JPH0636229A - Thin film for magnetic head, and magnetic head - Google Patents

Abstract

PURPOSE:To obtain a thin film, for magnetic head use, wherein a flux density is high and a coercive force is low by forming the thin film, for magnetic head use, wherein the film is provided with an atomic ratio composition expressed by a prescribed formula and the film is provided with a (100) orientation property which is nearly parallel to a film face. CONSTITUTION:A thin film for magnetic head use is provided with an atomic ratio composition expressed by a formula of Fe100-x-y-zMxNyXz, it is provided with a (100) orientation property which is nearly parallel to a film face, and it is heated and treated in an atmosphere containing oxygen. In the formula M represents one or more selected from Mg, Ca, Ti, Zr, Hf, V, Nb, Ta, Mo, W, Mn, and B; X, one or more of Si, Al and Cr; 6<=x<=14, 6<=y<=15, 0.6<=y/x<=2.0 and 0.5<=z<=10. In the magnetically soft thin film, its heat resistance is high and its (100) orientation property is strong. As a result, it is possible to obtain the thin film whose saturation magnetic flux density is high, whose coercive force is low and whose permerability is high.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a soft magnetic thin film and a magnetic head using the thin film, particularly a metal-in-gap (MIG) type magnetic head and an enhanced dual type.
The present invention relates to a composite type or monolithic type magnetic head such as a gap length (EDG) type or a thin film magnetic head.

[0002]

2. Description of the Related Art A soft magnetic thin film such as sendust having a saturation magnetic flux density Bs higher than that of a core is provided on at least one of facing surfaces of a first core and a second core made of ferrite, and both cores are made of glass. A MIG type magnetic head integrated by welding is known. There are a composite type in which an integrated core is sealed to a slider and a monolithic type in which the integrated core doubles as a slider. In this magnetic head, a strong magnetic flux can be applied to the magnetic recording medium from the soft magnetic thin film, so that effective recording can be performed on the medium having a high coercive force. Further, there is also known an EDG type magnetic head having a low Bs soft magnetic thin film in the gap portion of this MIG type magnetic head.

Further, a flying type thin film magnetic head having excellent characteristics such as high density recording and high speed data transfer has been put into practical use. Since a high density magnetic flux is generated even in the thin film magnetic head, soft magnetic thin films such as Permalloy and Sendust having high saturation magnetic flux density Bs are used for the upper and lower magnetic pole layers.

By the way, the saturation magnetic flux density Bs of such a soft magnetic thin film used for a magnetic head is at most 12000.
It is about G. For this reason, the conventional magnetic head has insufficient electromagnetic conversion characteristics such as overwrite characteristics, and in particular, in the case of a magnetic recording medium having a high coercive force, a higher saturation magnetic flux density Bs is required.

It is known that Fe-based soft magnetic thin films having a strong (100) orientation have excellent soft magnetic properties because they have a small crystal magnetic anisotropy. However, even if the Fe-based soft magnetic thin film is formed by a general vapor phase method such as sputtering, the (100) orientation cannot be strengthened, and mainly (11)
0) A plane-oriented or non-oriented thin film is formed. Therefore, (10
0) In order to form a film having a strong orientation, a substrate made of a specific material, such as ZnSe, or a single crystal substrate of (100) orientation or GaAs having a strong (100) orientation must be used. I won't.

A film having such a strong (100) orientation is
Since it is realized only under limited conditions, it is very difficult to increase the (100) orientation or the (100) orientation of the soft magnetic thin film of the magnetic head.

By the way, targeting Fe, Ar and N
_By sputtering in a mixed gas of _2, an Fe—N soft magnetic thin film having a higher saturation magnetic flux density Bs than Sendust can be obtained. This is done by mixing N
This is because the Fe crystal grains are made finer and the magnetic anisotropy dispersion is reduced.

For example, in JP-A-64-15907, Fe is the main component, and Fe ₄ N and / or Fe ₃ N are used.
A soft magnetic thin film containing iron nitride is disclosed. The soft magnetic thin film has a saturation magnetic flux density of 150.
It is more than 00G, the coercive force Hc is low, and it has suitable magnetic characteristics for the magnetic head. But Fe-N
The soft magnetic thin film has low heat resistance, the crystal grain size becomes large at a temperature of about 350 ° C., and the coercive force Hc sharply increases.

Therefore, the heat treatment such as glass welding causes
It is difficult to use for a MIG type magnetic head or an EDG type magnetic head which is kept at a temperature of about 50 to 700 ° C., and a thin film magnetic head which is kept at a temperature of about 350 ° C. or higher in a film forming process such as sputtering. Is. in addition,
This soft magnetic thin film cannot have a strong (100) orientation only by forming a film on an ordinary substrate by a vapor phase method such as sputtering.

Therefore, the inventors of the present invention have an atomic ratio composition represented by the following formula as a thin film for a magnetic head having high heat resistance and corrosion resistance, high saturation magnetic flux density Bs, and excellent soft magnetic characteristics. , X-ray diffraction has proposed a thin film for a magnetic head in which the relative intensity ratio of the Fe (200) peak to the Fe (110) peak is 1 or more (Japanese Patent Application No. 4-
No. 135099, 15th Annual Meeting of Japan Society for Applied Magnetics, 1991 1pE-4 P509).

Formula Fe _100-xy M _x N _y (where M is Mg, Ca, Ti, Zr, Hf,
One or more selected from V, Nb, Ta, Cr, Mo, W, Mn, and B, and 6.5 ≦ x ≦ 14, 6.2 ≦ y
≦ 15, 0.68 ≦ y / x ≦ 1.5, and 0 ≦ z ≦ 10. )

[0012] By limiting the content ratio of M and N to near 1 in this product, Z in the growth process of α-Fe crystal grains
MN such as rN functions as a so-called inhibitor, and F
The (100) orientation, which is usually difficult to obtain in an e-based thin film, occurs preferentially. As a result, the heat treatment temperature dependency is small, and high soft magnetic characteristics excellent in thermal stability can be obtained.

However, it has been found that when the MIG type magnetic head or the like is used to integrate the cores with the fused glass, iron oxide layers are formed on both end surfaces in the core track width direction. This is because the atmosphere at the time of glass welding cannot be made to have an oxygen content of zero and, for example, an atmosphere containing 1 to 100 ppm of oxygen must be used. In such a case, for both the monolithic type and the composite type, after forming a thin film on a long core half block and forming a gap material thin film so as to completely cover this, the thin film is exposed to oxygen. If the blocks are integrated in the absence of the situation and then cut into cores, the formation of such an oxide layer is prevented.

However, in the composite type, the chipped core has to be glass-sealed (secondary welding) at a temperature slightly lower than the temperature at which the core is integrated with the slider. At this time, both end surfaces of the core in the track width direction and the end surface of the thin film exposed on the front surface are exposed to an atmosphere containing oxygen, and an oxide layer is formed. In this case, the oxide layer on the front surface can be removed by grinding and polishing, but this oxide layer generated on both end surfaces in the core track width direction from the back surface to the front surface is sealed in the glass. As shown in 7, oxide remains on both ends of the core in the track width direction. This remaining oxide layer is 4-5 μm
And the physical properties of the electromagnetic conversion of the head become extremely poor.

