JPH06229709A - Film thickness measuring apparatus - Google Patents
Film thickness measuring apparatusInfo
- Publication number
- JPH06229709A JPH06229709A JP1366193A JP1366193A JPH06229709A JP H06229709 A JPH06229709 A JP H06229709A JP 1366193 A JP1366193 A JP 1366193A JP 1366193 A JP1366193 A JP 1366193A JP H06229709 A JPH06229709 A JP H06229709A
- Authority
- JP
- Japan
- Prior art keywords
- measuring
- coating film
- film thickness
- substrate
- reference position
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本願発明は、自動車用外板等に形
成された塗膜の膜厚を計測するための膜厚計測装置に関
するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a film thickness measuring device for measuring the film thickness of a coating film formed on an automobile outer plate or the like.
【０００２】[0002]
【従来の技術】一般に、自動車用外板等における塗膜の
品質を評価する一つの要素として、塗膜の厚さにかかわ
る評価がある。2. Description of the Related Art Generally, as one of the factors for evaluating the quality of a coating film on an automobile outer panel, there is an evaluation relating to the thickness of the coating film.
【０００３】この塗膜厚さを計測する方法としては、従
来から種々のものが提案され且つ実用化されている。例
えば、特開平３ー１８９５０３号公報に開示されている
ように、被覆された基板および被覆されていない基板
に、可変周波数の渦電流を発生させ、周波数の変化に伴
う両基板の導電度の変化を比較することにより基板上の
塗膜の厚さを計測する電磁式計測法がある。Various methods have been proposed and put to practical use as methods for measuring the thickness of the coating film. For example, as disclosed in Japanese Patent Application Laid-Open No. 3-189503, a eddy current having a variable frequency is generated in a coated substrate and an uncoated substrate, and a change in conductivity of both substrates due to a change in frequency. There is an electromagnetic measurement method for measuring the thickness of the coating film on the substrate by comparing
【０００４】また、基板の厚さと被覆されている基板の
厚さとを機械的に接触計測することにより塗膜の厚さを
計測する接触式膜厚計等も知られている。Also known is a contact type film thickness meter which measures the thickness of the coating film by mechanically measuring the thickness of the substrate and the thickness of the coated substrate.
【０００５】[0005]
【発明が解決しようとする課題】ところが、前記公知例
の電磁式計測法の場合、被覆された基板と被覆されてい
ない基板とにおける周波数変化による計測方法なので、
二つの基板における周波数測定値を比較しなければなら
ないため、既に基板上に被覆形成された塗膜の膜厚計測
には適しないという不具合がある。However, in the case of the above-mentioned known electromagnetic measuring method, the measuring method is based on the frequency change between the coated substrate and the uncoated substrate.
Since it is necessary to compare the frequency measurement values of the two substrates, there is a problem that it is not suitable for measuring the film thickness of the coating film already formed on the substrates.
【０００６】また、接触式膜厚計を用いる場合、塗膜表
面を傷付けるおそれがあるとともに、塗布直後の塗膜の
膜厚を計測するのに適しないという不具合がある。Further, when the contact type film thickness meter is used, there is a problem that the surface of the coating film may be damaged and it is not suitable for measuring the film thickness of the coating film immediately after coating.
【０００７】本願発明は、上記の点に鑑みてなされたも
ので、極めて簡易な構成の非接触方式により塗膜の膜厚
計測を行い得るようにすることを目的とするものであ
る。The present invention has been made in view of the above points, and an object of the present invention is to make it possible to measure the film thickness of a coating film by a non-contact method having an extremely simple structure.
【０００８】[0008]
【課題を解決するための手段】請求項１の発明では、上
記課題を解決するための手段として、導電体からなる基
板上に被覆された塗膜の厚さを計測する膜厚計測装置
を、基準位置から前記基板表面までの距離を計測する電
磁式計測手段と、前記基準位置から塗膜表面までの距離
を計測する光学式計測手段とを備えて構成している。According to a first aspect of the present invention, as means for solving the above-mentioned problems, a film thickness measuring device for measuring the thickness of a coating film coated on a substrate made of a conductor is provided. It comprises electromagnetic measuring means for measuring the distance from the reference position to the surface of the substrate and optical measuring means for measuring the distance from the reference position to the surface of the coating film.
