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JPH06346271A - Nickel laminate and its production - Google Patents

Nickel laminate and its production

Info

Publication number
JPH06346271A
JPH06346271A JP16007993A JP16007993A JPH06346271A JP H06346271 A JPH06346271 A JP H06346271A JP 16007993 A JP16007993 A JP 16007993A JP 16007993 A JP16007993 A JP 16007993A JP H06346271 A JPH06346271 A JP H06346271A
Authority
JP
Japan
Prior art keywords
nickel
nickel layer
layer
electroforming
laminate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16007993A
Other languages
Japanese (ja)
Other versions
JP3270948B2 (en
Inventor
Kazuhiko Inoue
和彦 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyushu Hitachi Maxell Ltd
Maxell Ltd
Original Assignee
Kyushu Hitachi Maxell Ltd
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyushu Hitachi Maxell Ltd, Hitachi Maxell Ltd filed Critical Kyushu Hitachi Maxell Ltd
Priority to JP16007993A priority Critical patent/JP3270948B2/en
Publication of JPH06346271A publication Critical patent/JPH06346271A/en
Application granted granted Critical
Publication of JP3270948B2 publication Critical patent/JP3270948B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Particle Formation And Scattering Control In Inkjet Printers (AREA)

Abstract

PURPOSE:To obtain a nickel laminate excellent in adhesion strength. CONSTITUTION:A first nickel layer 1 as a base material is primarily electroformed with mat nickel, a photoresist film is patterned on the surface of the layer 1, and then a second nickel layer 2 having a specified pattern is secondarily electroformed with bright nickel or mat nickel. Consequently, the layer 2 is not peeled off from the layer 1 even when the laminate is vibrated or bent, and a laminate excellent in adhesion is obtained.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、例えばインクジェット
用ノズル振動板のように耐振動性が要求される部品や電
子部品用チップ挿入用治具などに好適に用いられる、密
着良好なニッケル積層体並びにその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a nickel laminate having good adhesion, which is suitable for use in components requiring vibration resistance such as ink jet nozzle diaphragms and chip insertion jigs for electronic components. And the manufacturing method thereof.

【0002】[0002]

【従来の技術】従来、例えばインクジェット用ノズル振
動板は、エッチングで作られるのが一般的である。その
エッチングに際しては、図4の(A)に示すようにSU
S材10(15〜20μ厚)の裏面側にポリイミド11
をコートし、ついで同図の(B)に示すようにSUS材
10の表面にレジスト膜12をパターンニング形成し、
ついで同図の(C)に示すようにエッチング処理する。
最後に、同図の(D)に示すようにレジスト膜12を除
去してインクジェット用ノズル振動板13を得る(文献
不詳)。
2. Description of the Related Art Conventionally, for example, an ink jet nozzle diaphragm is generally made by etching. At the time of etching, as shown in FIG.
Polyimide 11 on the back side of S material 10 (15 to 20 μm thick)
And then patterning a resist film 12 on the surface of the SUS material 10 as shown in FIG.
Then, an etching process is performed as shown in FIG.
Finally, the resist film 12 is removed to obtain an inkjet nozzle vibrating plate 13 as shown in FIG.

【0003】[0003]

【発明が解決しようとする課題】しかるに、ポリイミド
11をベース材として使用すると、金属に比べて耐久性
に劣り、SUS材10との密着もあまり良くない。ま
た、エッチング時にダレが発生し易く、高精度な形状の
ものが得難い。そこで、本発明者達は、耐久性に優れ、
また高精度なインクジェット用ノズル振動板を得ること
を期してニッケル電鋳でそれを作ることを試みた。ベー
ス材として第1ニッケル層を通常の光沢ニッケル浴で1
次電鋳で形成し、ついで、その第1ニッケル層の表面に
フォトレジスト膜をパターンニング形成した後、第1ニ
ッケル層のフォトレジスト膜で覆われていない表面に第
2ニッケル層を2次電鋳する試みである。
However, when the polyimide 11 is used as the base material, the durability is inferior to that of metal and the adhesion with the SUS material 10 is not so good. In addition, sagging easily occurs during etching, and it is difficult to obtain a highly precise shape. Therefore, the present inventors have excellent durability,
In addition, in order to obtain a highly accurate nozzle diaphragm for inkjet, we tried to make it by nickel electroforming. 1st nickel layer as a base material in a normal bright nickel bath
Then, a photoresist film is patterned on the surface of the first nickel layer, and then a second nickel layer is formed on the surface of the first nickel layer which is not covered by the photoresist film. It is an attempt to cast.