In addition to this, in other various magnetic heads, it is necessary to perform heat treatment in an atmosphere containing oxygen during the process, and the formation of this oxygen-containing layer poses a problem. Further, for example, it may be forced to be used or stored under a high temperature and high humidity condition of 60 ° C. and a relative temperature of 90%, which also causes an oxide layer to cause a characteristic deterioration.

[0016]

The main objects of the present invention are high heat resistance and corrosion resistance, high saturation magnetic flux density Bs, excellent soft magnetic characteristics, and heat treatment in an atmosphere containing oxygen. , A thin film for a magnetic head that does not deteriorate in characteristics due to the formation of an oxide layer even when used or stored under high temperature and high humidity, and a composite type or monolithic type MIG type magnetic head or EDG having such a thin film.
Type magnetic head, and further to provide a thin film magnetic head and the like.

[0017]

The above objects are achieved by the present invention described in (1) to (18) below.

(1) A thin film for a magnetic head, which has an atomic ratio composition represented by the following formula, has a (100) orientation substantially parallel to the film surface, and has been heat-treated in an atmosphere containing oxygen. Formula Fe _100-xyz M _x N _y X _z (In the above formula, M is Mg, Ca, Ti, Zr, Hf,
At least one selected from V, Nb, Ta, Mo, W, Mn, and B, X at least one selected from Si, Al, and Cr, 6 ≦ x ≦ 14, 6 ≦ y ≦ 15, 0.
6 ≦ y / x ≦ 2.0 and 0.5 ≦ z ≦ 10. )

(2) The thin film for a magnetic head according to claim 1, wherein the relative intensity ratio of the Fe (200) peak to the Fe (110) peak in X-ray diffraction is 1 or more.

(3) The thin film for a magnetic head according to the above (1) or (2), wherein 0.6 ≦ y / x ≦ 2.0.

(4) The thin film for a magnetic head according to any one of the above (1) to (3), wherein 5 <z ≦ 10.

(5) A thin film for a magnetic head having an atomic ratio composition represented by the following formula and having uniaxial anisotropy substantially parallel to the film surface. Formula Fe _100-xyz M _x N _y X _z (In the above formula, M is Mg, Ca, Ti, Zr, Hf,
At least one selected from V, Nb, Ta, Mo, W, Mn, and B, X at least one selected from Si, Al, and Cr, 6 ≦ x ≦ 14, 6 ≦ y ≦ 15, 5 <
z ≦ 10. )

(6) The thin film for a magnetic head according to the above (5), which is heat-treated in an atmosphere containing oxygen.

(7) For a magnetic head according to any one of the above (1) to (6), which is subjected to heat treatment at a temperature of 650 ° C. or lower in the state of being exposed to an atmosphere containing 1 to 100 ppm of oxygen. Thin film.

(8) The thin film for a magnetic head according to any one of the above (1) to (7), which is heat-treated prior to the heat treatment in the atmosphere containing oxygen.

(9) The thin film for a magnetic head according to any one of the above (1) to (8), wherein an oxide layer is not substantially present on the end face of the thin film.

(10) Fe having an atomic ratio composition represented by the following formula, and Fe with respect to the Fe (110) peak in X-ray diffraction
A thin film for a magnetic head, which has a relative intensity ratio of (200) peaks of 1 or more and prevents oxidative deterioration due to storage or use under high temperature and high humidity. Formula Fe _100-xyz M _x N _y X _z (In the above formula, M is Mg, Ca, Ti, Zr, Hf,
At least one selected from V, Nb, Ta, Mo, W, Mm, and B, X at least one selected from Si, Al, and Cr, 6 ≦ x ≦ 14, 6 ≦ y ≦ 15, 0.
6 ≦ y / x ≦ 2.0 and 0.5 ≦ z ≦ 10. )

(11) The heat treatment (1)
0) Thin film for magnetic head.

(12) The thin film for a magnetic head according to the above (10) or (11), wherein the heat treatment temperature is 200 to 800 ° C.

(13) A magnetic head having the thin film according to any one of (1) to (12) above.

(14) A magnetic head having the thin film of (13), which has the thin film between a pair of cores.

(15) The magnetic head according to the above (14), wherein the pair of cores are fused and integrated by a fused glass having a working temperature Tw of 450 to 750 ° C.

(16) The magnetic head according to the above (15), wherein the pair of fused and integrated cores are sealed to a slider by a sealing glass having a working temperature Tw of 350 to 650 ° C.

(17) The magnetic head according to the above (13), which has an upper magnetic pole layer, a lower magnetic pole layer, and a protective layer, and the upper magnetic pole layer and the lower magnetic pole layer are formed of the thin film.

(18) The magnetic head according to the above (13), in which a magnetic circuit formed of the thin film is formed on a substrate.

[0036]

The soft magnetic thin film for the magnetic head of the present invention is made of Fe-
Since it is N type, the saturation magnetic flux density Bs is very high and the coercive force Hc is low. Further, it has a high micro Vickers hardness, which is advantageous in terms of wear resistance. A predetermined element is added to Fe and N in a predetermined amount ratio (y / x) and deposited, and then heat treated to form a soft magnetic material having a strong (100) plane orientation or degree on the core or slider. A thin film can be formed. Therefore, the soft magnetic characteristics are remarkably improved.

In addition, since the additional element M forms a nitride more stable than Fe, the saturation magnetic flux density Bs is preferably maintained at about 14000 G or more, particularly 16000 G or more, and heat resistance and corrosion resistance are remarkably improved. Let here,
The temperature at which the coercive force changes rapidly due to heat treatment, for example,
If the heat treatment temperature at which the coercive force Hc becomes 2 Oe is the heat resistant temperature,
The heat resistant temperature of the soft magnetic thin film used in the present invention is about 500 ° C. or higher, particularly 550 ° C. or higher, and further 600 ° C. or higher.

In this case, European Patent Publication No. 380136 discloses that after depositing an amorphous Fe-MN system thin film, it is heat-treated to form a (110) plane oriented film. . However, the amorphous film immediately after the deposition does not exhibit the soft magnetic property, but exhibits the soft magnetic property only after the (110) orientation is given.

On the other hand, in the present invention, the (100) plane orientation is provided immediately after the deposition so that the soft magnetic characteristics sufficient for practical use are exhibited. The degree of (100) plane orientation is further increased by the heat treatment, so that the soft magnetic characteristics are further improved. At this time, the dependence of the characteristics on the heat treatment conditions is reduced, and the heat treatment conditions can be easily controlled. In addition, heat resistance is improved, and heat treatment can be performed at 600 ° C. or higher, or even 700 ° C. or higher under conditions not exposed to oxygen, and glass fusion during head assembly integration becomes easy.

Therefore, the soft magnetic thin film of the present invention has excellent soft magnetic characteristics such that the saturation magnetic flux density Bs is high, the coercive force Hc is low, and the magnetic permeability μ is high. And the magnetostriction is also small. Therefore, the magnetic head of the present invention having such a soft magnetic thin film has high overwrite characteristics, high recording / reproducing sensitivity, etc.
It has excellent electromagnetic conversion characteristics. In addition, the soft magnetic thin film of the present invention is excellent in corrosion resistance and abrasion resistance, so that a highly reliable magnetic head can be realized.

