JPH06331816A - Color filter - Google Patents

Abstract

PURPOSE:To improve the accuracy in the pattern edge parts of black matrix patterns by setting the film thickness of a photoresist as far as possible, thereby eliminating an increase in pattern exposing time and preventing the generation of halation on a glass substrate surface in the case of formation of the black matrix patterns by a photofabriation (photolithography method) using a light shieldable pigment dispersed photoresist. CONSTITUTION:This color filter has the black matrix patterns 2, filter color patterns 5 composed of respective colored patterns B, G, R and a transparent conductive layer, etc., on a glass substrate 1. The black matrix patterns 2 are composed of the first pattern layer 3 formed of a light shieldable nonphotosensitive resin and a second pattern layer 4 formed of a light shieldable photosensitive resin layer matched and laminated on the first pattern layer.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glass substrate on which a black matrix pattern, Blue, Green, R
ed The present invention relates to a color filter for a liquid crystal display device or the like, which includes a filter color pattern composed of each colored pattern and a transparent conductive film or the like as appropriate.

[0002]

2. Description of the Related Art As shown in FIG. 3A, a conventional color filter for a liquid crystal display device or the like has a light-shielding property (or light-absorbing property) such as regular parallel lines or grids on a glass substrate 11. 3), the black matrix pattern 12 of FIG.
(B) Bl between the black matrix patterns 12
A filter color pattern 15 including ue, green, and red color patterns is provided, and a transparent protective film or a transparent conductive film (not shown) is appropriately laminated on the black matrix pattern 12 and the filter color pattern 15. Has been done.

In the above color filter, it is necessary to arrange the black matrix pattern 12 and the filter color pattern 15 so as to be in close contact with each other so that no void is formed in the adjacent portion between the black matrix pattern 12 and the filter color pattern 15. Therefore, the filter color pattern 15 is provided so as to overlap the black matrix pattern 12.

The black matrix pattern 12 is
When forming a pattern on the glass substrate 11, a chromium vapor deposition thin film formed on the glass substrate 11 by a metal vapor deposition method is patterned by a pattern etching method, or
Pattern formation is performed by a photofabrication (photolithography) method using a pigment dispersion photoresist in which black and dark color pigments are dispersed in a photoresist, or pattern formation is performed by a intaglio offset printing method using a printing ink.

In the pattern etching method of the above chromium vapor deposition thin film, the production cost of chromium metal vapor deposition is higher than that of other methods. Therefore, a pattern is formed by photofabrication (photolithography) method using a pigment dispersion photoresist. Is being formed.

[0006]

When the black matrix pattern 12 is patterned by a photofabrication (photolithography) method using a pigment-dispersed photoresist, the pattern exposure light beam in the photofabrication is a pigment. Before reaching the surface of the glass substrate 11 through the dispersed photoresist film, the amount of light that is actually absorbed by the black pigment of the pigment-dispersed photoresist film and reaches the surface of the glass substrate is 1/1.
It is only 00 to 1/10000.

Therefore, it is necessary to take a long exposure time for the pattern exposure, but due to the lengthening of the exposure time, halation occurs on the surface of the glass substrate 11 by the exposure light beam, and the pattern edge portion of the black matrix pattern 12 formed. Tended to cause a decrease in accuracy.

In such pattern formation, it is considered that the film thickness of the pigment-dispersed photoresist is made as thin as possible to reduce the optical density in order to avoid the lengthening of the exposure time. In order to obtain the optical density of the black matrix pattern 12 formed in the above, it is necessary to increase the film thickness of the pigment-dispersed photoresist as much as possible. It was difficult to control.

According to the present invention, when a black matrix pattern is formed by a photofabrication (photolithography) method using a light-shielding pigment-dispersed photoresist, the thickness of the photoresist is set as small as possible and the pattern is formed. It is intended to prevent the occurrence of halation on the glass substrate surface by eliminating the lengthening of the exposure time, and to improve the accuracy of the pattern edge portion of the black matrix pattern.

[0010]

The present invention provides a glass substrate 1
Black matrix pattern 2 on top, and Blue, Gr
The black matrix pattern 2 is provided with a first pattern layer 3 formed of a light-shielding non-photosensitive resin, and a first color layer 3 including a filter color pattern 5 including een and Red color patterns and a transparent conductive layer. A color filter comprising: a second pattern layer 4 formed of a light-shielding photosensitive resin layer, which is aligned and laminated on the pattern layer.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The color filter of the present invention will be described in detail below with reference to one embodiment shown in FIGS. 1 and 2. As shown in FIG. 1, a regular parallel line pattern is formed on a transparent glass substrate 1. A black matrix pattern 2 having a light-shielding property (or a light-absorbing property) such as a grid pattern is provided.

The black matrix pattern 2 is a light-shielding black pigment (or a dark color pigment such as dark blue).
A first pattern layer 3 formed of a light-shielding non-photosensitive resin using a non-photosensitive polyimide-based resin (polyimide acid resin or polyimide resin) such as acrylic-based or styrene-based resin in which 1 Photosensitive photocrosslinkable photoresist (main resin and main resin monomer) in which light-shielding black pigments (or dark color pigments such as dark blue) laminated in one pattern layer 3 are dispersed. The second pattern layer 4 is formed of a light-shielding photosensitive resin layer using a polymerization initiator or a resin monomer and a polymerization initiator).

