記組成を組み合わせ、所定の割合に混
合してなるコーティング剤をバーコーターにより塗布し
乾燥機で120℃、1分間乾燥させ、膜厚約0.3μm
の被膜を形成しガスバリア性積層体を得た。
Example 1 A film was formed by a vacuum evaporation method using an electron beam heating method, using a substrate of polyethylene terephthalate (hereinafter referred to as PET) having a thickness of 12 μm, and using SiO (silicon oxide) as an evaporation source on its upper surface. A thin film layer with a thickness of 400Å is formed, and the coating composition prepared by combining the following compositions and mixing in a predetermined ratio is applied by a bar coater and dried at 120 ° C for 1 minute to give a film thickness of about 0.3 μm.
Was formed to obtain a gas barrier laminate.

【0032】(コーティング剤の成分) (A)テトラエトキシシラン〔Si(OC2 5 4
以下、TEOSとする〕10.4gに塩酸(0.1N)
89.6gを加え、30分間攪拌し加水分解させた固形
分3wt%(SiO2 換算)の加水分解溶液。 (B)トリイソプロポキシアルミニウム〔Al(O−
2’−C3 7 3 :以下、TPAとする〕6.0gを
80℃の熱水90g中で溶解した後、塩酸(5N)4g
を添加し解膠させた固形分3wt%(Al2 3 換算)
の加水分解溶液 (C)塩化第一錫(無水物)の3wt%の水/エタノー
ル溶液(水:エタノール重量比で50:50) (D)塩化第二錫(無水物)の3wt%の水溶液 (E)ポリビニルアルコールの3.0wt%水/イソプ
ロピルアルコール溶液(水:イソプロピルアルコール重
量比で90:10) (F)ポリビニルピロリドンの3wt%の水/エタノー
ル溶液(水:エタノール重量比で50:50) (G)水性グラビアインキ(アクリル系) 水性ビヒク
ルのみ使用。アクリル樹脂固形分10wt%水/エタノ
ール溶液(水:エタノール重量比50:50) (H)シリカ微粒子(平均粒径0.1μm)の3.0w
t%水分散液 (I)シリカゾル(日産化学工業社製 商品名: スノ
ーテックス)を水で希釈した3.0wt%シリカゾル溶
(Component of Coating Agent) (A) Tetraethoxysilane [Si (OC 2 H 5 ) 4 :
Hereinafter referred to as TEOS] 10.4 g of hydrochloric acid (0.1 N)
A hydrolyzed solution having a solid content of 3 wt% (converted to SiO 2 ) obtained by adding 89.6 g and stirring for 30 minutes to hydrolyze. (B) Triisopropoxy aluminum [Al (O-
2′-C 3 H 7 ) 3 : hereinafter referred to as TPA] 6.0 g was dissolved in 90 g of hot water at 80 ° C., and then 4 g of hydrochloric acid (5N) was added.
3% by weight of solid content obtained by adding and deflocculating (as Al 2 O 3 )
Hydrolysis solution of (C) Stannous chloride (anhydrous) 3 wt% water / ethanol solution (water: ethanol weight ratio 50:50) (D) Stannous chloride (anhydrous) 3 wt% aqueous solution (E) 3.0 wt% polyvinyl alcohol water / isopropyl alcohol solution (water: isopropyl alcohol weight ratio 90:10) (F) Polyvinylpyrrolidone 3 wt% water / ethanol solution (water: ethanol weight ratio 50:50 ) (G) Water-based gravure ink (acrylic) Only water-based vehicle is used. Acrylic resin solid content 10 wt% water / ethanol solution (water: ethanol weight ratio 50:50) (H) 3.0 w of silica fine particles (average particle size 0.1 μm)
t% aqueous dispersion (I) 3.0 wt% silica sol solution obtained by diluting silica sol (trade name: Snowtex, manufactured by Nissan Chemical Industries, Ltd.) with water.