In JP-A-60-218820 and JP-A-60-220913, Fe, 2-10 wt% of Al, 3-16 wt% of Si, and 0.005-
A magnetic thin film containing 4 wt% nitrogen is disclosed. Then, it is described that the saturation magnetic flux density Bs can be improved by substituting a part of Fe with Co, and the magnetic permeability μ can be maintained in a high state without decreasing Bs by substituting with Ni. . However, although the specific examples shown in the examples have high heat resistance temperatures, the saturation magnetic flux density B
s is at most about 12000G. As described above, the conventional soft magnetic thin film has a lower saturation magnetic flux density Bs, a higher coercive force Hc, a lower magnetic permeability μ and a lower heat resistance than the Fe-M-N based thin film of the present invention. .

In the present invention, Si, Cr and Al are added as X to such an Fe-MN thin film. This critically reduces the formation of oxide layers under oxygen-containing atmospheres.

In this case, in Japanese Patent Application Laid-Open No. 4-16517 filed as an improved technique of the above-mentioned European publication, Fe
Zr, Hf, Ti, Nb, Ta, V, Mo, W for -N system
Is added, and a thin film containing 0.5 to 5 at% of Si is further described. In this thin film, Si is added to enhance the heat resistance, and the heat resistance here means prevention of characteristic deterioration due to crystal structure change due to heat treatment in an atmosphere containing no oxygen (for example, in vacuum). is doing. That is, this publication neither discloses nor focuses on the fact that the addition of Si prevents the formation of an oxide layer in an atmosphere containing oxygen.

Further, in JP-A-3-242911, preferably, a Fe-MN thin film in which the N content is periodically changed in the film thickness direction and has uniaxial anisotropy perpendicular to the film surface is disclosed. Describes that at least one of B, Si, Ge, and C is contained therein. However, even in this thin film, Si or the like has only a problem of characteristic deterioration due to structural change due to heat in a non-oxidizing atmosphere, and no attention has been paid to prevention of formation of an oxide layer.

[0045]

Specific Structure The specific structure of the present invention will be described in detail below. The soft magnetic thin film particularly suitable for the magnetic head of the present invention is
The atomic ratio composition represented by the following formula is applied to the core and the slider.

Formula Fe _100-xyz M _x N _y X _z

In the above formula, M is Mg, Ca, Ti,
One or more selected from Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn and B. Other elements,
For example, in Ru or the like, the saturation magnetic flux density also decreases Bs,
Soft magnetic properties are degraded. Among these, especially (1
00) In order to enhance the plane orientation, Zr alone or V alone,
In particular, Zr alone or Zr and / or V accounts for 20% or more of M.
A combination with elements other than is preferable.

The content x of M is 6.5 to 14, more preferably 7 to 12. If it is less than the above range, the heat resistance is insufficient. Therefore, the coercive force Hc increases significantly due to heat treatment or the like. If it exceeds the above range, the saturation magnetic flux density Bs decreases. Therefore, when applied to a magnetic head,
Overwrite characteristics tend to deteriorate. Further, in the range other than this, the hardness decreases and the magnetostriction increases. Then, in such a range, it becomes easy to form a soft magnetic thin film having a (100) orientation or a strong degree of orientation, and the soft magnetic characteristics are remarkably improved. In addition, heat resistance is improved and Hc is 2 Oe or more, especially 1
The heat resistant temperature of Oe or higher reaches 700 ° C., and particularly reaches 750 ° C. or higher.

The N content y is 6 to 15, more preferably 6.5 to 15, and most preferably 7 to 12. If it is less than this range, the crystal grains are not sufficiently refined by N, and soft magnetic properties tend not to be obtained. Above the range,
Soft magnetic properties cannot be obtained because nitrides of Fe, Ni, and M are generated more than necessary. And, in such a range, the (100) plane orientation becomes more preferable. If necessary, oxygen may be contained in an amount of 5 at% or less of the whole in addition to nitrogen.

The lower limit of y / x is preferably 0.6, more preferably 0.65, even more preferably 0.7, and especially 0.8. The upper limit of y / x is 2.0, more preferably 1.8, still more preferably 1.5, and especially 1.2.
Is preferred. By limiting y / x to this range, a (100) oriented film can be easily obtained, and otherwise (100) orientation becomes difficult.

X added to form the oxide layer is S
They are 1 to 3 types of i, Cr and Al. Of these,
In a MIG type or EDG type head using a ferrite core, since it is easy to diffuse in Al ferrite and a so-called pseudo gap may be formed, one or two kinds of Si and Cr, particularly Si, is essential, and Si alone is used. Alternatively, it is preferable to use Cr in combination with 5 at% or less. It should be noted that elements other than these, such as Ti, W, and Ru, do not have the effect of preventing the formation of an oxide layer.

The content z of X is 0.5 to 10, and z is 1 or more, further 3.5 or more, particularly more than 5, more preferably 5.5 or more, and 9 or less. Is preferred. Addition of 0.5 or more can prevent characteristic deterioration due to oxide formation due to storage and use under high temperature and high humidity, but in order to prevent oxide formation during heat treatment in an atmosphere containing oxygen, 3. It is preferably 5 or more, and particularly more than 5. Further, if it exceeds 10, the magnetic characteristics will be deteriorated.

Part of Fe may be replaced with Ni. The substitution amount of Ni (w = Ni / (Fe + Ni) is 0 to 1
It is 0%, preferably 0 to 5%. It is also possible to add Ni to improve the magnetic permeability μ. However, if it is too large, the saturation magnetic flux density Bs tends to decrease. Note that Ni
When w is included as an essential component, the content w is 1 to 1.
It is preferably 0, more preferably 1 to 5.

The composition of the soft magnetic thin film of the present invention as deposited is determined by, for example, Electron Probe Micro Analysis (EPM
It may be measured by the A) method. The thickness of the soft magnetic thin film may be appropriately selected according to the application, etc., but is usually 0.1.
It is about 10 μm.

To form the soft magnetic thin film of the present invention, various vapor phase methods such as vapor deposition, sputtering, ion plating and CVD may be used. Of these, it is particularly preferable to form a film by a sputtering method, and for example, the following film formation may be performed. As the target, an alloy cast body, a sintered body, a multi-source target, or the like is used. Then, sputtering is performed in an atmosphere of an inert gas such as Ar.

When reactive sputtering is performed,
The composition of the target may be substantially the same as the one not containing N in the above formula. Then, the sputtering is carried out in an atmosphere containing 0.1 to 15% by volume, preferably 2 to 10% by volume of N ₂ in Ar. If it is out of the above range, the soft magnetic characteristics cannot be obtained.