In the color filter of the present invention, as shown in FIG.
A filter color pattern 5 composed of e, Green, and Red color patterns is provided. Above the black matrix pattern 2 and the filter color pattern 5, although not shown, a transparent conductive film or the like (indium is doped with tin) is appropriately provided. The above-mentioned ITO film or an ITO film laminated via a transparent protective layer) is laminated.

In the color filter of the present invention,
As in the conventional case, the black matrix pattern 2 and the filter color pattern 5 are arranged in close contact with each other so that no void is formed in the adjacent portion between the black matrix pattern 2 and the filter color pattern 5. And the edge portions of the filter color pattern 5 are adjacent to each other, or the filter color pattern 5 is provided on the black matrix pattern 2 such that the edge portions overlap each other.

When the black matrix pattern 2 is formed on the glass substrate 1, the glass substrate 1 is used.
A non-photosensitive polyimide resin, in which black and dark color pigments are dispersed and mixed, is applied over the entire surface to a uniform film thickness and dried to form a light-shielding non-photosensitive colored resin film (later the first pattern). Layer 3) is formed, a pigment-dispersed photoresist in which a black and dark color pigment is dispersed and mixed in the photoresist is applied on the colored resin layer and dried.
The pigment-dispersed photoresist is subjected to pattern exposure (exposure using a master plate such as a photomask or electron beam exposure) into a black matrix pattern having a shape corresponding to the black matrix pattern 2 by photofabrication (photolithography method), and development processing. Then, a resist pattern having a shape corresponding to the black matrix pattern 2 (which will later become the second pattern layer 4) is formed, and then the resist pattern is subjected to an etching process using the resist pattern as an etching mask. As shown in FIG. On 1,
The black matrix pattern 2 including the first pattern layer 3 and the second pattern layer 4 which is aligned and laminated on the first pattern layer 3 is formed.

The pigment-dispersed photoresist which becomes the second pattern layer 4 applied on the first pattern layer 3 is
It can be applied to a film thinner than the applied film thickness of the first pattern layer 3 to the extent that it does not interfere with the etching mask.

In the color filter of the present invention, a filter color pattern consisting of blue, green, and red colored patterns is formed on a portion of the glass substrate 1 after the black matrix pattern 2 is formed, except for the area where the black matrix pattern 2 is formed. In the case of forming the pattern No. 5, a method similar to the method of forming the filter color pattern of the conventional color filter, for example, a transparent photosensitive liquid with good dyeability such as gelatin and Blue, Green, Re
The relief dyeing method using each of the dyes of d and the above-mentioned Blu
e, Green, Red pigment dispersion photoresist method using each pigment dispersion photoresist, and Blue, Gre
1. An organic filter color pattern forming method by a printing method such as an intaglio offset printing method using each of en and Red colored printing inks, or titanium oxide (TiO ₂ , light refractive index;
40), silicon oxide (SiO ₂ , optical refractive index; 1.46), and other dielectric films are laminated by vapor deposition, and the interference colors of blue, green, and red (polarization filters) are combined depending on the layer thickness and combination. ) Is formed by an inorganic filter color pattern forming method by a dielectric multilayer film method, the black matrix pattern 2 and the filter color pattern 5 are closely adjacent to each other at their edges, or the filter color pattern 5 is formed on the black matrix pattern 2. The filter color pattern 5 is formed so that the edges thereof overlap.

Specific examples of the method of forming the black matrix pattern 2 on the glass substrate 1 in the color filter of the present invention will be described below.

Example 1 2 parts by weight of carbon black was added to 10 parts by weight of a non-photosensitive polyimide resin (SP912; manufactured by Toray Industries, Inc.) on a transparent glass substrate, and a pyrrole solvent (N- Methyl-pyrrolidone) and other suitable organic solvent are kneaded and dispersed in a ball mill (three rolls) for light shielding (light absorption) non-photosensitive resin (optical density: 1 to
2) with a spin coater to a film thickness of 0.5 μm to 1.0 μm
(For example, film thickness: 0.8 μm, optical density: 0.5 is suitable), and then dried at 110 ° C. for 30 minutes to form a light-shielding (light-absorbing) non-photosensitive resin layer (later 1 pattern layer) is formed.

Subsequently, on the light-shielding non-photosensitive resin layer (non-photosensitive polyimide resin layer), a photosensitive photoresist (for example, photo black, CK-2000, optical, etc.) such as acrylic resin colored in black is used. Concentration: 1-2; made by Fuji Hunt Co., Ltd.) with a spin coater to a film thickness of 0.5 μm to 1.0 μ
m (for example, film thickness; 1 μm, optical density; 0.8 is suitable)
Was uniformly applied and dried to form a light-shielding photosensitive photoresist layer (which will later become the second pattern layer).

In this way, the light-shielding non-photosensitive resin layer serving as the first pattern layer and the light-shielding photosensitive photoresist layer serving as the second pattern layer are laminated on the glass substrate. The thickness is 1-2 μm and the total optical density is 2-4.