【0004】しかし、第1ニッケル層と第2ニッケル層
は密着しにくく、剥がれ易かった。これはベース材とし
て第1ニッケル層を光沢ニッケル浴で電鋳することに原
因があることを確認した。この理由については定かでな
いが、そのひとつとして考えられるのは、ブチンジオー
ル、あるいはサッカリンやNTSなどの光沢剤を添加し
たスルファミン酸ニッケル浴でベース材の第1ニッケル
層を1次電鋳した場合は、その第1ニッケル層にイオウ
やカーボンの含有量が多くなるため、1次電鋳後2次電
鋳するまでの間に、その表面に酸化皮膜ができたり、ア
ルカリ現像液などの薬品付着などで第1ニッケル層の表
面状態が変化する。そのため、その第1ニッケル層の表
面に対し第2ニッケル層が組成的に密着しにくくなるも
のと考えられる。そのほかに、第1ニッケル層の光沢表
面の結晶がち密になるため、第2ニッケル層が物理的に
も密着しにくいかと考えられる。
However, the first nickel layer and the second nickel layer were difficult to adhere to each other and were easily peeled off. It was confirmed that this was due to electroforming the first nickel layer as a base material in a bright nickel bath. The reason for this is not clear, but one of the possible reasons is that when the primary nickel layer of the base material is subjected to primary electroforming in a nickel sulfamate bath containing butynediol or a brightener such as saccharin or NTS. Since the first nickel layer contains a large amount of sulfur and carbon, an oxide film may be formed on the surface of the first nickel layer between the first electroforming and the second electroforming, and chemicals such as alkaline developer may be attached. The surface condition of the first nickel layer changes. Therefore, it is considered that the second nickel layer is compositionally difficult to adhere to the surface of the first nickel layer. In addition, since the crystals on the glossy surface of the first nickel layer are densely packed, it is considered that the second nickel layer is hard to physically adhere.

【0005】本発明は、こうした点に鑑みてなされたも
ので、ニッケル層相互間の密着性に優れるニッケル積層
体並びにその製造方法を提供せんとするものである。
The present invention has been made in view of these points, and an object thereof is to provide a nickel laminate having excellent adhesion between nickel layers and a method for producing the same.

【0006】[0006]

【課題を解決するための手段】本発明のニッケル積層体
は、1次電鋳された第1ニッケル層1の表面に、所定パ
ターンを持つ第2ニッケル層2を2次電鋳してなり、第
1ニッケル層1は光沢剤を添加しない無光沢ニッケルで
形成してなるものである。
A nickel laminate of the present invention is obtained by secondary electroforming a second nickel layer 2 having a predetermined pattern on the surface of a primary electroformed first nickel layer 1. The first nickel layer 1 is made of matte nickel to which no brightener is added.

【0007】本発明のニッケル積層体を製造するに際し
ては、電鋳母型3の表面に無光沢ニッケル浴で第1ニッ
ケル層1を1次電鋳する工程と、第1ニッケル層1の表
面にフォトレジスト膜6をパターンニング形成する工程
と、第1ニッケル層1のフォトレジスト膜6で覆われて
いない表面に第2ニッケル層2を2次電鋳する工程と、
電鋳母型3から第1ニッケル層1を第2ニッケル層2ご
と剥離する工程とからなる。
In the production of the nickel laminate of the present invention, a step of primary electroforming the first nickel layer 1 on the surface of the electroforming mold 3 with a matte nickel bath, and a step of forming the first nickel layer 1 on the surface A step of patterning the photoresist film 6, and a step of secondarily electroforming the second nickel layer 2 on the surface of the first nickel layer 1 which is not covered with the photoresist film 6.
And a step of peeling the first nickel layer 1 together with the second nickel layer 2 from the electroforming mold 3.