【０００９】請求項２の発明では、上記課題を解決する
ための手段として、前記請求項１記載の膜厚計測装置に
おいて、前記光学式計測手段において使用される計測光
の波長を２００〜３５０μmの範囲に設定している。According to a second aspect of the present invention, as means for solving the above-mentioned problems, in the film thickness measuring apparatus according to the first aspect, the wavelength of the measuring light used in the optical measuring means is 200 to 350 μm. It is set to the range.
【００１０】[0010]
【作用】請求項１の発明では、上記手段によって次のよ
うな作用が得られる。According to the first aspect of the invention, the following actions can be obtained by the above means.
【００１１】即ち、電磁式計測手段により計測された基
準位置から基板表面までの距離と光学式計測手段により
計測された基準位置から塗膜表面までの距離との差によ
って塗膜の膜厚が得られるのである。That is, the film thickness of the coating film is obtained by the difference between the distance from the reference position measured by the electromagnetic measuring means to the substrate surface and the distance from the reference position measured by the optical measuring means to the coating surface. Be done.
【００１２】請求項２の発明では、上記手段によって次
のような作用が得られる。According to the second aspect of the invention, the following actions can be obtained by the above means.
【００１３】即ち、光学式計測手段による計測の場合、
反射特性が塗膜の色の影響をほとんど受けない周波数領
域に設定されているため、色変化による計測誤差が小さ
く抑えられこととなる。That is, in the case of measurement by the optical measuring means,
Since the reflection characteristics are set in the frequency range where the influence of the color of the coating film is scarce, the measurement error due to the color change can be suppressed small.
【００１４】[0014]
【発明の効果】請求項１の発明によれば、導電体からな
る基板上に被覆された塗膜の厚さを計測する膜厚計測装
置を、基準位置から前記基板表面までの距離を計測する
電磁式計測手段と、前記基準位置から塗膜表面までの距
離を計測する光学式計測手段とを備えて構成して、電磁
式計測手段により計測された基準位置から基板表面まで
の距離と光学式計測手段により計測された基準位置から
塗膜表面までの距離との差によって塗膜の膜厚が得られ
るようにしたので、極めて簡易な手法により非接触方式
での膜厚計測が行えるところから、塗膜表面を傷付けた
りすることがないとともに、塗布直後の塗膜の膜厚計測
も容易に行うことができるという優れた効果がある。According to the first aspect of the invention, a film thickness measuring device for measuring the thickness of a coating film coated on a substrate made of a conductor measures the distance from a reference position to the surface of the substrate. An electromagnetic measuring means and an optical measuring means for measuring the distance from the reference position to the coating surface are provided, and the distance from the reference position measured by the electromagnetic measuring means to the substrate surface and the optical type Since the film thickness of the coating film can be obtained by the difference between the reference position measured by the measuring means and the surface of the coating film, the film thickness can be measured in a non-contact method by a very simple method. It has an excellent effect that the surface of the coating film is not damaged and the thickness of the coating film immediately after coating can be easily measured.
【００１５】請求項２の発明によれば、請求項１記載の
膜厚計測装置において、光学式計測手段において使用さ
れる計測光の波長を２００〜３５０μmの範囲に設定す
るようにして、光学式計測手段による計測を、反射特性
が塗膜の色の影響をほとんど受けない周波数領域の計測
光により行うようにしているので、色変化による計測誤
差が小さく抑えられることとなり、基準位置から塗膜表
面までの距離計測が正確に行えるという優れた効果があ
る。According to the invention of claim 2, in the film thickness measuring apparatus of claim 1, the wavelength of the measuring light used in the optical measuring means is set in the range of 200 to 350 μm. Since the measurement by the measuring means is performed by the measuring light in the frequency range whose reflection characteristic is hardly affected by the color of the coating film, the measurement error due to the color change can be suppressed to a small level, and the coating surface from the reference position can be suppressed. It has an excellent effect that the distance up to can be accurately measured.
【００１６】[0016]
【実施例】以下、添付の図面を参照して、本願発明の好
適な実施例を説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the accompanying drawings.
【００１７】本実施例の膜厚計測装置は、汎用ロボット
(図示省略)のロボットハンド１に装着されるものであ
り、導電体からなる基板２上に被覆された塗膜３の厚さ
dを計測するために使用されるものである。The film thickness measuring device of this embodiment is a general-purpose robot.
The thickness of the coating film 3 which is mounted on the robot hand 1 (not shown) and which is coated on the substrate 2 made of a conductor.
It is used to measure d.
