JPH0667425B2 - Sewing system - Google Patents

Description

The present invention relates to a sewing system for forming a pattern along a predetermined reference line on a work cloth, and more particularly to a desired area on the work cloth. The present invention relates to a sewing system capable of forming a pattern inside.

[Prior Art] Conventionally, there is known a sewing system for forming a pattern of characters, symbols, etc. on a work cloth along a predetermined reference line, for example, there is a sewing system described in JP-A-58-22090. . The one described in the above publication is configured to form a pattern of characters, symbols, etc. on a work cloth along a predetermined arc curve. The circular arc curve is determined by the operator selecting the origin position and the radius.

[Problems to be Solved by the Invention] However, in the above-described conventional sewing system, in order to form a pattern of characters, symbols, etc. at a desired position on a work cloth, an operator considers to form the pattern. Position
The origin and radius of the arc had to be calculated back from the reference line. However, if the size of the characters, symbols, etc. that make up the pattern changes, or if the length of the pattern is different, it is very difficult for even a skilled worker to perform the above back calculation. It was difficult.

Therefore, workability and productivity are poor, and there is also a problem of defective products due to calculation errors.

In Japanese Patent Laid-Open No. 63-105787, "the sewable range and the occupied range of the stitch pattern to be sewn are visually displayed together"
Although the system was disclosed, the condition for finally forming a stitch pattern within the sewable range is to be determined by the operator repeating the thought and error while observing this display. It could not be determined automatically.

Further, Japanese Patent Laid-Open No. 60-60889 discloses a system in which "the ratio between the reference size of the cycle pattern and the size of the sewing area is determined and the cycle pattern is enlarged / reduced according to this ratio". When the arrangement pattern along the reference line is targeted, it is difficult to simply calculate the ratio, and this technique cannot be applied.

Therefore, the present invention has been made in order to solve the above problems, and employs the following configurations.

[Means for Solving the Problem] That is, the gist of the present invention is to provide a stitch forming means M1 for forming a stitch on a work cloth, including a needle that is moved up and down, as illustrated in FIG. , Moving means M2 for changing the relative positional relationship between the work cloth and the needle, storage means M3 for storing pattern data for forming a predetermined pattern, and arranging the patterns along a predetermined reference line. Pattern arrangement means M4 for correcting calculation of the pattern data stored in the storage means M3, and drive control of the moving means M2 and the stitch forming means M1 based on the pattern data corrected and calculated by the pattern arrangement means M4. In a sewing system that includes a control means M5 and forms a pattern along a predetermined reference line on the work cloth, on the work cloth, a region setting means M6 that sets a region where the pattern is to be formed, and Corrective calculation by pattern arrangement means M4 In the case of forming a pattern based on the result, the decision means M7 which the pattern to determine whether fit in the set area
When the judgment means M7 determines that the pattern does not fit within the setting area, the reference line is changed until the pattern fits within the setting area, while the judgment means M7 determines the pattern. When it is determined that the pattern fits within the setting area, the reference line is changed until the pattern does not fit within the setting area, and then the reference line changing means M8 that changes the reference line until the pattern fits within the setting area again. And a reference line determination means M9 for determining the reference line for sewing based on the reference line when the pattern is switched from the state where the pattern does not fit in the setting area to the state where the pattern fits in the setting area by the reference line changing means M8. The sewing system is characterized by being provided.

[Operation] According to the sewing system of the present invention having the above-described configuration, the area setting means M6 sets the area where the pattern is to be formed on the work cloth. On the other hand, the pattern arranging means M4 corrects and calculates the pattern data in order to arrange the pattern data stored in the storage means M3 along a predetermined reference line. Here, the reference line changing means M8 and the reference line determining means M9 operate as follows based on the judgment of the judging means M7.

First, the operation when the area set by the area setting means M6 is a large area will be described. In this case, the first judgment made by the judgment means M7 is "the pattern fits within the set area." Therefore, the reference line changing means M8 changes the reference line in the direction in which the pattern does not fit within the set area. For example, increasing the diameter of the arc so that the reference line is the arc. When the change of the reference line progresses to some extent, the judgment of the judgment means M7 changes to "the pattern does not fit within the set area." Therefore, the reference line changing unit M8 returns the reference line in the direction in which the pattern fits within the set area, contrary to the above. The reference line determination means M9 determines the reference line that has been changed up to this point as the reference line for pattern formation.