【0033】 (コーティング剤の組成) 実施例 No.1 (A)/(E) 配合比(wt%)60/40 実施例 No.2 (A)/(B)/(F)配合比(wt%)50/10/40 実施例 No.3 (C)/(E) 配合比(wt%)60/40 実施例 No.4 (A)/(C)/(E)配合比(wt%)40/30/30 実施例 No.5 (A)/(D)/(E)配合比(wt%)40/30/30 比較例 No.6 コーティング無し 配合比(wt%) 比較例 No.7 (E) 配合比(wt%) 100 比較例 No.8 (F) 配合比(wt%) 100 比較例 No.9 (G) 配合比(wt%) 100 比較例 No.10(H)/(E) 配合比(wt%)60/40 比較例 No.11(I)/(E) 配合比(wt%)60/40 (Composition of Coating Agent) Example No. 1 (A) / (E) Compounding ratio (wt%) 60/40 Example No. 2 (A) / (B) / (F) compounding ratio (wt%) 50/10/40 Example No. 3 (C) / (E) Compounding ratio (wt%) 60/40 Example No. 4 (A) / (C) / (E) compounding ratio (wt%) 40/30/30 Example No. 5 (A) / (D) / (E) compounding ratio (wt%) 40/30/30 Comparative Example No. 6 No coating Compounding ratio (wt%) Comparative example No. 7 (E) Compounding ratio (wt%) 100 Comparative example No. 8 (F) Compounding ratio (wt%) 100 Comparative example No. 9 (G) Compounding ratio (wt%) 100 Comparative example No. 10 (H) / (E) Compounding ratio (wt%) 60/40 Comparative Example No. 11 (I) / (E) compounding ratio (wt%) 60/40

【0034】得られたガスバリア性積層体を40℃−9
0%RHの恒温恒湿下で4週間保存し、その前後のガス
バリア性を酸素透過度及び水蒸気透過度の測定により評
価した。酸素バリア性を25℃−100%RH雰囲気下
で酸素透過度測定装置(モダンコントロール社製 MO
CON OXTRAN 10/40A)を用いて測定
し、水蒸気バリア性を40℃−90RH雰囲気下で水蒸
気透過度測定装置(モダンコントロール社製 PERM
ATRAN W6)を用いて測定し、その結果を表1に
示す。なお比較例としてコーティングなしの蒸着膜のみ
のフィルムと水溶性高分子のみの被膜及び水性インキの
みの被膜からなる積層フィルム、金属アルコキシドの代
わりにシリカ微粒子、或いはシリカゾルを用いた水溶性
樹脂との混合被膜からなる積層フィルムを作製し同様に
測定評価した。
The gas barrier laminate thus obtained was placed at 40 ° C.-9.
It was stored under a constant temperature and humidity of 0% RH for 4 weeks, and the gas barrier properties before and after the storage were evaluated by measuring oxygen permeability and water vapor permeability. Oxygen barrier property was measured under an atmosphere of 25 ° C and 100% RH.
CON OXTRAN 10 / 40A) to measure the water vapor barrier property in an atmosphere of 40 ° C.-90 RH (Perrm made by Modern Control Co., Ltd.).
Measurement was performed using ATRAN W6), and the results are shown in Table 1. As a comparative example, a laminated film consisting of a film only of a vapor-deposited film without coating and a film of only a water-soluble polymer and a film of only an aqueous ink, silica fine particles instead of metal alkoxide, or a mixture with a water-soluble resin using silica sol A laminated film made of a coating film was produced and similarly evaluated.

【0035】[0035]

【表1】 [Table 1]

【0036】これらから蒸着フィルムにコーティング剤
を塗布したもの(No.1〜5)は酸素バリア性及び水
蒸気バリア性はともに、コーティング無しのNo.6に
比べ高く、高ガスバリア性を示した。比較例の水溶性高
分子(No.7、8)及び水性インキ(No.9)はガ
スバリア性が若干向上するが、高湿下保存後にガスバリ
ア性の低下が認められた。さらにシリカ微粒子、或いは
シリカゾルを用いた水溶性樹脂との混合被膜(No.1
0、11)はコーティング無しのNo.6と比べてガス
バリア性の向上はほとんど見られず、本発明のガスバリ
ア性積層フィルムのアルコキシドを用いた場合に比べ劣
っており、明らかに構成による相違を示している。
The vapor-deposited films coated with a coating agent (Nos. 1 to 5) have oxygen barrier properties and water vapor barrier properties, and have no coating properties. It was higher than that of No. 6 and showed a high gas barrier property. The water-soluble polymers (Nos. 7 and 8) and the water-based ink (No. 9) of Comparative Examples had slightly improved gas barrier properties, but a decrease in gas barrier properties was observed after storage under high humidity. Further, a mixed film of silica fine particles or a water-soluble resin using silica sol (No. 1)
Nos. 0 and 11) have no coating. Compared with No. 6, almost no improvement in gas barrier property was observed, which was inferior to the case of using the alkoxide of the gas barrier laminate film of the present invention, and clearly shows a difference due to the constitution.