【００１８】前記膜厚計測装置は、電磁式計測手段とし
て作用する電磁式変位検出コイル４と、該電磁式変位検
出コイル４の中に配設された投光部５aと受光部５bとか
らなり、光学式計測手段として作用する光学式変位検出
機構５とを備えて構成されている。The film thickness measuring device comprises an electromagnetic displacement detecting coil 4 acting as an electromagnetic measuring means, and a light projecting portion 5a and a light receiving portion 5b arranged in the electromagnetic displacement detecting coil 4. , And an optical displacement detection mechanism 5 that functions as an optical measuring unit.
【００１９】前記電磁式変位検出コイル４は、基準位置
Ａ(本実施例の場合、変位検出コイル４の下端)から前記
基板２の表面までの距離Ｘを計測するものとされ、前記
光学式変位検出機構５は、前記基準位置Ａから塗膜３の
表面までの距離Ｙを計測するものとされている。The electromagnetic displacement detection coil 4 measures the distance X from the reference position A (the lower end of the displacement detection coil 4 in the present embodiment) to the surface of the substrate 2, and the optical displacement detection coil 4 is used. The detection mechanism 5 is supposed to measure the distance Y from the reference position A to the surface of the coating film 3.
【００２０】ここで、前記電磁式変位検出コイル４によ
る計測方法を図２を参照して説明する。Now, a measuring method using the electromagnetic displacement detecting coil 4 will be described with reference to FIG.
【００２１】電磁式変位検出コイル４に周波数fの交流
を流すと、方向磁場Ｈpが発生し、導電体である基板２
の内部に渦電流が誘発される。この渦電流により二次的
な磁場Ｈsが生じる。該磁場Ｈsは前記方向磁場Ｈpに対
して方向が反対で方向磁場Ｈpを減少させるため、渦電
流が最初の交流に対して抵抗として作用し、コイル４の
インダクタンスを変えることとなる。When an alternating current having a frequency f is passed through the electromagnetic displacement detection coil 4, a directional magnetic field Hp is generated, and the substrate 2 which is a conductor.
Eddy currents are induced inside the. This eddy current produces a secondary magnetic field Hs. Since the magnetic field Hs has a direction opposite to that of the directional magnetic field Hp and reduces the directional magnetic field Hp, the eddy current acts as a resistance against the first alternating current and changes the inductance of the coil 4.
【００２２】上記のような現象から、周波数fと基準位
置Ａ(換言すれば、コイル４の下端)から基板２の表面ま
での距離Ｘとの間には次式で示す関係が成立することと
なる。From the phenomenon as described above, the relationship expressed by the following equation is established between the frequency f and the distance X from the reference position A (in other words, the lower end of the coil 4) to the surface of the substrate 2. Become.
【００２３】 f＝５．０６６／σ・μr・Ｘ2 (１) ここに、σ:導電率(μΩ)、μr:比透磁率。F = 5.066 / σ · μr · X 2 (1) where σ: conductivity (μΩ) and μr: relative permeability.
【００２４】従って、コイル４における周波数fの変化
を計測すれば、基準位置Ａから基板２の表面までの距離
Ｘが得られるのである。Therefore, by measuring the change in the frequency f in the coil 4, the distance X from the reference position A to the surface of the substrate 2 can be obtained.
【００２５】次に、光学式変位検出機構５による計測方
法を図３を参照して説明する。Next, a measuring method by the optical displacement detecting mechanism 5 will be described with reference to FIG.
【００２６】投光部５aから照射された計測光Ｉは塗膜
３の表面で反射されて受光部５bに受光されるが、前述
したように電磁式変位検出コイル４による計測によって
基準位置Ａから基板２の表面までの距離Ｘがわかってい
るので、投光部５aからの計測光Ｉが基板２の表面で反
射して受光部５bに受光されるであろう位置Ｐ1と塗膜３
の表面で反射して受光部５bに受光される位置Ｐ2との変
位量Ｓを測定すれば、計測光Ｉの入射角θに基づいて三
角法により基準位置Ａから塗膜３の表面までの距離Ｙが
得られるのである。The measuring light I emitted from the light projecting section 5a is reflected on the surface of the coating film 3 and received by the light receiving section 5b. Since the distance X to the surface of the substrate 2 is known, the position P 1 and the coating film 3 where the measurement light I from the light projecting portion 5a will be reflected by the surface of the substrate 2 and received by the light receiving portion 5b.
By measuring the displacement amount S with respect to the position P 2 which is reflected by the surface of the light receiving portion 5b and is received by the light receiving portion 5b, the distance from the reference position A to the surface of the coating film 3 is triangulated based on the incident angle θ of the measurement light I. The distance Y is obtained.