【0008】ここで、肝要なことは、第1ニッケル層1
を無光沢ニッケル電鋳で形成することで、第2ニッケル
層2は光沢ニッケルあるいは無光沢ニッケルのいずれの
電鋳で形成するかは任意である。ここに、光沢剤を添加
しない無光沢ニッケルとは、建浴後に意図的に光沢剤を
添加しないことを意味し、浴に不純物としてカーボンが
入っている場合その許容範囲は0.012%以下とする。
それ以上含まれると、光沢ニッケルで第1ニッケル層を
形成する場合と同様に良好な密着性が得られないからで
ある。
Here, it is important that the first nickel layer 1
It is arbitrary whether the second nickel layer 2 is formed by electroforming of bright nickel or dull nickel by electroforming of dull nickel. Here, matte nickel with no brightener added means that no brightener is intentionally added after the construction bath, and when carbon is contained as an impurity in the bath, the allowable range is 0.012% or less. To do.
This is because if it is contained more than that, good adhesion cannot be obtained as in the case of forming the first nickel layer with bright nickel.

【0009】[0009]

【作用】無光沢ニッケルで電鋳される第1ニッケル層1
は光沢ニッケルで形成されるものよりも表面の結晶が粗
く、梨地状になり、第2ニッケル層2が物理的に強固に
密着し易くなる。また、第1ニッケル層1を無光沢ニッ
ケルで電鋳すると、カーボンやイオウの含有量が僅少で
あるか、全く含まないため、第1ニッケル層1の表面状
態の変化が少なく、組成的にも第2ニッケル層2との密
着力を高めることができる。
Function: First nickel layer 1 electroformed with matte nickel
Has a crystal on the surface that is rougher than that formed by bright nickel, and has a satin-like texture, and the second nickel layer 2 is likely to be physically and firmly adhered. Further, when the first nickel layer 1 is electroformed with matte nickel, the content of carbon or sulfur is very small or not contained at all, so that the surface condition of the first nickel layer 1 is not significantly changed, and the composition is also improved. The adhesion with the second nickel layer 2 can be enhanced.

【0010】[0010]

【実施例】図1は本発明の対象とするニッケル積層体を
示しており、ベース材となる第1ニッケル層1の表面に
所定パターンを持つ第2ニッケル層2を積層してなる。
このようなニッケル積層体の電鋳法の一例を図2の
(A)ないし(G)に基づき説明する。まず、電鋳母型
3を無光沢ニッケル浴の電解液に浸漬して該母型3の表
面に1次電鋳を行う。この無光沢ニッケル浴の組成とメ
ッキ条件を次に示す。 スルファミン酸ニッケル 450g/l ホウ酸 30g/l pH 4〜4.5 浴温 50℃ 電流密度 2A/dm2 〜7A/dm2 以上の浴にて電鋳を行うことにより、図2の(A)に示
すように、電鋳母型3の表面に第1ニッケル層1を形成
する。この第1ニッケル層1の厚みは、例えば15μ程
度にする。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows a nickel laminated body to which the present invention is applied, in which a second nickel layer 2 having a predetermined pattern is laminated on the surface of a first nickel layer 1 serving as a base material.
An example of the electroforming method of such a nickel laminated body will be described with reference to FIGS. First, the electroforming mother die 3 is immersed in an electrolytic solution of a matte nickel bath to perform primary electroforming on the surface of the mother die 3. The composition and plating conditions of this matte nickel bath are shown below. Nickel sulfamate 450 g / l Boric acid 30 g / l pH 4 to 4.5 Bath temperature 50 ° C. Current density 2 A / dm 2 to 7 A / dm By performing electroforming in a bath of 2 or more, (A) of FIG. As shown in FIG. 1, the first nickel layer 1 is formed on the surface of the electroforming mold 3. The thickness of this first nickel layer 1 is, eg, about 15 μm.