【0037】〔実施例2〕実施例1のNo.1、No.
4、No.6、No.9の積層フィルムのコーティング
面を接着面としてポリオール−イソシアネート系接着剤
にて未延伸ポリプロピレン(CPP、30μm)フィル
ムと接着しラミネートフィルムを作製しガスバリア性積
層体を得た。酸素透過度及び水蒸気透過度の測定と接着
強度の測定を行い評価した。接着強度の測定は、15m
m幅、T字剥離、300mm/minの条件で行った。
その結果を表2に示す。なお比較例として、蒸着膜を施
されていないPETフィルムにコーティングし膜厚0.
3μmの被膜を形成した積層フィルムについても同様に
測定評価した。
Example 2 No. 1 of Example 1 1, No.
4, No. 6, No. The laminated film of No. 9 was bonded to an unstretched polypropylene (CPP, 30 μm) film with a polyol-isocyanate adhesive as the adhesive surface to obtain a gas barrier laminate. The oxygen permeability and water vapor permeability and the adhesive strength were measured and evaluated. Adhesive strength is measured at 15m
The measurement was performed under the conditions of m width, T-shaped peeling, and 300 mm / min.
The results are shown in Table 2. As a comparative example, a PET film having no vapor-deposited film was coated to a film thickness of 0.
The laminated film having a film of 3 μm formed thereon was also measured and evaluated in the same manner.

【0038】[0038]

【表2】 [Table 2]

【0039】これによれば、本発明のコーティング被膜
は第1層である蒸着膜が施されていなくても、酸素バリ
ア性に優れるものの水蒸気バリア性が低い。基材に蒸着
膜を設けることで、各々単体では得られない高い酸素バ
リア性及び水蒸気バリア性を得ることができた。また接
着強度は蒸着膜無しのフィルムに比べ、著しく向上し
た。
According to this, the coating film of the present invention is excellent in oxygen barrier property but low in water vapor barrier property even if the vapor deposition film as the first layer is not applied. By providing the vapor-deposited film on the base material, it was possible to obtain high oxygen barrier properties and water vapor barrier properties that cannot be obtained by a single substance. Also, the adhesive strength was significantly improved as compared with the film without the vapor deposition film.

【0040】〔実施例3〕実施例2のNo.13、N
o.16、No.18にCPPをラミネートした積層フ
ィルムを引張試験機を用いて所定伸率引張り試験を行っ
た後、酸素透過度、水蒸気透過度の測定及び可撓性の評
価を行った。その結果を表3に示す。
[Embodiment 3] No. 2 of Embodiment 2. 13, N
o. 16, No. A laminated film obtained by laminating CPP on 18 was subjected to a predetermined elongation tensile test using a tensile tester, and then oxygen permeability and water vapor permeability were measured and flexibility was evaluated. The results are shown in Table 3.

【0041】[0041]

【表3】 [Table 3]

【0042】比較例の蒸着膜のみのフィルム(No.1
6)は数%の伸びで引っ張りによる変形に耐えられず膜
にクラックを生じ、ガスバリア性が著しく低下したが、
本発明のガスバリア性積層フィルム(No.13)は1
0%程度まではほとんど劣化が認められず、その後の引
っ張りによる変形によってもその劣化は少なく、比較例
の蒸着膜単体の積層フィルムに比べてかなりの可撓性を
有している。さらに比較例の水性グラビアインキの積層
フィルム(No.18)も数%の伸びで引っ張りによる
変形が始まり、多少の劣化の抑制が認められるもののそ
の効果は僅かである。
A film having only a vapor-deposited film of the comparative example (No. 1)
In the case of 6), the film could not withstand deformation due to pulling due to elongation of several percent and cracked in the film, and the gas barrier property was significantly lowered.
The gas barrier laminate film (No. 13) of the present invention is 1
Almost no deterioration was observed up to about 0%, and the deterioration due to subsequent deformation due to tension was small, and it was considerably more flexible than the laminated film of the vapor deposition film of the comparative example. Further, the laminated film (No. 18) of the water-based gravure ink of the comparative example also starts to be deformed by pulling at an elongation of several%, and although some deterioration can be suppressed, its effect is slight.