The sputtering method is not particularly limited, and the sputtering apparatus used is not limited, and a normal sputtering apparatus may be used. The operating pressure is usually 0.1 to 1.0.
It should be about Pa. In this case, various conditions such as sputtering input voltage and current are appropriately determined according to the sputtering method and the like. However, in order to enhance the (100) orientation, the leakage magnetic field of 100 to
It is preferable to use magnetron sputtering performed under the conditions of about 500 Oe. The magnetron sputtering may be performed at high frequency or direct current.

The film immediately after film formation is preferably (1
It is preferable that the soft magnetic thin film is heat-treated as a film after being deposited, although it has a (00) orientation. By heat treatment,
The (100) orientation or the degree of orientation becomes stronger, the soft magnetic characteristics are remarkably improved, and the saturation magnetic flux density Bs is also improved.

Specifically, the film is (100) before the heat treatment.
It has orientation, and the (200) plane is oriented parallel to the film surface (substrate surface). The X-ray diffraction chart shows Fe (20)
0) peak is present, but heat treatment causes Fe (110)
The relative intensity ratio of the Fe (200) peak to the peak is
2 or more by increasing the heat treatment temperature from 1 or more,
Further, it increases to 3 or more, and in some cases to infinity, and the saturation magnetic flux density Bs also improves. In this case, for example,
A soft magnetic thin film having a strong (100) orientation can be realized by forming a film on any substrate such as a magnetic substance such as ferrite, a non-magnetic ceramics, and a polymer film. This is because the diffraction ring from the Fe (200) plane is discontinuous in the electron beam diffraction pattern, so that the (100) plane orientation can be confirmed.

In the present invention, in the X-ray diffraction chart of the film,
The relative intensity ratio of the Fe (200) peak to the Fe (110) peak is 1 or more, and the (100) orientation is increased as compared with the non-oriented state. In particular, this value is 2 or more, and more preferably 3 or more. . In addition, 2θ of the Fe (110) peak in the X-ray diffraction chart (θ is the diffraction angle)
Is about 44.7 degrees when CuKα is used, and Fe (20
0) The peak 2θ is about 65 degrees. It is preferable that the film after the heat treatment has a uniaxial anisotropy of (100) orientation parallel to the film surface, but in some cases, even if (110) orientation, z> 5. In that case, the formation of the oxide layer is prevented particularly in the heat treatment in the atmosphere containing oxygen.

As the heat treatment conditions, the following conditions are particularly preferable. Temperature rising rate: about 2 to 8 ° C / min Holding temperature: 200 to 800 ° C, generally 300 to 800
℃, especially about 400 ~ 750 ℃, further 400 ~ 70
Approximately 0 ° C, especially 550 ° C or higher, further 580 ° C or higher improves (100) plane orientation, and 600 ° C or higher, especially 7
Sufficiently stable at 50 ° C or above Holding time: 10-60 minutes Cooling rate: 2-8 ° C / minute

The atmosphere may be an inert gas such as Ar or in a vacuum, but in order to carry out the heat treatment at the same time as glass welding or sealing, 1 to 100 ppm, more preferably 1 to 50 ppm of this inert gas, Especially 5-40ppm, and even 1
An atmosphere containing 0 to 30 ppm of oxygen is preferable. At this time, it is not necessary to consider that the thin film is not exposed to oxygen when the welding is performed at a relatively low temperature of 650 ° C. or less, but in the welding at a high temperature side, the thin film may be covered with a gap material or the surface may be covered if necessary. Consideration such as polishing is necessary. By carrying out such a heat treatment, a soft magnetic thin film having further excellent soft magnetic characteristics can be obtained. In addition,
The heat treatment may be repeated a plurality of times, such as performing primary and secondary welding.

By such heat treatment, N ₂ is released from the film, and in the above composition formula, 6.5 ≦ x ≦ 14,
6 ≦ y ≦ 15, 0.6 ≦ y / x ≦ 2.0, 0.5 ≦ z ≦
The film is about 10, 0 ≦ w ≦ 10. As described above, the composition of the present invention has little composition variation after heat treatment. Further, as described above, y / x is in the vicinity of 1, so after the heat treatment,
The degree of orientation of the (100) orientation is improved. This is because ZrN or the like acts as an inhibitor to preferentially (100) -orientate during the growth process of Fe crystallinity, and it is necessary that y / x of the film immediately after film formation be close to 1. Also, Z
Since the generation of rN and the like suppresses the growth of Fe crystal grains, the thermal stability is improved, and the high magnetic permeability is maintained up to a high temperature. Even in the film after the heat treatment, x is 7 to 12, the lower limit of y is 6.5, particularly 7, the upper limit of y is 12, the lower limit of y / x is 0.65, and further 0.7 Preferably 0.8, y
The upper limit of / x is 1.8, especially 1.5, and even 1.2,
z is preferably more than 5 and 10 or less.

The soft magnetic thin film of the present invention has, for example, a film thickness of 1 to 5
When it is about μm, it has the following characteristics.

Coercive force Hc (50 Hz): about 0.1 to 2 Oe,
Especially about 0.1 to 1 Oe, further about 0.1 to 0.28 Oe Initial permeability μ _i (5 MHz): about 1000 to 5000, especially about 1900 to 5000, further 2000 to 5000
Saturation magnetic flux density Bs (DC): 12000 to 18000G
Depending on the heat treatment, about 13500 to 18000G, about 14000 to 18000G, especially 14000 to 1400G
Improved to about 17,000 G Magnetostriction: −2 × 10 ⁻⁶ to + 2 × 10 ⁻⁶ Average grain size D: 50 to 500 A, especially 1
About 00-300A, further about 150-250A Micro Vickers hardness: 700 or more, by heat treatment,
Improve to 1100 or more, especially 1150 or more, generally 1500 or more

For the measurement of the magnetic characteristics of the soft magnetic thin film, for example, when applied to a magnetic head, a film was formed on a non-magnetic substrate under the same conditions as those for forming a magnetic head, and heat treatment was performed under the same conditions. After that, it may be performed as follows.

Initial magnetic permeability (μ _i ): Measured with an applied magnetic field of 5 mOe using an 8-shaped coil magnetic permeability meter Coercive force (Hc): Measured with BH tracer Saturated magnetic flux density (Bs): VSM Used, measured in a magnetic field of 10000 G Magnetostriction: measured with an applied magnetic field of 100 Oe by the optical lever method

The average crystal grain size D of the crystal grains may be obtained from the Scherrer's formula below by measuring the half-value width W ₅₀ of the Fe (200) peak of the X-ray diffraction line. Formula D = 0.9λ / W ₅₀ cos θ

In the above equation, λ is the wavelength of the X-ray used, and θ is the diffraction angle. As described above, when CuKα is used, the 2θ of the Fe (200) peak is about 65 degrees. Furthermore, the micro Vickers hardness is JIS
It may be measured according to.

Further, as described above, the thin film of the present invention prevents the formation of an oxide layer even when heat-treated in an atmosphere containing oxygen, so that the oxide layer does not substantially exist. In this case, the absence of the oxide layer, that is, the layer of iron oxide Fe ₂ O ₃ is 0.15 μm from the edge of the film surface (exposed end surface) when observed by a scanning electron microscope (SEM) and an optical microscope. Or more, particularly 0.1 μm or more, and further 0.
This means that no oxide layer extending over 08 μm is observed. Therefore, in the preferred composition range of the present invention, polishing removal of the oxide layer is not required, and the oxide layer is not substantially formed even in the sealing portion which cannot be removed.