Next, the operation when the area set by the area setting means M6 is a small eye area will be described. In this case, the first judgment made by the judgment means M7 is "the pattern does not fit within the set area." Therefore, the reference line changing means M8 changes the reference line so that the pattern fits within the set area. For example, if the reference line is an arc, reduce the diameter of the arc. When the change of the reference line progresses to some extent, the judgment of the judgment means M7 is switched to "the pattern fits within the set area." At this time, the reference line determination means M9 determines the reference line that has been changed up to this point as the reference line for pattern formation.

As described above, in the sewing system of the present invention, the boundary line of the arbitrarily set area is automatically found, and the reference line is determined so that the pattern can be formed inside the boundary line as much as possible. Then, the pattern arranging means M4 performs a correction calculation so that the pattern data is arranged along the changed reference line. In this way, when the reference line is changed and the pattern data is corrected and the pattern data is contained within the area on the work cloth set by the area setting means M6, the control means M5 causes the moving means M2 to move.
Also, the stitch forming means M1 is drive-controlled to form a pattern along a predetermined reference line in the set region on the work cloth.

[Embodiment] Next, an embodiment in which the present invention is embodied in an electronic embroidery sewing machine will be described with reference to the drawings.

FIG. 2 shows the external appearance of the electronic embroidery sewing machine 1, and FIG. 3 shows the configuration of its control system.

As shown in the figure, an electronic embroidery sewing machine 1 has a work table 3 having a flat top plate 2, and a bed 4 installed on the work table 3 and arranged on the same plane as the top plate 2 to form a work cloth supporting surface 2a. A sewing machine main body 6 including an arm 5 and an XY moving device 9 that is also installed on the workbench 3 and that can move the embroidery frame 8 that supports the work cloth 7 in the XY directions, a keyboard 10, a digitizer 11, a display device 12, An external storage device 13 and an electronic control device 14,
The sewing machine main body 6 and the control unit 15 for driving and controlling the XY moving device 9 are included.

The arm 5 of the sewing machine body 6 is provided with a needle 16 at the lower end and a vertically movable needle bar 17, which is moved up and down as the sewing machine motor 18 rotates. A needle plate 4a is mounted on the bed 4, and a needle hole 4b is formed in the approximate center thereof. The needle 16 moves the work cloth 7 as the needle bar 17 moves up and down.
The needle hole 4b is inserted, and a stitch is formed on the work cloth 7 in cooperation with the shuttle 19 provided in the bed 4. Here, the needle 16, the needle bar 17, the sewing machine motor 18, and the shuttle 9 correspond to the stitch forming means M1.

Further, the XY moving device 9 fixes the fixed rails 20 and 21 arranged parallel to the X direction in the drawing and the movable rails 22 slidably inserted in the X direction between the fixed rails 20 and 21 and the movable rails 22. X-axis pulse motor 2 that slides in the X direction along rails 20 and 21
3 and a Y-axis pulse motor 24 that slides the embroidery frame 8 along the moving rail 22 in the Y direction, and corresponds to moving means M2.

The electronic control unit 14 is mainly composed of a CPU 25, a program memory 26,
A logical operation circuit is configured with the working memory 27, and the keyboard 10, digitizer 11, and
An electric signal from the external storage device 13 is input, and a drive signal is output to the sewing machine motor 18, the X-axis pulse motor 23, the Y-axis pulse motor 24, and the display device 12 via the output interface 29 and the drive circuits 30 to 33. Output. The electronic control unit 14 corresponds to the pattern arranging means M4, the control means M5, and the reference line changing means M7, the external storage device 13 corresponds to the storage means M3, and the keyboard
10 and the digitizer 11 correspond to the area setting means M6.

Next, the control process performed by the electronic control unit 14 will be described with reference to the flowcharts of FIGS. 4 and 5 and the explanatory diagrams of FIGS. 6 (a) to (f) and FIGS. 7 (a) to (e). .

As shown in FIG. 4, when the process is started, the first step is
Various flags, memory, etc. are initialized in S1 (hereinafter simply referred to as S1). Next, at S2
It was input as numerical data via 10 or as image data via digitizer 11. The area A where the pattern is to be formed on the work cloth 7 is stored in the working memory 27. In the following S3, the operator selects and supports the pattern from the keyboard 10, for example, by inputting a code or the like, the corresponding pattern data in the external storage device 13 is read, and the work memory is read.
Remembered in 27. The pattern data is, as is well known, the mask data D _{1 to} D ₅ indicating the range occupied by each pattern, and the position represented by the relative positional relationship between the needle and the work cloth for forming the embroidery pattern. It is composed of data. Next, in S4, the reference line designation processing is executed. In this embodiment,
A semi-circle, arc, straight line, spline curve, etc. can be specified as the reference line, and the operator can use the keyboard 10, digitizer 11
Select using.