【0043】〔実施例4〕PETフィルム(12μm)
を基材として、その片面にAl2 3 、SnO2、Mg
Oを蒸着源として電子線加熱方式により真空蒸着法によ
り、膜厚400Åの薄膜層を形成し、さらにこの薄膜層
上に実施例1のNo.4のコーティング剤を用いて、実
施例1と同様に被膜を形成し、酸素透過度及び水蒸気透
過度の測定評価を行った。なお比較例としてコーティン
グ無しのものを同様に測定評価した。その結果を表4に
示す。
Example 4 PET film (12 μm)
With Al 2 O 3 , SnO 2 , Mg on one side
A thin film layer having a film thickness of 400 Å was formed by a vacuum evaporation method using an electron beam heating method using O as an evaporation source, and No. 1 of Example 1 was formed on the thin film layer. A coating film was formed in the same manner as in Example 1 using the coating agent of No. 4, and the oxygen permeability and water vapor permeability were measured and evaluated. As a comparative example, the one without coating was similarly measured and evaluated. The results are shown in Table 4.

【0044】[0044]

【表4】 [Table 4]

【0045】この結果から、Al2 3 、SnO2 、M
gOからなる蒸着薄膜層上に形成されるコーティング剤
を用いた被膜(コーティング)によるガスバリア性の著
しい向上を示すことから、本発明の構成からなるガスバ
リア性積層フィルムの被膜による効果は明らかである。
From these results, Al 2 O 3 , SnO 2 , M
Since the gas barrier property is remarkably improved by the coating using the coating agent formed on the vapor-deposited thin film layer made of gO, the effect of the coating of the gas barrier laminate film having the constitution of the present invention is clear.

【0046】〔実施例5〕PETフィルム(12μm)
を基材として、実施例1および4と同様に、その片面に
SiO、Al2 3 を蒸着源として電子線加熱方式によ
り真空蒸着法により、膜厚400Åの薄膜層を形成し、
この薄膜層上に実施例1のNo.4のコーティング剤を
用いて、実施例1と同様に被膜を形成した。さらにポリ
オール−イソシアネート系接着剤によりCCPフィルム
(60μm)を接着しラミネートフィルムを作製しガス
バリア性積層フィルムを得た。このラミネートフィルム
を用いて、200mm×150mmのパウチを作製し、
内容物として水200ccを封入した。これをレトルト
処理(120℃−20min)し、処理前後の酸素透過
度の測定及びラミネート強度の評価を行った。なお比較
例としてコーティング無しのものを同様に測定評価し
た。その結果を表5に示す。
Example 5 PET film (12 μm)
As a base material, in the same manner as in Examples 1 and 4, a thin film layer having a film thickness of 400 Å is formed on one surface of the same by vacuum evaporation using an electron beam heating method using SiO and Al 2 O 3 as evaporation sources.
No. 1 of Example 1 was formed on this thin film layer. A coating film was formed in the same manner as in Example 1 by using the coating agent of No. 4. Further, a CCP film (60 μm) was adhered with a polyol-isocyanate adhesive to prepare a laminated film, and a gas barrier laminated film was obtained. Using this laminated film, a pouch of 200 mm x 150 mm is prepared,
200 cc of water was enclosed as the content. This was subjected to a retort treatment (120 ° C.-20 min), and the oxygen permeability before and after the treatment was measured and the laminate strength was evaluated. As a comparative example, the one without coating was similarly measured and evaluated. The results are shown in Table 5.

【0047】[0047]

【表5】 [Table 5]

【0048】この結果から、蒸着薄膜層上にコーティン
グ剤を用いた被膜を形成した本発明のガスバリア性積層
フィルムは、レトルト処理によるガスバリア性の低下及
び接着強度の劣化が抑制される。
From these results, the gas barrier laminate film of the present invention in which a coating film using a coating agent is formed on the vapor-deposited thin film layer suppresses the deterioration of the gas barrier property and the adhesion strength due to the retort treatment.