Such a soft magnetic thin film of the present invention is particularly suitable for M
It can be applied to various magnetic heads such as an IG (metal-in-gap) type magnetic head and a thin film magnetic head. In addition to the magnetic head, it can be applied to various soft magnetic parts such as a thin film inductor.

Next, the magnetic head of the present invention will be described. A preferred embodiment of the MIG type magnetic head of the present invention is shown in FIG.
And shown in FIG.

The magnetic head shown in FIG. 1 has a first core 1
And a second core 2 having a soft magnetic thin film 4 formed on the trading side of the surface facing the gap, and the two cores are joined together with a winding window 8 through a gap 5.
It is fused and integrated by the fused glass 3. Also, FIG.
The magnetic head shown in FIG.
The second core 2 is of a type formed on both surfaces facing each other.

In the present invention, the cores 1 and 2 are preferably made of ferrite. In this case, the ferrite used is not particularly limited, but Mn-Zn ferrite or Ni-Zn ferrite is preferably used according to the purpose. As Mn-Zn ferrite, Fe ₂ O ₃
50-60 mol%, ZnO 8-25 mol%,
It is preferable that the balance is substantially MnO. In addition, Ni
-Zn ferrite exhibits excellent characteristics especially in a high frequency region, and a preferable composition is Fe ₂ O ₃
Is 30 to 60 mol%, NiO is 15 to 50 mol%, Zn
O is about 5 to 40 mol%.

DC saturation magnetic flux density Bs of cores 1 and 2
Is preferably 3000 to 6000G. When the saturation magnetic flux density is less than the above range, the overwrite characteristic is deteriorated, and in such a composition of the saturation magnetic flux density, the Curie temperature is lowered and the thermal stability is deteriorated. If it exceeds the above range, magnetostriction is increased and the characteristics of the magnetic head are deteriorated, or the magnetic head is easily magnetized.

The initial magnetic permeability μ _i of the cores 1 and 2 at DC is 10
It is preferable that the coercive force Hc is 00 or more and the coercive force Hc is 0.3 Oe or less. Further, it is preferable that the surfaces of the cores 1 and 2 facing the gap portion are smoothed by mirror polishing or the like so that the soft magnetic thin film 4 and the base film described later can be easily formed.

The soft magnetic thin film 4 is provided in order to generate a high-density magnetic flux during recording and to effectively perform recording on a magnetic recording medium having a high coercive force. As the soft magnetic thin film 4, the above-mentioned soft magnetic thin film of the present invention is used.

The saturation magnetic flux density Bs of the soft magnetic thin film 4 when the magnetic head is completed is 14000 G or more, more preferably 16
It is preferably 000 G or more, particularly preferably 17,000 G or more. When it is less than the above range, the overwrite characteristic is deteriorated, and it is particularly difficult to record on a magnetic recording medium having a high coercive force.

The soft magnetic thin film 4 has a strong (100) orientation. When the (100) orientation is strong, the soft magnetic characteristics of the soft magnetic thin film 4 are improved and high recording / reproducing sensitivity is obtained. The average crystal grain size of the soft magnetic thin film 4 is 500 A.
Or less, more preferably 300 A or less, particularly 100 to 30
It is preferably about 0A. In the above range, the soft magnetic characteristics are improved and high recording / reproducing sensitivity is obtained.

In this case, the soft magnetic characteristics, that is, the coercive force Hc of the soft magnetic thin film 4 at the completion of the magnetic head at 50 Hz.
Is preferably 2 Oe or less, more preferably 1 Oe or less. And the initial permeability μ of the soft magnetic thin film 4 at 5 MHz
It is preferable that _i is 1000 or more, and particularly 1500 or more. If the coercive force Hc exceeds the above range or the initial magnetic permeability μ _i is less than the above range, the recording / reproducing sensitivity tends to decrease.

The thickness of the soft magnetic thin film 4 is preferably 0.2.
.About.5 .mu.m, more preferably 0.5 to 3 .mu.m. If the film thickness is less than the above range, the volume of the soft magnetic thin film 4 as a whole becomes insufficient, and the soft magnetic thin film 4 is likely to be saturated, and it becomes difficult to sufficiently fulfill the function of the MIG type magnetic head. Further, if it exceeds the above range, eddy current loss increases. By having such a soft magnetic thin film 4, the magnetic head of the present invention can perform effective recording on a magnetic recording medium having a coercive force of 800 Oe or more.

If the core 1, the core 2 and the soft magnetic thin film 4 have the above-mentioned magnetic characteristics, a high output and resolution can be obtained as a magnetic head. In addition, a good overwrite characteristic of -35 dB or less can be obtained. The resolution means, for example, (V _2f / V _1f ) × 100 [%] when the output of the 1f signal is V _1f and the output of the 2f signal is V _2f .
Is represented by. The overwrite characteristic is, for example, the 1f signal output with respect to the 2f signal output when the 2f signal is overwritten on the 1f signal.

The gap 5 is made of a non-magnetic material. In particular, it is preferable to use adhesive glass in the gap 5 in order to increase the adhesive strength.
The glass shown in No. 1506 and the like is suitable. Further, although the gap 5 may be formed of only the adhesive glass, it is preferable that the gap 5 is formed of two layers of the gap 51 and the gap 53 as shown in the figure in order to increase the gap forming speed and the gap strength. In this case, the gap 51 has an S
It is preferable to use iO ₂ and adhesive glass for the gap 53.

In the case of a magnetic head in which the fused glass 3 described later flows into both sides of the gap, the gap 5 may be formed of silicon oxide only. Gap 5
There is no particular limitation on the method of forming the above, but it is preferable to use the sputtering method. Gap length is usually 0.2-2.0μ
It is about m.

As shown in FIGS. 1 and 2, the MIG type magnetic head of the present invention is such that the first core 1 and the second core 2 are joined and integrated via the gap 5. The cores are usually joined by thermocompression bonding with the adhesive glass in the gap 53 and at the same time pouring the fused glass 3. The working temperature Tw of the welding glass 3 used is 450 to 75.
0 ° C, more preferably 450 to 700 ° C, especially 460 to
It is preferably about 650 ° C. As is well known, the working temperature Tw means that the viscosity of glass is 10 ⁴ poise.
Is the temperature at which

Since the soft magnetic thin film 4 having high heat resistance is used in the present invention, coercive force Hc is 2 Oe or less, particularly 1 Oe or less even when using such Tw glass in an atmosphere containing oxygen. Holds the value of. The fused glass 3 is not particularly limited, but lead silicate glass is preferably used.
Among these, for example, the glasses shown below are suitable.