【0011】ついで、この第1ニッケル層1を付けた電
鋳母型3を上記浴より引き上げ、同図の(B)に示すご
とく第1ニッケル層1の表面にネガタイプのフォトレジ
スト4を均一に塗布して乾燥させるか、またはラミネー
トする。ついで、そのレジスト4の上に同図の(C)に
示すごとく所望のパターンに対応するネガタイプフイル
ム5を密着させ、焼き付け、現像の各処理を行って、同
図の(D)に示すごとく所望パターンのフォトレジスト
膜6を形成する。勿論、上記フォトレジスト4として
は、ネガタイプのものに代えて、ポジタイプのものであ
ってもよい。
Then, the electroforming mold 3 having the first nickel layer 1 attached thereto is lifted from the bath, and a negative type photoresist 4 is uniformly formed on the surface of the first nickel layer 1 as shown in FIG. Apply and dry or laminate. Then, a negative type film 5 corresponding to a desired pattern is brought into close contact with the resist 4 as shown in (C) of the figure, and each process of baking and developing is performed to obtain the desired pattern as shown in (D) of the figure. A patterned photoresist film 6 is formed. Of course, the photoresist 4 may be a positive type instead of the negative type.

【0012】ついで、このフォトレジスト膜6が形成さ
れた電鋳母型3を、光沢ニッケル浴に移して2次電鋳を
行う。この光沢ニッケル浴の組成とメッキ条件を次に示
す。 スルファミン酸ニッケル 450g/l ブチンジオール 0.005〜0.01g/l NTS 0.01〜0.05g/l ホウ酸 30g/l pH 4〜4.5 浴温 50℃ 以上の浴にて電流密度2A/dm2 〜7A/dm2 で電
鋳を行うことにより、同図の(E)に示すごとく第1ニ
ッケル層1のフォトレジスト膜6で覆われていない表面
に、第2ニッケル層2を形成する。この第2ニッケル層
2の厚みは30μ程度とする。
Then, the electroforming mold 3 having the photoresist film 6 formed thereon is transferred to a bright nickel bath for secondary electroforming. The composition and plating conditions of this bright nickel bath are shown below. Nickel sulfamate 450 g / l Butynediol 0.005 to 0.01 g / l NTS 0.01 to 0.05 g / l Boric acid 30 g / l pH 4 to 4.5 Bath temperature 50A or above Current density 2A / Dm 2 to 7 A / dm 2 , electroforming is performed to form the second nickel layer 2 on the surface of the first nickel layer 1 not covered with the photoresist film 6 as shown in FIG. To do. The thickness of the second nickel layer 2 is about 30 μm.

【0013】この第2ニッケル層2の電鋳後、フォトレ
ジスト膜6を除去し、同図の(F)に示すごとく電鋳母
型3から第1ニッケル層1を第2ニッケル層2ごと剥離
する。かくして、同図の(G)および図2に示すごとき
ニッケル積層体電鋳製品が得られる。
After the electroforming of the second nickel layer 2, the photoresist film 6 is removed, and the first nickel layer 1 is peeled off together with the second nickel layer 2 from the electroforming mold 3 as shown in FIG. To do. Thus, a nickel laminate electroformed product as shown in FIG. 2G and FIG. 2 is obtained.