When the area setting, the pattern designation, and the reference line designation are completed as described above, the process proceeds to the reference line changing process (S5). For simplicity, the following description will focus on the case where a semicircle is designated.

When the semicircle as the reference line is designated in S4, the semicircle mode processing of FIG. 5 is executed.

First lower edge center of the area A in S10 as an initial set semicircular C ₁ is the reference line of the radius R ₁ at the origin 0 as S1, is provisionally set as example 6 (b). Next, in S11, the pattern data stored in the work memory 27 is read out, and the patterns are arranged with the lower left end of the semicircle C ₁ as the starting point, as shown in FIG. 6B. At this time, the read pattern data is corrected by performing a rotation calculation so that the patterns to be formed are arranged substantially orthogonal to the reference line C ₁ and stored in a predetermined area of the working memory 27. To be done. Thereafter, the mask data D ₁ to D ₅ pattern data the following processing is carried out by determining whether falls within the region A.

Mask data D ₁ to D ₅ all arranged on the S12 whether falls within the region A is determined. Figure 6 a predetermined value to the radius R ₁ proceeds if is within region A as (b) to S13 △ R was added, the origin 0, a new semi-circle with a radius R ₁ + △ R
C ₂ is set, and the mask data D ₁ is set in S14 as in S11 described above.
~ D ₅ are arranged as shown in FIG. All the mask data D ₁ to D ₅ again at S15 followed is determined whether falls within region A, the processing in S13 follows until a negative determination is repeated. Therefore, as shown in FIG. 6D, in the semicircle Cn having the origin 0 and the radius Rn, since the mask data D _{1 to} D ₅ are all contained in the area A, the processes of S13 and S14 are executed again. As a result, the radius Rn + 1 = Rn + Δ as shown in FIG.
In the semicircle Cn + 1 of R, the mask data D ₂ is out of the area A, a negative determination is made in S15, and the process proceeds to S16.
In S16, a semicircle C having an origin 0 and a radius R = Rn + 1−ΔR subtracted by a predetermined value ΔR from the radius Rn + 1 increased so far is secured as a reference line.

After that, in S6, pattern data array processing is executed as in S11 and S14 above, and in S7, the sewing machine motor is processed based on the pattern data.
18, the X-axis pulse motor 23 and the Y-axis pulse motor 24 are driven to form stitches on the work cloth 7 so that the pattern fits within the desired area A.

On the other hand, the radius R ₁ ′ of the semicircle C ₁ ′ temporarily installed at S10 is the 7th
If the area A is larger than the area A as shown in FIG.
The mask data D ₁ ′ to D ₅ ′ arranged in the process 1 is the 7th
Area A is projected as shown in FIG. Therefore, the negative determination is made in S12, and the process proceeds to S17. In S17, the radius R ₁ ′ is the predetermined value ΔR
Is subtracted, a new semicircle C ₂ ′ is set, and the mask data D ₁ ′ to D ₅ ′ are arranged in S18 as shown in FIG. Process S17: following determination is negative until all mask data D ₁ '~D _5' falls in the region A is repeated at S19, FIG. 7 entire mask data D ₁ as shown in (e) 'to D ₅ ′
When is within the area A, the process goes to S20 and the origin 0 and radius R ₁ ′ semicircle C ′ are set as the reference line.

Further, when, for example, a spline function approximation curve is designated as the reference line in S4, the reference line is provisionally set by inputting a predetermined point sequence from the digitizer 11,
Set the reference line by enlarging / reducing the spline curve so that the pattern data fits inside. Similarly, when a circular arc is specified, the limited position is automatically changed so that the pattern data is contained in the area A based on the input circular arc curvature, and the reference line is set. The origin may be designated instead of the arc curvature, and the arc curvature may be automatically changed. When a straight line is used as the reference line, similarly, the reference line is set by automatically changing the start point position of the straight line along any one side of the area A.

Further, in the above processing, the display device 12 displays images as shown in FIGS. 6 (a) to (d) and FIGS. 7 (a) to (e). The operator can forcibly terminate the reference line changing process and shift the process to S6 by pressing the break key 10a on the keyboard 10 before the process of S5 is completely finished while watching the image. Is.

The processing of S5, that is, S10 to S20 corresponds to the processing as the reference line changing means M7, S6 as the pattern arranging means M4, and S7 as the control means M5.