Next, on the light-shielding photosensitive photoresist layer, mask pattern exposure with ultraviolet rays (or electron beams) having a shape corresponding to the black matrix pattern or beam exposure processing is performed, and development processing is performed with an alkaline solution. The light-shielding photosensitive photoresist layer was patterned to form a resist pattern having a shape corresponding to the black matrix pattern.

Next, by using the resist pattern as an etching mask, the lower non-photosensitive resin layer is removed by etching with the organic solvent (for example, a pyrrole solvent), whereby the first pattern layer and the first pattern layer are removed. A black matrix pattern was formed by the second pattern layer which was aligned and laminated on the layer.

After that, the black matrix pattern formed on the glass substrate is, for example, 120 if necessary.
C. to 200.degree. C., heating for 5 minutes to 30 minutes, baking the first pattern layer made of a non-photosensitive polyimide resin which is a light-shielding non-photosensitive resin layer (or heat-condensing in the case of non-photosensitive polyamic acid). Made into a polyimide) and treated with chemical resistance.

[0025]

The color filter of the present invention comprises a glass substrate,
A first pattern layer 3 formed of a light-shielding non-photosensitive resin in which a black pigment is dispersed, and a light-shielding photosensitive resin in which a black pigment dispersed in alignment with the first pattern layer 3 is dispersed. Since the black matrix pattern 2 having a two-layer structure with the second pattern layer 4 formed of a layer is provided, the approximate light-shielding property of the black matrix pattern 2 is the same as that of the first pattern layer 3 made of a light-shielding non-photosensitive resin. The second pattern layer 4 made of a photosensitive resin layer having a light-shielding property can be set to have a relatively thin film thickness that can withstand as an etching mask, and therefore can be obtained only by the film thickness. The need to lengthen the exposure time is eliminated.

Therefore, it is possible to reduce the occurrence of halation on the surface of the glass substrate 1 due to the exposure light beam, and prevent the accuracy of the pattern edge portion of the black matrix pattern from decreasing.

Since the second pattern layer 4 of the color filter of the present invention is formed by pattern exposure and development using a light-shielding photosensitive resin, the first pattern layer 4 is used as an etching mask. After patterning the pattern layer 3 by etching, the second pattern layer 4 is again subjected to additional development processing so that only the width of the image area of the second pattern layer 4 is reduced. It is possible to perform an adjusting operation for making the width slightly thinner, and as a result, a step portion along the edge of the first pattern layer 3 due to the difference in the drawing width between the first pattern layer 3 and the second pattern layer 4 is formed. Can be formed.

Therefore, when arranging the black matrix pattern 2 and the filter color pattern 3 adjacent to each other in the color filter so as to be in close contact with each other, the filter color pattern 3 in which the step portion overlaps the black matrix pattern 2 is arranged. It is possible to eliminate swelling (formation of protrusions) of the edge portion, and to form a color filter alignment film for a liquid crystal display device (LCD), and with a counter electrode plate that is overlaid for assembly as a color display panel later. It is possible to eliminate adverse effects such as nonuniform spacing.

[0029]

According to the color filter of the present invention, when the black matrix pattern 2 is patterned by a photofabrication (photolithography) method using a pigment-dispersed photoresist, the pattern exposure light beam in the photofabrication is Pattern exposure due to the amount of light that is absorbed by the black pigment of the pigment-dispersed photoresist film and reaches the glass substrate surface extremely before it reaches the glass substrate 1 surface through the pigment-dispersed photoresist film. Can be eliminated by setting the thickness of the color pigment dispersion photoresist as small as possible, preventing halation on the glass substrate surface, and improving the accuracy of the pattern edge portion of the black matrix pattern. And can improve Black protrusions raised in a matrix pattern and the overlap portion of the filter color pattern is effective to prevent is formed.

[Brief description of drawings]

FIG. 1 is a side sectional view illustrating a black matrix pattern in an embodiment of a color filter of the present invention.

FIG. 2 is a side sectional view illustrating a black matrix pattern and a filter color pattern in one embodiment of the color filter of the present invention.

FIG. 3A is a side sectional view illustrating a black matrix pattern in an example of a conventional color filter,
(B) is a side sectional view for explaining a black matrix pattern and a filter color pattern in one embodiment of the color filter of the present invention.

[Explanation of symbols]

1 ... Glass substrate 2 ... Black matrix pattern 3
... 1st pattern layer 4 ... 2nd pattern layer 5 ... Filter color pattern 11 ... Glass substrate 12 ... Black matrix pattern 13 ... 1st pattern layer 14 ... 2nd pattern layer 15 ... Filter color pattern

Claims (1)

[Claims] 1. A black matrix pattern 2 on a glass substrate 1, a filter color pattern 5 composed of blue, green and red coloring patterns, a transparent conductive layer and the like, and the black matrix pattern 2 has a light shielding property. It is composed of a first pattern layer 3 formed of a non-photosensitive resin and a second pattern layer 4 formed of a light-shielding photosensitive resin layer that is aligned and laminated on the first pattern layer. Characteristic color filter.