PbO: about 67.5 to 87.5% by weight B ₂ O ₃ : about 4.0 to 8.1% by weight SiO ₂ : about 7.5 to 16.6% by weight Al ₂ O ₃ : 0. 3 to 0.8% by weight ZnO: 2.2 to 3.3% by weight Bi ₂ O ₃ : 0 to 0.1% by weight Na ₂ O, K ₂ O, CaO, etc .: 0 to 4% by weight sb ₂ O _3: about 0-1 wt%

The welding is carried out by the usual method with the welding temperature near the working temperature Tw. In this case, it is preferable that the welding process also serves as the heat treatment of the soft magnetic thin film 4. The welding atmosphere is 1 to 100 pp as described above.
It is preferable to use an inert gas atmosphere containing m 2 of oxygen. When welding at a temperature higher than 650 ° C. and up to about 750 ° C., a gap material may be laminated on the exposed end surface of the soft magnetic thin film 4 to cover it, or polishing may be performed after the welding. Alternatively, a long block body may be welded and then cut into chips. However, this consideration is not necessary when the welding temperature is low.

Further, in the present invention, as shown in FIG. 3, a low saturation magnetic flux density alloy thin film 6 having a lower saturation magnetic flux density Bs than the core is formed on the first core 1 and the soft core described above is formed on the second core 2. So-called EDG type MIG with magnetic thin film 4 formed
Type magnetic head. And the above-mentioned M
The same effect as that of the IG type magnetic head can be obtained. In this case, as the low saturation magnetic flux density alloy thin film 6, for example, a low saturation magnetic flux density amorphous thin film shown in Japanese Patent Application No. 63-311591 can be used, and excellent overwrite characteristics and high sensitivity can be obtained. To be

The magnetic head of the present invention is integrated with a slider as required and assembled into a head assembly. Floppy heads for overwriting such as tunnel erase type such as so-called laminate type or bulk type or read / write type without erase head, flying type computer head of monolithic type or composite type, rotary type VTR It is used as various magnetic heads such as heads and R-DAT heads. In this way, various known types of overwrite recording can be performed using the magnetic head of the present invention.

In such a case, if the welding is performed on the low temperature side, in the monolithic type, the formation of the oxide layer can be prevented without performing a treatment such as covering the thin film with the gap material when the core is welded and integrated. On the other hand, even with the composite type, 1
In both the secondary welding and the secondary welding (sealing), formation of an oxide layer can be prevented. However, the welding on the high temperature side requires consideration so as not to expose the thin film to oxygen and subsequent surface core polishing.

After the core is welded and integrated, the working temperature Tw of the sealing glass used for sealing the core on the slider is 350 to 350.
650 ° C, more preferably 400-600 ° C, especially 45
It is preferably about 0 to 600 ° C. Since a soft magnetic thin film having high oxidation resistance is used in the present invention, the oxide layer can be prevented from being formed even if the glass is sealed in an atmosphere containing oxygen by using such a glass. The sealing glass is not particularly limited, but lead silicate glass is preferably used. Among these, for example, the glasses shown below are suitable.

PbO: about 45-65% by weight B ₂ O ₃ : about 1-8% by weight SiO ₂ : about 5-20% by weight Al ₂ O ₃ : about 0.5-2% by weight ZnO: about 1-5% by weight % About Na ₂ O, K ₂ O, CaO, etc .: About 0.1-0.5 wt% Sb ₂ O ₃ : About 0.1-0.5 wt%

The sealing temperature during sealing is around the working temperature Tw, generally 350 to 650 ° C., and the atmosphere is 1 to 100 ppm.
The inert atmosphere containing oxygen is used, and the other conditions are the same as the above heat treatment conditions.

Next, the thin film magnetic head of the present invention will be described. FIG. 4 shows a flying type thin film magnetic head which is a preferred embodiment of the present invention. The thin-film magnetic head shown in FIG. 4 has an insulating layer 81, a lower magnetic pole layer 91, a gap layer 10, an insulating layer 83, a coil layer 11, and an insulating layer 8 on the slider 7.
5, the upper magnetic pole layer 95 and the protective layer 12 are sequentially provided.

In the present invention, the slider 7 may be made of various conventionally known materials, and is made of, for example, ceramics or ferrite. In this case, ceramics, particularly ceramics containing Al ₂ O ₃ —TiC as a main component, ceramics containing ZrO ₂ as a main component, Si
Ceramics containing C as a main component or ceramics containing AlN as a main component are suitable. Incidentally, these may contain Mg, Y, ZrO ₂ , TiO ₂ or the like as an additive. Various conditions such as the shape and size of the slider 7 may be any known ones and are appropriately selected according to the application.

An insulating layer 81 is formed on the slider 7. As the material of the insulating layer 81, any conventionally known material can be used. For example, when a thin film is formed by a sputtering method, SiO ₂ , glass, Al ₂ O ₃ or the like can be used. The insulating layer 81 may have any known film thickness or pattern, for example, a film thickness of 5 to 40.
It is about μm.

The magnetic pole is usually the lower magnetic pole layer 9 as shown.
1 and the upper magnetic pole layer 95. In the present invention,
The above-mentioned MI is formed on the 91 and the top pole layer 95, respectively.
Similar to the case of the G type magnetic head or the EDG type MIG type magnetic head, the soft magnetic thin film of the present invention having the atomic ratio composition represented by the above formula is used. Therefore, a magnetic head having excellent overwrite characteristics and high recording / reproducing sensitivity can be obtained. Note that film formation, heat treatment, and the like may be performed in the same manner as above.

The patterns and film thicknesses of the lower and upper magnetic pole layers 91 and 95 may be any known ones. For example, the thickness of the lower magnetic pole layer 91 may be about 1 to 5 μm, and the thickness of the upper magnetic pole layer 95 may be about 1 to 5 μm. The gap layer 10 is formed between the lower magnetic pole layer 91 and the upper magnetic pole layer 95.

The gap layer 10 is made of Al ₂ O ₃ and SiO.
Various known materials such as ₂ may be used. Further, the pattern, film thickness and the like of the gap layer 10 may be any known one. For example, the film thickness of the gap 10 is 0.2 to 1.0.
It may be about μm.

The material of the coil layer 11 is not particularly limited,
A metal such as Al or Cu which is usually used may be used. There are no restrictions on the winding pattern or winding density of the coil.
A known material may be appropriately selected and used. For example, the winding pattern may be any of a spiral type, a laminated type, a zigzag type, etc. other than the spiral type shown in the drawing. In addition, various vapor phase deposition methods such as a sputtering method and a plating method may be used to form the coil layer 11. In the illustrated example, the coil layer 11 is spirally disposed between the upper and lower magnetic pole layers 91 and 95 as a so-called spiral type, and the insulating layer 83 is provided between the coil layer 11 and the upper and lower magnetic pole layers 91 and 95. 85 are layered.

As the material for the insulating layers 83 and 85, any of the conventionally known materials can be used. For example, when a thin film is formed by a sputtering method, SiO ₂ , glass or A is used.
1 ₂ O ₃ or the like can be used.

A protective layer 12 is provided on the upper magnetic pole layer 95. As the material of the protective layer 12, any conventionally known material can be used, and for example, Al ₂ O ₃ or the like can be used. In this case, as the pattern, the film thickness, etc. of the protective layer 12, any conventionally known one can be used. For example, the film thickness may be about 10 to 50 μm. In the present invention, various resin coat layers may be further laminated.