As described above, according to the present embodiment, the operator sets the origin,
By inputting the area without calculating the curvature and the like, the previously set reference line is automatically changed and the pattern data is arranged in the desired area. Further, for the area setting, an image can be input using the display device 12 and the digitizer 11. Therefore, the operator does not need to perform a complicated calculation, and the pattern can be formed on the work cloth 7 along the predetermined reference line very easily and surely. Further, since the reference line can be set by operating the break key 10a during the process while watching the display of the display device 12, it is possible to roughly set the region at the start of the process and particularly specify the spline. . Further, since it is determined whether or not the pattern is within the area using the mask data, the time required for the determination is determined based on the position data (determination of the actual stitch position). It has the advantage of being shorter than.

Although one embodiment of the present invention has been described above, the present invention is not limited to this, and various modes can be adopted without departing from the scope of the invention.

For example, the reference line may be a closed curve such as a circle or a polygon, and the position of the pattern array on the reference line in the setting area can be specified / changed. For example, the center of the reference line and the center of the pattern array can be specified. The reference line changing process (S
5) may be performed. Further, in the process of S10, the radius of the semicircle may be provisionally set as the maximum diameter that fits within the region, and the processes of S13 to S16 may not be performed. still,
If you calculate by sandwiching from both the large radius and the small radius,
The calculation time can be shortened.

EFFECTS OF THE INVENTION As described above, according to the sewing system of the present invention, the reference line is automatically changed by a simple area setting, and the pattern is formed at the correct position. Therefore, troublesome calculation is not required, defective products are not generated due to calculation error, and workability and productivity can be significantly improved.

[Brief description of drawings]

FIG. 1 is a block diagram illustrating the configuration of the present invention, FIG. 2 is a schematic perspective view showing the external appearance of an electronic embroidery sewing machine 1 of an embodiment, and FIG. 3 is a configuration diagram of a main part showing its control system, and FIG. Is a flow chart of the control process performed by the electronic control unit 14, FIG. 5 is a flow chart showing the process in the semicircle mode as the reference line changing process, FIGS. 6 (a) to 6 (f) and FIG. 7 (a). (E) is an explanatory view showing a state of the reference line changing process. M1 ...... stitch forming means, M2 ...... moving means M3 ...... storage means, M4 ...... pattern arrangement means M5 ...... control means, M6 ...... area setting means M7 ...... judgment means, M8 ...... reference line changing means M9: Reference line determining means, 1 ... Electronic embroidery sewing machine, 6 ... Sewing machine body, 7 ... Work cloth, 8 ... Embroidery frame, 9 ... XY moving device, 10 ... Keyboard, 11 ... Digitizer, 12 ... Display Device, 13 ... External storage device 14 ... Electronic control device, 18 ... Sewing machine motor 19 ... Hook, 20,21 ... Fixed rail 22 ... Moveable rail, 23 ... X-axis pulse motor 24 ... Y-axis Pulse motor

 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) Reference JP-A-60-246785 (JP, A) JP-A-62-122496 (JP, A) JP-A-58-22090 (JP, A) JP-A-63- 105787 (JP, A) JP-A-60-60889 (JP, A)

Claims (1)

[Claims] 1. A stitch forming means for forming stitches on a work cloth, including a vertically movable needle, a moving means for changing a relative positional relationship between the work cloth and the needle, and forming a predetermined pattern. Storage means for storing the pattern data for storing the pattern data, pattern arrangement means for performing a correction operation on the pattern data stored in the storage means so as to arrange the patterns along a predetermined reference line, and correction operation by the pattern arrangement means. A sewing system for forming a pattern along a predetermined reference line on the work cloth, comprising: a control means for driving and controlling the moving means and the stitch forming means on the basis of the generated pattern data. The area setting means for setting the area where the pattern is to be formed, and whether or not the pattern fits within the set area when the pattern is formed based on the result of the correction calculation by the pattern arranging means If the judgment means determines that the pattern does not fit within the setting area, the reference line is changed until the pattern fits within the setting area, while the judgment means determines that the pattern falls within the setting area. When it is determined that the pattern fits within the setting area, the reference line is changed until the pattern does not fit within the setting area, and then the reference line is changed again until the pattern fits within the setting area. Reference line determining means for determining the reference line for sewing based on the reference line when the pattern is changed from the state where the pattern does not fit in the setting area to the state where the pattern fits in the setting area by the line changing means. Sewing system.