【0014】このようにして得られたニッケル積層体の
第1・第2ニッケル層1・2相互間の密着強さをテスト
してみた。すなわち、このニッケル積層体に振動を加え
てみたが、光沢ニッケルで形成する第1ニッケル層と第
2ニッケル層の積層体のごとき第2ニッケル層2が第1
ニッケル層1から剥がれるようなことがなく、完全に密
着していた。また、ニッケル積層体を第1ニッケル層1
側に折り曲げて第1・第2ニッケル層1・2相互間の一
端に剥離応力を加えてみたが、電子顕微鏡で拡大して見
た図3に示すようにその接合部の剥がれが無く、むしろ
第1ニッケル層1の第2ニッケル層2との接合部Cとは
異なり、その近傍の第1ニッケル層1の第2ニッケル層
2で覆われていない露出表面部の箇所Dが引きちぎれる
様な破壊状態が認められ、ニッケル層1・2相互間がい
かに強く密着しているかがよく判った。
The adhesion strength between the first and second nickel layers 1 and 2 of the nickel laminated body thus obtained was tested. That is, although vibration was applied to this nickel laminated body, the second nickel layer 2 such as a laminated body of the first nickel layer and the second nickel layer formed of bright nickel is
It did not peel off from the nickel layer 1, and it was in perfect contact. In addition, the nickel laminate is used as the first nickel layer 1
It was bent to the side and a peeling stress was applied to one end between the first and second nickel layers 1 and 2, but there was no peeling of the joint as shown in FIG. Unlike the joint portion C of the first nickel layer 1 with the second nickel layer 2, the portion D of the exposed surface portion of the first nickel layer 1 which is not covered with the second nickel layer 2 in the vicinity thereof is torn off. A fractured state was recognized, and it was clearly understood how strongly the nickel layers 1 and 2 were closely attached.

【0015】第2ニッケル層2は光沢ニッケルあるいは
無光沢ニッケルのいずれの電鋳で形成しても、第1ニッ
ケル層1との密着性に優れるが、上記実施例のように第
2ニッケル層2をブチンジオールを添加する光沢ニッケ
ル浴で電鋳した場合は、腐食環境においてイオウを含む
第2ニッケル層2がイオウを含まない第1ニッケル層1
に対してアノードとして作用し、腐食は第2ニッケル層
2で止まるため耐蝕性を向上させることができる。
Although the second nickel layer 2 is formed by electroforming either bright nickel or dull nickel, it has excellent adhesion to the first nickel layer 1, but as in the above-mentioned embodiment, the second nickel layer 2 is formed. When electroforming is carried out in a bright nickel bath containing butynediol, the second nickel layer 2 containing sulfur is the first nickel layer 1 containing no sulfur in a corrosive environment.
On the other hand, it acts as an anode, and the corrosion stops at the second nickel layer 2, so that the corrosion resistance can be improved.

【0016】なお、第2ニッケル層2は通常、上記のご
とく2〜7A/dm2 程度の電流密度で形成することが
多いが、好ましくは0.5〜1A/dm2 の低電流密度で
第2ニッケル層2を形成すれば、電着時間は長くかかる
が、第1ニッケル層1との親和力が向上し、より一層良
好な密着性が得られる。
The second nickel layer 2 is usually formed at a current density of about 2 to 7 A / dm 2 as described above, but preferably at a low current density of 0.5 to 1 A / dm 2 . If the two-nickel layer 2 is formed, the electrodeposition time will be long, but the affinity with the first nickel layer 1 will be improved, and even better adhesion can be obtained.

【0017】[0017]

【発明の効果】本発明によれば、1次電鋳された第1ニ
ッケル層1の表面に所定パターンを持つ第2ニッケル層
2を形成してなる積層体において、その第1ニッケル層
1を光沢剤を添加しない無光沢ニッケルで形成するの
で、密着性に優れるニッケル積層体を得ることができ、
例えば、耐振動性の要求されるインクジェット用ノズル
振動板などの部品に好適に使用することができる。
According to the present invention, the first nickel layer 1 is formed in the laminated body in which the second nickel layer 2 having a predetermined pattern is formed on the surface of the first electroformed first nickel layer 1. Since it is made of matte nickel without the addition of a brightener, a nickel laminate with excellent adhesion can be obtained,
For example, it can be suitably used for parts such as ink jet nozzle diaphragms that require vibration resistance.

【図面の簡単な説明】[Brief description of drawings]

【図1】ニッケル積層体の一部を切欠して示す斜視図で
ある。
FIG. 1 is a perspective view showing a nickel laminate with a part cut away.

【図2】ニッケル積層体の電鋳工程図である。FIG. 2 is an electroforming process diagram of a nickel laminate.

【図3】ニッケル積層体の密着強さをテストしてみた状
態を示すその一部斜視図である。
FIG. 3 is a partial perspective view showing a state in which the adhesion strength of the nickel laminate is tested.