The manufacturing process of such a thin film magnetic head is as follows.
Usually, it is performed by thin film formation and pattern formation.
As described above, a vapor deposition method which is a conventionally known technique, for example, a vacuum vapor deposition method, a sputtering method, a plating method, or the like may be used for forming the thin film of each layer. The pattern formation of each layer of the thin film magnetic head can be performed by selective etching or selective deposition which is a conventionally known technique. The etching can be performed by wet etching or dry etching. The thin film magnetic head of the present invention is used in combination with a conventionally known assembly such as an arm.

Further, various types of overwrite recording can be performed by using the above-mentioned thin film magnetic head of the present invention. In this case, recording / reproducing can be effectively performed on a magnetic recording medium having a coercive force Hc of 800 Oe or more.

Also in these thin film magnetic heads, heat treatment is performed by annealing, baking, curing or the like of various constituent films. Baking, curing, etc. are 100 in the atmosphere.
Approximately 200 ° C, annealing at 25 in vacuum, etc.
It is performed at a temperature of about 0 to 450 ° C., the heat treatment is effectively performed by annealing, and the formation of the oxide layer is prevented even if the heat treatment is performed in the atmosphere containing oxygen.

Further, in the present invention, a soft magnetic thin film is formed in a pattern between the non-magnetic substrates, or a pair of core halves having the soft magnetic thin film formed between the non-magnetic substrates are butted against each other. A magnetic circuit may be formed from a magnetic thin film to form a magnetic head.

In these various heads, relative humidity 90
%, The formation of the oxide layer is prevented even when exposed to an atmosphere having a temperature of 60 ° C. or more for 72 hours or more.

[0109]

EXAMPLES Hereinafter, the present invention will be described in more detail with reference to specific examples of the present invention.

Example 1 A soft magnetic thin film was formed on a crystallized glass substrate. The soft magnetic thin film was formed by RF magnetron sputtering and had a film thickness of 2 μm. In this case, the sputtering is Fe8
A 5Zr15 (atomic ratio) alloy was used as a target, a Si chip was placed on the target, and the test was performed in an atmosphere containing 10% by volume of N ₂ in Ar. The operating pressure was 0.5 Pa.

On this thin film, S so that the thin film is completely covered.
An iO ₂ film was formed to a thickness of 1000 A and then heat treated. The heat treatment atmosphere was Ar (atmospheric pressure) containing 10 ppm O ₂ , the heat treatment temperature was 650 ° C., and the holding time was 30 minutes. Composition of thin film after heat treatment, saturation magnetic flux density Bs at direct current
(KG), coercive force Hc (Oe) at a frequency of 50 Hz, initial permeability μ5 MHz at a frequency of 5 MHz, and intensity ratio of (200) peak to (110) peak in the X-ray diffraction pattern (2
00) / (100) is shown in Table 1 below.

EPMA is used for composition analysis, VSM is used for Bs measurement, B—H tracer is used for Hc measurement, and 8 is used for μ _i measurement.
The measurement was performed using a square-shaped coil permeability measuring device (applied magnetic field 5 mOe). Regarding magnetic characteristics, Bs13.5kG or more:
Hc of 0.28 Oe or less and μs MHz of 1900 or more were set as a satisfactory level, and ◯ and × were evaluated. In each case, the magnetostriction was within ± 2 × 10 ⁻⁶ and the crystal grain size was 200 A or less.

Next, the end portion of this laminated sample was cut to expose the end surface of the soft magnetic thin film. And this one
540 in Ar atmosphere (1 atm) containing 0 ppm O _2.
Heat treatment was performed at 30 ° C. for 30 minutes. The end face of the soft magnetic thin film of the sample after the heat treatment was observed with an SEM and an optical microscope to measure the thickness of the oxide layer. The results are also shown in Table 1, with ◯ being 0.1 μm or less, x being 1 μm or more, and Δ being the middle.
As a result, it can be seen that the formation of the oxide layer is very effectively prevented. Note that FIG. 5 shows the X-ray diffraction pattern of Sample No. 5 after these heat treatments.

[0114]

[Table 1]

Further, in the above, the thin film on which SiO ₂ was not laminated was heat-treated in a vacuum of 1 × 10 ⁻⁴ Pa or less at 650 ° C. for 30 minutes and then stored at 60 ° C. and 90% RH for 100 hours to change Bs. The rate Bs / Bs0 was measured. In addition, the state of discoloration was observed. The results are shown in Table 2. As a result, it can be seen that the characteristic deterioration due to the formation of the oxide layer is effectively prevented even by using or storing under high temperature and high humidity.

[0116]

[Table 2]

Example 2 As shown in FIG. 1, the first core 1 and the second core 2 having the soft magnetic thin film 4 formed on the facing surface of the gap portion are joined and integrated with each other through the gap 5, and the MIG is formed. Type magnetic head was manufactured. The material of the cores 1 and 2 was Mn-Zn ferrite, the saturation magnetic flux density Bs at direct current was 5000 G, the initial permeability μ _i was 3000, and the coercive force Hc was 0.1 Oe. As the soft magnetic thin film 4, No. 1 and No. 5 of Example 1 were used.

Next, as the gap 51, SiO ₂ was formed into a film by sputtering, and the film thickness was set to 0.3 μm. An adhesive glass having a working temperature Tw of 650 ° C. was used for the gap 53. The gap 53 was formed by sputtering and its thickness was 0.1 μm. When forming these films, a long core half block was used.

The working temperature Tw of the fused glass 3 is 650.
72.23PbO-7.05 B ₂ O ₃ -14.57SiO ₂ -0.55Al ₂ O ₃ -2.75ZnO
-0.05Bi ₂ O ₃ -2.50Na ₂ O-0.30Sb ₂ O ₃ (wt%)
Welding was performed at 50 ° C. for 30 minutes in an Ar atmosphere (atmospheric pressure) containing 10 ppm of O ₂ . Then, the fused and integrated core block was cut to obtain a core chip.

Thereafter, the number of coil turns was 20 × 2, and the slider was fixed and sealed on a slider made of calcium titanate.
The front surface was polished to obtain a composite type floating magnetic head. Sealing glass is 76.0PbO-1 with Tw of 550 ℃
0.0SiO ₂ -5.0ZnO-6.0B ₂ O ₃ -1.5Al ₂ O ₃ -1.5Na ₂ O (wt%)
5 in an Ar atmosphere (1 atm) containing 10 ppm of O _2.
Sealing was performed under the conditions of 40 ° C. and 30 minutes.

A magnetic head manufactured in this way,
Using a hard disk having a coercive force of 1600 Oe, the following characteristics were measured with a track width of 14 μm. In the measurement, the first core 1 was on the hard disk reading side.

(Overwrite characteristic) 1 at 1.25 MHz
The f signal was recorded and then the 2f signal at 2.5 MHz was overwritten. The output of the 1f signal with respect to the output of the 2f signal was calculated, and the overwrite characteristics were evaluated.