【００２７】上記のようにして、基準位置Ａから基板２
の表面および塗膜３の表面までの距離Ｘ,Ｙが得られる
と、塗膜３の膜厚dは両者の差(Ｘ−Ｙ)として求められ
るのである。As described above, from the reference position A to the substrate 2
When the distances X and Y to the surface of the coating film 3 and the surface of the coating film 3 are obtained, the film thickness d of the coating film 3 is obtained as the difference (XY) between the two.
【００２８】なお、光学式変位検出機構５による計測の
場合、計測面である塗膜３の表面の色によって光反射特
性が大きく異なることがあり、色変化による計測誤差が
生じるおそれがあるとともに、計測面の色が多色の場
合、色情報等による検出感度の調整(換言すれば、補正)
が必要となる。In the case of measurement by the optical displacement detection mechanism 5, the light reflection characteristics may vary greatly depending on the color of the surface of the coating film 3, which is the measurement surface, which may cause a measurement error due to color change. When the color of the measurement surface is multicolor, the detection sensitivity is adjusted based on the color information (in other words, correction)
Is required.
【００２９】ちなみに、計測面の色による光反射特性を
調べたところ、図４に示すような結果が得られた。図４
は、計測光Ｉの波長を横軸に、色による反射相対強度を
縦軸としたものである。By the way, when the light reflection characteristics depending on the color of the measurement surface were examined, the results shown in FIG. 4 were obtained. Figure 4
Shows the wavelength of the measurement light I on the horizontal axis and the reflection relative intensity by color on the vertical axis.
【００３０】これによれば、計測光Ｉの波長が２００〜
３５０μmの範囲においては色による光反射特性は変わ
らないが、計測光Ｉの波長が３５０μm以上となると白
色系と黒色系とで光反射特性に大きな差異が生じること
がわかる。According to this, the wavelength of the measurement light I is 200 to
Although the light reflection characteristics by color do not change in the range of 350 μm, it can be seen that when the wavelength of the measurement light I is 350 μm or more, there is a large difference in light reflection characteristics between the white system and the black system.
【００３１】このような事実に鑑みて、本実施例では、
光学式変位検出機構５に用いられる計測光Ｉの波長を２
００〜３５０μmの範囲に設定している。In consideration of such a fact, in this embodiment,
The wavelength of the measurement light I used in the optical displacement detection mechanism 5 is set to 2
It is set in the range of 00 to 350 μm.
【００３２】上記したように、本実施例によれば、電磁
式変位検出コイル４により計測された基準位置Ａから基
板２の表面までの距離Ｘと光学式変位検出機構５により
計測された基準位置Ａから塗膜３の表面までの距離Ｙと
の差によって塗膜３の膜厚dが得られるようにしている
ため、極めて簡易な手法により非接触方式での膜厚計測
が行えるところから、塗膜３の表面を傷付けたりするこ
とがないとともに、塗布直後の塗膜３の膜厚計測も容易
に行うことができるのである。As described above, according to this embodiment, the distance X from the reference position A measured by the electromagnetic displacement detection coil 4 to the surface of the substrate 2 and the reference position measured by the optical displacement detection mechanism 5 are set. Since the film thickness d of the coating film 3 is obtained by the difference from the distance Y from A to the surface of the coating film 3, it is possible to measure the film thickness in a non-contact method by an extremely simple method. The surface of the film 3 is not damaged and the film thickness of the coating film 3 immediately after coating can be easily measured.
【００３３】また、光学式変位検出機構５において使用
される計測光Ｉの波長を２００〜３５０μmの範囲に設
定するようにしているため、光学式変位検出機構５によ
る計測を、反射特性が塗膜の色の影響をほとんど受けな
い周波数領域の計測光Ｉにより行うことができることと
なり、色変化による計測誤差を小さく抑えることができ
る。Further, since the wavelength of the measuring light I used in the optical displacement detecting mechanism 5 is set in the range of 200 to 350 μm, the measurement by the optical displacement detecting mechanism 5 has a reflection characteristic of a coating film. Since the measurement light I in the frequency domain, which is hardly affected by the color of, can be performed, the measurement error due to the color change can be suppressed.
【００３４】本願発明は、上記実施例の構成に限定され
るものではなく、発明の要旨を逸脱しない範囲において
適宜設計変更可能なことは勿論である。The invention of the present application is not limited to the configuration of the above-mentioned embodiment, and it goes without saying that the design can be appropriately changed without departing from the gist of the invention.