【図4】従来のエッチング法によるインクジェット用ノ
ズル振動板のエッチング工程図である。
FIG. 4 is an etching process diagram of an inkjet nozzle diaphragm according to a conventional etching method.

【符号の説明】[Explanation of symbols]

1 第1ニッケル層 2 第2ニッケル層 3 電鋳母型 6 フォトレジスト膜 1 First Nickel Layer 2 Second Nickel Layer 3 Electroforming Master 6 Photoresist Film

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 1次電鋳された第1ニッケル層1の表面
に、所定パターンを持つ第2ニッケル層2を2次電鋳し
てなり、第1ニッケル層1は光沢剤を添加しない無光沢
ニッケルで形成されていることを特徴とするニッケル積
層体。
1. A second nickel layer 2 having a predetermined pattern is secondarily electroformed on a surface of the first electroformed first nickel layer 1, and the first nickel layer 1 does not include a brightening agent. A nickel laminate characterized by being formed of bright nickel.
【請求項2】 電鋳母型3の表面に無光沢ニッケル浴で
第1ニッケル層1を1次電鋳する工程と、 第1ニッケル層1の表面にフォトレジスト膜6をパター
ンニング形成する工程と、 第1ニッケル層1のフォトレジスト膜6で覆われていな
い表面に第2ニッケル層2を2次電鋳する工程と、 電鋳母型3から第1ニッケル層1を第2ニッケル層2ご
と剥離する工程とからなるニッケル積層体の製造方法。
2. A step of primary electroforming the first nickel layer 1 on the surface of the electroforming mold 3 in a matte nickel bath, and a step of patterning a photoresist film 6 on the surface of the first nickel layer 1. And a step of secondary electroforming the second nickel layer 2 on the surface of the first nickel layer 1 which is not covered with the photoresist film 6, and from the electroforming mold 3 to the first nickel layer 1 to the second nickel layer 2 A method for manufacturing a nickel laminate, comprising:
JP16007993A 1993-06-03 1993-06-03 Nickel laminate and method for producing the same Expired - Fee Related JP3270948B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16007993A JP3270948B2 (en) 1993-06-03 1993-06-03 Nickel laminate and method for producing the same

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10172529A (en) * 1996-12-09 1998-06-26 Oputonikusu Seimitsu:Kk Manufacture of battery explosion-proof safety piece
JPH1194196A (en) * 1997-09-18 1999-04-09 Oputonikusu Seimitsu:Kk Explosion-proof safety valve for battery and manufacture therefor
JP2002180282A (en) * 2000-12-20 2002-06-26 Kyushu Hitachi Maxell Ltd Electroformed metal and its manufacturing method
JP2002356793A (en) * 2001-05-30 2002-12-13 Kyushu Hitachi Maxell Ltd Electrocasting metal and method of manufacturing for the same
JP2022551136A (en) * 2019-10-24 2022-12-07 イルジン マテリアルズ カンパニー リミテッド Nickel foil for manufacturing thin-film capacitors and method for manufacturing same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10172529A (en) * 1996-12-09 1998-06-26 Oputonikusu Seimitsu:Kk Manufacture of battery explosion-proof safety piece
US6180279B1 (en) 1996-12-09 2001-01-30 Optnics Precision Co., Ltd. Method of manufacturing battery explosion prevention safety device
JPH1194196A (en) * 1997-09-18 1999-04-09 Oputonikusu Seimitsu:Kk Explosion-proof safety valve for battery and manufacture therefor
JP2002180282A (en) * 2000-12-20 2002-06-26 Kyushu Hitachi Maxell Ltd Electroformed metal and its manufacturing method
JP4674735B2 (en) * 2000-12-20 2011-04-20 九州日立マクセル株式会社 Method for producing electroformed metal
JP2002356793A (en) * 2001-05-30 2002-12-13 Kyushu Hitachi Maxell Ltd Electrocasting metal and method of manufacturing for the same
JP2022551136A (en) * 2019-10-24 2022-12-07 イルジン マテリアルズ カンパニー リミテッド Nickel foil for manufacturing thin-film capacitors and method for manufacturing same

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