【0049】[0049]

【発明の効果】以上述べたように本発明のガスバリア性
積層フィルムは、高分子樹脂組成物からなる基材上に、
無機化合物からなる蒸着層を第1層とし、水溶性高分子
と、(a)1種以上の金属アルコキシド及びその加水分
解物又は(b)塩化錫の少なくとも一方を含む水溶液、
或いは水/アルコール混合溶液を主剤とするコーティン
グ剤を塗布し、加熱乾燥してなるガスバリア性被膜を第
2層として積層してなることにより、高いガスバリア性
を有し、かつ可撓性、ラミネート強度、耐水性、耐湿
性、ボイル・レトルト耐性に優れ、さらに他の樹脂と積
層しても、その強度は十分実用に耐えるものである。す
なわち高温・高湿度雰囲気下においてもガスバリア性を
損なうことなく、食品や医薬品など内容物を劣化させる
ことなく長期保存を可能とするものである。また包装材
料として印刷やラミネート、製袋など後加工においても
ガスバリア性を損なうことがないとする効果を奏する。
As described above, the gas barrier laminate film of the present invention comprises a base material made of a polymer resin composition,
An aqueous solution containing a water-soluble polymer and at least one of (a) one or more metal alkoxides and a hydrolyzate thereof or (b) tin chloride, with a vapor deposition layer made of an inorganic compound as a first layer,
Alternatively, by coating a coating agent containing a water / alcohol mixed solution as a main component and heating and drying it as a second layer, a high gas barrier property is obtained, and flexibility and lamination strength are obtained. It has excellent water resistance, moisture resistance, and boiling / retort resistance, and its strength is sufficient for practical use even when laminated with other resins. That is, it enables long-term storage without impairing the gas barrier property even under a high temperature and high humidity atmosphere and without degrading the contents such as foods and pharmaceuticals. Further, the gas barrier property is not impaired even in post-processing such as printing, laminating and bag making as a packaging material.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のガスバリア性積層フィルムの構成を説
明する概略図である。
FIG. 1 is a schematic diagram illustrating the configuration of a gas barrier laminate film of the present invention.

【符号の説明】[Explanation of symbols]

1 ガスバリア性積層フィルム 2 基材 3 無機蒸着層 4 ガスバリア性被膜層 1 Gas Barrier Laminated Film 2 Base Material 3 Inorganic Vapor Deposition Layer 4 Gas Barrier Coating Layer

───────────────────────────────────────────────────── フロントページの続き (72)発明者 蒲生 美香 東京都台東区台東1丁目5番1号 凸版印 刷株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Mika Gamo 1-5-1 Taito, Taito-ku, Tokyo Inside Toppan Printing Co., Ltd.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】高分子樹脂組成物からなる基材上に、無機
化合物からなる蒸着層を第1層とし、水溶性高分子と、
(a)1種以上の金属アルコキシド及びその加水分解物
又は(b)塩化錫の少なくとも一方を含む水溶液、或い
は水/アルコール混合溶液を主剤とするコーティング剤
を塗布し、加熱乾燥してなるガスバリア性被膜を第2層
として積層してなることを特徴とするガスバリア性積層
フィルム。
1. A substrate comprising a polymer resin composition, a vapor deposition layer comprising an inorganic compound as a first layer, and a water-soluble polymer,
Gas barrier properties obtained by applying a coating agent containing (a) one or more metal alkoxides and / or a hydrolyzate thereof or (b) at least one of tin chloride or a water / alcohol mixed solution as a main component and heating and drying. A gas barrier laminate film, comprising a coating film laminated as a second layer.
【請求項2】前記水溶性高分子がポリビニルアルコール
であることを特徴とする請求項1記載のガスバリア性積
層フィルム。
2. The gas barrier laminate film according to claim 1, wherein the water-soluble polymer is polyvinyl alcohol.
【請求項3】前記金属アルコキシドは、テトラエトキシ
シラン又はトリイソプロポキシアルミニウム、或いはそ
れらの混合物であることを特徴とする請求項1、2記載
のガスバリア性積層フィルム。
3. The gas barrier laminate film according to claim 1, wherein the metal alkoxide is tetraethoxysilane, triisopropoxyaluminum, or a mixture thereof.
【請求項4】前記無機化合物からなる蒸着層が酸化アル
ミニウム、酸化マグネシウム、酸化スズ、酸化珪素の何
れかであることを特徴とする請求項1、2、3記載のガ
スバリア性積層フィルム。
4. The gas barrier laminate film according to claim 1, wherein the vapor deposition layer made of the inorganic compound is any one of aluminum oxide, magnesium oxide, tin oxide and silicon oxide.
JP23494794A 1993-09-30 1994-09-29 Gas barrier laminate film and packaging material using this laminate film Expired - Lifetime JP2790054B2 (en)

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JP5-245443 1993-09-30
JP24544393 1993-09-30
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