【図１】本願発明の実施例にかかる膜厚計測装置の概略
構成図である。FIG. 1 is a schematic configuration diagram of a film thickness measuring device according to an embodiment of the present invention.
【図２】本願発明の実施例にかかる膜厚計測装置におけ
る電磁式計測手段(電磁式変位検出コイル)による計測方
法を説明するための図である。FIG. 2 is a diagram for explaining a measuring method by an electromagnetic measuring unit (electromagnetic displacement detecting coil) in the film thickness measuring apparatus according to the embodiment of the present invention.
【図３】本願発明の実施例にかかる膜厚計測装置におけ
る光学式計測手段(光学式変位検出機構)による計測方法
を説明するための図である。FIG. 3 is a diagram for explaining a measuring method by an optical measuring means (optical displacement detecting mechanism) in the film thickness measuring apparatus according to the embodiment of the present invention.
【図４】計測面の色による光反射特性を示す特性図であ
る。FIG. 4 is a characteristic diagram showing a light reflection characteristic depending on a color of a measurement surface.
１はロボットハンド、２は基板、３は塗膜、４は電磁式
計測手段(電磁式変位検出コイル)、５は光学式計測手段
(光学式変位検出機構)、５aは投光部、５bは受光部、Ａ
は基準位置、Ｘは基準位置Ａから基板２の表面までの距
離、Ｙは基準位置Ａから塗膜３の表面までの距離、dは
塗膜３の膜厚。1 is a robot hand, 2 is a substrate, 3 is a coating film, 4 is an electromagnetic measuring means (electromagnetic displacement detection coil), and 5 is an optical measuring means.
(Optical displacement detection mechanism) 5a is a light emitting part, 5b is a light receiving part, A
Is the reference position, X is the distance from the reference position A to the surface of the substrate 2, Y is the distance from the reference position A to the surface of the coating film 3, and d is the film thickness of the coating film 3.
Claims (2)
の厚さを計測する膜厚計測装置であって、基準位置から
前記基板表面までの距離を計測する電磁式計測手段と、
前記基準位置から塗膜表面までの距離を計測する光学式
計測手段とを備えていることを特徴とする膜厚計測装
置。1. A film thickness measuring device for measuring the thickness of a coating film coated on a substrate made of a conductive material, and electromagnetic measuring means for measuring a distance from a reference position to the surface of the substrate.
A film thickness measuring device comprising: an optical measuring unit that measures the distance from the reference position to the surface of the coating film.
計測光の波長は２００〜３５０μmの範囲に設定されて
いることを特徴とする前記請求項１記載の膜厚計測装
置。2. The film thickness measuring device according to claim 1, wherein the wavelength of the measuring light used in the optical measuring means is set in the range of 200 to 350 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1366193A JPH06229709A (en) | 1993-01-29 | 1993-01-29 | Film thickness measuring apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1366193A JPH06229709A (en) | 1993-01-29 | 1993-01-29 | Film thickness measuring apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06229709A true JPH06229709A (en) | 1994-08-19 |
Family
ID=11839390
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1366193A Pending JPH06229709A (en) | 1993-01-29 | 1993-01-29 | Film thickness measuring apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06229709A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002148012A (en) * | 2000-11-08 | 2002-05-22 | Ulvac Japan Ltd | Apparatus and method for measurement of film thickness |
| JP2008304471A (en) * | 2000-03-28 | 2008-12-18 | Toshiba Corp | Film thickness measuring device, film thickness measuring method, and recording medium |
| KR20210057809A (en) * | 2018-09-24 | 2021-05-21 | 허니웰 인터내셔날 인코포레이티드 | Thickness measurement using inductive and optical displacement sensors |
-
1993
- 1993-01-29 JP JP1366193A patent/JPH06229709A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008304471A (en) * | 2000-03-28 | 2008-12-18 | Toshiba Corp | Film thickness measuring device, film thickness measuring method, and recording medium |
| JP2002148012A (en) * | 2000-11-08 | 2002-05-22 | Ulvac Japan Ltd | Apparatus and method for measurement of film thickness |
| KR20210057809A (en) * | 2018-09-24 | 2021-05-21 | 허니웰 인터내셔날 인코포레이티드 | Thickness measurement using inductive and optical displacement sensors |
| JP2022500660A (en) * | 2018-09-24 | 2022-01-04 | ハネウェル・インターナショナル・インコーポレーテッドHoneywell International Inc. | Thickness measurement using induction and optical displacement sensors |
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