(Measurement of Recording / Reproducing Sensitivity) A signal of 5 MHz is recorded, then the recorded signal is reproduced, and the reproduction output voltage value V ′ _PP (peak to peak) at that time is measured.
The measured value V _'PP normalized V _PP (μv / μm /
Turn). The results are shown in Table 3.

FIG. 6 shows an optical microscope photograph of the front surface of the composite type head using the thin film of No. 1 for comparison and FIG. 7 for comparison. From the results shown in Table 3, FIG. 6 and FIG. 7, it is understood that according to the present invention, the characteristic deterioration due to the oxide layer formation is prevented even by the sealing.

[0125]

[Table 3]

Example 3 The evaluation of Example 1 was performed using the samples shown in Table 3 below. From the results shown in Table 4 and Table 5, the effect of the present invention is clear.

[0127]

[Table 4]

[0128]

[Table 5]

[0129]

The soft magnetic thin film of the present invention has extremely high heat resistance. In particular, since it has a strong (100) orientation, it has high saturation magnetic flux density, low coercive force, and high magnetic permeability, and has excellent soft magnetic properties. Furthermore, it has high hardness and high corrosion resistance. Further, it exhibits excellent soft magnetic properties immediately after film formation. Furthermore, when heat treatment is performed, its control is easy. At this time, excellent soft magnetic properties can be obtained without forming an oxide layer even when heat-treated in an atmosphere containing oxygen.

For these reasons, the magnetic head of the present invention is easy to manufacture, has no deterioration in characteristics even when glass welding is performed in an atmosphere containing oxygen, and has high overwrite characteristics and high recording / reproducing sensitivity. It has electromagnetic conversion characteristics and reliability.
Since the soft magnetic thin film of the present invention has excellent corrosion resistance and abrasion resistance, a highly reliable magnetic head can be realized.

[Brief description of drawings]

FIG. 1 is a partial cross-sectional view showing an example of a MIG type magnetic head of the present invention.

FIG. 2 is a partial cross-sectional view showing an example of a MIG type magnetic head of the present invention.

FIG. 3 is a partial cross-sectional view showing an example of an EDG type MIG type magnetic head of the present invention.

FIG. 4 is a partial cross-sectional view showing an example of a thin film magnetic head of the present invention.

FIG. 5 is a graph showing an X-ray diffraction chart of the soft magnetic thin film of the present invention.

FIG. 6 is a drawing-substitute optical microscope photograph showing a metal crystal structure of a magnetic head using the soft magnetic thin film of the present invention.

FIG. 7 is a drawing-substitute optical microscope photograph showing a metal crystal structure of a magnetic head using a comparative soft magnetic thin film.

[Explanation of symbols]

 1 1st core 2 2nd core 3 Welding glass 4 Soft magnetic thin film 5, 51, 53 Gap 6 Low saturation magnetic flux density alloy thin film 7 Slider 81, 83, 85 Insulating layer 91 Lower magnetic pole layer 95 Upper magnetic pole layer 10 Gap layer 11 Coil Layer 12 Protective layer

─────────────────────────────────────────────────── ───

[Procedure amendment]

[Submission date] August 26, 1992

[Procedure Amendment 1]

[Document name to be corrected] Drawing

[Name of item to be corrected] Figure 6

[Correction method] Change

[Correction content]

[Figure 6]

[Procedure Amendment 2]

[Document name to be corrected] Drawing

[Name of item to be corrected] Figure 7

[Correction method] Change

[Correction content]

[Figure 7]

Claims (18)

[Claims] 1. An atomic ratio composition represented by the following formula:
A thin film for a magnetic head, which has a (100) orientation substantially parallel to the film surface and has been heat-treated in an atmosphere containing oxygen. Formula Fe _100-xyz M _x N _y X _z (In the above formula, M is Mg, Ca, Ti, Zr, Hf,
At least one selected from V, Nb, Ta, Mo, W, Mn, and B, X at least one selected from Si, Al, and Cr, 6 ≦ x ≦ 14, 6 ≦ y ≦ 15, 0.6 ≦ y / x ≦ 2.
0 and 0.5 ≦ z ≦ 10. ) 2. The thin film for a magnetic head according to claim 1, wherein the relative intensity ratio of the Fe (200) peak to the Fe (110) peak in X-ray diffraction is 1 or more. 3. The method according to claim 1, wherein 0.6 ≦ y / x ≦ 2.0.
Or the thin film for the magnetic head of 2. 4. The thin film for a magnetic head according to claim 1, wherein 5 <z ≦ 10. 5. An atomic ratio composition represented by the following formula:
A thin film for a magnetic head having uniaxial anisotropy substantially parallel to the film surface. Formula Fe _100-xyz M _x N _y X _z (In the above formula, M is Mg, Ca, Ti, Zr, Hf,
At least one selected from V, Nb, Ta, Mo, W, Mn, and B, X at least one selected from Si, Al, and Cr, 6 ≦ x ≦ 14, 6 ≦ y ≦ 15, 5 <z ≦ 10. ) 6. The thin film for a magnetic head according to claim 5, which is heat-treated in an atmosphere containing oxygen. 7. The thin film for a magnetic head according to claim 1, wherein the thin film for a magnetic head is heat-treated at a temperature of 650 ° C. or lower while being exposed to an atmosphere containing 1 to 100 ppm of oxygen. 8. The thin film for a magnetic head according to claim 1, wherein a heat treatment is performed prior to the heat treatment in the atmosphere containing oxygen. 9. The thin film for a magnetic head according to claim 1, wherein an oxide layer is substantially absent on the end face of the thin film. 10. An Fe (110) peak having an atomic ratio composition represented by the following formula, which is determined by X-ray diffraction.
A thin film for a magnetic head, which has a relative intensity ratio of (200) peaks of 1 or more and prevents oxidative deterioration due to storage or use under high temperature and high humidity. Formula Fe _100-xyz M _x N _y X _z (In the above formula, M is Mg, Ca, Ti, Zr, Hf,
At least one selected from V, Nb, Ta, Mo, W, Mm, and B, X at least one selected from Si, Al, and Cr, 6 ≦ x ≦ 14, 6 ≦ y ≦ 15, 0.6 ≦ y / x ≦ 2.
0 and 0.5 ≦ z ≦ 10. ) 11. The thin film for a magnetic head according to claim 10, which has been subjected to heat treatment. 12. The thin film for a magnetic head according to claim 10, wherein the heat treatment temperature is 200 to 800 ° C. 13. A magnetic head having the thin film according to claim 1. 14. A magnetic head having a thin film according to claim 13, which has the thin film between a pair of cores. 15. The working temperature Tw of the pair of cores is 45.
15. The magnetic head according to claim 14, which is fused and integrated with a fused glass of 0 to 750 ° C. 16. The magnetic head according to claim 15, wherein the pair of fused and integrated cores are sealed to the slider by sealing glass having a working temperature Tw of 350 to 650 ° C. 17. The magnetic head according to claim 13, further comprising an upper magnetic pole layer, a lower magnetic pole layer, and a protective layer, wherein the upper magnetic pole layer and the lower magnetic pole layer are formed of the thin film. 18. A magnetic head according to claim 13, wherein a magnetic circuit formed of the thin film is formed on a substrate.